CN109137029B - 用于半导体电镀装置的唇状密封件和触头元件 - Google Patents

用于半导体电镀装置的唇状密封件和触头元件 Download PDF

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Publication number
CN109137029B
CN109137029B CN201810986262.8A CN201810986262A CN109137029B CN 109137029 B CN109137029 B CN 109137029B CN 201810986262 A CN201810986262 A CN 201810986262A CN 109137029 B CN109137029 B CN 109137029B
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China
Prior art keywords
substrate
cup
electrical contact
contact element
contact
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CN201810986262.8A
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Chinese (zh)
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CN109137029A (zh
Inventor
冯敬斌
罗伯特·马歇尔·斯托威尔
尚蒂纳特·古艾迪
阿斯温·拉梅什
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Novellus Systems Inc
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Novellus Systems Inc
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Priority claimed from US14/685,526 external-priority patent/US9988734B2/en
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Publication of CN109137029A publication Critical patent/CN109137029A/zh
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004—Sealing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)
CN201810986262.8A 2014-11-26 2015-11-26 用于半导体电镀装置的唇状密封件和触头元件 Active CN109137029B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201462085171P 2014-11-26 2014-11-26
US62/085,171 2014-11-26
US14/685,526 2015-04-13
US14/685,526 US9988734B2 (en) 2011-08-15 2015-04-13 Lipseals and contact elements for semiconductor electroplating apparatuses
CN201510837221.9A CN105624754B (zh) 2014-11-26 2015-11-26 用于半导体电镀装置的唇状密封件和触头元件

Related Parent Applications (1)

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CN201510837221.9A Division CN105624754B (zh) 2014-11-26 2015-11-26 用于半导体电镀装置的唇状密封件和触头元件

Publications (2)

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CN109137029A CN109137029A (zh) 2019-01-04
CN109137029B true CN109137029B (zh) 2021-01-01

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CN201810986262.8A Active CN109137029B (zh) 2014-11-26 2015-11-26 用于半导体电镀装置的唇状密封件和触头元件
CN201510837221.9A Active CN105624754B (zh) 2014-11-26 2015-11-26 用于半导体电镀装置的唇状密封件和触头元件

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Country Link
JP (1) JP6745103B2 (https=)
KR (3) KR102453908B1 (https=)
CN (2) CN109137029B (https=)
TW (2) TWI681082B (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180251907A1 (en) * 2017-03-01 2018-09-06 Lam Research Corporation Wide lipseal for electroplating
US10612151B2 (en) * 2018-02-28 2020-04-07 Lam Research Corporation Flow assisted dynamic seal for high-convection, continuous-rotation plating
JP6963524B2 (ja) * 2018-03-20 2021-11-10 キオクシア株式会社 電解メッキ装置
JP7471778B2 (ja) * 2019-03-29 2024-04-22 株式会社日本マイクロニクス プローブカード
JP7264780B2 (ja) * 2019-09-10 2023-04-25 株式会社荏原製作所 基板ホルダ及びそれを備えた基板めっき装置、並びに電気接点
CN114502778B (zh) * 2019-10-04 2025-03-18 朗姆研究公司 用于防止唇形密封件镀出的晶片屏蔽
KR20220107012A (ko) * 2019-11-27 2022-08-01 램 리써치 코포레이션 쓰루-레지스트 (through-resist) 도금을 위한 에지 제거
JP7242516B2 (ja) * 2019-12-13 2023-03-20 株式会社荏原製作所 基板ホルダ
US12247310B2 (en) 2020-04-30 2025-03-11 Lam Research Corporation Lipseal edge exclusion engineering to maintain material integrity at wafer edge
CN114645311A (zh) * 2020-12-18 2022-06-21 盛美半导体设备(上海)股份有限公司 基板保持装置的杯形夹盘及基板保持装置
JP7081063B1 (ja) * 2021-10-18 2022-06-06 株式会社荏原製作所 めっき方法及びめっき装置
CN113846363B (zh) * 2021-10-27 2022-09-23 上海戴丰科技有限公司 一种晶圆电镀挂具
CN114351223A (zh) * 2022-01-18 2022-04-15 沈阳超夷微电子设备有限公司 一种晶圆夹持装置及方法
JP7264545B1 (ja) 2022-02-22 2023-04-25 有限会社クズハラゴム 部分メッキ治具
CN114561682A (zh) * 2022-03-18 2022-05-31 厦门大学 电镀夹具以及可垂直挂镀和水平旋转电镀的流水线
CN120866914A (zh) * 2024-04-30 2025-10-31 盛美半导体设备(上海)股份有限公司 晶圆保持装置的夹盘及晶圆保持装置

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6550484B1 (en) * 2001-12-07 2003-04-22 Novellus Systems, Inc. Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing
CN1433487A (zh) * 2000-11-03 2003-07-30 纳托尔公司 在衬底上电沉积具有最小边缘隔绝的均匀薄膜的方法和设备
JP2004068093A (ja) * 2002-08-07 2004-03-04 Electroplating Eng Of Japan Co ウェハーのめっき装置
US6755946B1 (en) * 2001-11-30 2004-06-29 Novellus Systems, Inc. Clamshell apparatus with dynamic uniformity control
US7033465B1 (en) * 2001-11-30 2006-04-25 Novellus Systems, Inc. Clamshell apparatus with crystal shielding and in-situ rinse-dry
CN1973361A (zh) * 2004-04-08 2007-05-30 微米技术有限公司 形成电触点的半导体处理方法和半导体结构
CN101798698A (zh) * 2008-12-10 2010-08-11 诺发系统有限公司 基底板、接触环、唇缘密封件与接触环以及电镀设备和电镀方法
CN102953104A (zh) * 2011-08-15 2013-03-06 诺发系统有限公司 用于半导体电镀设备的唇形密封件和接触元件
CN103031580A (zh) * 2011-09-12 2013-04-10 诺发系统公司 具有杯底部轮廓的镀杯
CN103857834A (zh) * 2011-09-14 2014-06-11 应用材料公司 金属电镀设备中的部件清洁

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7087144B2 (en) 2003-01-31 2006-08-08 Applied Materials, Inc. Contact ring with embedded flexible contacts
US7985325B2 (en) * 2007-10-30 2011-07-26 Novellus Systems, Inc. Closed contact electroplating cup assembly

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1433487A (zh) * 2000-11-03 2003-07-30 纳托尔公司 在衬底上电沉积具有最小边缘隔绝的均匀薄膜的方法和设备
US6755946B1 (en) * 2001-11-30 2004-06-29 Novellus Systems, Inc. Clamshell apparatus with dynamic uniformity control
US7033465B1 (en) * 2001-11-30 2006-04-25 Novellus Systems, Inc. Clamshell apparatus with crystal shielding and in-situ rinse-dry
US6550484B1 (en) * 2001-12-07 2003-04-22 Novellus Systems, Inc. Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing
JP2004068093A (ja) * 2002-08-07 2004-03-04 Electroplating Eng Of Japan Co ウェハーのめっき装置
CN1973361A (zh) * 2004-04-08 2007-05-30 微米技术有限公司 形成电触点的半导体处理方法和半导体结构
CN101798698A (zh) * 2008-12-10 2010-08-11 诺发系统有限公司 基底板、接触环、唇缘密封件与接触环以及电镀设备和电镀方法
CN102953104A (zh) * 2011-08-15 2013-03-06 诺发系统有限公司 用于半导体电镀设备的唇形密封件和接触元件
CN103031580A (zh) * 2011-09-12 2013-04-10 诺发系统公司 具有杯底部轮廓的镀杯
CN103857834A (zh) * 2011-09-14 2014-06-11 应用材料公司 金属电镀设备中的部件清洁

Also Published As

Publication number Publication date
TW201629275A (zh) 2016-08-16
TWI681082B (zh) 2020-01-01
KR20220141268A (ko) 2022-10-19
KR102861606B1 (ko) 2025-09-19
KR20160063252A (ko) 2016-06-03
JP6745103B2 (ja) 2020-08-26
KR102641458B1 (ko) 2024-02-28
TW202010881A (zh) 2020-03-16
CN109137029A (zh) 2019-01-04
CN105624754B (zh) 2019-06-11
JP2016135912A (ja) 2016-07-28
TWI702311B (zh) 2020-08-21
CN105624754A (zh) 2016-06-01
KR102453908B1 (ko) 2022-10-11
KR20240029754A (ko) 2024-03-06

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