CN108642451A - 镀膜机、镀膜机的控制方法及装置 - Google Patents
镀膜机、镀膜机的控制方法及装置 Download PDFInfo
- Publication number
- CN108642451A CN108642451A CN201810504146.8A CN201810504146A CN108642451A CN 108642451 A CN108642451 A CN 108642451A CN 201810504146 A CN201810504146 A CN 201810504146A CN 108642451 A CN108642451 A CN 108642451A
- Authority
- CN
- China
- Prior art keywords
- raw material
- container
- coating machine
- sensor
- parameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
Abstract
Description
Claims (13)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810504146.8A CN108642451A (zh) | 2018-05-23 | 2018-05-23 | 镀膜机、镀膜机的控制方法及装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810504146.8A CN108642451A (zh) | 2018-05-23 | 2018-05-23 | 镀膜机、镀膜机的控制方法及装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108642451A true CN108642451A (zh) | 2018-10-12 |
Family
ID=63757949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810504146.8A Pending CN108642451A (zh) | 2018-05-23 | 2018-05-23 | 镀膜机、镀膜机的控制方法及装置 |
Country Status (1)
Country | Link |
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CN (1) | CN108642451A (zh) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104278249A (zh) * | 2013-07-02 | 2015-01-14 | 上海和辉光电有限公司 | 坩埚材料量检测装置、方法及蒸镀机 |
US20160298227A1 (en) * | 2013-12-31 | 2016-10-13 | Shenzhen China Star Optoelectronics Technology Co., Ltd | A crucible device used in coating system |
CN107012431A (zh) * | 2017-05-04 | 2017-08-04 | 京东方科技集团股份有限公司 | 一种蒸镀源、蒸镀装置及蒸镀方法 |
CN107190236A (zh) * | 2017-07-27 | 2017-09-22 | 京东方科技集团股份有限公司 | 坩埚、蒸镀装置及蒸镀方法 |
CN107805783A (zh) * | 2017-11-30 | 2018-03-16 | 京东方科技集团股份有限公司 | 蒸发源、蒸镀设备及蒸镀控制方法 |
-
2018
- 2018-05-23 CN CN201810504146.8A patent/CN108642451A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104278249A (zh) * | 2013-07-02 | 2015-01-14 | 上海和辉光电有限公司 | 坩埚材料量检测装置、方法及蒸镀机 |
US20160298227A1 (en) * | 2013-12-31 | 2016-10-13 | Shenzhen China Star Optoelectronics Technology Co., Ltd | A crucible device used in coating system |
CN107012431A (zh) * | 2017-05-04 | 2017-08-04 | 京东方科技集团股份有限公司 | 一种蒸镀源、蒸镀装置及蒸镀方法 |
CN107190236A (zh) * | 2017-07-27 | 2017-09-22 | 京东方科技集团股份有限公司 | 坩埚、蒸镀装置及蒸镀方法 |
CN107805783A (zh) * | 2017-11-30 | 2018-03-16 | 京东方科技集团股份有限公司 | 蒸发源、蒸镀设备及蒸镀控制方法 |
Non-Patent Citations (1)
Title |
---|
王俊峰 等: "《现代传感器应用技术》", 30 September 2006, 机械工业出版社 * |
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PB01 | Publication | ||
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CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 100076 6015, 6th floor, building 8, 9 Yingshun Road, Yinghai Town, Daxing District, Beijing Applicant after: Beijing Dingrong Photovoltaic Technology Co.,Ltd. Address before: 100176 Beijing Daxing District Beijing economic and Technological Development Zone Rongchang East Street 7 hospital 6 Building 3001 room. Applicant before: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd. |
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TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20210409 Address after: 518066 Room 201, building A, No. 1, Qian Wan Road, Qianhai Shenzhen Hong Kong cooperation zone, Shenzhen, Guangdong (Shenzhen Qianhai business secretary Co., Ltd.) Applicant after: Shenzhen Zhengyue development and Construction Co.,Ltd. Address before: 100076 6015, 6th floor, building 8, 9 Yingshun Road, Yinghai Town, Daxing District, Beijing Applicant before: Beijing Dingrong Photovoltaic Technology Co.,Ltd. |
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TA01 | Transfer of patent application right |
Effective date of registration: 20210916 Address after: 201203 3rd floor, no.665 Zhangjiang Road, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai Applicant after: Shanghai zuqiang Energy Co.,Ltd. Address before: 518066 Room 201, building A, No. 1, Qian Wan Road, Qianhai Shenzhen Hong Kong cooperation zone, Shenzhen, Guangdong (Shenzhen Qianhai business secretary Co., Ltd.) Applicant before: Shenzhen Zhengyue development and Construction Co.,Ltd. |
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RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181012 |