CN203932033U - A kind of micro device of aiming at for precision mask plate - Google Patents

A kind of micro device of aiming at for precision mask plate Download PDF

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Publication number
CN203932033U
CN203932033U CN201420371749.2U CN201420371749U CN203932033U CN 203932033 U CN203932033 U CN 203932033U CN 201420371749 U CN201420371749 U CN 201420371749U CN 203932033 U CN203932033 U CN 203932033U
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China
Prior art keywords
slide rail
chassis
slide block
height adjustment
aiming
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Active
Application number
CN201420371749.2U
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Chinese (zh)
Inventor
包文中
胡荣民
陈慧芬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hangzhou ruilaibo Technology Co., Ltd
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Nantong Wei Bei Quantum Science And Technology Co Ltd
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Abstract

The utility model provides a kind of micro device of aiming at for precision mask plate, comprise chassis, it is characterized in that: also comprise a foursquare workbench independently, four sides of described workbench are equipped with slide rail one, on described each slide rail one, be occluding with slide block one, the bottom of each slide block one is enclosed within on slide rail two, described slide rail two is fixed with chassis, the top of described workbench is connected with manual rotation platform, the surrounding of described rotation platform is also provided with the height adjustment mechanism of a vertical direction, and described height adjustment mechanism is fixed on chassis.Compared with prior art, its remarkable advantage is the utility model: volume is small and exquisite, thickness particularly, and registration, simple to operate, simple in structure, realize with low costly, be conducive to production installation and maintenance.

Description

A kind of micro device of aiming at for precision mask plate
Technical field
The utility model has related to a kind of micro device of aiming at for precision mask plate, belongs to field of semiconductor processing.
Background technology
The current comparatively electrode evaporation of complicated electronic device (comprising computer CPU, electrical equipment chip), etching, the procedure of processings such as Implantation are all made by photoetching process conventionally, but photoetching process is expensive, step is various, and template construct is also very complicated.Normally large-scale company adopts when large-scale production.And metal (or other easy accurate etching material) via mask plate evaporation coating technique step is few, cost is low, and flexible design is another method that R&D institution and small and medium size companies generally adopt.The metal throuth hole mask of at present common employing wet etching can reach the live width of 20 microns, and adopts the high-end via mask version of dry etching even can reach the precision of sub-micron.Country's support to integrated circuit (IC) chip independent research in recent years, also caused the wilderness demand of high accuracy through hole mask plate, but high accuracy is covered the aligning between through-hole template and sample, goes back at present the perfect solution of neither one.
In the situation that via mask plate and sample do not need to aim at, conventionally adopt directly fixing (adhesive tape, fixture) mode, and need and sample existing graphics aims in the situation that, conventionally first use mask aligner precise mobile platform to aim at later the fixing mode of fixture again at via mask plate.But this mode exists various shortcoming, for example due to the existence of mechanical stress after fixing, along with the increase of time, both easily depart from original aligned position, so be not suitable for high-precision aligning.Mask aligner is expensive in addition, if very uneconomical in order to aim at for mask plate merely, and complex structure own, be unfavorable for repair and maintenance.These have all caused the limitation of high accuracy via mask plate extensive use.
And in carrying out semiconductor fabrication processes, as will be directly put into evaporation chamber by aiming at pedestal integral body, its volume must dwindle; As aimed at ordinary optical microscope, the adjustable distance between sample stage and microscope ocular is limited, so, in limited like this three dimensions, need to complete X, Y, Z and the rotation adjusting of totally four degrees of freedom, be very difficult.
Common precise mobile platform, as shown in Figure 1, the adjusting plane of x direction and y direction is independently, so the thickness after stack is conventionally all more than 5 centimetres.If simply by this kind of scaled size of mobile platform, such scheme can cause the increase of part difficulty of processing, has caused manufacturing cost significantly to increase in order to control thickness, and the precision of aiming at also can decline.
Utility model content
In order to solve the deficiency of existing equipment technology, the utility model provides a kind of micro device of aiming at for precision mask plate, comprise chassis, it is characterized in that: also comprise a foursquare workbench independently, four sides of described workbench are equipped with slide rail one, on described each slide rail one, be occluding with slide block one, the bottom of each slide block one is enclosed within on slide rail two, described slide rail two is fixed with chassis, the top of described workbench is connected with manual rotation platform, the surrounding of described rotation platform is also provided with the height adjustment mechanism of a vertical direction, described height adjustment mechanism is fixed on chassis.
Outside at any two adjacent slide rails two is respectively provided with an adjusting knob.
Described height adjustment mechanism comprises slide rail three and slide block two, described slide rail three is fixed with chassis, described slide block two is enclosed within on slide rail three, the top of described slide block two is provided with height adjustment knob, the inner side of described slide block two is fixed with pressing plate, and the other end of described pressing plate is just in time positioned at the top of described rotation platform.
Compared with prior art, its remarkable advantage is the utility model: volume is small and exquisite, thickness particularly, and registration, simple to operate, simple in structure, realize with low costly, be conducive to production installation and maintenance.
Accompanying drawing explanation
Fig. 1 is the structural representation of the prior art relevant to the utility model;
Fig. 2 is structural scheme of mechanism of the present utility model;
Accompanying drawing explanation: 1, chassis, 2, workbench, 3, slide rail one, 4, slide block one, 5, slide rail two, 6, adjusting knob, 7, manual rotation platform, 8, slide rail three, 9, slide block two, 10, height adjustment knob, 11, pressing plate.
Embodiment
Below to describe the technical solution of the utility model in detail by accompanying drawing.
As shown in Figure 2, the utility model provides a kind of micro device of aiming at for precision mask plate, comprise chassis 1, also comprise a foursquare workbench 2 independently, four sides of described workbench 2 are equipped with slide rail 1, on described each slide rail 1, be occluding with slide block 1, can make like this movement of workbench 2 in its directions X and Y-direction not interfere with each other: the bottom of each slide block 1 is enclosed within on slide rail 25, in the outside of any two adjacent slide rails 25, be respectively provided with an adjusting knob 6, the movement of slide block under can regulating separately in same plane, in the outside of the directions X of workbench 2 and any slide rail 25 in Y-direction, respectively establish an adjusting knob 6, two slide blocks 1 in such direction (X or Y) can slide by being controlled on slide rail 25 of adjusting knob 6, workbench 2 in the middle of driving during slip moves in identical direction together, it is motionless that two slide blocks 1 of another one direction keep.Described slide rail 25 is fixing with chassis 1, and the top of described workbench 2 is connected with manual rotation platform 7 by spring, and the surrounding of described rotation platform 7 is also provided with a height adjustment mechanism, and described height adjustment mechanism is fixed on chassis 1.Described height adjustment mechanism comprises slide rail 38 and slide block 29, described slide rail 38 is fixing with chassis 1, described slide block 29 is enclosed within on slide rail 38, the top of described slide block 29 is provided with height adjustment knob 10, the inner side of described slide block 29 is fixed with pressing plate 11, the other end of described pressing plate 11 is just in time positioned at the top of described rotation platform 7, and this pressing plate 11 is for permanent mask plate.
Below schematically the utility model and execution mode thereof are described, this description does not have restricted, and shown in accompanying drawing is also one of execution mode of the present utility model, and actual structure is not limited to this.So, if those of ordinary skill in the art is enlightened by it, in the situation that not departing from the utility model creation aim, without the creationary frame mode similar to this technical scheme and the embodiment of designing, all should belong to protection range of the present utility model.

Claims (3)

1. a micro device of aiming at for precision mask plate, comprise chassis, it is characterized in that: also comprise a foursquare workbench independently, four sides of described workbench are equipped with slide rail one, on described each slide rail one, be occluding with slide block one, the bottom of each slide block one is enclosed within on slide rail two, described slide rail two is fixed with chassis, the top of described workbench is connected with manual rotation platform, the surrounding of described rotation platform is also provided with the height adjustment mechanism of a vertical direction, and described height adjustment mechanism is fixed on chassis.
2. a kind of micro device of aiming at for precision mask plate according to claim 1, is characterized in that: the outside at any two adjacent slide rails two is respectively provided with an adjusting knob.
3. a kind of micro device of aiming at for precision mask plate according to claim 1, it is characterized in that: described height adjustment mechanism comprises slide rail three and slide block two, described slide rail three is fixed with chassis, described slide block two is enclosed within on slide rail three, the top of described slide block two is provided with height adjustment knob, the inner side of described slide block two is fixed with pressing plate, and the other end of described pressing plate is just in time positioned at the top of described rotation platform.
CN201420371749.2U 2014-07-07 2014-07-07 A kind of micro device of aiming at for precision mask plate Active CN203932033U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201420371749.2U CN203932033U (en) 2014-07-07 2014-07-07 A kind of micro device of aiming at for precision mask plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201420371749.2U CN203932033U (en) 2014-07-07 2014-07-07 A kind of micro device of aiming at for precision mask plate

Publications (1)

Publication Number Publication Date
CN203932033U true CN203932033U (en) 2014-11-05

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201420371749.2U Active CN203932033U (en) 2014-07-07 2014-07-07 A kind of micro device of aiming at for precision mask plate

Country Status (1)

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CN (1) CN203932033U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109065493A (en) * 2018-09-10 2018-12-21 复旦大学 A kind of device for assisting hard vias masks version and sample to be precisely aligned
CN109188858A (en) * 2018-09-10 2019-01-11 复旦大学 A kind of high-accuracy silicon substrate vias masks version fission graphic structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109065493A (en) * 2018-09-10 2018-12-21 复旦大学 A kind of device for assisting hard vias masks version and sample to be precisely aligned
CN109188858A (en) * 2018-09-10 2019-01-11 复旦大学 A kind of high-accuracy silicon substrate vias masks version fission graphic structure
CN109065493B (en) * 2018-09-10 2023-09-05 复旦大学 Device for assisting hard through hole mask plate and sample to accurately align

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C14 Grant of patent or utility model
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TR01 Transfer of patent right

Effective date of registration: 20190710

Address after: 310000 Room 101, Block A, No. 60, Jianghong South Road, Changhe Street, Binjiang District, Hangzhou City, Zhejiang Province

Patentee after: Hangzhou Vacuum Technology Co., Ltd.

Address before: 226300 Xishou Yinhe Bridge, Jinsha Town, Tongzhou District, Nantong City, Jiangsu Province

Patentee before: Nantong Wei Bei Quantum Science and Technology Co., Ltd

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20200226

Address after: 310000 room 103, block a, building 2, No. 60, Jianghong South Road, Changhe street, Binjiang District, Hangzhou City, Zhejiang Province

Patentee after: Hangzhou ruilaibo Technology Co., Ltd

Address before: 310000 Room 101, Block A, No. 60, Jianghong South Road, Changhe Street, Binjiang District, Hangzhou City, Zhejiang Province

Patentee before: Hangzhou Vacuum Technology Co., Ltd.

TR01 Transfer of patent right