CN107829068A - Mo‑Se‑Ta+TiAlTaN软硬复合涂层刀具及其制备方法 - Google Patents

Mo‑Se‑Ta+TiAlTaN软硬复合涂层刀具及其制备方法 Download PDF

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CN107829068A
CN107829068A CN201711082887.3A CN201711082887A CN107829068A CN 107829068 A CN107829068 A CN 107829068A CN 201711082887 A CN201711082887 A CN 201711082887A CN 107829068 A CN107829068 A CN 107829068A
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邢佑强
高俊涛
吴泽
李晓
孙东科
刘晓军
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Abstract

本发明公开了一种Mo‑Se‑Ta+TiAlTaN软硬复合涂层刀具及其制备方法,该涂层刀具包括刀具基体材料,基体材料为高速钢或硬质合金,由刀具基体到表面涂层依次为Ti+TiN过渡层、TiAlTaN硬涂层、Zr过渡层和Mo‑Se‑Ta软涂层。该涂层刀具的制备方法采用多弧离子镀+中频磁控溅射方式,包括沉积Ti+TiN过渡层、沉积TiAlTaN硬涂层、沉积Zr过渡层和沉积Mo‑Se‑Ta软涂层的步骤。本发明的涂层刀具既具有较高的硬度,又具有良好的润滑性能和低的摩擦系数,同时具有良好的热稳定性、抗氧化性、耐腐蚀性和抗磨损能力;具有广阔的应用前景;制备方法简单、易操作。

Description

Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法
技术领域
本发明属于机械切削刀具制造领域,尤其涉及Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法。
背景技术
TiN涂层作为一种硬质涂层,已广泛应用于切削刀具、刃具及各种模具表面作为耐磨和耐腐蚀层。然而,作为刀具涂层,切削过程中,TiN涂层表现出了抗氧化温度低,热硬度低等缺点。为提高TiN涂层硬度和热稳定性等,进一步研制出TiSiN、TiCrN及TiAlN等多种硬涂层。然而,作为刀具涂层,切削过程中,硬涂层刀具与工件摩擦系数较高,切削力大,导致切削温度较高,刀具寿命下降,加工工件表面质量受影响。为降低摩擦系数,减小刀具磨损,开发研制出一系列软涂层刀具,但软涂层硬度较低,易于磨损。软硬复合涂层刀具既硬涂层的高硬度,又具有软涂层的自润滑功效,使涂层刀具寿命得到了较大改善。Ta元素作为一种过渡金属元素,具有良好的耐腐蚀性和抗氧化能力([1]Pfeiler M.,et al.Journal ofVacuum Science&Technology A:Vacuum,Surfaces,and Films,2009,27(3):554-560.[2]Rachbauer R.,et al.Surface and Coatings Technology,2012,211:98-103.)。因此,Ta元素的添加不仅能够提高软、硬涂层的热稳定性、抗氧化能力和耐腐蚀能力,同时能够提高软涂层的硬度。
文献(KhetanV.,et al.ACS Applied Materials&Interfaces,2014,6(17):15403-15411.)报道了一种AlTiTaN硬涂层,该涂层与AlTiN涂层相比表现出较好的抗氧化和热稳定性能,非常适合干加工应用场合。中国专利“申请号:201410263737.2”报道了TiSiN-WS2/Zr-WS2软硬复合涂层刀具,该刀具能够降低摩擦系数,减小刀具磨损。中国专利CN200910256536.9报道了一种MoS2/ZrN软硬复合涂层刀具,该刀具既具有较低的摩擦系数,又具有较高的硬度,使涂层刀具的性能有了很大提高。中国专利CN201610819057.3报道了一种W-Se-Zr/ZrSiN软硬复合涂层刀具,该刀具既具有润滑性能,又具有较高硬度和耐磨性能。以上报道的几种软硬复合涂层刀具热稳定性、抗氧化及耐腐蚀性能等有待于进一步提高。目前国内外未见Mo-Se-Ta+TiAlTaN软硬复合涂层刀具的报道。
发明内容
发明目的:本发明提供了一种Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法,该涂层刀具提高了现有技术中软硬复合涂层刀具热稳定性、抗氧化及耐腐蚀性能;该制备方法简单、易操作,条件温和、易实现。
技术方案:本发明的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具,包括刀具基体材料,基体材料为高速钢或硬质合金,由刀具基体到表面涂层依次为Ti过渡层、TiN过渡层、TiAlTaN硬涂层、Zr过渡层和Mo-Se-Ta软涂层。
上述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具的制备方法,采用多弧离子镀+中频磁控溅射方式,包括以下步骤:
(1)前处理:将刀具基体材料研磨抛光至镜面,依次放入酒精和丙酮中超声清洗各20-30min,去除表面油渍等污染物,采用真空干燥箱充分干燥后迅速放入镀膜机真空室,真空室本底真空为7.0×10-3Pa,加热至200-250℃,保温30-40min。
(2)离子清洗:通入工作气体Ar2,其压力为0.5-1.5Pa,开启偏压电源,电压700-900V,占空比0.2,辉光放电清洗20-30min;偏压降低至300-600V,开启离子源离子清洗20-30min,开启电弧源Ti靶,偏压500-600V,靶电流40-70A,离子轰击Ti靶1-2min。
(3)沉积Ti过渡层:调整Ar2气压至0.4-0.6Pa,偏压降低至100-300V,电弧镀沉积2-5min。
(4)沉积TiN过渡层:调整工作气压为0.5-0.6Pa,偏压80-150V,Ti靶电流90-110A;开启N2,调整N2流量为150-300sccm,沉积温度为220-260℃,沉积2-10min。
(5)沉积TiAlTaN硬涂层:开启中频Al靶电弧电源,电流调至60-90A,开启Ta靶电源,电流调制40-60A,电弧镀+中频磁控溅射沉积40-60min。
(6)沉积Zr过渡层:关闭Ti靶、Al靶、Ta靶、N2源,调整Ar2气压至0.4-0.6Pa,开启Zr靶,电流调至40-70A,电弧镀沉积3-5min。
(7)沉积Mo-Se-Ta软涂层:关闭Zr靶,偏压调至100-200V,开启MoSe2靶和Ta靶,MoSe2靶电流调至2-4A,Ta靶调至20-40A,沉积80-120min。
(8)后处理:关闭MoSe2靶和Ta靶,关闭偏压电源及气体源,保温30-60min,涂层结束,得到所述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。
有益效果:1、本发明的涂层刀具综合了硬涂层和软涂层的优点,既具有较高的硬度,又具有良好的润滑性能和低的摩擦系数,同时具有良好的热稳定性、抗氧化性、耐腐蚀性和抗磨损能力;2、可广泛应用于干切削及难加工材料等切削温度较高的切削加工,具有广阔的应用前景;3、制备方法简单、易操作;4、条件温和、易实现;5、刀具使用寿命长。
附图说明
图1是本发明的结构示意图。
具体实施方式
参见图1,本发明一实施例所述的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具,包括刀具基体材料1,所述基体材料1为高速钢或硬质合金,所述基体材料1表面从内到外依次涂有Ti过渡层2、TiN过渡层3、TiAlTaN硬涂层4、Zr过渡层5和Mo-Se-Ta软涂层6。
实施例1
上述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法包括以下步骤:
(1)前处理:将刀具基体材料高速钢研磨抛光至镜面,依次放入酒精和丙酮中超声清洗各20min,去除表面油渍等污染物,采用真空干燥箱充分干燥后迅速放入镀膜机真空室,真空室本底真空为7.0×10-3Pa,加热至220℃,保温30min;
(2)离子清洗:通入工作气体Ar2,其压力为0.8Pa,开启偏压电源,电压750V,占空比0.2,辉光放电清洗20min;偏压降低至400V,开启离子源离子清洗20min,开启电弧源Ti靶,偏压500V,靶电流50A,离子轰击Ti靶2min;
(3)沉积Ti过渡层:调整Ar2气压至0.5Pa,偏压降低至150V,电弧镀沉积2min;
(4)沉积TiN过渡层:调整工作气压为0.5Pa,偏压100V,Ti靶电流90A;开启N2,调整N2流量为180sccm,沉积温度为230℃,沉积5min;
(5)沉积TiAlTaN应涂层:开启中频Al靶电弧电源,电流调至70A,开启Ta靶电源,电流调制40A,电弧镀+中频磁控溅射沉积50min;
(6)沉积Zr过渡层:关闭Ti靶、Al靶、Ta靶、N2源,调整Ar2气压至0.5Pa,开启Zr靶,电流调至50A,电弧镀沉积3min;
(7)沉积Mo-Se-Ta软涂层:关闭Zr靶,偏压调至150V,开启MoSe2靶和Ta靶,MoSe2靶电流调至2A,Ta靶调至25A,沉积90min;
(8)后处理:关闭MoSe2靶和Ta靶,关闭偏压电源及气体源,保温40min,涂层结束,得到以高速钢为基体材料的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。
实施例2
上述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法包括以下步骤:
(1)前处理:将刀具基体材料硬质合金研磨抛光至镜面,依次放入酒精和丙酮中超声清洗各30min,去除表面油渍等污染物,采用真空干燥箱充分干燥后迅速放入镀膜机真空室,真空室本底真空为7.0×10-3Pa,加热至230℃,保温40min;
(2)离子清洗:通入工作气体Ar2,其压力为1.2Pa,开启偏压电源,电压900V,占空比0.2,辉光放电清洗30min;偏压降低至500V,开启离子源离子清洗30min,开启电弧源Ti靶,偏压580V,靶电流65A,离子轰击Ti靶2min;
(3)沉积Ti过渡层:调整Ar2气压至0.6Pa,偏压降低至200V,电弧镀沉积4min;
(4)沉积TiN过渡层:调整工作气压为0.6Pa,偏压120V,Ti靶电流100A;开启N2,调整N2流量为250sccm,沉积温度为250℃,沉积8min;
(5)沉积TiAlTaN硬涂层:开启中频Al靶电弧电源,电流调至80A,开启Ta靶电源,电流调制60A,电弧镀+中频磁控溅射沉积55min;
(6)沉积Zr过渡层:关闭Ti靶、Al靶、Ta靶、N2源,调整Ar2气压至0.4-0.6Pa,开启Zr靶,电流调至65A,电弧镀沉积4min;
(7)沉积Mo-Se-Ta软涂层:关闭Zr靶,偏压调至180V,开启MoSe2靶和Ta靶,MoSe2靶电流调至4A,Ta靶调至35A,沉积120min;
(8)后处理:关闭MoSe2靶和Ta靶,关闭偏压电源及气体源,保温50min,涂层结束,得到以硬质合金为基体材料的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。

Claims (2)

1.一种Mo-Se-Ta+TiAlTaN软硬复合涂层刀具,其特征在于:包括刀具基体材料(1),所述基体材料为高速钢或硬质合金,由刀具基体到表面涂层依次为Ti过渡层(2)、TiN过渡层(3)、TiAlTaN硬涂层(4)、Zr过渡层(5)和Mo-Se-Ta软涂层(6)。
2.如权利要求1所述的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具的制备方法,其特征在于,采用多弧离子镀+中频磁控溅射方式,包括以下步骤:
(1)前处理:将刀具基体材料研磨抛光至镜面,依次放入酒精和丙酮中超声清洗各20-30min,去除表面油渍等污染物,采用真空干燥箱充分干燥后迅速放入镀膜机真空室,真空室本底真空为7.0×10-3Pa,加热至200-250℃,保温30-40min;
(2)离子清洗:通入工作气体Ar2,其压力为0.5-1.5Pa,开启偏压电源,电压700-900V,占空比0.2,辉光放电清洗20-30min;偏压降低至300-600V,开启离子源离子清洗20-30min,开启电弧源Ti靶,偏压500-600V,靶电流40-70A,离子轰击Ti靶1-2min;
(3)沉积Ti过渡层:调整Ar2气压至0.4-0.6Pa,偏压降低至100-300V,电弧镀沉积2-5min;
(4)沉积TiN过渡层:调整工作气压为0.5-0.6Pa,偏压80-150V,Ti靶电流90-110A;开启N2,调整N2流量为150-300sccm,沉积温度为220-260℃,沉积2-10min;
(5)沉积TiAlTaN硬涂层:开启中频Al靶电弧电源,电流调至60-90A,开启Ta靶电源,电流调制40-60A,电弧镀+中频磁控溅射沉积40-60min;
(6)沉积Zr过渡层:关闭Ti靶、Al靶、Ta靶、N2源,调整Ar2气压至0.4-0.6Pa,开启Zr靶,电流调至40-70A,电弧镀沉积3-5min;
(7)沉积Mo-Se-Ta软涂层:关闭Zr靶,偏压调至100-200V,开启MoSe2靶和Ta靶,MoSe2靶电流调至2-4A,Ta靶调至20-40A,沉积80-120min;
(8)后处理:关闭MoSe2靶和Ta靶,关闭偏压电源及气体源,保温30-60min,涂层结束,得到所述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。
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