CN103019035B - There is the mask platform of mask handing-over defencive function, method and lithographic equipment - Google Patents

There is the mask platform of mask handing-over defencive function, method and lithographic equipment Download PDF

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Publication number
CN103019035B
CN103019035B CN201110282348.0A CN201110282348A CN103019035B CN 103019035 B CN103019035 B CN 103019035B CN 201110282348 A CN201110282348 A CN 201110282348A CN 103019035 B CN103019035 B CN 103019035B
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Prior art keywords
mask
platform
handing
motion
stationary installation
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CN201110282348.0A
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CN103019035A (en
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江旭初
李生强
董俊清
徐涛
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

The present invention discloses a kind of mask platform with mask handing-over defencive function, is arranged on a base station, comprises: sports platform, carrying mask; Driving mechanism, the relative base station motion of actuation movement platform; One mask handing-over protection module, comprise the stationary installation be fixed on base station and the locating device being fixedly connected with wafer-supporting platform, described stationary installation is provided with a movable tight lock part, fixes described wafer-supporting platform when this tight lock part connects described locating device.The present invention discloses simultaneously and a kind ofly uses this method of mask platform with handing-over defencive function and a kind of lithographic equipment.

Description

There is the mask platform of mask handing-over defencive function, method and lithographic equipment
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, particularly relate to and a kind of there is the mask handing-over mask platform of defencive function, method and lithographic equipment.
Background technology
Lithographic equipment of the prior art, is mainly used in the manufacture of integrated circuit (IC) or other microdevice.The multi-layer mask with different mask pattern being imaged on successively under accurately aiming at by lithographic equipment is coated with on the wafer of photoresist, such as semiconductor wafer or LCD plate.Lithographic equipment is divided into two classes substantially, one class is stepping lithographic equipment, mask pattern single exposure is imaged on an exposure area of wafer, wafer moves relative to mask subsequently, next exposure area is moved to below mask pattern and projection objective, again mask pattern is exposed on another exposure area of wafer, repeats this process until all exposure areas all have the picture of mask pattern on wafer.Another kind of is step-scan lithographic equipment, and in above process, mask pattern is not single exposure imaging, but passes through the scanning mobile imaging of projection light field.In mask pattern imaging process, mask and wafer move relative to optical projection system and projected light beam simultaneously.In above-mentioned lithographic equipment, need have the carrier of corresponding device as mask and silicon chip, the carrier being mounted with mask/silicon chip produces accurate motion mutually and meets photoetching needs.The carrier of aforementioned mask version is referred to as and holds bed, and the carrier of silicon chip/substrate is referred to as wafer-supporting platform.Holding in the mask platform subsystem and work stage subsystem that bed and wafer-supporting platform lay respectively at lithographic equipment, is the nucleus module of above-mentioned subsystem.
In scanning photoetching device, mask platform is generally consisted of micropositioner and coarse motion platform, and micropositioner completes the Precision trimming of mask, and coarse motion platform completes the Long Distances scan exposure motion of mask.Along with the continuous pursuit in the industry for productive rate; the positioning precision of mask platform, scanning motion speed and acceleration demand improve constantly; in the design of mask platform; for the mask of high-speed motion; its protective device is also particularly important; especially, when mask joins, the protection requirement improving mask is more needed.
In patent EP772800B1, a kind of mask platform structure is proposed, as shown in Figure 1.By being formed with different layouts by three groups of coils, there is planar motor; form micropositioner; and level can be cancelled to guide piece; well solve the problem of coarse motion platform heap micropositioner disturbance; but this mask platform does not have mask handing-over protection, and when joining for mask, the safety of mask is not considered.In patent US6741332, another kind of mask platform structure is proposed, as shown in Figure 2.Three groups of voice coil motors form level to inching gear, and solve the coupled problem between micropositioner and coarse motion platform by a kind of flexible structure, and reduce the disturbance of coarse motion platform to micropositioner by balance mass block.But the safety problem of mask when this patent does not also consider that mask joins equally.
In view of this, need badly in prior art and want a kind of mask platform structure, effectively can solve the safety problem of mask during mask handing-over.
Summary of the invention
In order to overcome the defect existed in prior art, the invention provides a kind of mask platform with mask handing-over defencive function, effectively can solve the safety problem of mask during mask handing-over.
In order to realize foregoing invention object, the present invention discloses a kind of mask platform with mask handing-over defencive function, is arranged on a base station, comprises: sports platform, carrying mask; Driving mechanism, the relative base station motion of actuation movement platform; One mask handing-over protection module, comprise the stationary installation be fixed on base station and the locating device being fixedly connected with wafer-supporting platform, described stationary installation is provided with a movable tight lock part, fixes described wafer-supporting platform when this tight lock part connects described locating device.
Further, the micropositioner that the coarse motion platform that described sports platform comprises the motion of relative base station moves with relative coarse motion platform, the locating device of described mask handing-over protection module is fixed on coarse motion platform.Described driving mechanism comprises the first telecontrol equipment of driving coarse motion platform to move along Y-direction and drives micropositioner along X, Y, RZ to the second telecontrol equipment moved.Described first telecontrol equipment is for providing the linear electric motors of Y-direction rectilinear motion, and described second telecontrol equipment is for providing X, Y, RZ to the X of motion to motor and Y-direction motor.Tight lock part in described stationary installation is a register pin.Described stationary installation controls the stretching motion of register pin by a straight-line motion mechanism.Described straight-line motion mechanism is linear electric motors.Described locating device is a fender comprising a pilot hole, and this pilot hole matches with the tight lock part of described stationary installation.
The present invention discloses a kind of method that use has the mask platform of mask handing-over defencive function simultaneously, comprising: make the second telecontrol equipment move to mask delivery position; Open described mask handing-over protection module, described stationary installation is connected with described locating device; Complete mask adjustment of the printing plate or lower version; Close described mask handing-over protection module, described stationary installation is separated with described locating device.
The present invention also discloses a kind of lithographic equipment, comprising: a lighting unit, for providing exposing light beam; One mask platform, for supporting a mask; One work stage, for supporting a substrate and providing six-freedom motion; One projection objective, for being projected to substrate by a certain percentage by figure on mask; The structure of this mask platform as previously mentioned.
Compared with prior art, provided by the present invention have the mask handing-over mask platform of defencive function, method and lithographic equipment, available protecting mask platform can not produce damage to mask completing in mask handshaking.Avoid the mask plate being worth costliness to cause damage because of machinery or artificial error.And this mask platform with mask handing-over defencive function is simple for structure, and engineering cost is lower.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is a kind of mask platform structure of the prior art;
Fig. 2 is another kind of mask platform structure in prior art;
Fig. 3 is the structural representation of illustrated lithographic equipment;
Fig. 4 is the illustrated structural representation with the mask platform of mask handing-over defencive function;
Fig. 5 is the illustrated side view with the mask platform of mask handing-over defencive function;
Fig. 6 is the illustrated workflow diagram with the mask platform of mask handing-over defencive function.
Embodiment
Below in conjunction with accompanying drawing describe in detail a kind of specific embodiment of the present invention the mask platform with mask handing-over defencive function, use this to have the mask handing-over method of defencive function and lithographic equipment.But, the present invention should be understood as and be not limited to this embodiment described below, and technical concept of the present invention can combine with other known technologies or function other technologies identical with those known technologies and implements.
In the following description, in order to clear displaying structure of the present invention and working method, to be described by many Directional words, but should by "front", "rear", "left", "right", " outward ", " interior ", " outwards ", " inwardly ", " on ", the Word Understanding such as D score for convenience of term, and not should be understood to word of limitation.In addition, used in the following description " Y-direction " word mainly refers to level to parallel direction, " X-direction " one word mainly refer to level to parallel and vertical with Y-direction direction.
As shown in Figure 4, Fig. 4 is the illustrated structural representation with the mask platform of mask handing-over defencive function.Mask handing-over defencive function refers to when mask is placed on mask platform or is removed from mask platform, the function of available protecting mask.Fig. 4 is mask platform structural representation of the present invention, and this composition with the mask platform of mould handing-over defencive function mainly comprises: micropositioner 201, fine motion motor 202, coarse motion motor 203, coarse motion platform 204, mask handing-over protective device 205.Fine motion motor 202 is installed on micropositioner 201, completes the Precision trimming of mask R, and coarse motion motor 204 is installed on coarse motion platform, as the drive unit of coarse motion platform, drives micropositioner 201 and coarse motion platform 204 to complete Long Distances scanning motion along Y-direction.Mask handing-over protective device 205 is installed on coarse motion platform 204 side, completes mask defencive function during mask handing-over.When in mask handshaking; namely mask joins protective device by driving mask in upper or bottom sheet process; being inserted into by register pin in pilot hole thus pinning coarse motion platform, preventing mask platform when mask joins, mask damages because coarse motion motor occurs unexpected.When coarse motion platform does not need locking, register pin is return by straight-line motion mechanism, and the motion of coarse motion platform is unrestricted.Thus the protection added in structural design and workflow mask.
Please also refer to Fig. 5 to the explanation with the mask platform of mask handing-over defencive function shown in Fig. 4 below, Fig. 5 is the illustrated side view with the mask platform of mask handing-over defencive function.This mask handing-over protective device 205 comprises fender 301, pilot hole 302, register pin 304, straight-line motion mechanism 303.Fender 301 is fixed on coarse motion platform 204, and straight-line motion mechanism 303 drives register pin 304 along X to carrying out rectilinear motion.When micropositioner 201 move to handing-over position carry out mask handing-over time, by driving straight-line motion mechanism 303, register pin 304 being inserted in pilot hole 302, pinning coarse motion platform 204, ensure that the safety of mask during handing-over.When coarse motion platform 204 does not need locking, register pin 304 is return by straight-line motion mechanism 303, and the motion of coarse motion platform 204 is unrestricted.
Fig. 3 is the lithographic equipment of the mask platform with this mask handing-over defencive function.Shown in Fig. 3 is typical scanning photoetching device in lithographic equipment.The core component of this scanning photoetching machine comprises: illumination 101; Mask platform 102; Projection objective 103, work stage 104, framework 105, vibration damper 106.Projection objective 103 times, the scanning motion that the mask platform 102 that carry mask R is contrary with the work stage 104 times travel directions that carry silicon chip/substrate (S), by the graph exposure on mask on silicon chip/substrate.
Fig. 6 is the illustrated workflow diagram with the mask platform of mask handing-over defencive function.
First drive micropositioner to move to delivery position S401, then open mask handing-over protective device S402.If this mask platform adjustment of the printing plate first, then enter adjustment of the printing plate step S404, otherwise be introduced into step S403, carry out version under mask, then enter step S404, carry out mask adjustment of the printing plate.Close mask handing-over protective device S405, complete mask registration S406 and scan exposure S407.Need to carry out version S408 under mask after completing steps S407, then repeat step S401.
Provided by the present invention have the mask handing-over mask platform of defencive function, method and lithographic equipment, available protecting mask platform can not produce damage to mask completing in mask handshaking.Avoid the mask plate being worth costliness to cause damage because of machinery or artificial error.And this mask platform with mask handing-over defencive function is simple for structure, and engineering cost is lower.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.

Claims (9)

1. there is a mask platform for mask handing-over defencive function, be arranged on a base station, it is characterized in that, comprising:
Sports platform, carrying mask;
Driving mechanism, the relative base station motion of actuation movement platform;
One mask handing-over protection module, comprise the stationary installation be fixed on base station and the locating device being fixedly connected with sports platform, described stationary installation is provided with a movable tight lock part, this tight lock part can connect with described locating device or be separated, and fixes described sports platform when this tight lock part connects described locating device;
The micropositioner that the coarse motion platform that described sports platform comprises the motion of relative base station moves with relative coarse motion platform, the locating device of described mask handing-over protection module is fixed on coarse motion platform.
2. mask platform as claimed in claim 1, is characterized in that, described driving mechanism comprises the first telecontrol equipment of driving coarse motion platform to move along Y-direction and drives micropositioner along X, Y, RZ to the second telecontrol equipment moved.
3. mask platform as claimed in claim 2, is characterized in that, described first telecontrol equipment is for providing the linear electric motors of Y-direction rectilinear motion, and described second telecontrol equipment is for providing X, Y, RZ to the X of motion to motor and Y-direction motor.
4. mask platform as claimed in claim 1, is characterized in that, the tight lock part in described stationary installation is a register pin.
5. mask platform as claimed in claim 4, is characterized in that, described stationary installation controls the stretching motion of register pin by a straight-line motion mechanism.
6. mask platform as claimed in claim 5, is characterized in that, described straight-line motion mechanism is linear electric motors.
7. mask platform as claimed in claim 1, is characterized in that, described locating device is a fender comprising a pilot hole, and this pilot hole matches with the tight lock part of described stationary installation.
8. use a method for the mask platform as described in any one of claim 1 to 7, it is characterized in that, comprising:
The second telecontrol equipment is made to move to mask delivery position;
Open described mask handing-over protection module, described stationary installation is connected with described locating device;
Complete mask adjustment of the printing plate or lower version;
Close described mask handing-over protection module, described stationary installation is separated with described locating device.
9. a lithographic equipment, comprising:
One lighting unit, for providing exposing light beam;
One mask platform, for supporting a mask;
One work stage, for supporting a substrate and providing six-freedom motion;
One projection objective, for being projected to substrate by a certain percentage by figure on mask;
It is characterized in that, the structure of described mask platform is as described in any one of claim 1 to 8.
CN201110282348.0A 2011-09-22 2011-09-22 There is the mask platform of mask handing-over defencive function, method and lithographic equipment Active CN103019035B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112578639B (en) * 2019-09-29 2022-02-15 上海微电子装备(集团)股份有限公司 Limiting mechanism, mask table and photoetching machine

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101105635A (en) * 2006-07-10 2008-01-16 日本精工株式会社 Exposure device and exposure method
CN101221366A (en) * 2007-12-28 2008-07-16 上海微电子装备有限公司 6-freedom micro-motion platform capable of isolating exterior vibration
CN101487989A (en) * 2009-02-27 2009-07-22 上海微电子装备有限公司 Six-freedom precise positioning platform

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101105635A (en) * 2006-07-10 2008-01-16 日本精工株式会社 Exposure device and exposure method
CN101221366A (en) * 2007-12-28 2008-07-16 上海微电子装备有限公司 6-freedom micro-motion platform capable of isolating exterior vibration
CN101487989A (en) * 2009-02-27 2009-07-22 上海微电子装备有限公司 Six-freedom precise positioning platform

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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525

Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd

Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525

Patentee before: Shanghai Micro Electronics Equipment Co., Ltd.