CN107783380A - Submerge switch and method - Google Patents
Submerge switch and method Download PDFInfo
- Publication number
- CN107783380A CN107783380A CN201610791454.4A CN201610791454A CN107783380A CN 107783380 A CN107783380 A CN 107783380A CN 201610791454 A CN201610791454 A CN 201610791454A CN 107783380 A CN107783380 A CN 107783380A
- Authority
- CN
- China
- Prior art keywords
- power board
- manipulator
- exposure
- plate interface
- exposure desk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Abstract
The invention provides one kind submergence switch and method, the device includes mechanical arm assembly, power board, the first exchange plate interface being arranged on the first exposure desk and the second exchange plate interface being arranged on the second exposure desk, and the structure that the first exchange plate interface and second exchange plate interface is identical；The mechanical arm assembly, to movement and carry the power board：The power board, to by the mechanical arm assembly it is mobile, be docked to described first and exchange plate interface, and after docking, the power board and the first exposure desk are moved by synchronous driving so that the immersion liquid field is transferred on the power board from the exposure area of first exposure desk；Plate interface also is exchanged to be docked to described second, and after docking, the power board and the second exposure desk are moved by synchronous driving so that the immersion liquid field is transferred to the exposure area of second exposure desk from the power board, to carry out in exposure thereon.
Description
Technical field
The present invention relates to field of lithography, more particularly to a kind of submergence switch and method.
Background technology
Immersion lithography needs the photoetching on the lower surface and silicon chip of last lens of projection lens of lithography machine
The liquid of high index of refraction is full of between glue.The numerical aperture NA=nsin θ of projection objective, wherein, n be projection objective and silicon chip it
Between medium refractive index, θ is light maximum incident angle.In the case of maximum incident angle identical, the number of immersion lithographic system
Value aperture ratio conventional lithography system increases n times.And from the angle of Fourier Optics, numerical aperture plays spatial frequency low pass
The role of wave filter threshold value.The immersion liquid of injection high index of refraction can make the light wave of more high spatial frequency incide photoresist
On, therefore imaging resolution is improved.
The use of double-workpiece-table litho machine so that " dry type measures, submergence exposure " is possibly realized：I.e. silicon chip is in measurement position
" dry type " measurement is completed, can using the distinctive focusing test algorithm of double-workpiece-table litho machine after the accurate three-dimensional pattern of silicon chip is obtained
To be previously obtained the defocusing amount of silicon chip, silicon chip then can be navigated to reason without carrying out leveling and focusing measurement again in exposure position
Think that focal plane completes submergence exposure, realize dual -stage technology with submerging the seamless connection of exposure technique.
Known litho machine switch has the modes such as closed disk and swap bridge.Close disk-form and submerge friendship in double-workpiece-table
When changing, have a closed disk and temporarily seal immersion system bottom, maintain immersion liquid field, treat to move to level work stage exposure position
Afterwards, closed disk is withdrawn again, and immersion liquid field, which changes to be supported by silicon chip, to be maintained, and the inferior position of this mode is, close around immersion liquid field
Envelope gas field and liquid field need to re-establish, it is necessary to reasonable time cost, reduce yield.Swap bridge mode exchanges bridge plate by one
Roll up, two work stages are coupled, to realize the continued support of immersion liquid field, although swap time reduces, exchanging bridge plate can be right
Work stage surrounding causes to cover, and is not suitable for carrying out the occasion of position measurement, and such a swap bridge using interferometer strip mirror
Need to be respectively provided with one group of swap bridge in each work stage, the load of work stage can be increased, be unfavorable for kinematic accuracy, speed carries
Rise.
The content of the invention
In order to make up disadvantages mentioned above, the invention provides one kind to submerge switch, in the first exposure desk
And second carry out between exposure desk maintaining immersion liquid field during immersion liquid exchange, the submergence switch include mechanical arm assembly,
Power board and the first exchange plate interface being arranged on the first exposure desk and the second power board being arranged on the second exposure desk connect
Mouthful, the structure that the first exchange plate interface exchanges plate interface with described second is identical；
The mechanical arm assembly, to movement and carry the power board：
The power board, to by the mechanical arm assembly it is mobile, be docked to described first and exchange plate interface, and docking
Afterwards, the power board and the first exposure desk can be moved by synchronous driving so that the immersion liquid field is from first exposure desk
Exposure area be transferred on the power board；
Plate interface also is exchanged to be docked to described second, and after docking, the power board and the second exposure desk are same
Step driving movement so that the immersion liquid field is transferred to the exposure area of second exposure desk from the power board, to carry out
In exposure thereon.
Optionally, the mechanical arm assembly includes manipulator base and manipulator arm, and the power board is carried on described
Manipulator arm；The manipulator arm is installed on the manipulator base；
The manipulator arm, the power board is driven to translate；
The manipulator base, drive the manipulator arm and power board catenary motion thereon.
Optionally, the mechanical arm assembly also includes manipulator guide rail, and the manipulator base is mechanical described in drives edge
Hand guide rail moves, and the manipulator guide rail sets in the first direction, the manipulator arm drive the power board along with it is described
The vertical second direction motion of first direction.
Optionally, first exposure desk is located at the exposure side region of workbench, and second exposure desk is located at workbench
Alignment side region, the exposure region is distributed with the alignment area along Y-direction, the manipulator guide rail is along X to being arranged in the work
On the side of part platform.
Optionally, first exposure desk is located at the exposure region of workbench, and second exposure desk is located at pair of workbench
Quasi- area, the exposure region are distributed with the alignment area along Y-direction, and the manipulator guide rail is arranged in the side of the workbench along Y-direction
Bian Shang.
Optionally, the manipulator base and the quantity of manipulator arm are two groups, manipulator base interval described in two groups
It is fixed on the side of work stage, manipulator base described in one of which and manipulator arm realize that described first hands over to drive
Plate interface/second exchange plate interface is changed to dock with power board, and the separation of the power board and manipulator arm；Separately
Manipulator base described in one group and manipulator arm to realize described second exchange plate interface/described first exchange plate interface with
The separation of power board.
Optionally, the power board or the first exchange plate interface are provided with alignment mark, the exchange plate interface or exchange
Plate is provided with the position sensor for detecting the alignment mark, by described right between the power board and the first exchange plate interface
Fiducial mark is remembered and position sensor realizes alignment, and then can achieve a butt joint in the registered.
Optionally, adsorption piece is additionally provided with the power board or the first exchange plate interface, the power board exchanges with first
Adsorbed and connected by the adsorption piece between plate interface.
Optionally, it is additionally provided with vacuum pump drainage hole on the first exchange plate interface.
Optionally, temperature sensor and heating member, the heating are additionally provided with the power board or the first exchange plate interface
Part is driven detection data regulation heating amount according to the temperature sensor.
Optionally, it is additionally provided with flexible seal ring on the first exchange plate interface.
Present invention also offers one kind to submerge exchange method, comprises the following steps：
S0：Mechanical arm assembly, power board and the exchange plate interface for being respectively arranged at two exposure desks are provided；
S1：The power board is carried by the mechanical arm assembly, positioned at initial position, treats first in exposure side region
After exposure process on exposure desk terminates, into step S2；
S2：The power board is moved to by correspondence position by the mechanical arm assembly, and then causes the power board position
In the upside of the exchange plate interface of the first exposure desk；
S3：The power board is lifted by the mechanical arm assembly so that the power board docks the friendship of the first exposure desk
Change plate interface；
S4：The mechanical arm assembly separates with the power board；
S5：Power board described in synchronizing moving and the first exposure desk, so that exposure of the immersion liquid field from the first exposure desk
Zone-transfer is to the power board；
S6：Mobile the second exposure desk that alignment is completed in alignment side region so that the power board is located at the second exposure desk
Exchange plate interface upside；
S7：Rise second exposure desk so that the power board exchanges plate interface docking with the second exposure desk；
S8：The exchange plate interface and power board of first exposure desk are separated, and first exposure desk is moved into alignment
Side region；
S9：Power board described in synchronizing moving and the second exposure desk, so that immersion liquid field is transferred to from the power board
The exposure area of second exposure desk, to carry out in exposure thereon, after completing exposure, into step S10；
S10：The power board is lifted by the mechanical arm assembly so that the power board exchanges with the second exposure desk
Plate interface separates.
Optionally, in the step S0, the mechanical arm assembly includes manipulator base and manipulator arm, the friendship
Change plate and be carried on the manipulator arm；The manipulator arm is installed on the manipulator base；The manipulator base and
The quantity of manipulator arm is two；Wherein, the first manipulator arm Matching installation is in the first manipulator base, the second manipulator
Arm Matching installation is in the second manipulator base；
In the step S2, the power board is moved to corresponding position by flexible by first manipulator arm
Put；
In the step S3, the power board is declined by the first manipulator base therein, to achieve a butt joint；
In the step S4, first manipulator arm is further declined by the first manipulator base therein,
So that first manipulator arm separates with the power board；
In the step S10, second manipulator arm is retractable to required position, passes through the second manipulator bottom
Seat rises second manipulator arm, so that second manipulator arm is to connecting the power board, and by entering
The rising separation power board of one step exchanges plate interface with the second exposure desk.
Optionally, in the step S0, the mechanical arm assembly includes manipulator base, manipulator arm and manipulator
Guide rail, the power board are carried on the manipulator arm；Manipulator base manipulator guide rail described in drives edge moves,
And then translation of the power board along correspondence direction is realized, flexible side of the manipulator guide rail perpendicular to the manipulator arm
To；
In the step S2, by the flexible of the manipulator arm, the power board is moved into correspondence position；
In the step S3, pass through the manipulator base and decline the power board so that the power board docking the
The exchange plate interface of one exposure desk；
In the step S4, the manipulator arm is further declined by the manipulator base, so that described
Manipulator arm separates with the power board；
In the step S5, power board, the first exposure desk and manipulator base described in synchronizing moving；
In the step S9, power board, the second exposure desk and manipulator base described in synchronizing moving；
In the step S10, the manipulator arm is risen by the manipulator base so that the manipulator hand
Arm docks with the power board, and then passes through the further up power board of the manipulator base so that the power board
Separated with the exchange plate interface of the second exposure desk.
The present invention proposes a kind of submergence switch and method, can be applied to carry out position using interferometer or plane grating
The occasion of measurement, solve the problems, such as the maintenance of immersion liquid field during dual stage exchange, and compare closing disc type switch, avoid
Re-establishing for sealing gas field liquid field, saves the time, compares swap bridge form, reduce the quantity of switch, reduce
Work stage loads, and improves kinematic accuracy, speed to a certain extent, while avoids masking of the switch to strip mirror, more
Because the difference of exchanging policy so that when the one of work stage of dual stage exchange is withdrawn from exposure position, can be supported and soaked by power board
Do not have liquid field so that litho machine x to, y to size be reduced, it is compacter.
Brief description of the drawings
Fig. 1, Fig. 3, Fig. 6, Fig. 7, Figure 10, Figure 11 and Figure 13 are every configuration states in exchange process in the embodiment of the present invention 1
Schematic top plan view；
Fig. 2, Fig. 4, Fig. 5, Fig. 8, Fig. 9, Figure 12 and Figure 14 are every configuration states in exchange process in the embodiment of the present invention 1
Side view；
Figure 15 is the schematic diagram of power board in the embodiment of the present invention 1；
Figure 16 is the schematic diagram that plate interface is exchanged in the embodiment of the present invention 1；
Figure 17 is the schematic diagram in Figure 16 FF sections；
Figure 18 is schematic diagram after the docking of power board in the embodiment of the present invention 1；
Figure 19 is the schematic top plan view that switch is submerged in the embodiment of the present invention 2；
Figure 20 is the schematic top plan view that switch is submerged in the embodiment of the present invention 3；
In figure, 1.1- exposure regions；1.2- alignment area；2.0- exchanges plate interface；The exposure desks of 2.1- first；2.2- second exposes
Platform；3- balance masses；4.0- immersion liquids field；5.1- manipulator guide rails；5.2- manipulator base；5.3- manipulator arm；5.4-
Power board；6- projection objectives；7.1- position sensor；7.2- alignment mark；7.3- vacuum absorption holes；7.4- vacuum pump drainages hole；
7.5- heating member；7.6- temperature sensor；7.7- flexible seal ring.
Embodiment
Submergence switch provided by the invention is described in detail with method below with reference to Fig. 1 to Figure 20, its
For optional embodiment of the present invention, it is believed that those skilled in the art in the range of of the invention spirit and content is not changed,
It can be modified and polished.
Embodiment 1
The invention provides one kind to submerge switch, for being carried out between the first exposure desk 2.1 and the second exposure desk
Maintain immersion liquid field 4.0 when immersion liquid exchanges, including mechanical arm assembly, power board 5.4 and be respectively arranged at and be arranged at the first exposure
First in light table 2.1 the second exchange plate interface for exchanging plate interface and being arranged on the second exposure desk 2.2；Wherein, first hand over
Change plate interface and the second exchange plate interface all can refer to the exchange plate interface 2.0 illustrated in figure to understand, located at the first exposure desk
2.1 exchange plate interface 2.0 is the first exchange plate interface；Exchange plate interface 2.0 located at the second exposure desk 2.2 exchanges for second
Plate interface；Although describing it as first and second, only for convenience of description, during circulation swaps, first exposes
Light table and first exchange plate interface process also applicable hereafter the second exposure desk and second exchange plate interface description, second expose
Light table and second exchanges the process of plate interface also applicable hereafter the first exposure desk and the first description for exchanging plate interface, and described the
The structure that one exchange plate interface exchanges plate interface with described second is identical；
The mechanical arm assembly, to movement and carry the power board 5.4：
Comprehensive reference Fig. 1 to Figure 17, the power board 5.4,
To by the mechanical arm assembly it is mobile, be docked to the power board of the first exchange plate interface, i.e. the first exposure desk 2.1
Interface 2.0, and after docking, the exposure desk of power board 5.4 and first can be moved by synchronous driving so that the immersion liquid
Field 4.0 is transferred on the power board 5.4 from the exposure area of first exposure desk 2.1；
Also to be docked to the described second exchange plate interface 2.0 for exchanging plate interface, i.e. the second exposure desk 2.2, and right
After connecing, the exposure desk of power board 5.4 and second can be moved by synchronous driving so that the immersion liquid field 4.0 is from the friendship
The exposure area that plate 5.4 is transferred to second exposure desk is changed, to carry out in exposure thereon.
By above description, to immersion liquid field 4.0 from the first exposure desk to power board 5.4, then self-exchange plate 5.4 to the second
Many necessary functions in the transfer process of exposure desk are set forth, and rely on the submergence of the logical description present invention to exchange dress
Put.
The maintenance problem of immersion liquid field when dual stage exchanges is which solved, and compares closing disc type switch, is avoided
Re-establishing for sealing gas field liquid field, saves the time, compares swap bridge form, reduce the quantity of switch, reduce
Work stage loads, and improves kinematic accuracy, speed to a certain extent, while avoids masking of the switch to strip mirror, more
Because the difference of exchanging policy so that when the one of work stage of dual stage exchange is withdrawn from exposure position, can be supported and soaked by power board
Do not have liquid field so that litho machine x to, y to size be reduced, it is compacter.
The relevant mechanical arm assembly：
The mechanical arm assembly includes manipulator base 5.2 and manipulator arm 5.3, and the power board 5.4 is carried on institute
State manipulator arm 5.3；The manipulator arm 5.3 is installed on the manipulator base 5.2；
The manipulator arm 5.3, the power board 5.4 is driven to translate；Furthermore, it is understood that it can be driven by stretching motion
The power board 5.4 is moved to translate；
The manipulator base 5.2, drive the manipulator arm 5.3 and the catenary motion of power board 5.4 thereon.Enter one
For step, with reference to submergence exchange method hereafter, it can be further depicted as：
Fig. 4 is refer to, drives the manipulator arm 5.3 and power board 5.4 thereon to be declined by descending motion,
So that correspondence position the power board 5.4 can to connecting the exchange plate interface,
Fig. 5 is refer to, drives the manipulator arm 5.3 to be declined by further descending motion, so that
The power board 5.4 and manipulator arm 5.3 separate；
The manipulator arm 5.3 is driven to be risen by ascending motion, so that the energy of the manipulator arm 5.3
Enough dock the power board 5.4 of correspondence position；
Figure 12 is refer to, power board 5.4 by the further ascending motion drive manipulator arm 5.3 and thereon
Risen, so that the power board 5.4 in correspondence position can separate the exchange plate interface 2.0.
In the preferred embodiment of the invention, such as Fig. 1 of the present invention to Figure 18 embodiment 1 and Figure 20 of the present invention signals
Embodiment 3, the mechanical arm assembly also include manipulator guide rail 5.1, the manipulator described in drives edge of manipulator base 5.2
Guide rail 5.1 is moved, and the manipulator guide rail 5.1 is set in the first direction, and the manipulator arm 5.3 drives the power board
5.4 move along the second direction vertical with the first direction；First direction therein can refer to Y direction to understand, and second
Direction can refer to Y direction to understand.So in the embodiment that Fig. 1 to Figure 18 illustrates, manipulator guide rail 5.1 is along X-axis cloth
Put, the telescopic direction of mechanical arm 5.3 is in Y direction.
Further specifically, in the present embodiment, first exposure desk 2.1 is located at the exposure region 1.1 of workbench, described
Second exposure desk 2.2 is located at the alignment area 1.2 of workbench, and the exposure region 1.1 is distributed with the alignment area 1.2 along Y-direction, described
Manipulator guide rail 5.1 is along X to being arranged on the side of the work stage.
In specific implementation process：
Manipulator guide rail 5.1 is arranged on balance mass 3Y direction of principal axis side；Manipulator base 5.2 is led installed in manipulator
It on rail 5.1, and can be moved along Y-direction, and there is Z-direction motor function；Manipulator arm 5.3 is arranged in manipulator base 5.2,
And it can be moved along Y-direction；Power board 5.4 be arranged on manipulator arm 5.3 on, between connected by modes such as vacuum, electromagnetic adsorptions
Connect.
About the power board 5.4 and exchange plate interface 2.0：
Figure 15 to Figure 18 is refer to, the power board 5.4 or first exchanges plate interface and is provided with alignment mark 7.2, described
First exchanges plate interface or power board 5.4 provided with the position sensor 7.1 for detecting the alignment mark 7.2, the power board
5.4 and first exchange and realize alignment by the alignment mark 7.2 and position sensor 7.1 between plate interface, and then are being aligned
After can achieve a butt joint.Power board 5.4 is provided with multiple alignment marks 7.2, by the alignment with position sensor 7.1, will hand over
Change plate 5.4 and accurately docked with exchanging plate interface 2.0.Exchange plate interface 2.0 and be provided with multiple 7.1 position sensors, its quantity and
7.2 alignment marks match.
In further alternative, to realize that accurate docking of the power board 5.4 with exchanging plate interface 2.0 is aligned except using
Outside the alignment of mark 7.2 and position sensor 7.1, it can also simultaneously take or only take the self positioning structure on power board 5.4,
Such as edge is hypotenuse, is provided with alignment pin in power board 5.4.
In the present embodiment, and the preferred embodiment of the invention, the power board 5.4 or first exchanges also to be set on plate interface
There is an adsorption piece, the power board 5.4 connects with exchanging to adsorb by the adsorption piece between plate interface 2.0.Further optional side
In case, adsorption piece uses vacuum absorption holes 7.3, and vacuum absorption holes 7.3 are connect power board 5.4 and power board 2.0 by vacuumizing
Mouth firmly connection.
In the present embodiment, and the preferred embodiment of the invention, vacuum pump drainage is additionally provided with the first exchange plate interface
Hole 7.4, the one end in the vacuum pump drainage hole 7.4 can be communicated to the exchange plate interface 2.0 and the junction of power board 5.4.Very
Empty pump drainage hole 7.4, for the immersion liquid of seepage to be reclaimed, prevent immersion liquid pollution from being exposed positioned at the first exposure desk 2.1, second
The measuring cell of the side of light table 2.2；
In the present embodiment, and the preferred embodiment of the invention, the power board 5.4 or first exchanges also to be set on plate interface
There are a temperature sensor 7.6 and heating member 7.5, the heating member 7.5 is driven detection data according to the temperature sensor 7.6
Regulation heating amount, temperature declines caused by during compensating immersion liquid pump drainage, avoids being pointed to exposure desk 2.1, the side of exposure desk 2.2
The measurement accuracy of the measuring cell on side impacts.
In the present embodiment, and the preferred embodiment of the invention, flexible sealing is additionally provided with the first exchange plate interface
Circle 7.7.Flexible seal ring 7.7, for obstructing leakage of the immersion liquid to exposure desk side, avoid polluting the survey of exposure desk side
Element is measured, while cushioning effect is played with exchanging when plate interface 2.0 docks in power board 5.4, and exposure desk 2.1 can be made, exposed
Light table 2.2 decouples, and prevents from producing motion crosstalk between double-exposure platform, influences high-precision motion.
Certainly, described previously for the described first design for exchanging plate interface, it may be applicable to the second exchange plate interface.
Match with the device, the invention provides one kind to submerge exchange method, comprises the following steps：
S0：Mechanical arm assembly, power board and the exchange plate interface for being respectively arranged at two exposure desks are provided；The present embodiment
In, in the step S0, the mechanical arm assembly includes manipulator base, manipulator arm and manipulator guide rail, the friendship
Change plate and be carried on the manipulator arm；Manipulator base manipulator guide rail described in drives edge moves, and then realizes institute
State translation of the power board along correspondence direction, telescopic direction of the manipulator guide rail perpendicular to the manipulator arm；
S1：The power board is carried by the mechanical arm assembly, positioned at initial position, treats first in exposure side region
After exposure process on exposure desk terminates, into step S2；
Furthermore, it is understood that refer to Fig. 1 and Fig. 2, when double-workpiece-table does not exchange position, immersion liquid field 4.0 is located at exposure desk
On 2.1, manipulator arm 5.3 is in retracted state, and power board 5.4 is located on the side of the Y direction of balance mass 3.Machinery
At hand seat 5.2 minimizes position, under exposure desk 2.1, exposure desk 2.2, not blocks exposure platform 2.1, on exposure desk 2.2
Position measurement part, can be strip mirror, grating scale, grating reading head etc..
S2：The power board 5.4 is moved to by correspondence position by the mechanical arm assembly, and then causes the power board
5.4 positioned at the upside of the exchange plate interface 2.0 of the first exposure desk；
Fig. 3 and Fig. 4 are refer to, further specifically, in the present embodiment, passes through stretching for the manipulator arm 5.3
Contracting, correspondence position is moved to by the power board 5.4；Exposure desk 2.1 has been completed to expose, and manipulator arm 5.3 stretches out, and drives and hands over
Change plate 5.4 and the top of exchange plate interface 2.0 opened up is moved on exposure desk 2.1 along positive Y-direction.
S3：The power board 5.4 is lifted by the mechanical arm assembly so that the exposure of the docking of power board 5.4 first
The exchange plate interface 2.0 of platform；
Comparison chart 3 further specifically, in the present embodiment, in the step S3, passes through the machinery to Fig. 6
At hand seat 5.2 declines the power board 5.4 so that the power board 5.4 docks the exchange plate interface 2.0 of the first exposure desk；Tool
For body, manipulator base 5.2 is moved along negative Z-direction, passes through the alignment mark 7.2 on power board 5.4 as shown in figure 15 and position
The alignment of sensor 7.1 is put, power board 5.4 is accurately docked with exchanging plate interface 2.0；
S4：The mechanical arm assembly separates with the power board 5.4；
Fig. 5 and Fig. 6 are refer to, further specifically, in the present embodiment, in the step S4, passes through the machine
At hand seat 5.2 further declines the manipulator arm 5.3 to tool so that first manipulator arm 5.3 and the power board
5.4 separation；It can specifically be described as：Power board 5.4 disconnects with manipulator arm 5.3, and power board 5.4 is with exchanging plate interface
Realization firmly connection is vacuumized by vacuum absorption holes 7.3 as shown in figure 16 between 2.0, can also be real by electromagnetic adsorption etc.
Now connect.Manipulator base 5.2 continues to move along negative Z-direction, manipulator arm 5.3 is separated with power board 5.4, protects between the two
Appropriate spacing is held, to avoid manipulator arm 5.3 from producing disturbance to exposure desk 2.1, and protection is played to dropping for power board 5.4
Effect.
S5：Power board described in synchronizing moving and the first exposure desk, so that exposure of the immersion liquid field 4.0 from the first exposure desk
Light zone-transfer is to the power board 5.4；
In the further alternative embodiment of the present invention, in the step S5, power board 5.4 described in synchronizing moving, the
One exposure desk and manipulator base 5.2；Specifically, contrast is with reference to figure 3 and Fig. 6, power board 5.4, the first exposure desk and machinery
At hand seat 5.2 together moves along positive x direction；
S6：Mobile the second exposure desk that alignment is completed in alignment side region so that the power board is located at the second exposure desk
Exchange plate interface upside；Fig. 7 and Fig. 8 are refer to, exposure desk 2.2 is completed to after the processes such as locating tab assembly, moving to exposure side
Region 1.1, and under power board 5.4.
S7：Rise second exposure desk so that the power board exchanges plate interface docking with the second exposure desk；
In further alternative embodiment, Fig. 8 and Fig. 9 are refer to, exposure desk 2.2 moves along positive Z-direction, passes through such as Figure 15
The alignment of alignment mark 7.2 and position sensor 7.1 on shown power board 5.4, by power board 5.4 and is located at exposure desk
Exchange plate interface 2.0 on 2.2 accurately docks, and power board 5.4 is with exchanging between plate interface 2.0 by vacuum as shown in figure 16
Adsorption hole 7.3 vacuumizes realization firmly connection, can also be connected by realizations such as electromagnetic adsorptions.
S8：The exchange plate interface 2.0 and power board 5.4 of first exposure desk are separated, and first exposure desk is moved
To alignment side region 1.2；Furthermore, it is understood that refer to Figure 10, exposure desk 2.1 disconnects with power board 5.4, exposure desk 2.1
Move to alignment side region 1.2.
S9：The exposure desk of power board 5.4 and second described in synchronizing moving, so that immersion liquid field 4.0 is from the power board
5.4 are transferred to the exposure area of the second exposure desk, to carry out in exposure thereon, after completing exposure, into step S10；
In the further alternative embodiment of the present invention, in the step S9, power board 5.4 described in synchronizing moving, the
Two exposure desks and manipulator base 5.2.As shown in figure 11, manipulator base 5.2, exposure desk 2.2 together move along positive X-direction,
So that immersion liquid field 4.0 is transferred on exposure desk 2.2, appropriate spacing is kept between manipulator arm 5.3 and power board 5.4, it is right
Dropping for power board 5.4 plays a protective role.
S10：The power board 5.4. is lifted by the mechanical arm assembly so that the power board 5.4 and second exposes
The exchange plate interface 2.0 of platform separates.
In the further alternative embodiment of the present invention, in the step S10, by the manipulator base 5.2
Rise the manipulator arm 5.3 so that the manipulator arm 5.3 docks with the power board 5.4, and then passes through the machinery
The at hand further up power board 5.4 of seat 5.2 so that the power board 5.4 exchanges plate interface 2.0 with the second exposure desk
Separation.
In specific implementation process, exposure desk 2.2 is disconnected with power board 5.4, and manipulator base 5.2 is moved along positive Z-direction,
Power board 5.4 is jacked up and is adsorbed onto on manipulator arm 5.3, subsequent manipulator arm 5.3 is retracted to the Y-axis of balance mass 3
On the side of direction, subsequent manipulator base 5.2 is moved along negative Z-direction minimizes position, and subsequent exposure desk 2.2 carries out post-exposure work
Sequence.
Post-exposure platform 2.1 complete bottom sheet, upper piece, alignment etc. is after process, realized using above-mentioned similar step and exposure desk
2.2 exchange, whole process move in circles, and immersion liquid field 4.0 is supported maintenance all the time.
Embodiment 2
Figure 19 is refer to, the present embodiment and the difference of embodiment 1 are：
In the present embodiment, without manipulator guide rail present in embodiment 1 and embodiment 3, the manipulator base 5.2
Quantity with manipulator arm 5.3 is two groups, and the interval of manipulator base 5.2 is fixed on the side of work stage described in two groups, its
In manipulator base 5.2 described in one group and manipulator arm 5.3 realize that the power board of the first exchange plate interface/second connects to drive
Mouth docks with power board 5.4；Manipulator base 5.2 described in another group and manipulator arm 5.3 are realizing exchange plate interface
With the separation of power board.
Further for specific layout designs, difference is also expansible to be described as：
Two sets of manipulator bases 5.2 and manipulator arm 5.3, manipulator are provided with the Y direction side of balance mass 3
Base 5.2 is located at fixed position in X-axis, is not moved along x-axis.When exposure desk 2.1, exposure desk 2.2 exchange, a manipulator arm
5.3 be responsible for by power board 5.4 are placed on exchange plate interface 2.0 on, another manipulator arm 5.3 be responsible for by power board 5.4 from
Exchange and removed on plate interface 2.0, it is rear to receive after wherein power board 5.4 is placed on exchange plate interface 2.0 by manipulator arm 5.3
Return, to prevent the exchange campaign of blocks exposure platform.
It is corresponding, base of the submergence exchange method that the present embodiment is provided in the basic step S0 to S10 of the present invention
On plinth, following optional improvement has been done：
In the step S0, the mechanical arm assembly includes manipulator base 5.2 and manipulator arm 5.3, the friendship
Change plate 5.4 and be carried on the manipulator arm 5.3；The manipulator arm 5.3 is installed on the manipulator base 5.2；It is described
Manipulator base 5.2 and the quantity of manipulator arm 5.3 are two；Wherein, the first manipulator arm Matching installation is in the first machine
Tool at hand seat, the second manipulator arm Matching installation is in the second manipulator base；
In the step S2, flexible by first manipulator arm moves to the power board 5.4 correspondingly
Position；
In the step S3, the power board 5.4 is declined by the first manipulator base therein, to achieve a butt joint；
In the step S4, first manipulator arm is further declined by the first manipulator base therein,
So that first manipulator arm separates with the power board 5.4；
In the step S10, second manipulator arm is retractable to required position, passes through the second manipulator bottom
Seat rises second manipulator arm, so that second manipulator arm is to connecting the power board 5.4, and passes through
It is further to rise the interface of power board 5.4 for separating the power board and the second exposure desk.
Embodiment 3
Figure 20 is refer to, the present embodiment and the difference of embodiment 1 are：
In the case where arranging manipulator guide rail, first exposure desk 2.1 is located at the exposure region 1.1 of workbench, institute
The alignment area 1.2 that the second exposure desk 2.2 is located at workbench is stated, the exposure region 1.1 is distributed with the alignment area 1.2 along Y-direction, institute
Manipulator guide rail is stated along X to being arranged on the side of the workbench.Specifically, by manipulator guide rail 5.1, manipulator base
5.2nd, manipulator arm 5.3 is arranged on the X-direction side of balance mass 3, and exposure desk 2.1, the exchange of exposure desk 2.2 will be along Y
Axle is carried out.
In summary, the present invention proposes a kind of submergence switch and method, can be applied to use interferometer or planar light
Grid carry out the occasion of position measurement, solve the problems, such as the maintenance of immersion liquid field during dual stage exchange, and compare closing disc type and exchange
Device, re-establishing for sealing gas field liquid field is avoided, the time is saved, compares swap bridge form, reduce switch
Quantity, work stage load is reduced, improves kinematic accuracy, speed to a certain extent, while avoid switch to strip
The masking of mirror, more because the difference of exchanging policy so that, can be by handing over when the one of work stage of dual stage exchange is withdrawn from exposure position
Change plate support immersion liquid field so that litho machine x to, y to size be reduced, it is compacter.
Claims (14)
1. one kind submergence switch, for carrying out maintaining submergence when submergence exchanges between the first exposure desk and the second exposure desk
Liquid field, it is characterised in that：The submergence switch includes mechanical arm assembly, power board, is arranged on first exposure desk
First exchange plate interface and be arranged on second exposure desk second exchange plate interface, it is described first exchange plate interface and
The structure of the second exchange plate interface is identical；
The mechanical arm assembly, to movement and carry the power board：
The power board, to by the mechanical arm assembly it is mobile, be docked to described first and exchange plate interface, and after docking,
The power board and the first exposure desk are moved by synchronous driving so that exposure region of the immersion liquid field from first exposure desk
Domain is transferred on the power board；
Plate interface also is exchanged to be docked to described second, and after docking, the power board and the second exposure desk are synchronously driven
Dynamic movement so that the immersion liquid field is transferred to the exposure area of second exposure desk from the power board, to carry out at it
On exposure.
2. submergence switch as claimed in claim 1, it is characterised in that：The mechanical arm assembly include manipulator base and
Manipulator arm, the power board are carried on the manipulator arm；The manipulator arm is installed on the manipulator base；
The manipulator arm, the power board is driven to translate；
The manipulator base, drive the manipulator arm and power board catenary motion thereon.
3. submergence switch as claimed in claim 2, it is characterised in that：The mechanical arm assembly is also led including manipulator
Rail, manipulator base manipulator guide rail described in drives edge are moved, and the manipulator guide rail is set in the first direction, described
Manipulator arm drives the power board to be moved along the second direction vertical with the first direction.
4. submergence switch as claimed in claim 3, it is characterised in that：First exposure desk is located at the exposure of workbench
Area, second exposure desk are located at the alignment area of workbench, and the exposure region is distributed with the alignment area along Y-direction, the machinery
Hand guide rail is along X to being arranged on the side of the workbench.
5. submergence switch as claimed in claim 3, it is characterised in that：First exposure desk is located at the exposure of workbench
Area, second exposure desk are located at the alignment area of workbench, and the exposure region is distributed with the alignment area along Y-direction, the machinery
Hand guide rail is arranged in along Y-direction on the side of the workbench.
6. submergence switch as claimed in claim 2, it is characterised in that：The number of the manipulator base and manipulator arm
Measure as two groups, manipulator base interval is fixed on the side of work stage described in two groups, manipulator base described in one of which and
Manipulator arm realizes that the first exchange plate interface/second exchange plate interface docks with power board to drive；Separately
Manipulator base described in one group and manipulator arm to realize described second exchange plate interface/described first exchange plate interface with
The separation of power board.
7. submergence switch as claimed in claim 1, it is characterised in that：The power board or the first exchange plate interface
Alignment mark is provided with, described first exchanges the position sensor of plate interface or power board provided with the detection alignment mark,
Alignment is realized by the alignment mark and position sensor between the power board and the first exchange plate interface, and then is being aligned
After can achieve a butt joint.
8. submergence switch as claimed in claim 1, it is characterised in that：On the power board or the first exchange plate interface also
Provided with adsorption piece, the power board is exchanged to adsorb by the adsorption piece between plate interface with first and connected.
9. submergence switch as claimed in claim 1, it is characterised in that：Vacuum is additionally provided with the first exchange plate interface
Pump drainage hole.
10. submergence switch as claimed in claim 1, it is characterised in that：On the power board or the first exchange plate interface
It is additionally provided with temperature sensor and heating member, the heating member is according to the detection data regulation heating amount of the temperature sensor.
11. submergence switch as claimed in claim 1, it is characterised in that：It is additionally provided with the first exchange plate interface soft
Property sealing ring.
12. one kind submergence exchange method, it is characterised in that：Comprise the following steps：
S0：Mechanical arm assembly, power board and the exchange plate interface for being respectively arranged at two exposure desks are provided；
S1：The power board is carried by the mechanical arm assembly, positioned at initial position, treats the first exposure in exposure side region
After exposure process on platform terminates, into step S2；
S2：The power board is moved to by correspondence position by the mechanical arm assembly, and then causes the power board positioned at the
The upside of the exchange plate interface of one exposure desk；
S3：The power board is lifted by the mechanical arm assembly so that the power board docks the power board of the first exposure desk
Interface；
S4：The mechanical arm assembly separates with the power board；
S5：Power board described in synchronizing moving and the first exposure desk, so that immersion liquid field is from the exposure area of the first exposure desk
It is transferred to the power board；
S6：Mobile the second exposure desk that alignment is completed in alignment side region so that the power board is located at the friendship of the second exposure desk
Change the upside of plate interface；
S7：Rise second exposure desk so that the power board exchanges plate interface docking with the second exposure desk；
S8：The exchange plate interface and power board of first exposure desk are separated, and first exposure desk is moved into alignment lateral areas
Domain；
S9：Power board described in synchronizing moving and the second exposure desk, so that immersion liquid field is transferred to second from the power board
The exposure area of exposure desk, to carry out in exposure thereon, after completing exposure, into step S10；
S10：The power board is lifted by the mechanical arm assembly so that the power board of the power board and the second exposure desk connects
Mouth separation.
13. submergence exchange method as claimed in claim 12, it is characterised in that：In the step S0, the manipulator group
Part includes manipulator base and manipulator arm, and the power board is carried on the manipulator arm；The manipulator arm peace
Loaded on the manipulator base；The manipulator base and the quantity of manipulator arm are two；Wherein, the first manipulator arm
Matching installation is in the first manipulator base, and the second manipulator arm Matching installation is in the second manipulator base；
In the step S2, the power board is moved to correspondence position by flexible by first manipulator arm；
In the step S3, the power board is declined by the first manipulator base therein, to achieve a butt joint；
In the step S4, first manipulator arm is further declined by the first manipulator base therein so that
First manipulator arm separates with the power board；
In the step S10, second manipulator arm is retractable to required position, by second manipulator base
Second manipulator arm is risen, so that second manipulator arm is to connecting the power board, and by further
Rising separate the power board and the second exposure desk exchange plate interface.
14. submergence exchange method as claimed in claim 12, it is characterised in that：In the step S0, the manipulator group
Part includes manipulator base, manipulator arm and manipulator guide rail, and the power board is carried on the manipulator arm；The machine
At hand seat manipulator guide rail described in drives edge moves tool, and then realizes translation of the power board along correspondence direction, the machine
Telescopic direction of the tool hand guide rail perpendicular to the manipulator arm；
In the step S2, by the flexible of the manipulator arm, the power board is moved into correspondence position；
In the step S3, the power board is declined by the manipulator base so that the power board docking first exposes
The exchange plate interface of light table；
In the step S4, the manipulator arm is further declined by the manipulator base, so that the machinery
Hand arm separates with the power board；
In the step S5, power board, the first exposure desk and manipulator base described in synchronizing moving；
In the step S9, while mobile power board, the second exposure desk and the manipulator base；
In the step S10, pass through the manipulator base and rise the manipulator arm so that the manipulator arm with
Power board docking, and then pass through the further up power board of the manipulator base so that the power board and the
The exchange plate interface separation of two exposure desks.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610791454.4A CN107783380B (en) | 2016-08-31 | 2016-08-31 | Immersion exchange apparatus and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610791454.4A CN107783380B (en) | 2016-08-31 | 2016-08-31 | Immersion exchange apparatus and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107783380A true CN107783380A (en) | 2018-03-09 |
| CN107783380B CN107783380B (en) | 2020-10-16 |
Family
ID=61450682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610791454.4A Active CN107783380B (en) | 2016-08-31 | 2016-08-31 | Immersion exchange apparatus and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107783380B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023109000A1 (en) * | 2021-12-13 | 2023-06-22 | 长鑫存储技术有限公司 | Photoresist pattern forming method and projection exposure apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1862384A (en) * | 2006-06-13 | 2006-11-15 | 上海微电子装备有限公司 | Submersible photoetching apparatus soaking liquid flow field maintaining system |
| CN102193331A (en) * | 2010-03-12 | 2011-09-21 | Asml荷兰有限公司 | Lithographic apparatus and method |
-
2016
- 2016-08-31 CN CN201610791454.4A patent/CN107783380B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1862384A (en) * | 2006-06-13 | 2006-11-15 | 上海微电子装备有限公司 | Submersible photoetching apparatus soaking liquid flow field maintaining system |
| CN102193331A (en) * | 2010-03-12 | 2011-09-21 | Asml荷兰有限公司 | Lithographic apparatus and method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023109000A1 (en) * | 2021-12-13 | 2023-06-22 | 长鑫存储技术有限公司 | Photoresist pattern forming method and projection exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107783380B (en) | 2020-10-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2660656B1 (en) | Backside registration apparatus and method | |
| CN106919002B (en) | Exposure method, Bao Guang Installed is set and manufacturing method | |
| JP2009528561A (en) | Platform, apparatus, system and method for processing and analyzing substrates | |
| US7916277B2 (en) | Exposing apparatus having substrate chuck of good flatness | |
| TW200528938A (en) | Exposure device, exposure method and device manufacturing method | |
| CN112204707A (en) | Multi-substrate processing for digital lithography systems | |
| KR20190029697A (en) | Device and method for bonding alignment | |
| CN101477316A (en) | Gravity compensator | |
| CN107783380A (en) | Submerge switch and method | |
| US20080259327A1 (en) | Device for Inspecting a Microscopic Component | |
| CN102768470B (en) | Reticle stage vertical measuring apparatus | |
| CN117087305B (en) | Multilayer alignment superposition equipment and method | |
| CN103197506B (en) | A kind of litho machine adopting mirror image silicon wafer stage | |
| CN203101813U (en) | Exposure machine | |
| CN102243440B (en) | Lithography machine for monitoring positional precision of wafer stage | |
| JP4847584B2 (en) | Immersion flow field maintenance system for an immersion lithography machine | |
| CN207051662U (en) | Immersed photoetching machine base station system, immersed photoetching machine | |
| CN106997159A (en) | Wafer pre-alignment mechanism, exposure device and exposure method | |
| US11480742B1 (en) | Micro device mass transfer tool | |
| CN106154760B (en) | A kind of exposure device and exposure method | |
| CN109427616A (en) | A kind of silicon wafer gluing and prealignment detection device and method | |
| CN105892241B (en) | A kind of device and method of litho machine large area static state focusing and leveling | |
| CN103676488B (en) | Mask connecting mechanism and there is the mask platform of this mask connecting mechanism | |
| US20060044637A1 (en) | Hologram changing system | |
| CN111965944A (en) | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |