CN109130549B - 气体封闭系统和利用辅助封闭装置的方法 - Google Patents

气体封闭系统和利用辅助封闭装置的方法 Download PDF

Info

Publication number
CN109130549B
CN109130549B CN201811010130.8A CN201811010130A CN109130549B CN 109130549 B CN109130549 B CN 109130549B CN 201811010130 A CN201811010130 A CN 201811010130A CN 109130549 B CN109130549 B CN 109130549B
Authority
CN
China
Prior art keywords
enclosure
assembly
printing system
printhead
auxiliary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201811010130.8A
Other languages
English (en)
Chinese (zh)
Other versions
CN109130549A (zh
Inventor
J.莫克
A.S-K.高
E.弗龙斯基
S.阿尔德森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kedihua Display Technology Shaoxing Co ltd
Original Assignee
Codiva
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/802,304 external-priority patent/US9048344B2/en
Application filed by Codiva filed Critical Codiva
Publication of CN109130549A publication Critical patent/CN109130549A/zh
Application granted granted Critical
Publication of CN109130549B publication Critical patent/CN109130549B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/17Ink jet characterised by ink handling
    • B41J2/175Ink supply systems ; Circuit parts therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/02Framework
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/12Guards, shields or dust excluders
    • B41J29/13Cases or covers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/54Providing fillings in containers, e.g. gas fillings

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electroluminescent Light Sources (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Facsimiles In General (AREA)
CN201811010130.8A 2013-03-13 2014-03-11 气体封闭系统和利用辅助封闭装置的方法 Active CN109130549B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/802,304 US9048344B2 (en) 2008-06-13 2013-03-13 Gas enclosure assembly and system
US13/802304 2013-03-13
CN201480027671.5A CN105190860B (zh) 2013-03-13 2014-03-11 气体封闭系统和利用辅助封闭装置的方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201480027671.5A Division CN105190860B (zh) 2013-03-13 2014-03-11 气体封闭系统和利用辅助封闭装置的方法

Publications (2)

Publication Number Publication Date
CN109130549A CN109130549A (zh) 2019-01-04
CN109130549B true CN109130549B (zh) 2021-02-26

Family

ID=51659308

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201811010130.8A Active CN109130549B (zh) 2013-03-13 2014-03-11 气体封闭系统和利用辅助封闭装置的方法
CN201480027671.5A Active CN105190860B (zh) 2013-03-13 2014-03-11 气体封闭系统和利用辅助封闭装置的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201480027671.5A Active CN105190860B (zh) 2013-03-13 2014-03-11 气体封闭系统和利用辅助封闭装置的方法

Country Status (5)

Country Link
EP (2) EP3474317B1 (enExample)
JP (5) JP6349382B2 (enExample)
KR (6) KR20220162809A (enExample)
CN (2) CN109130549B (enExample)
WO (1) WO2014164932A2 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8383202B2 (en) 2008-06-13 2013-02-26 Kateeva, Inc. Method and apparatus for load-locked printing
US10442226B2 (en) 2008-06-13 2019-10-15 Kateeva, Inc. Gas enclosure assembly and system
US8899171B2 (en) 2008-06-13 2014-12-02 Kateeva, Inc. Gas enclosure assembly and system
US12064979B2 (en) 2008-06-13 2024-08-20 Kateeva, Inc. Low-particle gas enclosure systems and methods
US9048344B2 (en) 2008-06-13 2015-06-02 Kateeva, Inc. Gas enclosure assembly and system
US11975546B2 (en) 2008-06-13 2024-05-07 Kateeva, Inc. Gas enclosure assembly and system
US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US9604245B2 (en) 2008-06-13 2017-03-28 Kateeva, Inc. Gas enclosure systems and methods utilizing an auxiliary enclosure
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
KR20220162809A (ko) * 2013-03-13 2022-12-08 카티바, 인크. 가스 인클로저 시스템 및 보조 인클로저를 이용하는 방법
KR20190014589A (ko) * 2013-06-10 2019-02-12 카티바, 인크. 저-입자 가스 인클로저 시스템 및 방법
US10468279B2 (en) 2013-12-26 2019-11-05 Kateeva, Inc. Apparatus and techniques for thermal treatment of electronic devices
WO2015112454A1 (en) 2014-01-21 2015-07-30 Kateeva, Inc. Apparatus and techniques for electronic device encapsulation
WO2015168036A1 (en) 2014-04-30 2015-11-05 Kateeva, Inc. Gas cushion apparatus and techniques for substrate coating
CN106489212B (zh) * 2014-07-18 2019-07-12 科迪华公司 利用多区域循环及过滤的气体封闭系统和方法
KR102068882B1 (ko) 2014-11-26 2020-01-21 카티바, 인크. 환경적으로 제어되는 코팅 시스템
JP6254108B2 (ja) * 2015-01-07 2017-12-27 住友化学株式会社 有機elパネルの製造方法
FR3055108A1 (fr) 2016-08-16 2018-02-23 Dover Europe Sarl Procede et dispositif de filtrage de l'atmosphere recyclee d'une tete d'impression
JP6544658B2 (ja) * 2017-02-17 2019-07-17 株式会社ウエイト東海 載置物の転倒防止装置
JP7178937B2 (ja) * 2019-03-20 2022-11-28 ローランドディー.ジー.株式会社 プリンタ
CN111038108B (zh) * 2019-12-10 2021-11-23 Tcl华星光电技术有限公司 喷墨打印用墨盒的存储装置及其存储方法
JP7555022B2 (ja) * 2020-05-19 2024-09-24 パナソニックIpマネジメント株式会社 インクジェット印刷装置
CN112319045B (zh) * 2020-09-10 2022-05-31 季华实验室 一种玻璃基板的加工方法和喷墨打印设备
KR102473786B1 (ko) * 2021-01-07 2022-12-06 (주)유니젯 인클로저 시스템
CN115871332B (zh) * 2021-09-28 2025-10-31 广东聚华印刷显示技术有限公司 一种喷墨打印装置、喷墨打印方法及喷墨打印系统
CN114103454B (zh) * 2021-11-22 2023-01-10 Tcl华星光电技术有限公司 喷墨打印系统及喷头维护方法
CN118181360B (zh) * 2024-05-15 2024-07-16 成都德力斯实业有限公司 一种在役核手套箱及其改造方法

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5029518A (en) * 1989-10-16 1991-07-09 Clean Air Technology, Inc. Modular clean room structure
US5651625A (en) * 1995-04-10 1997-07-29 Security Operating Systems, Inc. Printer enclosure and controller unit
US6089282A (en) * 1998-05-08 2000-07-18 Aeronex, Inc. Method for recovery and reuse of gas
US6023899A (en) * 1998-11-03 2000-02-15 Climatecraft Technologies, Inc. Wall panel assembly with airtight joint
JP4827294B2 (ja) * 1999-11-29 2011-11-30 株式会社半導体エネルギー研究所 成膜装置及び発光装置の作製方法
US6375304B1 (en) * 2000-02-17 2002-04-23 Lexmark International, Inc. Maintenance mist control
JP3868280B2 (ja) * 2001-12-04 2007-01-17 株式会社美和製作所 有機電界発光素子の製造装置
TWI222423B (en) * 2001-12-27 2004-10-21 Orbotech Ltd System and methods for conveying and transporting levitated articles
JP4008387B2 (ja) * 2002-08-02 2007-11-14 セイコーエプソン株式会社 液滴吐出装置、電気光学装置の製造方法、電気光学装置および電子機器
JP2004146369A (ja) * 2002-09-20 2004-05-20 Semiconductor Energy Lab Co Ltd 製造装置および発光装置の作製方法
US20040123804A1 (en) * 2002-09-20 2004-07-01 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
KR100505061B1 (ko) * 2003-02-12 2005-08-01 삼성전자주식회사 기판 이송 모듈
JP2004247111A (ja) * 2003-02-12 2004-09-02 Seiko Epson Corp 長尺体配設構造、液滴吐出装置、電気光学装置、電気光学装置の製造方法および電子機器
TWI225008B (en) * 2003-12-31 2004-12-11 Ritdisplay Corp Ink-jet printing apparatus
JP2005218899A (ja) * 2004-02-03 2005-08-18 Toshiba Corp 塗布装置及びこれを備えた表示装置製造装置
US7354845B2 (en) * 2004-08-24 2008-04-08 Otb Group B.V. In-line process for making thin film electronic devices
JP2006120382A (ja) * 2004-10-20 2006-05-11 Seiko Epson Corp 有機el装置の製造装置及び方法、並びに電気光学装置及び電子機器
US7908885B2 (en) * 2004-11-08 2011-03-22 New Way Machine Components, Inc. Non-contact porous air bearing and glass flattening device
CN101243543A (zh) * 2005-07-13 2008-08-13 富士胶片迪麦提克斯公司 流体沉积组合设备工具
US20070026151A1 (en) 2005-07-13 2007-02-01 Higginson John A Fluid Deposition Cluster Tool
JP2007253043A (ja) * 2006-03-22 2007-10-04 Toshiba Corp 液滴噴射装置及び塗布体の製造方法
JP2008047340A (ja) * 2006-08-11 2008-02-28 Dainippon Printing Co Ltd 有機エレクトロルミネッセンス素子
US7690881B2 (en) * 2006-08-30 2010-04-06 Asm Japan K.K. Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus
WO2008069259A1 (en) * 2006-12-05 2008-06-12 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus, film formation method, manufacturing apparatus, and method for manufacturing light-emitting device
US20080206036A1 (en) * 2007-02-27 2008-08-28 Smith John M Magnetic media processing tool with storage bays and multi-axis robot arms
JP2008246435A (ja) * 2007-03-30 2008-10-16 Shibaura Mechatronics Corp 溶液の塗布方法及び装置
KR101139737B1 (ko) * 2007-05-16 2012-04-26 가부시키가이샤 알박 유기 el 장치의 제조 방법
KR101715089B1 (ko) * 2007-05-18 2017-03-10 무사시 엔지니어링 가부시키가이샤 액체 재료 토출 방법 및 장치
WO2008157395A1 (en) * 2007-06-14 2008-12-24 Massachusetts Institute Of Technology Method and apparatus for depositing films
JP4600483B2 (ja) * 2008-01-28 2010-12-15 セイコーエプソン株式会社 液滴吐出装置、吐出方法、カラーフィルタの製造方法、有機el装置の製造方法
US8383202B2 (en) * 2008-06-13 2013-02-26 Kateeva, Inc. Method and apparatus for load-locked printing
JP2010211045A (ja) * 2009-03-11 2010-09-24 Seiko Epson Corp 圧力調整弁およびこれを備えた液滴吐出装置
JP2010267399A (ja) * 2009-05-12 2010-11-25 Panasonic Corp 塗布装置
JP2011088101A (ja) 2009-10-26 2011-05-06 Seiko Epson Corp 液滴吐出装置
WO2011118652A1 (ja) * 2010-03-26 2011-09-29 シャープ株式会社 成膜装置および成膜方法
US20110318503A1 (en) * 2010-06-29 2011-12-29 Christian Adams Plasma enhanced materials deposition system
US20130004656A1 (en) * 2011-07-01 2013-01-03 Kateeva, Inc. Apparatus and method to separate carrier liquid vapor from ink
US9120344B2 (en) * 2011-08-09 2015-09-01 Kateeva, Inc. Apparatus and method for control of print gap
CN106299116B (zh) * 2011-08-09 2019-07-12 科迪华公司 面向下的打印设备和方法
KR20220162809A (ko) * 2013-03-13 2022-12-08 카티바, 인크. 가스 인클로저 시스템 및 보조 인클로저를 이용하는 방법
CN104704605B (zh) * 2013-10-02 2017-08-29 科迪华公司 用于控制打印间隙的设备和方法
CN103832094B (zh) * 2014-02-24 2016-07-06 苏州志东岚自动化设备有限公司 标牌激光打标自动送料机

Also Published As

Publication number Publication date
EP2973676A4 (en) 2017-07-19
WO2014164932A2 (en) 2014-10-09
KR20180107319A (ko) 2018-10-01
JP2021035678A (ja) 2021-03-04
JP2019091702A (ja) 2019-06-13
CN105190860A (zh) 2015-12-23
CN105190860B (zh) 2018-09-21
JP6349382B2 (ja) 2018-06-27
WO2014164932A3 (en) 2015-02-26
KR102098613B1 (ko) 2020-04-08
CN109130549A (zh) 2019-01-04
EP3474317B1 (en) 2022-06-22
JP2016518675A (ja) 2016-06-23
KR20150131111A (ko) 2015-11-24
JP7177521B2 (ja) 2022-11-24
KR102851236B1 (ko) 2025-08-26
JP6831046B2 (ja) 2021-02-17
KR101903226B1 (ko) 2018-10-01
KR102267858B1 (ko) 2021-06-22
EP3474317A1 (en) 2019-04-24
EP2973676B1 (en) 2018-11-28
JP7454878B2 (ja) 2024-03-25
EP2973676A2 (en) 2016-01-20
JP6463827B2 (ja) 2019-02-06
KR20220162809A (ko) 2022-12-08
KR20200038326A (ko) 2020-04-10
KR102470120B1 (ko) 2022-11-22
KR20240146089A (ko) 2024-10-07
KR20210077007A (ko) 2021-06-24
JP2018041744A (ja) 2018-03-15
JP2023010755A (ja) 2023-01-20

Similar Documents

Publication Publication Date Title
CN109130549B (zh) 气体封闭系统和利用辅助封闭装置的方法
US10500880B2 (en) Gas enclosure systems and methods utilizing an auxiliary enclosure
CN203854316U (zh) 气体封闭组件和系统的组合
CN107848309A (zh) 墨输送系统和方法
TWI783701B (zh) 用於列印之系統

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20220726

Address after: Room 402, 4th floor, building 1, No. 326, Yinqiao Road, Gaobu street, Yuecheng District, Shaoxing City, Zhejiang Province

Patentee after: Kedihua display technology (Shaoxing) Co.,Ltd.

Address before: California, USA

Patentee before: KATEEVA, Inc.

TR01 Transfer of patent right
PE01 Entry into force of the registration of the contract for pledge of patent right

Denomination of invention: Gas Closed system and method of using auxiliary closed device

Effective date of registration: 20230625

Granted publication date: 20210226

Pledgee: Xinji Co.,Ltd.

Pledgor: Kedihua display technology (Shaoxing) Co.,Ltd.

Registration number: Y2023990000312

PE01 Entry into force of the registration of the contract for pledge of patent right