CN110794624A - Display panel and manufacturing method thereof - Google Patents
Display panel and manufacturing method thereof Download PDFInfo
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- CN110794624A CN110794624A CN201911113353.1A CN201911113353A CN110794624A CN 110794624 A CN110794624 A CN 110794624A CN 201911113353 A CN201911113353 A CN 201911113353A CN 110794624 A CN110794624 A CN 110794624A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
Abstract
The invention provides a display panel and a manufacturing method thereof, wherein the display panel comprises: the color filter comprises an array substrate, a color film substrate, a color resistance layer, a plurality of black matrixes, an accommodating part and a plurality of support pillars; the accommodating part is arranged on the color resistance layer or the plurality of black matrixes; the support columns are arranged in the corresponding accommodating parts. According to the scheme, under the condition that the liquid crystal cell gap is limited, the accommodating part is arranged, so that more space is increased for preparing the supporting column.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display panel and a manufacturing method of the display panel.
Background
As shown in fig. 1, the conventional display panel 3 generally includes a color filter substrate 31, an array substrate 32, and a liquid crystal layer 33 interposed therebetween. The thickness H of the liquid crystal layer 33 is a cell gap (cell gap). The cell gap is controlled by a plurality of supporting pillars 34(Photo spacers, PS) disposed on the color film substrate 31.
With the development of ultra-thin technology, the cell gap tends to decrease gradually, and the height of PS also decreases. However, it is difficult to prepare a PS having a too low height due to the limitation of the PS manufacturing process.
Disclosure of Invention
The invention aims to provide a display panel and a manufacturing method of the display panel, which provide more space for preparing a support pillar.
An embodiment of the present invention provides a display panel, including: the color filter comprises an array substrate, a color film substrate, a color resistance layer, a plurality of black matrixes, an accommodating part and a plurality of support pillars;
the accommodating part is arranged on the color resistance layer or the plurality of black matrixes;
the support columns are arranged in the corresponding accommodating parts.
In one embodiment, the color resistance layer is arranged on the array substrate;
the accommodating portion is disposed on the color resist layer.
In one embodiment, the display panel further comprises a protective layer;
the protective layer is arranged on the color resistance layer;
the plurality of receiving portions are provided on the protective layer.
In one embodiment, the display panel further includes:
a first via disposed on the protective layer, the first via having a conductive material therein;
the second through hole is arranged on the color resistance layer, and a conductive material is arranged in the second through hole;
and the electrode layer is arranged on the protective layer and is electrically connected with the first substrate through the conductive materials in the first via hole and the second via hole.
In an embodiment, the color resistance layer is disposed on the color film substrate, and the color resistance layer includes a plurality of color resistance units;
the black matrixes are arranged on the color film substrate and arranged between the corresponding adjacent color resistance units;
the accommodating portion is disposed on the black matrix.
In one embodiment, the receiving portions are holes, and the depths of the holes are the same or different.
In one embodiment, the pores have a pore size in the range of 15 microns to 20 microns.
In one embodiment, the height difference between the plurality of support posts ranges from 0.1 micrometers to 5 micrometers.
The embodiment of the invention also provides a manufacturing method of the display panel, which comprises the following steps:
providing an array substrate and a color film substrate;
forming a color resistance layer on the array substrate or forming a color resistance layer on the color film substrate;
when the color resistance layer is formed on the array substrate, a receiving part is formed on the color resistance layer;
when the color resistance layer is formed on the color film substrate, forming a plurality of black matrixes on the same layer with the color resistance layer;
forming the accommodating portion on the black matrix;
a support column is formed in the housing.
In one embodiment, the receiving portions are holes, and the depths of the holes are the same or different.
According to the display panel and the manufacturing method of the display panel, under the condition that the liquid crystal box gap is limited, the accommodating part is arranged, so that more space is increased for preparing the supporting column.
In order to make the aforementioned and other objects of the present invention more comprehensible, preferred embodiments accompanied with figures are described in detail below:
drawings
Fig. 1 is a schematic structural diagram of a conventional display panel.
Fig. 2 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
Fig. 3 is another schematic structural diagram of a display panel according to an embodiment of the invention.
Fig. 4 is a top view of a display panel according to an embodiment of the invention.
Fig. 5 is a schematic view of another structure of a display panel according to an embodiment of the present invention.
Fig. 6 is a schematic flow chart illustrating a manufacturing method of a display panel according to an embodiment of the present invention.
Detailed Description
The following description of the embodiments refers to the accompanying drawings for illustrating the specific embodiments in which the invention may be practiced. In the present invention, directional terms such as "up", "down", "front", "back", "left", "right", "inner", "outer", "side", etc. refer to directions of the attached drawings. Accordingly, the directional terms used are used for explanation and understanding of the present invention, and are not used for limiting the present invention.
In the drawings, elements having similar structures are denoted by the same reference numerals.
Reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the invention. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. It is explicitly and implicitly understood by one skilled in the art that the embodiments described herein can be combined with other embodiments.
Referring to fig. 2, fig. 2 is a schematic structural diagram of a display panel according to an embodiment of the present invention. The display panel 1 includes an array substrate 11, a color filter substrate 12, and a liquid crystal layer 16 disposed therebetween.
Wherein the array substrate 11 includes a substrate and a thin film transistor layer. Wherein the substrate may be used to carry thin-film-transistor layers and the like thereon. The substrate may be a glass substrate made of silicon dioxide, aluminum oxide, or the like. The thin film transistor layer includes a plurality of thin film transistors for controlling driving of liquid crystal pixels in the display panel 1.
The color film substrate 12 may be a glass substrate, and specifically may be an alkali-free glass substrate. The color film substrate 12 and the array substrate 11 are both provided with alignment film layers, which can align liquid crystal molecules in the liquid crystal layer 16 to allow light to pass through or shield.
The display panel 1 further includes a color resist layer 13 and a black matrix 17. The color resist layer 13 may be made of a colorant, a photocurable resin, a photoinitiator, or the like. The white light emitted from the backlight passes through the color resist layer 13 to form blue light, green light and blue light, so that the display panel 1 performs color display. Specifically, the color resist layer 13 may be formed by applying a material such as a colorant, a photocurable resin, or a photoinitiator, and then performing steps such as baking, exposure, and development.
In one embodiment, as shown in fig. 2, the color resist layer 13 may be disposed on the array substrate 11. In an embodiment, as shown in fig. 5, the color resist layer 13 may also be disposed on the color filter substrate 12.
When the color resist layer 13 is disposed on the array substrate 1, as shown in fig. 3 or 4, the display panel 1 may further include a protective layer 18, and the protective layer 18 is disposed on the color resist layer 13. The protective layer 18 not only protects the color resist layer 13 from contaminants in the color resist layer 13 penetrating into the liquid crystal cell, but also provides a flat surface. The protective layer 18 can be made of epoxy resin, acrylic resin, or other polymer materials. Specifically, the protective layer 18 may be formed by coating the polymer material on the color resist layer 13, and then performing steps such as baking, exposure, and development.
In an embodiment, the display panel 1 further includes a first via 19, a second via 20, and an electrode layer 21. The electrode layer 21 is disposed on the protective layer 18, the first via hole 19 is disposed on the protective layer 18, and the second via hole 20 is disposed on the color resist layer 13. The first via hole 19 has a pore size ranging from 3 micrometers to 5 micrometers, and the second via hole 20 has a pore size ranging from 10 micrometers to 15 micrometers.
The electrode layer 21 may be made of ITO (indium Tin Oxide), which is a transparent conductive material with good conductivity, and the first via hole 19 and the second via hole 20 are filled with a conductive material, so that the electrode layer 21 is electrically connected to the thin film transistor layer on the substrate through the conductive material in the first via hole 19 and the second via hole 20.
As shown in fig. 5, when the color resist layer 13 is disposed on the color filter substrate 12, the color resist layer 13 includes a plurality of color resist units 131. At this time, the color filter substrate 12 is further provided with a plurality of black matrixes 17, and each black matrix 17 is arranged between corresponding adjacent color resistance units 131. The black matrix 17 is used to prevent light leakage between pixels in the display panel 1, and can increase color contrast. The black matrix 17 may be made of a metal material or a black photoresist material. In one embodiment, the black matrix 17 may be made of a black photoresist material such as resin or carbon black.
The display panel 1 includes the supporting pillars 15 regardless of whether the color resist layer 13 is disposed on the array substrate 11 or the color filter substrate 12. The support columns 15 can maintain the thickness uniformity of the liquid crystal in the liquid crystal layer 16, and can prevent display blurring caused by uneven thickness of the liquid crystal. The support posts 15 may be made of a photoresist material, including a positive photoresist and a negative photoresist.
With the continuous improvement of ultra-thin technical requirements, the liquid crystal cell gap of the display panel is smaller and smaller, so that the height of the support column is lower and lower, and great challenges are brought to the preparation process of the support column.
In order to solve the above problem, as shown in fig. 2, when the color-resist layer 13 is disposed on the array substrate 11, a plurality of receiving portions 14 may be disposed on the color-resist layer 13, and the support columns 15 may be disposed in the corresponding receiving portions 14. As can be seen from comparison of the display panel 3 shown in fig. 1, the cell gap of the display panel 3 and the display panel 1 of this embodiment is H, the height of the space for preparing the supporting pillars 34 in the display panel 3 is H, and the height of the space for preparing the supporting pillars 15 in the display panel 1 is (H + H), i.e., the sum of the cell gap and the height of the color-resist layer 13.
In summary, by providing the receiving portion 14 on the color resist layer 13, the supporting post 15 can be prepared in a larger space in the vertical direction of the display panel 1.
Similarly, a support post 15 may be disposed on the color resist layer 13. The height difference can be formed more conveniently between the support columns 15 arranged in the accommodating portion 14 and the support columns 15 directly arranged on the color resist layer 13, so that the display panel 1 has a better Liquid crystal margin (Liquid crystal margin).
Specifically, a resist material may be applied over the entire surface of the color resist layer 13 having the receiving portion 14, and the resist material may fluctuate with the shape of the receiving portion 14 due to leveling. The photo-resist material is exposed by a photo-mask and developed to obtain a plurality of support pillars 15 having a certain height difference. The height difference of the plurality of support posts 15 may be set between 0.1 microns and 5 microns. The mask can be a mask with the same or different transmittance.
When the display panel 1 further includes the protective layer 18 provided on the color resist layer 13, the plurality of receiving portions 14 may be provided on the protective layer 18.
When the color resist layer 13 is provided on the color filter substrate 12, as shown in fig. 5, the receiving portion 14 may be provided on the black matrix 17, and the support columns 15 may be provided in the corresponding receiving portions 14. As can be seen from comparison of the display panel 3 shown in fig. 1, the cell gap of the display panel 3 and the display panel 1 of the present embodiment is H, the height of the space for preparing the support pillars 34 in the display panel 3 is H, and the height of the space for preparing the support pillars 15 in the display panel 1 is (H + H'), which is the sum of the cell gap and the height of the black matrix 17.
By providing the receiving portion 14 on the black matrix 17, the support post 15 can be prepared with more space in the vertical direction of the display panel 1. The receiving portion 14 may be a hole or a groove. As shown in fig. 5, when the receiving portion 14 is a hole, the hole has a diameter ranging from 15 micrometers to 20 micrometers. The depth of the holes may be the same or different. It should be noted that, in order to make the display panel 1 have a good Liquid crystal margin (Liquid crystal margin), it is necessary to make the height difference between the supporting columns 15 good, and therefore, the plurality of holes may be set to different depths according to the required height difference.
Similarly, the support columns 15 may be provided on the black matrix 17. The height difference can be formed more conveniently between the support columns 15 arranged in the accommodating portion 14 and the support columns 15 directly arranged in the black matrix 17, so that the display panel 1 has a better Liquid crystal edge (Liquid crystal margin).
Specifically, a resist material may be applied over the entire surface of the black matrix 17 having the receiving portion 14, and the resist material may fluctuate in accordance with the shape of the receiving portion 14 due to a leveling effect. The photo-resist material is exposed by a photo-mask and developed to obtain a plurality of support pillars 15 having a certain height difference. The height difference of the plurality of support posts 15 may be set between 0.1 microns and 2 microns. The mask can be a mask with the same or different transmittance.
In summary, the receiving portion 14 may be a hole or a groove. As shown in fig. 2-4, when the receiving portion 14 is a pore, the pore size of the pore ranges from 15 microns to 20 microns. The depth of the holes may be the same or different. It should be noted that, in order to make the display panel 1 have a good Liquid crystal margin (Liquid crystal margin), it is necessary to make the height difference between the supporting columns 15 good, and therefore, the plurality of holes may be set to different depths according to the required height difference.
According to the display panel provided by the embodiment of the invention, under the condition that the liquid crystal box gap is limited, the support columns are arranged in the corresponding accommodating parts by arranging the accommodating parts on the color resistance layer or the black matrix, so that more space is increased for preparing the support columns.
Referring to fig. 6, fig. 6 is a schematic flow chart illustrating a manufacturing method of a display panel according to an embodiment of the present invention.
Step S101, an array substrate and a color filter substrate are provided.
Wherein the array substrate may include a substrate and a thin-film transistor layer. Wherein the substrate may be used to carry thin-film-transistor layers and the like thereon. The substrate may be a glass substrate made of silicon dioxide, aluminum oxide, or the like. The thin film transistor layer comprises a plurality of thin film transistors and is used for controlling the driving of liquid crystal pixel points in the display panel.
The color film substrate can be a glass substrate, and particularly can be an alkali-free glass substrate. The color film substrate and the array substrate are both provided with alignment film layers, and liquid crystal molecules in the liquid crystal layer can be aligned to enable light to pass through or shield.
Step S102, a color resist layer is formed on the array substrate or formed on the color film substrate.
The color-resisting layer can be composed of coloring agent, light-cured resin, photoinitiator and other materials. The white light emitted by the backlight source passes through the color resistance layer to form blue light, green light and blue light, so that the display panel performs color display.
As shown in fig. 2, 3 and 5, the color resist layer 13 may be disposed on the array substrate 11 or on the color filter substrate 12.
Specifically, the array substrate 11 or the color filter substrate 12 may be coated with a colorant, a photocurable resin, a photoinitiator, and other materials, and then subjected to baking, exposure, development, and other steps to form the color resist layer 13.
In step S103, when forming the color resist layer on the array substrate, a receiving portion is formed on the color resist layer.
Here, when the color resist layer 13 is disposed on the array substrate 11, the second via hole 20 shown in fig. 3 may also be formed simultaneously when the color resist layer 13 is prepared. The second via 20 has a pore size ranging between 10 and 15 microns.
As shown in fig. 3, a protective layer 18 may also be formed on the color resist layer 13. The protective layer 18 not only protects the color resist layer 13 from contaminants in the color resist layer 13 penetrating into the liquid crystal cell, but also provides a flat surface. The protective layer 18 can be made of epoxy resin, acrylic resin, or other polymer materials. Specifically, the protective layer 18 may be formed by coating the polymer material on the color resist layer 13, and then performing steps such as baking, exposure, and development. In this process, the first via hole 19 may also be formed on the protective layer 18. The first via hole 19 has a pore size ranging from 3 micrometers to 5 micrometers.
Further, the electrode layer 21 may be formed on the protective layer 18. The electrode layer 21 may be made of a transparent conductive material ITO (Indium Tin Oxide) having good conductivity. Specifically, the ITO is directly coated on the protective layer 18, and the ITO is filled into the first via hole 19 and the second via hole 20, so that the electrode layer 21 is electrically connected to the thin film transistor layer on the substrate through the first via hole 19 and the second via hole 20.
As shown in fig. 2, the receiving portion 14 may be provided on the color resist layer 13. As shown in fig. 3, when the color resist layer 13 is further formed with a protective layer 18, the plurality of receiving portions 14 may be provided on the protective layer 18.
In step S104, when the color resist layer is formed on the color film substrate, a plurality of black matrices are formed in the same layer as the color resist layer.
As shown in fig. 5, when the color filter substrate 12 is formed with the color resist layer 13, the color resist layer 13 includes a plurality of color resist units 131. Specifically, a black matrix 17 is formed between each two adjacent color resistance units 131. The black matrix 17 is used to prevent light leakage between pixels in the display panel 1, and can increase color contrast. The black matrix 17 may be made of a metal material or a black photoresist material. In one embodiment, the black matrix 17 may be made of a black photoresist material such as resin or carbon black.
In step S105, a housing portion is formed in the black matrix.
As shown in fig. 5, by providing the receiving portion 14 on the black matrix 17, the support post 15 can be prepared with more space in the vertical direction of the display panel 1.
Step S106 is to form a support column in the housing portion.
In summary, the receiving portion 14 may be a hole or a groove. When the receiving portion 14 is a pore, the pore size of the pore is in the range of 15 microns to 20 microns. The depth of the holes may be the same or different. It should be noted that, in order to make the display panel 1 have a good Liquid crystal margin (Liquid crystal margin), it is necessary to make the height difference between the supporting columns 15 good, and therefore, the plurality of holes may be set to different depths according to the required height difference.
Support posts 15 may then be formed in the receptacles 14. Specifically, when the receiving portion 14 is provided on the color resist layer 13, a resist material may be applied to the entire surface of the color resist layer 13 having the receiving portion 14. When the housing portion 14 is provided on the black matrix 17, a photoresist may be applied to the entire surface of the black matrix 17 having the housing portion 14. The photoresist fluctuates with the shape of the housing portion 14 due to the leveling action. The photo-resist material is exposed by a photo-mask and developed to obtain a plurality of support pillars 15 having a certain height difference. The height difference of the plurality of support posts 15 may be set between 0.1 microns and 2 microns. The mask can be a mask with the same or different transmittance.
According to the manufacturing method of the display panel, under the condition that the liquid crystal cell gap is limited, the supporting columns are arranged in the corresponding accommodating parts by arranging the accommodating parts on the color resistance layer or the black matrix, and more space is increased for preparing the supporting columns.
In summary, although the present invention has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, therefore, the scope of the present invention shall be determined by the appended claims.
Claims (10)
1. A display panel, comprising: the color filter comprises an array substrate, a color film substrate, a color resistance layer, a plurality of black matrixes, an accommodating part and a plurality of support pillars;
the accommodating part is arranged on the color resistance layer or the plurality of black matrixes;
the support columns are arranged in the corresponding accommodating parts.
2. The display panel according to claim 1,
the color resistance layer is arranged on the array substrate;
the accommodating portion is disposed on the color resist layer.
3. The display panel according to claim 2, further comprising a protective layer;
the protective layer is arranged on the color resistance layer;
the plurality of receiving portions are provided on the protective layer.
4. The display panel according to claim 3, characterized in that the display panel further comprises:
a first via disposed on the protective layer, the first via having a conductive material therein;
the second through hole is arranged on the color resistance layer, and a conductive material is arranged in the second through hole;
and the electrode layer is arranged on the protective layer and is electrically connected with the first substrate through the conductive materials in the first via hole and the second via hole.
5. The display panel according to claim 1,
the color resistance layer is arranged on the color film substrate and comprises a plurality of color resistance units;
the black matrixes are arranged on the color film substrate and arranged between the corresponding adjacent color resistance units;
the accommodating portion is disposed on the black matrix.
6. The display panel according to claim 1, wherein the receiving portions are holes, and the depth of the holes is the same or different.
7. The display panel of claim 4, wherein the apertures have a pore size in a range of 15 microns to 20 microns.
8. The display panel according to any one of claims 1 to 7, wherein a height difference between the plurality of support posts ranges from 0.1 micrometers to 5 micrometers.
9. A method for manufacturing a display panel is characterized by comprising the following steps:
providing an array substrate and a color film substrate;
forming a color resistance layer on the array substrate or forming a color resistance layer on the color film substrate;
when the color resistance layer is formed on the array substrate, a receiving part is formed on the color resistance layer;
when the color resistance layer is formed on the color film substrate, forming a plurality of black matrixes on the same layer with the color resistance layer;
forming the accommodating portion on the black matrix;
a support column is formed in the housing.
10. The method of manufacturing a display panel according to claim 9, wherein the receiving portions are holes, and the depth of the holes is the same or different.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112242098A (en) * | 2020-10-14 | 2021-01-19 | Tcl华星光电技术有限公司 | Substrate, preparation method thereof and display panel |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005084231A (en) * | 2003-09-05 | 2005-03-31 | Toshiba Matsushita Display Technology Co Ltd | Liquid crystal display and its manufacturing method |
| CN102213857A (en) * | 2010-04-07 | 2011-10-12 | 上海广电富士光电材料有限公司 | Color filtering base plate and manufacturing method thereof |
| CN104965333A (en) * | 2015-07-15 | 2015-10-07 | 深圳市华星光电技术有限公司 | COA type liquid crystal display panel and preparation method thereof |
| CN105652527A (en) * | 2016-01-22 | 2016-06-08 | 京东方科技集团股份有限公司 | Color film substrate, manufacture method thereof and display device |
| CN206773356U (en) * | 2017-05-19 | 2017-12-19 | 厦门天马微电子有限公司 | A kind of display panel |
| CN107608126A (en) * | 2017-11-07 | 2018-01-19 | 深圳市华星光电技术有限公司 | A kind of liquid crystal display panel and its manufacture method |
| CN209388079U (en) * | 2018-11-26 | 2019-09-13 | 惠科股份有限公司 | A kind of display panel and display device |
| CN110262117A (en) * | 2019-06-28 | 2019-09-20 | 厦门天马微电子有限公司 | A kind of color membrane substrates, display panel and display device |
-
2019
- 2019-11-14 CN CN201911113353.1A patent/CN110794624A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005084231A (en) * | 2003-09-05 | 2005-03-31 | Toshiba Matsushita Display Technology Co Ltd | Liquid crystal display and its manufacturing method |
| CN102213857A (en) * | 2010-04-07 | 2011-10-12 | 上海广电富士光电材料有限公司 | Color filtering base plate and manufacturing method thereof |
| CN104965333A (en) * | 2015-07-15 | 2015-10-07 | 深圳市华星光电技术有限公司 | COA type liquid crystal display panel and preparation method thereof |
| CN105652527A (en) * | 2016-01-22 | 2016-06-08 | 京东方科技集团股份有限公司 | Color film substrate, manufacture method thereof and display device |
| CN206773356U (en) * | 2017-05-19 | 2017-12-19 | 厦门天马微电子有限公司 | A kind of display panel |
| CN107608126A (en) * | 2017-11-07 | 2018-01-19 | 深圳市华星光电技术有限公司 | A kind of liquid crystal display panel and its manufacture method |
| CN209388079U (en) * | 2018-11-26 | 2019-09-13 | 惠科股份有限公司 | A kind of display panel and display device |
| CN110262117A (en) * | 2019-06-28 | 2019-09-20 | 厦门天马微电子有限公司 | A kind of color membrane substrates, display panel and display device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112242098A (en) * | 2020-10-14 | 2021-01-19 | Tcl华星光电技术有限公司 | Substrate, preparation method thereof and display panel |
| CN112242098B (en) * | 2020-10-14 | 2022-08-05 | Tcl华星光电技术有限公司 | Substrate, preparation method thereof and display panel |
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