CN108312043A - Roll shape vibrates auxiliary polishing device and method - Google Patents

Roll shape vibrates auxiliary polishing device and method Download PDF

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Publication number
CN108312043A
CN108312043A CN201810323490.7A CN201810323490A CN108312043A CN 108312043 A CN108312043 A CN 108312043A CN 201810323490 A CN201810323490 A CN 201810323490A CN 108312043 A CN108312043 A CN 108312043A
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platform
motor
screw
displacement
polishing
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CN108312043B (en
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谷岩
林洁琼
卢明明
陈修元
田旭
周岩
康洺硕
张成龙
杨继犇
王点正
张哲名
徐梓苏
苍新宇
付斌
张晋
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Changchun University of Technology
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Changchun University of Technology
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/04Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/02Frames; Beds; Carriages
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/02Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
    • B24B47/04Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by mechanical gearing only
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/04Devices or means for dressing or conditioning abrasive surfaces of cylindrical or conical surfaces on abrasive tools or wheels
    • B24B53/053Devices or means for dressing or conditioning abrasive surfaces of cylindrical or conical surfaces on abrasive tools or wheels using a rotary dressing tool
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

本发明涉及一种辊型振动辅助抛光装置及方法,属于超精密加工领域。Z向运动平台通过螺钉与Z轴运动系统一和Z轴运动系统二连接,Z轴运动系统一和Z轴运动系统二通过螺钉与底座平台连接,X向运动平台一通过螺钉与X轴运动系统一和X轴运动系统二连接,X轴运动系统一和X轴运动系统二通过螺钉与底座平台连接,X向运动平台二通过螺钉与X轴运动系统三连接,X轴运动系统三通过螺钉与底座平台连接,复式振动平台通过螺钉与X向运动平台二连接。本发明具有抛光效率高、抛光均匀性和一致性好、可以完成对曲面的抛光处理和实时在线修整等优点。

The invention relates to a roller-shaped vibration-assisted polishing device and method, belonging to the field of ultra-precision processing. The Z-direction motion platform is connected to the Z-axis motion system 1 and the Z-axis motion system 2 through screws, the Z-axis motion system 1 and the Z-axis motion system 2 are connected to the base platform through screws, and the X-direction motion platform 1 is connected to the X-axis motion system through screws. One is connected with X-axis motion system two, X-axis motion system one and X-axis motion system two are connected with the base platform through screws, X-axis motion platform two is connected with X-axis motion system three through screws, and X-axis motion system three is connected with the base platform through screws The base platform is connected, and the compound vibration platform is connected with the X-direction motion platform two through screws. The invention has the advantages of high polishing efficiency, good polishing uniformity and consistency, can complete the polishing treatment and real-time on-line trimming of curved surfaces, and the like.

Description

辊型振动辅助抛光装置及方法Roller type vibration assisted polishing device and method

技术领域technical field

本发明涉及超精密加工领域,尤指辊型振动辅助抛光方法及装置。The invention relates to the field of ultra-precision machining, in particular to a roller-type vibration-assisted polishing method and device.

背景技术Background technique

随着科学技术的快速发展,在工业的各个领域不仅对零件表面的质量和完整性提出了更高的要求,而且零件逐渐趋于微小化,这就要求加工精度在传统加工技术上提高一个精度,因此提出了超精密加工技术,超精密加工技术主要应用在大规模集成电路、航空航天、半导体等领域,加工后的工件表面精度可达纳米级或亚纳米级,在超精密加工中,抛光一直都是主要加工手段,并且通常为超精密加工的最终步骤,其目的是获得光滑、平整的表面。With the rapid development of science and technology, not only higher requirements are put forward for the quality and integrity of the surface of parts in various fields of industry, but also the parts tend to be miniaturized gradually, which requires that the processing accuracy should be improved by one level in the traditional processing technology Therefore, ultra-precision machining technology is proposed. Ultra-precision machining technology is mainly used in large-scale integrated circuits, aerospace, semiconductors and other fields. The surface precision of the processed workpiece can reach nanometer or sub-nanometer level. In ultra-precision machining, polishing It has always been the main processing method and is usually the final step of ultra-precision machining, the purpose of which is to obtain a smooth and flat surface.

20世纪60年代日本学者隈部淳一郎将振动系统引入机械加工中,并逐渐发展成为机械加工行业中的热门,振动加工的目的是使游离磨料更加均匀的分布在加工工件表面,以达到均匀化抛光的目的,特别适合玻璃、石英、碳化硅等硬脆材料的加工。In the 1960s, Japanese scholar Junichiro Kumabe introduced the vibration system into mechanical processing, and gradually developed into a hot spot in the mechanical processing industry. The purpose of vibration processing is to make the free abrasives more evenly distributed on the surface of the workpiece to achieve uniform polishing. Purpose, especially suitable for processing hard and brittle materials such as glass, quartz and silicon carbide.

目前针对硬脆材料的加工方式主要有离子束抛光、射流抛光、化学机械抛光和振动辅助抛光等,离子束抛光主要是利用离子枪产生的离子经加速形成的离子束流发射到工件表面,使材料变形分离,但其抛光效率较低;射流抛光是一种抛光精度可达原子级的抛光手段,但其加工界面不稳定也使应用范围较小;传统化学机械抛光工艺主要用于半导体制造、柔性印刷电路板和制造电子器件等,化学机械抛光系统使被抛光工件在其轴上受到扭矩,使得被加工的超薄基体可能表现撕裂或折叠等问题;目前大多数的振动辅助抛光装置是通过压电传感器将电能转换为机械能的共振类型,大部分的振动辅助抛光装置为共振型,虽然共振型的振动辅助抛光装置的振动频率较高,但振动参数无法调整,不易于进行闭环控制,相对而言,非共振型的振动辅助抛光装置具有工作范围宽、运动参数可调和易于进行闭环控制等优点,所以,非共振型振动辅助抛光装置的设计仍是一项关键任务。At present, the processing methods for hard and brittle materials mainly include ion beam polishing, jet polishing, chemical mechanical polishing and vibration-assisted polishing. The material is deformed and separated, but its polishing efficiency is low; jet polishing is a polishing method with polishing accuracy up to the atomic level, but its unstable processing interface also makes the application range small; traditional chemical mechanical polishing technology is mainly used in semiconductor manufacturing, Flexible printed circuit boards and manufacturing electronic devices, etc., the chemical mechanical polishing system makes the polished workpiece subject to torque on its axis, so that the processed ultra-thin substrate may show problems such as tearing or folding; most of the current vibration-assisted polishing devices are The resonance type that converts electrical energy into mechanical energy through a piezoelectric sensor. Most of the vibration-assisted polishing devices are of the resonance type. Although the vibration frequency of the resonance-type vibration-assisted polishing device is relatively high, the vibration parameters cannot be adjusted, and it is not easy to perform closed-loop control. Relatively speaking, the non-resonant vibration-assisted polishing device has the advantages of wide working range, adjustable motion parameters and easy closed-loop control. Therefore, the design of the non-resonant vibration-assisted polishing device is still a key task.

发明内容Contents of the invention

本发明提供一种辊型振动辅助抛光装置及方法,以解决目前存在的抛光效率低、应用范围小的问题。The invention provides a roller-type vibration-assisted polishing device and method to solve the existing problems of low polishing efficiency and small application range.

本发明采取的技术方案是:包括Z轴运动系统一、Z轴运动系统二、Z向运动平台、X轴运动系统一、X轴运动系统二、X向运动平台一、X轴运动系统三、X向运动平台二、复式振动平台、底座平台,其中Z向运动平台通过螺钉与Z轴运动系统一和Z轴运动系统二连接,Z轴运动系统一和Z轴运动系统二通过螺钉与底座平台连接,X向运动平台一通过螺钉与X轴运动系统一和X轴运动系统二连接,X轴运动系统一和X轴运动系统二通过螺钉与底座平台连接,X向运动平台二通过螺钉与X轴运动系统三连接,X轴运动系统三通过螺钉与底座平台连接,复式振动平台通过螺钉与X向运动平台二连接。The technical solution adopted by the present invention is: including Z-axis motion system 1, Z-axis motion system 2, Z-axis motion platform, X-axis motion system 1, X-axis motion system 2, X-axis motion platform 1, X-axis motion system 3, X-axis motion platform 2, compound vibration platform, and base platform, among which the Z-axis motion platform is connected to Z-axis motion system 1 and Z-axis motion system 2 through screws, and Z-axis motion system 1 and Z-axis motion system 2 are connected to the base platform through screws Connection, X-axis motion platform 1 is connected to X-axis motion system 1 and X-axis motion system 2 through screws, X-axis motion system 1 and X-axis motion system 2 are connected to the base platform through screws, and X-axis motion platform 2 is connected to X-axis motion system 2 through screws. The three-axis motion system is connected, the X-axis motion system three is connected to the base platform through screws, and the compound vibration platform is connected to the X-direction motion platform two through screws.

所述的Z轴运动系统一和Z轴运动系统二结构相同,其中Z轴运动系统一包括:工字形导轨一、机座一、轴承座一、联轴器一、滑台一、底板一、电机一和电机一驱动的滚珠丝杠一,所述工字形导轨一通过螺钉与底板一连接,电机一通过螺钉与机座一连接,机座一通过螺钉与底板一连接,电机一通过联轴器一和轴承座一与滚珠丝杠一连接,滚珠丝杠一安装在工字形导轨一之间,滑台一安装在工字形导轨一上。The Z-axis motion system 1 and the Z-axis motion system 2 have the same structure, wherein the Z-axis motion system 1 includes: I-shaped guide rail 1, machine base 1, bearing housing 1, shaft coupling 1, slide table 1, base plate 1, Motor 1 and ball screw 1 driven by motor 1, the I-shaped guide rail 1 is connected to base plate 1 through screws, motor 1 is connected to base plate 1 through screws, base 1 is connected to base plate 1 through screws, and motor 1 is connected to base plate 1 through shaft coupling Device one and bearing seat one are connected with ball screw one, ball screw one is installed between I-shaped guide rail one, and slide table one is installed on I-shaped guide rail one.

所述的Z向运动平台包括电机安装台一、电机二、轴承座二、联轴器二、电机支撑台一、抛光辊、扭矩传感器和抛光辊轴,其中电机二通过螺钉与电机安装台一连接,电机二的输出轴通过联轴器二与抛光辊连接,抛光辊另一端连接在轴承座二上,轴承座二通过螺钉与电机支撑台一连接,扭矩传感器安装在抛光辊轴上,电机安装台一和电机支撑台一均通过螺钉与滑台连接。The Z-direction motion platform includes motor mounting platform 1, motor 2, bearing seat 2, shaft coupling 2, motor support table 1, polishing roller, torque sensor and polishing roller shaft, wherein motor 2 is connected to motor mounting platform 1 through screws Connection, the output shaft of the motor 2 is connected with the polishing roller through the coupling 2, the other end of the polishing roller is connected to the bearing seat 2, the bearing seat 2 is connected to the motor support table 1 through screws, the torque sensor is installed on the polishing roller shaft, and the motor Both the mounting platform one and the motor support platform one are connected with the sliding platform by screws.

所述的X轴运动系统一和X轴运动系统二结构相同,其中X轴运动系统一包括工字形导轨二、机座二、轴承座三、联轴器三、滑台二、底板二、电机三和滚珠丝杠二,所述工字形导轨二通过螺钉与底板二连接,电机三通过螺钉与机座二连接,机座二通过螺钉与底座平台连接,电机三通过联轴器三和轴承座三与滚珠丝杠二连接,滚珠丝杠二安装在工字形导轨二之间,滑台二安装在工字形导轨二上。The X-axis motion system 1 and the X-axis motion system 2 have the same structure, wherein the X-axis motion system 1 includes the I-shaped guide rail 2, the machine base 2, the bearing housing 3, the coupling 3, the slide table 2, the base plate 2, the motor Sanhe ball screw 2, the I-shaped guide rail 2 is connected to the base plate 2 through screws, the motor 3 is connected to the frame 2 through screws, the frame 2 is connected to the base platform through screws, and the motor 3 is connected to the bearing seat through the coupling 3 The third is connected with the second ball screw, the second ball screw is installed between the two I-shaped guide rails, and the second slide table is installed on the second I-shaped guide rail.

所述的X向运动平台一包括电机四、电机安装台二、电机支撑台二、联轴器四、轴承座四和修整辊,其中电机四固定在电机安装台二上,电机四的输出轴通过联轴器四与修整辊连接,修整辊的另一端安装在电机支撑台二的轴承座四中,电机安装台二和电机支撑台二通过螺钉与滑台连接。The X-direction motion platform 1 includes motor 4, motor mounting platform 2, motor supporting platform 2, shaft coupling 4, bearing seat 4 and trimming roller, wherein motor 4 is fixed on motor mounting platform 2, and the output shaft of motor 4 Connect with the dressing roller through coupling four, and the other end of the dressing roller is installed in the bearing seat four of the motor support table two, and the motor installation table two and the motor support table two are connected with the slide table by screws.

所述的X轴运动系统三包括工字形导轨三、机座三、轴承座五、联轴器五、滑台三、底板三、电机五和滚珠丝杠三,其中工字形导轨三通过螺钉与底板三连接,电机五通过螺钉与机座三连接,机座三通过螺钉与底板三连接,电机五通过联轴器五和轴承座五与滚珠丝杠三连接,滚珠丝杠三安装在工字形导轨三之间,滑台三安装在工字形导轨三上。The X-axis motion system three includes an I-shaped guide rail three, a machine base three, a bearing seat five, a shaft coupling five, a slide table three, a base plate three, a motor five and a ball screw three, wherein the I-shaped guide rail three passes screws and Bottom plate 3 is connected, motor 5 is connected to frame 3 through screws, frame 3 is connected to base plate 3 through screws, motor 5 is connected to ball screw 3 through coupling 5 and bearing seat 5, and ball screw 3 is installed on the I-shaped Between the guide rails three, the slide table three is installed on the I-shaped guide rail three.

所述的X向运动平台二包括电机六、减速器、联轴器六、轴承座六、圆弧台、摆台、蜗杆和蜗轮,其中圆弧台通过螺钉安装在滑台上,电机六通过减速器和联轴器连接蜗杆,完成蜗杆的转动,蜗杆带动蜗轮完成蜗轮的转动,蜗轮安装在摆台中,蜗轮带动摆台在圆弧台完成曲面运动,摆台上水平安装有复式振动平台。The X-direction motion platform 2 includes motor 6, reducer, coupling 6, bearing seat 6, arc table, swing table, worm and worm gear, wherein the arc table is installed on the sliding table by screws, and the motor 6 passes through The reducer and coupling are connected to the worm to complete the rotation of the worm. The worm drives the worm wheel to complete the rotation of the worm wheel. The worm wheel is installed in the swing table, and the worm wheel drives the swing table to complete the curved surface movement on the arc table. A compound vibration platform is installed horizontally on the swing table.

所述复式振动平台包括振动底座、振动平台发生装置、防摩擦板、振动工作台、位移传感器和位移传感器夹具体,其中振动平台发生装置通过螺钉与振动底座连接,振动工作台与振动平台发生装置之间有一防摩擦板,用来减小振动工作台与振动平台发生装置之间的摩擦,振动工作台和防摩擦板通过螺钉固定在振动平台发生装置上,位移传感器安装在位移传感器夹具体中,两个位移传感器夹具体均安装在振动平台发生装置上,两个位移传感器的前端均与振动工作台接触,用于测量振动工作台的X向位移和Y向位移,振动底座包括凸缘,凸缘用于固定振动平台发生装置的Y向位移;The compound vibration platform includes a vibration base, a vibration platform generating device, an anti-friction plate, a vibration table, a displacement sensor and a displacement sensor clamp body, wherein the vibration platform generating device is connected with the vibration base through screws, and the vibration table and the vibration platform generating device There is an anti-friction plate in between to reduce the friction between the vibration table and the vibration platform generator. The vibration table and the anti-friction plate are fixed on the vibration platform generator by screws, and the displacement sensor is installed in the displacement sensor clamp. , the two displacement sensor clamps are installed on the vibration platform generating device, the front ends of the two displacement sensors are in contact with the vibration table, used to measure the X-direction displacement and Y-direction displacement of the vibration table, the vibration base includes flanges, The flange is used to fix the Y-direction displacement of the vibration platform generating device;

所述振动平台发生装置包括X向振动装置、Y向振动装置和连接器,X向振动装置通过连接器刚性连接在Y向振动装置上;The vibration platform generating device includes an X-direction vibration device, a Y-direction vibration device and a connector, and the X-direction vibration device is rigidly connected to the Y-direction vibration device through the connector;

所述X向振动装置包括桥式放大机构一、杠杆放大机构一、压电陶瓷一、刚性臂一、位移传递器一和固定块,固定块和刚性臂一分别用螺钉固定在振动底座上,压电陶瓷一通过螺钉安装在桥式放大机构一中,桥式放大机构一产生的微位移通过位移传递器一传递给杠杆放大机构一,杠杆放大机构一用于放大桥式放大机构一产生的微位移;The X-direction vibrating device comprises a bridge type amplifying mechanism one, a lever amplifying mechanism one, piezoelectric ceramics one, a rigid arm one, a displacement transmitter one and a fixed block, and the fixed block and the rigid arm one are fixed on the vibrating base with screws respectively, Piezoelectric ceramics are installed in the bridge-type amplifying mechanism-one through screws, and the micro-displacement generated by the bridge-type amplifying mechanism-one is transmitted to the lever amplifying mechanism-one through the displacement transmitter-one, and the lever amplifying mechanism-one is used to amplify the displacement produced by the bridge-type amplifying mechanism-one Micro displacement;

所述Y向振动装置包括桥式放大机构二、杠杆放大机构二、压电陶瓷二、刚性臂二、位移传递器二、初级振动平台和振动外壁,刚性臂二通过螺钉固定在振动底座上,压电陶瓷二通过螺钉安装在桥式放大机构二中,桥式放大机构二产生的微位移通过位移传递器二传递给杠杆放大机构二,杠杆放大机构二用于放大桥式放大机构二产生的微位移,X向振动装置和Y向振动装置相互独立,不存在耦合影响。The Y-direction vibration device includes a bridge type amplification mechanism 2, a lever amplification mechanism 2, piezoelectric ceramics 2, a rigid arm 2, a displacement transmitter 2, a primary vibration platform and a vibration outer wall, and the rigid arm 2 is fixed on the vibration base by screws. The piezoelectric ceramic 2 is installed in the bridge-type amplifying mechanism 2 through screws, and the micro-displacement generated by the bridge-type amplifying mechanism 2 is transmitted to the lever amplifying mechanism 2 through the displacement transmitter 2, and the lever amplifying mechanism 2 is used to amplify the bridge-type amplifying mechanism 2. For micro-displacement, the X-direction vibration device and the Y-direction vibration device are independent of each other, and there is no coupling effect.

所述的底座平台包括底座和龙门架,龙门架刚性连接于底座上。The base platform includes a base and a portal frame, and the portal frame is rigidly connected to the base.

采用辊型振动辅助抛光装置的抛光方法,包括下列步骤:The polishing method using a roller-type vibration-assisted polishing device comprises the following steps:

(一)、被抛光工件通过石蜡粘在振动工作台上,X向运动平台二带动被抛光工件沿X负方向运动到指定位置,Z向运动平台带动抛光辊沿Z方向运动到指定位置;(1) The workpiece to be polished is stuck on the vibrating table through paraffin, the X-direction movement platform drives the polished workpiece to move to the designated position along the negative X direction, and the Z-direction movement platform drives the polishing roller to move to the designated position along the Z direction;

(二)、被抛光工件的X向位移由桥式放大机构一、杠杆放大机构一对X向位移的二级放大作用实现,Y向位移由桥式放大机构二、杠杆放大机构二对Y向位移的二级放大作用实现,X向位移和Y向位移在初级振动平台矢量合成为一条运动曲线,若抛光辊绕Y轴顺时针转动,则复式振动平台沿X正方向运动,即抛光辊与复式振动平台发生相对反向运动以线接触的形式(辊对平面)对被抛光工件进行抛光,当需要进行曲面抛光时,通过圆弧台和摆台的配合,可以使被抛光工件产生摆动,完成对曲面的抛光;(2) The X-direction displacement of the polished workpiece is realized by the two-stage amplification effect of the bridge-type amplifying mechanism 1 and the lever amplifying mechanism on the X-direction displacement, and the Y-direction displacement is realized by the bridge-type amplifying mechanism 2 and the lever amplifying mechanism 2 on the Y-direction The secondary amplification of the displacement is realized. The X-direction displacement and the Y-direction displacement are synthesized into a motion curve on the primary vibration platform. If the polishing roller rotates clockwise around the Y-axis, the compound vibration platform moves along the positive X direction, that is, the polishing roller and the Y-axis move clockwise. The compound vibrating platform moves in the opposite direction and polishes the polished workpiece in the form of line contact (roller to plane). When it is necessary to polish the curved surface, the polished workpiece can be oscillated through the cooperation of the arc table and the swing table. Complete the polishing of the surface;

(三)、当抛光进行到一定程度时,抛光辊需要进行修整,此时X向运动平台一和X向运动平台二同时沿X方向运动,Z向运动平台沿Z方向运动,运动至X向运动平台一中的修整辊到达Z向运动平台中的抛光辊表面为止,开始进行在线实时修整,抛光辊与修整辊的运动为相对反向运动;(3) When the polishing is carried out to a certain extent, the polishing roller needs to be trimmed. At this time, the X-direction moving platform 1 and the X-direction moving platform 2 move along the X direction at the same time, and the Z-direction moving platform moves along the Z direction and moves to the X direction. On-line real-time dressing starts until the dressing roller on the moving platform 1 reaches the surface of the polishing roller on the Z-direction moving platform, and the movement of the polishing roller and the dressing roller is a relative reverse motion;

(四)、在线实时修整完成后,调整X向运动平台一、X向运动平台二和Z向运动平台的位置,使X向运动平台二中的被抛光工件到达抛光辊表面,重新进行抛光;(4), after the online real-time trimming is completed, adjust the positions of the X-direction motion platform 1, the X-direction motion platform 2 and the Z-direction motion platform, so that the polished workpiece in the X-direction motion platform 2 reaches the surface of the polishing roller, and re-polishes;

(五)、不断重复步骤二和步骤三,直至完成抛光。(5) Steps 2 and 3 are repeated continuously until the polishing is completed.

本发明的优点是:The advantages of the present invention are:

(1)提出了一种新式的辊型抛光,相较于传统的振动辅助抛光,被抛光工件与抛光工具的接触方式由常规的点、面接触变为线接触,考虑到线性接触材料去除机制的摩擦较小,它有很小的可能性导致超薄基体表现出弯曲变形,并且大矩形玻璃基体也不太可能表现出脆性断裂,此外,辊型抛光系统可应用于连续自动化生产过程,在保证工件表面光滑度和完整性的同时保证了抛光的一致性;(1) A new type of roller polishing is proposed. Compared with the traditional vibration-assisted polishing, the contact mode between the polished workpiece and the polishing tool is changed from conventional point and surface contact to line contact. Considering the linear contact material removal mechanism The friction is small, it has little possibility to cause the ultra-thin substrate to show bending deformation, and the large rectangular glass substrate is also less likely to show brittle fracture, in addition, the roller polishing system can be applied to the continuous automatic production process, in Ensure the smoothness and integrity of the surface of the workpiece while ensuring the consistency of polishing;

(2)抛光辊与复式振动平台采取相对反向的运动方式,抛光辊产生双向去除的效果,大大的提高了平均去除率;(2) The polishing roller and the compound vibration platform adopt a relatively reverse movement mode, and the polishing roller produces a two-way removal effect, which greatly improves the average removal rate;

(3)复式振动平台采用桥式放大机构与杠杆放大机构相配合的二级放大方式,大大增加了装置的位移行程,X向振动装置和Y向振动装置相互独立,互不影响,解决了复式振动平台的耦合问题,且复式振动平台的水平放置也保证了抛光的均匀性;(3) The compound vibration platform adopts a two-stage amplification method in which the bridge-type amplification mechanism and the lever amplification mechanism cooperate, which greatly increases the displacement stroke of the device. The X-direction vibration device and the Y-direction vibration device are independent of each other and do not affect each other. The coupling problem of the vibration platform, and the horizontal placement of the multiple vibration platform also ensures the uniformity of polishing;

(4)加入圆弧台,使装置可以完成对曲面的抛光,大大的增加了装置的可用范围,加入实时修整装置,使抛光辊可以在线实时修整,有效的避免了由多次装卡引起的装卡误差。(4) The arc table is added so that the device can complete the polishing of the curved surface, which greatly increases the usable range of the device. The real-time trimming device is added to enable the polishing roller to be trimmed online in real time, effectively avoiding the damage caused by multiple clamping Card loading error.

附图说明Description of drawings

图1是本发明的结构示意图;Fig. 1 is a structural representation of the present invention;

图2是本发明的Z轴运动系统一、Z轴运动系统二和Z向运动平台的结构示意图;Fig. 2 is a schematic structural view of the Z-axis motion system one, the Z-axis motion system two and the Z-direction motion platform of the present invention;

图3是本发明的电机安装台一的结构示意图;Fig. 3 is a schematic structural view of a motor mounting platform 1 of the present invention;

图4是本发明的电机支撑台一的结构示意图;Fig. 4 is a schematic structural view of a motor support platform 1 of the present invention;

图5是本发明的X轴运动系统一、X轴运动系统二和X向运动平台一的结构示意图;Fig. 5 is a structural schematic diagram of the first X-axis motion system, the second X-axis motion system and the first X-axis motion platform of the present invention;

图6是本发明的电机支撑台二的结构示意图;Fig. 6 is a schematic structural view of the second motor support platform of the present invention;

图7是本发明的X轴运动系统三和X向运动平台二的结构示意图;Fig. 7 is a structural schematic diagram of the X-axis motion system 3 and the X-direction motion platform 2 of the present invention;

图8是本发明的X向运动平台二全剖视的结构示意图;Fig. 8 is a structural schematic diagram of a full cross-section of the X-direction motion platform of the present invention;

图9是本发明的振动底座、振动源平台和防摩擦板的结构示意图;Fig. 9 is a schematic structural view of the vibrating base, the vibrating source platform and the anti-friction plate of the present invention;

图10是本发明的振动平台发生装置的结构示意图;Fig. 10 is a schematic structural view of the vibration platform generating device of the present invention;

图11是本发明的复式振动平台的结构示意图;Fig. 11 is a schematic structural view of the compound vibration platform of the present invention;

图12是本发明的底座平台的结构示意图;Fig. 12 is a schematic structural view of the base platform of the present invention;

图13是本发明复式振动平台的运动轨迹的结构示意图;Fig. 13 is a structural schematic diagram of the motion trajectory of the compound vibration platform of the present invention;

附图标记说明:Z轴运动系统一1,Z轴运动系统二2,Z向运动平台3,X轴运动系统一4,X轴运动系统二5,X向运动平台一6,X轴运动系统三7,X向运动平台二8,复式振动平台9,底座平台10,被抛光工件11,工字形导轨一101,机座一102,轴承座一103,联轴器104,滑台105,底板106,电机一107,滚珠丝杠一108,电机安装台一301,电机二302,轴承座二303,联轴器二304,电机支撑台一305,抛光辊306,扭矩传感器307,抛光辊轴308,工字形导轨二401,机座二402,轴承座三403,联轴器404,滑台405,底板二406,电机三407,滚珠丝杠二408,电机四601,电机安装台二602,电机支撑台二603,联轴器四604,轴承座四605,修整辊606,工字形导轨三701,机座702,轴承座五703,联轴器五704,滑台三705,底板三706,电机五707,滚珠丝杠三708,电机六801,减速器802,联轴器六803,轴承座六804,圆弧台805,摆台806,蜗杆807,蜗轮808,振动底座901,振动平台发生装置902,防摩擦板903,振动工作台904,位移传感器905,位移传感器夹具体906,凸缘90101,X向振动装置90201,Y向振动装置90202,连接器90203,桥式放大机构一9020101,杠杆放大机构一9020102,压电陶瓷一9020103,刚性臂一9020104,位移传递器一9020105,固定块9020106,桥式放大机构二9020201,杠杆放大机构二9020202,压电陶瓷二9020203,刚性臂二9020204,位移传递器二9020205,初级振动平台9020206,振动外壁9020207,底座1001,龙门架1002。Description of reference signs: Z-axis motion system one 1, Z-axis motion system two 2, Z-axis motion platform 3, X-axis motion system one 4, X-axis motion system two 5, X-axis motion platform one 6, X-axis motion system Three 7, X-direction motion platform two 8, compound vibration platform 9, base platform 10, polished workpiece 11, I-shaped guide rail 1 101, machine base 1 102, bearing housing 1 103, coupling 104, slide table 105, bottom plate 106, motor one 107, ball screw one 108, motor mounting table one 301, motor two 302, bearing seat two 303, coupling two 304, motor support table one 305, polishing roller 306, torque sensor 307, polishing roller shaft 308, I-shaped guide rail 2 401, machine base 2 402, bearing housing 3 403, coupling 404, slide table 405, bottom plate 2 406, motor 3 407, ball screw 2 408, motor 4 601, motor installation table 2 602 , Motor support platform 2 603, coupling 4 604, bearing seat 4 605, trimming roller 606, I-shaped guide rail 3 701, machine base 702, bearing seat 5 703, coupling 5 704, slide table 3 705, bottom plate 3 706, motor five 707, ball screw three 708, motor six 801, reducer 802, coupling six 803, bearing seat six 804, arc table 805, swing table 806, worm 807, worm wheel 808, vibration base 901, Vibration platform generating device 902, anti-friction plate 903, vibration table 904, displacement sensor 905, displacement sensor clamp body 906, flange 90101, X-direction vibration device 90201, Y-direction vibration device 90202, connector 90203, bridge amplification mechanism One 9020101, lever amplifying mechanism one 9020102, piezoelectric ceramic one 9020103, rigid arm one 9020104, displacement transmitter one 9020105, fixed block 9020106, bridge type amplifying mechanism two 9020201, lever amplifying mechanism two 9020202, piezoelectric ceramic two 9020203, rigid Arm two 9020204, displacement transmitter two 9020205, primary vibration platform 9020206, vibration outer wall 9020207, base 1001, gantry 1002.

具体实施方式Detailed ways

如图1所示,包括Z轴运动系统一1、Z轴运动系统二2、Z向运动平台3、X轴运动系统一4、X轴运动系统二5、X向运动平台一6、X轴运动系统三7、X向运动平台二8、复式振动平台9、底座平台10,其中Z向运动平台3通过螺钉与Z轴运动系统一1和Z轴运动系统二2连接,Z轴运动系统一1和Z轴运动系统二2通过螺钉与底座平台10连接,X向运动平台一6通过螺钉与X轴运动系统一4和X轴运动系统二5连接,X轴运动系统一4和X轴运动系统二5通过螺钉与底座平台10连接,X向运动平台二8通过螺钉与X轴运动系统三7连接,X轴运动系统三7通过螺钉与底座平台10连接,被抛光工件11通过石蜡粘在复式振动平台9上,复式振动平台9通过螺钉与X向运动平台二8连接。As shown in Figure 1, it includes Z-axis motion system 1, Z-axis motion system 2, Z-axis motion platform 3, X-axis motion system 1 4, X-axis motion system 2 5, X-axis motion platform 1 6, and X-axis Motion system 3 7, X-axis motion platform 2 8, compound vibration platform 9, and base platform 10, wherein Z-axis motion platform 3 is connected with Z-axis motion system 1 and Z-axis motion system 2 through screws, Z-axis motion system 1 1 and Z-axis motion system 2 2 are connected to the base platform 10 through screws, X-axis motion platform 1 6 is connected to X-axis motion system 1 4 and X-axis motion system 2 5 through screws, and X-axis motion system 1 4 and X-axis motion System 2 5 is connected to the base platform 10 by screws, X-direction motion platform 2 8 is connected to X-axis motion system 3 7 by screws, X-axis motion system 3 7 is connected to the base platform 10 by screws, and the polished workpiece 11 is glued on by paraffin On the compound vibration platform 9, the compound vibration platform 9 is connected with the X-direction motion platform 2 8 through screws.

Z轴运动系统一1、Z轴运动系统二2和Z向运动平台3一起配合完成Z向运动平台1的直线往复运动,X轴运动系统一4、X轴运动系统二5个X向运动平台一6一起配合完成X向运动平台一6的直线往复运动,X轴运动系统三7和X向运动平台二8一起配合完成X向运动平台二8的直线往复运动,为了保证抛光的稳定性、均匀性和一致性,装置采用复式振动平台8的X、Y方向平动、Z向运动平台3的Z方向平动和抛光辊306的绕Y轴转动四个自由度。Z-axis motion system one 1, Z-axis motion system two 2 and Z-direction motion platform 3 cooperate to complete the linear reciprocating motion of Z-direction motion platform 1, X-axis motion system one 4, X-axis motion system two 5 X-direction motion platforms 1 and 6 work together to complete the linear reciprocating motion of the X-direction motion platform 1 6, and the X-axis motion system 3 7 and X-direction motion platform 2 8 cooperate together to complete the linear reciprocating motion of the X-direction motion platform 2 8. In order to ensure the stability of polishing, Uniformity and consistency, the device adopts the four degrees of freedom of the X and Y direction translation of the compound vibration platform 8, the Z direction translation of the Z movement platform 3, and the rotation of the polishing roller 306 around the Y axis.

如图2、图3和图4所示的Z轴运动系统一1和Z轴运动系统二2结构相同,以Z轴运动系统一1为例,Z轴运动系统一1包括有工字形导轨一101、机座一102、轴承座一103、联轴器一104、滑台一105、底板一106、电机一107和电机一107驱动的滚珠丝杠一108,工字形导轨一101通过螺钉与底板一106连接,电机一107通过螺钉与机座一102连接,机座一102通过螺钉与底板一106连接,电机一107通过联轴器一104和轴承座一103与滚珠丝杠一108连接,滚珠丝杠一108安装在工字形导轨一101之间,滑台一105安装在工字形导轨一101上。As shown in Figure 2, Figure 3 and Figure 4, the Z-axis motion system 1 and the Z-axis motion system 2 have the same structure. Taking the Z-axis motion system 1 as an example, the Z-axis motion system 1 includes an I-shaped guide rail 1 101, support one 102, bearing housing one 103, shaft coupling one 104, slide table one 105, base plate one 106, motor one 107 and ball screw one 108 driven by motor one 107, I-shaped guide rail one 101 by screw and Bottom plate one 106 is connected, motor one 107 is connected with machine base one 102 through screws, machine base one 102 is connected with bottom plate one 106 through screws, motor one 107 is connected with ball screw one 108 through coupling one 104 and bearing seat one 103 , The ball screw one 108 is installed between the I-shaped guide rails one 101, and the slide table one 105 is installed on the I-shaped guide rail one 101.

Z向运动平台3包括电机安装台一301、电机二302、轴承座二303、联轴器二304、电机支撑台一305、抛光辊306、扭矩传感器307和抛光辊轴308,电机二302通过螺钉与电机安装台一301连接,电机二302的输出轴通过联轴器二304与抛光辊306连接,抛光辊306另一端连接在轴承座二303上,轴承座二303通过螺钉与电机支撑台一305连接,扭矩传感器307安装在抛光辊轴308上,电机安装台一301和电机支撑台一305均通过螺钉与滑台105连接。The Z-direction motion platform 3 includes a motor mounting platform 1 301, a motor 2 302, a bearing seat 2 303, a coupling 2 304, a motor support table 1 305, a polishing roller 306, a torque sensor 307 and a polishing roller shaft 308, and the motor 2 302 passes The screw is connected with the motor installation platform 1 301, the output shaft of the motor 2 302 is connected with the polishing roller 306 through the coupling 2 304, the other end of the polishing roller 306 is connected with the bearing seat 2 303, and the bearing seat 2 303 is connected with the motor support platform through screws One 305 is connected, the torque sensor 307 is installed on the polishing roller shaft 308, and the motor mounting table one 301 and the motor supporting table one 305 are connected with the slide table 105 by screws.

Z向运动平台3的电机二302、轴承座二303和联轴器二304配合完成抛光辊306的自转运动,扭矩传感器307用于实时测量抛光辊306产生的扭矩。The second motor 302 of the Z-direction motion platform 3 , the second bearing seat 303 and the second coupling 304 cooperate to complete the autorotation of the polishing roller 306 , and the torque sensor 307 is used to measure the torque generated by the polishing roller 306 in real time.

如图5和图6所示的X轴运动系统一4和X轴运动系统二5结构相同,以X轴运动系统一4为例,X轴运动系统一4包括工字形导轨二401、机座二402、轴承座三403、联轴器三404、滑台二405、底板二406、电机三407和电机三407驱动的滚珠丝杠二408,工字形导轨二401通过螺钉与底板二406连接,电机三407通过螺钉与机座二402连接,机座二402通过螺钉与底座平台10连接,电机三407通过联轴器三404和轴承座三403与滚珠丝杠二408连接,滚珠丝杠二408安装在工字形导轨二401之间,滑台二405安装在工字形导轨二401上。As shown in Figure 5 and Figure 6, the X-axis motion system one 4 and the X-axis motion system two 5 have the same structure. Taking the X-axis motion system one 4 as an example, the X-axis motion system one 4 includes an I-shaped guide rail 2 401, a machine base Two 402, bearing seat three 403, coupling three 404, sliding table two 405, bottom plate two 406, motor three 407 and ball screw two 408 driven by motor three 407, I-shaped guide rail two 401 are connected to bottom plate two 406 by screws , motor three 407 is connected with machine base two 402 through screws, machine base two 402 is connected with base platform 10 through screws, motor three 407 is connected with ball screw two 408 through coupling three 404 and bearing housing three 403, ball screw The second 408 is installed between the two I-shaped guide rails 401, and the second slide table 405 is installed on the second I-shaped guide rail 401.

X向运动平台一6包括电机四601、电机安装台二602、电机支撑台二603、联轴器四604、轴承座四605和修整辊606,电机四601固定在电机安装台二602上,电机四601的输出轴通过联轴器四604与修整辊606连接,修整辊606的另一端安装在电机支撑台二603的轴承座四605中,电机安装台二602和电机支撑台二603通过螺钉与滑台105连接。The X-direction motion platform 16 includes motor 4 601, motor mounting table 2 602, motor support table 2 603, shaft coupling 4 604, bearing housing 4 605 and trimming roller 606, motor 4 601 is fixed on the motor mounting table 2 602, The output shaft of the motor four 601 is connected with the dressing roller 606 through the shaft coupling four 604, and the other end of the dressing roller 606 is installed in the bearing seat four 605 of the motor support table two 603, and the motor installation table two 602 and the motor support table two 603 pass through Screws are connected with slide table 105.

X向运动平台一6的电机四601、联轴器四604和轴承座四605配合完成修整辊606的自转运动,以便于完成实时修整。The motor four 601 of the X-direction motion platform one 6, the coupling four 604 and the bearing seat four 605 cooperate to complete the autorotation of the dressing roller 606, so as to complete real-time dressing.

如图7和图8所示的X轴运动系统三7包括工字形导轨三701、机座三702、轴承座五703、联轴器五704、滑台三705、底板三706、电机五707和电机五707驱动的滚珠丝杠三708,工字形导轨三701通过螺钉与底板三706连接,电机五707通过螺钉与机座三702连接,机座三702通过螺钉与底板三706连接,电机五707通过联轴器五704和轴承座五703与滚珠丝杠三708连接,滚珠丝杠三708安装在工字形导轨三701之间,滑台三705安装在工字形导轨三701上。The X-axis motion system 37 shown in Figure 7 and Figure 8 includes I-shaped guide rail 3 701, machine base 3 702, bearing housing 5 703, coupling 5 704, slide table 3 705, bottom plate 3 706, motor 5 707 The ball screw three 708 driven by motor five 707, the I-shaped guide rail three 701 are connected to the bottom plate three 706 through screws, the five motors 707 are connected to the frame three 702 through screws, the frame three 702 are connected to the bottom plate three 706 through screws, and the motor Five 707 is connected with ball screw three 708 by coupling five 704 and bearing seat five 703, ball screw three 708 is installed between I-shaped guide rail three 701, slide table three 705 is installed on I-shaped guide rail three 701.

X向运动平台二8包括电机六801、减速器802、联轴器六803、轴承座六804、圆弧台805、摆台806、蜗杆807和蜗轮808,圆弧台805通过螺钉安装在滑台105上,电机六801通过减速器802和联轴器803连接蜗杆807,完成蜗杆807的转动,蜗杆807带动蜗轮808完成蜗轮808的转动,蜗轮808安装在摆台806中,蜗轮808带动摆台806在圆弧台805完成曲面运动,摆台806上水平安装有复式振动平台9。X direction motion platform two 8 comprises motor six 801, speed reducer 802, shaft coupling six 803, bearing seat six 804, arc table 805, pendulum table 806, worm screw 807 and worm wheel 808, and arc table 805 is installed on the slide by screw On stage 105, motor six 801 is connected to worm 807 through reducer 802 and coupling 803 to complete the rotation of worm 807. Worm 807 drives worm wheel 808 to complete the rotation of worm wheel 808. Worm wheel 808 is installed in swing table 806, and worm wheel 808 drives the swing The platform 806 completes the curved surface movement on the arc platform 805, and the compound vibration platform 9 is horizontally installed on the swing platform 806.

如图9、图10和图11所示的复式振动平台9包括振动底座901、振动平台发生装置902、防摩擦板903、振动工作台904、位移传感器905和位移传感器夹具体906,振动平台发生装置902通过螺钉与振动底座901连接,振动工作台904与振动平台发生装置902之间有一防摩擦板903,用来减小振动工作台904与振动平台发生装置902之间的摩擦,振动工作台904和防摩擦板903通过螺钉固定在振动平台发生装置902上,位移传感器905安装在位移传感器夹具体906中,两个位移传感器夹具体906均安装在振动平台发生装置902上,两个位移传感器905的前端均与振动工作台904接触,用于测量振动工作台904的X向位移和Y向位移,振动底座901包括凸缘90101,凸缘90101用于固定振动平台发生装置902的Y向位移。The compound vibration platform 9 shown in Figure 9, Figure 10 and Figure 11 comprises a vibration base 901, a vibration platform generating device 902, an anti-friction plate 903, a vibration table 904, a displacement sensor 905 and a displacement sensor clamp body 906, and the vibration platform generates The device 902 is connected to the vibrating base 901 by screws, and there is an anti-friction plate 903 between the vibrating table 904 and the vibrating platform generating device 902, which is used to reduce the friction between the vibrating table 904 and the vibrating platform generating device 902, and the vibrating table 904 and anti-friction plate 903 are fixed on the vibration platform generating device 902 by screws, the displacement sensor 905 is installed in the displacement sensor clamp body 906, and the two displacement sensor clamp bodies 906 are all installed on the vibration platform generating device 902, and the two displacement sensor The front ends of 905 are all in contact with the vibration table 904 for measuring the X-direction displacement and Y-direction displacement of the vibration table 904, the vibration base 901 includes a flange 90101, and the flange 90101 is used to fix the Y-direction displacement of the vibration platform generator 902 .

振动平台发生装置902包括X向振动装置90201、Y向振动装置90202和连接器90203,X向振动装置90201通过连接器90203刚性连接在Y向振动装置90202上。The vibration platform generating device 902 includes an X-direction vibration device 90201 , a Y-direction vibration device 90202 and a connector 90203 , and the X-direction vibration device 90201 is rigidly connected to the Y-direction vibration device 90202 through the connector 90203 .

X向振动装置90201包括桥式放大机构一9020101、杠杆放大机构一9020102、压电陶瓷一9020103、刚性臂一9020104、位移传递器一9020105和固定块9020106,固定块9020106和刚性臂一9020104分别用螺钉固定在振动底座901上,压电陶瓷一9020103通过螺钉安装在桥式放大机构一9020101中,桥式放大机构一9020101产生的微位移通过位移传递器一9020105传递给杠杆放大机构一9020102,杠杆放大机构一9010102用于放大桥式放大机构一9020101产生的微位移。The X-direction vibrating device 90201 includes a bridge type amplifying mechanism-9020101, a lever amplifying mechanism-9020102, a piezoelectric ceramic-9020103, a rigid arm-9020104, a displacement transmitter-9020105 and a fixed block 9020106, and the fixed block 9020106 and the rigid arm-9020104 are respectively used The screws are fixed on the vibrating base 901, and the piezoelectric ceramics-9020103 is installed in the bridge-type amplifying mechanism-9020101 through screws. Amplifying mechanism one 9010102 is used for amplifying the micro-displacement produced by bridge type amplifying mechanism one 9020101.

Y向振动装置90202包括桥式放大机构二9020201、杠杆放大机构二9020202、压电陶瓷二9020203、刚性臂二9020204、位移传递器二9020205、初级振动平台9020206和振动外壁9020207,刚性臂二9020204通过螺钉固定在振动底座901上,压电陶瓷二9020203通过螺钉安装在桥式放大机构二9020201中,桥式放大机构二9020201产生的微位移通过位移传递器二9020205传递给杠杆放大机构二9020202,杠杆放大机构二9020202用于放大桥式放大机构二9020201产生的微位移,X向振动装置90201和Y向振动装置90202相互独立,不存在耦合影响。The Y-direction vibration device 90202 includes a bridge-type amplification mechanism 2 9020201, a lever amplification mechanism 9020202, a piezoelectric ceramic 9020203, a rigid arm 9020204, a displacement transmitter 9020205, a primary vibration platform 9020206 and a vibration outer wall 9020207, and the rigid arm 9020204 passes through The screws are fixed on the vibrating base 901, and the piezoelectric ceramic 2 9020203 is installed in the bridge-type amplifying mechanism 2 9020201 through screws. The second amplification mechanism 9020202 is used to amplify the micro-displacement generated by the second bridge-type amplification mechanism 9020201. The X-direction vibration device 90201 and the Y-direction vibration device 90202 are independent of each other, and there is no coupling effect.

如图12所示的底座平台10包括底座1001和龙门架1002,龙门架1002刚性连接于底座1001上,底座平台10用于提供整个装置的安装和固定。The base platform 10 shown in FIG. 12 includes a base 1001 and a gantry 1002. The gantry 1002 is rigidly connected to the base 1001. The base platform 10 is used to provide installation and fixation of the entire device.

图13所示的为复式振动平台9的运动轨迹图,图中F1为输入力,L1为X向位移,X为X向的输出位移,L2为Y向位移,Y为Y向的输出位移,X向振动装置90201中的固定块9020106通过螺钉固定于振动底座901上,用于确定桥式放大机构一9020101的放大作用,刚性臂一9020104用过螺钉固定在振动底座901上,用于限制刚性臂一9020104的X向位移,Y向振动装置90202中的刚性臂二9020204连接振动外壁9020207,刚性臂二9020204的Y向位移通过振动外壁9020207固定,桥式放大机构二9020201的放大作用通过振动外壁9020207确定,当工件需要进行抛光时,分别对压电陶瓷一9020103和压电陶瓷二9020203施加力F1,即对桥式放大机构一9020101和桥式放大机构二9020201施加力F1,力F1经桥式放大机构一9020101和桥式放大机构二9020201的放大作用后转化为L1和L2,L1和L2经过杠杆放大机构一9020101和杠杆放大机构二9020201进行位移放大,放大后的位移分别为X和Y,如图X1和X2分别为X方向第一次和第二次的输出位移,以此类推,Y1和Y2分别为Y方向第一次和第二次的输出位移,以此类推,位移X和位移Y在初级振动平台9020206的矢量合成位移为T,即T1、T2、T3、T4和T5分别为第一次、第二次、第三次、第四次和第五次的矢量合成位移,以此类推,例:桥式放大机构一9020101和桥式放大机构二9020201的放大率为A倍,杠杆放大机构一9020102和杠杆放大机构二9020202的放大率为B倍,所以综合放大率约为A X B倍,由此可见本平台具有良好的放大作用。Figure 13 shows the motion trajectory diagram of the compound vibration platform 9, in which F1 is the input force, L1 is the displacement in the X direction, X is the output displacement in the X direction, L2 is the displacement in the Y direction, and Y is the output displacement in the Y direction. The fixed block 9020106 in the X-direction vibration device 90201 is fixed on the vibration base 901 by screws, and is used to determine the amplification effect of the bridge type amplification mechanism-9020101, and the rigid arm-9020104 is fixed on the vibration base 901 by screws to limit the rigidity. The X-direction displacement of arm one 9020104, the rigid arm two 9020204 in the Y-direction vibrating device 90202 is connected to the vibrating outer wall 9020207, the Y-direction displacement of the rigid arm two 9020204 is fixed by vibrating the outer wall 9020207, and the amplification effect of the bridge type amplification mechanism two 9020201 is through the vibrating outer wall 9020207 determines that when the workpiece needs to be polished, force F1 is applied to piezoelectric ceramic 1 9020103 and piezoelectric ceramic 2 9020203 respectively, that is, force F1 is applied to bridge-type amplification mechanism 1 9020101 and bridge-type amplification mechanism 2 9020201, and force F1 passes through the bridge L1 and L2 are converted into L1 and L2 after the amplification effect of the first 9020101 and the second 9020201 of the bridge-type amplifying mechanism, and the displacement of L1 and L2 is amplified through the first 9020101 of the lever amplifying mechanism and the second 9020201 of the lever amplifying mechanism, and the amplified displacements are respectively X and Y , as shown in the figure, X1 and X2 are the first and second output displacements in the X direction, and so on, Y1 and Y2 are the first and second output displacements in the Y direction, and so on, the displacements X and The vector composite displacement of the displacement Y on the primary vibration platform 9020206 is T, that is, T1, T2, T3, T4 and T5 are the vector composite displacements of the first, second, third, fourth and fifth times respectively, By analogy, for example: the magnification ratio of bridge type amplifying mechanism one 9020101 and bridge type amplifying mechanism two 9020201 is A times, the magnification ratio of lever amplifying mechanism one 9020102 and lever amplifying mechanism two 9020202 is B times, so the comprehensive magnification ratio is about A X B times, it can be seen that this platform has a good magnification effect.

采用所述一种辊型振动辅助抛光装置的抛光方法,包括下列步骤:The polishing method adopting the described a kind of roller-type vibration-assisted polishing device comprises the following steps:

(一)、被抛光工件11通过石蜡粘在振动工作台904上,X向运动平台二8带动被抛光工件11沿X负方向运动到指定位置,Z向运动平台3带动抛光辊306沿Z方向运动到指定位置;(1), the workpiece 11 to be polished is stuck on the vibrating table 904 through paraffin, the X-direction movement platform 2 8 drives the polished workpiece 11 to move to the designated position along the negative X direction, and the Z-direction movement platform 3 drives the polishing roller 306 along the Z direction Move to the specified position;

(二)、被抛光工件11的X向位移由桥式放大机构一9020101、杠杆放大机构一9020102对X向位移的二级放大作用实现,Y向位移由桥式放大机构二9020201、杠杆放大机构二9020202对Y向位移的二级放大作用实现,X向位移和Y向位移在初级振动平台9020206矢量合成为一条运动曲线,若抛光辊306绕Y轴顺时针转动,则复式振动平台9沿X正方向运动,即抛光辊306与复式振动平台9发生相对反向运动以线接触的形式(辊对平面)对被抛光工件11进行抛光,当需要进行曲面抛光时,通过圆弧台803和摆台804的配合,可以使被抛光工件11产生摆动,完成对曲面的抛光;(2), the X-direction displacement of the polished workpiece 11 is realized by the secondary amplification of the X-direction displacement by the bridge-type amplifying mechanism one 9020101 and the lever amplifying mechanism one 9020102, and the Y-direction displacement is realized by the bridge-type amplifying mechanism two 9020201 and the lever amplifying mechanism Two, 9020202 realizes the secondary amplification effect on the Y-direction displacement. The X-direction displacement and the Y-direction displacement are synthesized into a motion curve on the primary vibration platform 9020206. If the polishing roller 306 rotates clockwise around the Y axis, the compound vibration platform 9 will Movement in the positive direction, that is, the polishing roller 306 and the compound vibrating platform 9 undergo relative reverse movement to polish the workpiece 11 to be polished in the form of line contact (roller to plane). The cooperation of the table 804 can make the workpiece 11 to be polished swing to complete the polishing of the curved surface;

(三)、当抛光进行到一定程度时,抛光辊306需要进行修整,此时X向运动平台一6和X向运动平台二8同时沿X方向运动,Z向运动平台3沿Z方向运动,运动至X向运动平台一6中的修整辊606到达Z向运动平台3中的抛光辊306表面为止,开始进行在线实时修整,抛光辊306与修整辊606的运动为相对反向运动;(3), when the polishing is carried out to a certain extent, the polishing roller 306 needs to be trimmed. At this time, the X-direction moving platform one 6 and the X-direction moving platform two 8 move along the X direction at the same time, and the Z-direction moving platform 3 moves along the Z direction. Move until the trimming roller 606 in the X-direction motion platform 1 reaches the surface of the polishing roller 306 in the Z-direction motion platform 3, start to carry out online real-time trimming, and the motion of the polishing roller 306 and the trimming roller 606 is a relative reverse motion;

(四)、在线实时修整完成后,调整X向运动平台一6、X向运动平台二8和Z向运动平台3的位置,使X向运动平台二8中的被抛光工件到达抛光辊306表面,重新进行抛光;(4), after the online real-time trimming is completed, adjust the positions of the X-direction motion platform 1 6, the X-direction motion platform 2 8 and the Z-direction motion platform 3, so that the polished workpiece in the X-direction motion platform 2 8 reaches the surface of the polishing roller 306 , re-polished;

(五)、不断重复步骤二和步骤三,直至完成抛光。(5) Steps 2 and 3 are repeated continuously until the polishing is completed.

Claims (10)

1. a kind of roll shape vibrates auxiliary polishing device, it is characterised in that:Including the unification of Z axis kinetic system, Z axis kinematic system two, Z-direction Motion platform, the unification of X-axis kinetic system, X-axis kinematic system two, X are to motion platform one, X-axis kinematic system three, X to motion platform Two, compound shaking platform, base platform, wherein Z-direction motion platform pass through screw and the unification of Z axis kinetic system and Z axis kinematic system Two connections, Z axis kinetic system is unified and Z axis kinematic system two is connect by screw with base platform, and X passes through spiral shell to motion platform one Nail is connect with the unification of X-axis kinetic system and X-axis kinematic system two, and X-axis kinetic system is unified and X-axis kinematic system two passes through screw and bottom Seat platform connection, X are connect by screw with X-axis kinematic system three to motion platform two, and X-axis kinematic system three passes through screw and bottom Seat platform connection, compound shaking platform are connect with X to motion platform two by screw.
2. a kind of roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the Z axis kinetic system Unified identical with two structure of Z axis kinematic system, wherein Z axis kinetic system includes uniformly:I-shaped guide rail one, engine base one, bearing block One, the ball-screw one that shaft coupling one, slide unit one, bottom plate one, motor one and motor one drive, the I-shaped guide rail one pass through Screw is connect with bottom plate one, and motor one is connect by screw with engine base one, and engine base one is connect by screw with bottom plate one, motor one It is connect with ball-screw one by shaft coupling one and bearing block one, ball-screw one is mounted between I-shaped guide rail one, slide unit One is mounted on I-shaped guide rail one.
3. a kind of roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the Z-direction movement is flat Platform include motor erecting bed one, motor two, bearing block two, shaft coupling two, motor supporting table one, polishing roll, torque sensor and Roll shaft is polished, wherein motor two is connect by screw with motor erecting bed one, and the output shaft of motor two passes through shaft coupling two and throwing Smooth roll connects, and the polishing roll other end is connected on bearing block two, and bearing block two is connect by screw with motor supporting table one, torque Sensor is mounted on polishing roll shaft, and motor erecting bed one and motor supporting table one are connect by screw with slide unit.
4. a kind of roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the X-axis kinetic system Unified identical with two structure of X-axis kinematic system, wherein X-axis kinetic system includes uniformly I-shaped guide rail two, engine base two, bearing block Three, shaft coupling three, slide unit two, bottom plate two, motor three and ball-screw two, the I-shaped guide rail two pass through screw and bottom plate two Connection, motor three are connect by screw with engine base two, and engine base two is connect by screw with base platform, and motor three passes through shaft coupling Three and bearing block three connect with ball-screw two, ball-screw two be mounted on I-shaped guide rail two between, slide unit two be mounted on work On font guide rail two.
5. a kind of roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the X is flat to movement Platform one includes motor four, motor erecting bed two, motor supporting table two, shaft coupling four, bearing block four and finishing roller, wherein motor four It is fixed on motor erecting bed two, the output shaft of motor four is connect by shaft coupling four with finishing roller, and the other end peace of roller is modified In the bearing block four of motor supporting table two, motor erecting bed two and motor supporting table two are connect by screw with slide unit.
6. a kind of roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the X-axis kinetic system System three includes I-shaped guide rail three, engine base three, bearing block five, shaft coupling five, slide unit three, bottom plate three, motor five and ball-screw Three, wherein I-shaped guide rail three is connect by screw with bottom plate three, motor five is connect by screw with engine base three, and engine base three passes through Screw is connect with bottom plate three, and motor five is connect by shaft coupling five and bearing block five with ball-screw three, and ball-screw three is installed Between I-shaped guide rail three, slide unit three is mounted on I-shaped guide rail three.
7. a kind of roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the X is flat to movement Platform two includes motor six, retarder, shaft coupling six, bearing block six, circular arc platform, sets a table, worm and worm wheel, and wherein circular arc platform passes through Screw is mounted on slide unit, and motor six completes the rotation of worm screw by retarder and shaft coupling connecting worm, and worm screw drives worm gear The rotation of worm gear is completed, for worm gear in setting a table, worm gear drive is set a table completes non-plane motion in circular arc platform, upper horizontal peace of setting a table Equipped with compound shaking platform.
8. roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the compound shaking platform includes Vibrating base, shaking platform generating means, antifriction wiping board, shaking table, displacement sensor and displacement sensor fixture body, Middle shaking platform generating means is connect by screw with vibrating base, has one between shaking table and shaking platform generating means Antifriction wiping board, for reducing the friction between shaking table and shaking platform generating means, shaking table and antifriction wiping board It is fixed by screws on shaking platform generating means, displacement sensor is mounted in displacement sensor fixture body, two displacements Clamp of sensor body is installed on shaking platform generating means, and the front end of two displacement sensors connects with shaking table It touches, for measuring the X of shaking table to displacement and Y-direction displacement, vibrating base includes flange, and flange is for fixing shaking platform The Y-direction displacement of generating means;
The shaking platform generating means includes X to vibrating device, Y-direction vibrating device and connector, and X passes through company to vibrating device Device is connect to be rigidly attached on Y-direction vibrating device;
The X to vibrating device include bridge-type enlarger one, lever amplifying mechanism one, piezoelectric ceramics one, rigid arm one, displacement Converyer one and fixed block, fixed block and rigid arm one are screwed on vibrating base respectively, and piezoelectric ceramics one passes through spiral shell Nail is mounted in bridge-type enlarger one, and the micro-displacement that bridge-type enlarger one generates passes to lever by displacement transfer device one Enlarger one, lever amplifying mechanism one are used to amplify the micro-displacement of the generation of bridge-type enlarger one;
The Y-direction vibrating device includes bridge-type enlarger two, lever amplifying mechanism two, piezoelectric ceramics two, rigid arm two, displacement Converyer two, primary shaking platform and vibration outer wall, rigid arm two are fixed by screws on vibrating base, piezoelectric ceramics two-way Screw is crossed in bridge-type enlarger two, the micro-displacement that bridge-type enlarger two generates is passed to by displacement transfer device two Lever amplifying mechanism two, lever amplifying mechanism two are used to amplify the micro-displacement of the generation of bridge-type enlarger two, X to vibrating device and Y-direction vibrating device is mutual indepedent, and coupling influence is not present.
9. a kind of roll shape according to claim 1 vibrates auxiliary polishing device, which is characterized in that the base platform packet Pedestal and portal frame are included, portal frame is rigidly connected on pedestal.
10. using a kind of polishing method of roll shape vibration auxiliary polishing device as described in claim 1, which is characterized in that packet Include the following steps:
(1), it is polished workpiece to be sticked on shaking table by paraffin, X is polished workpiece to the drive of motion platform two and bears along X Direction moves to designated position, and Z-direction motion platform drives polishing roll to move to designated position along Z-direction;
(2), the X for being polished workpiece is put to displacement from bridge-type enlarger one, lever amplifying mechanism a pair of X to the two level of displacement Big effect realizes that Y-direction displacement realizes the two level amplification of Y-direction displacement by bridge-type enlarger two, lever amplifying mechanism two, X is a curve movement in primary shaking platform Vector modulation to displacement and Y-direction displacement, if polishing roll is rotated clockwise around Y-axis, Then compound shaking platform is moved along X positive directions, i.e., polishing roll occurs what opposite counter motion was contacted with line with compound shaking platform Form is polished to being polished workpiece, when needing to carry out curved surface polishing, by circular arc platform and the cooperation set a table, can make by It polishes workpiece and generates swing, complete the polishing to curved surface;
(3), when polishing carries out to a certain extent, polishing roll is modified, and X is to motion platform one and X to movement at this time Platform two moves in X direction simultaneously, and Z-direction motion platform is moved along Z-direction, moves to finishing rollers of the X into motion platform one and arrives Until the polishing roller surface in Z-direction motion platform, online finishing in real time is proceeded by, the movement of polishing roll and finishing roller is phase To counter motion;
(4), after the completion of online finishing in real time, adjustment X is to motion platform one, X to the position of motion platform two and Z-direction motion platform It sets, so that be polished workpiece of the X into motion platform two is reached polishing roller surface, re-start polishing;
(5), step 2 and step 3 are constantly repeated, until completing polishing.
CN201810323490.7A 2018-04-11 2018-04-11 Roller type vibration auxiliary polishing device and method Active CN108312043B (en)

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