CN108831824A - The cleaning method of solar battery substrate and the preparation method of solar battery - Google Patents
The cleaning method of solar battery substrate and the preparation method of solar battery Download PDFInfo
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- CN108831824A CN108831824A CN201810672947.5A CN201810672947A CN108831824A CN 108831824 A CN108831824 A CN 108831824A CN 201810672947 A CN201810672947 A CN 201810672947A CN 108831824 A CN108831824 A CN 108831824A
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- substrate
- solar battery
- cleaning
- oxidation processes
- cleaned
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- 239000000758 substrate Substances 0.000 title claims abstract description 136
- 238000000034 method Methods 0.000 title claims abstract description 61
- 238000004140 cleaning Methods 0.000 title claims abstract description 44
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 230000003647 oxidation Effects 0.000 claims abstract description 39
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 39
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 36
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 32
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 239000000243 solution Substances 0.000 claims description 15
- 239000011259 mixed solution Substances 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 229910017604 nitric acid Inorganic materials 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 239000010453 quartz Substances 0.000 claims description 10
- 150000002500 ions Chemical class 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 2
- 230000001737 promoting effect Effects 0.000 claims 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 30
- 229910052698 phosphorus Inorganic materials 0.000 abstract description 29
- 239000011574 phosphorus Substances 0.000 abstract description 29
- 230000008021 deposition Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000002000 scavenging effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- AFCIMSXHQSIHQW-UHFFFAOYSA-N [O].[P] Chemical compound [O].[P] AFCIMSXHQSIHQW-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Photovoltaic Devices (AREA)
Abstract
The present invention is suitable for technical field of solar batteries, provides a kind of cleaning method of solar battery substrate and the preparation method of solar battery, the cleaning method of solar battery substrate include：After the ion implanted processing of backside of substrate, oxidation processes are carried out to the front of the substrate, wherein the front of the substrate is the opposite face of the backside of substrate；Substrate after oxidation processes is started the cleaning processing.The present invention can clean up the phosphorus that substrate front surface deposits.
Description
Technical field
The invention belongs to the cleaning method of technical field of solar batteries more particularly to a kind of solar battery substrate and too
The preparation method of positive energy battery.
Background technique
During preparing N-type ion injection solar battery, after the ion implanted technique injection phosphorus in the back side of substrate,
It can leak electricity in the front sedimentary phosphor of substrate, the solar battery that the phosphorus of substrate front surface deposition will lead to preparation, and to solar energy
When battery carries out electroluminescent test, watermark can be generated, and therefore, it is necessary to the phosphorus for substrate front surface being deposited by cleaning process is complete
Removal.In general, being cleaned by chemicals such as hydrogen peroxide, hydrochloric acid, hydrofluoric acid to substrate, still, this cleaning method is usually
The phosphorus for causing substrate front surface to deposit does not wash clean clearly.
Summary of the invention
In view of this, the embodiment of the invention provides a kind of cleaning method of solar battery substrate and solar batteries
Preparation method, the phosphorus cleaning to solve the problems, such as substrate front surface deposition in the prior art are sordid.
The first aspect of the embodiment of the present invention provides a kind of cleaning method of solar battery substrate, including：
After the ion implanted processing of backside of substrate, oxidation processes are carried out to the front of the substrate, wherein the substrate
Front be the backside of substrate opposite face；
Substrate after oxidation processes is started the cleaning processing.
Optionally, gas oxidation processes are carried out to the front of the substrate.
Further, the front to the substrate carries out oxidation processes, including：
The substrate is put into quartz boat, contacts the front of the substrate with air；
The quartz boat is put into reacting furnace, and the temperature of the reacting furnace is increased to preset temperature；
It is passed through dry oxygen in the reacting furnace, oxidation processes are carried out to the front of the substrate.
Optionally, oxidation processes are carried out using front of the Strong oxdiative solution to the substrate.
Further, the Strong oxdiative solution is nitric acid；
The front to the substrate carries out oxidation processes, including：
The substrate is put into nitric acid and is aoxidized 100 seconds to 800 seconds, wherein the volumetric concentration of the nitric acid is range
10% to 50%.
Optionally, the substrate to after oxidation processes starts the cleaning processing, including：
Substrate after oxidation processes is subjected to prerinse in water；
Substrate after prerinse is cleaned in the mixed solution of hydrogen peroxide and hydrochloric acid；
Substrate after cleaning in the mixed solution of hydrogen peroxide and hydrochloric acid is cleaned in water；
Substrate after cleaning in water is cleaned in hydrofluoric acid.
Further, the substrate by after prerinse is cleaned in the mixed solution of hydrogen peroxide and hydrochloric acid, including：
Substrate after prerinse is cleaned 30 seconds to 300 seconds in the mixed solution of hydrogen peroxide and hydrochloric acid, wherein described double
The volume concentration range of oxygen water is 2% to 70%, and the volume concentration range of the hydrochloric acid is 20% to 70%.
Further, the substrate by after cleaning in water is cleaned in hydrofluoric acid, including：
Substrate after cleaning in water is cleaned 30 seconds to 180 seconds in hydrofluoric acid, wherein the volume of the hydrofluoric acid is dense
Spending range is 10% to 30%.
The second aspect of the embodiment of the present invention provides a kind of preparation method of solar battery, including as the present invention is implemented
The cleaning method of solar battery substrate described in the first aspect of example.
The third aspect of the embodiment of the present invention provides a kind of solar battery, passes through the first party of such as embodiment of the present invention
The preparation method of solar battery described in face is prepared.
Existing beneficial effect is the embodiment of the present invention compared with prior art：The embodiment of the present invention passes through in backside of substrate
After ion implanted processing, oxidation processes are carried out to the front of substrate, wherein the front of substrate is the opposite face of backside of substrate,
Then the substrate after oxidation processes is started the cleaning processing again, since the phosphorus after oxidation-treated is easier to be cleaned, by clear
The phosphorus that substrate front surface deposits can be cleaned up by washing processing, to solve the solar battery as caused by the phosphorus of front deposition
Electrical leakage problems, and to solar battery carry out electroluminescent test when, watermark will not be generated.
Detailed description of the invention
It to describe the technical solutions in the embodiments of the present invention more clearly, below will be to embodiment or description of the prior art
Needed in attached drawing be briefly described, it should be apparent that, the accompanying drawings in the following description is only of the invention some
Embodiment for those of ordinary skill in the art without any creative labor, can also be according to these
Attached drawing obtains other attached drawings.
Fig. 1 is the implementation process schematic diagram of the cleaning method of solar battery substrate provided in an embodiment of the present invention.
Specific embodiment
In being described below, for illustration and not for limitation, the tool of such as particular system structure, technology etc is proposed
Body details, to understand thoroughly the embodiment of the present invention.However, it will be clear to one skilled in the art that there is no these specific
The present invention also may be implemented in the other embodiments of details.In other situations, it omits to well-known system, device, electricity
The detailed description of road and method, in case unnecessary details interferes description of the invention.
In order to illustrate technical solutions according to the invention, the following is a description of specific embodiments.
Embodiment one
Referring to FIG. 1, the cleaning method of solar battery substrate, including：
Step S101 carries out oxidation processes to the front of the substrate after the ion implanted processing of backside of substrate,
In, the front of the substrate is the opposite face of the backside of substrate.
In embodiments of the present invention, ion implanting element is phosphorus, injects phosphorus at the back side of substrate by ion implantation technology
When, due to the diffusion of ion, a part of phosphorus can be deposited in the front of substrate, oxidation processes are carried out to the front of substrate, are made in base
The compound that chemical reaction generates phosphorus occurs for the phosphorus of bottom front deposition.Substrate is the substrate for preparing solar battery, including but not
It is limited to silicon wafer.
Step S102 starts the cleaning processing the substrate after oxidation processes.
In embodiments of the present invention, it after the oxidation-treated compound for forming phosphorus of the phosphorus of substrate front surface deposition, is cleaned
Processing.Compared with phosphorus, the compound of phosphorus is easier to be cleaned out, and is cleaned by the phosphorus that cleaning treatment deposits substrate front surface dry
Only.
The embodiment of the present invention carries out oxidation processes by after the ion implanted processing of backside of substrate, to the front of substrate,
Wherein, the front of substrate is the opposite face of backside of substrate, is then started the cleaning processing again to the substrate after oxidation processes, due to warp
Phosphorus after oxidation processes is easier to be cleaned, and can be cleaned up the phosphorus that substrate front surface deposits by cleaning treatment, to solve
The certainly electrical leakage problems of the solar battery as caused by the phosphorus of front deposition, and electroluminescent test is being carried out to solar battery
When, watermark will not be generated.
Optionally, gas oxidation processes are carried out to the front of the substrate.
In embodiments of the present invention, using oxidizing gas by the phosphorus oxidation of substrate front surface.
Further, the implementation of step S101 is：The substrate is put into quartz boat, the front of the substrate is made
It is contacted with air；The quartz boat is put into reacting furnace, and the temperature of the reacting furnace is increased to preset temperature；Described
It is passed through dry oxygen in reacting furnace, oxidation processes are carried out to the front of the substrate.
In embodiments of the present invention, substrate is put into quartz boat, and contacts the front of substrate with air, prevented rear
In continuous oxidation processes, the back side of substrate is oxidized.In a kind of implementation, substrate is put into quartz boat, and is blocked
The back side of substrate contacts the front of substrate with air；In another implementation, multi-disc substrate is put into quartz boat,
In, adjacent two panels substrate leans against back contacts, that is, the wherein rear-face contact at the back side of a piece of substrate and another substrate makes adjacent
The front of two panels substrate is contacted with air.Then quartz boat is put into reacting furnace, it is Celsius that the temperature of reacting furnace is increased to 800
Degree is passed through dry oxygen to 950 degrees Celsius, and the gas flow of oxygen is that 1slm to 20slm will be anti-after preset time
It answers the temperature of furnace to be reduced to 750 degrees Celsius to 850 degrees Celsius, goes out boat after the completion of oxidation.It, can also be first in oxidation processes
It is passed through the temperature that dry oxygen increases ingot furnace again.Dry oxygen is pure oxygen, water content 0.
Optionally, oxidation processes are carried out using front of the Strong oxdiative solution to the substrate.
In embodiments of the present invention, the phosphorus oxygen of substrate front surface is melted into phosphoric acid or phosphate using Strong oxdiative solution.Strong oxygen
Changing solution includes but is not limited to nitric acid, the concentrated sulfuric acid and sodium hydroxide.
Optionally, the Strong oxdiative solution is nitric acid；
The implementation of step S101 is：The substrate is put into nitric acid and is aoxidized 100 seconds to 800 seconds, wherein the nitre
The volumetric concentration of acid is range 10% to 50%.
In embodiments of the present invention, reaction time less than 100 seconds and/or when the volumetric concentration of nitric acid is less than 10%, substrate
Positive phosphorus will not be fully oxidized, and the reaction time, can be by base greater than 800 seconds and/or when the volumetric concentration of nitric acid is greater than 50%
The phosphorus of bottom back side is oxidized.It will control in reaction time at 100 seconds to 800 seconds, the volumetric concentration of nitric acid is 10% to 50%, a side
Face guarantees that the phosphorus of substrate front surface is fully oxidized, and the phosphorus of backside of substrate is on the other hand prevented to be oxidized.
Optionally, the implementation of step S102 is：Substrate after oxidation processes is subjected to prerinse in water；
Substrate after prerinse is cleaned in the mixed solution of hydrogen peroxide and hydrochloric acid；
Substrate after cleaning in the mixed solution of hydrogen peroxide and hydrochloric acid is cleaned in water；
Substrate after cleaning in water is cleaned in hydrofluoric acid.
Further, the substrate by after prerinse is cleaned in the mixed solution of hydrogen peroxide and hydrochloric acid, including：
Substrate after prerinse is cleaned 30 seconds to 300 seconds in the mixed solution of hydrogen peroxide and hydrochloric acid, wherein described double
The volume concentration range of oxygen water is 2% to 70%, and the volume concentration range of the hydrochloric acid is 20% to 70%.
Further, the substrate by after cleaning in water is cleaned in hydrofluoric acid, including：
Substrate after cleaning in water is cleaned 30 seconds to 180 seconds in hydrofluoric acid, wherein the volume of the hydrofluoric acid is dense
Spending range is 10% to 30%.
In embodiments of the present invention, after substrate is oxidation-treated, the mixing of deionized water, hydrogen peroxide and hydrochloric acid is successively used
Solution, deionized water and hydrofluoric acid control substrate in the scavenging period of hydrogen peroxide and the mixed solution of hydrochloric acid to cleaning substrate
And concentration, scavenging period and concentration of the substrate in hydrofluoric acid, on the one hand guarantee that the phosphorus after substrate front surface is oxidation-treated can
It is cleaned, the phosphorus on the other hand preventing backside of substrate from injecting is cleaned out, and makes the back surface field of the solar battery of preparation by shadow
It rings.
It should be understood that the size of the serial number of each step is not meant that the order of the execution order in above-described embodiment, each process
Execution sequence should be determined by its function and internal logic, the implementation process without coping with the embodiment of the present invention constitutes any limit
It is fixed.
Embodiment two
A kind of preparation method of solar battery, including the clear of the solar battery substrate as described in the embodiment of the present invention one
Washing method, and there is beneficial effect possessed by the embodiment of the present invention one.
Embodiment three
A kind of solar battery is prepared by the preparation method of the solar battery as described in the embodiment of the present invention two
It arrives, and there is beneficial effect possessed by the embodiment of the present invention two.
Embodiment described above is merely illustrative of the technical solution of the present invention, rather than its limitations；Although referring to aforementioned reality
Applying example, invention is explained in detail, those skilled in the art should understand that：It still can be to aforementioned each
Technical solution documented by embodiment is modified or equivalent replacement of some of the technical features；And these are modified
Or replacement, the spirit and scope for technical solution of various embodiments of the present invention that it does not separate the essence of the corresponding technical solution should all
It is included within protection scope of the present invention.
Claims (10)
1. a kind of cleaning method of solar battery substrate, which is characterized in that including：
After the ion implanted processing of backside of substrate, oxidation processes are carried out to the front of the substrate, wherein the substrate is just
Face is the opposite face of the backside of substrate；
Substrate after oxidation processes is started the cleaning processing.
2. the cleaning method of solar battery substrate as described in claim 1, which is characterized in that the substrate front into
Promoting the circulation of qi body oxidation processes.
3. the cleaning method of solar battery substrate as claimed in claim 2, which is characterized in that it is described to the substrate just
Face carries out oxidation processes, including：
The substrate is put into quartz boat, contacts the front of the substrate with air；
The quartz boat is put into reacting furnace, and the temperature of the reacting furnace is increased to preset temperature；
It is passed through dry oxygen in the reacting furnace, oxidation processes are carried out to the front of the substrate.
4. the cleaning method of solar battery substrate as described in claim 1, which is characterized in that using Strong oxdiative solution to institute
The front for stating substrate carries out oxidation processes.
5. the cleaning method of solar battery substrate as claimed in claim 4, which is characterized in that the Strong oxdiative solution is nitre
Acid；
The front to the substrate carries out oxidation processes, including：
The substrate is put into nitric acid and is aoxidized 100 seconds to 800 seconds, wherein the volumetric concentration of the nitric acid be range 10% to
50%.
6. such as the cleaning method of solar battery substrate described in any one of claim 1 to 5, which is characterized in that described to oxygen
Change that treated that substrate starts the cleaning processing, including：
Substrate after oxidation processes is subjected to prerinse in water；
Substrate after prerinse is cleaned in the mixed solution of hydrogen peroxide and hydrochloric acid；
Substrate after cleaning in the mixed solution of hydrogen peroxide and hydrochloric acid is cleaned in water；
Substrate after cleaning in water is cleaned in hydrofluoric acid.
7. the cleaning method of solar battery substrate as claimed in claim 6, which is characterized in that the base by after prerinse
Bottom is cleaned in the mixed solution of hydrogen peroxide and hydrochloric acid, including：
Substrate after prerinse is cleaned 30 seconds to 300 seconds in the mixed solution of hydrogen peroxide and hydrochloric acid, wherein the hydrogen peroxide
Volume concentration range be 2% to 70%, the volume concentration range of the hydrochloric acid is 20% to 70%.
8. the cleaning method of solar battery substrate as claimed in claim 6, which is characterized in that it is described will clean in water after
Substrate cleaned in hydrofluoric acid, including：
Substrate after cleaning in water is cleaned 30 seconds to 180 seconds in hydrofluoric acid, wherein the volumetric concentration model of the hydrofluoric acid
Enclose is 10% to 30%.
9. a kind of preparation method of solar battery, which is characterized in that including the sun as claimed in any one of claims 1 to 8
The cleaning method of energy cell substrate.
10. a kind of solar battery, which is characterized in that pass through the preparation method system of solar battery as claimed in claim 9
It is standby to obtain.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810672947.5A CN108831824A (en) | 2018-06-26 | 2018-06-26 | The cleaning method of solar battery substrate and the preparation method of solar battery |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810672947.5A CN108831824A (en) | 2018-06-26 | 2018-06-26 | The cleaning method of solar battery substrate and the preparation method of solar battery |
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| CN108831824A true CN108831824A (en) | 2018-11-16 |
Family
ID=64137708
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2018
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Application publication date: 20181116 |