CN103676488A - Mask connecting mechanism and mask stage with same - Google Patents
Mask connecting mechanism and mask stage with same Download PDFInfo
- Publication number
- CN103676488A CN103676488A CN201210333084.1A CN201210333084A CN103676488A CN 103676488 A CN103676488 A CN 103676488A CN 201210333084 A CN201210333084 A CN 201210333084A CN 103676488 A CN103676488 A CN 103676488A
- Authority
- CN
- China
- Prior art keywords
- mask
- motion
- motor
- grating scale
- platform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention discloses a mask stage with a mask connecting mechanism. Te mask stage comprises a bearing stage, a first pin board, a second pin board, a first motor, a second motor, a first grating ruler, a second grating ruler, a first direction measuring lens, a second direction measuring lens and a mask connecting mechanism, wherein the first motor and the second motor are used for providing scanning direction motion drive force and micro-motion drive force to the mask stage, and providing Rz micro-motion direction drive force by differential motion of the first motor and the second motor; the mask connecting mechanism is fixedly arranged on a base, and is arranged at a mask juncture in the scanning motion direction of the mask stage. By adopting the mask stage disclosed by the invention, the mask connecting mechanism is fixedly arranged on the mask juncture; the mask connecting mechanism has Rz and Z-direction motion functions, and the Rz travel requirements on the mask stage are lowered. Meanwhile, the mask stage comprises the first motor, the second motor, the first grating ruler and the second grating ruler, so that the design difficulty of the mask stage is lowered.
Description
Technical field
The present invention relates to semi-conductor device technology field, relate in particular to a kind of mask connecting mechanism and there is the mask platform of this mask connecting mechanism.
Background technology
In the prior art, lithographic equipment is mainly used in integrated circuit (IC), flat pannel display field, or the manufacture of other microdevice.By lithographic equipment, the multilayer mask with different mask patterns is imaged on successively on the wafer that is coated with photoresist under accurately aiming at, for example semiconductor wafer or LCD panel.Lithographic equipment is divided into two classes substantially, one class is stepping lithographic equipment, mask pattern single exposure is imaged on an exposure area of wafer, wafer moves with respect to mask subsequently, next exposure area is moved to mask pattern and projection objective below, again by mask pattern exposure in another exposure area of wafer, repeat this process until on wafer all exposure areas all have the picture of mask pattern.Another kind of is step-scan lithographic equipment, and in said process, mask pattern is not single exposure imaging, but by the scanning mobile imaging of projection light field.In mask pattern imaging process, mask and wafer move with respect to optical projection system and projected light beam simultaneously.In above-mentioned lithographic equipment, need there is corresponding device as the carrier of mask and wafer, the carrier that is mounted with mask, wafer produces accurate motion mutually and meets photoetching needs.The carrier of aforementioned mask version is referred to as and holds bed, and the carrier of wafer is referred to as wafer-supporting platform.
In scanning photoetching device, mask platform generally consists of micropositioner and coarse motion platform.Described micropositioner completes the Precision trimming of mask.Described coarse motion platform completes the large stroke scan exposure motion of mask.The handing-over of described mask is a motion flow the most key in scanning photoetching machine, and the motion operating mode of described mask platform is limited by the handing-over flow process of described mask directly.
In traditional scanning photoetching device, mask transmission system is delivered to described mask behind handing-over position, due to the existence of the kinematic error of described mask transmission system and the plate-making precision of described mask, can cause described mask to have the adjustment of the printing plate error of a Rz.For meeting the seizure visual field size requirement of mask registration, adjustment of the printing plate Rz error need to compensate.By the pre-alignment system in described lithographic equipment, fed back to described mask platform or described mask transmission system after to adjustment of the printing plate error measure, then compensated by described mask platform or described mask transmission system.
But in large mask scanning photoetching device, such as being applied in the splicing camera lens lithographic equipment in flat pannel display field, G4.5 is for generally adopting 520 * 610mm to G6
2with 520 * 800mm
2, G6 adopts 850*1200mm and 850*1400mm above, even larger.Because mask size increases, make it and utilize the IC field lithographic equipment of 6 inches of masks to compare, the adjustment of the printing plate Rz error of its mask increases greatly.And because the manufacturing cost of described large mask is very expensive, the risk of damaging for reducing large mask, the mask transmission system of described large mask does not arrange Rz rotating mechanism conventionally.When the mask transmission system of described large mask transfers to described large mask behind mask handing-over position, mask prealignment mechanism to mask platform, compensates by mask platform Rz adjustment of the printing plate Error Feedback to the Rz error of adjustment of the printing plate.This directly causes mask platform Rz stroke demand to increase, and the design difficulty of mask platform increases.
Therefore the problem existing for prior art, this case designer relies on the industry experience for many years of being engaged in, and active research improvement, so there has been the mask platform of inventing a kind of mask connecting mechanism and having this mask connecting mechanism.
Summary of the invention
The present invention be directed in prior art, traditional masks platform Rz stroke demand increases, and the defects such as the design difficulty increase of mask platform provide a kind of mask connecting mechanism.
Another object of the present invention is in prior art, and traditional masks platform Rz stroke demand increases, and the defects such as the design difficulty increase of mask platform provide a kind of mask platform with mask connecting mechanism.
The 3rd object of the present invention is in prior art, and traditional masks platform Rz stroke demand increases, and the defects such as the design difficulty increase of mask platform provide a kind of litho machine with described mask platform.
In order to address the above problem, the invention provides a kind of mask connecting mechanism, described mask connecting mechanism comprises: handing-over hand, its top braces is also adsorbed mask; Vertical movement mechanism, described vertical movement mechanism is fixedly connected with the bottom of described handing-over hand, and drive described handing-over hand along catenary motion; And rotating mechanism, described rotating mechanism is arranged at the bottom of described vertical movement mechanism, and drives described vertical movement mechanism and handing-over hand along Rz to rotatablely moving.
Optionally, described vertical movement mechanism further comprises: guide rail splice, and its upper surface is fixedly connected with described handing-over hand; Voice coil motor, the stator of described voice coil motor is arranged on rotating mechanism, and the mover of described voice coil motor is fixedly connected with described guide rail splice lower surface, and drives described guide rail splice along catenary motion; Guide rail, described guide rail is arranged on rotating mechanism and is provided with slide block along vertical, and described slide block is fixedly connected with described guide rail splice, for described vertical movement mechanism provides vertical movement guiding.
Optionally, between described guide rail splice and described rotating mechanism, be also provided with a resetting means, for described handing-over hand complete handing-over at described mask after, reset in zero-bit.
Optionally, described rotating mechanism further comprises: rotating bottom board, be arranged on a pedestal, and on described rotating bottom board, be fixedly connected with respectively stator and the guide rail of described voice coil motor, and make described vertical movement mechanism there is Rz to spinfunction; Coded scale, the read head of described coded scale is fixedly installed on described pedestal, and the chi band correspondence of described coded scale is arranged on described rotating bottom board, for described rotating mechanism provides position measurement; Vertical pneumatic bearing, described vertical pneumatic bearing is fixedly installed under described rotating bottom board, and provides vertical support function for described rotating bottom board; Ring-shaped guide rail, described ring-shaped guide rail is arranged between described rotating bottom board and described pedestal; Annular air-bearing, described annular air-bearing is arranged between described ring-shaped guide rail and described rotating bottom board, and provides Rz to guide function for described rotating bottom board; And linear electric motors, the stator of described linear electric motors is fixedly connected with described pedestal, and the mover of described linear electric motors is fixedly connected with described rotating bottom board, and provides Rz to driving force for described rotating mechanism.
For realizing the present invention's another object, the invention provides a kind of mask platform with described mask connecting mechanism, described mask platform along Y-direction do scanning motion, along X-direction do fine motion campaign, described mask platform comprises: hold bed, described in hold bed for carrying described mask; The first card extender and the second card extender, the both sides of holding bed described in described the first card extender and described the second card extender are separately positioned on, and by the first pneumatic bearing and the second pneumatic bearing being fixedly installed under described the first card extender and described the second card extender, be movably arranged on a base respectively; The first motor and the second motor, the stator of described the first motor and described the second motor is fixedly installed on described base, the mover of described the first motor and the second motor is fixedly connected with the second card extender with described the first card extender respectively, for described mask platform provides the driving force of moving along described mask bench scanning direction of motion and fine motion direction of motion; The first grating scale and the second grating scale, the read head of described the first grating scale and described the second grating scale or chi band are arranged at respectively on described the first card extender and the second card extender, the chi band of described the first grating scale and described the second grating scale or read head respectively correspondence are arranged on described base, for the motion control of described mask platform initialization and described the first motor and the second motor provides position measurement signal; And mask connecting mechanism, described mask connecting mechanism is fixedly installed on the place, mask handing-over position being positioned in described mask bench scanning direction of motion.
Optionally, described in hold on bed and be also fixedly installed the measurement mirror perpendicular to mask bench scanning direction of motion and fine motion direction of motion, corresponding described measurement mirror is also provided with laser interferometer measurement system, for the motion control of described mask platform provides position measurement signal.
Optionally, in described the first motor and described the second motor, at least one is rough micro-moving mechanism integrated motor.
Optionally, described the first motor and described the second motor all adopt rough micro-moving mechanism integrated motor, and it comprises respectively: coil holder, be fixedly installed on the first card extender or the second card extender, and described coil holder is provided with coarse motion coil and fine motion coil; Magnetic receiver, is arranged at intervals with coarse motion magnet and the fine motion magnet of distinguishing corresponding coarse motion coil and fine motion coil on described magnetic receiver; Have between the described coarse motion magnet of opposed polarity and form magnetic field, when described coarse motion coil passes into after electric current, described the first motor or the second motor are along scanning motion direction output drive strength; Have between the described fine motion magnet of opposed polarity and form magnetic field, when described fine motion coil passes into after electric current, described the first motor or the second motor are along fine motion direction of motion output drive strength.
Optionally, described the first grating scale and described the second grating scale comprise respectively: coarse motion grating scale, and the read head of described coarse motion grating scale and chi band arrange along scanning motion direction is corresponding respectively, and position measurement is carried out in the motion to mask platform in scanning motion direction; Fine motion grating scale, the read head of described fine motion grating scale and chi band arrange along fine motion direction of motion is corresponding respectively, and position measurement is carried out in the motion to mask platform in fine motion direction of motion.
For realizing the present invention's the 3rd object, the invention provides a kind of litho machine with described mask platform, described litho machine comprises: illuminator, described illuminator is used to the exposure device of described litho machine that exposure light source is provided; Mask platform, described mask platform is for supporting and locate described mask; Projection objective, described projection objective is assembled by many arrangements of mirrors head, forms large visual field exposure device, and by the intersection layout of each camera lens, single-lens small field of view is formed to large exposure visual field, by the pattern exposure on described mask in described substrate to be patterned; Work stage, described work stage is used for carrying described substrate to be patterned, and location and support function are provided; Laser interferometer, described laser interferometer is used to the precise motion of described mask platform and described work stage that position signalling is provided; Mask prealignment mechanism, described mask prealignment mechanism is for measuring the adjustment of the printing plate error of described mask, and provides described adjustment of the printing plate error signal to carry out adjustment of the printing plate error compensation; And mask transmission system, described mask transmission system has X-direction motor function, and provides transfer function for described mask.
In sum, mask platform of the present invention is by being fixedly installed the mask handing-over position place of described mask connecting mechanism in described mask bench scanning direction of motion, described mask connecting mechanism also has Rz and Z-direction motor function, when described mask is transferred into behind described mask handing-over position, just by described mask connecting mechanism, compensate described mask adjustment of the printing plate error, reduce the Rz stroke demand of described mask platform.Meanwhile, described mask platform has the first motor, the second motor, and the first grating scale, the second grating scale, has reduced the design difficulty of described mask platform.
Accompanying drawing explanation
Figure 1 shows that the main TV structure schematic diagram of mask platform of the present invention;
Figure 2 shows that the plan structure schematic diagram of mask platform of the present invention;
Figure 3 shows that the structural representation of mask connecting mechanism of the present invention;
Figure 4 shows that the workflow schematic diagram of mask platform of the present invention;
Figure 5 shows that the concrete structure schematic diagram of mask connecting mechanism of the present invention;
Figure 6 shows that the moving divided stator of described the first motor is from structural representation;
It described in Fig. 7, is the main TV structure schematic diagram of described the first motor;
Figure 8 shows that the structural representation of described the first grating scale;
Figure 9 shows that the litho machine structural representation with mask platform of the present invention;
Figure 10 shows that the litho machine plan structure schematic diagram with mask platform of the present invention.
Embodiment
By describe in detail the invention technology contents, structural attitude, reached object and effect, below in conjunction with embodiment and coordinate accompanying drawing to be described in detail.
Refer to Fig. 1, Fig. 2, Figure 1 shows that the main TV structure schematic diagram of mask platform of the present invention.Figure 2 shows that the plan structure schematic diagram of mask platform of the present invention.Described mask platform 1 comprises holds bed 10, described in hold bed 10 for carrying described mask 11; The first card extender 12a and the second card extender 12b, described in described the first card extender 12a and described the second card extender 12b are separately positioned on, hold bed 10 both sides and with the described adjacent layout of bed 10 of holding, described the first card extender 12a and the second card extender 12b are movably arranged on described base 14 by the first pneumatic bearing 13a and the second pneumatic bearing 13b being fixedly installed on respectively under described the first card extender 12a and described the second card extender 12b; The first motor 15a and the second motor 15b, the stator of described the first motor 15a and described the second motor 15b is fixedly installed on described base 14, the mover of described the first motor 15a and the second motor 15b with described in hold bed 10 and be fixedly connected with, described the first motor 15a and described the second motor 15b are used to described mask platform 1 to provide scanning to motion driving force, fine motion direction driving force, and by the differential driving force that fine motion direction is provided of described the first motor 15a and described the second motor 15b; The first grating scale 16a and the second grating scale 16b, the read head of described the first grating scale 16a and described the second grating scale 16b or chi band are fixedly installed on described the first card extender 12a and described the second card extender 12b; The chi band of described the first grating scale 16a and described the second grating scale 16b or read head respectively correspondence are arranged on described base 14, and described the first grating scale 16a and the second grating scale 16b are used to the control of described mask platform 1 initialization and described the first motor 15a and the second motor 15b that position measurement signal is provided; And mask connecting mechanism 17, described mask connecting mechanism 17 is fixedly installed on described base 14, and is positioned at 170 places, a mask handing-over position in described mask platform 1 scanning motion direction.
In the present embodiment, the first grating scale 16a and the second grating scale 16b are arranged on chi band (as scale grating) on base 14, and the read head that includes indication grating is arranged on and is held on bed 10.But, be not limited in actual use this mounting means, for example can select read head to be arranged on base 14, and chi band is arranged on and is held on bed 10, also can select interval that a plurality of read heads are set according to movement travel and the size relationship that holds bed 10.
Apparently, in the present invention, described the first grating scale 16a and the second grating scale 16b are used to the control of described mask platform 1 initialization and described the first motor 15a and described the second motor 15b that position measurement signal is provided.When if the measuring accuracy of described the first grating scale 16a and described the second grating scale 16b can not meet the user demand of described mask platform 1, mask platform 1 of the present invention can further comprise described in being fixedly installed on holds on bed 10 and respectively perpendicular to measurement mirror 18a, the 18b of described mask platform 1 scanning motion direction and fine motion direction of motion, and corresponding described measurement mirror 18a, 18b are also provided with the laser interferometer measurement system 19 that is used to the motion control of described mask platform 1 that position measurement signal is provided.Described laser interferometer measurement system 19 is used to the precise motion of the supporting body (not shown) of described mask platform 1 and described substrate to be patterned to control position signalling is provided.; described mask platform 1 completes after initialization by described the first grating scale 16a and described the second grating scale 16b; just switch described the first grating scale 16a and described the second grating scale 16b to laser interferometer measurement system 19, to complete the position measurement of described mask platform 1.
Refer to Fig. 3, and in conjunction with consulting Fig. 2, Figure 3 shows that the structural representation of mask connecting mechanism of the present invention.Described mask connecting mechanism 17 comprises handing-over hand 171, and described handing-over hand 171 top braces are also adsorbed described mask 11; Vertical movement mechanism 172, described vertical movement mechanism 172 is fixedly connected with the bottom of described handing-over hand 171, and drive described handing-over hand 171 along catenary motion; And rotating mechanism 173, described rotating mechanism 173 is arranged at the bottom of described vertical movement mechanism 172, and drives described vertical movement mechanism 172 and described handing-over hand 171 along Rz to rotatablely moving.
In the present invention, particularly, described handing-over hand 171 is disposed in described vertical movement mechanism 172, and is used to the absorption of described mask 11 that vacuum and support function are provided; Described vertical movement mechanism 172 is for realizing the catenary motion function of described handing-over hand 171, and provides vacuum line (not shown) for the absorption of described mask 11.
Please continue to refer to Fig. 1, and in conjunction with consulting Fig. 3, Fig. 4 in detail, the principle of work of mask connecting mechanism 17 of the present invention is described in detail.
Figure 4 shows that the workflow schematic diagram of mask platform of the present invention.In the present invention, the mode of described mask 11 by vacuum suction held on bed 10 described in being carried on.Describedly hold bed 10 and slide on described base 14 by the first pneumatic bearing 13a and the second pneumatic bearing 13b being fixedly installed on respectively under described the first card extender 12a and described the second card extender 12b.Described holding is also fixedly installed measurement mirror 18a, the 18b perpendicular to mask platform 1 scanning motion direction and fine motion direction of motion on bed 10, corresponding described measurement mirror 18a, 18b are also provided with laser interferometer measurement system 19, are used to the motion control of described mask platform 1 that position measurement signal is provided.
The motion process of the mask connecting mechanism 17 of mask platform 1 of the present invention comprises the following steps:
Execution step S1: the described mask 11 of described mask platform 1 absorption moves to 170 places, mask handing-over position in described mask platform 1 scanning motion direction;
Execution step S2: described mask connecting mechanism 17 is from described zero-bit h
0described in moving to, meet version position h
1, and open vacuum to adsorb described mask 11;
Execution step S3: measure the adjustment of the printing plate Rz error of described mask 11, and carry out adjustment of the printing plate error compensation by described rotating mechanism 173, described mask connecting mechanism 17 is from meeting version position h subsequently
1motion best friend's version position h
2, close vacuum, hold bed 10 described in simultaneously to open vacuum to adsorb described mask 11;
Execution step S4: described mask connecting mechanism 17 is from handing over version position h
2move to zero-bit h
0;
Execution step S5: described mask platform 1 moves to zero-bit h
0;
Execution step S6: described mask platform 1 is waited for the handing-over signal of mask 11, and carries out subsequent action.
Refer to Fig. 5, and in conjunction with consulting Fig. 3, Figure 5 shows that the concrete structure schematic diagram of mask connecting mechanism of the present invention.As embodiment, the vertical movement mechanism 172 of mask connecting mechanism 17 of the present invention further comprises guide rail splice 1721, and its upper surface is fixedly connected with described handing-over hand 171; Voice coil motor 1722, the stator of described voice coil motor 1722 is arranged on rotating mechanism 173, and the mover of described voice coil motor 1722 is fixedly connected with described guide rail splice 1721 lower surfaces, and drives described guide rail splice 1721 along catenary motion; Guide rail 1723, described guide rail 1723 is arranged on rotating mechanism 173 and is provided with slide block 1724 along vertical, and described slide block 1724 is fixedly connected with described guide rail splice 1721, for described vertical movement mechanism 172 provides vertical movement guiding.
Further, between described guide rail splice 1721 and described rotating mechanism 173, be also provided with a resetting means 1725, for described handing-over hand 171 complete handing-over at described mask 11 after, reset in zero-bit h
0.Please continue to refer to Fig. 3, Fig. 5, and in conjunction with consulting Fig. 2, the rotating mechanism 173 of mask connecting mechanism 17 of the present invention further comprises rotating bottom board 1731, described rotating bottom board 1731 is arranged on a pedestal 1732, on described rotating bottom board 1731, be fixedly connected with respectively stator and the guide rail 1723 of described voice coil motor 1722, and make described vertical movement mechanism 172 there is Rz to spinfunction; Coded scale 1733, the read head of described coded scale 1733 is fixedly installed on described pedestal 1732, and the chi band correspondence of described coded scale 1733 is arranged on described rotating bottom board 1731, for described rotating mechanism 173 provides position measurement; Vertical pneumatic bearing 1734, described vertical pneumatic bearing 1734 is fixedly installed on described rotating bottom board 1731 times, and provides vertical support function for described rotating bottom board 1731; Ring-shaped guide rail 1735, described ring-shaped guide rail 1735 is arranged between described rotating bottom board 1731 and described pedestal 1732; Annular air-bearing 1736, described annular air-bearing 1736 is arranged between described ring-shaped guide rail 1735 and described rotating bottom board 1731, and provides Rz to guide function for described rotating bottom board 1731; And linear electric motors 1737, the stator of described linear electric motors 1737 is fixedly connected with described pedestal 1732, and the mover of described linear electric motors 1737 is fixedly connected with described rotating bottom board 1731, and provides Rz to driving force for described rotating mechanism 173.
Please continue to refer to Fig. 1, and in conjunction with consulting Fig. 6, Fig. 7, in the present embodiment, described the first motor 15a and described the second motor 15b have identical structural design, and described the first motor 15a and described the second motor 15b are rough micro-moving mechanism integrated motor.In the present embodiment, described the first motor 15a of take sets forth as example, and described the second motor 15b has identical structure, does not repeat them here.Figure 6 shows that the moving divided stator of described the first motor is from structural representation.It described in Fig. 7, is the main TV structure schematic diagram of described the first motor.Described the first motor 15a comprises coil holder 151, described coarse motion coil 152 and described fine motion coil 153 that described coil holder 151 arranges for fixed intervals; Magnetic receiver 154, is arranged at intervals with coarse motion magnet 155 and the fine motion magnet 156 of distinguishing corresponding coarse motion coil 152 and fine motion coil 153 on described magnetic receiver 154.Have between the described coarse motion magnet 155 of opposed polarity and form magnetic field.When described coarse motion coil 152 passes into after electric current, described the first motor 15a or the second motor 15b are along scanning motion direction output drive strength.Similarly, have between the described fine motion magnet 156 of opposed polarity and form magnetic field.When described fine motion coil 153 passes into after electric current, described the first motor 15a or the second motor 15b are along fine motion direction of motion output drive strength.In the present embodiment, the magnetic pole of described coarse motion magnet 155 and described fine motion magnet 156 is only arranged as enumerating, and should not be considered as the restriction to the technical program.
Apparently, in the present invention, described the first motor 15a and described the second motor 15b can adopt linear electric motors and can be described mask platform 1 provides scanning motion direction coarse motion, the fine motion of fine motion direction of motion simultaneously, and Rz is to the motor of fine motion driving force.
Refer to Fig. 8, and in conjunction with consulting Fig. 2, in the present embodiment, described the first grating scale 16a and described the second grating scale 16b has identical structural design.In the present embodiment, described the first grating scale 16a of take sets forth as example, and described the second grating scale 16b has identical structure, does not repeat them here.Figure 8 shows that the structural representation of described the first grating scale.Described the first grating scale 16a and described the second grating scale 16b comprise respectively coarse motion grating scale, and the chi band 160 of described coarse motion grating scale and read head 161 arrange along scanning motion direction is corresponding respectively, and position measurement is carried out in the motion to mask platform 1 in scanning motion direction; Fine motion grating scale, the read head 162 of described fine motion grating scale and chi band 163 arrange along fine motion direction of motion is corresponding respectively, and position measurement is carried out in the motion to mask platform in fine motion direction of motion.Described fine motion grating scale can complete described mask platform 1 in the position measurement of fine motion direction of motion by interferential scanning or image scanning.Described coarse motion grating scale can complete described mask platform 1 in the position measurement of coarse motion direction of motion by interferential scanning or image scanning.Described the first grating scale 16a is used to the initialization of described mask platform and described the first motor 15a that control signal is provided.
In the present embodiment, the first grating scale 16a and the second grating scale 16b adopt scan-type grating only for clearly demonstrating for example technical scheme of the present invention, should not be considered as the restriction to the technical program.In actual use, those skilled in the art also can select to carry out displacement measurement as the grating scale of transmission phase formula grating or other types.
Refer to Fig. 9, Figure 10, and in conjunction with consulting Fig. 1, Fig. 2, Fig. 3, Fig. 4, Figure 9 shows that the litho machine structural representation with mask platform of the present invention.Figure 10 shows that the litho machine plan structure schematic diagram with mask platform of the present invention.Described litho machine 2 comprises illuminator 21, and described illuminator 21 is used to the exposure device of described litho machine 2 that exposure light source is provided; Mask platform 1, described mask platform 1 is for supporting and locate described mask 11; Projection objective 22, described projection objective 22 is assembled by many arrangements of mirrors head, forms large visual field exposure device, and by the intersection layout of each camera lens, single-lens small field of view is formed to large exposure visual field, by the pattern exposure on described mask 11 in described substrate to be patterned; Work stage 23, described work stage 23 is for carrying described substrate to be patterned, and location and support function are provided; Laser interferometer 24, described laser interferometer 24 is used to the precise motion of described mask platform 1 and described work stage 23 that position signalling is provided; Mask prealignment mechanism 25, described mask prealignment mechanism 25 is for measuring the adjustment of the printing plate error of described mask 11, and provides described adjustment of the printing plate error signal to carry out adjustment of the printing plate error compensation; Mask transmission system 26, described mask transmission system 26 has X-direction motor function, and provides transfer function for described mask 11.
In sum, mask platform of the present invention is by being fixedly installed the mask handing-over position place of described mask connecting mechanism in described mask bench scanning direction of motion, described mask connecting mechanism also has Rz and Z-direction motor function, when described mask is transferred into behind described mask handing-over position, just by described mask connecting mechanism, compensate described mask adjustment of the printing plate error, reduce the Rz stroke demand of described mask platform.Meanwhile, described mask platform has the first motor, the second motor, and the first grating scale, the second grating scale, has reduced the design difficulty of described mask platform.
Those skilled in the art all should be appreciated that, in the situation that not departing from the spirit or scope of the present invention, can carry out various modifications and variations to the present invention.Thereby, if when any modification or modification fall in the protection domain of appended claims and equivalent, think that the present invention contains these modifications and modification.
Claims (10)
1. a mask connecting mechanism, is characterized in that, described mask connecting mechanism comprises:
Handing-over hand, its top braces is also adsorbed mask;
Vertical movement mechanism, described vertical movement mechanism is fixedly connected with the bottom of described handing-over hand, and drive described handing-over hand along catenary motion; And,
Rotating mechanism, described rotating mechanism is arranged at the bottom of described vertical movement mechanism, and drives described vertical movement mechanism and handing-over hand along Rz to rotatablely moving.
2. mask connecting mechanism as claimed in claim 1, is characterized in that, described vertical movement mechanism further comprises:
Guide rail splice, its upper surface is fixedly connected with described handing-over hand;
Voice coil motor, the stator of described voice coil motor is arranged on rotating mechanism, and the mover of described voice coil motor is fixedly connected with described guide rail splice lower surface, and drives described guide rail splice along catenary motion;
Guide rail, described guide rail is arranged on rotating mechanism and is provided with slide block along vertical, and described slide block is fixedly connected with described guide rail splice, for described vertical movement mechanism provides vertical movement guiding.
3. mask connecting mechanism as claimed in claim 2, is characterized in that, between described guide rail splice and described rotating mechanism, is also provided with a resetting means, for described handing-over hand complete handing-over at described mask after, resets in zero-bit.
4. mask connecting mechanism as claimed in claim 2 or claim 3, is characterized in that, described rotating mechanism further comprises:
Rotating bottom board, is arranged on a pedestal, is fixedly connected with respectively stator and the guide rail of described voice coil motor on described rotating bottom board, and makes described vertical movement mechanism have Rz to spinfunction;
Coded scale, the read head of described coded scale is fixedly installed on described pedestal, and the chi band correspondence of described coded scale is arranged on described rotating bottom board, for described rotating mechanism provides position measurement;
Vertical pneumatic bearing, described vertical pneumatic bearing is fixedly installed under described rotating bottom board, and provides vertical support function for described rotating bottom board;
Ring-shaped guide rail, described ring-shaped guide rail is arranged between described rotating bottom board and described pedestal;
Annular air-bearing, described annular air-bearing is arranged between described ring-shaped guide rail and described rotating bottom board, and provides Rz to guide function for described rotating bottom board; And,
Linear electric motors, the stator of described linear electric motors is fixedly connected with described pedestal, and the mover of described linear electric motors is fixedly connected with described rotating bottom board, and provides Rz to driving force for described rotating mechanism.
5. a mask platform with mask connecting mechanism as described in arbitrary claim in claim 1～4, described mask platform along Y-direction do scanning motion, along X-direction do fine motion campaign, it is characterized in that, described mask platform comprises:
Hold bed, described in hold bed for carrying described mask;
The first card extender and the second card extender, the both sides of holding bed described in described the first card extender and described the second card extender are separately positioned on, and by the first pneumatic bearing and the second pneumatic bearing being fixedly installed under described the first card extender and described the second card extender, be movably arranged on a base respectively;
The first motor and the second motor, the stator of described the first motor and described the second motor is fixedly installed on described base, the mover of described the first motor and the second motor is fixedly connected with the second card extender with described the first card extender respectively, for described mask platform provides the driving force of moving along described mask bench scanning direction of motion and fine motion direction of motion;
The first grating scale and the second grating scale, the read head of described the first grating scale and described the second grating scale or chi band are arranged at respectively on described the first card extender and the second card extender, the chi band of described the first grating scale and described the second grating scale or read head respectively correspondence are arranged on described base, for the motion control of described mask platform initialization and described the first motor and the second motor provides position measurement signal; And,
Mask connecting mechanism, described mask connecting mechanism is fixedly installed on the place, mask handing-over position being positioned in described mask bench scanning direction of motion.
6. mask platform as claimed in claim 5, it is characterized in that, described holding is also fixedly installed the measurement mirror perpendicular to mask bench scanning direction of motion and fine motion direction of motion on bed, corresponding described measurement mirror is also provided with laser interferometer measurement system, for the motion control of described mask platform provides position measurement signal.
7. the mask platform as described in arbitrary claim in claim 5～6, is characterized in that, in described the first motor and described the second motor, at least one is rough micro-moving mechanism integrated motor.
8. mask platform as claimed in claim 7, is characterized in that, described the first motor and described the second motor all adopt rough micro-moving mechanism integrated motor, and it comprises respectively:
Coil holder, is fixedly installed on the first card extender or the second card extender, and described coil holder is provided with coarse motion coil and fine motion coil;
Magnetic receiver, is arranged at intervals with coarse motion magnet and the fine motion magnet of distinguishing corresponding coarse motion coil and fine motion coil on described magnetic receiver;
Have between the described coarse motion magnet of opposed polarity and form magnetic field, when described coarse motion coil passes into after electric current, described the first motor or the second motor are along scanning motion direction output drive strength; Have between the described fine motion magnet of opposed polarity and form magnetic field, when described fine motion coil passes into after electric current, described the first motor or the second motor are along fine motion direction of motion output drive strength.
9. the mask platform as described in arbitrary claim in claim 5～6, is characterized in that, described the first grating scale and described the second grating scale comprise respectively:
Coarse motion grating scale, the read head of described coarse motion grating scale and chi band arrange along scanning motion direction is corresponding respectively, and position measurement is carried out in the motion to mask platform in scanning motion direction;
Fine motion grating scale, the read head of described fine motion grating scale and chi band arrange along fine motion direction of motion is corresponding respectively, and position measurement is carried out in the motion to mask platform in fine motion direction of motion.
10. a litho machine with mask platform as described in arbitrary claim in claim 5～9, is characterized in that, described litho machine comprises:
Illuminator, described illuminator is used to the exposure device of described litho machine that exposure light source is provided;
Mask platform, described mask platform is for supporting and locate described mask;
Projection objective, described projection objective is assembled by many arrangements of mirrors head, forms large visual field exposure device, and by the intersection layout of each camera lens, single-lens small field of view is formed to large exposure visual field, by the pattern exposure on described mask in described substrate to be patterned;
Work stage, described work stage is used for carrying described substrate to be patterned, and location and support function are provided;
Laser interferometer, described laser interferometer is used to the precise motion of described mask platform and described work stage that position signalling is provided;
Mask prealignment mechanism, described mask prealignment mechanism is for measuring the adjustment of the printing plate error of described mask, and provides described adjustment of the printing plate error signal to carry out adjustment of the printing plate error compensation; And,
Mask transmission system, described mask transmission system has X-direction motor function, and provides transfer function for described mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210333084.1A CN103676488B (en) | 2012-09-10 | 2012-09-10 | Mask connecting mechanism and there is the mask platform of this mask connecting mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210333084.1A CN103676488B (en) | 2012-09-10 | 2012-09-10 | Mask connecting mechanism and there is the mask platform of this mask connecting mechanism |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103676488A true CN103676488A (en) | 2014-03-26 |
| CN103676488B CN103676488B (en) | 2016-02-03 |
Family
ID=50314488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210333084.1A Active CN103676488B (en) | 2012-09-10 | 2012-09-10 | Mask connecting mechanism and there is the mask platform of this mask connecting mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103676488B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103926805A (en) * | 2014-04-28 | 2014-07-16 | 清华大学 | Planar motor-driven coarse motion and fine motion integrated mask platform |
| WO2022150221A1 (en) * | 2021-01-08 | 2022-07-14 | Applied Materials, Inc. | Active linear motor parasitic force compensation |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5796469A (en) * | 1993-06-30 | 1998-08-18 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method using the same |
| CN1854909A (en) * | 2005-04-20 | 2006-11-01 | 应用菲林股份有限两合公司 | Method and apparatus for positioning a mask |
| CN101356623A (en) * | 2006-01-19 | 2009-01-28 | 株式会社尼康 | Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method |
| CN102203677A (en) * | 2009-11-25 | 2011-09-28 | 日本精工株式会社 | Exposure unit and method for exposing substrate |
-
2012
- 2012-09-10 CN CN201210333084.1A patent/CN103676488B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5796469A (en) * | 1993-06-30 | 1998-08-18 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method using the same |
| CN1854909A (en) * | 2005-04-20 | 2006-11-01 | 应用菲林股份有限两合公司 | Method and apparatus for positioning a mask |
| CN101356623A (en) * | 2006-01-19 | 2009-01-28 | 株式会社尼康 | Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method |
| CN102203677A (en) * | 2009-11-25 | 2011-09-28 | 日本精工株式会社 | Exposure unit and method for exposing substrate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103926805A (en) * | 2014-04-28 | 2014-07-16 | 清华大学 | Planar motor-driven coarse motion and fine motion integrated mask platform |
| WO2022150221A1 (en) * | 2021-01-08 | 2022-07-14 | Applied Materials, Inc. | Active linear motor parasitic force compensation |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103676488B (en) | 2016-02-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10514616B2 (en) | Movable body apparatus, exposure apparatus and device manufacturing method | |
| CN100468212C (en) | Two-sets location switching system | |
| US10983438B2 (en) | Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method | |
| CN111965948B (en) | Exposure apparatus, exposure method, method for manufacturing flat panel display, and method for manufacturing device | |
| KR102226989B1 (en) | Substrate treatment device, substrate treatment method, light exposure method, light exposure device, method for manufacturing device, and method for manufacturing flat panel display | |
| JP2009537969A (en) | Accurate positioning system in dual stage exchange exposure | |
| CN104133347A (en) | Exposure apparatus and exposure method | |
| CN101571675A (en) | Balancing and positioning system for workpiece platform of photoetching machine | |
| US20110244396A1 (en) | Exposure apparatus, exchange method of object, exposure method, and device manufacturing method | |
| US20200096879A1 (en) | Movable body apparatus, exposure apparatus, manufacturing method of flat-panel display and device manufacturing method, and movement method of object | |
| CN102955368B (en) | A kind of stepping lithographic equipment and method of photolithographic exposure | |
| TW201823882A (en) | Movable body apparatus, moving method, exposure apparatus, exposure method, manufacturing method of flat panel display, and device manufacturing method | |
| CN103676488B (en) | Mask connecting mechanism and there is the mask platform of this mask connecting mechanism | |
| CN102117016A (en) | Device for measuring position of mask table of scanning lithography machine | |
| CN102768470A (en) | Reticle stage vertical measuring apparatus | |
| CN113835308A (en) | Splicing exposure method, device and system | |
| CN103969959B (en) | Vertical cable support means for lithographic equipment | |
| CN114624964A (en) | Exposure method and device | |
| CN103376667B (en) | A kind of mask platform for exposure device | |
| KR102320293B1 (en) | A moving body apparatus, a moving method, an exposure apparatus, an exposure method, a manufacturing method of a flat panel display, and a device manufacturing method | |
| CN104570592A (en) | Device and method for shaping large mask plate | |
| CN103019035B (en) | There is the mask platform of mask handing-over defencive function, method and lithographic equipment | |
| TW201643557A (en) | Exposure apparatus, manufacturing method of flat panel display, device manufacturing method, and exposure method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder |