CN108604534A - Photoresist component concentration measuring device and method for measurement of concentration - Google Patents
Photoresist component concentration measuring device and method for measurement of concentration Download PDFInfo
- Publication number
- CN108604534A CN108604534A CN201680079908.3A CN201680079908A CN108604534A CN 108604534 A CN108604534 A CN 108604534A CN 201680079908 A CN201680079908 A CN 201680079908A CN 108604534 A CN108604534 A CN 108604534A
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- China
- Prior art keywords
- photoresist
- stripper
- component concentration
- concentration measuring
- sulphur
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Abstract
The dissolving photoresist of the photoresist stripper of recycling timely increases and is denaturalized, therefore the concentration mensuration based on absorbance there are problems that deviateing standard curve.A kind of photoresist component concentration measuring device, it is characterized in that, the determination unit for having the specified element for being included in photoresist but being not included in photoresist stripping stoste and measuring its concentration of the specified specified element in photoresist stripper.
Description
Technical field
The present invention relates to the light for measuring the photoresist agent concentration in photoresist stripper used in photoetching
Cause resist component concentration measuring device and method for measurement of concentration.
Background technology
In IC, LSI etc., with the downsizing of the highly integrated and chip size of semiconductor element, wired circuit it is fine
Change and multiple stratification is being in progress.In addition, not only such micro-element, in the FPD such as liquid crystal display (flat-panel monitor, Flat
Panel Display) in small wired circuit is also required in the formation of pixel.In order to make such small wiring electricity
Road needs photoetching technique.
In photoetching, formed for the material membrane as wired circuit, and the painting photoresist on the film.Then,
Make photoresist with it is photosensitive with the corresponding pattern of wiring and remove after, material membrane is etched.Finally remove photoresist
Agent.In positive light anti-etching agent, in order to which the photoresist after will be photosensitive removes, photoresist stripper is used.
Photoresist stripper can gradually increase due to carrying out reuse to a certain degree, photoresist agent concentration
It is high.Reuse the problem of photoresist stripper is economically.In addition, photoresist agent concentration stops when improving to a certain degree
Only using can be problematic in the quality of product.
That is, photoresist stripper is needed in the photoresist agent concentration of monitoring right in the middle used, if as defined in becoming
More than concentration, then all or part of is replaced.
For the measurement of the photoresist agent concentration in photoresist stripper, it is contemplated that certain methods.It is carrying out greatly
In the factory for measuring production, it is desirable to be able to the method for determining photoresist agent concentration in a short time with a degree of precision.
The side that the photoresist agent concentration in photoresist stripper is found out according to absorbance is disclosed in patent document 1
Method.In this method, using the rising with the photoresist agent concentration in photoresist stripper, what absorbance was got higher shows
As.That is, finding out the absorbance of photoresist stripper known to prior photoresist agent concentration in advance, it is made into standard song
Line determines photoresist agent concentration.
But in the concentration mensuration based on absorbance, exist even if photoresist constant concentration, photoresist stripping
The problem of absorbance of chaotropic also changes over time.It is thought that because being dissolved in photoresist stripper
Photoresist is gradually decomposed into low molecule, and the peak of extinction spectrum is deviated to low wavelength side.
In addition, it is important that the temperature management of determinand in the concentration mensuration based on absorbance.
In actual manufacturing process, supplements photic anticorrosive additive stripping liquid controlling side in several weeks inner edge and continue to produce.That is, with each
The decomposition ingredient of kind various kinds extinction spectrum, lysed photoresist is mingled in photoresist stripper.In this way, can
It is difficult to measure accurate photoresist agent concentration in the method for saying patent document 1.
Existing technical literature
Patent document
Patent document 1：Japanese Unexamined Patent Publication 07-235487 bulletins
Invention content
Problems to be solved by the invention
Patent document 1 is the method using absorbance.The photoresist being dissolved in photoresist stripper is gradual
It is decomposed into low molecule, the peak of extinction spectrum is deviated to low wavelength side.As a result, with various extinction spectrum, photic anti-
The molecule of erosion agent ingredient is mingled in photoresist stripper.
As a result, the following topics exist：The standard curve found out in advance by using the method for absorbance is pushed away with the time
It moves and becomes not utilizing, lack accuracy, can not accurately hold the photoresist being dissolved in photoresist stripper
Agent concentration.In addition there is following problem：The photoresist ingredient breakdown of photoresist stripper, to which tone becomes
Change, error is generated in concentration mensuration.
The present invention is for solving such existing issue, even if being dissolved in photoresist stripping it is intended that providing
Photoresist in liquid is gradually decomposed into low molecule, also can accurately, precisely measure and be dissolved in photoresist stripping
Photoresist agent concentration in chaotropic, photoresist component concentration measuring device and photoresist component concentration measuring
Method.
The solution to the problem
Moreover, in order to realize the purpose, the present invention is included in photoresist and is not included in photic anti-using specifying
Erosion agent removes the element in stoste and measures the composition of its concentration of the specified specified element in photoresist stripper,
It is achieved in desired purpose.
Specifically, making specified element be sulphur, in addition, more specifically, the amount of sulphur is measured using fluorescent X-ray.In addition,
More specifically, the photoresist constituent concentration in photoresist stripper is calculated according to the measured quantity of fluorescent X-ray.
It is included in photoresist but is not included in photoresist stripping stoste, in photoresist using specifying
It is not decomposed in stripper or indeclinable ingredient, and measures the structure of its concentration of the specified ingredient in photoresist stripper
At.
According to this constitution, the photoresist being dissolved in photoresist stripper accurately, can be measured precisely
Agent, the dissolving agent concentration against corrosion i.e. in photoresist stripper.
As specified specified ingredient, such as contain sulphur and photoresist in the photosensitive material ingredient of photoresist
Agent is removed in stoste not in the case of sulfur-bearing, there is sulphur.
As specified specified ingredient, if photoresist contain but do not contained in photoresist stripping stoste and
It is not decomposed in photoresist stripper, can be element or chemical substance or chemical composition.
The effect of invention
According to the present invention, stoste is removed using for specifying to be included in photoresist but be not included in photoresist
In element and measure the composition of its concentration of the specified specified element in photoresist stripper.
Thus, it is possible to which it is dense to provide the photoresist that can accurately, precisely measure in photoresist stripper
Degree is dissolved in photoresist agent concentration, the i.e. dissolving photoresist concentration, photoresist in photoresist stripper
Agent component concentration measuring device and photoresist component concentration measuring method.
In addition, even if tone changes because of the photoresist ingredient breakdown of photoresist stripper, in concentration
Also error is not generated in measurement.
Description of the drawings
Fig. 1 is the photoresist stripping off device for showing to be equipped with the photoresist component concentration measuring device of the present invention
Composition figure.
Fig. 2 is the figure for the composition for showing photoresist component concentration measuring device.
Fig. 3 is to show the experimental result obtained from the sulphur concentration that fluorescent X-ray measures in photoresist stripper
Figure.
Specific implementation mode
Hereinafter, being illustrated to the photoresist component concentration measuring device of the present invention with attached drawing.It should be noted that
The following description exemplifies one embodiment of the present invention, but the present invention is not limited to the following description.It can not depart from
Freely change in the range of present subject matter.
The photoresist stripping for the photoresist component concentration measuring device for being equipped with present embodiment is shown in Fig. 1
The composition of device 50.Photoresist stripping off device 50 has：Photoresist removes liquid bath 52, for conveying treated object 60
Conveyer belt 54, the spray 56 for photoresist stripper M to be interspersed among to treated object 60 and photoresist ingredient it is dense
Spend measurement device 10.
Photoresist stripping off device 50 acts as follows.Treated object 60 is placed on conveyer belt 54 and is conveyed.
Moreover, spreading photoresist stripper M on photoresist stripping liquid bath 52, photoresist is stripped.It recycles
Photoresist stripper M.
It is specified to be included in photoresist but be not included in photoresist stripping stoste and removed in photoresist
It is not decomposed in liquid or indeclinable ingredient.The specified ingredient specified as its, as long as photoresist contains, photoresist stripping
Can be element or chemicals from not contained in stoste and not decomposing or do not change in photoresist stripper
Matter or chemical composition.It should be noted that photoresist stripping stoste refers to not used photic anti-after preparing herein
Lose agent stripper.
For example, including as the NQD (naphthalene quinone di-azide sulfonic acid ester) of photosensitizer and as high score subtree in photoresist
In the case of the novolac resin of fat, photoresist includes sulphur, i.e. element sulphur.
For example, in photoresist stripping stoste using MEA (monoethanolamine), BDG (diethylene glycol monobutyl ether) and water
In the case of composition, photoresist removes stoste not sulfur-bearing, i.e. element sulphur.
Include in specified photoresist but when the ingredient or element be free of in photoresist stripping stoste is element sulphur,
Even if the ingredient containing sulphur in photoresist stripper by decompose etc. bys change element sulphur itself if do not change.
Therefore, by measuring its concentration of the specified specified element i.e. element sulphur in photoresist stripper, to
It is photic anti-in photoresist stripper that the instant solution of photoresist agent concentration in photoresist stripper can be calculated
It loses agent concentration, dissolve photoresist concentration, can accurately, precisely measure and be dissolved in photoresist stripper
Photoresist agent concentration.
The photoresist stripper M of recycling is stored in photoresist stripping liquid bath 52, and is borrowed by pumping 56a
It helps spray piping 56b and is sent to spray 56.It should be noted that preferably having filter 56c in spray piping 56b.
It is the blocking because can prevent the solid constituent etc. of photoresist from bringing.
Moreover, after the photoresist of treated object 60 is removed, it is back to photoresist stripping liquid bath 52.It follows in this way
Ring utilizes photoresist stripper M.Photoresist in photoresist stripper M is dissolved in photoresist after stripping
Agent stripper M.
The concentration of the photoresist of the dissolving in photoresist stripping liquid bath 52 timely increases as a result,.Therefore, light
Cause the photoresist stripper M in anticorrosive additive stripping liquid controlling slot 52 when lysed dissolving photoresist reaches a certain concentration
Part or all is changed to the new liquid as photoresist stripper stoste.
The photoresist component concentration measuring device 10 of the present invention takes out photic from photoresist stripping liquid bath 52
Anticorrosive additive stripping liquid controlling M and the amount for measuring the sulphur as specified element in the photoresist of dissolving, return again to photic anti-
It loses in agent stripping liquid bath 52.
It should be noted that symbol 12i is the suction inlet of photoresist stripper M, symbol 18o is that will determine dissolving
Photoresist in sulfur content after photoresist stripper M be back to photoresist stripping liquid bath 52 in discharge
Mouthful.
It should be noted that, although it is not shown, but can also be by the photoresist stripper M discharges after the amount for measuring sulphur
Without being back in photoresist stripping liquid bath 52 outside to system.
Fig. 2 shows the compositions of photoresist component concentration measuring device 10.Photoresist component concentration measuring device
10 have：Be communicated in photoresist stripping liquid bath 52 in extraction piping 12, aforementioned extractions piping 12, for measurement pass through before
It states the determination part 14 for drawing the photoresist stripper M in piping 12 and photoresist stripper M is made to be back to aforementioned light
Cause the piping 18 in anticorrosive additive stripping liquid controlling slot 52.
In turn, also have：Fluorescent X-ray measurement device 20, as measuring the aforementioned light in aforementioned determination part 14
Cause the determination unit of the amount of the sulphur as specified specified element in anticorrosive additive stripping liquid controlling M；With controller 30, as root
The photoresist in aforementioned photoresist stripper M is calculated according to the sulfur content measured value of aforementioned fluorescent X-ray measurement device 20
The calculated unit of constituent concentration.
It draws piping 12 and removes the part for taking out photoresist stripper M in liquid bath 52 from photoresist.In addition,
Extraction piping 12 is provided with the pump 12a for conveying photoresist stripper M.12a is pumped to drawing the pressure in piping 12
It is adjusted such that and handles photoresist stripper M with no obstacle in the determination part 14 for being set to downstream side.
Determination part 14 as determination unit is fluorescent X-ray measurement device 20 to measure photoresist stripper M
In sulphur amount, i.e. sulfur content and continuously be set to extraction piping 12.It is to be continuously set to the part for drawing piping 12 in Fig. 2.For
X-ray from fluorescent X-ray measurement device 20 irradiated to photoresist stripper M, determination part 14 is using can make X-ray
The material of transmission.
The form of determination part 14 as determination unit is not particularly limited.For example, it is contemplated that following form：It will be from fluorescence X
The pipe for the resin that axial observation X-ray can penetrate is as determination part 14 and is communicated in extraction piping 12 or is piped 12 temporarily from drawing
When storage photoresist stripper M measurements container be continuously set to and draw the form for being piped 12.
In present embodiment, to (hereinafter referred to as " being penetrated and being matched by being communicated in the piping drawn the X-ray of piping 12 and can penetrated
Pipe ".) 24 composition determination part 14 the case where illustrate.
In this composition, the sulfur content in the photoresist stripper M flowed in through piping 24 is measured.Through piping 24
Use the material that is not easily deteriorated and can make fluorescent X-ray to penetrate in photoresist stripper.As an example, it can enumerate
Go out fluororesin, polyester, polypropylene etc., the material that can be penetrated by fluorescent X-ray when measuring sulphur using fluorescent X-ray is constituted.
In addition, the material that can all can not be penetrated by X-ray through piping 24 is formed.I.e., it is possible to only X-ray irradiation,
The part for generating fluorescent X-ray is formed through piping 24, the metal piping that other parts are stainless steel etc..Alternatively, it is also possible to only
The piping material for making a part for extraction piping 12 use X-ray that can penetrate.
It should be noted that the photoresist stripping obtained from extraction piping 12 can temporarily be received in measuring container
Liquid M measures the sulfur content in the photoresist stripper in container.
Piping 18 is returned to be connected to through piping 24.Therefore, it is removed in liquid bath 52 and is sucted from photoresist using pump 12a
Photoresist stripper M by draw piping 12, pass through through piping 24 in, via return piping 18 in be back to it is photic
In anticorrosive additive stripping liquid controlling slot 52.
Fluorescent X-ray measurement device 20 as determination unit measure in photoresist stripper M as specified
The sulphur (S) of specified element.Positive light anti-etching agent by photosensitizer NQD (naphthalene quinone di-azide sulfonic acid ester) and novolac resin structure
At.
Photosensitive NQD has been carried out to become indene carboxylic acid in the presence of alcohol and be dissolved in aqueous slkali.In this way, novolac resin
Mutual combination is interrupted, and has carried out photosensitive photoresist by aqueous slkali stripping, dissolving.
Photoresist stripper M is by the new liquid of the stoste as photoresist stripper M, the novolaks tree of dissolving
The NQD of dissolving including fat, the NQD for further including dissolving and changing structure is constituted.It wraps the novolac resin of dissolving and also
The NQD for including dissolving and changing the dissolving including the NQD of structure is known as photoresist ingredient.Photoresist ingredient is dissolving
Dissolving photoresist.
These photoresist ingredients dissolve the not all single forms of photoresist, for big block or dissolving
And in the basic structure person for resolving into novolac resin is also included within.
Moreover, as photoresist stripper M is recycled, additional new photoresist ingredient.In addition, as the time passes through
It crosses, as the lysed photoresist ingredient breakdown for dissolving photoresist and changes.
But the amount for the sulphur being present in NQD does not change.Therefore, by measuring the sulphur in photoresist stripper M
Amount, concentration, the i.e. lysed dissolving that can steadily measure the photoresist ingredient in photoresist stripper M are photic
Agent concentration against corrosion.
It should be noted that for the amount of sulphur herein, i.e. sulfur content, the intensity of the fluorescent X-ray of sulphur can be measured.That is, sulphur
Amount can be the intensity (kcps) of the characteristic X-ray of sulphur.
As described above, the photoresist component concentration measuring device of the present invention is made using the sulphur in photoresist ingredient
Concentration, the index of i.e. lysed dissolving photoresist agent concentration for photoresist ingredient.Therefore, if photoresist is shelled
Include sulfate in ingredient in chaotropic, then can not accurately measure the concentration of photoresist ingredient.
As has been explained above, photoresist stripper is one of the photoresist stripper that will have been used mostly
Divide discarded or discharge, supplement as new liquid or the regenerated liquid of photoresist stripping stoste and use in residue.
In the case where photoresist is removed and contains sulphur in stoste, does not differentiate between current sulfur content and be derived from photoresist
Ingredient is also derived from photoresist stripper itself.
Therefore, photoresist component concentration measuring device 10 of the invention can be used for photoresist stripper only by
The case where material without element sulphur is constituted.
Contain in photoresist but photoresist removes in stoste the element that does not contain and to measure it specified to specify
Concentration person of the specified element in photoresist stripper.
Due to element, its own does not decompose in photoresist stripper or does not change as a result, even if being dissolved in
Dissolving resist in photoresist stripper decomposes, and also can accurately find out the dissolving in photoresist stripper
Dissolving agent concentration against corrosion.
For the test section 20a of fluorescent X-ray measurement device 20, x-ray bombardment portion is shown in FIG. 2 and acceptance part is combined into
The situation of one.But irradiation portion and acceptance part can respectively form respectively.
It, can in order to which the sulfur content in the photoresist stripper M that measures fluorescent X-ray measurement device 20 is scaled concentration
To have controller 30.Controller 30 is penetrated according to the flow for penetrating the photoresist stripper M in piping 24 and using fluorescence X
The sulphur measured quantity that line measurement device 20 obtains calculate the photoresist constituent concentration in photoresist stripper M and by its
It is shown in display 30a.
Furthermore it is possible to calculate photoresist constituent concentration as follows.First, photoresist constituent concentration is made to determine
Correcting fluid flowed in through piping 24 with defined flow.Then, it is surveyed with fluorescent X-ray measurement device 20
Amount.
Standard curve of the photoresist constituent concentration relative to the sulfur content of measurement is found out according to the measurement.Can be based on should
Standard curve calculates the photoresist constituent concentration in photoresist stripper M.
Controller 30 can have sends signal when photoresist constituent concentration reaches certain value to other equipment
Send line 30b.Be in order to when the photoresist constituent concentration of photoresist stripper M reaches certain value by photoresist
All or part of replacement of the photoresist stripper M in liquid bath 52 is removed in agent.
Action with the photoresist component concentration measuring device 10 constituted above is illustrated.Photoresist
Stripper M is transported to photoresist component concentration measuring device 10 (referring to Fig.1) by drawing piping 12.
It is adjusted in pump 12a to drawing the internal pressure in piping 12, photoresist stripper M is sent to through piping
24.The photoresist stripper M passed through through piping 24 is back to photoresist stripping liquid bath by returning to piping 18
52。
Fluorescent X-ray measurement device 20 measures the photoresist flowed in through piping 24 according to the instruction of controller 30
The amount of sulphur in agent stripper M.And measured value is notified to controller 30.
Controller 30 calculates the sulphur concentration in photoresist stripper M with pre-prepd standard curve.Therefore, it carries out
The controller 30 of this action is it may be said that be calculated unit.The sulphur concentration of calculating is shown in display 30a.In addition, conduct
To the signal of miscellaneous equipment by transmission (30b).
As described above, the photoresist component concentration measuring device 10 of the present invention is due to being based on photoresist stripper
It is not contained in stoste but dissolves the sulphur atom in such as photoresist that photoresist contains to measure photoresist stripping
Photoresist constituent concentration in chaotropic M, therefore even if dissolving resist ingredient breakdown in photoresist stripper M,
Ongoing change, and/or tone change, and can also carry out accurate concentration mensuration.
Embodiment
The experimental result described below measured with fluorescent X-ray measurement device obtained by photoresist ingredient.As analysis
Device uses the sweep type fluorescent x-ray analyzer (ZSX PrimusII) of Rigaku Corporation.
Photoresist stripper uses MEA (monoethanolamine) 19%, BDG (diethylene glycol monobutyl ether) 60%, water 21%
It forms and winner.Any material is free of element sulphur.
As the photoresist ingredient of sample, using the positive light anti-etching agent of novolac resin will have been used photosensitive
Afterwards, the dry and person that is made powder.It is specified element to make sulphur.
<Experimental method>
To photoresist stripper, the photoresist ingredient (powder) of sample is dissolved, make 0.1,0.3,0.6,
The photic anticorrosive additive stripping liquid controlling of simulation of 1.0wt%.Then, each photic anticorrosive additive stripping liquid controlling of simulation is measured with above-mentioned analytical equipment
Only sulphur X-ray (K alpha rays) intensity.Show the result in Fig. 3.
In Fig. 3, horizontal axis is (to be expressed as " PR as the concentration of photoresist ingredient of the concentration of dissolving photoresist
Add concentration [wt%] ".), the longitudinal axis is that the intensity of fluorescent X-ray (is expressed as " X-ray intensity (kcps) ".).
With reference to Fig. 3, to the photoresist addition concentration of stripper and the X-ray intensity from sulphur (S) 0.1wt% with
Under low concentration to the high concentration of 1.0wt% range wide in this way in there are high positive correlations.In addition, same sample is placed 1
Zhou Jinhang is measured again, does not find to change.
The figure be with fluorescent X-ray to the concentration of photoresist ingredient, i.e. lysed dissolving photoresist it is dense
The result that the amount of the sulphur for the photoresist stripper for having spent previously known is measured.It may be used as calculated unit
Standard curve.
It is unknown to concentration, the concentration of i.e. lysed dissolving photoresist of photoresist ingredient with fluorescent X-ray
Photoresist stripper sulphur amount be measured in the case of, can turn around and photoresist is found out by X-ray intensity
The concentration of agent ingredient.
Concentration can also be calculated in this way.It should be noted that standard curve can not be the such figures of Fig. 3, can also be
The table being made of numeric data.
Industrial availability
The photoresist component concentration measuring device of the present invention can be suitable for that the fine of photoetching used to add
The photoresist stripping process in working hour.
Reference sign
10 photoresist component concentration measuring devices
12 draw piping
12a is pumped
12i suction inlets
14 determination parts
18 return to piping
18o outlets
20 fluorescent X-ray measurement devices
20a test sections
24 through piping
30 controllers
30a displays
30b sends line
50 photoresist stripping off devices
52 photoresists remove liquid bath
54 conveyer belts
56 sprays
60 treated objects
56a is pumped
56b spray pipings
56c filters
M photoresist strippers
Claims (13)
1. a kind of photoresist component concentration measuring device, which is characterized in that have and be included in photoresist for specified
In but be not included in photoresist stripping stoste in element and measure its specified specified element photoresist remove
The determination unit of concentration in liquid.
2. photoresist component concentration measuring device according to claim 1, wherein it is sulphur to make specified element.
3. photoresist component concentration measuring device according to claim 2, wherein determination unit is penetrated using fluorescence X
Line measurement device measures the amount of sulphur.
4. photoresist component concentration measuring device according to claim 3, which is characterized in that have according to fluorescence X
The measured quantity of ray measurement device calculates the calculated unit of the photoresist constituent concentration in photoresist stripper.
5. photoresist component concentration measuring device according to claim 4, which is characterized in that photic anti-with being communicated in
Extraction in erosion agent stripping liquid bath is piped and is set to the determination unit for drawing piping and is measured.
6. photoresist component concentration measuring device according to claim 5, which is characterized in that have and be communicated in extraction
The X-ray transparent of piping is piped.
7. photoresist component concentration measuring device according to claim 5, which is characterized in that have for receive from
Draw the measurement container of the photoresist stripper of piping discharge.
8. a kind of photoresist component concentration measuring method, which is characterized in that specified to be included in photoresist but do not wrap
The element being contained in photoresist stripping stoste, and it is dense in photoresist stripper to measure its specified specified element
Degree.
9. photoresist component concentration measuring method according to claim 8, wherein it is sulphur to make specified element.
10. photoresist component concentration measuring method according to claim 9, wherein measure sulphur using fluorescent X-ray
Amount.
11. photoresist component concentration measuring method according to claim 10, which is characterized in that include according to sulphur
Amount calculates the calculating process of the concentration of the photoresist ingredient in the photoresist stripper.
12. photoresist component concentration measuring method according to claim 11, which is characterized in that from photoresist
Photoresist stripper is taken out in stripping liquid bath and measures the sulphur of the photoresist stripper of the flowing of its taking-up
Amount.
13. photoresist component concentration measuring method according to claim 11, which is characterized in that from photoresist
Photoresist stripper is taken out in stripping liquid bath and the photoresist stripper being drawn off is temporarily stored within measurement container
The amount of sulphur is measured afterwards.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-012558 | 2016-01-26 | ||
| JP2016012558A JP6643710B2 (en) | 2016-01-26 | 2016-01-26 | Photoresist component concentration measuring device and concentration measuring method |
| PCT/JP2016/088687 WO2017130620A1 (en) | 2016-01-26 | 2016-12-26 | Photoresist component concentration measurement device and concentration measurement method |
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| Publication Number | Publication Date |
|---|---|
| CN108604534A true CN108604534A (en) | 2018-09-28 |
| CN108604534B CN108604534B (en) | 2022-06-21 |
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| CN201680079908.3A Active CN108604534B (en) | 2016-01-26 | 2016-12-26 | Apparatus and method for measuring concentration of photoresist component |
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|---|---|
| JP (1) | JP6643710B2 (en) |
| CN (1) | CN108604534B (en) |
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| JP2015162659A (en) * | 2014-02-28 | 2015-09-07 | 芝浦メカトロニクス株式会社 | Processing device and processing method |
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- 2016-01-26 JP JP2016012558A patent/JP6643710B2/en active Active
- 2016-12-26 WO PCT/JP2016/088687 patent/WO2017130620A1/en active Application Filing
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2017135204A (en) | 2017-08-03 |
| JP6643710B2 (en) | 2020-02-12 |
| TWI697743B (en) | 2020-07-01 |
| CN108604534B (en) | 2022-06-21 |
| TW201736987A (en) | 2017-10-16 |
| WO2017130620A1 (en) | 2017-08-03 |
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