CN107850857B - 印刷版前体、制作所述前体的工艺、以及由所述前体制备印刷版的方法 - Google Patents

印刷版前体、制作所述前体的工艺、以及由所述前体制备印刷版的方法 Download PDF

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Publication number
CN107850857B
CN107850857B CN201680043541.XA CN201680043541A CN107850857B CN 107850857 B CN107850857 B CN 107850857B CN 201680043541 A CN201680043541 A CN 201680043541A CN 107850857 B CN107850857 B CN 107850857B
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CN
China
Prior art keywords
layer
digital
infrared
printing plate
printing
Prior art date
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CN201680043541.XA
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English (en)
Chinese (zh)
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CN107850857A (zh
Inventor
R·M·布洛姆奎斯特
B·K·泰勒
J·S·洛克
M·A·海克勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronics Inc
Original Assignee
EI Du Pont de Nemours and Co
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Publication of CN107850857A publication Critical patent/CN107850857A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/006—Forme preparation the relief or intaglio pattern being obtained by abrasive means, e.g. by sandblasting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/50—Sympathetic, colour changing or similar inks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
CN201680043541.XA 2015-06-02 2016-05-27 印刷版前体、制作所述前体的工艺、以及由所述前体制备印刷版的方法 Active CN107850857B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562169901P 2015-06-02 2015-06-02
US62/169,901 2015-06-02
PCT/US2016/034563 WO2016196257A2 (en) 2015-06-02 2016-05-27 A printing form precursor, a process for making the precursor, and a method for preparing a printing form from the precursor

Publications (2)

Publication Number Publication Date
CN107850857A CN107850857A (zh) 2018-03-27
CN107850857B true CN107850857B (zh) 2021-02-09

Family

ID=56118040

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680043541.XA Active CN107850857B (zh) 2015-06-02 2016-05-27 印刷版前体、制作所述前体的工艺、以及由所述前体制备印刷版的方法

Country Status (6)

Country Link
US (3) US10668711B2 (OSRAM)
EP (1) EP3304206B1 (OSRAM)
JP (1) JP6901410B2 (OSRAM)
KR (1) KR102616599B1 (OSRAM)
CN (1) CN107850857B (OSRAM)
WO (1) WO2016196257A2 (OSRAM)

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US11953834B2 (en) * 2018-04-26 2024-04-09 Xsys Prepress N.V. Apparatus and method for treating and transporting a relief printing plate precursor
WO2019226737A1 (en) * 2018-05-25 2019-11-28 E. I. Du Pont De Nemours And Company A flexographic printing form having microcell patterns on surface
FR3085304B1 (fr) * 2018-08-31 2021-01-08 D Uniflexo Forme imprimante photosensible pour un procede d’impression flexographique comprenant des informations visibles et non imprimables, procede de preparation d’une telle forme imprimante
EP3894956B1 (en) * 2018-12-11 2025-08-13 DuPont Electronics, Inc. Flexographic printing form precursor and a method for making the precursor
US11046092B2 (en) * 2019-02-13 2021-06-29 Macdermid Graphics Solutions Llc Photopolymer film with UV filtering
JP7223868B2 (ja) * 2019-02-14 2023-02-16 オルボテック リミテッド 高密度導体を有するｐｃｂ製品を調製するための方法及び装置
NL2022776B1 (en) * 2019-03-20 2020-09-28 Xeikon Prepress Nv Method and system for applying a pattern on a mask layer
WO2020239665A1 (en) 2019-05-30 2020-12-03 Esko-Graphics Imaging Gmbh Process and apparatus for automatic measurement of density of photopolymer printing plates
CN110588141A (zh) * 2019-09-03 2019-12-20 天津保创印刷材料有限公司 印刷版及其制备工艺
US11388311B2 (en) * 2020-06-05 2022-07-12 Esko Software Bvba System and method for obtaining a uniform ink layer
JP2024530179A (ja) 2021-08-04 2024-08-16 デュポン エレクトロニクス インコーポレイテッド 印刷版原版及びその印刷版
WO2023105446A1 (en) * 2021-12-07 2023-06-15 Esko Software Bv Herringbone microstructure surface pattern for flexographic printing plates
US20230311473A1 (en) 2022-04-01 2023-10-05 Dupont Electronics, Inc. Printing form precursor and printing form thereof
US12496846B2 (en) * 2022-06-16 2025-12-16 Miraclon Corporation Mask for low contrast printed highlights
KR102894165B1 (ko) * 2023-04-14 2025-12-01 가부시키가이샤 고무라테크 인쇄판 및 그 제조 방법
WO2025042400A1 (en) * 2023-08-24 2025-02-27 Miraclon Corporation Flexographic printing plate and mask for low contrast printed highlights

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Also Published As

Publication number Publication date
KR20180014757A (ko) 2018-02-09
US10668711B2 (en) 2020-06-02
US20200254749A1 (en) 2020-08-13
JP2018517939A (ja) 2018-07-05
US11858252B2 (en) 2024-01-02
JP6901410B2 (ja) 2021-07-14
KR102616599B1 (ko) 2023-12-26
CN107850857A (zh) 2018-03-27
US20160355004A1 (en) 2016-12-08
WO2016196257A2 (en) 2016-12-08
US11465402B2 (en) 2022-10-11
EP3304206B1 (en) 2021-02-17
WO2016196257A3 (en) 2017-01-19
EP3304206A2 (en) 2018-04-11
US20230001684A1 (en) 2023-01-05

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Effective date of registration: 20221123

Address after: Delaware

Patentee after: DuPont Electronics

Address before: Delaware

Patentee before: E.I. Nemours DuPont