CN108080645B - 一种降低316l不锈钢球形粉末空心率的方法 - Google Patents
一种降低316l不锈钢球形粉末空心率的方法 Download PDFInfo
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- CN108080645B CN108080645B CN201711365321.1A CN201711365321A CN108080645B CN 108080645 B CN108080645 B CN 108080645B CN 201711365321 A CN201711365321 A CN 201711365321A CN 108080645 B CN108080645 B CN 108080645B
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- stainless steel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/06—Metallic powder characterised by the shape of the particles
- B22F1/065—Spherical particles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
- B22F2009/043—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling by ball milling
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201711365321.1A CN108080645B (zh) | 2017-12-18 | 2017-12-18 | 一种降低316l不锈钢球形粉末空心率的方法 |
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CN201711365321.1A CN108080645B (zh) | 2017-12-18 | 2017-12-18 | 一种降低316l不锈钢球形粉末空心率的方法 |
Publications (2)
Publication Number | Publication Date |
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CN108080645A CN108080645A (zh) | 2018-05-29 |
CN108080645B true CN108080645B (zh) | 2020-10-09 |
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CN201711365321.1A Active CN108080645B (zh) | 2017-12-18 | 2017-12-18 | 一种降低316l不锈钢球形粉末空心率的方法 |
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CN (1) | CN108080645B (zh) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03284829A (ja) * | 1990-03-30 | 1991-12-16 | Kyocera Corp | 半導体結晶化膜の形成方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100494478C (zh) * | 2006-03-20 | 2009-06-03 | 浙江大学 | 电磁双重屏蔽膜的溅射制备方法 |
CN101851709B (zh) * | 2009-12-15 | 2012-05-23 | 江苏大学 | 一种纳米多孔金属或陶瓷的制备方法及装置 |
CN102796988B (zh) * | 2012-08-24 | 2014-09-03 | 广州金升阳科技有限公司 | 一种溅射法制备高度取向的CuInS2外延薄膜的方法 |
CN103691329B (zh) * | 2013-12-20 | 2016-01-20 | 南京工业大学 | 一种多孔不锈钢膜的制备方法 |
CN205852070U (zh) * | 2016-06-15 | 2017-01-04 | 广东工业大学 | 一种微粒制造设备 |
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2017
- 2017-12-18 CN CN201711365321.1A patent/CN108080645B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03284829A (ja) * | 1990-03-30 | 1991-12-16 | Kyocera Corp | 半導体結晶化膜の形成方法 |
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CB03 | Change of inventor or designer information |
Inventor after: Liang Tingyu Inventor after: Jiang Yong Inventor before: Yue Wei Inventor before: Liang Tingyu Inventor before: Jiang Yong Inventor before: Sheng Hongchao |
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Address after: 226000 No.20, Qixin Road, Nantong Development Zone, Jiangsu Province Applicant after: NANTONG JINYUAN INTELLIGENT TECHNOLOGY Co.,Ltd. Address before: Xinghu Avenue Development Zone 226000 Jiangsu city in Nantong Province, 1692, 21 (22) room 1292 Applicant before: NANTONG JINYUAN INTELLIGENT TECHNOLOGY Co.,Ltd. |
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