CN108307717A - A kind of arid area vegetation implantation methods - Google Patents

A kind of arid area vegetation implantation methods Download PDF

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Publication number
CN108307717A
CN108307717A CN201810162550.1A CN201810162550A CN108307717A CN 108307717 A CN108307717 A CN 108307717A CN 201810162550 A CN201810162550 A CN 201810162550A CN 108307717 A CN108307717 A CN 108307717A
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CN
China
Prior art keywords
liquid
layer
implantation methods
arid area
soil
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Pending
Application number
CN201810162550.1A
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Chinese (zh)
Inventor
高卫民
程寒飞
王浩
项萌
李明
朱巧红
冉景
夏溢
焦朋朋
刘金光
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Huatian Engineering and Technology Corp MCC
MCC Huatian Anhui Energy Conservation and Environmental Protection Research Institute Co Ltd
Original Assignee
Huatian Engineering and Technology Corp MCC
MCC Huatian Anhui Energy Conservation and Environmental Protection Research Institute Co Ltd
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Application filed by Huatian Engineering and Technology Corp MCC, MCC Huatian Anhui Energy Conservation and Environmental Protection Research Institute Co Ltd filed Critical Huatian Engineering and Technology Corp MCC
Priority to CN201810162550.1A priority Critical patent/CN108307717A/en
Publication of CN108307717A publication Critical patent/CN108307717A/en
Pending legal-status Critical Current

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01BSOIL WORKING IN AGRICULTURE OR FORESTRY; PARTS, DETAILS, OR ACCESSORIES OF AGRICULTURAL MACHINES OR IMPLEMENTS, IN GENERAL
    • A01B79/00Methods for working soil

Abstract

The present invention discloses a kind of arid area vegetation implantation methods.It is designed mainly for improving arid area vegetation plantation survival rate, including (1) smooth soil, and digs a plantation hole on soil;(2) impervious barrier is built on the side wall of plantation hole;(3) it is laid with pollutant sorbing material at the hole bottom of plantation hole, forms pollutant adsorption layer;(4) it is laid with mud granulizing on sludge absorption layer, forms mud granulizing layer;(5) it is laid with overburden layer in the upper surface of mud granulizing layer, and plants vegetation.The present invention blends bottom pollutant absorption by the anti-of plantation hole side wall, prevent pollution of the sludge to ambient enviroment, by the mud granulizing layer of setting using water conservation ingredient and nutritional ingredient in sludge, plays the role of improving nutritional ingredient for plant, improve vegetation survival rate.

Description

A kind of arid area vegetation implantation methods
Technical field
The invention belongs to arid area ecological restoration technical field more particularly to a kind of arid area vegetation implantation methods.
Background technology
Desertification of land, soil erosion and environmental degradation have become influence the key of human social and ask Topic, world land ccd area account for about 30% or so of the land gross area, and along with environment be constantly destroyed and people The frequent activities of class and constantly aggravate.China is one of the country of desertification in the world and severe water and soil erosion, at present desert, dagger-axe Wall and sandy land are 165.3 ten thousand square kilometres total, are related to 18 provinces (area) and 471 counties, account for about the 17% of national territorial area.Soil Land resource has not only greatly been corroded in ground desertification, makes valuable arable land, the further atrophy in grassland, and bring serious ring Border problem such as constantly wreaks havoc the Sand-Duststorm of northern China in recent years.Desertification of land problem make the living space of the mankind by To seriously threatening, continuous with national strategy to develop western regions promotes and the increase of desertificated area infrastructure construction, right The active demand improved the ecological environment and also more and more strong to the technical need of Novel planting and revegetation.
China western part and " three Norths " (northwest, northeast and North China) most area are in arid and semi-arid lands, precipitation Amount less, evaporation capacity it is big, the survival rate of planting is low, revegetation difficulty is big.Especially Inner Mongolia Autonomous Region of the upper reaches of the Yellow River Equal areas, due to drought, vegetation cover degree and plantation survival rate are low, not only cause a large amount of dusts storm, form sandstorm weather, also Cause serious soil erosion.
Currently, the primary abatement method of desertification and soil erosion is biological method.However, these areas usually soil is husky Change serious, poor water retention property, and belong to arid and semi-arid lands, water consumption is big but planting survival rate is low, revegetation Difficulty is big.Thus, there is an urgent need to develop a kind of arid area vegetation implantation methods.
Invention content
In view of the above-mentioned problems, the present invention provides a kind of arid area vegetation that can improve arid area vegetation plantation survival rate Implantation methods.
In order to achieve the above objectives, a kind of arid area vegetation implantation methods of the present invention, include the following steps:
(1) smooth soil, and a plantation hole is dug on soil;
(2) impervious barrier is built on the side wall of plantation hole;
(3) it is laid with pollutant sorbing material at the hole bottom of plantation hole, forms pollutant adsorption layer;
(4) it is laid with mud granulizing on sludge absorption layer, forms mud granulizing layer;
(5) it is laid with overburden layer in the upper surface of mud granulizing layer, and plants vegetation;
Further, the area at the hole bottom of the plantation hole is 1-100m2, depth 60-100cm.
Further, the construction method of the impervious barrier is that the polyurethane spray of the EVA of liquid or liquid are sprinkled upon plantation hole Side wall on, the EVA of liquid or the polyurethane of liquid penetrate into solidification in soil and obtain impervious barrier.
Further, the concentration range of the polyurethane of the EVA or liquid of the liquid is 5%-15%.
Further, the thickness range of the impervious barrier is 1-5cm.
Further, the method for the structure impervious barrier is:EVA or the liquid that liquid is sprayed on the side wall of plantation hole are poly- Urethane;Liquid EVA or liquid polyurethane, which penetrate into, is formed by curing impervious barrier in soil.
Further, the concentration range of the liquid EVA or liquid polyurethane is 5%~15%.
Further, the pollutant sorbing material includes activated magnesia, zeolite and gypsum;
The mass ratio of the activated magnesia, zeolite and gypsum is 100:(1~100):(1~100).
Further, the thickness range of the pollutant adsorption layer is:1~5cm.
Further, the preparation method of the mud granulizing is:Municipal dewatered sludge, gypsum, cement and water-retaining agent are mixed It closes, mud granulizing is obtained with after secondary granulation processing by being once granulated, the particle size range of the mud granulizing is 0.01~ 1cm。
Further, the municipal dewatered sludge, gypsum, cement and water-retaining agent mass ratio are 100:(1~100):(1~ 100):(0.1~1).
Further, the thickness range of the overburden layer is 10~20cm.
Further, the vegetation includes two or more arbitrary combinations in cold-resistant drought-enduring arbor, shrub and grass.
The municipal sludge of a kind of arid area vegetation implantation methods of the present invention, use is handled by secondary granulation, and is added Water-retaining agent, improves the water conservation water-holding capacity of soil, and required moisture is provided for plant growth, greatly improves vegetation plantation survival Rate and increment;It prevents moisture from spreading around by the antiseepage of plantation hole side wall, preserves nutritional ingredient, improve water-holding capacity; The pollutant of bottom adsorbs, and prevents pollution of the sludge to ambient enviroment;Construction technology of the present invention is simple, without large scale equipment and greatly Material is measured, it is at low cost, it is suitble to scale application.
Description of the drawings
Fig. 1 is schematic structural view of the invention;
In figure:1 overburden layer;2 mud granulizing layers;3 pollutant adsorption layers;4 grounds;5 soil;6 impervious barriers;7 mud granulizings Material;8 pollutant adsorption materials.
Specific implementation mode
The present invention will be further described with reference to the accompanying drawings of the specification.
Embodiment
In conjunction with Fig. 1, a kind of arid area vegetation implantation methods are provided in the present embodiment, are included the following steps:
(1) smooth soil 4, and a plantation hole is dug on soil;
(2) impervious barrier 6 is built on the side wall of plantation hole;
(3) it is laid with pollutant sorbing material 8 at the hole bottom of plantation hole, forms pollutant adsorption layer 3;
(4) it is laid with mud granulizing 7 on sludge absorption layer, forms mud granulizing layer 2;
(5) it is laid with soil 5 in the upper surface of mud granulizing layer and forms overburden layer 1, and plant vegetation.
Embodiment 1
As the concrete scheme of above-described embodiment, arid area vegetation implantation methods are as follows in the present embodiment, data parameters It is shown in Table 1, obtains following material:
EVA lotions:Sinopec group Sichuan vinylon plant provides, and CW40-600 solid contents are up to 60% or more.
Sludge:The second sewage treatment plant of Ma'an Mountain dewatered sludge;
Water-retaining agent:Sodium Polyacrylate;
Light calcined magnesia:Haicheng City magnesium factory, 200 mesh of grain size, activity are more than 85%;
Gypsum:Chemical pure, 200 mesh of grain size;
Cement:Portland cement, Nanjing Jiangnan cement plant;
Zeolite:Chemical pure, 200 mesh of grain size.
Specifically, the first step:Smooth soil 4, excavates plantation hole on ground, and hole size is 100cm*100cm* 60cm;
Second step:Hole surrounding sprinkling solid content be 10% concentration EVA lotions, EVA lotions naturally osmotic to crater wall, Impervious barrier 6 is built, antiseepage layer thickness is 2cm;
Third walks:It is laid with pollutant adsorption material in hole bottom, structure pollutant adsorption layer 3 is simultaneously compacted, pollutant absorption Layer thickness is 1cm;
4th step:Mud granulizing is filled in hole, forms mud granulizing layer 2, and the thickness of mud granulizing layer 2 is about 89cm;
5th step:Overburden layer 1 is built in the surface earthing of mud granulizing layer, and smooth, compacting, 1 thickness of overburden layer are 10cm;
6th step:Uniformly 3 plant heights of plantation are the sea-buckthorn of 10cm and sow 20 grams of Festuca Arundinacea grass seeds, spray 100 grams of water, from So place growth.
Natural curing 3 months, tracking and testing vegetation height change, total phosphorus, total nitrogen in last test growing area surrounding soil And organic concentration, data result are recorded in table 2-4.
Embodiment 2
As another concrete scheme of above-described embodiment, arid area vegetation implantation methods are as follows in the present embodiment, data Parameter is shown in Table 1:
The first step:Smooth soil 4, excavates plantation hole on ground, and plantation pit-size is 100cm*100cm*60cm;
Second step:In the EVA lotions that plantation hole surrounding sprinkling solid content is 10% concentration, EVA lotions naturally osmotic to hole Wall, builds impervious barrier 6, and antiseepage layer thickness is 2cm;
Third walks:It is laid with pollutant adsorption material in plantation hole bottom, structure pollutant adsorption layer 3 is simultaneously compacted, and pollutant is inhaled Attached layer thickness is 2cm;
4th step:Mud granulizing is filled in hole, forms mud granulizing layer 2, the thickness of mud granulizing layer is about 78cm;
5th step:Overburden layer 1, and smooth, compacting are built in mud granulizing layer surface earthing, earthing layer thickness is 20cm;
6th step:Uniformly 3 plant heights of plantation are the sea-buckthorn of 10cm and sow 20 grams of Festuca Arundinacea grass seeds, spray 100 grams of water, from So place growth.
Natural curing 3 months, tracking and testing vegetation height change, total phosphorus, total nitrogen in last test growing area surrounding soil And organic concentration, data result are recorded in table 2-4.
Comparative example 1
A kind of vegetation implantation methods are provided in this comparative example, steps are as follows, and data parameters are shown in Table 1:
The first step:Smooth soil excavates plantation hole on ground, and the size of plantation hole is 100cm*100cm* 60cm;
Second step:Mud granulizing layer is filled in plantation hole, thickness is about 80cm;
Third walks:Surface earthing builds overburden layer, and earthing layer thickness is 20cm, and smooth, compacting;
4th step:The sea-buckthorn that uniformly 3 plant heights of plantation are 10cm, sprays 100 grams of water, places growth naturally.
Natural curing 3 months, tracking and testing vegetation height change, total phosphorus, total nitrogen in last test growing area surrounding soil And organic concentration, data result are recorded in table 2-4.
Comparative example 2
A kind of vegetation implantation methods are provided in this comparative example, steps are as follows, and data parameters are shown in Table 1:
The first step:Smooth soil, excavates plantation hole on ground, and plantation pit-size is 100cm*100cm*60cm;
Second step:In the EVA lotions that plantation hole surrounding sprinkling solid content is 5% concentration, naturally osmotic builds impervious barrier, Antiseepage layer thickness is 10mm;
Third walks:It is laid with pollutant adsorption material in plantation hole bottom, pollutant adsorption layer is built and is compacted, pollutant absorption Layer thickness is 20mm;
4th step:Mud granulizing is filled in hole, forms mud granulizing layer, the thickness of mud granulizing layer is 78cm;
5th step:Surface earthing builds overburden layer, and earthing layer thickness is 20cm, and smooth, compacting;
6th step:20 grams of Festuca Arundinacea grass seeds are uniformly sowed, 100 grams of water are sprayed, place growth naturally.
Natural curing 3 months, tracking and testing vegetation height change, total phosphorus, total nitrogen in last test growing area surrounding soil And organic concentration, data result are recorded in table 2-4.
Table 1:Each embodiment and each comparative example parameter
Table 2:Sea-buckthorn growing state compares
Embodiment 1 (cm) Embodiment 2 (cm) Comparative example 1 (cm) Comparative example 2 (cm)
When completion 10 10 10 10
After January 22 23 16 15
After 2 months 34 34 19 18
After March 47 48 21 20
Table 3:Growth of Festuca elata situation compares
Embodiment 1 (cm) Embodiment 2 (cm) Comparative example 1 (cm) Comparative example 2 (cm)
When completion 0 0 0 0
After January 15 18 7 10
After 2 months 30 34 11 17
After March 38 40 15 21
Table 4:Pollution concentration (mg/KG) in three months surrounding soils
Embodiment 1 Embodiment 2 Comparative example 1 Comparative example 2
TP 5 2 20 15
TN 3 2 12 8
Organic pollution 0.3 0.2 2.5 1.4
Cd 0.15 0.15 1.2 1.0
By tables of data 2-4 it is found that sea-buckthorn and growth of Festuca elata situation in embodiment 1 and embodiment 2 are better than compares Example 1 and the sea-buckthorn in comparative example 2 and Festuca Arundinacea, and in embodiment 1 and embodiment 2 in surrounding soil pollution concentration less than comparing Example 1 and comparative example 2.
The arid area vegetation planting technology of the present invention can efficiently use nutritional ingredient and moisture in municipal sludge, simultaneously Ambient enviroment will not be polluted again, vegetation growth is all right, is suitable for arid area revegetation and water and soil conservation.
More than, only presently preferred embodiments of the present invention, but scope of protection of the present invention is not limited thereto, and it is any to be familiar with sheet In the technical scope disclosed by the present invention, the change or replacement that can be readily occurred in should all be covered those skilled in the art Within protection scope of the present invention.Therefore, the scope of protection of the present invention shall be subject to the scope of protection defined by the claims.

Claims (8)

1. a kind of arid area vegetation implantation methods, which is characterized in that include the following steps:
(1) smooth soil, and a plantation hole is dug on soil;
(2) impervious barrier is built on the side wall of plantation hole;
(3) it is laid with pollutant sorbing material at the hole bottom of plantation hole, forms pollutant adsorption layer;
(4) it is laid with mud granulizing on sludge absorption layer, forms mud granulizing layer;
(5) it is laid with overburden layer in the upper surface of mud granulizing layer, and plants vegetation.
2. a kind of arid area vegetation implantation methods according to claim 1, which is characterized in that the structure of the impervious barrier Method is that the polyurethane spray of the EVA of liquid or liquid are sprinkled upon on the side wall of plantation hole, the EVA of liquid or the polyurethane of liquid It penetrates into solidification in soil and obtains impervious barrier.
3. a kind of arid area vegetation implantation methods according to claim 2, which is characterized in that the EVA of the liquid or The concentration range of the polyurethane of liquid is 5%-15%.
4. a kind of arid area vegetation implantation methods according to claim 1, which is characterized in that the structure impervious barrier Method is:The EVA or liquid polyurethane of liquid are sprayed on the side wall of plantation hole;Liquid EVA or liquid polyurethane penetrate into soil Impervious barrier is formed by curing in earth.
5. a kind of arid area vegetation implantation methods according to claim 4, which is characterized in that the liquid EVA or liquid The concentration range of state polyurethane is 5%~15%.
6. a kind of arid area vegetation implantation methods according to claim 1, which is characterized in that the pollutant adsorption material Material includes activated magnesia, zeolite and gypsum;
The mass ratio of the activated magnesia, zeolite and gypsum is 100:(1~100):(1~100).
7. a kind of arid area vegetation implantation methods according to claim 1, which is characterized in that the system of the mud granulizing Preparation Method is:Municipal dewatered sludge, gypsum, cement and water-retaining agent are mixed, obtained with after secondary granulation processing by being once granulated Mud granulizing is obtained, the particle size range of the mud granulizing is 0.01~1cm.
8. a kind of arid area vegetation implantation methods according to claim 7, which is characterized in that the municipal administration dehydration is dirty Mud, gypsum, cement and water-retaining agent mass ratio are 100:(1~100):(1~100):(0.1~1).
CN201810162550.1A 2018-02-27 2018-02-27 A kind of arid area vegetation implantation methods Pending CN108307717A (en)

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN109673356A (en) * 2018-12-19 2019-04-26 中国科学院新疆生态与地理研究所 A kind of building method of semiarid region building north side greenery patches unirrigated vegetation

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Application publication date: 20180724