CN108873621A - Sided exposure machine and double-faced exposure method - Google Patents
Sided exposure machine and double-faced exposure method Download PDFInfo
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- CN108873621A CN108873621A CN201810836042.7A CN201810836042A CN108873621A CN 108873621 A CN108873621 A CN 108873621A CN 201810836042 A CN201810836042 A CN 201810836042A CN 108873621 A CN108873621 A CN 108873621A
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- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000009434 installation Methods 0.000 claims description 5
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000003447 ipsilateral effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Abstract
The present invention relates to a kind of sided exposure machine and double-faced exposure method, sided exposure machine includes mounting rack；It is respectively arranged on the first exposure components and the second exposure components of mounting rack two sides；First loading stage and the second loading stage；And driving mechanism, driving mechanism include driving assembly, the first loading stage and the second loading stage pass through exposure region in the first motion state and the second motion state respectively.Upon exposure, first loading stage is with the movement of first circulation track, and pass through exposure region in the first motion state, to be exposed to the first part to be exposed, and the second loading stage is with the movement of second circulation track, and pass through exposure region in the second motion state, to be exposed to the second part to be exposed, first loading stage and the equal shuttling movement of the second loading stage, and it also can be carried out the unloading of the first exposure finished product or the loading of next first part to be exposed when the second part to be exposed exposure, exposure efficiency is higher, compared to the mode of conventionally employed overturning double-sided exposure, exposure accuracy is also higher.
Description
Technical field
The present invention relates to double-sided exposure technical fields, more particularly to a kind of sided exposure machine and double-faced exposure method.
Background technique
Traditional sided exposure machine generallys use the exposure that film transfer carries out double-sided PCB.Before exposure, need first to make
Make the film of pattern to be transferred；Then, it will be separately fixed on upper and lower surface glass with the two-sided patterned film；Then, will
The circuit board of pattern to be transferred is clipped between two blocks of glass up and down, is exposed using bluish violet higher source luminance, by line map
Case is transferred on wiring board, completes double-sided exposure.And for laser direct-writing exposure machine, generally use single side exposure.First to circuit
Plate is wherein exposed on one side, is overturn, is then exposed again to the another side of circuit board, finally after the completion of to be exposed
Complete the double-sided exposure to circuit board.
However, turning operation need to be carried out when laser direct-writing exposure machine carries out double-sided exposure, and turning operation will necessarily generate
The problem of being aligned after overturning not only increases exposure process, while also can influence exposure accuracy because of aligning accuracy problem, from
And influence final exposure effect.
Summary of the invention
Based on this, it is necessary to provide a kind of sided exposure machine and double-faced exposure method.The sided exposure machine is being exposed
Shi Wuxu overturning, reduces exposure process, improves exposure accuracy, and then promote exposal image-forming quality；The double-faced exposure method application
In sided exposure machine above-mentioned, exposure efficiency is higher, and is easy to implement automatic operation.
Its technical solution is as follows：
On the one hand, a kind of sided exposure machine, including mounting rack are provided；Exposure mechanism, exposure mechanism include being respectively arranged on
The first exposure components and the second exposure components of mounting rack two sides, the first exposure components and the second exposure components are oppositely arranged, simultaneously
Form exposure region；Loader mechanism, loader mechanism include the first loading stage and the second loading stage, the first loading stage and the second loading stage
It is flexibly connected with mounting rack；And driving mechanism, driving mechanism include driving assembly；Driving assembly drives the first loading stage with the
One circulation track moves and is exposed the first loading stage by exposure region in the first motion state；Driving assembly also drives
Dynamic second loading stage is moved with second circulation track and exposes the second loading stage by exposure region in the second motion state
Light.
Above-mentioned sided exposure machine, upon exposure, the first loading stage is with the movement of first circulation track and in the first motion state
When by exposure region, to be exposed to the first part to be exposed, and the second loading stage with second circulation track movement and second
By exposure region, to be exposed to the second part to be exposed when motion state, the first loading stage and the second loading stage recycle fortune
It is dynamic, and also can be carried out the unloading of the first exposure finished product or the loading of next first part to be exposed when the exposure of the second part to be exposed,
Exposure efficiency is higher, and compared to the mode of conventionally employed overturning double-sided exposure, exposure accuracy is also higher.
Technical solution is illustrated further below：
The first loading stage and the second loading stage are respectively arranged on the two sides of mounting rack, driving group in one of the embodiments,
Part further includes the first driving assembly and the second driving assembly, and the first driving assembly is for driving the first loading stage, making the first loading
Platform is with the movement of first circulation track, and the second driving assembly is for driving the second loading stage, making the second loading stage with second circulation rail
Mark movement.
Loader mechanism further includes the first maneuvering board and the second maneuvering board in one of the embodiments, the first maneuvering board and
Second maneuvering board is flexibly connected with mounting rack；
First loading stage is set to the first maneuvering board and is flexibly connected with the first maneuvering board, and the first driving assembly includes first
Actuator and the second actuator, the first actuator is for driving the first maneuvering board mobile in mounting rack, and the second actuator is for driving
Dynamic first loading stage is mobile in the first maneuvering board, and the first maneuvering board and the cooperation of the first loading stage are mobile, make the first loading stage along the
One circulation track movement；
Second loading stage is set to the second maneuvering board and is flexibly connected with the second maneuvering board, and the second driving assembly includes third
Actuator and fourth drive member, third actuator is for driving the second maneuvering board mobile in mounting rack, and fourth drive member is for driving
Dynamic second loading stage is mobile in the second maneuvering board, and the second maneuvering board and the cooperation of the second loading stage are mobile, make the second loading stage along the
Two circulation track movements.
Mounting rack is equipped with the first sliding rail and the second sliding rail in one of the embodiments, and the first maneuvering board is equipped with and first
The first sliding groove of sliding rail cooperation, the second maneuvering board are equipped with the second sliding slot cooperated with the second sliding rail；
Or first maneuvering board be equipped with the first guide rod, the first loading stage is equipped with the first pilot hole for cooperating with the first guide rod, the
Two maneuvering boards are equipped with the second guide rod, and the second loading stage is equipped with the second pilot hole cooperated with the second guide rod.
In one of the embodiments, further include sensing mechanism, sensing mechanism include first sensor, second sensor,
3rd sensor and the 4th sensor, first sensor are used to detect the shift position of the first maneuvering board, and second sensor is used for
The shift position of the first loading stage is detected, 3rd sensor is used to detect the shift position of the second maneuvering board, and the 4th sensor is used
In the shift position for detecting the second loading stage.
It in one of the embodiments, further include control mechanism, control mechanism includes controller, the first exposure components,
Two exposure components, the first actuator, the second actuator, third actuator, fourth drive member, first sensor, second sensor,
3rd sensor and the 4th sensor are electrically connected with controller.
The first loading stage is equipped with the first loading part in one of the embodiments, and the second loading stage is equipped with the second loading part.
On the other hand, a kind of double-faced exposure method is additionally provided, can be applied to described in any of the above-described a technical solution
Sided exposure machine includes the following steps：
(S1), the first loading stage is located at the first initial position, and the second loading stage is located at the second initial position, loads first
Platform loads the first part to be exposed；
(S2), the first loading stage with first circulation track move to the first exposure position, make the first part to be exposed be located at expose
Light area；
(S3), the first exposure components and the second exposure components are exposed the first part to be exposed and obtain the first exposure
Finished product；Meanwhile the second part to be exposed is loaded in the second loading stage；
(S4), the first loading stage moves to the first initial position along first circulation track and unloads the first exposure finished product；
(S5), the second loading stage along second circulation track move to the second exposure position, make the second part to be exposed be located at expose
Light area；
(S6), the first exposure components and the second exposure components are exposed the second part to be exposed and obtain the second exposure
Finished product；Meanwhile next first part to be exposed is loaded in the first loading stage；
(S7), the second loading stage moves to the second initial position along second circulation track and unloads the second exposure finished product.
Above-mentioned double-faced exposure method makes the first part to be exposed by the shuttling movement of the first loading stage and the second loading stage
It is successively exposed with the second part to be exposed, is easy to implement automatic operation, and when the exposure of the second part to be exposed, progress can be synchronized
The loading of next first part to be exposed improves time utilization efficiency when exposure, improves exposure efficiency.
Detailed description of the invention
Fig. 1 is the exposure process figure of double-faced exposure method in embodiment；
Fig. 2 is the overall structure front view of sided exposure machine in embodiment；
Fig. 3 is the overall structure top view of sided exposure machine in embodiment.
Attached drawing marks explanation：
100, mounting rack, the 210, first exposure components, the 220, second exposure components, the 310, first loading stage, 320, second
Loading stage, the 330, first maneuvering board, the 340, second maneuvering board, the 410, first part to be exposed, the 420, second part to be exposed.
Specific embodiment
The embodiment of the present invention is described in detail with reference to the accompanying drawing：
It should be noted that it can be directly in another element when alleged element is with another element " fixation " in text
Above or there may also be elements placed in the middle.When an element is considered as with another element " connection ", it be can be directly
It is connected to another element in succession or may be simultaneously present centering elements.On the contrary, when element is referred to as " directly existing " another element
When "upper", intermediary element is not present.Term as used herein "vertical", "horizontal", "left" and "right" and similar table
It states for illustrative purposes only, is not meant to be the only embodiment.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention
The normally understood meaning of technical staff is identical.Term as used herein in the specification of the present invention is intended merely to description tool
The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more
Any and all combinations of relevant listed item.
Embodiment as shown in Figure 1 to Figure 3 provides a kind of sided exposure machine, including mounting rack 100；Exposure mechanism exposes
Ray machine structure includes the first exposure components 210 and the second exposure components 220 for being respectively arranged on 100 two sides of mounting rack, the first exposure group
Part 210 and the second exposure components 220 are oppositely arranged and form exposure region；Loader mechanism, loader mechanism include the first loading stage
310 and second loading stage 320, the first loading stage 310 and the second loading stage 320 are flexibly connected with mounting rack 100；And driving machine
Structure, driving mechanism include driving assembly；Driving assembly drives the first loading stage 310 to move with first circulation track and make first
Loading stage 310 is exposed in the first motion state by exposure region；Driving assembly also drives the second loading stage 320 with second
Circulation track moves and is exposed the second loading stage 320 by exposure region in the second motion state.
Upon exposure, the first loading stage 310 passes through exposure with the movement of first circulation track and in the first motion state
Area, to be exposed to the first part 410 to be exposed, and the second loading stage 320 with second circulation track movement and second movement
By exposure region, to be exposed to the second part 420 to be exposed when state, the first loading stage 310 and the second loading stage 320 are followed
Ring movement, and the second part 420 to be exposed expose when also can be carried out the first exposure finished product unloading or next first part to be exposed
410 loading, exposure efficiency is higher, and compared to the mode of conventionally employed overturning double-sided exposure, exposure accuracy is also higher.
Traditional laser direct-writing exposure machine can only single side exposure, cannot simultaneously double-sided exposure, also needed after having exposed one side
It overturns, to carry out the exposure of another side, due to needing to overturn, not only process flow is more, and overturns holding time waste, exposure
Low efficiency, and also aligned after overturning, it is easy to influence exposure accuracy because of aligning accuracy problem；Meanwhile the two-sided exposure of tradition
Light mostly uses the film to transfer, and film production is same to increase process flow, and film cost of manufacture is high, and the film is after a period of use
It must also replace.
In the present embodiment, the first exposure components 210 and the second exposure components 220 are respectively provided at the two sides of mounting rack 100, and
One exposure components 210 and the second exposure components 220 are oppositely arranged and form exposure region in mounting rack 100, when the first loading stage
310 or second loading stage 320 by when, can be to the first part 410 to be exposed or the second loading stage 320 on the first loading stage 310
Upper second part 420 to be exposed is exposed.Here the first exposure components 210 and the second exposure components 220 are oppositely arranged finger
The light emitting end surface of the luminous end of one exposure components 210 and the second exposure components 220 is provided opposite to and is in spacing setting, at it
Between form exposure region, when exposure, realizes the primary technical effect for completing front and back sides exposure.
First loading stage 310 and the second loading stage 320 are flexibly connected with mounting rack 100, the first loading stage 310 and the second dress
Microscope carrier 320 is moved along first circulation track and second circulation track respectively, to realize that the first loading stage 310 and second loads
The shuttling movement of platform 320.When the first loading stage 310 is in the first motion state of first circulation track, the first loading stage 310
In exposure region, and carry out the exposure to the first part 410 to be exposed, at this point, the second loading stage 320 second circulation track move,
It is not in exposure region, at this point, the exposed part or load next wait expose that unloading exposure is completed can be carried out to the second loading stage 320
The exposed part of light；When the second loading stage 320 is in the second motion state of second circulation track, the second loading stage 320, which is located at, to expose
Light area, and carry out the exposure to the second part 420 to be exposed, at this point, the first loading stage 310 moves and in first circulation track
Exposure region is left, at this point, can be unloaded to the first exposure finished product that exposure is completed on the first loading stage 310, and is carried out down
The loading of one the first part 410 to be exposed.By the operation, realize that second part 420 to be exposed is exposed on the second loading stage 320
The unloading or loading operation on the first loading stage 310 are carried out while light, improve exposure efficiency.First loading stage 310 and second
The equal shuttling movement of loading stage 320, is easy to implement automatic operation, so as to further improve exposure efficiency, and improves certainly
Dynamicization is horizontal, realizes the operating processization standardization of exposing operation process, reduces manual operation process, reduce cost of labor.
Further, the first exposure components 210 and the second exposure components 220 are fixedly installed.As shown in Figures 2 and 3,
One exposure components 210 and the second exposure components 220 are formed in the inside of mounting rack 100 and are exposed in being installed on mounting rack 100 up and down
Light area.
When installation, it need to guarantee the installation accuracy of the first exposure components 210 and the second exposure components 220, to guarantee that first exposes
The corresponding position precision of optical assembly 210 and the second exposure components 220, to improve the aligning accuracy of post-exposure figure, compared to biography
System overturns the double-sided exposure mode that part to be exposed re-registrates, and exposure accuracy is higher.
In addition, the first exposed part is set as shown in figure 3, the first exposure components 210 include the first exposed part and the second exposed part
There are multiple first light source parts, first light source part be arranged in spacing and sets in a row, and the second exposed part is equipped with multiple second light sources
Part, second light source part are arranged in spacing and set in a row, and first light source part is set side by side with second light source part and is in be staggered to set
It sets (in such as Fig. 3, the left end of the left end of the first exposed part and the second exposed part is simultaneously unjustified, but the certain distance that is staggered), make one
The setting position of a first light source part is corresponding with the gap position between two second light source parts；Second exposure components 220
Can similarly it be arranged, which is not described herein again.
So set, the exposure image needed for making exposing patterns Dock With Precision Position when exposure and being formed, further increases exposure
Light precision.
Optionally, the first exposure components 210 and the second exposure components 220 form maskless exposure system (Digital
Micromirror Device, abbreviation DMD exposure system), maskless exposure system is amplified image by projection objective, is realized
Disposable exposure, the first light source part of DMD exposure system and the arrangement quantity of second light source part are determined according to the size of exposing patterns
Fixed, exposure accuracy is higher.
It should be noted that since the first part 410 or the second to be exposed part 420 to be exposed is needed when exposure region is exposed
The light that the light and the second exposure components 220 for issuing the first exposure components 210 issue reaches the first part 410 or the second to be exposed
Part 420 to be exposed.Therefore, the first loading part or the second loading part should be equipped with the exposure front and back sides for making the first part 410 to be exposed
Region or the leakage of the front and back sides exposure area of the second part 420 to be exposed, to meet the requirement of exposure.If the first loading part is in frame
Body structure setting, the outline border that the first part 410 to be exposed is located at the first loading part enable light to shine so that the middle part of frame is unobstructed
The front and back sides region for being incident upon the first part 410 to be exposed carries out normal front and back sides exposure；For another example the first loading part is to load through slot
Equal set-up modes, this is the structure that those skilled in the art must be configured as needed, and can be used can satisfy setting and want
Any prior art asked specifically is arranged, and which is not described herein again.
As with the embodiments shown in figures 2 and 3, the first loading stage 310 and the second loading stage 320 are respectively arranged on mounting rack 100
Two sides, driving assembly further includes the first driving assembly and the second driving assembly, and the first driving assembly is loaded for driving first
Platform 310 makes the first loading stage 310 with the movement of first circulation track, and the second driving assembly is for driving the second loading stage 320, making
Second loading stage 320 is with the movement of second circulation track.
First circulation track and second circulation track can be rectangular path, be also possible to can satisfy other rails of requirement
Mark such as circular trace, those skilled in the art can be specifically arranged as needed.
If first circulation track is rectangular path.At this point, mounting rack 100 is equipped with the first rectangular rail slot and the second rectangle rail
Road slot, the first driving assembly drive the first loading stage 310 to move along the first rectangular rail slot and make the first loading stage 310 along the
The exposure to the thereon first part 410 to be exposed is realized in one circulation track movement；Similarly, which is not described herein again for second circulation track.
And in fact, the first loading stage 310 and the second loading stage 320 can also be located at the ipsilateral of mounting rack 100.At this point,
First rectangular rail slot is nested in the second rectangular rail slot or the second rectangular rail slot is nested in the first rectangular rail slot,
I.e. the length and width dimensions of the first rectangular rail slot are different from the length and width dimensions of the second rectangular rail slot, the radius of the first circuit orbit slot
Size is not also identical as the circular radius size of the second circuit orbit slot, and those skilled in the art should be noted that first in design
Loading stage 310 and the second loading stage 320 avoid interference with when moving specifically to be arranged, and which is not described herein again.
Embodiment as shown in Figure 2, loader mechanism further include the first maneuvering board 330 and the second maneuvering board 340, the first movement
Plate 330 and the second maneuvering board 340 are flexibly connected with mounting rack 100；First loading stage 310 be set to the first maneuvering board 330 and with
First maneuvering board 330 is flexibly connected, and the first driving assembly includes the first actuator and the second actuator, and the first actuator is for driving
Dynamic first maneuvering board 330 is mobile in mounting rack 100, and the second actuator is for driving the first loading stage 310 in the first maneuvering board 330
Mobile, the first maneuvering board 330 and the cooperation of the first loading stage 310 are mobile, move the first loading stage 310 along first circulation track；
Second loading stage 320 is set to the second maneuvering board 340 and is flexibly connected with the second maneuvering board 340, the second driving assembly
Including third actuator and fourth drive member, third actuator is mobile in mounting rack 100 for the second maneuvering board 340 of driving, the
Four actuators are for driving the second loading stage 320 mobile in the second maneuvering board 340, the second maneuvering board 340 and the second loading stage 320
Cooperation is mobile, moves the second loading stage 320 along second circulation track.
As shown in Fig. 2, the first actuator can drive the first maneuvering board 330 to move before and after the left side of mounting rack 100 is realized
Dynamic, the second actuator can drive the first loading stage 310 to move up and down on the first maneuvering board 330, third actuator energy
It enough drives the second maneuvering board 340 to realize on the right side of mounting rack 100 to be moved forward and backward, fourth drive member can drive the second loading stage
320 move up and down on the second maneuvering board 340.
By the driving effect of the first actuator, the second actuator, third actuator and fourth drive member, make the first movement
Plate 330, the second maneuvering board 340, the first loading stage 310 and the cooperation of the second loading stage 320 are mobile, realize the first loading stage in turn
310 are moved along the first motion profile of rectangle, realize that the second loading stage 320 is transported along the second motion profile of rectangle
It is dynamic.
As shown in Figures 2 and 3, the up and down motion region of the first loading stage 310 and the second loading stage 320 is located at the first exposure
In the lower regions of component 210 and the second exposure components 220；It certainly, as needed, can also be without being limited thereto.
In addition, as shown in Fig. 2, the first maneuvering board 330 and the second maneuvering board 340 are set to the left and right sides of mounting rack 100, first
Loading stage 310 and the second loading stage 320 are respectively provided on corresponding first maneuvering board 330 and the second maneuvering board 340, and make first
Loading stage 310 and the second loading stage 310 form bilevel movement during exercise, save the occupied space of mechanism, reduce life
Produce cost.
On the basis of any of the above-described a embodiment, mounting rack 100 is equipped with the first sliding rail and the second sliding rail, the first maneuvering board
330 are equipped with the first sliding groove cooperated with the first sliding rail, and the second maneuvering board 340 is equipped with the second sliding slot cooperated with the second sliding rail；Or
First maneuvering board 330 is equipped with the first guide rod, and the first loading stage 310 is equipped with the first pilot hole cooperated with the first guide rod, the second fortune
Movable plate 340 is equipped with the second guide rod, and the second loading stage 320 is equipped with the second pilot hole cooperated with the second guide rod.
Sliding rail and sliding slot be equipped with or the setting of guide rod and pilot hole is for realizing the first maneuvering board 330, the
Mobile stationarity between two maneuvering boards 340 and mounting rack 100, and then realize the first loading stage 310 and the second loading stage 320
Mobile stationarity, improves mobile accuracy, and guarantee exposure accuracy.
It further include sensing mechanism on the basis of any of the above-described a embodiment, sensing mechanism includes first sensor, second
Sensor, 3rd sensor and the 4th sensor, first sensor are used to detect the shift position of the first maneuvering board 330, and second
Sensor is used to detect the shift position of the first loading stage 310, and 3rd sensor is used to detect the mobile position of the second maneuvering board 340
It sets, the 4th sensor is used to detect the shift position of the second loading stage 320.
By the setting of sensing mechanism, the first maneuvering board 330, the second maneuvering board 340, the first loading stage 310 and the are improved
The kinematic accuracy of two loading stages 320 improves exposure accuracy.
It further include control mechanism on the basis of any of the above-described a embodiment, control mechanism includes controller, the first exposure
Component 210, the second exposure components 220, the first actuator, the second actuator, third actuator, fourth drive member, the first sensing
Device, second sensor, 3rd sensor and the 4th sensor are electrically connected with controller.
The setting of control mechanism, the work between cooperation exposure mechanism, loader mechanism and driving mechanism are realized more
Accurate and efficient graph exposure.
On the basis of any of the above-described a embodiment, the first loading stage 310 is equipped with the first loading part, the second loading stage 320
Equipped with the second loading part.
The setting of first loading part and the second loading part is for the ease of the first part 410 and the second part to be exposed to be exposed
420 loading improves efficiency of loading.
Embodiment as shown in Figure 1 additionally provides a kind of double-faced exposure method, can be applied to any of the above-described a embodiment
The sided exposure machine, includes the following steps：
(S1), the first loading stage 310 is located at the first initial position, and the second loading stage 320 is located at the second initial position,
One loading stage 310 loads the first part 410 to be exposed；
(S2), the first loading stage 310 with first circulation track moves to the first exposure position, makes the first part 410 to be exposed
Positioned at exposure region；
(S3), the first exposure components 210 and the second exposure components 220 are exposed and obtain to the first part 410 to be exposed
First exposure finished product；Meanwhile the second part 420 to be exposed is loaded in the second loading stage 320；
(S4), the first loading stage 310 along first circulation track move to the first initial position and unload first exposure at
Product；
(S5), the second loading stage 320 along second circulation track moves to the second exposure position, makes the second part 420 to be exposed
Positioned at exposure region；
(S6), the first exposure components 210 and the second exposure components 220 are exposed and obtain to the second part 420 to be exposed
Second exposure finished product；Meanwhile the next first part 410 to be exposed is loaded in the first loading stage 310；
(S7), the second loading stage 320 along second circulation track move to the second initial position and unload second exposure at
Product.
By the shuttling movement of the first loading stage 310 and the second loading stage 320, make the first part to be exposed 410 and second to
Exposed part 420 is successively exposed, and is easy to implement automatic operation, and when the exposure of the second part 420 to be exposed, can be synchronized and be carried out down
The loading of one the first part 410 to be exposed improves time utilization efficiency when exposure, improves exposure efficiency.
It should be noted that step (S1) is to step (S7), there is no stringent sequences, using step (S1) to step
(S7) mode is the convenience in order to express and illustrate, those skilled in the art can carry out specifically as needed in practical operation
Adjustment, which is not described herein again.In step (S6), at the same time it can also carry out the unloading of the first exposure finished product, and not necessarily can only
It is unloaded in step (S4).
Further, as depicted in figs. 1 and 2, when exposure, according to the following steps：
First loading stage 310 is located at rear i.e. the first initial position of mounting rack 100, and the second loading stage 320 is located at installation
The front of frame 100 is the second initial position, and the first part 410 to be exposed is loaded on the first loading stage 310；
First loading stage 310 is moved downward to the first default first position along the first maneuvering board 330；
First maneuvering board 330 is moved to the first exposure position forward, the first loading stage 310 is made to be located at exposure region；
First exposure components 210 and the second exposure components 220 are exposed the first part 410 to be exposed and obtain first
Expose finished product；Meanwhile the second part 420 to be exposed is loaded in the second loading stage 320；
First maneuvering board 330 continue to move to and reach forward the first default second position, make the first loading stage 310 from
Open exposure region；
Second maneuvering board 340 is moved to the second default first position towards the rear；Second loading stage 320 is along the second maneuvering board
340 are moved downward to the second default second position；Second maneuvering board 340 is moved to the second exposure position forward and makes second
Loading stage 320 is located at exposure region；
First loading stage 310 is moved upward to the first default the third place；First maneuvering board 330 is moved and is returned towards the rear
It is back to the first initial position, unloads the first exposure finished product on the first loading stage 310；
First exposure components 210 and the second exposure components 220 are exposed the second part 420 to be exposed and obtain second
Expose finished product；Meanwhile the next first part 410 to be exposed is loaded in the first loading stage 310；
Second maneuvering board 340 continuously moves to the second default the third place forward, and the second loading stage 320 is moved upward to
Second default 4th position, the second maneuvering board 340 are moved to the second initial position (here, the second default 4th position towards the rear
It can directly be the second initial position)；
The step of being moved downward to the first default first position along the first maneuvering board 330 into the first loading stage 310, and follow
Ring carries out.
Here, it should be noted that in as with the embodiments shown in figures 2 and 3, because the first loading stage 310 and second loads
Platform 320 moves up and down between first exposure components 210 on top and the second exposure components 220 of lower part.Therefore exist
When first part 410 to be exposed is exposed, the second loading stage 320 cannot be to be exposed to avoid influencing first by exposure region
The exposure of part 410, thus, when the first part 410 to be exposed is exposed, the second maneuvering board 340 cannot pass through exposure region；
When second part 420 to be exposed is exposed similarly, those skilled in the art reasonable arrangement circulation can transport as needed
The problems such as dynamic timing node, to meet the needs of exposure, which is not described herein again.
When it is implemented, after the completion of the first part 410 to be exposed exposes, 310 high-speed motion of the first loading stage is simultaneously back to the
One initial position；After the completion of second part 420 to be exposed exposes, 320 high-speed motion of the second loading stage is simultaneously back to the second initial bit
It sets.Those skilled in the art can be specifically arranged as needed, with obtain suitable movement node and with exposure, load and
It is matched between unloading.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (8)
1. a kind of sided exposure machine, which is characterized in that including：
Mounting rack；
Exposure mechanism, the exposure mechanism include the first exposure components and the second exposure group for being respectively arranged on the mounting rack two sides
Part, first exposure components and second exposure components are oppositely arranged and form exposure region；
Loader mechanism, the loader mechanism include the first loading stage and the second loading stage, first loading stage and described second
Loading stage is flexibly connected with the mounting rack；And
Driving mechanism, the driving mechanism include driving assembly；
The driving component drives first loading stage to move with first circulation track and make first loading stage first
It is exposed when motion state by the exposure region；
The driving component is also driven second loading stage to be moved with second circulation track and makes second loading stage
It is exposed when two motion states by the exposure region.
2. sided exposure machine according to claim 1, which is characterized in that first loading stage and second loading stage
It is respectively arranged on the two sides of the mounting rack, the driving component further includes the first driving assembly and the second driving assembly, and described
One driving assembly is described for driving first loading stage, moving first loading stage with the first circulation track
Second driving assembly is for driving second loading stage, moving second loading stage with the second circulation track.
3. sided exposure machine according to claim 2, which is characterized in that the loader mechanism further include the first maneuvering board and
Second maneuvering board, first maneuvering board and second maneuvering board are flexibly connected with the mounting rack；
First loading stage is set to first maneuvering board and is flexibly connected with first maneuvering board, first driving
Component includes the first actuator and the second actuator, and first actuator is for driving first maneuvering board in the installation
Frame is mobile, and second actuator is for driving first loading stage mobile in first maneuvering board, first movement
Plate and first loading stage cooperation are mobile, move first loading stage along the first circulation track；
Second loading stage is set to second maneuvering board and is flexibly connected with second maneuvering board, second driving
Component includes third actuator and fourth drive member, and the third actuator is for driving second maneuvering board in the installation
Frame is mobile, and the fourth drive member is for driving second loading stage mobile in second maneuvering board, second movement
Plate and second loading stage cooperation are mobile, move second loading stage along the second circulation track.
4. sided exposure machine according to claim 3, which is characterized in that the mounting rack is equipped with the first sliding rail and second and slides
Rail, first maneuvering board are equipped with the first sliding groove that cooperate with first sliding rail, and second maneuvering board is equipped with described the
The second sliding slot of two sliding rails cooperation；
Or first maneuvering board is equipped with the first guide rod, first loading stage is equipped with first cooperated with first guide rod and leads
Xiang Kong, second maneuvering board are equipped with the second guide rod, and second loading stage is equipped with second cooperated with second guide rod and leads
Xiang Kong.
5. sided exposure machine according to claim 3, which is characterized in that it further include sensing mechanism, the sensing mechanism packet
First sensor, second sensor, 3rd sensor and the 4th sensor are included, the first sensor is for detecting described first
The shift position of maneuvering board, the second sensor are used to detect the shift position of first loading stage, the third sensing
Device is used to detect the shift position of second maneuvering board, and the 4th sensor is used to detect the movement of second loading stage
Position.
6. sided exposure machine according to claim 5, which is characterized in that it further include control mechanism, the control mechanism packet
Include controller, it is first exposure components, second exposure components, first actuator, second actuator, described
Third actuator, the fourth drive member, the first sensor, the second sensor, the 3rd sensor and described
4th sensor is electrically connected with the controller.
7. sided exposure machine according to claim 1-6, which is characterized in that first loading stage is equipped with first
Loading part, second loading stage are equipped with the second loading part.
8. a kind of double-faced exposure method, it can be applied to such as the described in any item sided exposure machines of claim 1-7, feature exists
In including the following steps：
(S1), the first loading stage is located at the first initial position, and the second loading stage is located at the second initial position, fills in the first loading stage
Carry the first part to be exposed；
(S2), first loading stage with first circulation track moves to the first exposure position, makes the described first part position to be exposed
In exposure region；
(S3), the first exposure components and the second exposure components are exposed the described first part to be exposed and obtain the first exposure
Finished product；Meanwhile the second part to be exposed is loaded in second loading stage；
(S4), first loading stage moves to first initial position along the first circulation track and unloads described
One exposure finished product；
(S5), second loading stage along the second circulation track move to the second exposure position, make it is described second to be exposed
Part is located at the exposure region；
(S6), first exposure components and second exposure components are exposed and obtain to the described second part to be exposed
Second exposure finished product；Meanwhile next first part to be exposed is loaded in first loading stage；
(S7), second loading stage moves to second initial position along the second circulation track and unloads described
Two exposure finished products.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810836042.7A CN108873621B (en) | 2018-07-26 | 2018-07-26 | Cantilever type double-table-board double-side exposure machine and double-side exposure method |
| PCT/CN2018/122484 WO2020019653A1 (en) | 2018-07-26 | 2018-12-20 | Cantilevered double-table double-sided digital exposure system and exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810836042.7A CN108873621B (en) | 2018-07-26 | 2018-07-26 | Cantilever type double-table-board double-side exposure machine and double-side exposure method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108873621A true CN108873621A (en) | 2018-11-23 |
| CN108873621B CN108873621B (en) | 2020-06-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810836042.7A Active CN108873621B (en) | 2018-07-26 | 2018-07-26 | Cantilever type double-table-board double-side exposure machine and double-side exposure method |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN108873621B (en) |
| WO (1) | WO2020019653A1 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020019653A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | Cantilevered double-table double-sided digital exposure system and exposure method |
| WO2020019652A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | High-efficiency double-table-board double-sided digitization exposure system and working procedure |
| WO2020019651A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | Novel double-sided digital exposure system and work process |
| WO2020133852A1 (en) * | 2018-12-26 | 2020-07-02 | 深圳市华星光电半导体显示技术有限公司 | Substrate exposure method and device |
| CN112859532A (en) * | 2019-11-27 | 2021-05-28 | 株式会社Orc制作所 | Direct exposure apparatus and method for exposing substrate |
| CN115524942A (en) * | 2022-09-30 | 2022-12-27 | 广东科视光学技术股份有限公司 | Exposure method of gantry double-sided lithography system |
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| CN1828427A (en) * | 2006-04-14 | 2006-09-06 | 上海微电子装备有限公司 | Step scan photo-etching machine double-platform exchanging and positioning system |
| CN103176366A (en) * | 2011-12-22 | 2013-06-26 | 上海微电子装备有限公司 | Active drive cable table of lithography machine wafer stage |
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| CN104950598B (en) * | 2015-07-07 | 2017-05-24 | 合肥芯硕半导体有限公司 | Up-and-down distributed double-workpiece-stage device |
| CN108873621B (en) * | 2018-07-26 | 2020-06-05 | 中山新诺科技股份有限公司 | Cantilever type double-table-board double-side exposure machine and double-side exposure method |
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2018
- 2018-07-26 CN CN201810836042.7A patent/CN108873621B/en active Active
- 2018-12-20 WO PCT/CN2018/122484 patent/WO2020019653A1/en active Application Filing
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1828427A (en) * | 2006-04-14 | 2006-09-06 | 上海微电子装备有限公司 | Step scan photo-etching machine double-platform exchanging and positioning system |
| CN103176366A (en) * | 2011-12-22 | 2013-06-26 | 上海微电子装备有限公司 | Active drive cable table of lithography machine wafer stage |
| CN103913955A (en) * | 2013-01-06 | 2014-07-09 | 上海华虹宏力半导体制造有限公司 | Double-sided photoetching machine and double-sided photoetching method |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020019653A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | Cantilevered double-table double-sided digital exposure system and exposure method |
| WO2020019652A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | High-efficiency double-table-board double-sided digitization exposure system and working procedure |
| WO2020019651A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | Novel double-sided digital exposure system and work process |
| WO2020133852A1 (en) * | 2018-12-26 | 2020-07-02 | 深圳市华星光电半导体显示技术有限公司 | Substrate exposure method and device |
| CN112859532A (en) * | 2019-11-27 | 2021-05-28 | 株式会社Orc制作所 | Direct exposure apparatus and method for exposing substrate |
| CN115524942A (en) * | 2022-09-30 | 2022-12-27 | 广东科视光学技术股份有限公司 | Exposure method of gantry double-sided lithography system |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020019653A1 (en) | 2020-01-30 |
| CN108873621B (en) | 2020-06-05 |
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Effective date of registration: 20240131 Address after: 528400 No. 3 Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province Patentee after: Zhongshan Xinnuo Microelectronics Co.,Ltd. Country or region after: China Address before: No. 3, Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province Patentee before: ZHONGSHAN AISCENT TECHNOLOGIES Co.,Ltd. Country or region before: China |