CN108955516B - Nanometer measuring instrument based on synchronous phase-shifting interference technology - Google Patents
Nanometer measuring instrument based on synchronous phase-shifting interference technology Download PDFInfo
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- CN108955516B CN108955516B CN201810899243.1A CN201810899243A CN108955516B CN 108955516 B CN108955516 B CN 108955516B CN 201810899243 A CN201810899243 A CN 201810899243A CN 108955516 B CN108955516 B CN 108955516B
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- 230000001360 synchronised effect Effects 0.000 title claims abstract description 24
- 238000005516 engineering process Methods 0.000 title abstract description 11
- 230000010287 polarization Effects 0.000 claims abstract description 39
- 230000001427 coherent effect Effects 0.000 claims abstract description 15
- 239000004065 semiconductor Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 13
- 230000010363 phase shift Effects 0.000 claims description 6
- 238000005305 interferometry Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 230000008859 change Effects 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims 1
- 238000005259 measurement Methods 0.000 abstract description 11
- 230000008569 process Effects 0.000 description 8
- 238000003754 machining Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000003908 quality control method Methods 0.000 description 2
- 238000004441 surface measurement Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000275 quality assurance Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention discloses a nanometer measuring instrument based on synchronous phase-shifting interference technology, which comprises a coherent light source and a polarization delay system and a synchronous phase-shifting system, wherein the coherent light source and the polarization delay system 1 comprise a semiconductor laser and 1/2Wave plate, first 1/4Wave plate, first total reflection mirror, second 1/4The synchronous phase shifting system comprises a reflecting mirror, a first diaphragm, a first lens and a third 1/4The device comprises a wave plate, a second lens, a second diaphragm, a polaroid set, a third lens, a CCD, a data acquisition card, a computer and a two-dimensional orthogonal holographic grating, wherein 1/2 of the device is arranged between a laser and a polarization beam splitter prismA first 1/4 of that is respectively arranged between the wave plate, the polarization beam splitter prism and the first total reflection mirror and between the polarization beam splitter prism and the second total reflection mirrorWave plate and second 1/4A wave plate. The invention can effectively solve the problem of influence of vibration on the measurement result, has super anti-interference capability, and can realize high-precision measurement.
Description
Technical Field
The invention relates to the technical field of interferometers, in particular to a nano measuring instrument based on synchronous phase-shifting interference technology.
Background
With the rapid development of high and new technologies such as microelectronics technology, ultra-precision machining technology and the like, a larger range and higher precision measurement requirement is provided for a corresponding nanometer measuring instrument.
The quality of the surface finish is usually ensured by precision manufacturing equipment and suitable manufacturing processes, provided that the manufacturing system must have good stability and reliability. However, in high precision machining, the quality of the surface finish is highly susceptible to the static, dynamic and thermodynamic operating conditions of the manufacturing system and its units. In order to ensure the surface quality, the existing high-precision surface machining (such as single-point machining of surface precision grinding diamond and the like) has to adopt frequent offline detection of the machined surface so as to facilitate the process adjustment or compensation which may be required, so that the quality control mode reduces the reliability of the process adjustment and compensation because the process continuity, the consistency of the machining environment and the state are damaged in the process of offline detection and repositioning of the machined surface, simultaneously reduces the efficiency, the online measurement of the surface can maintain the process continuity, the consistency of the machining environment and the state before and after the measurement is maintained, thereby ensuring the reliable basis of the process adjustment and the quality control obtained by the surface detection, realizing more reliable quality assurance and improving the machining efficiency, and thus receiving high importance,
however, the existing precise surface measurement methods, such as the laser wavefront interferometry method, are extremely sensitive to the external environment, are easily limited by vibration interference in an online environment, and are difficult to be used for online measurement, so that the online precise surface measurement is a difficult problem in the field of high-precision manufacturing.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides a nano measuring instrument based on a synchronous phase-shifting interference technology, which solves the problems that the prior art is easy to be limited by vibration interference in an online environment and is difficult to be used for online measurement.
In order to achieve the above purpose, the present invention provides the following technical solutions: the nanometer measuring instrument based on the synchronous phase-shifting interference technology comprises a coherent light source, a polarization delay system and a synchronous phase-shifting system, wherein the coherent light source and the polarization delay system comprise a semiconductor laser, a 1/2 lambda wave plate, a first 1/4 lambda wave plate, a first total reflection mirror, a second 1/4 lambda wave plate, a second total reflection mirror, a polarization beam splitter prism and a one-dimensional guide rail, the synchronous phase-shifting system comprises a reflecting mirror, a first diaphragm, a first lens, a third 1/4 lambda wave plate, a second lens, a second diaphragm, a polaroid set, a third lens, a CCD (charge coupled device), a data acquisition card, a computer and a two-dimensional orthogonal holographic grating, a 1/2 lambda wave plate is arranged between the laser and the polarization beam splitter prism, a first 1/4 lambda wave plate and a second 1/4 lambda wave plate are respectively arranged between the polarization beam splitter prism and the first total reflection mirror and the second total reflection mirror, and a third 1/4 lambda and two-dimensional orthogonal holographic grating is respectively arranged between the first lens and the second lens.
Preferably, the polarizer group is composed of four polarizers of different polarization directions.
Preferably, a second diaphragm and a polarizer group are provided between the second lens and the third lens.
Preferably, the laser is a semiconductor laser.
The invention provides a nanometer measuring instrument based on a synchronous phase-shifting interference technology, which has the following beneficial effects:
the interference patterns with certain phase shift step length are acquired at different spatial positions at the same time by arranging the coherent light source, the polarization delay system and the synchronous phase shift system, and because the influence of vibration on the interference patterns at the same time is the same, if high-speed and high-resolution image acquisition equipment is adopted, the influence of environmental vibration and air disturbance on a measurement result can be fundamentally avoided based on the rule of subtraction and division in a common phase shift algorithm, so that the interference pattern measuring device can effectively solve the problem of influence of vibration on the measurement result, has super-strong anti-interference capability and can realize high-precision measurement.
Drawings
FIG. 1 is a composition diagram of the present invention;
fig. 2 is a schematic diagram of the operation of the present invention.
In the figure: 1. a coherent light source and a polarization delay system; 2. a synchronous phase shifting system; 3. a laser; 4. a 1/2 lambda plate; 5. a first 1/4 lambda plate; 6. a first total reflection mirror; 7. a second 1/4 lambda plate; 8. a second total reflection mirror; 9. a polarization beam splitter prism; 10. a reflecting mirror; 11. a first diaphragm; 12. a first lens; 13. a third 1/4 lambda plate; 14. a second lens; 15. a second diaphragm; 16. a polarizer group; 17. a third lens; 18. a CCD; 19. a data acquisition card; 20. a computer; 21. a one-dimensional guide rail; 22. two-dimensional orthogonal holographic gratings.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
As shown in fig. 1-2, the present invention provides a technical solution: the nanometer measuring instrument based on synchronous phase-shifting interference technology comprises a coherent light source and polarization delay system 1 and a synchronous phase-shifting system 2, wherein the coherent light source and polarization delay system 1 comprises a semiconductor laser 3, a 1/2 lambda wave plate 4, a first 1/4 lambda wave plate 5, a first total reflection mirror 6, a second 1/4 lambda wave plate 7, a second total reflection mirror 8, a polarization beam splitter prism 9 and a one-dimensional guide rail 21, the synchronous phase-shifting system 2 comprises a reflecting mirror 10, a first diaphragm 11, a first lens 12, a third 1/4 lambda wave plate 13, a second lens 14, a second diaphragm 15, a polaroid group 16, a third lens 17, a CCD18, a data acquisition card 19, a computer 20 and a quadrature holographic grating 22, the 1/2 lambda wave plate 4 is arranged between the laser 3 and the polarization beam splitter prism 9, the first 1/4 lambda wave plate 5 and the second 1/4 lambda wave plate 7 are respectively arranged between the polarization beam splitter prism 9 and the first total reflection mirror 6 and between the second total reflection mirror 8, the third 1/4 lambda wave plate 13 and the two-dimensional orthogonal holographic grating 22 are respectively arranged between the first lens 12 and the second lens 14, the polarizing plate group 16 is composed of polarizing plates with four different polarization directions, the second diaphragm 15 and the polarizing plate group 16 are arranged between the second lens 14 and the third lens 17, the laser 3 is a semiconductor laser, three sides of the polarization beam splitter prism 9 are respectively provided with the laser 3, the first total reflection mirror 6 and the second total reflection mirror 8, and the laser 3, the first total reflection mirror 6 and the second total reflection mirror 8 are arranged on the same optical axis.
When in use, the coherent light source and the polarization delay system 1 takes linearly polarized light emitted by the laser 3 as a light source, and the light source is emitted into the polarization beam splitter prism 9 through the 1/2 lambda plate 4 and is split into two mutually perpendicular transmission light I 1 And reflected light I 2，， In which light I is transmitted 1 First, the first light is changed into a beam of circularly polarized light I through a second 1/4 lambda wave plate 7 11 Then the first total reflection mirror 6 fixed on the one-dimensional guide rail 21 reflects the light back to the second 1/4 lambda wave plate 7 to be changed into linearly polarized light; reflected light I 2 First, the first 1/4 lambda wave plate 5 is changed into a beam of circularly polarized light I 21 Then the light is reflected back to the first 1/4 lambda wave plate 5 through the first total reflection mirror 6 and is changed into linearly polarized light, I 11 、I 21 All pass through the polarization beam splitter prism 9 again to synthesize a beam of light I 3 . The one-dimensional guide rail 21 is moved to change the L optical path difference when passing through the second total reflecting mirror 8, the synchronous phase shifting system 2 filters stray light by a first diaphragm 11 through a reflecting mirror 10 and I is filtered by a first lens 12 on the basis of a coherent light source and a polarization delay system 1 3 The beam is expanded, changed into two beams of circularly polarized light through a third 1/4 lambda wave plate 13, and then the two beams of circularly polarized light are subjected to diffraction phenomenon through a two-dimensional orthogonal holographic grating 22, focused through a second lens 14, and other diffracted light is filtered through a second diaphragm 15, so that only four beams I are needed 311 、I 312 、I 321 、I 322 The four light beams are passed through a special polarizer group 16 so that their polarization angles are 0 °, 45 °, 90 °, and 135 °, respectively. The third lens 17 is used for focusing, two interference pairs are used for forming four interference patterns, the four interference patterns are received by the CCD18 at the same time, the data acquisition card 19 acquires information, and the information is calculated by a labview program on the computer 20.
In summary, the invention solves the problems that the prior art is easy to be limited by vibration interference in an online environment and is difficult to be used for online measurement by arranging the coherent light source, the polarization delay system 1 and the synchronous phase shifting system 2.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (3)
1. The utility model provides a nanometer measuring apparatu based on synchronous phase shift interference technique, includes coherent light source and polarization delay system (1) and synchronous phase shift system (2), its characterized in that: the coherent light source and polarization delay system (1) comprises a semiconductor laser (3), a 1/2 lambda wave plate (4), a first 1/4 lambda wave plate (5), a first total reflection mirror (6), a second 1/4 lambda wave plate (7), a second total reflection mirror (8), a polarization beam splitter prism (9) and a one-dimensional guide rail (21), the synchronous phase shift system comprises a reflecting mirror (10), a first diaphragm (11), a first lens (12), a third 1/4 lambda wave plate (13), a second lens (14), a second diaphragm (15), a polaroid group (16), a third lens (17), a CCD (18), a data acquisition card (19), a computer (20) and an orthogonal holographic grating (22), wherein the 1/2 lambda wave plate (4) is arranged between the laser (3) and the polarization beam splitter prism (9), the first 1/4 lambda wave plate (5) is arranged between the polarization beam splitter prism (9) and the first total reflection mirror (6), the second 1/4 lambda wave plate (7) is arranged between the polarization beam splitter prism (9) and the second total reflection mirror (8), the first lambda wave plate (12) and the orthogonal holographic grating (13) are arranged between the first lambda wave plate (14) and the orthogonal holographic grating (22) respectively, a second diaphragm (15) and a polaroid group (16) are arranged between the second lens (14) and the third lens (17);
when in use, the coherent light source and the polarization delay system take linearly polarized light emitted by the laser as a light source, and the light source is emitted into the polarization beam splitter prism through the 1/2 lambda wave plate and is split into two mutually perpendicular transmission light I 1 And reflected light I 2 In which light I is transmitted 1 First, a beam of circularly polarized light I is changed into a beam of circularly polarized light I through a second 1/4 lambda wave plate 11 Then the first total reflection mirror fixed on the one-dimensional guide rail is used for reflecting the second 1/4 lambda wave plate back to the linearly polarized light; reflected light I 2 First, a beam of circularly polarized light I is changed into a beam of circularly polarized light I through a first 1/4 lambda wave plate 21 Then the light is reflected back to the first 1/4 lambda wave plate through the first total reflection mirror and is changed into linearly polarized light, I 11 、I 21 All pass through the polarization beam splitter prism again to synthesize a beam of light I 3 The one-dimensional guide rail is moved to change the L optical path difference when passing through the second total reflection mirror, the synchronous phase shifting system filters stray light by a first diaphragm through a reflection mirror on the basis of a coherent light source and a polarization delay system 1, and I is filtered by a first lens 3 Expanding the beam, changing the beam into two beams of circularly polarized light through a third 1/4 lambda wave plate, then generating diffraction phenomenon through a two-dimensional orthogonal holographic grating, focusing the circularly polarized light through a second lens, filtering other diffracted light through a second diaphragm, and only leaving four beams I required 311 、I 312 、I 321 、I 322 Four beams of light pass through a special polaroid set to have polarization angles of 0 DEG, 45 DEG, 90 DEG and 135 DEG respectively, are focused by a third lens, interfere two by two to form four interference patterns, are simultaneously received by a CCD, acquire information by a data acquisition card, and are calculated by a labview program on a computer.
2. The nano-meter based on synchronous phase-shifting interferometry according to claim 1, wherein: the polarizer group (16) is composed of four polarizers of different polarization directions.
3. The nano-meter based on synchronous phase-shifting interferometry according to claim 1, wherein: the laser (3) is a semiconductor laser.
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| CN201810899243.1A CN108955516B (en) | 2018-08-08 | 2018-08-08 | Nanometer measuring instrument based on synchronous phase-shifting interference technology |
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| CN201810899243.1A CN108955516B (en) | 2018-08-08 | 2018-08-08 | Nanometer measuring instrument based on synchronous phase-shifting interference technology |
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| CN108955516B true CN108955516B (en) | 2023-12-19 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101033937A (en) * | 2007-04-13 | 2007-09-12 | 南京师范大学 | Method and device of light splitting, image-forming and synchronous phase-shifting in optical interferometry. |
| WO2018045735A1 (en) * | 2016-09-06 | 2018-03-15 | 深圳市中图仪器股份有限公司 | Apparatus used for laser-measurement signal correction |
| CN208595878U (en) * | 2018-08-08 | 2019-03-12 | 河南师范大学 | A kind of nano measurement instrument based on simultaneous phase-shifting interference technique |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110176144A1 (en) * | 2010-01-18 | 2011-07-21 | W2 Optronics Inc. | Polarization Based Delay Line Interferometer |
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- 2018-08-08 CN CN201810899243.1A patent/CN108955516B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101033937A (en) * | 2007-04-13 | 2007-09-12 | 南京师范大学 | Method and device of light splitting, image-forming and synchronous phase-shifting in optical interferometry. |
| WO2018045735A1 (en) * | 2016-09-06 | 2018-03-15 | 深圳市中图仪器股份有限公司 | Apparatus used for laser-measurement signal correction |
| CN208595878U (en) * | 2018-08-08 | 2019-03-12 | 河南师范大学 | A kind of nano measurement instrument based on simultaneous phase-shifting interference technique |
Non-Patent Citations (1)
| Title |
|---|
| 基于二维光栅分光的同步移相干涉测量技术;左芬;陈磊;徐春生;;光学学报(第04期);全文 * |
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