CN107924134A - Exposure light source modular unit and the exposure device for being provided with the light source module unit - Google Patents
Exposure light source modular unit and the exposure device for being provided with the light source module unit Download PDFInfo
- Publication number
- CN107924134A CN107924134A CN201680047935.2A CN201680047935A CN107924134A CN 107924134 A CN107924134 A CN 107924134A CN 201680047935 A CN201680047935 A CN 201680047935A CN 107924134 A CN107924134 A CN 107924134A
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- Prior art keywords
- light source
- exposure
- unit
- ultraviolet ray
- panel
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Abstract
The present invention provides a kind of intensive exposure light source modular unit and is provided with the exposure device of the light source module unit, exposure light source modular unit is maximized by the combination of module come optical output power, so as to fulfill low-power consumption, especially, realize high efficiency, the Single wavelength of height output, the ultraviolet of short wavelength, therefore improved in the form of the light source that existing exposure device can be economically replaced while may insure exposure performance, exposure performance enables to the miniaturization of exposure figure and resolution ratio to significantly improve, wherein, the combination of module includes：Central light source portion, it includes light source panel and optic panel, light source panel is installed on circuit board by multiple unit ultraviolet ray emitting elements (UV LED) and is formed with the array structure of matrix shape, light emitting side of the optic panel to be configured at the light-emitting component in the form of facing with the light source panel, multiple unit collector lenses are configured to from the array structure with the corresponding position of the light-emitting component relative to key light axially past the matrix shape of the state of arbitrary reference center's axis lateral deviation heart at the center of the ultraviolet ray emitting element array on the light source panel respectively in optic panel；Multiple periphery light source portions, it is with the radial inclined state of key light emission shaft being equably configured to towards the unit ultraviolet ray emitting element in the central light source portion.
Description
Technical field
The present invention relates to a kind of exposure light source, it is in order in the formation fine circuits figure such as semiconductor transistor elements or display panel
Shape and be used in photoetching (Photolithography) technique, be related to a kind of intensive exposure light source module list in more detail
Member and the exposure device for being provided with the light source module unit, the intensive style exposure light source modular unit is in the form of following
Improved：Central light source is formed with multiple ultraviolet ray emitting elements (UV LED) array (array) and condenser lens array
The form in portion and peripheral light source portion integrates, and while so as to efficiently perform the exposure performance of larger area, economically may be used
To replace the light source of existing exposure device.
Background technology
For example, the semiconductor element built-in as the critical piece of electric/electronic device or circuit board (PCB) and class
It is similar to LCD (crystal display, Liquid Crystal Display), Organic Light Emitting Diode (OLED:Organic Light
Emitting Diode), the video display board of PDP (plasma display panel, Plasma Display Panel) manufactured at it
By being referred to as the light micrometer-nanometer processing technology of photoetching (Photolithography) and with formed with micro- in exposure technology in journey
The form of thin circuitous pattern is made.
In general, the exposure light source being used in existing exposure technology mainly uses extra-high-pressure mercury vapour lamp or halogen
Lamp, but truth is, as everyone knows as, existing exposure light source as described above is exposed due to low service life and height
The efficiency of exposure technology caused by inefficient and high cost caused by consumption electric power, moreover, in terms of the environment on
Expose many problems.
Especially, it is being manufactured similarly to the display of liquid crystal display (LCD) or Organic Light Emitting Diode (OLED) etc. recently
Thin film transistor (TFT) (the TFT in field；Thin Film Transistor) or manufacture filter (CF；Color Filter) when, city
Field using the miniaturization technology of exposure figure to realizing that the demand of ultra high-definition is urgent.
But nevertheless, due to using existing exposure light source (Hg Lamp, mercury vapor lamp) exposure figure it is fine
The technology restriction of chemical industry skill, although unfortunately, reality is miniaturization and the display industry that can not be realized as exposure figure
The ultra high-definition of core technology.
Further, since miniaturization and high capacity and highly integrated and densification for nearest semiconductor element
Trend, the requirement of miniaturization and high precision to exposure figure is continuously increased, therefore is had problems in that, is being passed through
There is limitation when existing exposure light source is to realize the requirement to current miniaturization figure.
Thus, recently in active progress such as similar to the new exposure technique immersion exposure or deep uv exposure
Exploitation, especially, ultraviolet ray emitting element (UV LED) used as low consumption electric power and long-life, the selectivity of Single wavelength and
The exposure light source of short wavelength and environmental protection can be used, in being attracted the attention of millions of people as the trend of the substitute of existing exposure light source.
But in such as next stage：By ultraviolet ray emitting element (UV LED) be used as light source exposure device situation,
An urgent demand can be improved by the composition or Illumination Distribution figure and the power of light output of the light path of light loss reduction
And the miniaturization of exposure figure come realize ultra high-definition, exploitation be used to minimizing, high capacity and densification etc. it is efficient
New ultraviolet LED (UV LED) light source, while develop optical component, module, unit etc..
The present invention be it is derived under technical background as described above, the problem of background technology be the applicant in order to
Export is of the invention and has, or as the content for regaining and ensuring during the export of the present invention, therefore never
It can be known as before the application of the present invention to content known to general public.
The content of the invention
The present invention is that the exposure light source (Hg of existing exposure device is considered under background technology as described above
Lamp etc.) possessed by problem and proposed to improve described problem, it is an object of the invention to for providing a kind of exposure
Light light source module unit, it can be by so that multiple ultraviolet ray emitting element arrays and condenser lens array form center
What the form in light source portion and peripheral light source portion integrated is formed to promote the maximization of light output efficiency.
It is another object of the present invention to for providing a kind of exposure light source modular unit, its can by so that
The structure that the form in multiple ultraviolet ray emitting element arrays and condenser lens array formation central light source portions and peripheral light source portion integrates
Into efficiently performing large area exposure.
The present invention again another purpose be used for provide a kind of low consumption electric power type exposure light source modular unit and
The light source module unit is arranged to the exposure device of light source, it is in order to realizing the miniaturization of exposure figure and high-resolution
Rate, can cause exposure performance and exposure efficiency effectively and significantly improve.
The present invention again another purpose be used for provide a kind of low consumption electric power type exposure light source modular unit and
The unit is arranged to the exposure device of light source, exposure light source (the Hg Lamp etc.) improvement of existing exposure device is by it
The replacement interchangeability modular unit that can easily replace, so that not only economic but also practical.
In order to realize the purpose, exposure light source modular unit according to the present invention is characterized in that, including：Surface of light source
Plate, it is arranged to first circuit board and is loaded into a face central portion with state side by side, and multiple unit ultraviolet ray emitting elements are with square
The array structure of formation state is installed on first circuit board, to form central light source portion, and multiple unit luminescence-utraviolets member
Part is installed on the second circuit board of at least more than one with the array structure of matrix shape, so as to form peripheral light source portion, at least
More than one second circuit board is arranged to be loaded in the form of inclined forwards around the first circuit board；Optics
Panel, it is arranged at the first support panel and the second support panel by multiple unit collector lenses and is formed, the first support panel
It is arranged to configure with the state respectively with the first circuit board and second circuit board accordingly side by side with the second support panel
In the light emitting side of the unit ultraviolet ray emitting element, multiple unit collector lenses be arranged as respectively with the unit ultraviolet
The corresponding array structure of array structure of light-emitting component, the unit collector lens are arranged as relative to respectively with corresponding
The key light of the unit ultraviolet ray emitting element of form arrangement is axially past the ultraviolet of the central light source portion for forming the light source panel
The state of arbitrary reference center's axis lateral deviation heart at line light-emitting device array center.
Also, in order to realize the purpose, others exposure light source modular unit is characterized in that according to the present invention,
Including：Case panel, it includes plane central light source portion and multiple peripheral light source portions, and central light source portion is formed as central part
Concave recess formation, multiple periphery light source portions are configured around central light source portion with radial unit inclined plane；Unit light
Source panel and unit optic panel, it is combined into the unit of opposed facing state, and is arranged to be loaded into the shell respectively
The central light source portion of honorable plate and peripheral light source portion, the light source panel is in circuit board with the battle array of the matrix shape in x-y coordinate
Array structure is provided with multiple unit ultraviolet ray emitting elements, and the optic panel is provided with multiple unit collector lenses, Duo Gedan
Position collector lens is arranged as and is installed on the array junctions of each unit ultraviolet ray emitting element of the circuit board of the light source panel
The corresponding array structure of structure, the unit collector lens are arranged as purple relative to the unit arranged respectively in the form of corresponding
The key light of outside line light-emitting component is axially past in the ultraviolet ray emitting element array in the central light source portion for forming the light source panel
The state of any reference center's axis lateral deviation heart of the heart, for the light from the ultraviolet ray emitting element untill the A of light area
Distance " a " is learned, from reference center's axis side of the center O by the ultraviolet ray emitting element array on the light source panel
The facing face of the spacing distance " b " of the ultraviolet ray emitting element being spaced, the ultraviolet ray emitting element and collector lens
Spacing distance " c ", the eccentric distance between the central shaft of each ultraviolet ray emitting element and the central shaft of collector lens
The relation of the diameter of " x " and light area A " t " is set so that the benchmark of the eccentric distance " x " of collector lens meets " x=
B*c/a ", the range set of " x " is satisfaction " bc (2b-t)/2ab<x<bc(2b+t)/2ab”.
In addition, in order to realize the purpose, exposure device according to the present invention, it includes exposure desk, driving device, exposure
With light source module unit, optical system and control device, exposure desk is used to support the substrate for exposure coated with emulsion, driving
Device is used for so that the exposure desk is set on X-Y plane coordinate with moveable state-driven, exposure light source modular unit
The mask being set to the exposure figure for forming the substrate sends illumination light, and optical system is arranged at the substrate and exposure
With between light source module unit, driving of the control device to the driving device and exposure light source modular unit carries out collaboration control
System, the exposure light source modular unit include：Light source panel, it is arranged to first circuit board and is loaded into one with state side by side
Face central portion, multiple unit ultraviolet ray emitting elements are installed on first circuit board with the array structure of matrix shape, to form
Central light source portion, multiple unit ultraviolet ray emitting elements are installed at least more than one second with the array structure of matrix shape
Circuit board, so as to form peripheral light source portion, the second circuit board of at least more than one is set around the first circuit board
To be obliquely loaded forwards；Optic panel, it is arranged at the first support panel and second by multiple unit collector lenses
Support panel and formed, the first support panel and the second support panel be arranged to respectively with the first circuit board and second circuit
The state of plate side by side is configured at the light emitting side of the unit ultraviolet ray emitting element, and multiple unit collector lenses are arranged as distinguishing
With the corresponding array structure of array structure of the unit ultraviolet ray emitting element, the unit collector lens is arranged as relatively
In the unit ultraviolet ray emitting element arranged respectively in the form of corresponding key light axially past being formed the light source panel
The state of any reference center's axis lateral deviation heart at the center of the ultraviolet ray emitting element array in central light source portion, for from described
Optical distance " a " of the ultraviolet ray emitting element untill the A of light area, from by the ultraviolet hair on the light source panel
It is the spacing distance " b " for the ultraviolet ray emitting element that reference center's axis side of the center O of optical component array is spaced, described ultraviolet
Spacing distance " c ", the central shaft of each ultraviolet ray emitting element in the facing face of line light-emitting component and collector lens
The relation of the diameter " t " of eccentric distance " x " and light area A between the central shaft of collector lens is set so that optically focused
The benchmark of the eccentric distance " x " of lens meets " x=b*c/a ", and the range set of " x " is satisfaction " bc (2b-t)/2ab<x<
bc(2b+t)/2ab”。
According to the present invention, the unit collector lens is arranged to from the central light source portion by forming the light source panel
Arbitrary reference center's axis side of ultraviolet ray emitting element array center gradually separates and more causes to be directed to phase closer to edge
The array structure of the increased matrix shape of offset of the primary optical axis of corresponding unit ultraviolet ray emitting element, and cause from each
A unit ultraviolet ray emitting element irradiates the light area that the diffusion light come is gathered in the optical system for being set in exposure device.
A side according to the present invention, what the ultraviolet ray emitting element was installed as selecting from chip or component appoints
The LED light source of one form of meaning or both the form of mixing.
In the present invention, the unit collector lens is formed by biconvex lens, and may be configured with according to array arrangement position
The biconvex lens of curvature surface with mutually different optical texture.
Also, from optical distance " a " of the ultraviolet ray emitting element untill the A of light area and from by positioned at described
The ultraviolet ray emitting element that reference center's axis side of the center O of ultraviolet ray emitting element array on light source panel is spaced
Spacing distance " b " when " b/a " is formed as more than 0.5, the periphery light source portion 110B by be configured to it is radial in the form of tilt
Ground is arranged at around the central light source portion 110A.
On the other hand, from optical distance " a " of the ultraviolet ray emitting element untill the A of light area and from by being located at
The luminescence-utraviolet member that reference center's axis side of the center O of ultraviolet ray emitting element array on the light source panel is spaced
For the spacing distance " b " of part when " b/a " is formed as the scope within 0.1 to 0.5, the periphery light source portion 110B is optionally
It is arranged at around the central light source portion 110A.
Moreover it is preferred that the spacing distance c in the facing face of the ultraviolet ray emitting element and collector lens and described
The diameter d of collector lens meets 1.0c<d<The condition of 2.5c.
Preferably, the light source panel and the optic panel obtain the support of housing, and with dismountable cell-like
State is arranged at exposure device.
Moreover it is preferred that it is additionally provided with heat-releasing device around the light source panel and the optic panel.
Exposure light source modular unit according to the present invention, is integrated in by peripheral light source portion and is sent out by multiple ultraviolets
The combination for the module around central light source portion that optical element (UV LED) array (array) and condenser lens array are formed can
Realization passes through the maximized low consumption electric power of optical output power and height output and high efficiency exposure technology.Thus, can be by effective
The exposure performance and exposure efficiency for improving larger area realize the miniaturization of exposure figure and significant high-resolution.
Also, exposure light source modular unit according to the present invention so that can easily replace the light source of existing exposure device
The blocking instead of interchangeability light source module be possibly realized, so as to provide a kind of not only practical but also economic exposure device.
In addition, with using exposure light source modular unit according to the present invention, use that can be by low consumption electric power, light
Significant maintenance cost is expected in reduction, the lifting of exposure device operating time and solution of environmental problem of source renewal cost etc.
Minimizing effect.
Moreover, especially, as needed can unrestricted choice for exposure light source modular unit according to the present invention
, therefore, also can be according to the exposure performance as high quality using the Single wavelength of high efficiency height output and the ultraviolet of short wavelength
High-resolution is realized in the figure miniaturization of the core technology of realization.
Brief description of the drawings
Fig. 1 and Fig. 2 is outline separation stereogram and the side for representing exposure light source modular unit according to the present invention respectively
Face figure.
Fig. 3 and Fig. 4 is in order to illustrate the flat light source and optically focused of exposure light source modular unit according to the present invention respectively
The eccentric array structure of lens and the ideograph represented.
Fig. 5 is the measurement result of the optically focused amount for the concentration structure for representing exposure light source modular unit according to the present invention
Chart.
Fig. 6 is the central light-emitting component for representing exposure light source modular unit according to the present invention and eccentric luminous member
The chart of the light output change of part.
Fig. 7 is the plane of the embodiment for the deformation for schematically representing exposure light source modular unit according to the present invention
Figure.
Fig. 8 is the stereogram for roughly representing exposure light source modular unit according to another embodiment of the invention.
Fig. 9 is the solid for the exposure light source modular unit for roughly representing still another embodiment according to the present invention
Figure.
Figure 10 is to by exposure light source modular unit according to the present invention and being used as the mercury of existing exposure light source
The mian part for the circuitous pattern that lamp (Hg Lamp) is respectively formed in wafer is shot and to the CD value according to mask linewidths of measure
The result figure that is contrasted and represented.
Figure 11 is to by exposure light source modular unit according to the present invention and being used as the mercury of existing exposure light source
Lamp (Hg Lamp) is respectively formed in the figure that the CD value measurement results of the mask linewidths of the circuitous pattern of wafer are contrasted and represented
Table.
Figure 12 is the mian part and schematically for the exposure device that extraction is applicable in exposure light source modular unit according to the present invention
The schematic configuration diagram shown.
Embodiment
Hereinafter, exposure light source modular unit according to the present invention is described in detail referring to the drawings.It is described below
Content and attached drawing are only to be illustrated based on the preferred embodiment of the present invention, and described in non-limiting claims
The exposure light source modular unit of the present invention.
With reference to Fig. 1 and Fig. 2, exposure light source modular unit 100 according to the present invention includes light source panel 110 and optical surface
Plate 120, light source panel 110 and optic panel 120 are formed list by being combined in the form of the close configuration of state mutually side by side
Bit location.
The light source panel 110 is used as while being used to support circuit board 111,112 and is installed on unshowned exposure device
Light source portion supporting structure, for example, being formed as by mould moldings such as synthetic resin material or metal materials and shape
Into plate panel, wherein, circuit board 111,112 is provided with the unit ultraviolet ray emitting element 101 described below.
As shown in drawings, it is preferable that the light source panel 110 is formed as corner panel, the shape and structure or material etc.
And the non-limiting present invention, the embodiment of applicable various deformation.
The light source panel 110 includes：First circuit board 111, it is arranged to be loaded in one side with state side by side
Center portion；Multiple second circuit boards 112, it is equably configured to radial around first circuit board 111, and upper end is forwards
Protrusion, and set with being inclined upwardly.
Also, in the first circuit board 111 and second circuit board 122 respectively so that multiple unit ultraviolet ray emitting elements
(UV LED) 101 is installed as the array structure of matrix shape.
Thus, multiple unit ultraviolet ray emitting elements 101 that the first circuit board 111 is installed on array structure are formed
While the central light source portion 110A of the light source panel 110, the multiple of the second circuit board 112 are installed on array structure
Unit ultraviolet ray emitting element 101 forms the peripheral light source portion 110B of the light source panel 110.
In other words, single is provided with the form of loading in the central light source portion 110A of the light source panel 110
One circuit board 111, multiple unit ultraviolet ray emitting elements 101 in the form of forming the array of the matrix shape in x-y coordinate to pacify
Loaded on the first circuit board 111.
Also, the light source panel 110 peripheral light source portion 110B with around the shape of the outer part of first circuit board 111
Formula is provided with multiple second circuit boards 112 with impartial spacing, and multiple unit ultraviolet ray emitting elements 101 are to form x-y coordinate
On the form of array of matrix shape be installed on each second circuit board 112.
In addition, in the present invention, although example is rondelle panel to the first circuit board 111 in the accompanying drawings, as above
The shape and structure is represented as one embodiment, and non-limiting exposure light source modular unit 100 according to the present invention.
Thus, as the panel form of corner, the applicable reality for being deformed into various shapes structure of first circuit board 111
Apply example.
And, it is preferable that as shown in the figure, the second circuit board 112 be formed as it is upper it is wide under narrow trapezoidal, but the structure
Into and the non-limiting present invention.
For the second circuit board 112 is formed as trapezoidal composition, in the situation for the circuit board for being formed as quadrangle
Under, between the arrangement for the unit ultraviolet ray emitting element for filling the circuit board adjacent with being installed on more more to split to upper end
Every.Thus, each unit ultraviolet ray emitting element 101 is installed as on the whole with impartial spacing in the second circuit board 112
The array structure of arrangement.
As described above, according to the composition with central light source portion 110A and peripheral light source portion 110B, peripheral light source portion is formed
The second circuit board 112 of 110B is equably configured at around first circuit board 111 with radial, and upper end is protruded simultaneously forwards
Set with being inclined upwardly, therefore be installed on the ultraviolet ray emitting element 101 for the second circuit board 112 for forming peripheral light source portion 110B
It is arranged to be installed on the ultraviolet ray emitting element for the first circuit board 111 for being formed central light source portion 110A with key light emission shaft direction
The inclined state of form of 101 key light emission shaft.
In addition, it is necessary to increase the situation of exposure area, in order to ultraviolet by increasing glass substrate such as large area etc.
The setting quantity of line light-emitting component 101 causes array area increase, necessarily increases the area of light source panel 110.As described above,
So that the increased situation of the area of light source panel 110, the optical axis for being configured at the ultraviolet ray emitting element 101 of periphery expands to the periphery
Dissipate, so as to reduce light gathering efficiency, be dramatically reduced exposure performance accordingly.
Thus, it is configured at the optical axis of the ultraviolet ray emitting element 101 of periphery to effectively control to large area exposure
Spread to the periphery, exposure light source modular unit 100 according to the present invention has relative to first circuit board 111 so that the second electricity
The composition that the upper end of road plate 112 is set with being inclined upwardly in the form of protruding forwards.Thus, even if so that the surface of light source
The array area of plate 110 and ultraviolet ray emitting element 101 increases, and is installed on the ultraviolet ray emitting element 101 of second circuit board 112
Optical axis also configured in the form of the central axis towards central light source portion 110A, accordingly can effectively optically focused.
In addition, the optic panel 120 in the form of being configured at the light emitting side of the ultraviolet ray emitting element 101 with simultaneously
The combinations of states of row is before the light source panel 110, so that one group is formed, and including the first support panel 121 and
Two support panels 122, the first support panel 121 and the second support panel 122 be accordingly arranged to respectively with the surface of light source
The state of the first circuit board 111 and second circuit board 112 of plate 110 side by side.
Also, 121 and second support panel 122 of the first support panel is provided with multiple unit collector lenses 102,
Multiple unit collector lenses 102 are arranged as respectively with being respectively arranged in the more of the first circuit board 111 and second circuit board 112
The corresponding array structure of array structure of a unit ultraviolet ray emitting element 101.
In other words, exposure light source modular unit 100 according to the present invention, described first is arranged in array structure
Support panel 121 unit collector lens 102 formed by with the central light source portion 110A of the light source panel 110 it is corresponding in the form of
The lens group to work, and respectively with array structure be arranged in second support panel 122 collector lens 102 formed with
The lens group to work with the peripheral corresponding forms of light source portion 110B of the light source panel 110.
Also, the unit collector lens 102 has the unit being arranged as relative to being arranged respectively in the form of corresponding
The key light of ultraviolet ray emitting element 101 is sent out axially past the ultraviolet for the central light source portion 110A for forming the light source panel 110
The composition of the state of any reference center's axes O lateral deviation heart at optical component array center.
Fig. 3 and Fig. 4 is in order to illustrate the collector lens 102 of exposure light source modular unit 100 according to the present invention respectively
The ideograph shown relative to the array structure of the key light eccentric shaft of ultraviolet ray emitting element 101.
In Fig. 3 and Fig. 4, " a " is represented from ultraviolet ray emitting element 101 to being set to as optically focused target (target)
Light area A aperture (aperture) untill optical distance.
Also, " b " is represented with from the benchmark of the ultraviolet ray emitting element array center O by the light source panel 110
The spacing distance of the ultraviolet ray emitting element 101 for the form configuration that mandrel line side is spaced.
In addition, " c " represents the spacing distance in the facing face of ultraviolet ray emitting element 101 and collector lens 102, " x "
Represent the eccentric distance between the central shaft of ultraviolet ray emitting element 101 and the central shaft of collector lens 102, " t " represents light
The diameter of region A.
With reference to Fig. 3 and Fig. 4, it is preferable that for from ultraviolet ray emitting element 101 to being set to as optically focused target
(target) optical distance " a " untill the aperture (aperture) of light area A, exposure light source mould according to the present invention
Module unit 100 is configured to define the relation of " b " and " c ", " x " and " t " using following formula.
The benchmark of the eccentric distance " x " of the collector lens 102 is set as satisfaction " x=b*c/a ", the scope of " x "
It is set as meeting " bc (2b-t)/2ab<x<bc(2b+t)/2ab”.
A side according to the present invention, the ultraviolet ray emitting element 101, which can have, is forming the light source panel 110
Central light source portion 110A ultraviolet ray emitting element array center O allocation units ultraviolet ray emitting element 101 or release
The structure of the configuration of unit ultraviolet ray emitting element 101.
In other words, in the ultraviolet ray emitting element array of central light source portion 110A for forming the light source panel 110
Heart O spreads light by collector lens 102 and the light area of aggregation with causing from the irradiation of each unit ultraviolet ray emitting element
The center configuration of (with reference to the drawing reference numeral " A " of Fig. 3 and Fig. 4) becomes on coaxially and determines the inclined of each unit collector lens 102
The benchmark of heart amount (" x " of Fig. 4).
In addition, the light area is arranged to aperture (aperture) form (with reference to the drawing reference numeral " A " of Fig. 3 and Fig. 4),
The optically focused mesh for form the speculum of the optical system by being arranged at unshowned exposure device focusing light being passed through
Mark (target).
Thus, exposure light source modular unit 100 according to the present invention is set as the light source of exposure device, and with
From each unit ultraviolet ray emitting element 101 irradiation diffusion light by collector lens 102 and assemble refraction and by be used as by
The optically focused target (target) in light region and the form transmitting illumination light in aperture (aperture) formed.
In other words, for exposure light source modular unit according to the present invention, on the light source panel 110
The center configuration of the lens array of 101 array center O of ultraviolet ray emitting element and optic panel 120 is on coaxially, from by institute
Any reference center's axis side for stating center O gradually separate and by proximal edge configuration collector lens 102 with relative to its phase
The distance of the axial reference center's axis lateral deviation heart of the key light of corresponding ultraviolet ray emitting element 101 gradually match somebody with somebody by increased form
Put.
For example, exposure light source modular unit 100 is configured to according to the present invention, except being configured at light source panel 110
The unit collector lens of 102 array center of collector lens of 101 array center O of ultraviolet ray emitting element and optic panel 120 it
Outer each unit collector lens 102 is configured in the form of the key light eccentric shaft relative to ultraviolet ray emitting element 101, if than
For analogy, then the effect and function of strabismus (strabismus) lens are performed, so that first from each unit luminescence-utraviolet
The light gathering efficiency for the diffusion light that part 101 irradiates maximizes.
Furthermore it is preferred that just according to having the exposure light source modular unit 100 of the invention that forms as described above and
Speech, in order to enable the light gathering efficiency of the diffusion light irradiated from ultraviolet ray emitting element 101 maximizes, collector lens 102 is by biconvex
Lens forming, it is preferable that be provided with the biconvex lens for the curvature surface that mutually different optical texture is had according to array position.
Fig. 5 is the optically focused amount for the concentration structure that exposure light source modular unit 100 according to the present invention is represented with chart
Measurement result, " c " represents the spacing distance in the facing face of ultraviolet ray emitting element 101 and collector lens 102, " d " table
Show the diameter of collector lens 102.
With reference to Fig. 5, for exposure light source modular unit 100 according to the present invention, for ultraviolet ray emitting element
101 and collector lens 102 facing face spacing distance " c " collector lens 102 diameter " d " ratio (d/c) be 1
During the above, light quantity sharply increases, on the contrary, when the value of d/c is more than 2, keeps certain light quantity.
It is thus preferable that exposure light source modular unit 100 is configured to according to the present invention, ultraviolet ray emitting element 101
Meet 1.0c with the spacing distance c in the facing face of collector lens 102 and the diameter d of the collector lens<d<The bar of 2.5c
Part.
Fig. 6 is the central light-emitting component for representing exposure light source modular unit according to the present invention and eccentric luminous member
The chart of the light output change of part.Here, " a " is represented from the ultraviolet ray emitting element 101 to being set to as optically focused mesh
Optical distance untill the aperture of target light area A, " b " represent with from by the light source panel 110 luminescence-utraviolet
The spacing distance of the ultraviolet ray emitting element 101 for the form configuration that reference center's axis side of the center O of element arrays is spaced.
According to Fig. 6, since " b/a " is more than 0.15, central light-emitting component and eccentric light-emitting component
Light output start produce difference, and since " b/a " be more than 0.5, both light output difference is increasing.
Thus, exposure light source modular unit 100 according to the present invention needs to increase as glass substrate of large area etc.
Add the situation of exposure area, when " b/a " is formed as more than 0.5, as described above, must be requested that relative to central light source portion 110A
The setting for the peripheral light source portion 110B being arranged obliquely.
On the other hand, when " b/a " is formed as the scope below 0.15 to 0.5, optionally set relative to
The peripheral light source portion 110B that the central light source portion 110A is obliquely configured.
In other words, exposure light source modular unit 100 according to the present invention is needed as glass substrate of large area etc.
Increase the situation of exposure area, the setting for the ultraviolet ray emitting element 101 for increasing the central light source portion 110A can be passed through
Quantity and array area increase is tackled.At this time, when from the ultraviolet ray emitting element 101 to being set to as optically focused
Optical distance " a " untill the aperture of the light area A of target and with from the luminescence-utraviolet member by the light source panel 110
The spacing distance " b " of the ultraviolet ray emitting element 101 for the form configuration that reference center's axis side of the center O of part array is spaced
Relation " b/a " when being formed as more than 0.5, as described above, must be requested that be arranged obliquely relative to central light source portion 110A outer
Enclose the setting of light source portion 110B.
In addition, exposure light source modular unit 100 can have the shape to be supported by unshowned housing according to the present invention
Formula installation and the composition of blocking.As described above, in the form of being installed on housing (not shown) blocking exposure light source mould
Module unit 100 can be utilized as the light source of exposure device (not shown) in the form of dismountable, therefore can be very economical
And easily replace being similar to the light source of the existing exposure device of mercury vapor lamp or halogen lamp etc..
On the other hand, exposure light source modular unit 100 according to the present invention is with the light source panel 110 and optical surface
In the state of the form of one group of the formation of plate 120 is combined, the stent or method by being arranged at exposure device may be set to be
The light source that the works such as orchid are supported.
And, it is preferable that exposure light source modular unit 100 according to the present invention is configured to further include heat-releasing device, puts
Thermal is arranged at housing (not shown) in the form of being arranged at around light source panel 110 and optic panel 120.
For example, the heat-releasing device may be provided with radiator, radiator is to be mounted with the light source panel 110 and optical surface
The form of plate 120 is built in housing, for example, it is also possible to be provided with form and cooling device so that cooling water circulation
(chiller) the water-cooled heat-releasing device being connected.
Fig. 7 is the plan of the embodiment for the deformation for schematically representing exposure light source modular unit according to the present invention,
Represent light source panel 110 and the overlapping state of optic panel 120, in the reference numeral of attached drawing with previously shown attached drawing
The identical reference numeral of reference numeral represents identical inscape.
With reference to Fig. 7, exposure light source modular unit 100 of the invention has according to this embodiment is formed as follows：For
The composition of the light source panel 110 of Fig. 1 and Fig. 2, the periphery for forming multiple second circuit boards 112 of peripheral light source portion 110B are also set up
There are multiple tertiary circuit plates 113, multiple tertiary circuit plates 113 are set with being inclined upwardly in the form of upper end is protruded forwards,
While multiple 3rd support panels 123 are also equipped with the periphery of the second support panel 122 of optic panel 120, multiple three
Support panel 123 is set with being inclined upwardly in the form of upper end is protruded forwards.
Thus, it is respectively set to incline relative to the first circuit board 111, second circuit board 112 and tertiary circuit plate 113
The gradual increased state of rake angle, meanwhile, relative to first support panel 121, the second support panel 122 and the 3rd support
Panel 123 is respectively set to angle of inclination gradually increased state.
Also, in 113 and the 3rd support panel 123 of tertiary circuit plate also respectively to form the matrix in x-y coordinate
The form of the array of form is provided with multiple unit ultraviolet ray emitting elements 101 and collector lens 102.
The key light emission shaft for being installed on the unit ultraviolet ray emitting element 101 of the tertiary circuit plate 113 is provided towards
The inclined state of light emitting axis of the ultraviolet ray emitting element 101 of first circuit board 111 is installed on, first circuit board 111 is formed
Central light source portion 110A.
In other words, the ultraviolet ray emitting element 101 for being installed on the tertiary circuit plate 113 is arranged at peripheral light to form
The form in the peripheral light source portion of peripheral second of source portion 110B is added.
For example, according to the present invention exposure light source modular unit 100 be additionally provided with to increase exposure area it is multiple
Peripheral light source portion, multiple periphery light source portions are increased in the form of being configured to concentric circles around central light source portion 110A
If hence in so that the effective condenser effect for large area exposure is possibly realized.
Fig. 8 is the stereogram for roughly representing exposure light source modular unit according to another embodiment of the invention,
The reference numeral identical with the reference numeral of attached drawing indicated before represents identical inscape.
With reference to Fig. 8, exposure light source modular unit 200 according to the present invention has following form：Light source panel 210 includes
The body 210a and multiple alar part 210b, multiple alar part 210b in center are equably configured at the outer of body 210a with radial
In week, set and be integrated with protruding and be inclined upwardly forwards with state upper end spaced apart from each other.
Thus, the light source panel 210 body 210a and alar part 210b respectively with the array structure of matrix shape
Ultraviolet ray emitting element 101 is installed, so as to form central light source portion and peripheral light source portion.
Also, optic panel 220 also has the composition of the body 220a for including center and multiple alar part 220b, Duo Geyi
Portion 220b is and convex forwards with state upper end spaced apart from each other with the radial periphery for being equably configured at body 220a
Set with going out and be inclined upwardly and be integrated, be provided with respectively with the array structure of matrix shape in body 210a and alar part 210b
Unit collector lens 102, so as to form central light source portion and peripheral light source portion.
As described above, for set according to exposure light source modular unit 100,200 can be applicable according to the present invention
The structure or composition in the light source portion for the exposure device put etc. and by the light source panel 110,210 and optic panel 120,220
It is deformed into the embodiment of various form.
Fig. 9 is the solid for the exposure light source modular unit for roughly showing still another embodiment according to the present invention
Figure.
With reference to Fig. 9, exposure light source modular unit 300 of the invention includes according to this embodiment：Case panel 310,
It includes plane central light source portion 311 and multiple peripheral light source portions 312, and the central part in central light source portion 311 is formed as recessed
Sunken recess formation, multiple periphery light source portions 312 are configured at around central light source portion 311 with radial unit inclined plane；
Flat light source panel 321 and unit optic panel 332, it is combined into the unit of opposed facing state, and is arranged to distinguish
It is loaded into the central light source portion 311 of the case panel 310 and peripheral light source portion 312.
Also, the light source panel 321 is provided with circuit board 322 with the array structure of the matrix shape in x-y coordinate
Multiple unit ultraviolet ray emitting elements (UV LED) 323.
In addition, the optic panel 332 is provided with multiple unit collector lenses 331, multiple unit collector lenses 331 arrange
Array structure for each unit ultraviolet ray emitting element 323 of the circuit board 322 with being installed on the light source panel 321 is opposite
The array structure answered.
In other words, had according to exemplary embodiment in Fig. 9, exposure light source modular unit 300 according to the present invention
It is following to form：The shape of unit is combined into the form of opposed facing in the flat light source panel 321 and unit optic panel 332
Under state, it is arranged to be loaded into the central light source portion 311 for the case panel 310 to form single supporting structure and peripheral light source respectively
Portion 312.
In as described above form, the ultraviolet ray emitting element 323 for forming peripheral light source portion 312 is provided towards center
The inclined state of key light emission shaft of the ultraviolet ray emitting element 323 in light source portion 311.The composition substantially has and above institute
Another embodiment illustrated forms identical composition, therefore omits the detailed description to this.
In addition, Figure 10 is by according to the exposure light source modular unit and work of the invention formed as described above
Exposure performance for the mercury vapor lamp (Hg Lamp) of existing exposure light source is tested and result of the comparison is shot simultaneously with photo
The figure shown.
Shown test result is in Figure 10, and the photoresist (PR of 1.5um thickness is coated on 3.5 inch wafers：
DTFR-JC800), after setting mask linewidths with the spacing of 0.2 (or 0.3um) respectively in the range of 1.0 to 3.5um and exposing,
Developed with tetramethylammonium hydroxide (TMAH) 2.38wt% developers, and to by common in the form of photograph taking
The photoetching process utilized in LCD manufacturing process is come the critical dimension (CD of fine circuit pattern that is formed；Critical
Dimension) it is measured.
With reference to Figure 10, the following fact can confirm that：It is achievable micro- by the use of the mercury vapor lamp as existing exposure light source
The boundary of the critical dimension (CD) of thin circuitous pattern is 2.0um or so, on the contrary, utilizing exposure light source module according to the present invention
The critical dimension (CD) of the achievable fine circuit pattern of unit can be 1.4um or so.
Also, Figure 11 be with chart come to the critical dimension measured in Figure 10 by photograph taking (CD) with preferably facing
Ungraduated ruler cun (CD) is compared.
With reference to Figure 11, the following fact can confirm that：It is achievable using exposure light source modular unit according to the present invention
The critical dimension (CD) of fine circuit pattern is achievable fine compared to by the use of the mercury vapor lamp as existing exposure light source
The critical dimension (CD) of circuitous pattern, is formed by the figure for being more nearly preferable critical dimension (CD).
Thus, it is possible to confirm, the fine circuits figure formed using exposure light source modular unit according to the present invention
The line width of shape compared to the circuitous pattern formed by the use of the mercury vapor lamp (Hg Lamp) as existing exposure light source line width,
It can be formed in the form of finer and is accurate.Thus, exposure light source modular unit according to the present invention is in exposure technology
In can be achieved significant high-resolution.
Figure 12 is the mian part and schematically for the exposure device that extraction is applicable in exposure light source modular unit according to the present invention
The schematic configuration diagram shown.Here, the reference numeral identical with the reference numeral of previously shown attached drawing represents identical structure
Into key element.
With reference to Figure 12, exposure device 400 according to the present invention includes：Exposure desk 450, it is used to support coated with emulsion
Exposure glass substrate 10；Driving device (no drawing reference numeral), it is used for so that the exposure desk 450 is in X-Y plane coordinate
On with moveable state-driven；Exposure light source modular unit 100,200,300, it, which is arranged to project to the substrate 10, exposes
Light illumination light；Optical system 410~430, it is arranged at the substrate 10 and exposure light source modular unit 100,200,300
Between；And control device (no drawing reference numeral), its drive to the driving device and exposure light source unit 100,200,300
It is dynamic to carry out Collaborative Control.Here, undeclared drawing reference numeral 440 represents the exposure mask formed with exposure figure.
Also, drawing reference numeral 200 and 300 is exemplarily represented according to respectively by Fig. 7 and Fig. 8 come the present invention that illustrates
Another embodiment exposure light source modular unit and the exposure light source modular unit 100 be replaced, so as to
To be adopted to the light source of exposure device 400 according to the present invention.
The glass substrate 10 is coated with the face for the illumination light incidence irradiated from the exposure light source modular unit 100
Emulsion, and the mask 440 formed with the identical figure of the photosensitive figure with being formed at photosurface is in the shape across air layer
Set under state in the form of being exposed platform 450 and supporting.Thus, the illumination light sent from exposure light source modular unit 100 passes through
While optical system 410~430 is assembled, by mask 440 and the photosurface of glass substrate 10 is irradiated to, so as to perform to be formed
The exposure technology of the photosurface of glass substrate 10 is transferred in the exposure figure of mask 440.
The exposure desk 450 is sat according to the relative size of glass substrate 10 and mask 440 by driving device in X-Y plane
Movement is put on, while exposure technology is performed in the state of the aligned in position of glass substrate 10 and mask 440 is caused.
In addition, for exposure device 400 according to the present invention, although illustrating the glass substrate 10 and mask 440
The composition set in the form of being spaced, but the composition and the non-limiting present invention.
On the other hand, can have so that mask 440 is close to the composition that the form of the photosurface of glass substrate 10 is set.
In the case of the composition, the photosurface of glass substrate 10 is exposed in the form of being close to, so that the figure transfer of mask 440
In photosurface.
In addition, it is embedded in by expanding the gap (gap) between glass substrate 10 and mask 440 come reduced projection lens
Between glass substrate 10 and mask 440, exposed by the composition to enable to be formed at the pattern reduction of mask 440 to project
Light is in the photosurface of glass substrate 10.
Also, the optical system 410~430 be in order to enable illumination light is effectively gathered in mask 440 and sets,
Including：Speculum 410, its be used for so that from exposure light source modular unit 100 irradiate illumination light with by being set as light
The form of the aperture A in region is reflected；Fly's-eye lens (fly eye lens) 431, condenser (condense lens) 422
And plano lens (plate lens) 423,424, it is used to be reflected by speculum 430, and speculum 430 is so that pass through
The illumination light of the aperture A is gathered in mask 440.The composition of optical system 410~430 as described above is simultaneously non-limiting according to this
The exposure device 400 of invention, can also be applicable in the composition of the deformation of variform according to exposure object and the specification of mask etc..
The exposure light source modular unit 100 is the inscape of specific exposure device 400 according to the present invention, directly
It is applicable in by Fig. 1 to Figure 11 the exposure light source modular unit 100. of the invention that illustrates
In other words, the exposure light source modular unit 100 includes light source panel 110 and optic panel 120, surface of light source
Plate 110 and optic panel 120 are combined in the form of state mutually side by side is close to configuration, so as to form unit cell.
Also, as shown in Figure 1, the light source panel 110 includes central light source portion 110A and peripheral light source portion 110B, periphery
Light source portion 110B is obliquely arranged to radial configuration around the central light source portion 110A, passes through Fig. 1 to Figure 11 pairs
Its specific technological maheup and action effect are described in detail, and therefore, omit herein to the exposure light source module list
The explanation of the specific technological maheup and action effect of member 100.
In addition, for exposure device 400 according to the present invention, the exposure light source modular unit 100 can have
Replaced by Fig. 8 and Fig. 9 come the exposure light source modular unit 200,300 according to another embodiment of the invention illustrated
Composition.
For example, exposure device 400 has following form according to the present invention：Relative to existing common exposure device,
In the form of being replaced with the exposure light source modular unit according to the present invention 100,200,300 formed as described above
Set, so as to pass through the use of low consumption electric power, the reduction of replacing light source expense, the lifting of exposure device operating time and ring
The minimizing effect of significant maintenance cost is expected in solution of border problem etc., moreover, can especially pass through the unicast of ultraviolet
Long and short wavelength realizes height output and high efficiency, and advantage is accordingly, by effectively improve exposure performance and exposure efficiency come
Realize the miniaturization of exposure figure and significant high-resolution.
Not limited present invention as described above by the specific preferred embodiment, in claims are not departed from
In the case of the idea of the invention of request, if having the technology people of general knowledge in technical field belonging to the present invention
Member, then anyone can carry out various deformation embodiment certainly, and change as described above belongs to described claims model
In enclosing.
Label declaration
100、200、300:Exposure light source modular unit
101:Ultraviolet ray emitting element (UV LED)
102:Collector lens 110:Light source panel
111:First circuit board 112:Second circuit board
113:Tertiary circuit plate 120:Optic panel
121:First support panel 122:Second support panel
123:3rd support panel 400:Exposure device
410:Speculum 440:Mask
A:Light area/aperture (aperture)
Possibility is utilized in industry
The present invention can be used for carrying out in order to which fine circuit pattern is formed at semiconductor transistor elements or display panel etc.
Photoetching (Photolithography) technique.
Claims (16)
- A kind of 1. exposure light source modular unit, it is characterised in that including：Light source panel, it is arranged to first circuit board and is loaded into a face central portion, multiple unit ultraviolet hairs with state side by side Optical element is installed on first circuit board with the array structure of matrix shape, and to form central light source portion, and multiple units are purple Outside line light-emitting component is installed on the second circuit board of at least more than one with the array structure of matrix shape, so as to form peripheral light Source portion, the second circuit board of at least more than one are arranged to upper end around the first circuit board and gradually protrude forwards And obliquely it is loaded；Optic panel, it is arranged at the first support panel and the second support panel by multiple unit collector lenses and is formed, first Support panel and the second support panel be arranged to respectively with the first circuit board and second circuit board accordingly side by side State is configured at the light emitting side of the unit ultraviolet ray emitting element, and multiple unit collector lenses are arranged as purple with unit respectively The corresponding array structure of array structure of outside line light-emitting component,The unit collector lens is arranged as relative to the unit ultraviolet ray emitting element arranged respectively in the form of corresponding Any benchmark of the key light axially past the center of the ultraviolet ray emitting element array in the central light source portion for forming the light source panel The state of the central axis lateral deviation heart,For the optical distance " a " untill the ultraviolet ray emitting element to light area (A), from by being located at the light source Between the ultraviolet ray emitting element that reference center's axis side at the center (O) of the ultraviolet ray emitting element array on panel is spaced Spacing distance " c ", described each ultraviolet of the gauge from the facing face of " b ", the ultraviolet ray emitting element and collector lens The diameter " t " of eccentric distance " x " and light area (A) between the central shaft of line light-emitting component and the central shaft of collector lens Relation be set so that the benchmark of the eccentric distance " x " of collector lens meets " x=b*c/a ", the range set of " x " is Meet " bc (2b-t)/2ab<x<bc(2b+t)/2ab”.
- A kind of 2. exposure light source modular unit, it is characterised in that including：Case panel, it includes plane central light source portion and multiple peripheral light source portions, and central light source portion is formed as central part Concave recess formation, multiple periphery light source portions are configured around central light source portion with radial unit inclined plane；Flat light source panel and unit optic panel, it is combined into the unit of opposed facing state, and is arranged to fill respectively The central light source portion of the case panel and peripheral light source portion are loaded in,The light source panel is provided with multiple unit ultraviolets with the array structure of the matrix shape in x-y coordinate in circuit board and sends out Optical element, the optic panel are provided with multiple unit collector lenses, and multiple unit collector lenses are arranged as and are installed on described The corresponding array structure of array structure of each unit ultraviolet ray emitting element of the circuit board of light source panel,The unit collector lens is arranged as relative to the unit ultraviolet ray emitting element arranged respectively in the form of corresponding Key light is axially past in any benchmark of the ultraviolet ray emitting element array center in the central light source portion for forming the light source panel The state of mandrel line side bias,For the optical distance " a " untill the ultraviolet ray emitting element to light area (A), from by being located at the light source Between the ultraviolet ray emitting element that reference center's axis side at the center (O) of the ultraviolet ray emitting element array on panel is spaced Spacing distance " c ", described each ultraviolet of the gauge from the facing face of " b ", the ultraviolet ray emitting element and collector lens The diameter " t " of eccentric distance " x " and light area (A) between the central shaft of line light-emitting component and the central shaft of collector lens Relation be set so that the benchmark of the eccentric distance " x " of collector lens meets " x=b*c/a ", the range set of " x " is Meet " bc (2b-t)/2ab<x<bc(2b+t)/2ab”.
- 3. exposure light source modular unit according to claim 1 or 2, it is characterised in thatThe unit collector lens is arranged to the ultraviolet ray emitting element from the central light source portion by forming the light source panel Arbitrary reference center's axis side of array center gradually separates and more causes closer to edge ultraviolet for corresponding unit The array structure of the increased matrix shape of offset of the primary optical axis of line light-emitting component, and to send out from each unit ultraviolet Optical element irradiates the light area that the diffusion light come is gathered in the optical system for being set in exposure device.
- 4. exposure light source modular unit according to claim 1 or 2, it is characterised in thatFor the peripheral light source portion, with inclined towards the key light emission shaft of the unit ultraviolet ray emitting element in central light source portion State causes tertiary circuit plate, and with angle of inclination, gradually increased concentric circles are configured at the periphery in the first peripheral light source portion respectively, The peripheral light source portion is added in the form of further forming multiple peripheral light source portions, so as to carry out effective optically focused work With.
- 5. exposure light source modular unit according to claim 1 or 2, it is characterised in thatThe ultraviolet ray emitting element is installed as any one form selected from chip or component or both mixing The LED light source of form.
- 6. exposure light source modular unit according to claim 1 or 2, it is characterised in thatThe unit collector lens is formed by biconvex lens.
- 7. exposure light source modular unit according to claim 1 or 2, it is characterised in thatThe unit collector lens is by having the biconvex of the curvature surface of mutually different optical texture according to the arrangement position of array Lens forming.
- 8. exposure light source modular unit according to claim 1 or 2, it is characterised in thatOptical distance " a " untill the ultraviolet ray emitting element to light area (A) and from by being located at the surface of light source The interval for the ultraviolet ray emitting element that reference center's axis side at the center (O) of the ultraviolet ray emitting element array on plate is spaced Distance " b " when " b/a " is formed as more than 0.5, it is described periphery light source portion (110B) by be configured to it is radial in the form of obliquely It is arranged at around the central light source portion (110A).
- 9. exposure light source modular unit according to claim 1 or 2, it is characterised in thatOptical distance " a " untill the ultraviolet ray emitting element to light area (A) and from by being located at the surface of light source The interval for the ultraviolet ray emitting element that reference center's axis side at the center (O) of the ultraviolet ray emitting element array on plate is spaced For distance " b " when " b/a " is formed as the scope within 0.1 to 0.5, the periphery light source portion (110B) is selectively arranged at institute State around central light source portion (110A).
- 10. exposure light source modular unit according to claim 1 or 2, it is characterised in thatThe spacing distance (c) in the facing face of the unit ultraviolet ray emitting element and unit collector lens that correspond and The diameter (d) of the collector lens meets 1.0c<d<The condition of 2.5c.
- 11. exposure light source modular unit according to claim 1 or 2, it is characterised in thatThe light source panel and the optic panel are arranged at exposure device with dismountable state cell.
- 12. exposure light source modular unit according to claim 2, it is characterised in thatThe case panel is arranged at exposure device with dismountable state cell.
- 13. exposure light source modular unit according to claim 1 or 2, it is characterised in thatHeat-releasing device is additionally provided with around the light source panel and the optic panel.
- 14. a kind of exposure device, it is characterised in that including exposure desk, driving device, exposure light source modular unit, optical system System and control device, exposure desk are used to support the substrate for exposure coated with emulsion, and driving device is used for so that the exposure With moveable state-driven on X-Y plane coordinate, exposure light source modular unit is arranged to for forming the base platform The mask of the exposure figure of plate sends illumination light, and optical system is arranged between substrate and the exposure light source modular unit, Driving of the control device to the driving device and exposure light source modular unit carries out Collaborative Control,The exposure light source modular unit includes：Light source panel, it is arranged to first circuit board and is loaded into a face central portion, multiple unit ultraviolet hairs with state side by side Optical element is installed on first circuit board with the array structure of matrix shape, and to form central light source portion, and multiple units are purple Outside line light-emitting component is installed on the second circuit board of at least more than one with the array structure of matrix shape, so as to form peripheral light Source portion, the second circuit board of at least more than one are arranged to upper end around the first circuit board and gradually protrude forwards And obliquely it is loaded；Optic panel, it is arranged at the first support panel and the second support panel by multiple unit collector lenses and is formed, first Support panel and the second support panel are arranged to configure with the state respectively with the first circuit board and second circuit board side by side In the light emitting side of the unit ultraviolet ray emitting element, multiple unit collector lenses be arranged as respectively with unit luminescence-utraviolet The corresponding array structure of array structure of element,The unit collector lens is arranged as relative to the unit ultraviolet ray emitting element arranged respectively in the form of corresponding Any benchmark of the key light axially past the center of the ultraviolet ray emitting element array in the central light source portion for forming the light source panel The state of the central axis lateral deviation heart,For the optical distance " a " untill the ultraviolet ray emitting element to light area (A), from by forming the light source The ultraviolet hair that reference center's axis side at the center (O) of the ultraviolet ray emitting element array in the central light source portion of panel is spaced The spacing distance " c " in the facing face of the spacing distance " b " of optical element, the ultraviolet ray emitting element and collector lens, institute State eccentric distance " x " and the light area between the central shaft of each ultraviolet ray emitting element and the central shaft of collector lens (A) relation of diameter " t " is set so that the benchmark of the eccentric distance " x " of collector lens meets " x=b*c/a ", described The range set of " x " is satisfaction " bc (2b-t)/2ab<x<bc(2b+t)/2ab”.
- 15. a kind of exposure device, it is characterised in that including exposure desk, driving device, exposure light source modular unit, optical system System and control device, exposure desk are used to support the substrate for exposure coated with emulsion, and driving device is used for so that the exposure With moveable state-driven on X-Y plane coordinate, exposure light source modular unit is arranged to for forming the base platform The mask of the exposure figure of plate sends illumination light, and optical system is arranged between substrate and the exposure light source modular unit, Driving of the control device to the driving device and exposure light source modular unit carries out Collaborative Control,The exposure light source modular unit includes：Case panel, it includes plane central light source portion and multiple peripheral light source portions, and central light source portion is formed as central part Concave recess formation, multiple periphery light source portions are configured around central light source portion with radial unit inclined plane；Flat light source panel and unit optic panel, it is combined into the unit of opposed facing state, and is arranged to fill respectively The central light source portion of the case panel and peripheral light source portion are loaded in,The light source panel is provided with multiple unit ultraviolets with the array structure of the matrix shape in x-y coordinate in circuit board and sends out Optical element, the optic panel are provided with multiple unit collector lenses, and multiple unit collector lenses are arranged as and are installed on described The corresponding array structure of array structure of each unit ultraviolet ray emitting element of the circuit board of light source panel,The unit collector lens is arranged as relative to the unit ultraviolet ray emitting element arranged respectively in the form of corresponding Key light is axially past in any benchmark of the ultraviolet ray emitting element array center in the central light source portion for forming the light source panel The state of mandrel line side bias,For the optical distance " a " untill the ultraviolet ray emitting element to light area (A), from by forming the light source The ultraviolet hair that reference center's axis side at the center (O) of the ultraviolet ray emitting element array in the central light source portion of panel is spaced The spacing distance " c " in the facing face of the spacing distance " b " of optical element, the ultraviolet ray emitting element and collector lens, institute State eccentric distance " x " and the light area between the central shaft of each ultraviolet ray emitting element and the central shaft of collector lens (A) relation of diameter " t " is set so that the benchmark of the eccentric distance " x " of collector lens meets " x=b*c/a ", " x " Range set for meet " bc (2b-t)/2ab<x<bc(2b+t)/2ab”.
- 16. the exposure device according to claims 14 or 15, it is characterised in thatThe unit collector lens is arranged to the ultraviolet ray emitting element from the central light source portion by forming the light source panel Arbitrary reference center's axis side of array center gradually separates and more causes closer to edge ultraviolet for corresponding unit The array structure of the increased matrix shape of offset of the primary optical axis of line light-emitting component, and to send out from each unit ultraviolet Optical element irradiates the light area that the diffusion light come is gathered in the optical system for being set in exposure device.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2015-0118085 | 2015-08-21 | ||
| KR1020150118085A KR101649129B1 (en) | 2015-08-21 | 2015-08-21 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| PCT/KR2016/009139 WO2017034221A1 (en) | 2015-08-21 | 2016-08-19 | Light source module unit for exposure and exposure device having light source module unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107924134A true CN107924134A (en) | 2018-04-17 |
| CN107924134B CN107924134B (en) | 2019-10-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680047935.2A Active CN107924134B (en) | 2015-08-21 | 2016-08-19 | Exposure light source modular unit and the exposure device for being provided with the light source module unit |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR101649129B1 (en) |
| CN (1) | CN107924134B (en) |
| TW (1) | TWI608309B (en) |
| WO (1) | WO2017034221A1 (en) |
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| CN110196517A (en) * | 2019-05-16 | 2019-09-03 | 深圳市华星光电技术有限公司 | A kind of ultraviolet irradiation machine |
| CN113126456A (en) * | 2021-05-06 | 2021-07-16 | 艾斯尔光电(南通)有限公司 | Photomask exposure developing process |
| CN115674894A (en) * | 2022-11-10 | 2023-02-03 | 广东科视光学技术股份有限公司 | Offset printing light source, adjusting device, control system, control method and printing machine |
| CN115877674A (en) * | 2023-02-22 | 2023-03-31 | 广东科视光学技术股份有限公司 | LED optical system of DI lithography machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101848072B1 (en) | 2016-09-27 | 2018-04-11 | (주)블루코어 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| KR20240002721A (en) | 2022-06-29 | 2024-01-05 | 엘지전자 주식회사 | Light source module and exposure apparatus having the same |
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| CN115877674A (en) * | 2023-02-22 | 2023-03-31 | 广东科视光学技术股份有限公司 | LED optical system of DI lithography machine |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017034221A1 (en) | 2017-03-02 |
| KR101649129B1 (en) | 2016-08-18 |
| TW201710805A (en) | 2017-03-16 |
| TWI608309B (en) | 2017-12-11 |
| CN107924134B (en) | 2019-10-01 |
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