CN109101136B - 显示面板及显示装置 - Google Patents
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Abstract
本发明提出了一种显示面板及显示装置,本发明通过在一道光罩工艺同时形成第一触控感应电极线以及像素电极,所述第一触控感应电极线与所述第二公共电极同层设置,节省了光罩,有效的降低了面板阵列制造过程中的周期,节省了制作成本。
Description
技术领域
本发明涉及显示领域,特别涉及一种显示面板及显示装置。
背景技术
触控技术作为智能化的一个重要指标,应用范围越来越广。触控技术经过快速的发展,按照触控原理可分为压阻式、光学式、电容式等,其中电容式触控技术经过多代的发展,应用最为广泛。电容式触控技术大致可分为外挂式触控(Add-on Touch)、外嵌式触控(On-cell Touch)、及内嵌式(In-cell Touch)。
如今,内嵌式触控显示面板越来越多地应用到手机等电子显示设备。内嵌式触控显示面板将触控与显示功能集成在一起,将触控传感器(Touch Sensor)制作在阵列基板(Thin Film Transistor Array Substrate,TFT Array Substrate)(通常称为TFT阵列基板)与彩色滤光片基板(Color Filter,CF)之间,在保证触控灵敏度的同时,可以使触控显示产品更轻薄、光学显示性能更好,同时可以将显示和触控的驱动电路整合到一颗芯片,量产后可实现低成本效益。
在LTPS产品结构中,ITP(In Cell Touch Panel,内嵌式触控面板)结构相较非ITP,只需增加两层膜层结构,即触控感应电极和触控绝缘层;但是,LTPS的工艺复杂,在阵列工艺中,基板阵列成膜的的层别较多,一般需要10层及以上的膜层结构;较多的光罩数量,导致产品制作产能时间增长,增加了光照成本以及运营成本。
因此,本发明基于此技术问题,而提出了一新型的结构。
发明内容
本发明提供一种显示面板及显示装置,以解决阵列基板工艺复杂的技术问题。
为解决上述问题,本发明提供的技术方案如下:
本发明提供一种显示面板,包括阵列基板,所述阵列基板包括:
基板;
位于所述基板上的薄膜晶体管层;
位于所述薄膜晶体管层上的平坦层;
位于所述平坦层上的第一公共电极;
位于所述第一公共电极上的钝化层;
位于所述钝化层上的第二公共电极;以及
与所述第二公共电极同层设置的第一触控电极线,所述第一触控电极线通过第一过孔与部分所述第一公共电极电连接。
在本发明的显示面板在本发明的显示面板,所述第一触控感应电极线与所述第二公共电极由同一金属层通过同一光罩工艺制成。
在本发明的显示面板,所述阵列基板还包括第二过孔,部分所述第二公共电极通过所述第二过孔与所述薄膜晶体管层中的源漏极电连接。
在本发明的显示面板,所述第一过孔贯穿部分所述钝化层,所述第二过孔贯穿所述钝化层以及部分所述平坦层。
在本发明的显示面板,所述阵列基板还包括第二触控电极线,形成于所述第一触控感应电极线上,所述第二触控感应电极线通过所述第一触控感应电极线与部分所述第一公共电极电连接。
在本发明的显示面板,所述第二触控感应电极线在所述第一触控感应电极线上的正投影,位于所述第一触控感应电极线内。
在本发明的显示面板,所述第二触控电极线与所述第一触控电极线通过同一道光罩工艺制成。
在本发明的显示面板,所述阵列基板还包括第三过孔,所述第三过孔位于所述显示面板的非显示区域;位于所述非显示区域的所述第一触控感应电极线通过所述第三过孔,与位于所述非显示区域的源漏极电连接。
在本发明的显示面板,所述第三过孔贯穿所述钝化层以及部分所述平坦层。
本发明还提出了一种显示面板,其中,所述显示面板包括上述的阵列基板。
有益效果:本发明通过在一道光罩工艺同时形成第一触控感应电极线以及像素电极,所述第一触控感应电极线与所述第二公共电极同层设置,节省了光罩,有效的降低了面板阵列制造过程中的周期,节省了制作成本。
附图说明
为了更清楚地说明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单介绍,显而易见地,下面描述中的附图仅仅是发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例一阵列基板的膜层结构图;
图2为本发明实施例一触控层的俯视图;
图3为图2中C点的剖面图;
图4为图2中D点的剖面图;
图5为本发明实施例二阵列基板的膜层结构图。
具体实施方式
以下各实施例的说明是参考附加的图示,用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语,例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本发明,而非用以限制本发明。在图中,结构相似的单元是用以相同标号表示。
实施例一
本发明提供一种显示面板,包括阵列基板,所述阵列基板包括基板101、位于所述基板101上的薄膜晶体管层、位于所述薄膜晶体管层上的平坦层109、位于所述平坦层109上的第一公共电极110、位于所述第一公共电极110上的钝化层111、位于所述钝化层111上的第二公共电极112以及多条第一触控感应电极线。
图1所示为本发明优选实施例一一种阵列基板的膜层结构图,其中,区域A为显示区域,区域B为非显示区域;所述薄膜晶体管层包括遮光层102、缓冲层103、硅沟道层104、第一绝缘层104、栅极106、第二绝缘层107、源漏极108以及若干过孔。
本实施例中,所述基板101的原材料可以为玻璃基板、石英基板、树脂基板等中的一种。
所述遮光层102形成于所述基板101上,所述遮光层102可以为单不限定于黑色遮光材料。
所述缓冲层103形成于所述遮光层102上,所述缓冲层覆盖所述遮光层。
所述硅沟道层104形成于所述缓冲层103上,所述硅沟道层104由多晶硅构成,所述硅沟道层104包括经离子掺杂的轻掺杂区域1041和重掺杂区域1042,所述重掺杂区域1042位于所述硅沟道层104的两侧,所述轻掺杂区域1041位于未进行离子掺杂的所述硅沟道层104和所述重掺杂区域1042之间;其中,所述重掺杂区域1042注入有高浓度N+离子,所述轻掺杂区域1041注入有低浓度N-离子。
所述第一绝缘层105形成于所述硅沟道层104上,述第一绝缘层105为栅绝缘层,所述栅绝缘层将所述硅沟道层104覆盖,所述栅绝缘层主要用于将所述硅沟道层104与其他金属层隔离;优选的,所述栅绝缘层的材料通常为氮化硅,也可以使用氧化硅和氮氧化硅等。
所述栅极106形成于所述第一绝缘层105上,所述栅极106的金属材料通常可以采用钼、铝、铝镍合金、钼钨合金、铬、或铜等金属,也可以使用上述几种金属材料的组合物,优选的,本实施例中所述栅极的金属材料为钼;
通过对形成所述栅极106的一金属层使用第一光罩制程工艺,在该金属层上形成一光阻层,经掩模板(未画出)曝光,显影以及蚀刻的构图工艺处理后,使该金属层形成如图1所示的所述阵列基板的栅极106,并剥离该光阻层。
所述第二绝缘层107形成于所述栅极106上,所述第二绝缘层107为间绝缘层,所述间绝缘层将所述栅极106覆盖,所述间绝缘层主要用于将所述栅极106和所述源漏极108隔离。
所述源漏极108形成于所述第二绝缘层107上,所述源漏极108的金属材料通常可以采用钼、铝、铝镍合金、钼钨合金、铬、铜或钛铝合金等金属,也可以使用上述几种金属材料的组合物,优选的,所述源漏极108的金属材料为钛铝合金;
通过对形成所述源漏极108的一金属层使用第二光罩制程工艺,在该金属层上形成一光阻层,经掩模板(未画出)曝光,显影以及蚀刻的构图工艺处理后,使该金属层形成如图1所示的所述阵列基板的源漏极108,并剥离该光阻层。
所述平坦层109形成于所述源漏极108上,所述平坦层109覆盖所述源漏极108,主要用于保证膜层结构的平整性。
所述第一公共电极110形成于所述平坦层109上,如图2所示,所述第一公共电极110包括成阵列分布公共电极板1101,又可作为触控电极,每一所述公共电极板1101与至少一条所述第一触控感应电极线113对应;当显示面板处于显示状态时,所述第一公共电极110的所述公共电极板1101和像素电极层用于驱动液晶。
所述钝化层111形成于所述第一公共电极110上,用于保证膜层结构的平整性;优选的,本实施例中,优选的,所述钝化层111材料通常为氮化矽化合物。
所述第二公共电极112形成于所述钝化层111上,所述第二公共电极112又可称为像素电极,所述第一公共电极110与所述第二公共电极112提供液晶分子偏转所的电压。
另外,阵列基板还包括第一触控感应电极线113,所述第一触控感应电极线113形成于所述钝化层111上,与所述第二公共电极112同层设置;可以理解的,所述第一触控感应电极线113与所述第二公共电极112由同一金属层,通过同一道光罩工艺形成;并且,所述第一触控感应电极线113通过第一过孔114与部分所述第一公共电极110电连接。
如图1所示,所述阵列基板还包括第二过孔116,部分所述第二公共电极112通过所述第二过孔116与所述薄膜晶体管层中的源漏极电连接;所述第一过孔114贯穿部分所述钝化层111,所述第二过孔116贯穿所述钝化层111以及部分所述平坦层109。
图3所示为图2中C点的剖面图,所述第一触控感应电极线113形成于所述钝化层111上,与所述第一公共电极110并列设置;图4所示为图2中D点的剖面图,所述第一触控感应电极线113通过所述第一过孔114与所述第一公共电极110连接。
如图1所示,所述阵列基板还包括第三过孔115,所述第三过孔115位于所述显示面板的非显示区域;位于所述非显示区域的所述第一触控感应电极线113通过所述第三过孔115,与位于所述非显示区域的源漏极107电连接。
相比现有技术,本发明通过同一金属层,同时形成所述第一触控感应电极线113与像素电极,节省了形成第一触控感应电极线113、以及第一触控感应电极线113与第二公共电极112之间的绝缘层两道光罩工艺,有效的降低了面板阵列制造过程中的周期,节省了制作成本。
实施例二
图5所示为本发明优选实施例二一种阵列基板的膜层结构图,所述阵列基板还包括第二触控感应电极线217,所述第二触控感应电极线217形成于所述第一触控感应电极线213上;所述第二触控感应电极线217通过所述第一触控感应电极线213与部分所述第一公共电极210电连接。
优选的,在光罩工艺制程中,所述第一触控感应电极线213与所述第二触控感应电极线217通过一道光罩制程工艺形成;可以理解的,由于所述第一触控感应电极线213与所述第二公共电极212通过同一道光罩工艺形成;因此本实施例中,所述第一触控感应电极线213、所述第二触控感应电极线217以及所述第二公共电极212均由同一道光罩工艺形成;
本实施例中,所述第二触控感应电极线217在所述第一触控感应电极线213上的正投影位于所述第一触控感应电极线213内。
本实施例通过在所述第一触控感应电极线213上形成所述第二触控感应电极线217,两层金属的并列搭接,降低触控感应电极线的阻抗,增加所述显示面板的触控灵敏度。
本发明还提出了一种显示装置,其中,所述显示装置包括上述的显示面板。
本发明提出了一种显示面板及显示装置,本发明通过在一道光罩工艺同时形成第一触控感应电极线以及像素电极,所述第一触控感应电极线与所述第二公共电极同层设置,节省了光罩,有效的降低了面板阵列制造过程中的周期,节省了制作成本。
综上所述,虽然本发明已以优选实施例揭露如上,但上述优选实施例并非用以限制本发明,本领域的普通技术人员,在不脱离本发明的精神和范围内,均可作各种更动与润饰,因此本发明的保护范围以权利要求界定的范围为准。
Claims (6)
1.一种显示面板,包括阵列基板,其特征在于,所述阵列基板包括:
基板;
位于所述基板上的薄膜晶体管层;
位于所述薄膜晶体管层上的平坦层;
位于所述平坦层上的第一公共电极;
位于所述第一公共电极上的钝化层;
位于所述钝化层上的第二公共电极;以及
与所述第二公共电极同层设置的第一触控感应电极线,所述第一触控感应电极线通过第一过孔与部分所述第一公共电极电连接;
所述阵列基板还包括第二触控感应电极线,形成于所述第一触控感应电极线上,所述第二触控感应电极线通过所述第一触控感应电极线与部分所述第一公共电极电连接,所述第二触控感应电极线在所述第一触控感应电极线上的正投影位于所述第一触控感应电极线内;
其中,所述第一触控感应电极线与所述第二公共电极由同一金属层构成,所述第二公共电极、所述第二触控感应电极线以及所述第一触控感应电极线通过同一道光罩工艺制成。
2.根据权利要求1所述的显示面板,其特征在于,所述阵列基板还包括第二过孔,部分所述第二公共电极通过所述第二过孔与所述薄膜晶体管层中的源漏极电连接。
3.根据权利要求2所述的显示面板,其特征在于,所述第一过孔贯穿部分所述钝化层,所述第二过孔贯穿所述钝化层以及部分所述平坦层。
4.根据权利要求1所述的显示面板,其特征在于,所述阵列基板还包括第三过孔,所述第三过孔位于所述显示面板的非显示区域;位于所述非显示区域的所述第一触控感应电极线通过所述第三过孔,与位于所述非显示区域的源漏极电连接。
5.根据权利要求4所述的显示面板,其特征在于,所述第三过孔贯穿所述钝化层以及部分所述平坦层。
6.一种显示装置,其特征在于,所述显示装置包括权利要求1至5任一项所述的显示面板。
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