CN108611667B - 一种铜合金基材上环保复合镀层及其制备方法 - Google Patents

一种铜合金基材上环保复合镀层及其制备方法 Download PDF

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CN108611667B
CN108611667B CN201810770882.8A CN201810770882A CN108611667B CN 108611667 B CN108611667 B CN 108611667B CN 201810770882 A CN201810770882 A CN 201810770882A CN 108611667 B CN108611667 B CN 108611667B
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林孝发
林孝山
刘小龙
王汉春
李日红
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Jomoo Kitchen and Bath Co Ltd
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Abstract

本发明公开了一种铜合金基材上环保复合镀层,在铜合金基材表面依次为电镀铜层、镍腐蚀光亮层、和三价铬环保层,并且在所述三价铬环保层的表面通过PVD共沉积形成CrAlTiC钝化层。此外,还公开了该复合镀层的制备方法。

Description

一种铜合金基材上环保复合镀层及其制备方法
技术领域
本发明涉及材料技术,具体涉及一种铜合金基材上环保复合镀层及其制备方法。
背景技术
目前,水龙头等厨卫产品的表面材料主要是由电镀铜、镍及六价铬来形成的,六价铬具有高毒性和致癌性,对人体和环境具有严重的危害,被美国环境署列为17种高危毒性物质之一,严重污染周边环境,且污染具有持久性。同时,欧盟已建立了REACH法规,六价铬物质需获得授权才可使用,而装饰性六价铬的授权使用期只有7年。
为了取代六价铬,已有不少研究者开始研究相对绿色环保型的三价铬产品。例如,专利CN 102517618 A在塑料基材上采用PVD、电镀、拉丝、电镀、PVD/喷涂/电镀三价铬、PVD镀铬等多道复合工艺进行了绿色环保镀层的开发,尽管该专利中提到了三价铬电镀后再直接采用PVD镀铬,但由于PVD制备出的铬层与电镀层材料通常存在结合力较差,PVD镀层经过测试后会出现脱离现象,同时,该专利并未给出相关样品性能测试结果。
发明内容
以下是对本文详细描述的主题的概述。本概述并非是为了限制权利要求的保护范围。
目前,铜合金基材上的三价铬制备过程中依旧需要用到少量的六价铬(对人体健康影响大)进行钝化保护,无法实现真正的无六价铬绿色环保;因此,急需找到一种可替代六价铬的膜层。
本申请提供了一种铜合金基材上环保复合镀层及其制备方法,该复合涂层不仅绿色环保且无六价铬、耐腐蚀、耐刮擦、耐变色及较高强度的优点。
具体地,本申请提供了一种铜合金基材上环保复合镀层,在铜合金基材表面依次为电镀铜层、镍腐蚀光亮层、和三价铬环保层,并且在所述三价铬环保层的表面通过PVD共沉淀形成CrAlTiC钝化层。
在本申请的铜合金基材上环保复合镀层中,所述电镀铜层为镀一层酸铜,所用的酸铜电镀液为CuSO4·5H2O浓度220±20g/L,H2SO4浓度70±5g/L,Cl-含量70-100ppm,JC-55A酸铜光亮剂0.3-0.4mL/L,JC-55B酸铜光亮剂0.2-0.3mL/L。
在本申请的铜合金基材上环保复合镀层中,所述电镀铜层为镀一层酸铜,其工艺为:温度25±3℃,电压3±2V,时间1650-2700s。
在本申请的铜合金基材上环保复合镀层中,所述镍腐蚀光亮层是由半光镍、全光镍和镍封组成,其中,所述半光镍的电镀液为NiSO4浓度280±50g/L,NiCl2浓度60±10g/L,H3BO3浓度45±10g/L,Pre-ORIO柔软剂4±2mL/L,Pre-ORIO整平剂1.2±0.5mL/L;其工艺条件为:温度55±10℃,pH值4.0±0.4,电压6±2V,时间600-2400s;
任选地,所述半光镍的电镀液为NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,Pre-ORIO柔软剂4±1mL/L,Pre-ORIO整平剂1.2±0.4mL/L;其工艺条件为:温度55±5℃,pH值4.0±0.2,电压6±2V,时间1200–1500s;
所述全光镍的电镀液为NiSO4浓度280±50g/L,NiCl2浓度60±10g/L,H3BO3浓度45±10g/L,520添加剂15±6mL/L,TRA镍添加剂3±1.5mL/L;其工艺条件为:温度55±10℃,pH值4.4±0.4,电压6±2V;时间900-2400s;
任选地,所述全光镍的电镀液为NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,520添加剂15±5mL/L,TRA镍添加剂3±1mL/L;其工艺条件为:温度55±5℃,pH值4.4±0.4,电压6±2V,时间1500-1800s;
所述镍封的电镀液为NiSO4浓度230±50g/L,NiCl2浓度80±10g/L,H3BO3浓度45±10g/L,光亮镍ZD-220 0.2±0.1mL/L,镍SA-1辅助剂3±1.5mL/L,镍A-5(4X)柔软剂10±2mL/L,Mark 904 0.2±0.1mL/L,MPS 800液体添加剂33±4mL/L;其工艺条件为:温度55±10℃,pH值4.8±0.4,电压16±2V,时间120-420s;
任选地,所述镍封的电镀液为NiSO4浓度230±10g/L,NiCl2浓度80±5g/L,H3BO3浓度45±5g/L,光亮镍ZD-220 0.2±0.1mL/L,镍SA-1辅助剂3±1mL/L,镍A-5(4X)柔软剂10±1mL/L,Mark 904 0.2±0.1mL/L,MPS 800液体添加剂33±2mL/L;其工艺条件为:温度55±5℃,pH值4.8±0.2,电压16±2V,时间180-300s。
在本申请的铜合金基材上环保复合镀层中,所述三价铬环保层的电镀液为Trichrome ICE Salts 270±10g/L,Trichrome ICE PART 1 200±20mL/L,Trichrome ICEMAKE UP 15±3mL/L,Trichrome ICE WA 1±0.3mL/L,三价铬9±3g/L;其工艺条件为:温度55±5℃,pH值3.5±0.1,阴极电流密度5±0.5A/dm2,时间480-1200s;
任选地,所述三价铬环保层的电镀液为Trichrome ICE Salts 270g/L,TrichromeICE PART 1 200mL/L,Trichrome ICE MAKE UP 15mL/L,Trichrome ICE WA 1mL/L,三价铬9g/L;其工艺条件为:温度55±5℃,pH值3.5±0.1,阴极电流密度5A/dm2,时间480-1200s。
在本申请的铜合金基材上环保复合镀层中,所述三价铬环保层的表面通过PVD共沉淀形成CrAlTiC钝化层,其中,所述的PVD(物理气相沉积)共沉淀采用Ti50Al50靶进行离子镀、和Cr靶进行中频磁控溅射;
任选地,同时打开Ti50Al50靶和Cr靶进行镀膜的时间为180-1200s。
另一方面,本申请提供了上述铜合金基材上环保复合镀层的制备方法,包括如下步骤:
(i)电镀前处理
包括基材抛光处理和基材清洗处理;这里,所述抛光处理可以包括开皮、整平和精抛工艺;所述的基材清洗处理包括分别通过酸洗、超声波热脱、超声波除蜡、超声波除油、纯水清洗等方式来实现表面精细清洗;
(ii)电镀环保层
在(i)得到的洁净基材上分别镀一层酸铜、半光镍、全光镍、镍封、三价铬;
(ii-1)酸铜:CuSO4·5H2O浓度220±20g/L,H2SO4浓度70±5g/L,Cl-含量70-100ppm,JC-55A酸铜光亮剂0.3-0.4mL/L,JC-55B酸铜光亮剂0.2-0.3mL/L,温度25±3℃,电压3±2V,时间1650-2700s;
(ii-2)半光镍:NiSO4浓度280±50g/L,NiCl2浓度60±10g/L,H3BO3浓度45±10g/L,Pre-ORIO柔软剂4±2mL/L,Pre-ORIO整平剂1.2±0.5mL/L,温度55±10℃,pH值4.0±0.4,电压6±2V,时间600-2400s;
任选地,NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,Pre-ORIO柔软剂4±1mL/L,Pre-ORIO整平剂1.2±0.4mL/L,温度55±5℃,pH值4.0±0.2,电压6±2V,时间1200-1500s;
(ii-3)全光镍:NiSO4浓度280±50g/L,NiCl2浓度60±10g/L,H3BO3浓度45±10g/L,520添加剂15±6mL/L,TRA镍添加剂3±1.5mL/L,温度55±10℃,pH值4.4±0.4,电压6±2V;时间900-2400s;
任选地,NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,520添加剂15±5mL/L,TRA镍添加剂3±1mL/L,温度55±5℃,pH值4.4±0.4,电压6±2V,时间1500-1800s;
(ii-4)镍封:NiSO4浓度230±50g/L,NiCl2浓度80±10g/L,H3BO3浓度45±10g/L,光亮镍ZD-220 0.2±0.1mL/L,镍SA-1辅助剂3±1.5mL/L,镍A-5(4X)柔软剂10±2mL/L,Mark 904 0.2±0.1mL/L,MPS 800液体添加剂33±4mL/L,温度55±10℃,pH值4.8±0.4,电压16±2V,时间120-420s;
任选地,NiSO4浓度230±10g/L,NiCl2浓度80±5g/L,H3BO3浓度45±5g/L,光亮镍ZD-220 0.2±0.1mL/L,镍SA-1辅助剂3±1mL/L,镍A-5(4X)柔软剂10±1mL/L,Mark 9040.2±0.1mL/L,MPS 800液体添加剂33±2mL/L,温度55±5℃,pH值4.8±0.2,电压16±2V,时间180-300s;
(ii-5)三价铬:Trichrome ICE Salts 270±10g/L,Trichrome ICE PART 1 200±20mL/L,Trichrome ICE MAKE UP 15±3mL/L,Trichrome ICE WA 1±0.3mL/L,三价铬9±3g/L,温度55±5℃,pH值3.5±0.1,阴极电流密度5±0.5A/dm2,时间480-1200s;
任选地,Trichrome ICE Salts 270g/L,Trichrome ICE PART 1 200mL/L,Trichrome ICE MAKE UP 15mL/L,Trichrome ICE WA 1mL/L,三价铬9g/L,温度55±5℃,pH值3.5±0.1,阴极电流密度5A/dm2,时间480-1200s;
(iii)三价铬基片清洗处理
采用PVD技术制备CrAlTiC钝化层之前,先分别通过纯水清洗、超声波除油、纯水清洗等方式对镀有三价铬层基材进行精细清洗,具体步骤如下:
(iii-1)纯水清洗:温度常温,时间900s;
(iii-2)超声波除油:除油粉浓度35±5g/L,温度60±10℃,时间240-300s,波美度2.5±1.5,超声波电流2±1A;
(iii-3)纯水清洗:纯水,温度常温,时间1200s。
(iv)三价铬基材加热处理
将清洗后的三价铬基片放入洁净的加热炉中,热风烘干,炉体温度180℃,烘干时间1800s-2700s;
(v)在三价铬基片表面共沉积(中频磁控溅射+离子镀)CrAlTiC钝化层
将洁净的三价铬基片放入PVD炉体,并抽真空至6×10-4Pa,通入Ar,流量设定为300sccm,调节腔体内工作压力至0.8Pa,环境温度加热至100℃,将Ti50Al50靶(离子镀)的电流调节至70A,预镀600s。Cr靶(中频磁控溅射)功率调整为25kW,预溅射600s。预镀结束后,通入C2H2,流量设定为20sccm,维持炉体环境温度为100℃和腔体内工作压力为0.8Pa,转动基片台(转速为20rpm/min),同时打开Ti50Al50靶和Cr靶的基片挡板,镀膜180-1200s,同时关闭离子镀和中频磁控溅射的电源,停止炉体内的Ar和C2H2的通入。
在本申请的铜合金基材上环保复合镀层制备方法中,这里,所述的复合镀层在铜合金基材表面依次为电镀铜层、镍腐蚀光亮层、和三价铬环保层,并且在所述三价铬环保层的表面通过PVD共沉淀形成CrAlTiC钝化层;
其中,所述电镀铜层为镀一层酸铜,所用的酸铜电镀液为CuSO4·5H2O浓度220±20g/L,H2SO4浓度70±5g/L,Cl-含量70-100ppm,JC-55A酸铜光亮剂0.3-0.4mL/L,JC-55B酸铜光亮剂0.2-0.3mL/L;所述电镀铜层为镀一层酸铜,其工艺为:温度25±3℃,电压3±2V,时间1650-2700s;
所述镍腐蚀光亮层是由半光镍、全光镍和镍封组成,其中,所述半光镍的电镀液为NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,Pre-ORIO柔软剂4±1mL/L,Pre-ORIO整平剂1.2±0.4mL/L;其工艺条件为:温度55±5℃,pH值4.0±0.2,电压6±2V,时间1200-1500s;
所述全光镍的电镀液为NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,520添加剂15±5mL/L,TRA镍添加剂3±1mL/L;其工艺条件为:温度55±5℃,pH值4.4±0.4,电压6±2V,时间1500-1800s;
所述镍封的电镀液为NiSO4浓度230±10g/L,NiCl2浓度80±5g/L,H3BO3浓度45±5g/L,光亮镍ZD-220 0.2±0.1mL/L,镍SA-1辅助剂3±1mL/L,镍A-5(4X)柔软剂10±1mL/L,Mark 904 0.2±0.1mL/L,MPS 800液体添加剂33±2mL/L;其工艺条件为:温度55±5℃,pH值4.8±0.2,电压16±2V,时间180-300s;
所述三价铬环保层的电镀液为Trichrome ICE Salts 270g/L,Trichrome ICEPART 1 200mL/L,Trichrome ICE MAKE UP 15mL/L,Trichrome ICE WA 1mL/L,三价铬9g/L;其工艺条件为:温度55±5℃,pH值3.5±0.1,阴极电流密度5A/dm2,时间480-1200s;
所述三价铬环保层的表面通过PVD共沉淀形成CrAlTiC钝化层,其中,所述的PVD(物理气相沉积)共沉淀采用Ti50Al50靶进行离子镀、和Cr靶进行中频磁控溅射;同时打开Ti50Al50靶和Cr靶进行镀膜的时间为180-1200s。
本技术领域在现有三价铬电镀完,通常是再电镀一层薄的六价铬进行电解、钝化保护作用;然而本申请采用CrAlTiC取代六价铬,不仅起到钝化保护,而且制备方法绿色环保。
本发明的其它特征和优点将在随后的说明书中阐述,并且,部分地从说明书中变得显而易见,或者通过实施本发明而了解。本发明的目的和其他优点可通过在说明书、权利要求书以及附图中所特别指出的结构来实现和获得。
附图说明
附图用来提供对本发明技术方案的进一步理解,并且构成说明书的一部分,与本申请的实施例一起用于解释本发明的技术方案,并不构成对本发明技术方案的限制。
图1表示的是本申请铜合金基材上绿色环保复合镀层的示意图。其中,标记1为铜合金基材;标记2为酸铜层;标记3为半光镍层;标记4为全光镍层;表5为镍封层,标记6为三价铬层;标记7为CrAlTiC层。
具体实施方式
为使本申请的目的、技术方案和优点更加清楚明白,下文中将结合附图对本发明的实施例进行详细说明。需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互任意组合。
在本申请中所用的原料都是商业上可获得的。
实施例1
本发明提供一种铜合金基材上绿色环保复合镀层的制备方法,在无六价铬电镀层的基础上,采用PVD共沉积制备了CrAlTiC,进而取代常规三价铬电镀钝化保护所用的六价铬膜,具体而言,在基材表面依次电镀铜层、镍腐蚀光亮层、三价铬环保层,在三价铬环保层的表面通过真空物理气相共沉积Cr靶和TiAl靶(气氛为氩气和乙炔)形成CrAlTiC钝化层,所述CrAlTiC钝化层不仅绿色环保,同时具有较好的耐腐蚀性、耐磨性及较高的硬度。
主要包括以下步骤:
1、电镀前处理,包括基材抛光处理和基材清洗处理
抛光处理主要涉及到开皮、整平和精抛工艺,清洗处理分别通过酸洗、超声波热脱、超声波除蜡、超声波除油、纯水清洗等方式来实现表面精细清洗。
2、电镀环保层
在洁净的基材上分别镀一层酸铜、半光镍、全光镍、镍封、三价铬,进而实现产品的耐腐蚀、光亮及整平的作用。
(1)酸铜:CuSO4·5H2O浓度220g/L,H2SO4浓度70g/L,Cl-含量80ppm,JC-55A酸铜光亮剂0.3mL/L,JC-55B酸铜光亮剂0.2mL/L,温度25℃,电压3V,时间1650s;
(2)半光镍:NiSO4浓度280g/L,NiCl2浓度60g/L,H3BO3浓度45g/L,Pre-ORIO柔软剂4mL/L,Pre-ORIO整平剂1.2mL/L,温度55℃,pH值4.0,电压6V,时间1200s;
(3)全光镍:NiSO4浓度280g/L,NiCl2浓度60g/L,H3BO3浓度45g/L,520添加剂15mL/L,TRA镍添加剂3mL/L,温度55℃,pH值4.4,电压6V,时间1500s。
(4)镍封:NiSO4浓度230g/L,NiCl2浓度80g/L,H3BO3浓度45g/L,光亮镍ZD-2200.2mL/L,镍SA-1辅助剂3mL/L,镍A-5(4X)柔软剂10mL/L,Mark 904 0.2mL/L,MPS 800液体添加剂33mL/L,温度55℃,pH值4.8,电压16V,时间180s;。
(5)三价铬:Trichrome ICE Salts 270g/L,Trichrome ICE PART 1 200mL/L,Trichrome ICE MAKE UP 15mL/L,Trichrome ICE WA 1mL/L,三价铬9g/L,温度55℃,pH值3.5,阴极电流密度5A/dm2,时间480s。
3、三价铬基片清洗处理
采用PVD技术制备CrAlTiC钝化层之前,先分别通过纯水清洗、超声波除油、纯水清洗等方式对镀有三价铬层基材进行精细清洗,具体步骤如下:
(1)纯水清洗:温度常温,时间900s;
(2)超声波除油:除油粉浓度35g/L,温度60℃,时间240s,波美度2.5,超声波电流2A;
(3)纯水清洗:纯水,温度常温,时间1200s。
4、三价铬基材加热处理
将清洗后的三价铬基片放入洁净的加热炉中,热风烘干,炉体温度180℃,烘干时间1800s
5、在三价铬基片表面共沉积(中频磁控溅射+离子镀)CrAlTiC钝化层
将洁净的三价铬基片放入PVD炉体,并抽真空至6×10-4Pa,通入Ar,流量设定为300sccm,调节腔体内工作压力至0.8Pa,环境温度加热至100℃,将Ti50Al50靶(离子镀)的电流调节至70A,预镀600s。Cr靶(中频磁控溅射)功率调整为25kW,预溅射600s。预镀结束后,通入C2H2,流量设定为20sccm,维持炉体环境温度为100℃和腔体内工作压力为0.8Pa,转动基片台(转速为20rpm/min),同时打开Ti50Al50靶和Cr靶的基片挡板,镀膜180s,同时关闭离子镀和中频磁控溅射的电源,停止炉体内的Ar和C2H2的通入。
实施例2
制备方法与实施例1基本相同,所不同的是,同时打开Ti50Al50靶和Cr靶的基片挡板,镀膜为300s。
实施例3
制备方法与实施例1基本相同,所不同的是,同时打开Ti50Al50靶和Cr靶的基片挡板,镀膜为600s。
实施例4
制备方法与实施例1基本相同,所不同的是,同时打开Ti50Al50靶和Cr靶的基片挡板,镀膜为900s。
实施例5
制备方法与实施例1基本相同,所不同的是,同时打开Ti50Al50靶和Cr靶的基片挡板,镀膜为1200s。
对比例1
制备方法与实施例1基本相同,所不同的是,在三价铬环保层的表面直接电镀六价铬进行钝化保护,不采用PVD共沉积CrAlTiC钝化层。
表一:本申请实施例和对比例的相关测试结果和观察结果
Figure BDA0001730225160000101
由上表一的数据可知:
当在三价铬环保层的表面直接电镀六价铬进行钝化保护(如对比例1),得到的镀层抗刮擦性较差,而本申请具有CrAlTiC绿色钝化层的复合镀层(在共沉积180s-1200s时间时,绿色环保镀层的性能最佳),其显著地优于采用电镀制备的六价铬钝化层硬度。
虽然本申请所揭露的实施方式如上,但所述的内容仅为便于理解本申请而采用的实施方式,并非用以限定本申请。任何本申请所属领域内的技术人员,在不脱离本申请所揭露的精神和范围的前提下,可以在实施的形式及细节上进行任何的修改与变化,但本申请的专利保护范围,仍须以所附的权利要求书所界定的范围为准。

Claims (14)

1.一种铜合金基材上环保复合镀层,在基材上依次电镀一层酸铜、镍腐蚀光亮层、三价铬,并且在所述三价铬的表面通过PVD共沉积形成CrAlTiC钝化层;
所述镍腐蚀光亮层是由半光镍、全光镍和镍封组成;
所述PVD共沉积采用中频磁控溅射和离子镀。
2.如权利要求1所述铜合金基材上环保复合镀层,其中,所用的酸铜电镀液为CuSO4·5H2O浓度220±20g/L,H2SO4浓度70±5g/L,Cl-含量70-100ppm,JC-55A酸铜光亮剂0.3-0.4mL/L,JC-55B酸铜光亮剂0.2-0.3mL/L。
3.如权利要求2所述铜合金基材上环保复合镀层,其中,其工艺为:温度25±3℃,电压3±2V,时间1650-2700s。
4.如权利要求1所述铜合金基材上环保复合镀层,其中,其中,所述半光镍的电镀液为NiSO4浓度280±50g/L,NiCl2浓度60±10g/L,H3BO3浓度45±10g/L,Pre-ORIO柔软剂4±2mL/L,Pre-ORIO整平剂1.2±0.5mL/L;其工艺条件为:温度55±10℃,pH值4.0±0.4,电压6±2V,时间600-2400s;
全光镍的电镀液为NiSO4浓度280±50g/L,NiCl2浓度60±10g/L,H3BO3浓度45±10g/L,520添加剂15±6mL/L,TRA镍添加剂3±1.5mL/L;其工艺条件为:温度55±10℃,pH值4.4±0.4,电压6±2V;时间900-2400s;
镍封的电镀液为NiSO4浓度230±50g/L,NiCl2浓度80±10g/L,H3BO3浓度45±10g/L,光亮镍ZD-220 0.2±0.1mL/L,镍SA-1辅助剂3±1.5mL/L,镍A-5(4X)柔软剂10±2mL/L,Mark904 0.2±0.1mL/L,MPS 800液体添加剂33±4mL/L;其工艺条件为:温度55±10℃,pH值4.8±0.4,电压16±2V,时间120-420s。
5.如权利要求4所述铜合金基材上环保复合镀层,其中,所述半光镍的电镀液为NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,Pre-ORIO柔软剂4±1mL/L,Pre-ORIO整平剂1.2±0.4mL/L;其工艺条件为:温度55±5℃,pH值4.0±0.2,电压6±2V,时间1200-1500s。
6.如权利要求5所述铜合金基材上环保复合镀层,其中,所述全光镍的电镀液为NiSO4浓度280±20g/L,NiCl2浓度60±5g/L,H3BO3浓度45±5g/L,520添加剂15±5mL/L,TRA镍添加剂3±1mL/L;其工艺条件为:温度55±5℃,pH值4.4±0.4,电压6±2V;时间1500-1800s。
7.如权利要求5所述铜合金基材上环保复合镀层,其中,所述镍封的电镀液为NiSO4浓度230±10g/L,NiCl2浓度80±5g/L,H3BO3浓度45±5g/L,光亮镍ZD-220 0.2±0.1mL/L,镍SA-1辅助剂3±1mL/L,镍A-5(4X)柔软剂10±1mL/L,Mark 904 0.2±0.1mL/L,MPS 800液体添加剂33±2mL/L;其工艺条件为:温度55±5℃,pH值4.8±0.2,电压16±2V,时间180-300s。
8.如权利要求1所述铜合金基材上环保复合镀层,其中,所述三价铬的电镀液为Trichrome ICE Salts 270±10g/L,Trichrome ICE PART 1 200±20mL/L,Trichrome ICEMAKE UP 15±3mL/L,Trichrome ICE WA 1±0.3mL/L,三价铬9±3g/L;其工艺条件为:温度55±5℃,pH值3.5±0.1,阴极电流密度5±0.5A/dm2,时间480-1200s。
9.如权利要求8所述铜合金基材上环保复合镀层,其中,所述三价铬的电镀液为Trichrome ICE Salts 270g/L,Trichrome ICE PART 1 200mL/L,Trichrome ICE MAKE UP15mL/L,Trichrome ICE WA 1mL/L,三价铬9g/L;其工艺条件为:温度55±5℃,pH值3.5±0.1,阴极电流密度5A/dm2,时间480-1200s。
10.如权利要求1-9中任一项所述铜合金基材上环保复合镀层,其中,所述三价铬的表面通过PVD共沉积形成CrAlTiC钝化层,其中,所述的PVD共沉积采用Ti50Al50靶进行离子镀、和Cr靶进行中频磁控溅射。
11.权利要求1-10中任一项所述铜合金基材上环保复合镀层的制备方法,包括如下步骤:
(i)电镀前处理
包括基材抛光处理和基材清洗处理;所述抛光处理包括开皮、整平和精抛工艺;所述的基材清洗处理包括分别通过酸洗、超声波热脱、超声波除蜡、超声波除油、纯水清洗方式来实现表面精细清洗;
(ii)电镀环保层
在(i)得到的洁净基材上分别镀一层酸铜、半光镍、全光镍、镍封、三价铬;
(iii)三价铬基片清洗处理
采用PVD技术制备CrAlTiC钝化层之前,先分别通过纯水清洗、超声波除油、纯水清洗方式对镀有三价铬层基材进行精细清洗;
(iv)三价铬基片加热处理
(v)在三价铬基片表面共沉积CrAlTiC钝化层。
12.如权利要求11所述的制备方法,其中,所述三价铬基片清洗处理的具体步骤如下:
(iii-1)纯水清洗:温度常温,时间900s;
(iii-2)超声波除油:除油粉浓度35±5g/L,温度60±10℃,时间240-300s,波美度2.5±1.5,超声波电流2±1A;
(iii-3)纯水清洗:纯水,温度常温,时间1200s。
13.如权利要求11所述的制备方法,其中,所述三价铬基片加热处理为:
将清洗后的三价铬基片放入洁净的加热炉中,热风烘干,炉体温度180℃,烘干时间1800s-2700s。
14.如权利要求11所述的制备方法,其中,所述在三价铬基片表面共沉积CrAlTiC钝化层为:
将洁净的三价铬基片放入PVD炉体,并抽真空至6×10-4Pa,通入Ar,流量设定为300sccm,调节腔体内工作压力至0.8Pa,环境温度加热至100℃,将Ti50Al50靶离子镀的电流调节至70A,预镀600s;Cr靶中频磁控溅射功率调整为25kW,预溅射600s;预镀结束后,通入C2H2,流量设定为20sccm,维持炉体环境温度为100℃和腔体内工作压力为0.8Pa,转动基片台,转速为20rpm/min,同时打开Ti50Al50靶和Cr靶的基片挡板,镀膜180-1200s,同时关闭离子镀和中频磁控溅射的电源,停止炉体内的Ar和C2H2的通入。
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