CN107942621A - Nanopore array wafer bearing platform suitable for flexible substrate - Google Patents
Nanopore array wafer bearing platform suitable for flexible substrate Download PDFInfo
- Publication number
- CN107942621A CN107942621A CN201711316128.9A CN201711316128A CN107942621A CN 107942621 A CN107942621 A CN 107942621A CN 201711316128 A CN201711316128 A CN 201711316128A CN 107942621 A CN107942621 A CN 107942621A
- Authority
- CN
- China
- Prior art keywords
- substrate
- air
- disk
- anodised aluminium
- flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 70
- 239000011148 porous material Substances 0.000 claims abstract description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 25
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 25
- 239000004411 aluminium Substances 0.000 claims description 24
- 238000001179 sorption measurement Methods 0.000 claims description 4
- 238000013461 design Methods 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 3
- 235000010210 aluminium Nutrition 0.000 description 20
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241000486406 Trachea Species 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 210000004872 soft tissue Anatomy 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 210000003437 trachea Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a nanopore array wafer bearing platform suitable for a flexible substrate, wherein the core part of the wafer bearing platform is an anodic alumina pore base plate, nanoscale pores are uniformly distributed on the surface of the anodic alumina pore base plate and communicated with an airflow plate, after the airflow plate is communicated with an air source, the airflow of the whole anodic alumina pore base plate is uniform, and in the process of attaching exposure and a mask plate, the air pressure of the air source is increased, so that a substrate is separated from the anodic alumina pore base plate to extrude the mask plate, the air floatation exposure is realized, and the exposure precision can be effectively improved. In the exposure process, the temperature of the working area rises, the leveling precision of the wafer bearing table rises within a certain range of the temperature rise, the phenomena of substrate distortion, figure distortion and the like are avoided, and the problems of uneven stress and large internal stress of the substrate are also avoided.
Description
Technical field
The present invention relates to the technical field of wafer-supporting platform, and in particular to a kind of nanohole array suitable for flexible substrate holds piece
Platform, the particularly wafer-supporting platform for the exposure of air supporting substrate.
Background technology
Flexible electronic, optics compared to conditional electronic, optics have more frivolous, more low-power consumption, preferably just
The features such as property taken, flexible and soft tissue good fit, thus the research as the electronics, optics of a new generation is hot
Point.Therefore the micro-nano structure on flexible parent metal surface is processed and detection is flexible electronic, the key of optics fast development.But
In conventional semiconductors equipment, wafer-supporting platform uses aluminum or steel annular adsorption tank, pore structure more, is limited to machining accuracy,
The size in groove and hole is difficult to accomplish below 1mm, thus local deformation occurs in when flexible parent metal can be caused to adsorb, influences flexible parent metal
The processing of the structure on surface or accuracy of detection.
The content of the invention
The purpose of the present invention is a kind of vacuum suction wafer-supporting platform of nanohole array, mainly solves traditional wafer-supporting platform and is only applicable in
In hard substrate, the defects of not being suitable for flexible substrate.
To achieve the above object, the present invention adopts the following technical scheme that：
A kind of nanohole array wafer-supporting platform suitable for flexible substrate, including chassis, positioning disk, anodised aluminium hole base
Plate, substrate, air-flow disk, L-type adapter and tracheae, tray bottom are contacted with air-flow disk, and air-flow disk is guided gas by flow channel
To anode alumina pore substrate bottom surface, the diversion trench of anodised aluminium hole substrate bottom surface design can be uniform by the gas of entrance
Branch is to whole plane so that whole substrate uniform force, reduce stress, and positioning disk is installed on chassis with screw connecting mode
On, air-flow disk is installed on chassis plane, and anodised aluminium hole substrate is installed in positioning disk and air-flow disk is concentric places, substrate
It is embedded in positioning disk upper surface and is placed with and is connected to the flow channel of air-flow disk in anodised aluminium hole upper surface of base plate, L-type adapter
Whole air-channel system, is connected by collar extension by tracheae with source of the gas.
Wherein, using the anodised aluminium hole substrate air pressure of nanohole array as substrate bearing, the size model of nano-pore
Enclose and uniformly exert a force for 10nm-200nm, air pressure, it is ensured that whole substrate stress is without blind spot, uniform force, stress reduction, adsorption capacity
By force.
Wherein, when being exposed using the anodised aluminium hole base plate carrying substrate of the nanohole array mode, source of the gas gas is passed through
Pressure is adjusted so that and substrate extrudes mask plate and realizes exposure after by uniform force, air supporting exposure can effectively improve graphics resolution,
Imaging distortion is avoided to deform.
The principle of the present invention is：
Tray bottom is contacted with air-flow disk, and air-flow disk is guided gas to anode alumina pore substrate bottom surface by flow channel,
The diversion trench of anodised aluminium hole substrate bottom surface design, can be by the uniform branch of the gas of entrance to whole plane so that whole
Substrate uniform force.Positioning disk screw connecting mode is installed on chassis, and air-flow disk is installed on chassis plane, anodised aluminium
Hole substrate is installed in positioning disk and air-flow disk is concentric places, and there are between small for anodised aluminium hole substrate and air-flow disk contact surface
Gap, so that air pressure can be effectively distributed in each nano-pore, and substrate is embedded in positioning disk upper surface and is placed with anode
Alumina pore upper surface of base plate.Substrate can have a small Y type displacement space, and L-type adapter is connected to the air-flow of air-flow disk
Whole air-channel system, is connected by road collar extension by tracheae with source of the gas.When exposing preparation, mask holder, which declines, realizes substrate and mask plate
Extruding, which enables to substrate to be subject to depart from anodised aluminium hole substrate after certain air pressure, extrudes mask plate, pass through gas
The adjusting of pressure can control extruding degree, so that optimal conditions of exposure is adjusted, while substrate can be bonded with mask plate completely,
Reach substrate stress without blind spot.
Invention has the characteristics that and beneficial effect compared with prior art：
(1) present invention is a kind of nanohole array wafer-supporting platform suitable for flexible substrate, can be relied on equally distributed more
Pore structure ceramics air supporting, ensures substrate uniform force, stress without blind spot.
(2) increase in air pressure in a certain range, substrate can be made directly to depart from wafer-supporting platform, it is real with mask plate contact exposure
Existing air supporting exposure effect, strong adsorption force, eliminates the bad phenomenon of substrate deformation of unevenness, can effectively improve exposure accuracy.
(3) traditional material is mostly metal, and temperature change increases its deflection.Using anodised aluminium hole substrate material,
At an elevated temperature, smooth precision improves, and the graphics resolution after exposure improves.
Brief description of the drawings
Fig. 1 is a kind of structure diagram of nanohole array wafer-supporting platform suitable for flexible substrate of the invention.
Fig. 2 is the cut-away view of the nanohole array wafer-supporting platform of the present invention.
1- chassis in Fig. 1,2- positioning disks, 3- anodised aluminiums hole substrate, 4- substrates, 5- air-flows disk, 6-L types adapter,
7- tracheaes.
Embodiment
Below in conjunction with the accompanying drawings and embodiment further illustrates the present invention.
Embodiment is shown in attached drawing 1, and this nano-array hole wafer-supporting platform includes chassis 1, positioning disk 2, anodised aluminium hole base
Plate 3, substrate 4, air-flow disk 5, L-type adapter 6, tracheae 7.1 bottom of chassis is contacted with air-flow disk 5, and air-flow disk 5 is by gas by air-flow
Road guides the diversion trench designed to 3 bottom surface of anode alumina pore substrate, anodised aluminium hole substrate bottom surface 3, can be by entrance
The uniform branch of gas is to whole plane so that whole substrate uniform force, reduce stress, and positioning disk 2 is pacified with screw connecting mode
On chassis 1, air-flow disk 5 is installed in 1 plane of chassis, and anodised aluminium hole substrate 3 is installed in positioning disk 2 and air-flow disk
5 place with one heart, and substrate is embedded in 2 upper surface of positioning disk and is placed with to be connected in 3 upper surface of anodised aluminium hole substrate, L-type adapter 6
In the flow channel collar extension of air-flow disk 5, whole air-channel system is connected with source of the gas by tracheae 7.
Anodised aluminium hole substrate 3 is realized by template combination anode oxidation process.
Tracheae 7 connects external air source, and connection L-type adapter 6 passes through gas by gas connection to the flow channel in air-flow disk 5
5 central switching hole of flow table, gas flows to 3 bottom surface of anodised aluminium hole substrate being completely fixed, by diversion trench, gas is uniform
Branch is in nano-pore, and by nano-array hole, gas only has Y-direction power, 3 Multipoint Uniform of anodised aluminium hole substrate force,
Realize that whole substrate 4 floats after being subject to uniform stressed, extrude mask plate, can be and complete to 4 secondary leveling of substrate by mask plate
Into exposure.
Claims (3)
- A kind of 1. nanohole array wafer-supporting platform suitable for flexible substrate, it is characterised in that：Including chassis (1), positioning disk (2), Anodised aluminium hole substrate (3), substrate (4), air-flow disk (5), L-type adapter (6) and tracheae (7), chassis (1) bottom and air-flow Disk (5) contacts, and air-flow disk (5) is guided gas to anode alumina pore substrate (3) bottom surface, anodised aluminium hole base by flow channel The diversion trench of plate bottom surface (3) design, can be by the uniform branch of the gas of entrance to whole plane so that whole substrate stress is equal Even, reduction stress, positioning disk (2) are installed on chassis (1) with screw connecting mode, and air-flow disk (5) is installed on chassis (1) plane On, anodised aluminium hole substrate (3) is installed in positioning disk (2) is embedded in positioning disk with the concentric placement of air-flow disk (5), substrate (2) upper surface is placed with is connected to the flow channel of air-flow disk (5) in anodised aluminium hole substrate (3) upper surface, L-type adapter (6) Whole air-channel system, is connected by collar extension by tracheae (7) with source of the gas.
- A kind of 2. nanohole array wafer-supporting platform suitable for flexible substrate according to claim 1, it is characterised in that：Use Anodised aluminium hole substrate (3) air pressure of nanohole array is carried as substrate (4), and the magnitude range of nano-pore is 10nm- 200nm, air pressure uniformly exert a force, it is ensured that whole substrate (4) stress is strong without blind spot, uniform force, stress reduction, adsorption capacity.
- A kind of 3. nanohole array wafer-supporting platform suitable for flexible substrate according to claim 1 or 2, it is characterised in that： When being exposed using anodised aluminium hole substrate (3) carrying substrates (4) of the nanohole array mode, by source of the gas air pressure adjustment, So that substrate (4) extrudes mask plate and realizes exposure after by uniform force, air supporting exposure can effectively improve graphics resolution, avoid Imaging distortion deforms.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711316128.9A CN107942621B (en) | 2017-12-12 | 2017-12-12 | Nanopore array wafer bearing platform suitable for flexible substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711316128.9A CN107942621B (en) | 2017-12-12 | 2017-12-12 | Nanopore array wafer bearing platform suitable for flexible substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107942621A true CN107942621A (en) | 2018-04-20 |
| CN107942621B CN107942621B (en) | 2020-04-10 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711316128.9A Active CN107942621B (en) | 2017-12-12 | 2017-12-12 | Nanopore array wafer bearing platform suitable for flexible substrate |
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| Country | Link |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111759290A (en) * | 2019-04-02 | 2020-10-13 | 清华大学 | Flexible physiological signal detection device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201188417Y (en) * | 2008-03-04 | 2009-01-28 | 深圳深爱半导体有限公司 | Slice-bearing platform for chips |
| KR20100026101A (en) * | 2008-08-29 | 2010-03-10 | 중앙대학교 산학협력단 | Stamp for superhydrophobic micro/nano hybrid surface based on anodic aluminum oxide, method of manufacturing the same, and product manufactured with the same |
| CN101794076A (en) * | 2009-02-03 | 2010-08-04 | 王氏港建经销有限公司 | Automatic substrate transport system and method |
-
2017
- 2017-12-12 CN CN201711316128.9A patent/CN107942621B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201188417Y (en) * | 2008-03-04 | 2009-01-28 | 深圳深爱半导体有限公司 | Slice-bearing platform for chips |
| KR20100026101A (en) * | 2008-08-29 | 2010-03-10 | 중앙대학교 산학협력단 | Stamp for superhydrophobic micro/nano hybrid surface based on anodic aluminum oxide, method of manufacturing the same, and product manufactured with the same |
| CN101794076A (en) * | 2009-02-03 | 2010-08-04 | 王氏港建经销有限公司 | Automatic substrate transport system and method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111759290A (en) * | 2019-04-02 | 2020-10-13 | 清华大学 | Flexible physiological signal detection device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107942621B (en) | 2020-04-10 |
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