CN108754446A - A kind of winding type two-sided magnetic control sputtering vacuum coating equipment and film plating process - Google Patents
A kind of winding type two-sided magnetic control sputtering vacuum coating equipment and film plating process Download PDFInfo
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- CN108754446A CN108754446A CN201810891762.3A CN201810891762A CN108754446A CN 108754446 A CN108754446 A CN 108754446A CN 201810891762 A CN201810891762 A CN 201810891762A CN 108754446 A CN108754446 A CN 108754446A
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- roller
- rocker
- main drum
- winding
- nip rolls
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- 238000004804 winding Methods 0.000 title claims abstract description 59
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 28
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims abstract description 17
- 230000008569 process Effects 0.000 title description 8
- 238000007747 plating Methods 0.000 title description 7
- 238000001816 cooling Methods 0.000 claims abstract description 40
- 230000007246 mechanism Effects 0.000 claims abstract description 27
- 238000000576 coating method Methods 0.000 claims abstract description 13
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 238000005096 rolling process Methods 0.000 claims abstract description 7
- 238000005477 sputtering target Methods 0.000 claims description 11
- 241000201246 Cycloloma atriplicifolium Species 0.000 claims 1
- 239000000463 material Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003137 locomotive effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of winding type two-sided magnetic control sputtering vacuum coating equipment comprising vacuum cavity and unreeling structure is arranged in the vacuum cavity, rolling-up mechanism, cooling main drum, unreels rocker and winding rocker；The unreeling structure and rolling-up mechanism are setting up and down, and the rocker that unreels is connected with unreeling structure, and the winding rocker is connected with rolling-up mechanism, and the main drum setting two of cooling is respectively positioned between unreeling structure and rolling-up mechanism and left and right is oppositely arranged；The invention also discloses a kind of winding type two-sided magnetic control sputtering vacuum coating methods；Coiled strip through unreeling structure, unreel rocker after the plated film of one side is realized by one of cooling main drum, again the plated film that main drum realizes other one side is cooled down through another, rolling rocker and rolling-up mechanism are wound later, are realized and are disposably plated coating simultaneously on film two sides.
Description
Technical field
The invention belongs to technical field of vacuum plating, and in particular to a kind of winding type two-sided magnetic control sputtering vacuum coating equipment
And film plating process.
Background technology
Flexible conducting material is used widely in electronics, shielding, capacitance, automobile, new energy, space flight industry at present, magnetic
Control sputtering possesses the more preferable advantage of coating purity, compactness, uniformity, firmness；Existing production technology is first to complete single side plating
Film, then complete the plated film of other one side, due to being molded at twice, film roll needs to remove that vacuum warehouse is exposed to the atmosphere to be turned over
Face causes film roll to be vulnerable to operating environment pollution effect film quality, while export also increases secondary pumpdown time,
Manufacturing cost is high.
Invention content
The object of the present invention is to provide a kind of winding type two-sided magnetic control sputtering vacuum coating equipment, by unreeling structure, receive
Volume mechanism, cooling main drum unreel rocker and wind the mutual cooperation between rocker, and realization is disposably plated on film two sides simultaneously
Upper coating.
It is a further object to provide a kind of winding type two-sided magnetic control sputtering vacuum coating methods.
The technical solution adopted in the present invention is：
A kind of winding type two-sided magnetic control sputtering vacuum coating equipment comprising vacuum cavity and setting are in the vacuum chamber
Internal unreeling structure, cooling main drum, unreels rocker and winding rocker at rolling-up mechanism；
The unreeling structure and rolling-up mechanism are setting up and down, and the rocker that unreels is connected with unreeling structure, the winding pendulum
Frame is connected with rolling-up mechanism, and the main drum setting two of cooling is respectively positioned between unreeling structure and rolling-up mechanism and left and right is opposite
Setting.
The features of the present invention also characterized in that
The rocker that unreels includes unreeling rocker ontology, first unreeling roller, unreel nip rolls and second unreeled roller,
It described first unreeled roller, unreel nip rolls and second unreeled roller and be arranged at and unreel in rocker ontology, and unreel rocker
Ontology unreeled roller using second and was rotated as the center of circle.
The winding rocker includes winding rocker ontology, first wound roller, winding nip rolls and second wound roller,
Described first wound roller, winding nip rolls and second wound roller be arranged at winding rocker ontology in, and wind rocker
Ontology wound roller using second and was rotated as the center of circle.
The rocker that unreels is connected with one of cooling main drum by the first guide roller component, first guide roller group
Part was oriented to roller including first, second was oriented to nip rolls before roller and main drum, and coiled strip was oriented to roller, second by first successively
It was oriented to nip rolls before roller and main drum.
By connecting roll assembly connection, the connection between one of cooling main drum and another main drum of cooling
Roll assembly includes rear nip rolls, connected roller and preceding nip rolls, and nip rolls after coiled strip passes through successively connected roller and preceding exhibition
Plain-barreled roll.
Another described main drum of cooling is connected with winding rocker by the second guide roller component, second guide roller group
Part includes that nip rolls after main drum, third were oriented to roller and the 4th were oriented to roller, coiled strip nip rolls, third after main drum successively
It was oriented to roller and the 4th was oriented to roller.
The main drum of cooling includes main bulging ontology and sputtering target, and the sputtering target is at least arranged two and surrounds main bulging ontology
It is arranged towards the edge in outside.
The main drum of cooling further comprises that ion source, the ion source are arranged above main bulging ontology and are located at sputtering target
Before.
A kind of winding type two-sided magnetic control sputtering vacuum coating method, uses above-mentioned winding type two-sided magnetron sputtered vacuum
Filming equipment, specific implementation method are：Coiled strip through unreeling structure, unreel rocker after one side realized by one of cooling main drum
Plated film, then cool down the plated film that main drum realizes other one side through another, rolling rocker and rolling-up mechanism are received later
Volume completes double-sided coating.
Compared with prior art, the present invention in use, coiled strip through unreeling structure, unreel rocker after by one of cooling
Main drum realizes the plated film of one side, then cools down the plated film that main drum realizes other one side through another, later rolling rocker and receipts
Volume mechanism is wound, and is realized and is disposably plated coating simultaneously on film two sides.
Description of the drawings
Fig. 1 is that the embodiment of the present invention 1 provides a kind of structural schematic diagram of winding type two-sided magnetic control sputtering vacuum coating equipment；
Fig. 2 is that the embodiment of the present invention 2 provides a kind of structural schematic diagram of winding type two-sided magnetic control sputtering vacuum coating equipment.
Specific implementation mode
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used in the restriction present invention.
The embodiment of the present invention 1 provides a kind of winding type two-sided magnetic control sputtering vacuum coating equipment, as shown in Figure 1 comprising
Vacuum cavity 1 and unreeling structure 2 is set in vacuum cavity 1, rolling-up mechanism 3, cooling main drum 4, unreels rocker 5 and winding pendulum
Frame 6；
Unreeling structure 2 and rolling-up mechanism 3 are setting up and down, unreel rocker 5 and unreeling structure 2 connects, wind rocker 6 and winding
Mechanism 3 connects, and cooling main drum 4 is arranged two, is respectively positioned between unreeling structure 2 and rolling-up mechanism 3 and left and right is oppositely arranged；
In this way, using the above structure, coiled strip through unreeling structure 2, unreel rocker 5 after it is real by one of cooling main drum 4
The now plated film of one side, then the plated film that main drum 4 realizes other one side is cooled down through another, later rolling rocker 6 and winder
Structure 3 is wound, and is realized and is disposably plated coating simultaneously on film two sides.
On the basis of embodiment 1, the embodiment of the present invention 1 provides a kind of winding type two-sided magnetic control sputtering vacuum coating and sets
It is standby, as shown in Fig. 2, it includes unreeling rocker ontology 51, first unreeling roller 52, unreel nip rolls 53 and second to unreel rocker 5
It unreeled roller 54, first unreeled roller 52, unreels nip rolls 53 and second unreeled roller 54 and be arranged at and unreel rocker ontology
In 51, and it is that the center of circle is rotated to unreel rocker ontology 51 to unreel roller 54 with second；
Winding rocker 6 includes that winding rocker ontology 61, first wound roller 62, winding nip rolls 63 and second wound
Roller 64, first wound roller 62, winding nip rolls 63 and second wound roller 64 and be arranged in winding rocker ontology 61, and
It is that the center of circle is rotated that winding rocker ontology 61 wound roller 64 with second；
In this way, with increasing or reducing for coiled strip, being put using unreeling rocker 5 and winding rocker 6 when winding or unreeling
Volume rocker 5 and winding rocker 6, which have, follows locomotive function, and unreeling roller 54 or the second with second wound roller 64 as center of circle progress
Rotation, unreels rocker ontology 51 and winding rocker ontology 61 follows roller mechanism that can keep one with receiving/releasing wound membrane face outermost layer always
Fixed distance ensures that retractable volume process film surface is smooth；
It is that the film surface rolled up to receiving/releasing flattens to unreel nip rolls 53 and winding 63 main function of nip rolls, unreels flattening
Effect be ensure film surface become owner of drum before film surface planarization effects, wind flattening effect be ensure wind film surface it is smooth
Degree and overall winding appearance；
Second unreeled roller 54 and second wound roller 64 effect be conduct guiding film surface, in some special designs
In its can also be used as tension-sensing roller use.
It unreels rocker 5 and one of cooling main drum 4 is connected by the first guide roller component 7, the first guide roller component 7 packet
First is included to be oriented to roller 71, second be oriented to nip rolls 73 before roller 72 and main drum, coiled strip successively by first be oriented to roller 71,
Second was oriented to nip rolls 73 before roller 72 and main drum.
One of cooling main drum 4 and another cool down to pass through between main drum 4 and connect roll assembly 8 and connect, connect roller group
Part 8 includes rear nip rolls 81, connected roller 82 and preceding nip rolls 83, and nip rolls 81 after coiled strip passes through successively connected roller 82
And preceding nip rolls 83；
Nip rolls 81, the main function for connecting roller 82 and preceding nip rolls 83 are the films of connection two groups of coating systems up and down
Free film length is reduced in face.This three are crossed the plain roller that roller can be common, be can also be various forms of nip rolls, also may be used
To be applied in combination.
Another cools down main drum 4 and winding rocker 6 is connected by the second guide roller component 9, the second guide roller component 9 packet
Include nip rolls 91 after main drum, third was oriented to roller 92 and the 4th and was oriented to roller 93, coiled strip successively after main drum nip rolls 91,
Third was oriented to roller 92 and the 4th and was oriented to roller 93.
Nip rolls 73 and preceding nip rolls 83 before main drum, main function are flattened in advance when film enters cooling main drum 4, are protected
The film that barrier enters main drum surface is substantially flat, ensures that film surface is bonded with the complete of main drum in this way；Afterwards nip rolls 81 and with
And nip rolls 91 after main drum, when it acts as going out cooling main drum 4, being acted on using the dragging of evaluating by exhibit of nip rolls, ensureing film surface and master
Bulging tension fit-state.It passes in and out cooling main drum 4 and is all made of flattening roll structure, can ensure perfect patch drum type state, Jin Erbao
Good heat-conducting effect is demonstrate,proved, the appearance of film surface corrugation and plating ceases to be busy is reduced；The type of nip rolls optimal optional roller or glue
Roller, can also select multistage roller, expander etc., this four nip rolls can also be changed to common mistake with the same function
Roller can be the roller excessively of smooth surface, can also be that the hair side with certain friction coefficient crosses roller, can all replace can also combine
It replaces and uses.
Cooling main drum 4 includes main bulging ontology 41 and sputtering target 42, and sputtering target 42 is at least arranged two and surrounds main bulging ontology
41 are arranged towards the edge in outside, and cooling main drum 4 further comprises that ion source 43, ion source 43 are arranged above main bulging ontology 41
And before sputtering target 42；Its main function is to provide cooling for film, and the heat of sputtering particle is passed indirectly by cold drum
It is delivered to device external, film surface is kept to complete coating process under the state of temperature of reduction；
The main function of sputtering target 42 is that target particle bombardment is come out to target by principle of magnetron-sputtering under vacuum,
Gas/solid state target particle diffuses to polymeric film surface and forms metal layer in a vacuum.The material of target has very much, Ke Yishi
The metal targets such as nickel, aluminium, zinc, copper, gold, silver can also be the ceramic targets such as silicon nitride, boron nitride, aluminium nitride, silica,
It can also be nickel chromium triangle, ambrose alloy, aluminium silicon, titanium aluminum target；Ion source 43 is used for processing, cleaning to film surface impurity,
Improve film adhesion.
This equipment is suitable for the vacuum magnetic-control sputtering process compared with thin material, such as 2-30 μm of plastic film, laminated film, paper
, the base materials such as cloth vacuum environment magnetron sputtering process.Optimally, this system be more suitable for 2-8 μm of plastic film such as PET,
The magnetron sputtering process in vacuum environment such as PEN, PI, PP, PE and non-woven fabrics, thin paper.
In addition, the equipment can also be by suitably increasing or less nip rolls, crossing roller or jockey pulley, balance roller, pendulum roller etc.
It realizes, can also be realized by changing nip rolls or crossing roller type, the type of any change both fall within the protection model of this patent
Within enclosing.
A kind of winding type two-sided magnetic control sputtering vacuum coating method, uses above-mentioned winding type two-sided magnetron sputtered vacuum
Filming equipment, specific implementation method are：Coiled strip through unreeling structure 2, unreel rocker 5 after realized by one of cooling main drum 4
Plated film on one side, then the plated film that main drum 4 realizes other one side is cooled down through another, later rolling rocker 6 and rolling-up mechanism 3
It is wound, completes double-sided coating.
The present embodiment use process is as follows：It unreels, is wound at rolling-up mechanism 3,2 He of unreeling structure at unreeling structure 2
3 diameter 600mm of rolling-up mechanism, the polymer flexibilities film such as substrate material PET, PI, sputtering target 42 are more set magnetic controlled sputtering targets,
The materials such as the material metal of target, alloy, ceramics；Film sequence is worn to be followed successively by：Unreeling structure 2, first unreeled roller 52, unreel flattening
Roller 53, second unreeled roller 54, first be oriented to roller 71, second be oriented to nip rolls 73 before roller 72, main drum, cooling main drum 4, after
Nip rolls 91, third were oriented to roller 92, the 4th were oriented to roller 93, the after nip rolls 81, preceding nip rolls 83, cooling main drum 4, main drum
Two wound roller 64, winding nip rolls 63, first wound roller 62 and rolling-up mechanism 3, and cooling main drum 4 is recycled using coolant liquid
Cooling, -20 DEG C of cooling temperature is passed through after argon gas plated film under conditions of vacuum degree 0.1-0.9Pa, according to film thickness film-passing speed 1-
50m/min is adjustable, can once be obtained simultaneously on base material two sidesThe coating of thickness, this method film surface appearance is good,
Corrugationless, coating is secured, no plating ceases to be busy.
Using the above scheme, compared with prior art, coiled strip through unreeling structure, unreel rocker after by one of cooling
Main drum realizes the plated film of one side, then cools down the plated film that main drum realizes other one side through another, later rolling rocker and receipts
Volume mechanism is wound, and is realized and is disposably plated coating simultaneously on film two sides.
The foregoing is only a preferred embodiment of the present invention, but scope of protection of the present invention is not limited thereto,
Any one skilled in the art in the technical scope disclosed by the present invention, the change or replacement that can be readily occurred in,
It should be covered by the protection scope of the present invention.Therefore, protection scope of the present invention should be with scope of the claims
Subject to.
Claims (9)
1. a kind of winding type two-sided magnetic control sputtering vacuum coating equipment, which is characterized in that it includes vacuum cavity (1) and setting
In the vacuum cavity (1) interior unreeling structure (2), rolling-up mechanism (3), cooling main drum (4), unreel rocker (5) and winding rocker
(6)；
The unreeling structure (2) and rolling-up mechanism (3) are setting up and down, described to unreel rocker (5) and unreeling structure (2) connection, institute
Winding rocker (6) and rolling-up mechanism (3) connection are stated, the main drum of cooling (4) is arranged two, is respectively positioned on unreeling structure (2) and receives
Between volume mechanism (3) and left and right is oppositely arranged.
2. a kind of winding type two-sided magnetic control sputtering vacuum coating equipment according to claim 1, which is characterized in that described to put
Volume rocker (5) includes unreeling rocker ontology (51), first unreeling roller (52), unreel nip rolls (53) and second unreeled roller
(54), it described first unreeled roller (52), unreel nip rolls (53) and second unreeled roller (54) and be arranged at and unreel rocker
In ontology (51), and it is that the center of circle is rotated to unreel rocker ontology (51) to unreel roller (54) with second.
3. a kind of winding type two-sided magnetic control sputtering vacuum coating equipment according to claim 2, which is characterized in that the receipts
Volume rocker (6) includes winding rocker ontology (61), first wound roller (62), winding nip rolls (63) and second wound roller
(64), described first roller (62), winding nip rolls (63) was wound and second wound roller (64) and is arranged at winding rocker
In ontology (61), and it is that the center of circle is rotated to wind rocker ontology (61) to wind roller (64) with second.
4. a kind of winding type two-sided magnetic control sputtering vacuum coating equipment according to claim 3, which is characterized in that described to put
Volume rocker (5) and one of cooling main drum (4) are connected by the first guide roller component (7), the first guide roller component (7)
It was oriented to roller (71) including first, second was oriented to nip rolls (73) before roller (72) and main drum, coiled strip is led by first successively
Nip rolls (73) before being oriented to roller (72) and main drum to roller (71) excessively, second.
5. a kind of winding type two-sided magnetic control sputtering vacuum coating equipment according to claim 4, which is characterized in that it is described its
In the main drum (4) of a cooling and another cool down to pass through between main drum (4) and connect roll assembly (8) and connect, the connection roller group
Part (8) includes rear nip rolls (81), connected roller (82) and preceding nip rolls (83).
6. a kind of winding type two-sided magnetic control sputtering vacuum coating equipment according to claim 5, which is characterized in that described another
The main drum (4) of an outer cooling and winding rocker (6) are connected by the second guide roller component (9), the second guide roller component (9)
It was oriented to roller (92) including nip rolls (91), third after main drum and the 4th was oriented to roller (93), coiled strip is successively after main drum
Nip rolls (91), third were oriented to roller (92) and the 4th were oriented to roller (93).
7. according to a kind of winding type two-sided magnetic control sputtering vacuum coating equipment of claim 1-6 any one of them, feature exists
In the main drum of cooling (4) includes main bulging ontology (41) and sputtering target (42), and the sputtering target (42) is at least arranged two and encloses
Edge around main bulging ontology (41) towards outside is arranged.
8. a kind of winding type two-sided magnetic control sputtering vacuum coating equipment according to claim 7, which is characterized in that described cold
Main drum (4) further comprises ion source (43), and ion source (43) setting is above main bulging ontology (41) and positioned at sputtering
Before target (42).
9. a kind of winding type two-sided magnetic control sputtering vacuum coating method, which is characterized in that it uses any one of claim 1-8 institutes
The winding type two-sided magnetic control sputtering vacuum coating equipment stated, specific implementation method are：Coiled strip through unreeling structure (2), unreel rocker
(5) plated film of one side is realized after by one of cooling main drum (4), then other one is realized through another main drum (4) of cooling
The plated film in face, later rolling rocker (6) and rolling-up mechanism (3) wound, complete double-sided coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810891762.3A CN108754446A (en) | 2018-08-07 | 2018-08-07 | A kind of winding type two-sided magnetic control sputtering vacuum coating equipment and film plating process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810891762.3A CN108754446A (en) | 2018-08-07 | 2018-08-07 | A kind of winding type two-sided magnetic control sputtering vacuum coating equipment and film plating process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108754446A true CN108754446A (en) | 2018-11-06 |
Family
ID=63969054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810891762.3A Pending CN108754446A (en) | 2018-08-07 | 2018-08-07 | A kind of winding type two-sided magnetic control sputtering vacuum coating equipment and film plating process |
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| CN (1) | CN108754446A (en) |
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| CN109809230A (en) * | 2019-02-28 | 2019-05-28 | 深圳市汇美新科技有限公司 | A kind of rotatably equidistant unwinding control method and its unreeling structure |
| CN110004423A (en) * | 2019-05-14 | 2019-07-12 | 南京汇金锦元光电材料有限公司 | CIGS preparation reinforcing isolation film and preparation method |
| CN110699645A (en) * | 2019-11-07 | 2020-01-17 | 青州市天宝机械科技有限公司 | Optimal flattening structure for winding film coating machine |
| CN112795895A (en) * | 2021-03-31 | 2021-05-14 | 辽宁分子流科技有限公司 | Vacuum film penetrating mechanism for winding type vacuum film coating machine |
| CN112813400A (en) * | 2021-03-31 | 2021-05-18 | 辽宁分子流科技有限公司 | Double-sided multi-station winding type vacuum coating machine |
| CN113502459A (en) * | 2021-07-08 | 2021-10-15 | 江西柔顺科技有限公司 | Double-sided magnetron sputtering vacuum coating machine and vacuum coating method thereof |
| CN114369809A (en) * | 2021-12-17 | 2022-04-19 | 重庆金美新材料科技有限公司 | High polymer material surface plating device and plating method |
| CN115110055A (en) * | 2022-06-28 | 2022-09-27 | 肇庆市科润真空设备有限公司 | Winding type magnetron sputtering coating device and method for ultrathin film double-sided copper plating film |
| CN115369374A (en) * | 2022-07-21 | 2022-11-22 | 肇庆市科润真空设备有限公司 | Ultrathin film double-sided coating method and device based on magnetron sputtering and evaporation |
| CN115433917A (en) * | 2022-10-18 | 2022-12-06 | 北京北方华创真空技术有限公司 | Main drum assembly and vacuum coating equipment applying same |
| CN115449751A (en) * | 2022-10-19 | 2022-12-09 | 肇庆市科润真空设备有限公司 | Evaporation source mechanism for coating ultrathin film, coating equipment and coating method |
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| CN109809230A (en) * | 2019-02-28 | 2019-05-28 | 深圳市汇美新科技有限公司 | A kind of rotatably equidistant unwinding control method and its unreeling structure |
| CN110004423A (en) * | 2019-05-14 | 2019-07-12 | 南京汇金锦元光电材料有限公司 | CIGS preparation reinforcing isolation film and preparation method |
| CN110699645A (en) * | 2019-11-07 | 2020-01-17 | 青州市天宝机械科技有限公司 | Optimal flattening structure for winding film coating machine |
| CN112813400B (en) * | 2021-03-31 | 2024-05-24 | 泊肃叶科技(沈阳)有限公司 | Double-sided multi-station winding type vacuum coating machine |
| CN112795895A (en) * | 2021-03-31 | 2021-05-14 | 辽宁分子流科技有限公司 | Vacuum film penetrating mechanism for winding type vacuum film coating machine |
| CN112813400A (en) * | 2021-03-31 | 2021-05-18 | 辽宁分子流科技有限公司 | Double-sided multi-station winding type vacuum coating machine |
| CN113502459A (en) * | 2021-07-08 | 2021-10-15 | 江西柔顺科技有限公司 | Double-sided magnetron sputtering vacuum coating machine and vacuum coating method thereof |
| CN114369809A (en) * | 2021-12-17 | 2022-04-19 | 重庆金美新材料科技有限公司 | High polymer material surface plating device and plating method |
| CN114369809B (en) * | 2021-12-17 | 2023-11-03 | 重庆金美新材料科技有限公司 | High polymer material surface plating device and plating method |
| CN115110055A (en) * | 2022-06-28 | 2022-09-27 | 肇庆市科润真空设备有限公司 | Winding type magnetron sputtering coating device and method for ultrathin film double-sided copper plating film |
| CN115369374A (en) * | 2022-07-21 | 2022-11-22 | 肇庆市科润真空设备有限公司 | Ultrathin film double-sided coating method and device based on magnetron sputtering and evaporation |
| CN115433917A (en) * | 2022-10-18 | 2022-12-06 | 北京北方华创真空技术有限公司 | Main drum assembly and vacuum coating equipment applying same |
| CN115433917B (en) * | 2022-10-18 | 2023-07-18 | 北京北方华创真空技术有限公司 | Main drum assembly and vacuum coating equipment using same |
| CN115449751A (en) * | 2022-10-19 | 2022-12-09 | 肇庆市科润真空设备有限公司 | Evaporation source mechanism for coating ultrathin film, coating equipment and coating method |
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