CN107942621B - Nanopore array wafer bearing platform suitable for flexible substrate - Google Patents
Nanopore array wafer bearing platform suitable for flexible substrate Download PDFInfo
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- CN107942621B CN107942621B CN201711316128.9A CN201711316128A CN107942621B CN 107942621 B CN107942621 B CN 107942621B CN 201711316128 A CN201711316128 A CN 201711316128A CN 107942621 B CN107942621 B CN 107942621B
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- substrate
- airflow
- air
- anodic alumina
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- 239000000758 substrate Substances 0.000 title claims abstract description 84
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000011148 porous material Substances 0.000 claims abstract description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 238000001179 sorption measurement Methods 0.000 claims description 5
- 238000005188 flotation Methods 0.000 claims description 3
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 4
- 230000003287 optical effect Effects 0.000 description 5
- 210000003437 trachea Anatomy 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 210000004872 soft tissue Anatomy 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a nanopore array wafer bearing platform suitable for a flexible substrate, wherein the core part of the wafer bearing platform is an anodic alumina pore base plate, nanoscale pores are uniformly distributed on the surface of the anodic alumina pore base plate and communicated with an airflow plate, after the airflow plate is communicated with an air source, the airflow of the whole anodic alumina pore base plate is uniform, and in the process of attaching exposure and a mask plate, the air pressure of the air source is increased, so that a substrate is separated from the anodic alumina pore base plate to extrude the mask plate, the air floatation exposure is realized, and the exposure precision can be effectively improved. In the exposure process, the temperature of the working area rises, the leveling precision of the wafer bearing table rises within a certain range of the temperature rise, the phenomena of substrate distortion, figure distortion and the like are avoided, and the problems of uneven stress and large internal stress of the substrate are also avoided.
Description
Technical Field
The invention relates to the technical field of wafer bearing tables, in particular to a nanopore array wafer bearing table suitable for a flexible substrate, and particularly relates to a wafer bearing table for exposure of an air-floatation substrate.
Background
Compared with the traditional electronic and optical devices, the flexible electronic and optical devices have the characteristics of being lighter and thinner, lower in power consumption, better in portability, bendable, good in fit with soft tissues and the like, so that the flexible electronic and optical devices become a research hotspot of a new generation of electronic and optical devices. Therefore, the processing and detection of the micro-nano structure on the surface of the flexible substrate are the key points for the rapid development of flexible electronic and optical devices. However, in the conventional semiconductor device, the wafer bearing table mostly adopts an aluminum or steel annular adsorption groove and hole structure, and is limited by machining precision, and the size of the groove and the hole is difficult to be less than 1mm, so that local deformation occurs when the flexible substrate is adsorbed, and the machining or detection precision of the structure on the surface of the flexible substrate is affected.
Disclosure of Invention
The invention aims to provide a vacuum adsorption wafer bearing table of a nanopore array, which mainly solves the defect that the traditional wafer bearing table is only suitable for a hard substrate and is not suitable for a flexible substrate.
In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides a nanopore array wafer bearing platform suitable for flexible substrate, which comprises a base plate, the positioning disk, anodal alumina hole base plate, the substrate, the air current dish, L type adapter and trachea, the chassis bottom contacts with the air current dish, the air current dish guides gas to anodal alumina hole base plate bottom surface by the air current runner, the guiding gutter of anodal alumina hole base plate bottom surface design, can distribute the gas that gets into to whole plane evenly, make whole substrate atress even, reduce stress, the positioning disk is installed on the chassis with the screw connection mode, the air current dish is installed on the chassis plane, anodal alumina hole base plate is installed and is placed with the air current dish is concentric in the positioning disk, the substrate is inlayed and is put at anodal alumina hole base plate upper surface at the positioning disk upper surface subsides, L type adapter is connected outside the air current runner of air current dish, be connected whole gas circuit system and air supply by the trachea.
The pressure of the anodic alumina pore substrate of the nanopore array is used as substrate bearing, the size range of the nanopore is 10nm-200nm, the pressure is uniformly applied, and the whole substrate is ensured to be stressed without blind spots, to be stressed uniformly, to be stressed in a reduced manner and to have strong adsorption capacity.
When the anodic alumina pore substrate adopting the nanopore array mode is used for bearing a substrate for exposure, the substrate is pressed by the mask plate to realize exposure after being subjected to uniform force through air pressure adjustment of an air source, the pattern resolution can be effectively improved through air flotation exposure, and pattern distortion is avoided.
The principle of the invention is as follows:
the bottom of the chassis is in contact with the airflow plate, the airflow plate guides gas to the bottom surface of the anodic alumina hole substrate through the airflow channel, and the diversion trench designed on the bottom surface of the anodic alumina hole substrate can evenly distribute the entering gas to the whole plane, so that the whole substrate is evenly stressed. The positioning disk is installed on the chassis in a screw connection mode, the airflow disk is installed on the plane of the chassis, the anodic alumina hole substrate is installed in the positioning disk and concentrically placed with the airflow disk, a small gap exists between the anodic alumina hole substrate and the contact surface of the airflow disk, so that air pressure can be effectively dispersed into each nanometer hole, and the substrate is embedded on the upper surface of the positioning disk and attached to the upper surface of the anodic alumina hole substrate. The substrate can have a small Y-shaped displacement space, the L-shaped adapter is connected to the outer opening of the airflow channel of the airflow plate, and the whole air path system is connected with an air source through an air pipe. When exposure is prepared, the mask frame descends to realize the extrusion of the substrate and the mask plate, the device can enable the substrate to be separated from the anodized aluminum hole substrate after being subjected to certain air pressure, the mask plate is extruded, the extrusion degree can be controlled through the adjustment of the air pressure, the optimal exposure condition is adjusted, meanwhile, the substrate can be completely attached to the mask plate, and the purpose that the substrate is stressed without blind spots is achieved.
Compared with the prior art, the invention has the following characteristics and beneficial effects:
(1) the invention relates to a nano-pore array bearing table suitable for a flexible substrate, which can ensure that the substrate is stressed uniformly and has no blind spot by depending on the air flotation of porous structure ceramic which is uniformly distributed.
(2) In a certain range of air pressure increase, the substrate can be directly separated from the wafer bearing table and is in contact with the mask plate for exposure, the air floatation exposure effect is realized, the adsorption force is strong, the bad phenomenon of concave-convex deformation of the substrate is eliminated, and the exposure precision can be effectively improved.
(3) Most of the traditional materials are metal, and the deformation amount is increased by the temperature change. By adopting the anodic alumina pore substrate material, under the condition of temperature rise, the leveling precision is improved, and the resolution of the exposed pattern is improved.
Drawings
FIG. 1 is a schematic structural diagram of a nanopore array substrate stage suitable for a flexible substrate according to the present invention.
FIG. 2 is a schematic diagram of the interior of a nanopore array substrate stage of the present invention.
In figure 1, 1-chassis, 2-positioning plate, 3-anodic alumina pore base plate, 4-substrate, 5-airflow plate, 6-L type adapter and 7-air pipe.
Detailed Description
The invention is further described with reference to the following figures and detailed description.
The embodiment is shown in figure 1, and the nano-array hole bearing platform comprises a base plate 1, a positioning plate 2, an anodic alumina hole substrate 3, a substrate 4, an airflow plate 5, an L-shaped adapter 6 and an air pipe 7. 1 bottom on chassis and the contact of air current dish 5, air current dish 5 guides gas to 3 bottom surfaces of anodic alumina pore base plate by the air current runner, the guiding gutter of 3 designs on anodic alumina pore base plate bottom surfaces, can be with the even subdivision of the gas that gets into to whole plane, make whole substrate atress even, reduce stress, positioning disk 2 is installed on chassis 1 with the screw connection mode, air current dish 5 is installed on 1 plane on chassis, anodic alumina pore base plate 3 is installed and is placed with air current dish 5 concentricity in positioning disk 2, the substrate is inlayed and is put at 3 upper surfaces of anodic alumina pore base plate at the 2 upper surface subsides of positioning disk, L type adapter 6 is connected at the air current runner outer mouthful of air current dish 5, be connected whole gas circuit system and air supply by trachea 7.
The anodized aluminum porous substrate 3 is realized by combining a template method with an anodizing process.
The air pipe 7 is connected with an external air source, the L-shaped adapter 6 is connected to communicate air into an air flow channel in the air flow disc 5, the air flows to the bottom surface of the completely fixed anode alumina hole substrate 3 through the center switching hole of the air flow disc 5, the air is uniformly distributed into the nanometer holes through the diversion trenches, Y-direction force is only stored in the air through the nanometer array holes, 3 multiple points of the anode alumina hole substrate are uniformly applied with force, the whole substrate 4 floats upwards after being uniformly stressed, the mask plate is squeezed, the substrate 4 can be leveled for the second time through the mask plate, and exposure is completed.
Claims (1)
1. A nanopore array substrate stage suitable for a flexible substrate, characterized in that: the device comprises a chassis (1), a positioning disc (2), an anodic alumina hole substrate (3), a substrate (4), an airflow disc (5), an L-shaped adapter (6) and an air pipe (7), wherein the bottom of the airflow disc (5) is in contact with the chassis (1), the airflow disc (5) guides air to the bottom surface of the anodic alumina hole substrate (3) through an airflow channel, a diversion trench designed on the anodic alumina hole substrate (3) can evenly distribute the entered air to the whole plane, so that the whole substrate is evenly stressed and reduces stress, the positioning disc (2) is arranged on the chassis (1) in a screw connection mode, the airflow disc (5) is arranged on the plane of the chassis (1), the anodic alumina hole substrate (3) is arranged in the positioning disc (2) and is concentrically arranged with the airflow disc (5), the substrate is embedded on the upper surface of the positioning disc (2) and is attached to the upper surface of the anodic alumina hole substrate (3), the L-shaped adapter (6) is connected to the outer opening of the airflow channel of the airflow disc (5), and the whole air path system is connected with an air source through an air pipe (7);
the air pressure of an anodic alumina pore substrate (3) of a nanopore array is used as a substrate (4) for bearing, the size range of the nanopore is 10nm-200nm, and the air pressure applies force uniformly, so that the whole substrate (4) is ensured to be stressed without blind spots, stressed uniformly, reduced in stress and strong in adsorption capacity;
when the anodic alumina pore substrate (3) of the nanopore array is used for bearing the substrate (4) for exposure, the substrate (4) is pressed by a mask plate to realize exposure after being uniformly stressed through air pressure regulation of an air source, and the pattern resolution can be effectively improved through air flotation exposure, so that the pattern distortion is avoided;
the bottom of the airflow disk is in contact with the chassis, the airflow disk guides the gas to the bottom surface of the anodic alumina pore substrate through the airflow channel, and the flow guide groove designed on the bottom surface of the anodic alumina pore substrate can uniformly distribute the entered gas to the whole plane, so that the whole substrate is uniformly stressed; the positioning plate is installed on the chassis in a screw connection mode, the airflow plate is installed on the plane of the chassis, the anodized aluminum hole substrate is installed in the positioning plate and is concentrically placed with the airflow plate, a small gap exists between the contact surface of the anodized aluminum hole substrate and the airflow plate, so that air pressure can be effectively dispersed into each nanometer hole, and the substrate is embedded on the upper surface of the positioning plate and attached to the upper surface of the anodized aluminum hole substrate; the substrate can have a small Y-shaped displacement space, the L-shaped adapter is connected to the outer opening of the airflow channel of the airflow plate, and the whole air path system is connected with an air source through an air pipe; when exposure is prepared, the mask frame descends to squeeze the substrate and the mask plate, the nanopore array substrate bearing table suitable for the flexible substrate can enable the substrate to be separated from the anodized aluminum porous substrate after being subjected to certain air pressure, the mask plate is squeezed, the squeezing degree can be controlled through adjustment of the air pressure, and therefore the optimal exposure condition is adjusted to achieve the effect that the substrate is stressed without blind spots.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711316128.9A CN107942621B (en) | 2017-12-12 | 2017-12-12 | Nanopore array wafer bearing platform suitable for flexible substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711316128.9A CN107942621B (en) | 2017-12-12 | 2017-12-12 | Nanopore array wafer bearing platform suitable for flexible substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107942621A CN107942621A (en) | 2018-04-20 |
| CN107942621B true CN107942621B (en) | 2020-04-10 |
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| CN201711316128.9A Active CN107942621B (en) | 2017-12-12 | 2017-12-12 | Nanopore array wafer bearing platform suitable for flexible substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111759290B (en) * | 2019-04-02 | 2022-02-08 | 清华大学 | Flexible physiological signal detection device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN201188417Y (en) * | 2008-03-04 | 2009-01-28 | 深圳深爱半导体有限公司 | Slice-bearing platform for chips |
| KR100987987B1 (en) * | 2008-08-29 | 2010-10-18 | 중앙대학교 산학협력단 | Stamp for superhydrophobic micro/nano hybrid surface based on anodic aluminum oxide, method of manufacturing the same, and product manufactured with the same |
| US20100195083A1 (en) * | 2009-02-03 | 2010-08-05 | Wkk Distribution, Ltd. | Automatic substrate transport system |
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