CN108130227B - 一种适配于自取向液晶材料的辅助清洗剂及其应用 - Google Patents
一种适配于自取向液晶材料的辅助清洗剂及其应用 Download PDFInfo
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Abstract
本发明公开了一种适配于自取向液晶材料的辅助清洗剂,其包括溶剂以及充分溶解在所述溶剂中的如式1~式4任一表示的清洗组分。本发明还公开了上述辅助清洗剂在液晶显示器领域中的应用。根据本发明的辅助清洗剂,当其应用于液晶面板的制作过程中时,首先通过利用该辅助清洗剂清洗TFT基板、CF基板,使TFT基板、CF基板表面产生多种类型的极性基团,继而后续以自取向液晶材料制备液晶取向层时,自取向液晶材料中的极性基团即可与该清洗组分之间产生分子间氢键,从而利用该清洗组分提高在基板表面吸附的能力,以有效解决现有技术中的由自取向液晶材料形成的液晶显示器中所存在的漏光问题。
Description
技术领域
本发明属于液晶显示技术领域,具体来讲,涉及一种适配于自取向液晶材料的辅助清洗剂、以及该辅助清洗剂在液晶显示器领域中的应用。
背景技术
在液晶显示器(LCD)的CF基板和TFT基板上,分别有一层薄膜材料,其主要作用是使液晶分子(LC分子)按一定方向排列,一般称之为配向膜(常用聚酰亚胺材料,即PI材料)。这种配向膜主要分为摩擦配向型PI材料和光配向型PI材料,但是,两种配向材料均有各自的缺点。首先,摩擦配向型PI材料容易造成粉尘颗粒、静电残留、刷痕等问题降低工艺良率,而光配向型PI材料虽然可以避免这些问题,但由于材料特性受限,耐热性和耐老化性不佳,同时锚定LC分子的能力也较弱,从而影响面板的品质;其次,PI材料本身就具有高极性和高吸水性,存储和运送容易造成变质而导致配相不均,并且PI材料价格昂贵,在TFT-LCD上成膜的工艺也较为复杂,导致面板成本提高。
因此,一般在LCD中加入一种添加剂材料,这种添加剂材料可作用在无PI膜的基板表面,以省去PI膜,达到使LC分子垂直排列的目的。这类添加剂材料一般由头基和尾基两部分组成,头基主要是利用分子间作用力锚定在基板上,而尾基的主要作用是依靠类似于PI分子支链的作用以立体障碍的方式使得液晶分子垂直排列。但是,将这种添加剂材料应用在TFT-LCD面板中,往往存在一些问题,主要因素是这类添加剂材料与基板表面分子间作用力较弱,液晶面板容易出现漏光等异常。
因此有必要对垂直配向型液晶显示器进行改进,在去除PI膜即实现垂直配向的情况下,还要提高添加剂材料在基板表面的锚定作用,以解决漏光问题。
发明内容
为解决上述现有技术存在的问题,本发明提供了一种适配于自取向液晶材料的辅助清洗剂,该辅助清洗剂能够在制备无PI膜的液晶显示器时,提高自取向液晶材料的锚定作用,从而有效解决漏光问题。
为了达到上述发明目的,本发明采用了如下的技术方案:
一种适配于自取向液晶材料的辅助清洗剂,包括溶剂以及充分溶解在所述溶剂中的如式1~式4任一表示的清洗组分:
其中,A基团为连接键、苯环或环烷烃;Sp基团选自连接键、-O-、-S-、-CO-、-CO-O-、-O-CO-、-O-CO-O-、-CH=CH-、-CF=CF-、-C≡C-、-CH=CH-COO-、-OCO-CH=CH-中的任意一种;B基团为-OH或-COOH;D基团为连接键或-CH2-;E基团为连接键或C1~C5的烷烃;G基团为C2~C6的烷烃;
n1表示A基团的个数,n1为不超过10的正整数;m表示-Sp-B-的个数,m为不超过n1的正整数;n2表示D基团的个数,n2为不超过10的正整数;n3为式3中Sp基团的个数,n3为不超过5的正整数;n4为式4中B基团的个数,n4为不超过6的正整数。
进一步地,在所述式4中,G基团通过Sp基团连接成环。
进一步地,所述清洗组分选自式1-1~1-4中的任意一种,或选自式2-1~2-4中的任意一种,或选自式3-1~3-4中的任意一种,或选自式4-1:
进一步地,在所述辅助清洗剂中,所述清洗组分的质量百分数不超过50%。
进一步地,在所述辅助清洗剂中,所述清洗组分的质量百分数为0.1%~5%。
进一步地,所述溶剂选自水、N-乙基吡咯烷、γ-己内酯、二甲基亚砜、二氯甲烷、丙酮中的任意一种。
本发明的另一目的还在于提供一种如上任一所述的辅助清洗剂的应用,至少包括步骤:
S1、提供TFT基板和/或CF基板;
S2、采用如上任一所述的辅助清洗剂清洗所述TFT基板和/或所述CF基板的表面;
S3、烘烤经过清洗的TFT基板和/或CF基板,使得所述辅助清洗剂中的清洗组分锚定在所述TFT基板和/或所述CF基板的表面上。
进一步地,在所述步骤S3中,将所述经过清洗的TFT基板和/或CF基板置于100℃~150℃中烘烤1min~10min。
进一步地,在所述步骤S3之后,还包括步骤:S4、利用自取向液晶材料在锚定有清洗组分的TFT基板和/或锚定有清洗组分的CF基板上形成液晶取向层。
本发明通过选择含有多极性基团的物质作为清洗组分,将这种材料配制成辅助清洗剂,用于基板清洗后,可在基板表面产生多种类型的极性基团,由此,当该辅助清洗剂应用于液晶面板的制作过程中时,自取向液晶材料中的极性基团即可与该清洗组分之间产生分子间氢键,从而利用该清洗组分提高在基板表面吸附的能力,以有效解决现有技术中的漏光问题。
具体实施方式
以下,将来详细描述本发明的实施例。然而,可以以许多不同的形式来实施本发明,并且本发明不应该被解释为限制于这里阐述的具体实施例。相反,提供这些实施例是为了解释本发明的原理及其实际应用,从而使本领域的其他技术人员能够理解本发明的各种实施例和适合于特定预期应用的各种修改。
本发明公开了一种适配于自取向液晶材料的辅助清洗剂,其包括溶剂以及充分溶解在溶剂中的如式1~式4任一表示的清洗组分:
其中,A基团为连接键、苯环或环烷烃;Sp基团选自连接键、-O-、-S-、-CO-、-CO-O-、-O-CO-、-O-CO-O-、-CH=CH-、-CF=CF-、-C≡C-、-CH=CH-COO-、-OCO-CH=CH-中的任意一种;B基团为-OH或-COOH;D基团为连接键或-CH2-;E基团为连接键或C1~C5的烷烃;G基团为C2~C6的烷烃。
n1表示A基团的个数,n1为不超过10的正整数;m表示-Sp-B-的个数,m为不超过n1的正整数;n2表示D基团的个数,n2为不超过10的正整数;n3为式3中Sp基团的个数,n3为不超过5的正整数;n4为式4中B基团的个数,n4为不超过6的正整数。
优选地,在式4中,G基团通过Sp基团连接成环。
更为优选地,清洗组分可以是如式1-1~1-4或式2-1~2-4或式3-1~3-4中的任意一种、或式4-1所示的物质:
具体来讲,一般在该辅助清洗剂中,控制清洗组分的质量百分数不超过50%即可,优选控制为0.1%~5%。
用于溶解上述清洗组分的溶剂选自水、N-乙基吡咯烷、γ-己内酯、二甲基亚砜、二氯甲烷、丙酮中的任意一种。
上述辅助清洗剂可适配于自取向液晶材料应用于液晶面板的制作过程中,具体采用下述步骤:
在步骤S1中,提供TFT基板和/或CF基板。
基于该辅助清洗剂适配于自取向液晶材料,而该自取向液晶材料即无需在TFT基板、CF基板上制作PI膜作为液晶取向层。
在步骤S2中,采用上所述的辅助清洗剂清洗TFT基板和/或CF基板的表面。
在步骤S3中,烘烤经过清洗的TFT基板、CF基板,使得辅助清洗剂中的清洗组分锚定在TFT基板、CF基板的表面上。
具体来讲,将经过清洗的TFT基板、CF基板置于100℃~150℃中烘烤1min~10min,如此,即可去除覆盖在TFT基板、CF基板上的辅助清洗剂中的溶剂,从而使清洗组分保留下来;清洗组分即可锚定在TFT基板、CF基板的表面上。
在步骤S4中,利用自取向液晶材料在锚定有清洗组分的TFT基板和/或锚定有清洗组分的CF基板上形成液晶取向层。
基于该清洗组分的特定结构,其未与TFT基板、CF基板锚定的另一端即可与自取向液晶材料中的极性基团产生分子间氢键,从而提高自取向液晶材料在TFT基板、CF基板表面吸附的能力,以有效解决现有技术中的漏光问题。
为了说明本发明中的上述辅助清洗剂的作用,配制了两种辅助清洗剂,其中清洗组分分别为如式1-2、1-3所示的物质,溶剂均为水,在两种辅助清洗剂中,清洗组分的质量百分数均为1%。利用上述两种辅助清洗剂清洗TFT基板、CF基板后制成液晶显示器,经测试,获得的两种液晶显示器均无漏光等不良现象。
与此同时,按照与上述两种液晶显示器相同的条件制作了另一种对比液晶显示器,其中TFT基板、CF基板仅用水进行清洗,该获得的对比液晶显示器在相同测试情况下即出现漏光的不良现象。
由此可以看出,根据本发明的辅助清洗剂,当其应用于液晶面板的制作过程中时,首先通过利用该辅助清洗剂清洗TFT基板、CF基板,使TFT基板、CF基板表面产生多种类型的极性基团,继而后续以自取向液晶材料制备液晶取向层时,自取向液晶材料中的极性基团即可与该清洗组分之间产生分子间氢键,从而利用该清洗组分提高在基板表面吸附的能力,以有效解决现有技术中的由自取向液晶材料形成的液晶显示器中所存在的漏光问题。
虽然已经参照特定实施例示出并描述了本发明,但是本领域的技术人员将理解:在不脱离由权利要求及其等同物限定的本发明的精神和范围的情况下,可在此进行形式和细节上的各种变化。
Claims (3)
2.根据权利要求1所述的辅助清洗剂在清洗TFT基板和/或CF基板中的应用,其特征在于,所述溶剂选自水、N-乙基吡咯烷、γ-己内酯、二甲基亚砜、二氯甲烷、丙酮中的任意一种。
3.根据权利要求1-2任一项所述的辅助清洗剂在清洗TFT基板和/或CF基板中的应用,其特征在于,至少包括步骤:
S1、提供TFT基板和/或CF基板;
S2、采用所述辅助清洗剂清洗所述TFT基板和/或所述CF基板的表面;
S3、烘烤经过清洗的TFT基板和/或CF基板,使得所述辅助清洗剂中的清洗组分锚定在所述TFT基板和/或所述CF基板的表面上;其中,将所述经过清洗的TFT基板和/或CF基板置于100℃~150℃中烘烤1 min~10 min;
S4、利用自取向液晶材料在锚定有清洗组分的TFT基板和/或锚定有清洗组分的CF基板上形成液晶取向层。
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