CN108440020A - 一种降低多晶铸锭氧含量石英涂层的制备方法 - Google Patents
一种降低多晶铸锭氧含量石英涂层的制备方法 Download PDFInfo
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Abstract
本发明公开了一种降低多晶铸锭氧含量石英涂层的制备方法,包含以下成分:5%‑50%的熔融石英砂骨料;0.05%‑0.5%的醇类研磨助剂;10%‑50%的微米级石英浆料;5%‑30%的亚微米级石英浆料;0.1%‑10%的有机粘结剂;0.1%‑5%的无机添加剂。通过使用微米级和亚微米级的石英砂取代硅溶胶等含高活性羟基的二氧化硅,并依靠超细石英砂在较低温度下的明显析晶,阻隔了氧向铸锭的扩散,降低了铸锭中的间隙氧含量。
Description
技术领域
本发明涉及坩埚涂层领域,具体涉及一种降低多晶铸锭氧含量石英涂层的制备方法。
背景技术
多晶硅铸锭生产采用的石英坩埚,由于原料纯度低,以及生产过程中杂质的引入,导致硅锭边部少数载流子寿命明显偏低,为此坩埚生产企业在坩埚出厂前会在坩埚内表面涂覆一层纯度99.999%以上的高纯石英涂层,来降低杂质扩散对铸锭的影响,但由于涂覆完高纯石英的坩埚不再经过烧结而直接投入铸锭炉使用,涂层中高活性的羟基极其容易扩散到铸锭中,导致铸锭的间隙氧含量较高,甚至发生氧沉积,从而影响硅片转化效率。
发明内容
本发明所要解决的主要技术问题:降低多晶铸锭的氧含量,提升铸锭产出硅片的转化效率。
为了实现上述发明目的,本发明公开了一种降低多晶铸锭氧含量石英涂层的制备方法,通过使用微米级和亚微米级的石英砂取代硅溶胶等含高活性羟基的二氧化硅,并依靠超细石英砂在较低温度下的明显析晶,阻隔了氧向铸锭的扩散,降低了铸锭中的间隙氧含量。
一种降低多晶铸锭氧含量石英涂层的制备方法,包含以下步骤:
步骤一:将醇类研磨助剂、微米级石英砂和去离子水加入磨机进行湿法研磨,得到微米级石英浆料;
步骤二:将醇类研磨助剂、微米级石英砂和去离子水加入磨机进行湿法研磨,得到亚微米级石英浆料;
步骤三:将微米级石英浆料和亚微米级石英浆料混合,然后依次加入熔融石英砂骨料,有机粘结剂和无机添加剂混合均匀。
一种降低多晶铸锭氧含量石英涂层的制备方法,基于石英涂层的总重量:包括5%-50%的熔融石英砂骨料,所述骨料颗粒粒度为50-200目;0.05%-0.5%的醇类研磨助剂;10%-50%的微米级石英浆料,所述微米级石英浆料固含量50%-80%,D50=3.0±2.0um; 5%-30%的亚微米级石英浆料,所述亚微米级石英浆料固含量30%-70%,D50=0.8±0.3um;0.1%-10%的有机粘结剂,所述有机粘结剂为PVA,PVP和PAM中一种或其任意组合;0.1%-5%的无机添加剂,所述无机添加剂为硅酸铝,硅酸锆和氧化钇中一种或其任意组合。
本发明的有益技术效果:
通过该方法制备的石英涂层涂覆在多晶硅生产使用的石英坩埚内表面,在有效阻隔杂质扩散的同时,可显著降低多晶铸锭的氧含量,减少由于氧含量过高带来的氧施主,氧沉积而导致的硅片转化效率低的问题,提升了铸锭产出硅片的转化效率。
Claims (2)
1.一种降低多晶铸锭氧含量石英涂层的制备方法,其特征在于,包含以下步骤:
步骤一:将醇类研磨助剂、微米级石英砂和去离子水加入磨机进行湿法研磨,得到微米级石英浆料;
步骤二:将醇类研磨助剂、微米级石英砂和去离子水加入磨机进行湿法研磨,得到亚微米级石英浆料;
步骤三:将微米级石英浆料和亚微米级石英浆料混合,然后依次加入熔融石英砂骨料,有机粘结剂和无机添加剂混合均匀。
2.根据权利要求1所述一种降低多晶铸锭氧含量石英涂层的制备方法,其特征在于,基于石英涂层的总重量:包括5%-50%的熔融石英砂骨料,所述骨料颗粒粒度为50-200目;0.05%-0.5%的醇类研磨助剂;10%-50%的微米级石英浆料,所述微米级石英浆料固含量50%-80%,D50=3.0±2.0um; 5%-30%的亚微米级石英浆料,所述亚微米级石英浆料固含量30%-70%,D50=0.8±0.3um;0.1%-10%的有机粘结剂,所述有机粘结剂为PVA,PVP和PAM中一种或其任意组合;0.1%-5%的无机添加剂,所述无机添加剂为硅酸铝,硅酸锆和氧化钇中一种或其任意组合。
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN112626614A (zh) * | 2020-12-11 | 2021-04-09 | 江西中昱新材料科技有限公司 | 一种用于铸锭类超高纯涂层石英坩埚及其制备方法 |
Citations (4)
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CN101508590A (zh) * | 2009-03-20 | 2009-08-19 | 江西赛维Ldk太阳能高科技有限公司 | 一种多晶硅铸锭用坩埚涂层以及制备方法 |
CN102527594A (zh) * | 2012-01-22 | 2012-07-04 | 常熟华融太阳能新型材料有限公司 | 一种铸锭用石英坩埚及其制备方法 |
CN102797042A (zh) * | 2012-09-06 | 2012-11-28 | 张礼强 | 一种用于熔解晶体硅的坩埚及其制备方法和喷涂液 |
CN105648528A (zh) * | 2016-03-15 | 2016-06-08 | 常熟华融太阳能新型材料有限公司 | 一种新型高纯石英坩埚及其制备方法 |
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CN101508590A (zh) * | 2009-03-20 | 2009-08-19 | 江西赛维Ldk太阳能高科技有限公司 | 一种多晶硅铸锭用坩埚涂层以及制备方法 |
CN102527594A (zh) * | 2012-01-22 | 2012-07-04 | 常熟华融太阳能新型材料有限公司 | 一种铸锭用石英坩埚及其制备方法 |
CN102797042A (zh) * | 2012-09-06 | 2012-11-28 | 张礼强 | 一种用于熔解晶体硅的坩埚及其制备方法和喷涂液 |
CN105648528A (zh) * | 2016-03-15 | 2016-06-08 | 常熟华融太阳能新型材料有限公司 | 一种新型高纯石英坩埚及其制备方法 |
Cited By (1)
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CN112626614A (zh) * | 2020-12-11 | 2021-04-09 | 江西中昱新材料科技有限公司 | 一种用于铸锭类超高纯涂层石英坩埚及其制备方法 |
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