CN108132543B - 超分辨成像系统 - Google Patents
超分辨成像系统 Download PDFInfo
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- CN108132543B CN108132543B CN201711410961.XA CN201711410961A CN108132543B CN 108132543 B CN108132543 B CN 108132543B CN 201711410961 A CN201711410961 A CN 201711410961A CN 108132543 B CN108132543 B CN 108132543B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
Abstract
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CN201711410961.XA CN108132543B (zh) | 2017-12-23 | 2017-12-23 | 超分辨成像系统 |
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CN108132543A CN108132543A (zh) | 2018-06-08 |
CN108132543B true CN108132543B (zh) | 2020-06-12 |
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Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2019119458A1 (zh) * | 2017-12-23 | 2019-06-27 | 深圳大学 | 超分辨成像系统 |
CN109211871A (zh) * | 2018-11-26 | 2019-01-15 | 深圳大学 | 一种受激发射损耗荧光寿命超分辨成像装置 |
WO2020107140A1 (zh) * | 2018-11-26 | 2020-06-04 | 深圳大学 | 一种受激发射损耗荧光寿命超分辨成像装置 |
CN109683342B (zh) * | 2018-12-25 | 2020-11-03 | 浙江大学 | 基于波前整形的多模光纤超分辨成像装置及其光斑校正方法 |
CN109633881A (zh) * | 2019-01-04 | 2019-04-16 | 深圳大学 | 一种受激发射损耗显微镜的成像系统 |
CN109633885A (zh) * | 2019-01-29 | 2019-04-16 | 清华大学 | 基于波前聚焦的梯度折射率透镜显微成像系统及方法 |
CN111562665B (zh) * | 2020-05-21 | 2021-03-19 | 浙江大学 | 一种sted超分辨技术中的自适应光学像差校正系统及方法 |
CN115791756A (zh) * | 2022-11-24 | 2023-03-14 | 北京杏林睿光科技有限公司 | 一种一次测量全谱的激光诱导击穿光谱装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103777473A (zh) * | 2014-01-23 | 2014-05-07 | 中国科学院上海光学精密机械研究所 | 基于受激光发射损耗的激光直写曝光装置 |
CN103917914A (zh) * | 2011-10-26 | 2014-07-09 | 浜松光子学株式会社 | 光调制控制方法、控制程序、控制装置以及激光照射装置 |
CN105026916A (zh) * | 2013-03-06 | 2015-11-04 | 浜松光子学株式会社 | 荧光受光装置以及荧光受光方法 |
CN105241857A (zh) * | 2015-09-30 | 2016-01-13 | 深圳大学 | 一种超分辨成像系统 |
Family Cites Families (1)
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WO2013007726A1 (en) * | 2011-07-11 | 2013-01-17 | Facultes Universitaires Notre-Dame De La Paix | Method for high resolution sum-frequency generation and infrared microscopy |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103917914A (zh) * | 2011-10-26 | 2014-07-09 | 浜松光子学株式会社 | 光调制控制方法、控制程序、控制装置以及激光照射装置 |
CN105026916A (zh) * | 2013-03-06 | 2015-11-04 | 浜松光子学株式会社 | 荧光受光装置以及荧光受光方法 |
CN103777473A (zh) * | 2014-01-23 | 2014-05-07 | 中国科学院上海光学精密机械研究所 | 基于受激光发射损耗的激光直写曝光装置 |
CN105241857A (zh) * | 2015-09-30 | 2016-01-13 | 深圳大学 | 一种超分辨成像系统 |
Non-Patent Citations (3)
Title |
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Aberration correction for improving the image quality in STED microscopy using the genetic algorithm;Luwei Wang et.al.;《Nanophotonics》;20181231;第7卷(第12期);第1971–1980页 * |
Interleaved segment correction achieves higher improvement factors in using genetic algorithm to optimize light focusing through scattering media;Runze Li1 et.al.;《Journal of Optics》;20171031;第19卷(第10期);第1-20页 * |
受激发射损耗显微中空心损耗光的光强分布优化研究;蔡亚楠等;《光学学报》;20170331;第37卷(第3期);第0318009-1-9页 * |
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