CN104064505A - Mini-type device for precise mask plate alignment - Google Patents
Mini-type device for precise mask plate alignment Download PDFInfo
- Publication number
- CN104064505A CN104064505A CN201410319889.XA CN201410319889A CN104064505A CN 104064505 A CN104064505 A CN 104064505A CN 201410319889 A CN201410319889 A CN 201410319889A CN 104064505 A CN104064505 A CN 104064505A
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- China
- Prior art keywords
- chassis
- slide rail
- mini
- workbench
- mask plate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a mini-type device for precise mask plate alignment. The mini-type device comprises a chassis. The mini-type device is characterized by further comprising an independent square workbench, the four side edges of the workbench are provided with first sliding rails, each first sliding rail is provided with a first sliding block in a meshed mode, the lower portion of each first sliding block is arranged on a second sliding rail in a sleeved mode, the second sliding rail and the chassis are fixed, a hand-operated rotation platform is connected to the upper portion of the workbench, and a vertical height adjusting mechanism is arranged around the rotation platform and fixed on the chassis. Compared with the prior art, the mini-type device has the advantages of being small in size especially in thickness, accurate in positioning, easy to operate, simple in structure, low in achieving cost and beneficial to production, installation and maintenance.
Description
Technical field
The present invention relates to a kind of micro device of aiming at for precision mask plate, belonged to field of semiconductor processing.
Background technology
The current comparatively electrode evaporation of complicated electronic device (comprising computer CPU, electrical equipment chip), etching, the procedure of processings such as Implantation are all made by photoetching process conventionally, but photoetching process is expensive, step is various, and template construct is also very complicated.Normally large-scale company adopts when large-scale production.And metal (or other easy accurate etching material) via mask plate evaporation coating technique step is few, cost is low, and flexible design is another method that R&D institution and small and medium size companies generally adopt.The metal throuth hole mask of at present common employing wet etching can reach the live width of 20 microns, and adopts the high-end via mask version of dry etching even can reach the precision of sub-micron.Country's support to integrated circuit (IC) chip independent research in recent years, also caused the wilderness demand of high accuracy through hole mask plate, but high accuracy is covered the aligning between through-hole template and sample, goes back at present the perfect solution of neither one.
In the situation that via mask plate and sample do not need to aim at, conventionally adopt directly fixing (adhesive tape, fixture) mode, and need and sample existing graphics aims in the situation that, conventionally first use mask aligner precise mobile platform to aim at later the fixing mode of fixture again at via mask plate.But this mode exists various shortcoming, for example due to the existence of mechanical stress after fixing, along with the increase of time, both easily depart from original aligned position, so be not suitable for high-precision aligning.Mask aligner is expensive in addition, if very uneconomical in order to aim at for mask plate merely, and complex structure own, be unfavorable for repair and maintenance.These have all caused the limitation of high accuracy via mask plate extensive use.
And in carrying out semiconductor fabrication processes, as will be directly put into evaporation chamber by aiming at pedestal integral body, its volume must dwindle; As aimed at ordinary optical microscope, the adjustable distance between sample stage and microscope ocular is limited, so, in limited like this three dimensions, need to complete X, Y, Z and the rotation adjusting of totally four degrees of freedom, be very difficult.
Common precise mobile platform, as shown in Figure 1, the adjusting plane of x direction and y direction is independently, so the thickness after stack is conventionally all more than 5 centimetres.If simply by this kind of scaled size of mobile platform, such scheme can cause the increase of part difficulty of processing, has caused manufacturing cost significantly to increase in order to control thickness, and the precision of aiming at also can decline.
Summary of the invention
In order to solve the deficiency of existing equipment technology, the invention provides a kind of micro device of aiming at for precision mask plate, comprise chassis, it is characterized in that: also comprise a foursquare workbench independently, four sides of described workbench are equipped with slide rail one, on described each slide rail one, be occluding with slide block one, the bottom of each slide block one is enclosed within on slide rail two, described slide rail two is fixed with chassis, the top of described workbench is connected with manual rotation platform, the surrounding of described rotation platform is also provided with the height adjustment mechanism of a vertical direction, described height adjustment mechanism is fixed on chassis.
Outside at any two adjacent slide rails two is respectively provided with an adjusting knob.
Described height adjustment mechanism comprises slide rail three and slide block two, described slide rail three is fixed with chassis, described slide block two is enclosed within on slide rail three, the top of described slide block two is provided with height adjustment knob, the inner side of described slide block two is fixed with pressing plate, and the other end of described pressing plate is just in time positioned at the top of described rotation platform.
Compared with prior art, its remarkable advantage is: volume is small and exquisite in the present invention, thickness particularly, and registration, simple to operate, simple in structure, realize with low costly, be conducive to production installation and maintenance.
Accompanying drawing explanation
Fig. 1 is the structural representation of prior art related to the present invention;
Fig. 2 is structural scheme of mechanism of the present invention;
Accompanying drawing explanation: 1, chassis, 2, workbench, 3, slide rail one, 4, slide block one, 5, slide rail two, 6, adjusting knob, 7, manual rotation platform, 8, slide rail three, 9, slide block two, 10, height adjustment knob, 11, pressing plate.
Embodiment
Below to describe technical scheme of the present invention in detail by accompanying drawing.
As shown in Figure 2, the invention provides a kind of micro device of aiming at for precision mask plate, comprise chassis 1, also comprise a foursquare workbench 2 independently, four sides of described workbench 2 are equipped with slide rail 1, on described each slide rail 1, be occluding with slide block 1, can make like this movement of workbench 2 in its directions X and Y-direction not interfere with each other: the bottom of each slide block 1 is enclosed within on slide rail 25, in the outside of any two adjacent slide rails 25, be respectively provided with an adjusting knob 6, the movement of slide block under can regulating separately in same plane, in the outside of the directions X of workbench 2 and any slide rail 25 in Y-direction, respectively establish an adjusting knob 6, two slide blocks 1 in such direction (X or Y) can slide by being controlled on slide rail 25 of adjusting knob 6, workbench 2 in the middle of driving during slip moves in identical direction together, it is motionless that two slide blocks 1 of another one direction keep.Described slide rail 25 is fixing with chassis 1, and the top of described workbench 2 is connected with manual rotation platform 7 by spring, and the surrounding of described rotation platform 7 is also provided with a height adjustment mechanism, and described height adjustment mechanism is fixed on chassis 1.Described height adjustment mechanism comprises slide rail 38 and slide block 29, described slide rail 38 is fixing with chassis 1, described slide block 29 is enclosed within on slide rail 38, the top of described slide block 29 is provided with height adjustment knob 10, the inner side of described slide block 29 is fixed with pressing plate 11, the other end of described pressing plate 11 is just in time positioned at the top of described rotation platform 7, and this pressing plate 11 is for permanent mask plate.
Below schematically the present invention and execution mode thereof are described, this description does not have restricted, and shown in accompanying drawing is also one of embodiments of the present invention, and actual structure is not limited to this.So, if those of ordinary skill in the art is enlightened by it, in the situation that not departing from the invention aim, without the creationary frame mode similar to this technical scheme and the embodiment of designing, all should belong to protection scope of the present invention.
Claims (3)
1. a micro device of aiming at for precision mask plate, comprise chassis, it is characterized in that: also comprise a foursquare workbench independently, four sides of described workbench are equipped with slide rail one, on described each slide rail one, be occluding with slide block one, the bottom of each slide block one is enclosed within on slide rail two, described slide rail two is fixed with chassis, the top of described workbench is connected with manual rotation platform, the surrounding of described rotation platform is also provided with the height adjustment mechanism of a vertical direction, and described height adjustment mechanism is fixed on chassis.
2. a kind of micro device of aiming at for precision mask plate according to claim 1, is characterized in that: the outside at any two adjacent slide rails two is respectively provided with an adjusting knob.
3. a kind of micro device of aiming at for precision mask plate according to claim 1, it is characterized in that: described height adjustment mechanism comprises slide rail three and slide block two, described slide rail three is fixed with chassis, described slide block two is enclosed within on slide rail three, the top of described slide block two is provided with height adjustment knob, the inner side of described slide block two is fixed with pressing plate, and the other end of described pressing plate is just in time positioned at the top of described rotation platform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410319889.XA CN104064505A (en) | 2014-07-07 | 2014-07-07 | Mini-type device for precise mask plate alignment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410319889.XA CN104064505A (en) | 2014-07-07 | 2014-07-07 | Mini-type device for precise mask plate alignment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104064505A true CN104064505A (en) | 2014-09-24 |
Family
ID=51552158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410319889.XA Pending CN104064505A (en) | 2014-07-07 | 2014-07-07 | Mini-type device for precise mask plate alignment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104064505A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112410741A (en) * | 2019-08-23 | 2021-02-26 | 哈尔滨理工大学 | Mask clamp based on hard alloy blade coating |
-
2014
- 2014-07-07 CN CN201410319889.XA patent/CN104064505A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112410741A (en) * | 2019-08-23 | 2021-02-26 | 哈尔滨理工大学 | Mask clamp based on hard alloy blade coating |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140924 |
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| WD01 | Invention patent application deemed withdrawn after publication |