CN108538764B - Cleaning machine - Google Patents
Cleaning machine Download PDFInfo
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- CN108538764B CN108538764B CN201810381654.1A CN201810381654A CN108538764B CN 108538764 B CN108538764 B CN 108538764B CN 201810381654 A CN201810381654 A CN 201810381654A CN 108538764 B CN108538764 B CN 108538764B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
Abstract
The invention relates to a cleaning machine. The cleaning machine has a carrying-in side for a substrate to be cleaned to enter and a carrying-out side for the cleaned substrate to leave, and comprises: a foreign matter detection unit and a backwashing unit; the foreign matter detection unit is positioned in front of the moving-out side and is used for detecting whether the substrate is qualified for cleaning before the substrate leaves the cleaning machine; the backwashing unit is positioned between the carry-out side and the carry-in side, and is used for returning the substrate detected by the foreign matter detection unit to the carry-in side from the carry-out side so as to be cleaned again by the cleaning machine. The cleaning machine can improve the cleaning yield of the produced substrate, reduce the influence of water residue or unwashed objects on downstream coating machine equipment and the like, and improve the backwashing efficiency before coating; the efficiency of exception handling before production line coating is accelerated, and the material and time loss of abnormal substrate backwashing are reduced.
Description
Technical Field
The invention relates to the technical field of display, in particular to a cleaning machine.
Background
The flat display device has the advantages of thin body, power saving, no radiation and the like, and is widely applied. Conventional flat panel Display devices mainly include Liquid Crystal Display (LCD) devices and Organic Light Emitting Diode (OLED) Display devices.
Taking a liquid crystal display as an example, the liquid crystal display generally comprises a Color Filter (CF) substrate, a Thin Film Transistor (TFT) substrate, a Liquid Crystal (LC) sandwiched between the Color Filter substrate and the Thin Film Transistor substrate, and a Sealant (Sealant), and the forming process generally comprises: front Array (Array) process (thin film, yellow light, etching and stripping), middle Cell (TFT substrate and CF substrate) process and back module assembly process (driver IC and printed circuit board lamination).
In the liquid crystal display industry, a coating film forming process is commonly used, and a film layer with a certain pattern is formed on a glass substrate through processes such as cleaning, coating a photoresist, exposing, developing and the like.
The substrate cleaning apparatus is an indispensable apparatus: cleaning machine (Cleaner) -is used for cleaning the surface of the glass substrate before coating, and removing dirt such as particles (particles) and organic matters.
The existing conventional production line cleaning machine is designed to be provided with an organic matter cleaning unit, a wet cleaning unit and an Air Knife (AK) drying unit, a substrate is cleaned, cleaned and dried and then directly enters a photoresist coating machine (Coater), and the following problems exist:
1. the current cleaning machine (Cleaner) is designed to have no cleaning detection function, and if the substrate is not cleaned, the substrate directly enters the downstream equipment. The problems of pollution of downstream equipment, waste of production line time and materials and the like exist.
2. The substrate cleaned by the current cleaning machine is difficult to avoid the abnormal condition of accidental drying failure. After the substrate enters a downstream coating machine, the water residue on the surface of the substrate is detected by a detection device of the coating machine (Coater), and then the substrate is judged to be washed back and needs to be sent into a cleaning machine after passing through the whole production line equipment. The problems of complicated flow, production line time waste and the like also exist.
Disclosure of Invention
Therefore, an object of the present invention is to provide a cleaning machine, which can improve the yield of cleaning the substrate produced by the cleaning machine, reduce the influence of water residue on the downstream coater equipment, and improve the backwashing efficiency before coating.
In order to achieve the above object, the present invention provides a cleaning machine having a carry-in side into which a substrate to be cleaned enters and a carry-out side from which the cleaned substrate leaves, comprising: a foreign matter detection unit and a backwashing unit; the foreign matter detection unit is positioned in front of the moving-out side and is used for detecting whether the substrate is qualified for cleaning before the substrate leaves the cleaning machine; the backwashing unit is positioned between the carry-out side and the carry-in side, and is used for returning the substrate detected by the foreign matter detection unit to the carry-in side from the carry-out side so as to be cleaned again by the cleaning machine.
The foreign matter detection unit comprises a water residue detection device for detecting water residue on the surface of the substrate and/or a cleanliness detection device for detecting the cleanliness of the surface of the substrate.
The water residue detection device comprises an infrared emitter and an infrared receiver, the infrared emitter is arranged to be attached to the upper surface of the substrate in a clinging mode from one side of the substrate to emit infrared light, the infrared receiver is arranged to receive the infrared light emitted by the infrared emitter from the other side of the substrate, and whether the substrate is abnormal or not is detected according to the infrared light receiving condition.
The cleanliness detection device comprises a light projector and a light receiving lens, wherein the light projector is used for providing a light source for the lower surface or the upper surface of the substrate, the light receiving lens is used for receiving the light source from the other side surface of the substrate, and whether the substrate is abnormal or not is detected according to gray data.
The substrate is detected by the residual water detection device before the residual water detection device is positioned in front of the cleanliness detection device.
The backwashing unit comprises a first vertical movable slide rail, a horizontal movable slide rail, a second vertical movable slide rail, a sucker and a servo motor; one end of the horizontal movable sliding rail is connected with the upper part of a first vertical movable sliding rail positioned on the moving-in side, and the other end of the horizontal movable sliding rail is connected with the upper part of a second vertical movable sliding rail positioned on the moving-out side; when the substrate needs to be backwashed, the servo motor drives the sucker to move up and down along the first vertical movable sliding rail or the second vertical movable sliding rail so that the sucker is close to or away from the substrate in the vertical direction, the sucker sucks or puts down the substrate through pneumatic control, and the servo motor drives the sucker to move back and forth along the horizontal movable sliding rail so as to return the substrate from the moving-out side to the moving-in side.
The substrate loading device also comprises a loading unit positioned on the loading side and used for loading the substrate; the first vertical movable slide rail is arranged in the carrying-in unit.
Wherein, also include the carry-out unit located in carrying-out side, is used for carrying out the base plate; the second vertical movable slide rail is arranged in the moving-out unit.
The device also comprises a machine object cleaning unit, a dry and wet buffer area, a wet cleaning unit and/or a drying unit which are sequentially arranged along the substrate conveying direction.
The cleaning machine further comprises conveying rollers which are horizontally distributed from the carrying-in side to the carrying-out side in the cleaning machine and are used for conveying the substrate from the carrying-in side to the carrying-out side in the cleaning machine.
In conclusion, the cleaning machine can improve the cleaning yield of the produced substrate, reduce the influence of water residue or unwashed objects on downstream coating machine equipment and the like, and improve the backwashing efficiency before coating; the efficiency of exception handling before production line coating is accelerated, and the material and time loss of abnormal substrate backwashing are reduced.
Drawings
The technical solution and other advantages of the present invention will become apparent from the following detailed description of specific embodiments of the present invention, which is to be read in connection with the accompanying drawings.
In the drawings, there is shown in the drawings,
FIG. 1 is a simplified schematic diagram of the overall construction of a preferred embodiment of the washer of the present invention;
FIG. 2 is a schematic view of a foreign matter detection unit according to a preferred embodiment of the present invention;
FIG. 3 is a schematic diagram of a back washing unit of a preferred embodiment of the cleaning machine of the present invention.
Detailed Description
Referring to fig. 1, there is shown a simplified schematic diagram of a preferred embodiment of the washer of the present invention. The invention provides a design of a residual water detection back-washing type cleaning machine, which is provided with a carrying-in side for a substrate to be cleaned to enter and a carrying-out side for the cleaned substrate to leave, and mainly comprises: a foreign matter detection unit 10 and a backwashing unit 20; the foreign matter detection unit 10 is located before the carrying-out side and is used for detecting whether the substrate is cleaned successfully or not before the substrate leaves the cleaning machine; the backwashing unit 20 is located between the carry-out side and the carry-in side, and returns the substrate detected as defective by the foreign matter detection unit 10 from the carry-out side to the carry-in side to be cleaned again by the cleaning machine.
Similar to a conventional cleaning machine, the cleaning machine of the present invention may include a carrying roller 1, a carry-in unit 2 on the carry-in side, a carry-out unit 3 on the carry-out side; the conveying rollers 1 are horizontally distributed from the carry-in side to the carry-out side in the cleaning machine, and are used for horizontally conveying the substrate from the carry-in side to the carry-out side in the cleaning machine. A loading unit 2 that can be used to load a substrate from an upstream device; the carry-out unit 3 can be used to carry out substrates to downstream devices. In fig. 1, a direction arrow indicates a possible moving direction of a substrate in the cleaning machine of the present invention, and by using the present invention, the substrate enters the cleaning machine through the conveying roller 1, is cleaned and dried as in the conventional cleaning machine, and then enters the foreign matter detection unit 10 of the present invention to be detected, and if the detection is qualified (OK), the substrate is normally carried out through the conveying roller 1, and if the detection is not qualified (NG), the substrate is returned to the carrying-in side by the backwashing unit 20 of the present invention to be cleaned and dried again.
Referring to fig. 2, it is a schematic diagram of a foreign object detection unit according to a preferred embodiment of the cleaning machine of the present invention. In this embodiment, the foreign matter detection unit may include a water remaining detection device and a cleanliness detection device. The water remainder detection device mainly comprises an infrared emitter 11 and an infrared receiver 12, wherein the infrared emitter 11 is arranged to be attached to the upper surface of the substrate 31 from one side of the substrate 31 to emit infrared light, the infrared receiver 12 is arranged to receive the infrared light emitted by the infrared emitter 11 from the other side of the substrate 31, and whether the substrate 31 is abnormal or not is detected according to the infrared light receiving condition. The water remainder detection device utilizes the infrared light sensing principle, if there is residual water drops or protruding particles on the upper surface of the substrate 31, the water remainder detection device will obstruct the receiving of infrared light due to a certain height, so that the abnormality of the substrate 31 can be detected. The invention prevents the substrate with water residue from entering downstream equipment by adding the dried substrate surface water residue detection device.
In this embodiment, the cleanliness detection apparatus mainly includes a light projector 13 and a light receiving lens 14, the light projector 13 is configured to provide a light source to the lower (or upper) surface of the substrate 31, the light receiving lens 14 is configured to receive the light source from the other side surface of the substrate 31, and whether the substrate is abnormal or not is detected based on the gradation data. The cleanliness detection device utilizes the principle that the gray scale of transmitted light is changed by blocking by foreign matters, the light projector 13 provides a light source on the lower surface of the substrate 31, and the light receiving lens 14 receives the light source. The gray scale data of the normally cleaned substrate after detection is used for comparison, and the transmittance of the substrate which is not cleaned is relatively poor, so that the change of the gray scale can be analyzed. Thereby determining whether the substrate 31 is abnormal. The invention prevents the uncleaned substrate from entering the downstream equipment by adding the device for detecting the cleanliness of the produced substrate.
The water remainder detection device can be positioned before the cleanliness detection device, the substrates are firstly detected by the water remainder detection device, and one of the substrates is unqualified in detection, so that the substrates can be judged to be backwashed.
Referring to fig. 3, it is a schematic diagram of the back washing unit of the preferred embodiment of the cleaning machine of the present invention. Referring to fig. 1 and 3, the backwashing unit of the present invention mainly includes a first vertical moving slide rail 21, a horizontal moving slide rail 22, a second vertical moving slide rail 23, a suction cup 24, and a servo motor 25; the first vertically movable slide rail 21 may be provided in the loading unit 2 in combination with the loading unit 2, and the second vertically movable slide rail 23 may be provided in the unloading unit 3 in combination with the unloading unit 3.
One end of the horizontal movable slide rail 22 is connected with the upper part of the first vertical movable slide rail 21 positioned at the carrying-in side, and the other end is connected with the upper part of the second vertical movable slide rail 23 positioned at the carrying-out side; when the substrate needs to be backwashed, the servo motor 25 drives the suction cup 24 to move up and down along the first vertical moving slide rail 21 or the second vertical moving slide rail 23 so that the suction cup 24 approaches to or separates from the substrate on the conveying roller 1 from the vertical direction, the suction cup 24 sucks or drops the substrate through pneumatic control, and the servo motor 25 drives the suction cup to move back and forth along the horizontal moving slide rail 22 so as to return the substrate from the carry-out side to the carry-in unit 2 of the carry-in side for cleaning again. The invention returns the abnormal substrate to be cleaned again by adding the upper-layer backwashing track (the horizontal moving slide rail 22), thereby ensuring the cleaning quality.
In addition to the foreign matter detection unit 10 and the backwashing unit 20, the cleaning machine of the present invention may be similar to a conventional cleaning machine in which the organic matter cleaning unit 4, the dry and wet buffer 5, the wet cleaning unit 6, the drying unit 7, and other units and pipelines, an electric control system, and an operation system are sequentially disposed along the substrate conveying direction; the organic cleaning unit 4 may be an EUV organic cleaning unit, and the drying unit 7 may include a thermal drying and air knife drying unit; and the system also comprises an operation PC, an electric control system, a pipeline and water storage (Tank) system of the wet cleaning unit 6, an air supply processing system of the drying unit 7 and the like.
The substrate enters the cleaning machine of the present invention through the carrying roller 1, and is cleaned as in the conventional cleaning machine. After drying, the dried organic matter enters a residual water detection device and a cleanliness detection device, and is normally carried out through the carrying roller 1 if the detection is qualified (OK), and is sucked and lifted to the upper layer by the suction cup 24 in the carrying-out unit 3 if the detection is unqualified (NG), and is moved to the carrying-in unit 2 through the horizontal moving slide rail 22, and then falls onto the carrying roller 1, and enters the organic matter cleaning unit 4, the wet cleaning unit 6 and the like again for backwashing.
In conclusion, the cleaning machine can improve the cleaning yield of the produced substrate, reduce the influence of water residue or unwashed objects on downstream coating machine equipment and the like, and improve the backwashing efficiency before coating; the efficiency of exception handling before production line coating is accelerated, and the material and time loss of abnormal substrate backwashing are reduced.
As described above, it will be apparent to those skilled in the art that various other changes and modifications can be made based on the technical solution and the technical idea of the present invention, and all such changes and modifications should fall within the protective scope of the appended claims.
Claims (9)
1. A cleaning machine having a carry-in side into which a substrate to be cleaned enters and a carry-out side from which the cleaned substrate leaves, comprising: a foreign matter detection unit and a backwashing unit; the foreign matter detection unit is positioned in front of the moving-out side and is used for detecting whether the substrate is qualified for cleaning before the substrate leaves the cleaning machine; the backwashing unit is positioned between the carrying-in side and the carrying-out side and is used for returning the substrate which is detected to be unqualified by the foreign matter detection unit from the carrying-out side to the carrying-in side so as to be cleaned again by the cleaning machine;
the backwashing unit comprises a first vertical movable slide rail, a horizontal movable slide rail, a second vertical movable slide rail, a sucker and a servo motor; one end of the horizontal movable sliding rail is connected with the upper part of a first vertical movable sliding rail positioned on the moving-in side, and the other end of the horizontal movable sliding rail is connected with the upper part of a second vertical movable sliding rail positioned on the moving-out side; when the substrate needs to be backwashed, the servo motor drives the sucker to move up and down along the first vertical movable sliding rail or the second vertical movable sliding rail so that the sucker is close to or away from the substrate in the vertical direction, the sucker sucks or puts down the substrate through pneumatic control, and the servo motor drives the sucker to move back and forth along the horizontal movable sliding rail so as to return the substrate from the moving-out side to the moving-in side.
2. The cleaning machine according to claim 1, wherein the foreign matter detection unit includes a water residue detection device for detecting water residue on the surface of the substrate and/or a cleanliness detection device for detecting cleanliness of the surface of the substrate.
3. The cleaning machine according to claim 2, wherein the residual water detecting means includes an infrared emitter arranged to emit infrared light from one side of the substrate against the upper surface of the substrate, and an infrared receiver arranged to receive the infrared light emitted from the infrared emitter from the other side of the substrate, and detect whether the substrate is abnormal or not based on the infrared light reception.
4. The cleaning machine according to claim 2, wherein the cleanliness detecting means includes a light projector configured to provide a light source to a lower or upper surface of the substrate and a light receiving lens configured to receive the light source from the other surface of the substrate, and detects whether the substrate is abnormal based on the gradation data.
5. The cleaning machine of claim 2, wherein the water remainder detecting device is located before the cleanliness detecting device, and the substrate is detected by the water remainder detecting device.
6. The cleaning machine according to claim 1, further comprising a carry-in unit at a carry-in side for carrying in the substrate; the first vertical movable slide rail is arranged in the carrying-in unit.
7. The cleaning machine according to claim 1, further comprising a carry-out unit on a carry-out side for carrying out the substrate; the second vertical movable slide rail is arranged in the moving-out unit.
8. The cleaning machine of claim 1, further comprising a machine cleaning unit, a dry-wet buffer zone, a wet cleaning unit, and/or a drying unit, which are disposed in this order in the substrate carrying direction.
9. The cleaning machine of claim 1, further comprising conveying rollers horizontally distributed from the carry-in side to the carry-out side in the cleaning machine for conveying the substrate from the carry-in side to the carry-out side in the cleaning machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810381654.1A CN108538764B (en) | 2018-04-25 | 2018-04-25 | Cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810381654.1A CN108538764B (en) | 2018-04-25 | 2018-04-25 | Cleaning machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108538764A CN108538764A (en) | 2018-09-14 |
| CN108538764B true CN108538764B (en) | 2020-09-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810381654.1A Active CN108538764B (en) | 2018-04-25 | 2018-04-25 | Cleaning machine |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114620440B (en) * | 2022-05-17 | 2022-12-20 | 贝赛尔科技(常州)有限公司 | Brick machine supporting plate shunting and returning device and working method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08318237A (en) * | 1995-05-26 | 1996-12-03 | Nikon Corp | Substrate washing apparatus |
| TWI524456B (en) * | 2011-11-04 | 2016-03-01 | 東京威力科創股份有限公司 | Substrate treatment system, substrate delivery method, program, and computer memory medium |
| CN106094291B (en) * | 2016-08-05 | 2019-04-02 | 武汉华星光电技术有限公司 | Glass substrate treating device |
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