CN108151648B - Double-guide-rail measuring platform and method for measuring target coordinates by using same - Google Patents

Double-guide-rail measuring platform and method for measuring target coordinates by using same Download PDF

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CN108151648B
CN108151648B CN201711447974.4A CN201711447974A CN108151648B CN 108151648 B CN108151648 B CN 108151648B CN 201711447974 A CN201711447974 A CN 201711447974A CN 108151648 B CN108151648 B CN 108151648B
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grating ruler
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江浩
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Suzhou Lebaitu Information Technology Co ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates

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Abstract

The invention relates to a double-guide-rail measuring platform, which comprises: one side of each of the two X-axis guide rails is respectively fixed with an X-axis main grating ruler and an X-axis auxiliary grating ruler; the X-direction moving platform is provided with a first main reading head for reading the X-axis main grating ruler and a first auxiliary reading head for reading the X-axis auxiliary grating ruler during moving; the X-axis moving platform drives the Y-axis guide rails to move forwards relative to the X-axis guide rails, and a Y-axis main grating ruler and a Y-axis auxiliary grating ruler are respectively fixed on one sides of the two Y-axis guide rails; and the Y-direction moving platform is provided with a first main reading head for reading the Y-axis main grating ruler and a first auxiliary reading head for reading the Y-axis auxiliary grating ruler during moving. The coordinates of the target are adjusted by using the auxiliary grating ruler, and the accurate coordinates of the target closer to the reality are obtained, so that the detection precision reduction of the XY platform caused by the distortion in the advancing process is eliminated. In addition, a method for measuring the coordinates of the target based on the platform is also provided.

Description

Double-guide-rail measuring platform and method for measuring target coordinates by using same
Technical Field
The invention relates to the field of precision detection, in particular to a double-guide-rail measuring platform and a coordinate measuring method thereof.
Background
The current measuring platform of high accuracy all is little stroke generally, and to the great measuring platform of stroke, the platform need use the platform of double guide rail, if use two drives, then with high costs, the debugging is difficult, if use single drive, then the platform can have the wrench movement at the in-process of advancing, leads to measurement accuracy to descend.
Disclosure of Invention
Therefore, it is necessary to provide a dual-rail measuring platform for solving the problem of twisting during the traveling process of the dual-rail platform.
A dual-rail measurement platform comprising:
the X-axis grating ruler and the X-axis auxiliary grating ruler are respectively fixed on one side of the two X-axis guide rails;
the X-direction moving platform is matched with the two X-axis guide rails and is provided with a first main reading head for reading the X-axis main grating ruler and a first auxiliary reading head for reading the X-axis auxiliary grating ruler during moving;
two Y-axis guide rails which are arranged at intervals are driven by the X-direction moving platform to move forward relative to the X-axis guide rails, and a Y-axis main grating ruler and a Y-axis auxiliary grating ruler are respectively fixed on one sides of the two Y-axis guide rails;
and the Y-direction moving platform is matched with the two Y-axis guide rails and is provided with a second main reading head for reading the Y-axis main grating ruler and a second auxiliary reading head for reading the Y-axis auxiliary grating ruler during moving.
Above-mentioned double guide rail measuring platform has all set up main grating chi and vice grating chi in X and the Y direction, can utilize vice grating chi to adjust target A's coordinate, obtains more pressing close to actual accurate target A's coordinate to eliminate XY platform and descend because the detection precision that the distortion of marcing in-process brought.
In one embodiment, the device further comprises a control system, wherein the control system is used for receiving the data information of the first main reading head, the first auxiliary reading head, the second main reading head and the second auxiliary reading head.
In one embodiment, the system further comprises a display device connected with the control system and used for displaying the data information.
In one embodiment, the X-direction driving mechanism comprises a ball screw which is positioned in the middle of the two X-axis guide rails and used for driving the X-direction moving platform to move forwards; the Y-direction driving mechanism comprises a ball screw which is positioned in the middle of the two Y-axis guide rails and used for driving the Y-direction moving platform to move forwards.
In one embodiment, the X-direction drive mechanism further includes a servo motor that drives the ball screw, and the Y-direction drive mechanism further includes a servo motor that drives the ball screw.
In one embodiment, the device further comprises a machine table, wherein the two X-axis guide rails, the X-axis main grating ruler and the X-axis auxiliary grating ruler are all fixed on the machine table, and the Y-axis guide rail, the Y-axis main grating ruler and the Y-axis auxiliary grating ruler are all fixed on the X-direction moving platform.
In one embodiment, the X-axis main grating ruler and the first main reading head are arranged in an up-down mode or a left-right mode, the X-axis auxiliary grating ruler and the first auxiliary reading head are arranged in an up-down mode or a left-right mode, the Y-axis main grating ruler and the second main reading head are arranged in an up-down mode or a left-right mode, and the Y-axis auxiliary grating ruler and the second auxiliary reading head are arranged in an up-down mode or a left-right mode.
Also provided is a method for measuring target coordinates using the dual guideway measurement platform, comprising the steps of:
acquiring a reading X1 of an X-axis main grating ruler and a reading X2 of an X-axis auxiliary main grating ruler, and acquiring a reading Y1 of a Y-axis main grating ruler and a reading Y2 of the Y-axis auxiliary main grating ruler;
iteratively solving the X and Y coordinates of the object by the following formula：
Figure GDA0002175547520000021
Figure GDA0002175547520000022
The XD is the distance between the Y-axis main grating ruler and the Y-axis auxiliary grating ruler, YD is the distance between the X-axis main grating ruler and the X-axis auxiliary grating ruler, ya is an initial value of X1, and xa is an initial value of Y1.
By using the measurement data of the measurement platform, the coordinates of the target can be accurately solved by means of an iterative algorithm, so that the detection precision reduction of the XY platform caused by distortion in the advancing process is eliminated.
In one embodiment, iteration is performed for N times, X and Y coordinates of the target are obtained through calculation, N is a natural number, and N is not more than 3.
In one embodiment, the method further comprises the following steps: and when the difference value between the X coordinate value obtained by iterative solution and the coordinate value of the X before substitution is in a preset range, stopping iterative solution.
Drawings
FIG. 1 is a schematic view of a dual rail measurement platform according to one embodiment of the present invention;
fig. 2 and 3 are block diagrams of the X-direction moving platform and the Y-direction moving platform, respectively;
fig. 4 is a schematic diagram of measuring coordinates of a target point using the measurement platform shown in fig. 1.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
The following describes a preferred embodiment of the dual-rail measuring platform according to the present invention with reference to the accompanying drawings.
Referring to fig. 1 to 3, a dual rail measurement platform 100 according to an embodiment of the present invention includes: two X-axis guide rails 110 arranged at intervals, an X-direction moving platform 120 matched with the two X-axis guide rails 110, two Y-axis guide rails 130 arranged at intervals and a Y-direction moving platform 140 matched with the two Y-axis guide rails. Wherein the Y-direction moving stage 140 moves in the Y-direction with respect to the Y-axis guide 130. The X-direction moving stage 120 moves in the X direction relative to the X-axis guide 110, and the Y-axis guide 130 and the Y-direction moving stage 140 can be driven to move in the X direction together while the X-direction moving stage 120 moves, thereby forming an XY moving stage.
The dual-guide-rail measuring platform 100 further comprises an X-axis main grating ruler 150 and an X-axis auxiliary grating ruler 160, which are respectively arranged on one side of one X-axis guide rail 110 along the guide direction of the X-axis guide rail; and a Y-axis main grating scale 170 and a Y-axis sub grating scale 180, which are respectively disposed at one side of one Y-axis guide rail 130 along the guiding direction of the Y-axis guide rail 130. In other words, one side of one of the X-axis guide rails 110 is provided with the X-axis main grating scale 150, and one side of the other X-axis guide rail 110 is provided with the X-axis sub grating scale 160. One side of one of the Y-axis guide rails 130 is provided with a Y-axis main grating scale 170, and one side of the other Y-axis guide rail 130 is provided with a Y-axis sub grating scale 180.
Correspondingly, the X-direction moving platform 120 is provided with a first main reading head 121 for reading the main X-axis grating scale 150 and a first sub-reading head 122 for reading the sub-X-axis grating scale 160. When the X-direction moving platform 120 moves relative to the X-axis main grating scale 150 and the X-axis sub grating scale 160, the first main reading head 121 obtains the reading of the X-axis main grating scale 150, and the first sub reading head 122 obtains the reading of the X-axis sub grating scale 160.
The Y-direction moving stage 140 is provided with a second main reading head 141 for reading the Y-axis main grating scale 170 and a second sub-reading head 142 for reading the Y-axis sub-grating scale 180. When the Y-direction moving platform 140 moves relative to the Y-axis main grating scale 170 and the Y-axis sub grating scale 180, the second main reading head 141 obtains the reading of the Y-axis main grating scale 170, and the second sub reading head 142 obtains the reading of the Y-axis sub grating scale 180.
The dual rail measurement platform 100 is used in conjunction with a machine vision system during part inspection. When the part detection device is used, a detected part is placed on the Y-direction moving platform 140, an industrial camera is used for collecting an image of the detected part, the image is transmitted to the upper computer, and the upper computer analyzes and measures the image by using measurement software. Machine vision has many superior characteristics that traditional measurement methods cannot match. The measuring system based on machine vision generally comprises an illuminating device, an industrial camera, a lens, an upper computer and measuring software. The principle of the device is that the outline of a part to be detected is highlighted by light emitted by an illumination system, light is gathered on a CMOS area array by a lens, collected light signals are converted into charge signals by the CMOS and are transmitted to a computer, and corresponding measurement software measures and analyzes the size of each parameter to be detected. When the position of the part to be detected needs to be adjusted, the position of the part to be detected is adjusted by moving the X-direction moving platform 120 and the Y-direction moving platform 140. As shown in fig. 1, the movement of the X-direction moving stage 120 and the Y-direction moving stage 140 enables the object a placed on the Y-direction moving stage 140 to be located at any position of the XY plane coordinate system.
How to accurately acquire the coordinates of the target a in the XY plane coordinate system by using the dual-rail measurement platform 100 will be described in detail below with reference to fig. 4.
As shown in fig. 4, in the position where the object a is currently located, the following are set: the distance between the X-axis main grating ruler 150 and the X-axis auxiliary grating ruler 160 is YD, the distance between the Y-axis main grating ruler 170 and the Y-axis auxiliary grating ruler 180 is XD, the current reading X1 of the X-axis main grating ruler 150, the reading X2 of the X-axis auxiliary grating ruler 160, the reading Y1 of the Y-axis main grating ruler 170 and the reading Y2 of the Y-axis auxiliary grating ruler 180 are shown, the point A is away from the X-axis main grating ruler 150 by the distance xa, and the point A is away from the Y-axis main grating ruler 170 by the distance ya.
The X and Y coordinates of the actual a are iteratively calculated using the following formula:
Figure GDA0002175547520000051
the X coordinate and the Y coordinate are calculated by setting the initial value of xa to Y1 and the initial value of ya to X1. And then substituting the calculated X and Y into X and Y on the right side of the formula to obtain X and Y again, and iterating for N times to converge.
As can be seen in fig. 4, xa is the distance of point a from the X-axis master raster scale 150 and ya is the distance of point a from the Y-axis master raster scale 170. Thus, xa corresponds to the Y coordinate of object A, and ya corresponds to the X coordinate of object A. For ease of distinction from X and Y coordinates herein, are denoted as xa and ya, respectively.
Taking the XY stage moving in the X direction as an example, in the process that the X-direction moving stage 120 moves along the two X-axis guide rails 110, there may be torques due to uneven stress on the X-direction moving stage 120 at the two X-axis guide rails 110, so that the readings X1 of the X-axis main grating scale 150 and the readings X2 of the X-axis sub grating scale 160 are different, and at this time, the actual Y coordinates of the target a, which is X1 or X2, are inaccurate, which affects the accuracy of the subsequent measurement work. Similarly, neither reading y1 nor y2 can be directly taken as the X coordinate of target A.
Based on this situation, in this embodiment, an iterative algorithm is used to obtain a relatively accurate X coordinate and a relatively accurate Y coordinate. Specifically, taking the solving formula for setting the Y coordinate as an example, when the XY stage moves in the Y direction, the actual position xa of the point a away from the X-axis main raster ruler 150 is between the position corresponding to the reading X1 and the position corresponding to the reading X2. Therefore, by using the principle that the corresponding sides of similar triangles are proportional, a formula for calculating the Y coordinate can be designed as
Figure GDA0002175547520000052
The principle is similar for the solution formula design for the X coordinate.
Whereby the X and Y coordinates can be solved iteratively by the following equations, respectively:
Figure GDA0002175547520000053
Figure GDA0002175547520000061
the XD is the distance between the Y-axis main grating ruler and the Y-axis auxiliary grating ruler, YD is the distance between the X-axis main grating ruler and the X-axis auxiliary grating ruler, the initial value of xa is Y1, and the initial value of ya is X1. Thus, relatively accurate X and Y can be obtained by iterative solution.
The number of iterations N is a natural number, and is generally set to 3 depending on the required accuracy. In addition, the number of iterations is not particularly limited, but a stop criterion is set, and the iteration is stopped when the accuracy criterion is reached.
For example, the stop criterion may be a difference limit between X and the coordinate value of X before substitution when the difference is within a predetermined range. If the difference between the two is set to be not more than 2 mm, the program is executed with iterative calculation until the above condition is satisfied.
Above-mentioned double guide rail measuring platform 100, main grating chi and vice grating chi have all been set up in X and Y direction, can utilize vice grating chi to adjust target A's coordinate, obtain the accurate target A's that more is close to reality coordinate to eliminate XY platform and because the distortion that advances in-process brings the detection precision and descend.
In one embodiment, the dual guideway measurement platform 100 further comprises a control system, wherein the control system is configured to receive data information of the first primary read head 121, the first secondary read head 122, the second primary read head 141, and the second secondary read head 142. After receiving the data information, the control system can calculate the X coordinate and the Y coordinate of the target A according to a preset program. The control system can comprise an upper computer, and the X coordinate and the Y coordinate of the target A are calculated by using the upper computer.
Furthermore, the system also comprises a display device connected with the control system and used for displaying the data information. The display device may employ a CRT display, an LCD display, or the like.
In one embodiment, the dual-rail measurement platform 100 further comprises an X-direction driving mechanism including a ball screw located in the middle of the two X-axis rails 110 for driving the X-direction moving platform 120 to advance; and a Y-direction driving mechanism including a ball screw located in the middle of the two Y-axis guide rails 130 for driving the Y-direction moving platform 140 to move forward.
In this embodiment, the dual-rail measuring platform 100 adopts a single-drive mode in both the X direction and the Y direction, and the transmission mechanism is a ball screw. The ball screw has higher transmission precision, and is beneficial to improving the measurement precision. Note that the position of the ball screw does not necessarily need to be exactly in the middle, and may be inclined to one side. In addition, the transmission mechanism can also be in other existing modes, such as a gear rack, a crank block mechanism, a cylinder system and the like.
Further, the X-direction driving mechanism further includes a servo motor that drives the ball screw, and the Y-direction driving mechanism further includes a servo motor that drives the ball screw. In addition, the servo motor can also be other power output devices, such as a hydraulic motor, a gasoline engine, a diesel engine and the like.
In one embodiment, the dual-guide-rail measurement platform 100 further includes a machine table 190, the two X-axis guide rails 110, the X-axis main grating ruler 150, and the X-axis sub grating ruler 160 are all fixed on the machine table 190, and the Y-axis guide rail 130, the Y-axis main grating ruler 170, and the Y-axis sub grating ruler 190 are all fixed on the X-direction moving platform 120.
The machine 190 is used to support the entire XY stage. The structure of the machine 190 is not limited, and may be a rack type or a platform type. The main X-axis grating scale 150 and the sub X-axis grating scale 160 are fixed on the machine table 190. The particular manner of attachment is not particularly required. When the XY platform moves in the X direction, the target A moves relative to the X-axis main grating scale 150 and the X-axis auxiliary grating scale 160; when the XY stage moves in the Y direction, the object a moves with respect to the Y-axis main grating scale 170 and the Y-axis sub grating scale 180.
Further, the X-axis main grating scale 150 and the first main reading head 121 are preferably arranged in an up-down manner, and the X-axis auxiliary grating scale 160 and the first auxiliary reading head 122 are preferably arranged in an up-down manner; the Y-axis main grating ruler 170 and the second main reading head 141 are arranged in an up-down mode, and the Y-axis auxiliary grating ruler 180 and the second auxiliary reading head 142 are arranged in an up-down mode.
For example, the X-axis main grating ruler 150 is attached to the machine, and the first main reading head 121 is disposed at the bottom of the X-direction moving platform 120; the X-axis secondary scale 160 and the first secondary readhead 122 are arranged in a similar manner. A Y-axis main grating ruler 170 is attached to the top of the X-direction moving platform 120, and a second main reading head 141 is arranged at the bottom of the Y-direction moving platform 140; the Y-axis sub scale 180 and the second sub reading head 142 are arranged in a similar manner.
In addition, taking the X-axis main grating scale 150 and the first main reading head 121 as an example, they may be arranged side by side in a left-right manner.
The present invention also provides a method for measuring target coordinates using the dual rail measurement platform 100, comprising the steps of:
s100, acquiring a reading X1 of the X-axis main grating ruler and a reading X2 of the X-axis auxiliary grating ruler, and acquiring a reading Y1 of the Y-axis main grating ruler and a reading Y2 of the Y-axis auxiliary grating ruler.
In this step, a reading X1 of the X-axis main grating scale 150 is read by the first main reading head 121. The reading X2 of the X-axis sub grating scale 160 is read by the first sub reading head 122. A reading Y1 of the Y-axis master raster scale 170 is read by the second master read head 141. A reading Y2 of the Y-axis sub raster scale 180 is read by the second sub reading head 142.
S200, iteratively solving the X coordinate and the Y coordinate of the target through the following formulas:
Figure GDA0002175547520000081
Figure GDA0002175547520000082
the XD is the distance between the Y-axis main grating ruler and the Y-axis auxiliary grating ruler, YD is the distance between the X-axis main grating ruler and the X-axis auxiliary grating ruler, the initial value of xa is Y1, and the initial value of ya is X1.
As already mentioned above, X and Y of different accuracies can be obtained by multiple iterative solutions. By using the above method, accurate X and Y can be obtained by using the measurement data of the measurement platform 100, and measurement accuracy errors caused by distortion are reduced.
In one embodiment, iteration is performed for N times, and X and Y coordinates of the target are obtained through calculation, wherein N is a natural number and is not larger than 3.
In general, 3 times of iterative calculation can basically reach the reading precision of the grating ruler.
In one embodiment, the method further comprises the steps of: and when the difference value between the X coordinate value obtained by iterative computation and the coordinate value of X before substitution is in a preset range, stopping iterative computation.
For example, a margin for the difference between X and the coordinate value of X before substitution may be set to determine when to stop the iteration. If the measurement platform accuracy requirement is assumed to be on the order of 10 microns, the margin for the difference between the coordinate values of X and X before substitution is set to be no greater than 1 micron. The program is executed with iterative computations until the above condition is satisfied.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (10)

1. A dual-rail measurement platform, comprising:
the X-axis grating ruler and the X-axis auxiliary grating ruler are respectively fixed on one side of the two X-axis guide rails;
the X-direction moving platform is matched with the two X-axis guide rails and is provided with a first main reading head for reading the X-axis main grating ruler and a first auxiliary reading head for reading the X-axis auxiliary grating ruler during moving;
the X-direction moving platform drives the Y-axis guide rails to move forwards relative to the X-axis guide rails, and a Y-axis main grating ruler and a Y-axis auxiliary grating ruler are respectively fixed on one sides of the two Y-axis guide rails;
the Y-direction moving platform is matched with the two Y-axis guide rails and is provided with a second main reading head for reading the Y-axis main grating ruler during moving and a second auxiliary reading head for reading the Y-axis auxiliary grating ruler;
the X-direction driving mechanism and the Y-direction driving mechanism are both single-driven.
2. The dual track measurement platform of claim 1, further comprising a control system configured to receive data information from the first primary read head, the first secondary read head, the second primary read head, and the second secondary read head.
3. The dual-guideway measurement platform of claim 2, further comprising a display device coupled to the control system to display the data information.
4. The dual-guideway measurement platform of claim 1, wherein the X-direction drive mechanism comprises a ball screw located at the middle of the two X-axis guideways for driving the X-direction moving platform to advance; and the Y-direction driving mechanism comprises a ball screw which is positioned in the middle of the two Y-axis guide rails and used for driving the Y-direction moving platform to move forwards.
5. The dual-guideway measurement platform of claim 4, wherein the X-direction drive mechanism further comprises a servo motor that drives the ball screw, and the Y-direction drive mechanism further comprises a servo motor that drives the ball screw.
6. The dual-guide-rail measuring platform according to claim 1, further comprising a machine table, wherein the two X-axis guide rails, the X-axis main grating ruler and the X-axis auxiliary grating ruler are all fixed on the machine table, and the Y-axis guide rails, the Y-axis main grating ruler and the Y-axis auxiliary grating ruler are all fixed on the X-direction moving platform.
7. The dual-guide-rail measuring platform as claimed in claim 6, wherein the X-axis main grating ruler and the first main reading head are arranged in an up-down manner or a left-right manner, the X-axis auxiliary grating ruler and the first auxiliary reading head are arranged in an up-down manner or a left-right manner, the Y-axis main grating ruler and the second main reading head are arranged in an up-down manner or a left-right manner, and the Y-axis auxiliary grating ruler and the second auxiliary reading head are arranged in an up-down manner or a left-right manner.
8. A method of measuring the coordinates of an object using the dual guideway measurement platform of claim 1, comprising the steps of:
acquiring a reading X1 of an X-axis main grating ruler and a reading X2 of an X-axis auxiliary main grating ruler, and acquiring a reading Y1 of a Y-axis main grating ruler and a reading Y2 of the Y-axis auxiliary main grating ruler; iteratively solving the X and Y coordinates of the object by:
Figure FDA0002359328550000021
wherein XD is the distance between the Y-axis main grating ruler and the Y-axis auxiliary grating ruler, YD is the distance between the X-axis main grating ruler and the X-axis auxiliary grating ruler, ya is an initial value of X1, xa is an initial value of Y1,
xa is the distance of the target from the X-axis master grating scale, ya is the distance of the target from the Y-axis master grating scale,
and respectively substituting the calculated X and Y into xa and ya on the right side of the formula, recalculating the X and Y, iterating for N times, and taking the calculated X and Y as the X coordinate and the Y coordinate of the target, wherein N is a natural number.
9. The method of claim 8, wherein N is not greater than 3.
10. The method of claim 8, further comprising the step of: and when the difference value between the X coordinate value obtained by iterative solution and the coordinate value of the X before substitution is in a preset range, stopping iterative solution.
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