WO2020019653A1 - Cantilevered double-table double-sided digital exposure system and exposure method - Google Patents

Cantilevered double-table double-sided digital exposure system and exposure method Download PDF

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Publication number
WO2020019653A1
WO2020019653A1 PCT/CN2018/122484 CN2018122484W WO2020019653A1 WO 2020019653 A1 WO2020019653 A1 WO 2020019653A1 CN 2018122484 W CN2018122484 W CN 2018122484W WO 2020019653 A1 WO2020019653 A1 WO 2020019653A1
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WIPO (PCT)
Prior art keywords
exposure
loading
moving plate
double
loading platform
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Application number
PCT/CN2018/122484
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French (fr)
Chinese (zh)
Inventor
汪孝军
廖平强
Original Assignee
中山新诺科技股份有限公司
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Priority to CN201810836042.7 priority Critical
Priority to CN201810836042.7A priority patent/CN108873621B/en
Application filed by 中山新诺科技股份有限公司 filed Critical 中山新诺科技股份有限公司
Publication of WO2020019653A1 publication Critical patent/WO2020019653A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor

Abstract

Provided are a double-sided exposure machine and a double-sided exposure method. The double-sided exposure machine comprises: a mounting frame; a first exposure component (210) and a second exposure component (220) provided at two sides of the mounting frame, respectively; a first loading table (310) and a second loading table (320); and a driving mechanism, the driving mechanism comprising a driving assembly, the first loading table (310) and the second loading table (320) passing through an exposure area in a first motion state and a second motion state, respectively. During exposure, the first loading platform (310) moves along a first circular path and passes through the exposure area in the first motion state, so as to expose a first member to be exposed (410), and the second loading platform (320) moves along a second circular path and passes through the exposure area in the second motion state, so as to expose a second member to be exposed (420). Both the first loading platform (310) and the second loading platform (320) are in circular motion, and while said second member (420) is being exposed, the unloading of a first exposed finished product or the loading of a next first member to be exposed can also be performed, thereby having high exposure efficiency. Compared with the traditional double-sided exposure method by means of flipping, the present invention has high exposure precision.

Description

Cantilever-type double-stage double-sided digital exposure system and exposure method Technical field

The invention relates to the technical field of double-sided exposure, in particular to a double-sided exposure machine and a double-sided exposure method.

Background technique

Conventional double-sided exposure machines usually use film transfer to expose double-sided circuit boards. Before the exposure, you need to make the film with the pattern to be transferred. Then, fix the film with the pattern on both sides to the upper and lower glass. Then, sandwich the circuit board with the pattern to be transferred between the upper and lower glass. The blue-violet high-brightness light source is exposed, and the circuit pattern is transferred to the circuit board to complete double-sided exposure. For laser direct writing exposure machines, single-sided exposure is usually used. First, one side of the circuit board is exposed, and after the exposure is completed, the other side is flipped, and then the other side of the circuit board is exposed, and finally the double-sided exposure of the circuit board is completed.

However, the laser direct writing exposure machine needs to perform a flip operation when performing double-sided exposure, and the flip operation will inevitably cause the problem of alignment after the flip, which not only increases the exposure process, but also affects the exposure accuracy due to the alignment accuracy problem. Thus affecting the final exposure effect.

Summary of the Invention

Based on this, it is necessary to provide a double-sided exposure machine and a double-sided exposure method. The double-sided exposure machine does not need to be reversed during exposure, reduces the exposure process, improves the exposure accuracy, and then improves the imaging quality of the exposure. The double-sided exposure method is applied to the aforementioned double-sided exposure machine, which has higher exposure efficiency and facilitates automated operations. .

Its technical scheme is as follows:

In one aspect, a double-sided exposure machine is provided, which includes a mounting frame; an exposure mechanism, the exposure mechanism includes a first exposure component and a second exposure component respectively disposed on two sides of the mounting frame, and the first exposure component and the second exposure component are opposite to each other; Setting and forming an exposure area; a loading mechanism, the loading mechanism includes a first loading stage and a second loading stage, and the first loading stage and the second loading stage are movably connected to the mounting frame; and a driving mechanism, the driving mechanism includes a driving assembly; The component drives the first loading platform to move in a first circular trajectory, and causes the first loading platform to perform exposure through the exposure area when in the first motion state; the driving component also drives the second loading platform to move in a second circular trajectory, and causes the second When the loading stage is in the second motion state, exposure is performed through the exposure area.

In the above-mentioned double-sided exposure machine, when exposed, the first loading stage moves in a first circular trajectory, and passes through the exposure area during the first movement state to expose the first to-be-exposed piece, and the second loading stage uses the second The cyclic trajectory moves and passes through the exposure area to expose the second to-be-exposed piece in the second movement state. Both the first loading stage and the second loading stage are cyclically moved, and the second to-be-exposed piece can also be subjected to the first The unloading of one exposure finished product or the loading of the next first to-be-exposed part has higher exposure efficiency, and the exposure accuracy is also higher than that of the traditional method of reversing double-sided exposure.

The technical solution is further described below:

In one embodiment, the first loading stage and the second loading stage are respectively disposed on two sides of the mounting frame, and the driving assembly further includes a first driving assembly and a second driving assembly. The first driving assembly is configured to drive the first loading station. The first loading platform is caused to move in a first cyclic trajectory, and the second driving component is used to drive the second loading platform and to move the second loading platform in a second cyclic trajectory.

In one embodiment, the loading mechanism further includes a first moving plate and a second moving plate, and both the first moving plate and the second moving plate are movably connected to the mounting frame;

The first loading platform is disposed on the first moving board and is movably connected to the first moving board. The first driving assembly includes a first driving member and a second driving member. The first driving member is used to drive the first moving board to move on the mounting frame. The second driving member is used to drive the first loading platform to move on the first moving plate, and the first moving plate and the first loading platform move together to move the first loading platform along the first circular trajectory;

The second loading platform is disposed on the second moving plate and is movably connected to the second moving plate. The second driving assembly includes a third driving member and a fourth driving member. The third driving member is used to drive the second moving plate to move on the mounting frame. The fourth driving member is used to drive the second loading platform to move on the second moving plate, and the second moving plate and the second loading platform move in cooperation to move the second loading platform along the second circulation track.

In one of the embodiments, the mounting frame is provided with a first slide rail and a second slide rail, the first moving plate is provided with a first slide groove cooperating with the first slide rail, and the second moving plate is provided with a second slide rail. Second chute

Or the first movement plate is provided with a first guide rod, the first loading platform is provided with a first guide hole that cooperates with the first guide rod, the second movement plate is provided with a second guide rod, and the second loading platform is provided with a second guide rod A second guide hole fitted with the guide rod.

In one of the embodiments, it further includes a sensing mechanism. The sensing mechanism includes a first sensor, a second sensor, a third sensor, and a fourth sensor. The first sensor is used to detect the movement position of the first motion board. The second sensor The third sensor is used for detecting the moving position of the first loading platform, the third sensor is used for detecting the moving position of the second moving plate, and the fourth sensor is used for detecting the moving position of the second loading platform.

In one embodiment, it further includes a control mechanism. The control mechanism includes a controller, a first exposure module, a second exposure module, a first driving member, a second driving member, a third driving member, a fourth driving member, and a first The sensor, the second sensor, the third sensor, and the fourth sensor are all electrically connected to the controller.

In one embodiment, the first loading platform is provided with a first loading portion, and the second loading platform is provided with a second loading portion.

On the other hand, a double-sided exposure method is also provided, which can be applied to the double-sided exposure machine according to any one of the above technical solutions, and includes the following steps:

(S1), the first loading stage is located at the first initial position, the second loading stage is located at the second initial position, and the first to-be-exposed part is loaded on the first loading stage;

(S2), the first loading stage moves to the first exposure position in a first circular trajectory, so that the first to-be-exposed piece is located in the exposure area;

(S3), the first exposure component and the second exposure component expose the first to-be-exposed piece and obtain a first-exposure finished product; at the same time, load the second to-be-exposed piece on a second loading table;

(S4): The first loading platform moves along the first circular trajectory to the first initial position, and unloads the first exposed finished product;

(S5): The second loading stage moves along the second circular trajectory to the second exposure position, so that the second to-be-exposed piece is located in the exposure area;

(S6), the first exposure component and the second exposure component expose the second to-be-exposed part and obtain a second exposure finished product; at the same time, load the next first to-be-exposed part on the first loading table;

(S7): The second loading table moves along the second trajectory to the second initial position, and unloads the second exposed product.

In the above-mentioned double-sided exposure method, the first to-be-exposed piece and the second to-be-exposed piece are sequentially exposed through the cyclic movement of the first loading stage and the second loading stage, which is convenient for automatic operation, and when the second to-be-exposed piece is exposed, The loading of the next first to-be-exposed piece can be performed synchronously to improve the time utilization efficiency during exposure and the exposure efficiency.

BRIEF DESCRIPTION OF THE DRAWINGS

1 is an exposure flowchart of a double-sided exposure method in an embodiment;

2 is a front view of the overall structure of a double-sided exposure machine in the embodiment;

FIG. 3 is a plan view of the overall structure of the double-sided exposure machine in the embodiment.

Drawings description:

100. Mounting frame, 210, first exposure module, 220, second exposure module, 310, first loading table, 320, second loading table, 330, first moving plate, 340, second moving plate, 410, first One to be exposed, 420, the second to be exposed.

detailed description

The embodiments of the present invention will be described in detail below with reference to the drawings:

It should be noted that when the element referred to in the text is “fixed” with another element, it may be directly on the other element or a centered element may exist. When an element is considered to be "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and are not meant to be the only implementations.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terms used herein in the description of the present invention are only for the purpose of describing specific embodiments, and are not intended to limit the present invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

As shown in the embodiment shown in FIG. 1 to FIG. 3, a double-sided exposure machine is provided, which includes a mounting bracket 100; an exposure mechanism, the exposure mechanism includes a first exposure module 210 and a second exposure respectively disposed on two sides of the mounting bracket 100; Module 220, first exposure module 210 and second exposure module 220 are oppositely disposed and form an exposure area; loading mechanism, loading mechanism includes first loading stage 310 and second loading stage 320, first loading stage 310 and second loading stage All 320 are movably connected to the mounting frame 100; and a driving mechanism including a driving component; the driving component drives the first loading platform 310 to move in a first circular trajectory, and causes the first loading platform 310 to pass through the exposure area in the first motion state Exposure is performed; the driving assembly also drives the second loading stage 320 to move in a second trajectory, and causes the second loading stage 320 to perform exposure through the exposure area in the second motion state.

When exposed, the first loading stage 310 moves in a first circular trajectory, and passes through the exposure area in the first movement state to expose the first to-be-exposed piece 410, and the second loading stage 320 moves in a second circular trajectory. And in the second motion state, through the exposure area to expose the second to-be-exposed piece 420, the first loading stage 310 and the second loading stage 320 are cyclically moved, and the second to-be-exposed piece 420 can also be exposed during exposure The unloading of the first exposure finished product or the loading of the next first to-be-exposed piece 410 has higher exposure efficiency, and the exposure accuracy is also higher than that of the conventional method of reversing double-sided exposure.

The traditional laser direct writing exposure machine can only be exposed on one side, and cannot be exposed on both sides at the same time. After exposing one side, it needs to be flipped to expose the other side. Due to the need for flipping, not only the process flow is too much, but the flipping wastes time. Exposure efficiency is low, and alignment is required after flipping, which easily affects exposure accuracy due to alignment accuracy issues. At the same time, traditional double-sided exposure mostly uses film transfer, film production also increases the process flow, and film production costs are high, and film use It must be replaced after a period of time.

In this embodiment, the first exposure module 210 and the second exposure module 220 are respectively disposed on both sides of the mounting frame 100, the first exposure module 210 and the second exposure module 220 are oppositely disposed, and an exposure area is formed in the mounting frame 100, When the first loading stage 310 or the second loading stage 320 passes, the first to-be-exposed piece 410 on the first loading stage 310 or the second to-be-exposed piece 420 on the second loading stage 320 can be exposed. The opposite arrangement of the first exposure component 210 and the second exposure component 220 here means that the light-emitting end of the first exposure component 210 and the light-emitting end surface of the second exposure component 220 are oppositely disposed and spaced apart to form an exposure area therebetween. The technical effect of realizing front and back exposure at one time during exposure.

The first loading platform 310 and the second loading platform 320 are movably connected to the mounting frame 100. The first loading platform 310 and the second loading platform 320 move along the first and second circulation trajectories, respectively, so as to realize the first loading platform 310 And the cyclic movement of the second loading table 320. When the first loading stage 310 is in the first movement state of the first circular trajectory, the first loading stage 310 is located in the exposure area, and the first to-be-exposed piece 410 is exposed. At this time, the second loading stage 320 is at the second stage. The cyclic track moves and is not in the exposure area. At this time, the second loading table 320 can be unloaded and the exposed exposure piece completed or the next exposure piece to be exposed can be loaded. When the second loading table 320 is in the second section of the second cyclic track, In the second motion state, the second loading stage 320 is located in the exposure area and exposes the second to-be-exposed member 420. At this time, the first loading stage 310 moves on the first circulation track and has left the exposure area. At this time, The first exposure finished product that has been exposed on the first loading table 310 may be unloaded, and the next first to-be-exposed piece 410 may be loaded. Through this operation, the unloading or loading operation on the first loading platform 310 is performed while the second to-be-exposed member 420 on the second loading platform 320 is exposed, and the exposure efficiency is improved. Both the first loading stage 310 and the second loading stage 320 are cyclically moved, which facilitates the realization of automated operations, which can further improve the exposure efficiency and automation level, realize the standardization of the operation procedure of the exposure operation process, reduce the manual operation process, and reduce the labor. cost.

Further, the first exposure component 210 and the second exposure component 220 are both fixedly disposed. As shown in FIGS. 2 and 3, the first exposure module 210 and the second exposure module 220 are fixed on the mounting frame 100 up and down, and an exposure area is formed inside the mounting frame 100.

During installation, it is necessary to ensure the installation accuracy of the first exposure module 210 and the second exposure module 220 to ensure the corresponding position accuracy of the first exposure module 210 and the second exposure module 220 to improve the alignment accuracy of subsequent exposure patterns. The traditional double-sided exposure method in which the object to be exposed is flipped and repositioned has higher exposure accuracy.

In addition, as shown in FIG. 3, the first exposure module 210 includes a first exposure element and a second exposure element. The first exposure element is provided with a plurality of first light source elements. The first light source elements are arranged at a distance and arranged in a row. The second exposure element is provided with a plurality of second light source elements, the second light source elements are arranged at a distance and arranged in a row, and the first light source element and the second light source element are arranged side by side and are staggered (as shown in FIG. 3, The left end of the first exposure element and the left end of the second exposure element are not aligned, but are staggered by a certain distance), so that the setting position of one first light source element corresponds to the position of the gap between the two second light source elements; the second The exposure component 220 can be set in the same way, and is not repeated here.

In this way, the exposure patterns during the exposure are accurately docked, and a required exposure image is formed, thereby further improving the exposure accuracy.

Optionally, the first exposure module 210 and the second exposure module 220 form a maskless exposure system (Digital Micromirror Device, DMD exposure system for short). The maskless exposure system enlarges an image through a projection objective to realize a one-time exposure. DMD The arrangement number of the first light source element and the second light source element of the exposure system is determined according to the size of the exposure pattern, and the exposure accuracy is higher.

It should be noted that, because the first to-be-exposed member 410 or the second to-be-exposed member 420 is exposed in the exposure area, both the light emitted by the first exposure module 210 and the light emitted by the second exposure module 220 must reach the first to-be-exposed. Piece 410 or the second to-be-exposed piece 420. Therefore, the first loading part or the second loading part should be provided to expose the front and back areas of the first to-be-exposed member 410 or the front and back exposure areas of the second to-be-exposed member 420 so as to meet the exposure requirements. If the first loading part is provided in a frame structure, the first to-be-exposed piece 410 is provided on the outer frame of the first loading part, so that the middle of the frame is unobstructed, so that light can be irradiated to the front and back areas of the first to-be-exposed piece 410. Normal front and back exposure; for example, the first loading section is a loading slot, etc. This is a structure that must be set by those skilled in the art according to needs. Any existing technology that can meet the setting requirements can be used for specific settings. Here No longer.

As shown in the embodiment shown in FIG. 2 and FIG. 3, the first loading platform 310 and the second loading platform 320 are respectively disposed on two sides of the mounting frame 100, and the driving assembly further includes a first driving assembly and a second driving assembly. The component is used to drive the first loading platform 310 to move the first loading platform 310 in a first circular trajectory, and the second driving component is used to drive the second loading platform 320 and move the second loading platform 320 in a second circular trajectory.

The first circular trajectory and the second circular trajectory may be rectangular trajectories, or other trajectories that can meet requirements, such as circular trajectories, and those skilled in the art may make specific settings according to requirements.

For example, the first cycle track is a rectangular track. At this time, the mounting bracket 100 is provided with a first rectangular track groove and a second rectangular track groove, and the first driving assembly drives the first loading platform 310 to move along the first rectangular track groove, and causes the first loading platform 310 to follow the first circular track. The movement realizes the exposure on the first to-be-exposed piece 410; the second trajectory is the same, and is not repeated here.

In fact, the first loading platform 310 and the second loading platform 320 may also be disposed on the same side of the mounting frame 100. At this time, the first rectangular track slot is nested in the second rectangular track slot, or the second rectangular track slot is nested in the first rectangular track slot, that is, the length and width dimensions of the first rectangular track slot and the second rectangular track slot The length and width dimensions of the first circular track groove are different from those of the second circular track groove, and those skilled in the art should pay attention to the first loading platform 310 and the second loading when designing. The specific setting of the stage 320 is to avoid interference during the movement, which is not repeated here.

As shown in the embodiment shown in FIG. 2, the loading mechanism further includes a first moving plate 330 and a second moving plate 340. Both the first moving plate 330 and the second moving plate 340 are movably connected to the mounting frame 100; The first moving board 330 is movably connected to the first moving board 330. The first driving component includes a first driving member and a second driving member. The first driving member is used for driving the first moving board 330 to move on the mounting frame 100. The second driving member is configured to drive the first loading platform 310 to move on the first moving plate 330, and the first moving plate 330 and the first loading platform 310 cooperate to move the first loading platform 310 along a first circular trajectory;

The second loading platform 320 is disposed on the second moving plate 340 and is movably connected to the second moving plate 340. The second driving assembly includes a third driving member and a fourth driving member, and the third driving member is used to drive the second moving plate 340. When the mounting bracket 100 moves, the fourth driving member is used to drive the second loading platform 320 to move on the second moving plate 340, and the second moving plate 340 and the second loading platform 320 move together to make the second loading platform 320 along the second cycle Track motion.

As shown in FIG. 2, the first driving member can drive the first moving plate 330 to move back and forth on the left side of the mounting bracket 100, and the second driving member can drive the first loading platform 310 to move up and down on the first moving plate 330. The third driving member can drive the second moving plate 340 to move back and forth on the right side of the mounting bracket 100, and the fourth driving member can drive the second loading table 320 to move up and down on the second moving plate 340.

By the driving action of the first driving member, the second driving member, the third driving member, and the fourth driving member, the first moving plate 330, the second moving plate 340, the first loading platform 310, and the second loading platform 320 are cooperatively moved. Then, the first loading platform 310 is moved along a rectangular first movement track, and the second loading platform 320 is moved along a rectangular second movement track.

As shown in FIG. 2 and FIG. 3, the up and down movement areas of the first loading stage 310 and the second loading stage 320 are located in the up and down areas of the first exposure module 210 and the second exposure module 220; of course, it may not be limited to this according to needs. .

In addition, as shown in FIG. 2, the first moving plate 330 and the second moving plate 340 are provided on the left and right sides of the mounting bracket 100, and the first loading platform 310 and the second loading platform 320 are provided on the corresponding first moving plate 330 and On the second moving plate 340, the first loading platform 310 and the second loading platform 310 are formed to move up and down two layers when moving, which saves space occupied by the mechanism and reduces production costs.

On the basis of any of the above embodiments, the mounting bracket 100 is provided with a first slide rail and a second slide rail, the first moving plate 330 is provided with a first sliding groove matching the first slide rail, and the second moving plate 340 is provided There is a second chute that cooperates with the second slide rail; or the first movement plate 330 is provided with a first guide bar, the first loading platform 310 is provided with a first guide hole that cooperates with the first guide bar, and the second movement plate 340 A second guide rod is provided, and the second loading platform 320 is provided with a second guide hole that cooperates with the second guide rod.

The cooperative arrangement of the slide rail and the chute, or the arrangement of the guide rod and the guide hole is to achieve the smoothness of movement between the first moving plate 330, the second moving plate 340, and the mounting frame 100, thereby realizing the first loading platform 310 And the smoothness of movement of the second loading stage 320 improves the movement accuracy and ensures the exposure accuracy.

On the basis of any of the above embodiments, a sensing mechanism is further included. The sensing mechanism includes a first sensor, a second sensor, a third sensor, and a fourth sensor. The first sensor is configured to detect a moving position of the first motion board 330. The second sensor is used to detect the moving position of the first loading table 310, the third sensor is used to detect the moving position of the second moving plate 340, and the fourth sensor is used to detect the moving position of the second loading table 320.

By setting the sensing mechanism, the motion accuracy of the first moving plate 330, the second moving plate 340, the first loading stage 310, and the second loading stage 320 is improved, and the exposure accuracy is improved.

On the basis of any of the above embodiments, a control mechanism is further included. The control mechanism includes a controller, a first exposure module 210, a second exposure module 220, a first driving member, a second driving member, a third driving member, and a fourth The driving member, the first sensor, the second sensor, the third sensor, and the fourth sensor are all electrically connected to the controller.

The setting of the control mechanism coordinates the work between the exposure mechanism, the loading mechanism and the driving mechanism to achieve more accurate and efficient graphic exposure.

Based on any of the above embodiments, the first loading table 310 is provided with a first loading section, and the second loading table 320 is provided with a second loading section.

The first loading portion and the second loading portion are provided to facilitate loading of the first to-be-exposed member 410 and the second to-be-exposed member 420 and improve loading efficiency.

The embodiment shown in FIG. 1 also provides a double-sided exposure method, which can be applied to the double-sided exposure machine described in any one of the above embodiments, and includes the following steps:

(S1), the first loading stage 310 is located at the first initial position, the second loading stage 320 is located at the second initial position, and the first to-be-exposed piece 410 is loaded on the first loading stage 310;

(S2), the first loading stage 310 moves to the first exposure position in a first circular trajectory, so that the first to-be-exposed piece 410 is located in the exposure area;

(S3), the first exposure module 210 and the second exposure module 220 expose the first to-be-exposed piece 410 and obtain a first exposure finished product; at the same time, load the second to-be-exposed piece 420 on the second loading table 320;

(S4): The first loading platform 310 moves along the first circular trajectory to the first initial position, and unloads the first exposed finished product;

(S5): The second loading stage 320 moves to the second exposure position along the second circulation track, so that the second to-be-exposed piece 420 is located in the exposure area;

(S6), the first exposure module 210 and the second exposure module 220 expose the second to-be-exposed member 420 and obtain a second exposure finished product; at the same time, load the next first to-be-exposed member 410 on the first loading table 310;

(S7), the second loading stage 320 moves to the second initial position along the second circulation trajectory, and unloads the second exposure finished product.

Through the cyclic movement of the first loading stage 310 and the second loading stage 320, the first to-be-exposed piece 410 and the second to-be-exposed piece 420 are sequentially exposed, which is convenient for automatic operation. When the second to-be-exposed piece 420 is exposed, the The loading of the next first to-be-exposed piece 410 is performed synchronously to improve the time utilization efficiency during exposure and the exposure efficiency.

It should be noted that there is no strict sequence of steps (S1) to (S7). The method of using steps (S1) to (S7) is for the convenience of expression and description. Those skilled in the art may use Specific adjustments are needed and are not repeated here. As in step (S6), at the same time, unloading of the first exposure finished product can also be performed, and it is not necessarily only unloading in step (S4).

Further, as shown in FIG. 1 and FIG. 2, when exposing, follow the steps below:

The first loading stage 310 is located behind the mounting bracket 100, that is, the first initial position, and the second loading stage 320 is located in front of the mounting bracket 100, that is, the second initial position, and loads the first to-be-exposed piece 410 on the first loading platform 310;

The first loading platform 310 moves down to the first preset first position along the first moving plate 330;

The first moving plate 330 moves forward to the first exposure position, so that the first loading stage 310 is located in the exposure area;

The first exposure component 210 and the second exposure component 220 expose the first to-be-exposed piece 410 and obtain a first exposure finished product; at the same time, the second to-be-exposed piece 420 is loaded on the second loading table 320;

The first moving plate 330 continues to move forward, and reaches the first preset second position, so that the first loading platform 310 leaves the exposure area;

The second moving plate 340 moves backward to the second preset first position; the second loading platform 320 moves down to the second preset second position along the second moving plate 340; the second moving plate 340 moves forward to the second preset position Two exposure positions, and the second loading stage 320 is located in the exposure area;

The first loading platform 310 moves upward to the first preset third position; the first moving plate 330 moves rearward and returns to the first initial position to unload the first exposed finished product on the first loading platform 310;

The first exposure module 210 and the second exposure module 220 expose the second to-be-exposed piece 420 and obtain a second exposure finished product; at the same time, load the next first to-be-exposed piece 410 on the first loading table 310;

The second moving plate 340 continues to move forward to the second preset third position, the second loading platform 320 moves upward to the second preset fourth position, and the second moving plate 340 moves rearward to the second initial position (here, (The second preset fourth position may be the second initial position directly);

The steps of entering the first loading platform 310 and moving down the first moving plate 330 to the first preset first position are performed in a loop.

Here, it should be noted that, in the embodiment shown in FIG. 2 and FIG. 3, since the first loading stage 310 and the second loading stage 320 are both in the upper first exposure module 210 and the lower second exposure module 220, Move up and down between times. Therefore, when the first to-be-exposed member 410 is exposed, the second loading table 320 can no longer pass through the exposure area to avoid affecting the exposure of the first to-be-exposed member 410. Therefore, when the first to-be-exposed member 410 is exposed, the second The moving plate 340 cannot pass through the exposure area;

The same applies to the exposure of the second to-be-exposed member 420. Those skilled in the art can reasonably arrange the time node of the cyclic motion according to the needs to meet the needs of the exposure, which will not be repeated here.

In specific implementation, after the exposure of the first to-be-exposed member 410 is completed, the first loading table 310 moves at a high speed and returns to the first initial position; after the exposure of the second to-be-exposed member 420 is completed, the second loading table 320 moves at a high speed and returns To the second initial position. Those skilled in the art can make specific settings as required to obtain suitable motion nodes and match them with exposure, loading and unloading.

The technical features of the embodiments described above can be arbitrarily combined. In order to simplify the description, all possible combinations of the technical features in the above embodiments have not been described. However, as long as there is no contradiction in the combination of these technical features, It should be considered as the scope described in this specification.

The above-mentioned embodiments only express several implementation manners of the present invention, and their descriptions are more specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be noted that, for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can be made, which all belong to the protection scope of the present invention. Therefore, the protection scope of the invention patent shall be subject to the appended claims.

Claims (8)

  1. A double-sided exposure machine, comprising:
    Mount;
    An exposure mechanism comprising a first exposure component and a second exposure component respectively disposed on both sides of the mounting frame, the first exposure component and the second exposure component being oppositely disposed and forming an exposure area;
    A loading mechanism, the loading mechanism comprising a first loading stage and a second loading stage, both of the first loading stage and the second loading stage being movably connected to the mounting frame; and
    A drive mechanism including a drive assembly;
    The driving component drives the first loading stage to move in a first circular trajectory, and causes the first loading stage to perform exposure through the exposure area in a first motion state;
    The driving component also drives the second loading stage to move in a second trajectory, and causes the second loading stage to perform exposure through the exposure area when in the second motion state.
  2. The double-sided exposure machine according to claim 1, wherein the first loading stage and the second loading stage are respectively disposed on both sides of the mounting frame, and the driving assembly further comprises a first driving assembly And a second drive assembly, the first drive assembly is used to drive the first loading stage, and the first loading stage moves with the first cyclic trajectory, and the second drive assembly is used to drive the first loading stage Two loading platforms move the second loading platform along the second trajectory.
  3. The double-sided exposure machine according to claim 2, wherein the loading mechanism further comprises a first moving plate and a second moving plate, and the first moving plate and the second moving plate are both connected to the installation. Frame active connection
    The first loading platform is disposed on the first moving plate and is movably connected to the first moving plate. The first driving assembly includes a first driving member and a second driving member. For driving the first moving plate to move on the mounting frame, the second driving member is configured to drive the first loading platform to move on the first moving plate, and the first moving plate and the first The loading platform moves cooperatively to move the first loading platform along the first circular trajectory;
    The second loading platform is disposed on the second moving plate and is movably connected to the second moving plate. The second driving assembly includes a third driving member and a fourth driving member. For driving the second moving plate to move on the mounting frame, the fourth driving member is used to drive the second loading platform to move on the second moving plate, and the second moving plate and the second moving plate are moved. The loading platform moves cooperatively to move the second loading platform along the second circulation track.
  4. The double-sided exposure machine according to claim 3, wherein the mounting frame is provided with a first slide rail and a second slide rail, and the first moving plate is provided with a first slide rail that cooperates with the first slide rail. Chute, the second movement plate is provided with a second chute that cooperates with the second slide rail;
    Or the first moving plate is provided with a first guide rod, the first loading platform is provided with a first guide hole that cooperates with the first guide rod, and the second moving plate is provided with a second guide rod. The second loading platform is provided with a second guide hole matched with the second guide rod.
  5. The double-sided exposure machine according to claim 3, further comprising a sensing mechanism, the sensing mechanism including a first sensor, a second sensor, a third sensor, and a fourth sensor, wherein the first sensor is used for For detecting the moving position of the first moving plate, the second sensor is used for detecting the moving position of the first loading platform, and the third sensor is used for detecting the moving position of the second moving plate. A fourth sensor is used to detect a moving position of the second loading platform.
  6. The double-sided exposure machine according to claim 5, further comprising a control mechanism, the control mechanism comprising a controller, the first exposure module, the second exposure module, the first driving member, The second driving member, the third driving member, the fourth driving member, the first sensor, the second sensor, the third sensor, and the fourth sensor are all related to the controller Electrical connection.
  7. The double-sided exposure machine according to any one of claims 1-6, wherein the first loading stage is provided with a first loading portion, and the second loading stage is provided with a second loading portion.
  8. A double-sided exposure method, which can be applied to the double-sided exposure machine according to any one of claims 1 to 7, is characterized by comprising the following steps:
    (S1), the first loading stage is located at the first initial position, the second loading stage is located at the second initial position, and the first to-be-exposed part is loaded on the first loading stage;
    (S2), the first loading stage moves to a first exposure position in a first circular trajectory, so that the first to-be-exposed piece is located in an exposure area;
    (S3), the first exposure component and the second exposure component perform exposure on the first to-be-exposed part and obtain a first exposure finished product; at the same time, load the second to-be-exposed part on the second loading table;
    (S4), the first loading platform moves along the first circular trajectory to the first initial position, and unloads the first exposed finished product;
    (S5), the second loading stage moves to the second exposure position along the second circular trajectory, so that the second to-be-exposed piece is located in the exposure area;
    (S6), the first exposure component and the second exposure component expose the second to-be-exposed part and obtain a second exposure finished product; at the same time, load the next first to-be-exposed part on the first loading table Exposure piece
    (S7): The second loading stage moves along the second trajectory to the second initial position, and unloads the second exposure finished product.
PCT/CN2018/122484 2018-07-26 2018-12-20 Cantilevered double-table double-sided digital exposure system and exposure method WO2020019653A1 (en)

Priority Applications (2)

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CN201810836042.7 2018-07-26
CN201810836042.7A CN108873621B (en) 2018-07-26 2018-07-26 Cantilever type double-table-board double-side exposure machine and double-side exposure method

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WO2020019653A1 true WO2020019653A1 (en) 2020-01-30

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Publication number Priority date Publication date Assignee Title
CN108873622B (en) * 2018-07-26 2020-03-31 中山新诺科技股份有限公司 Double-side exposure machine with double loading parts and double-side exposure method
CN108983556A (en) * 2018-07-26 2018-12-11 中山新诺科技股份有限公司 Sided exposure machine and double-faced exposure method
CN108873621B (en) * 2018-07-26 2020-06-05 中山新诺科技股份有限公司 Cantilever type double-table-board double-side exposure machine and double-side exposure method

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CN108873621A (en) * 2018-07-26 2018-11-23 中山新诺科技股份有限公司 Sided exposure machine and double-faced exposure method

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CN1828427A (en) * 2006-04-14 2006-09-06 上海微电子装备有限公司 Step scan photo-etching machine double-platform exchanging and positioning system
CN103913955A (en) * 2013-01-06 2014-07-09 上海华虹宏力半导体制造有限公司 Double-sided photoetching machine and double-sided photoetching method
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