CN108168702A - Full-aperture back scattered light measurement system based on scattering plate scattering sampling - Google Patents

Full-aperture back scattered light measurement system based on scattering plate scattering sampling Download PDF

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Publication number
CN108168702A
CN108168702A CN201711343139.6A CN201711343139A CN108168702A CN 108168702 A CN108168702 A CN 108168702A CN 201711343139 A CN201711343139 A CN 201711343139A CN 108168702 A CN108168702 A CN 108168702A
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measurement
energy
scatter plate
spectral
bandpass filter
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CN108168702B (en
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闫亚东
何俊华
许瑞华
齐文博
韦明智
吴冰静
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XiAn Institute of Optics and Precision Mechanics of CAS
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XiAn Institute of Optics and Precision Mechanics of CAS
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
    • G01J3/4412—Scattering spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0295—Constructional arrangements for removing other types of optical noise or for performing calibration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
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    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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    • G01J1/02—Details
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    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0437—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using masks, aperture plates, spatial light modulators, spatial filters, e.g. reflective filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0466—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings with a sighting port
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0474—Diffusers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0213—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using attenuators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0216—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using light concentrators or collectors or condensers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0218—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using optical fibers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0248—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using a sighting port, e.g. camera or human eye
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J2001/0276—Protection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1213—Filters in general, e.g. dichroic, band
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A90/00—Technologies having an indirect contribution to adaptation to climate change
    • Y02A90/10—Information and communication technologies [ICT] supporting adaptation to climate change, e.g. for weather forecasting or climate simulation

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

The invention belongs to the technical field of optical measurement, and particularly relates to a full-aperture back scattering light measurement system based on scattering sampling of a scattering plate. The invention adopts a probe group to directly measure the diffuse reflection light of the off-axis paraboloid type scattering plate, particularly comprises space distribution measurement, spectrum measurement, time measurement, energy measurement and the like, obviously simplifies the sampling and measuring light path, overcomes the defect of large system volume by adopting a long-focus focusing lens, is particularly suitable for the condition of multi-beam laser combination target shooting, and can meet the requirement of large-scale laser driving device full-aperture back scattering diagnosis.

Description

Full aperture backscattering light measurement system based on scatter plate scattering sampling
Technical field
The invention belongs to field of optical measuring technologies, and in particular to a kind of full aperture based on scatter plate scattering sampling is backwards Scatter light measurement system.
Background technology
Laser fusion is a kind of human controllable's nuclear fusion generally used at present, it all has ten on civilian and military Divide great research significance：A kind of inexhaustible Clear nuclear energy source is explored for the mankind；For developing " clean ", (no radiation is dirty Dye) nuclear weapon, development high energy laser weapon；Partial alternative nuclear tests.
Therefore, laser fusion is paid much attention to by each nuclear power of the world, since second half the 1970s, The states such as Russia, U.S., day, method, China and British start the development of high-power laser driver in succession.Research of the U.S. in this field is in neck First status, and formally built up the ultra-large type laser driving apparatus " NIF " comprising 192 tunnels in 2009；The MLF that France is building Include 240 road laser；Construction large laser driver is also fermenting, and plan to complete to apply between 2015-2020 in Japan In the basic technology research of power generation.China also establishes a series of laser driving apparatus (starlight series, God Light series etc.), The laser driving apparatus " Shenguang-Ⅲ " for completing the largest domestic built includes 48 road laser within 2015.
However, U.S. NIF did not succeed in the igniting of 2010, this causes larger shock in world wide.NIF with Afterwards the study found that the original theoretical model verified on small-scale laser driver on NIF no longer be applicable in, NIF practice shooting The backscattering share of laser is well beyond original desired value, and target practice laser energy is substantially slackened, fusion fuel compression Symmetry is destroyed, and leads to loss of ignition, it can be seen that backscattering measuring system is building a new Laser Driven dress Put the irreplaceable role played in the process.
The country is also relatively early to the research starting of backscattering, and the development of backscattering diagnostic techniques substantially experienced two ranks Section：
First stage, using heavy caliber, long-focus Fresnel Lenses focus on full aperture back-scattering light, near focal point into Row optical measurement.But since Fresnel Lenses is using optical plastic making, nonlinear effect is serious under strong light action, should With being restricted.
Second stage focuses on full aperture back-scattering light, and in light beam using caliber metal off-axis parabolic mirror Light beam spectrum is detached into (being divided into raman scattering spectrum and Brillouin scattering spectrum) using dichroscope before focusing on.After separation, Implement space filtering respectively in the focal point of Raman scattering light beam and Brillouin scattering light beam, filter out the interference of stray light；Then, It samples respectively by two beam collimations and repeatedly, carries out spatial distribution measurement, spectral measurement, time measurement, energy measurement successively.It should Scheme is preferable by filtering preventing stray light effect, but metal off-axis paraboloidal mirror laser damage threshold is not high, and system bulk is more huge Greatly.The full aperture backscattered energy of following ultra-large laser fusion facility will higher, speculum easily damages；And its light Beam integrated level higher, space is limited, and bulky diagnostic device is difficult to be applicable in.
Invention content
It is an object of the present invention to provide a kind of full aperture backscattering light measurement systems based on scatter plate scattering sampling, solve The technical issues of damage threshold existing for existing diagnostic device is low, bulky.
The present invention technical solution be：A kind of full aperture backscattering light measurement system based on scatter plate scattering sampling System, is characterized in that：Probe including off axis paraboloid mirror type scatter plate and positioned at off axis paraboloid mirror type scatter plate focal point Group, the probe group include two energy measuring units, two time measuring units, two spectral measurement units, a calibration Contact unit and a spatial distribution measuring unit；Two energy measuring units are respectively used to carry out long wave energy measurement and shortwave Energy measurement, two time measuring units are respectively used to carry out long wave time measurement and shortwave time measurement, two spectral measurements Unit is respectively used to carry out long wave spectral measurement and shortwave spectral measurement.
Preferably, above-mentioned energy measuring unit includes the energy measurement bandpass filter, the energy that are set gradually along optical path direction Measurement iris diaphgram, energy measurement optically focused camera lens and energy meter.
Further, in the energy measuring unit for long wave energy measurement, the thang-kng of energy measurement bandpass filter Bandwidth is 400-700nm；In the energy measuring unit for shortwave energy measurement, the thang-kng band of energy measurement bandpass filter Width is 351 ± 3nm.
Preferably, above-mentioned time measuring unit include the time measurement bandpass filter set gradually along optical path direction, when Between measure coupling camera lens and fast photoelectric tube.
Further, in the time measuring unit for long wave time measurement, the thang-kng of time measurement bandpass filter Bandwidth is 400-700nm；In the time measuring unit for shortwave time measurement, the thang-kng band of time measurement bandpass filter Width is 351 ± 3nm.
Preferably, above-mentioned spectral measurement unit includes the spectral measurement bandpass filter, the light that are set gradually along optical path direction Spectrometry diaphragm, spectral measurement coupling camera lens and multimode fibre, the multimode fibre are connected with spectrometer.
Further, in the spectral measurement unit for long wave spectral measurement, the thang-kng of spectral measurement bandpass filter Bandwidth is 400-700nm；In the spectral measurement unit for shortwave spectral measurement, the thang-kng band of spectral measurement bandpass filter Width is 351 ± 3nm.
Preferably, above-mentioned calibration contact unit includes photoelectric probe and rotatable cover sheet.
Preferably, above-mentioned spatial distribution measuring unit includes spatial distribution imaging lens and ICCD cameras, the space point Spatial distribution is provided in cloth imaging lens and measures iris diaphgram.
The beneficial effects of the present invention are：The present invention proposes a kind of full aperture based on scatter plate scattering sampling backwards to scattered Penetrate light measurement system.Scatter plate damage threshold is high, overcomes the problem of existing diagnostic device damage threshold is low；Using a probe Group, which directly measures diffusing for scatter plate, (specifically includes spatial distribution measurement, spectral measurement, time measurement, energy Measure), the shortcomings that significantly simplifying sampling and optical path, overcome the systems bulky using focal length focus lamp, especially It is suitable for multiple laser and closes the situation that beam is practiced shooting, disclosure satisfy that the need of extensive laser driving apparatus full aperture backscattering diagnosis It asks.
Description of the drawings
Fig. 1 is that the present invention is based on the optical path structures of the full aperture backscattering light measurement system of scatter plate scattering sampling Schematic diagram.
Fig. 2 is the planar structure schematic diagram of probe group of the present invention.
Fig. 3 is energy measuring unit structure diagram of the present invention.
Fig. 4 is time measuring unit structure diagram of the present invention.
Fig. 5 is spectral measurement cellular construction schematic diagram of the present invention.
Fig. 6 is present invention calibration contact unit structure diagram.
Fig. 7 is spatial distribution measuring unit structure diagram of the present invention.
Fig. 8 is the light path layout schematic diagram that the present invention is applied under the conditions of eight sharp combiners are practiced shooting.
Fig. 9 is the lateral view of light path in Fig. 8.
Wherein, reference numeral is：1- full aperture backscattering light beams, 2- off axis paraboloid mirror type scatter plates, 3- probe groups, 31- energy measuring units, 311- energy measurement bandpass filters, 312- energy measurement iris diaphgrams, 313- energy measurement optically focused Camera lens, 314- energy meters, 32- time measuring units, 321- time measurement bandpass filters, 322- time measurements coupling camera lens, The fast photoelectric tubes of 323-, 33- spectral measurement units, 331- spectral measurement bandpass filters, 332- spectral measurement diaphragms, 333- spectrum It measures and couples camera lens, 334- multimode fibres, 34- calibration contact units, 341- photoelectric probes, the rotatable cover sheets of 342-, 343- stepper motors, 35- spatial distribution measuring units, 351- spatial distribution imaging lens, 352-ICCD cameras, 353- spaces point Cloth measures iris diaphgram.
Specific embodiment
Referring to Fig. 1, the present invention provides a kind of full aperture backscattering light measurement system based on scatter plate scattering sampling, should System includes off axis paraboloid mirror type scatter plate 2 and the probe group 3 positioned at 2 focal point of off axis paraboloid mirror type scatter plate, parabolic shape Design be to reduce time measurement error, off-axis design is that probe group blocks light path in order to prevent.According to optics common sense, It is no any aberration at parabolic focus, that is, reaches the equivalent optical path of the various light of focus, there is no the time differences.Approximation is flat Capable full aperture backscattering light beam 1 is incident on off axis paraboloid mirror type scatter plate 2, and off axis paraboloid mirror is received using probe group 3 Type scatter plate 2 diffuses, and time measurement is scattered to it, the measurement of scattering light spatial distribution, scattering energy measurement, is dissipated Penetrate spectral measurement etc..
Referring to Fig. 2, probe group 3 includes two spectral measurements of time measuring unit 32, two of energy measuring unit 31, two 33, calibration contact units 34 of unit and a spatial distribution measuring unit 35.Two energy measuring units 31 are respectively used to Carry out long wave energy measurement and shortwave energy measurement, two time measuring units 32 are respectively used to carry out long wave time measurement and short Wave time measurement, two spectral measurement units 33 are respectively used to carry out long wave spectral measurement and shortwave spectral measurement.
Referring to Fig. 3, energy measuring unit 31 include the energy measurement bandpass filter 311 set gradually along optical path direction, Energy measurement iris diaphgram 312, energy measurement optically focused camera lens 313 and energy meter 314.During applied to long wave measurement, energy measurement The thang-kng bandwidth of bandpass filter 311 is 400-700nm；When being measured applied to shortwave, energy measurement bandpass filter 311 leads to Light belt width is 351 ± 3nm.Energy measurement iris diaphgram 312 can adjust the size of thang-kng amount, to meet different levels of scatter The demand of various experiments.
Referring to Fig. 4, time measuring unit 32 include the time measurement bandpass filter 321 set gradually along optical path direction, Time measurement couples camera lens 322 and fast photoelectric tube 323.During applied to long wave measurement, the thang-kng of time measurement bandpass filter 321 Bandwidth is 400-700nm；When being measured applied to shortwave, the thang-kng bandwidth of time measurement bandpass filter 321 is 351 ± 3nm. During scattering time measures, to reduce time measurement error, the face type of scatter plate is designed as paraboloid, while probe group is placed in At parabolic focus, theoretically the temporal dispersion at parabolic focus is zero, this is extremely advantageous for time measuring unit.
Referring to Fig. 5, spectral measurement unit 33 include the spectral measurement bandpass filter 331 set gradually along optical path direction, Spectral measurement diaphragm 332, spectral measurement coupling camera lens 333 and multimode fibre 334, multimode fibre 334 are connected with spectrometer.Using When long wave measurement, the thang-kng bandwidth of spectral measurement bandpass filter 331 is 400-700nm；When being measured applied to shortwave, spectrum The thang-kng bandwidth for measuring bandpass filter 331 is 351 ± 3nm.
Fig. 6 is participated in, calibration contact unit 34 includes photoelectric probe 341 and rotatable cover sheet 342.Rotatable protection cap Plate 342 can rotate under the driving of stepper motor 343, in mark time opening, close to protect photoelectric probe after calibration 341。
Referring to Fig. 7, spatial distribution measuring unit 35 includes spatial distribution imaging lens 351 and ICCD cameras 352, space point Spatial distribution is provided in cloth imaging lens 351 and measures iris diaphgram 353.Spatial distribution measures iris diaphgram 353 and can control Thang-kng amount prevents ICCD cameras 352 under-exposed or supersaturated.
Referring to Fig. 8 and Fig. 9, for 8 constriction beams, (8 laser surround square, are located at square quadrangle and four side midpoints respectively Position) situation about practicing shooting, a kind of layout of full aperture backscattering measuring system is as shown in Figure 8.The advantages of this layout is：Knot Structure is compact, independently of each other, non-interference.

Claims (9)

1. a kind of full aperture backscattering light measurement system based on scatter plate scattering sampling, it is characterised in that：Including throwing off axis Object plane type scatter plate and the probe group positioned at off axis paraboloid mirror type scatter plate focal point, the probe group include two energy measurements Unit, two time measuring units, two spectral measurement units, a calibration contact unit and a spatial distribution measure single Member；Two energy measuring units are respectively used to carry out long wave energy measurement and shortwave energy measurement, two time measuring units point Long wave time measurement and shortwave time measurement Yong Yu not be carried out, two spectral measurement units are respectively used to carry out long wave spectral measurement With shortwave spectral measurement.
2. the full aperture backscattering light measurement system according to claim 1 based on scatter plate scattering sampling, feature It is：It is variable that the energy measuring unit includes the energy measurement bandpass filter set gradually along optical path direction, energy measurement Diaphragm, energy measurement optically focused camera lens and energy meter.
3. the full aperture backscattering light measurement system according to claim 2 based on scatter plate scattering sampling, feature It is：In the energy measuring unit for long wave energy measurement, the thang-kng bandwidth of energy measurement bandpass filter is 400- 700nm；In the energy measuring unit for shortwave energy measurement, the thang-kng bandwidth of energy measurement bandpass filter for 351 ± 3nm。
4. the full aperture backscattering light measurement system according to claim 1 based on scatter plate scattering sampling, feature It is：The time measuring unit includes the time measurement bandpass filter set gradually along optical path direction, time measurement couples Camera lens and fast photoelectric tube.
5. the full aperture backscattering light measurement system according to claim 4 based on scatter plate scattering sampling, feature It is：In the time measuring unit for long wave time measurement, the thang-kng bandwidth of time measurement bandpass filter is 400- 700nm；In the time measuring unit for shortwave time measurement, the thang-kng bandwidth of time measurement bandpass filter for 351 ± 3nm。
6. the full aperture backscattering light measurement system according to claim 1 based on scatter plate scattering sampling, feature It is：The spectral measurement unit include the spectral measurement bandpass filter set gradually along optical path direction, spectral measurement diaphragm, Spectral measurement couples camera lens and multimode fibre, the multimode fibre are connected with spectrometer.
7. the full aperture backscattering light measurement system according to claim 6 based on scatter plate scattering sampling, feature It is：In the spectral measurement unit for long wave spectral measurement, the thang-kng bandwidth of spectral measurement bandpass filter is 400- 700nm；In the spectral measurement unit for shortwave spectral measurement, the thang-kng bandwidth of spectral measurement bandpass filter for 351 ± 3nm。
8. according to the full aperture backscattering light measurement system based on scatter plate scattering sampling any in claim 1-7 System, it is characterised in that：The calibration contact unit includes photoelectric probe and rotatable cover sheet.
9. according to the full aperture backscattering light measurement system based on scatter plate scattering sampling any in claim 1-7 System, it is characterised in that：The spatial distribution measuring unit includes spatial distribution imaging lens and ICCD cameras, the spatial distribution Spatial distribution is provided in imaging lens and measures iris diaphgram.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115195950A (en) * 2022-07-28 2022-10-18 广东英诺威盛科技有限公司 Unmanned ship for paint spraying of ocean platform and control method thereof
EP4158411A4 (en) * 2020-06-01 2024-07-10 Lockheed Corp Geometric phase and off-axis optics for reduced backscatter

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140044226A1 (en) * 2011-04-20 2014-02-13 Logos Technologies Llc Flexible Driver Laser for Inertial Fusion Energy
CN105469837A (en) * 2015-12-29 2016-04-06 中国科学院西安光学精密机械研究所 Laser fusion backscattering light beam simulation device
CN207636186U (en) * 2017-12-14 2018-07-20 中国科学院西安光学精密机械研究所 Full-aperture back scattered light measurement system based on scattering plate scattering sampling

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140044226A1 (en) * 2011-04-20 2014-02-13 Logos Technologies Llc Flexible Driver Laser for Inertial Fusion Energy
CN105469837A (en) * 2015-12-29 2016-04-06 中国科学院西安光学精密机械研究所 Laser fusion backscattering light beam simulation device
CN207636186U (en) * 2017-12-14 2018-07-20 中国科学院西安光学精密机械研究所 Full-aperture back scattered light measurement system based on scattering plate scattering sampling

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
彭晓世 等: "神光Ⅲ原型全孔径背向散射测量系统研制及应用", 《光学学报》 *
闫亚东 等: "全孔径背向散射诊断光学系统", 《光学精密工程》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4158411A4 (en) * 2020-06-01 2024-07-10 Lockheed Corp Geometric phase and off-axis optics for reduced backscatter
CN115195950A (en) * 2022-07-28 2022-10-18 广东英诺威盛科技有限公司 Unmanned ship for paint spraying of ocean platform and control method thereof

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