CN107783380B - Immersion exchange apparatus and method - Google Patents
Immersion exchange apparatus and method Download PDFInfo
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- CN107783380B CN107783380B CN201610791454.4A CN201610791454A CN107783380B CN 107783380 B CN107783380 B CN 107783380B CN 201610791454 A CN201610791454 A CN 201610791454A CN 107783380 B CN107783380 B CN 107783380B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides an immersion exchange device and a method, the device comprises a manipulator component, an exchange plate, a first exchange plate interface arranged on a first exposure platform and a second exchange plate interface arranged on a second exposure platform, wherein the first exchange plate interface and the second exchange plate interface have the same structure; the manipulator assembly is used for moving and bearing the exchange plate: the exchange plate is used for being moved by the manipulator assembly and butted with the first exchange plate interface, and after the exchange plate is butted with the first exchange plate interface, the exchange plate and the first exposure platform are synchronously driven to move, so that the immersion liquid field is transferred onto the exchange plate from an exposure area of the first exposure platform; the immersion liquid field is transferred from the exchange plate to an exposure area of the second exposure station so as to carry out exposure on the immersion liquid field.
Description
Technical Field
The invention relates to the field of photoetching, in particular to an immersion exchange device and method.
Background
Immersion lithography requires filling a high refractive index liquid between the lower surface of the last lens of the projection objective of the lithography machine and the photoresist on the silicon wafer. The numerical aperture NA of the projection objective is nsin θ, where n is the refractive index of the medium between the projection objective and the silicon wafer, and θ is the maximum incident angle of the light. The numerical aperture of an immersion lithography system increases by a factor of n over a conventional lithography system with the same maximum angle of incidence. From the fourier optics perspective, the numerical aperture plays the role of the spatial frequency low pass filter threshold. Injecting a high refractive index immersion liquid can cause higher spatial frequency light waves to be incident on the photoresist, thus improving imaging resolution.
The adoption of a double-workpiece-table photoetching machine enables dry measurement and immersion exposure to be possible: namely, the silicon wafer is measured in a dry mode at the measurement position, after the accurate three-dimensional appearance of the silicon wafer is obtained, the defocusing amount of the silicon wafer can be obtained in advance by using a special focus detection algorithm of a double-workpiece-table photoetching machine, then the silicon wafer can be positioned to an ideal focal plane to complete immersion exposure without leveling and focusing measurement at the exposure position, and seamless connection between the double-workpiece-table technology and the immersion exposure technology is achieved.
Known exchange devices of lithography machines have been provided with closing disks, exchange bridges, etc. When the closed disc type is used for immersion exchange of the two workpiece tables, the closed disc temporarily seals the bottom of the immersion device to maintain the immersion liquid field, the closed disc is removed again after the workpiece table aligned with the closed disc moves to the exposure position, and the immersion liquid field is supported and maintained by the silicon wafer instead. The exchange bridge mode is turned over through an exchange bridge plate, with two work piece platforms coupling, realizes the continuation support in immersion liquid field, though exchange time reduces, but the exchange bridge plate can lead to the fact to shield work piece platform all around, is not suitable for the occasion that adopts the rectangular mirror of interferometer to carry out position measurement, and this kind of exchange bridge need all set up a set of exchange bridge at every work piece platform in addition, can increase the load of work piece platform, is unfavorable for the promotion of motion precision, speed.
Disclosure of Invention
In order to remedy the above mentioned disadvantages, the present invention provides an immersion exchange device for maintaining an immersion liquid field when performing immersion liquid exchange between a first exposure station and a second exposure station, the immersion exchange device comprising a manipulator assembly, an exchange plate, and a first exchange plate interface disposed on the first exposure station and a second exchange plate interface disposed on the second exposure station, the first exchange plate interface and the second exchange plate interface having the same structure;
the manipulator assembly is used for moving and bearing the exchange plate:
the exchange plate is used for being moved by the manipulator assembly and butted with the first exchange plate interface, and after the exchange plate and the first exposure platform are butted, the exchange plate and the first exposure platform can be synchronously driven to move, so that the immersion liquid field is transferred onto the exchange plate from an exposure area of the first exposure platform;
the immersion liquid field is transferred from the exchange plate to an exposure area of the second exposure station so as to carry out exposure on the immersion liquid field.
Optionally, the manipulator assembly includes a manipulator base and a manipulator arm, and the exchange plate is supported on the manipulator arm; the manipulator arm is arranged on the manipulator base;
the mechanical arm drives the exchange plate to translate;
the manipulator base drives the manipulator arm and the exchange plate on the manipulator arm to move vertically.
Optionally, the manipulator assembly further includes a manipulator guide rail, the manipulator base is driven to move along the manipulator guide rail, the manipulator guide rail is arranged along a first direction, and the manipulator arm drives the exchange plate to move along a second direction perpendicular to the first direction.
Optionally, the first exposure stage is located in an exposure side region of the workbench, the second exposure stage is located in an alignment side region of the workbench, the exposure region and the alignment region are distributed along the Y direction, and the robot guide rail is arranged on a side edge of the workpiece stage along the X direction.
Optionally, the first exposure stage is located in an exposure area of the workbench, the second exposure stage is located in an alignment area of the workbench, the exposure area and the alignment area are distributed along the Y direction, and the manipulator guide rail is arranged on the side edge of the workbench along the Y direction.
Optionally, the number of the mechanical arm bases and the mechanical arm arms is two, the two sets of the mechanical arm bases are fixed on the side edge of the workpiece table at intervals, and one set of the mechanical arm bases and the mechanical arm arms is used for driving to realize the butt joint of the first exchange plate interface/the second exchange plate interface and the exchange plate and the separation of the exchange plate and the mechanical arm; and the other group of the mechanical arm base and the mechanical arm are used for realizing the separation of the second exchange board interface/the first exchange board interface and the exchange board.
Optionally, an alignment mark is arranged on the exchange board or the first exchange board interface, a position sensor for detecting the alignment mark is arranged on the exchange board interface or the exchange board, alignment between the exchange board and the first exchange board interface is realized through the alignment mark and the position sensor, and then butt joint can be realized after alignment.
Optionally, an adsorption piece is further arranged on the exchange plate or the first exchange plate interface, and the exchange plate and the first exchange plate interface are in adsorption connection through the adsorption piece.
Optionally, the first exchange plate interface is further provided with a vacuum exhaust hole.
Optionally, a temperature sensor and a heating element are further arranged on the exchange plate or the first exchange plate interface, and the heating element is driven to adjust the heating value according to detection data of the temperature sensor.
Optionally, a flexible sealing ring is further disposed on the first exchange plate interface.
The invention also provides an immersion exchange method, which comprises the following steps:
s0: providing a manipulator assembly, an exchange board and exchange board interfaces respectively arranged on two exposure tables;
s1: the exchange plate is carried by the manipulator assembly, is located at an initial position, and enters step S2 after the exposure process on the first exposure platform in the exposure side area is finished;
s2: translating the exchange plate to a corresponding position through the manipulator assembly, so that the exchange plate is positioned on the upper side of an exchange plate interface of the first exposure platform;
s3: lifting the exchange plate through the manipulator assembly to enable the exchange plate to be in butt joint with an exchange plate interface of a first exposure platform;
s4: the manipulator assembly is separated from the exchange plate;
s5: synchronously moving the exchange plate and the first exposure platform so that the immersion liquid field is transferred from the exposure area of the first exposure platform to the exchange plate;
s6: moving the second exposure station which completes alignment in the alignment side area so that the exchange plate is positioned at the upper side of the exchange plate interface of the second exposure station;
s7: raising the second exposure platform to enable the exchange plate to be in butt joint with an exchange plate interface of the second exposure platform;
s8: separating the exchange plate interface and the exchange plate of the first exposure platform, and moving the first exposure platform to an alignment side area;
s9: synchronously moving the exchange plate and the second exposure platform, so that the immersion liquid field is transferred from the exchange plate to an exposure area of the second exposure platform for exposure thereon, and after the exposure is finished, entering step S10;
s10: and lifting the exchange plate through the manipulator assembly so that the exchange plate is separated from an exchange plate interface of the second exposure platform.
Optionally, in step S0, the robot assembly includes a robot base and a robot arm, and the exchange plate is carried on the robot arm; the manipulator arm is arranged on the manipulator base; the number of the mechanical arm bases and the number of the mechanical arm arms are two; the first mechanical arm is mounted on the first mechanical arm base in a matching mode, and the second mechanical arm is mounted on the second mechanical arm base in a matching mode;
in step S2, translating the swap plate to a corresponding position by extension and contraction of the first robot arm;
in the step S3, the exchange board is lowered through the first robot base to realize docking;
in the step S4, the first robot arm is further lowered by the first robot base thereof so that the first robot arm is separated from the exchange board;
in step S10, the second robot arm extends to a desired position, and the second robot arm is raised by the second robot base so that the second robot arm abuts against the exchange plate, and the exchange plate is separated from the exchange plate interface of the second exposure stage by further raising.
Optionally, in step S0, the manipulator assembly includes a manipulator base, a manipulator arm and a manipulator guide rail, and the exchange plate is carried on the manipulator arm; the mechanical hand base is driven to move along the mechanical hand guide rail, so that the exchange plate can translate along the corresponding direction, and the mechanical hand guide rail is perpendicular to the stretching direction of the mechanical hand arm;
in step S2, the swap plate is translated to a corresponding position by the extension and contraction of the robot arm;
in step S3, the swap board is lowered by the robot base so that the swap board interfaces with the swap board interface of the first exposure station;
in step S4, the robot arm is further lowered by the robot base so that the robot arm is separated from the exchange board;
in the step S5, the exchange plate, the first exposure stage, and the robot base are moved in synchronization;
in the step S9, the exchange plate, the second exposure stage, and the robot base are moved in synchronization;
in step S10, the robot base raises the robot arm to bring the robot arm into abutment with the exchange board, and the robot base further raises the exchange board to bring the exchange board into abutment with the exchange board interface of the second exposure station.
The invention provides an immersion exchange device and method, which can be applied to the occasion of position measurement by adopting an interferometer or a plane grating, solves the maintenance problem of an immersion liquid field during double-platform exchange, avoids the reestablishment of a sealed gas field and a liquid field compared with a closed disc type exchange device, saves time, reduces the number of the exchange devices compared with an exchange bridge form, reduces the load of a workpiece platform, improves the movement precision and speed to a certain extent, avoids the shielding of a long mirror by the exchange device, and can support the immersion liquid field by an exchange plate when one workpiece platform is withdrawn from an exposure position during double-platform exchange due to the difference of exchange strategies, so that the sizes of a photoetching machine in the x direction and the y direction are reduced and the photoetching machine is more compact.
Drawings
Fig. 1, fig. 3, fig. 6, fig. 7, fig. 10, fig. 11, and fig. 13 are schematic top views of respective position states in the exchange process in embodiment 1 of the present invention;
fig. 2, fig. 4, fig. 5, fig. 8, fig. 9, fig. 12, and fig. 14 are side views of respective position states in the exchange process in embodiment 1 of the present invention;
FIG. 15 is a schematic view of an exchange board in embodiment 1 of the present invention;
fig. 16 is a schematic diagram of a switch board interface in embodiment 1 of the present invention;
FIG. 17 is a schematic view of the FF cross-section of FIG. 16;
FIG. 18 is a schematic diagram showing the exchange board in example 1 of the present invention after butt joint;
FIG. 19 is a schematic top view of an immersion exchange apparatus according to embodiment 2 of the present invention;
FIG. 20 is a schematic top view of an immersion exchange apparatus according to example 3 of the present invention;
in the figure, 1.1-exposed area; 1.2-alignment area; 2.0-switchboard interface; 2.1-first exposure stage; 2.2-a second exposure stage; 3-balancing mass; 4.0-immersion liquid field; 5.1-manipulator guide rail; 5.2-manipulator base; 5.3-mechanical arm; 5.4-exchange plate; 6-projection objective; 7.1-position sensor; 7.2-alignment mark; 7.3-vacuum adsorption holes; 7.4-vacuum pumping holes; 7.5-heating element; 7.6-temperature sensor; 7.7-Flexible sealing ring.
Detailed Description
The submerged exchange apparatus and method of the present invention will be described in detail with reference to fig. 1 to 20, which are alternative embodiments of the present invention, and it is considered that those skilled in the art can modify and decorate the submerged exchange apparatus and method without departing from the spirit and scope of the present invention.
Example 1
The invention provides an immersion exchange device, which is used for maintaining an immersion liquid field 4.0 when immersion liquid exchange is carried out between a first exposure platform 2.1 and a second exposure platform, and comprises a manipulator assembly, an exchange plate 5.4, a first exchange plate interface and a second exchange plate interface, wherein the first exchange plate interface is arranged on the first exposure platform 2.1, and the second exchange plate interface is arranged on the second exposure platform 2.2; both the first switch board interface and the second switch board interface can be understood by referring to the switch board interface 2.0 illustrated in the figure, and the switch board interface 2.0 provided in the first exposure station 2.1 is the first switch board interface; the exchange board interface 2.0 arranged on the second exposure platform 2.2 is a second exchange board interface; although it is described as first and second, for convenience of description only, in the cyclic switching process, the procedures of the first exposure station and the first switch board interface can also be applied to the following description of the second exposure station and the second switch board interface, and the procedures of the second exposure station and the second switch board interface can also be applied to the following description of the first exposure station and the first switch board interface, and the structures of the first switch board interface and the second switch board interface are the same;
the manipulator assembly is used for moving and bearing the exchange plate 5.4:
with combined reference to fig. 1 to 17, the exchange plates 5.4,
an exchange plate interface 2.0 for being moved by the robot assembly, docked to a first exchange plate interface, i.e. a first exposure station 2.1, and after docking the exchange plate 5.4 and the first exposure station can be driven in a synchronized manner such that the immersion liquid field 4.0 is transferred from the exposure area of the first exposure station 2.1 onto the exchange plate 5.4;
and an exchange plate interface 2.0 for docking to the second exchange plate interface, i.e. the second exposure station 2.2, and after docking, the exchange plate 5.4 and the second exposure station can be synchronously driven to move, so that the immersion liquid field 4.0 is transferred from the exchange plate 5.4 to an exposure area of the second exposure station for exposure thereon.
Through the above description, a number of necessary functions in the transfer process of the immersion liquid field 4.0 from the first exposure station to the exchange plate 5.4 and then from the exchange plate 5.4 to the second exposure station are explained, and the immersion exchange device of the present invention is described by means of this logic.
The maintenance problem of the immersion liquid field during double-station exchange is solved, compared with a closed disc type exchange device, the reestablishment of the liquid field of a sealed gas field is avoided, the time is saved, compared with an exchange bridge form, the number of the exchange devices is reduced, the load of a workpiece table is reduced, the movement precision and speed are improved to a certain extent, meanwhile, the shielding of the exchange devices on a long strip lens is avoided, and due to the difference of exchange strategies, when one workpiece table of the double-station exchange is evacuated from an exposure position, the immersion liquid field can be supported by an exchange plate, so that the sizes of the photoetching machine in the x direction and the y direction can be reduced, and the photoetching machine is more compact.
Regarding the robot assembly:
the manipulator assembly comprises a manipulator base 5.2 and a manipulator arm 5.3, and the exchange plate 5.4 is borne on the manipulator arm 5.3; the manipulator arm 5.3 is arranged on the manipulator base 5.2;
the mechanical arm 5.3 drives the exchange plate 5.4 to translate; further, the exchange plates 5.4 can be driven in translation by a telescopic movement;
and the manipulator base 5.2 drives the manipulator arm 5.3 and the exchange plate 5.4 thereon to vertically move. Further, in connection with the immersion exchange method below, it may be further described as:
referring to fig. 4, the robot arm 5.3 and the exchange board 5.4 thereon are driven to descend by the descending motion, so that the exchange board 5.4 at the corresponding position can be butted with the exchange board interface,
referring to fig. 5, the robot arm 5.3 is driven to descend by a further descending motion, so that the exchange plate 5.4 is separated from the robot arm 5.3;
the manipulator arm 5.3 is driven to ascend through ascending motion, so that the manipulator arm 5.3 can be butted with the exchange plate 5.4 at a corresponding position;
referring to fig. 12, the robot arm 5.3 and the exchange plate 5.4 thereon are lifted by a further lifting movement, so that the exchange plate 5.4 at the corresponding position can be separated from the exchange plate interface 2.0.
In a preferred embodiment of the present invention, such as embodiment 1 of fig. 1 to 18 and embodiment 3 of the present invention illustrated in fig. 20, the robot assembly further comprises a robot guide 5.1, the robot base 5.2 is driven to move along the robot guide 5.1, the robot guide 5.1 is arranged along a first direction, and the robot arm 5.3 drives the exchanging plate 5.4 to move along a second direction perpendicular to the first direction; the first direction can be understood with reference to the X-axis direction and the second direction can be understood with reference to the Y-axis direction. Therefore, in the embodiment illustrated in fig. 1 to 18, the robot guide 5.1 is arranged along the X-axis, and the extending and retracting direction of the robot arm 5.3 is the Y-axis direction.
More specifically, in this embodiment, the first exposure stage 2.1 is located in an exposure area 1.1 of the stage, the second exposure stage 2.2 is located in an alignment area 1.2 of the stage, the exposure area 1.1 and the alignment area 1.2 are distributed along the Y direction, and the robot guide 5.1 is arranged on the side edge of the stage along the X direction.
In the specific implementation process:
the manipulator guide rail 5.1 is arranged on the side edge of the balance mass 3Y axis direction; the manipulator base 5.2 is arranged on the manipulator guide rail 5.1, can move along the X direction and has a Z-direction movement function; the mechanical arm 5.3 is arranged on the mechanical arm base 5.2 and can move along the Y direction; the exchange plate 5.4 is arranged on the mechanical arm 5.3 and is connected with the mechanical arm in a vacuum mode, an electromagnetic adsorption mode and the like.
Regarding the switchboard 5.4 and the switchboard interface 2.0:
referring to fig. 15 to 18, an alignment mark 7.2 is disposed on the exchange board 5.4 or the first exchange board interface, a position sensor 7.1 for detecting the alignment mark 7.2 is disposed on the first exchange board interface or the exchange board 5.4, and the exchange board 5.4 and the first exchange board interface are aligned through the alignment mark 7.2 and the position sensor 7.1, so that the alignment can be achieved after the alignment. The switch board 5.4 is provided with a plurality of alignment marks 7.2, and the switch board 5.4 is precisely butted with the switch board interface 2.0 through alignment with the position sensor 7.1. The exchange board interface 2.0 is provided with a plurality of 7.1 position sensors, the number of which matches with the 7.2 alignment marks.
In a further alternative, the exchange board 5.4 and the exchange board interface 2.0 may be precisely connected to each other by using a self-positioning structure on the exchange board 5.4, such as a bevel edge, a positioning pin on the exchange board 5.4, or the like, in addition to the alignment of the alignment mark 7.2 and the position sensor 7.1.
In this embodiment and in a preferred embodiment of the present invention, an absorbing member is further disposed on the exchange plate 5.4 or the first exchange plate interface, and the exchange plate 5.4 and the exchange plate interface 2.0 are connected by absorbing through the absorbing member. In a further alternative, the adsorption piece adopts a vacuum adsorption hole 7.3, and the vacuum adsorption hole 7.3 is used for firmly connecting the interface of the exchange plate 5.4 and the interface of the exchange plate 2.0 through vacuumizing.
In this embodiment and in a preferred embodiment of the present invention, the first exchange plate interface is further provided with a vacuum exhaust hole 7.4, and one end of the vacuum exhaust hole 7.4 may be communicated to a connection position of the exchange plate interface 2.0 and the exchange plate 5.4. The vacuum pumping hole 7.4 is used for recovering leaked immersion liquid and preventing the immersion liquid from polluting measuring elements on the side edges of the first exposure platform 2.1 and the second exposure platform 2.2;
in this embodiment and in a preferred embodiment of the present invention, a temperature sensor 7.6 and a heating element 7.5 are further disposed on the exchange plate 5.4 or the interface of the first exchange plate, and the heating element 7.5 is driven to adjust a heating value according to detection data of the temperature sensor 7.6, so as to compensate for a temperature drop caused by pumping of immersion liquid, and avoid affecting measurement accuracy of measurement elements located at the sides of the exposure stage 2.1 and the exposure stage 2.2.
In this embodiment and the preferred embodiment of the present invention, a flexible sealing ring 7.7 is further disposed on the first exchange board interface. And the flexible sealing ring 7.7 is used for blocking the leakage of immersion liquid to the side edge of the exposure table, avoiding polluting measuring elements on the side edge of the exposure table, simultaneously playing a role of buffering when the exchange plate 5.4 is butted with the exchange plate interface 2.0, decoupling the exposure table 2.1 and the exposure table 2.2, and preventing the two exposure tables from generating motion crosstalk and influencing high-precision motion.
Of course, the above design for the first board interface can be applied to the second board interface.
The invention provides an immersion exchange method matched with the device, which comprises the following steps:
s0: providing a manipulator assembly, an exchange board and exchange board interfaces respectively arranged on two exposure tables; in this embodiment, in step S0, the manipulator assembly includes a manipulator base, a manipulator arm, and a manipulator guide rail, and the exchange plate is carried on the manipulator arm; the mechanical hand base is driven to move along the mechanical hand guide rail, so that the exchange plate can translate along the corresponding direction, and the mechanical hand guide rail is perpendicular to the stretching direction of the mechanical hand arm;
s1: the exchange plate is carried by the manipulator assembly, is located at an initial position, and enters step S2 after the exposure process on the first exposure platform in the exposure side area is finished;
further, referring to fig. 1 and 2, when the two workpiece tables are not exchanged, the immersion liquid field 4.0 is located on the exposure table 2.1, the robot arm 5.3 is in a retracted state, and the exchange plate 5.4 is located on the side of the balance mass 3 in the Y-axis direction. The manipulator base 5.2 is lowered to the lowest position, is positioned below the exposure tables 2.1 and 2.2, does not block the position measuring components on the exposure tables 2.1 and 2.2, and can be a long strip mirror, a grating ruler, a grating reading head and the like.
S2: translating the exchange plate 5.4 to a corresponding position through the manipulator assembly, so that the exchange plate 5.4 is positioned at the upper side of an exchange plate interface 2.0 of the first exposure station;
referring to fig. 3 and 4, more specifically, in the present embodiment, the exchanging plate 5.4 is translated to a corresponding position by the extension and contraction of the robot arm 5.3; after the exposure of the exposure platform 2.1 is finished, the manipulator arm 5.3 extends out to drive the exchange plate 5.4 to move along the positive Y direction to the position above an exchange plate interface 2.0 arranged on the exposure platform 2.1.
S3: the exchange plate 5.4 is lifted through the manipulator assembly, so that the exchange plate 5.4 is in butt joint with an exchange plate interface 2.0 of a first exposure platform;
more specifically, compared with fig. 3 to fig. 6, in the present embodiment, in the step S3, the exchange board 5.4 is lowered by the robot base 5.2, so that the exchange board 5.4 is butted against the exchange board interface 2.0 of the first exposure station; specifically, the robot base 5.2 moves in the negative Z-direction, precisely docking the swap plate 5.4 with the swap plate interface 2.0 by aligning the alignment mark 7.2 on the swap plate 5.4 with the position sensor 7.1 as shown in fig. 15;
s4: the manipulator assembly is separated from the exchange plate 5.4;
referring to fig. 5 and 6, more specifically, in the present embodiment, in the step S4, the robot arm 5.3 is further lowered by the robot base 5.2, so that the first robot arm 5.3 is separated from the exchange board 5.4; specifically, it can be described as follows: the exchange plate 5.4 is disconnected from the manipulator arm 5.3, and the exchange plate 5.4 is connected with the exchange plate interface 2.0 firmly by vacuumizing through a vacuum adsorption hole 7.3 as shown in fig. 16, or by electromagnetic adsorption and the like. The manipulator base 5.2 continues to move along the negative Z direction, so that the manipulator arm 5.3 is separated from the exchange plate 5.4, and a proper distance is kept between the manipulator arm 5.3 and the exchange plate 5.4, so that the manipulator arm 5.3 is prevented from disturbing the exposure table 2.1, and the exchange plate 5.4 is protected from falling.
S5: synchronously moving the exchange plate and the first exposure station so that the immersion liquid field 4.0 is transferred from the exposure area of the first exposure station to the exchange plate 5.4;
in a further alternative embodiment of the present invention, in the step S5, the exchange board 5.4, the first exposure stage and the robot base 5.2 are moved synchronously; in particular, with reference to fig. 3 and 6 in contrast, the exchange plate 5.4, the first exposure station and the robot base 5.2 move together in the positive x-direction;
s6: moving the second exposure station which completes alignment in the alignment side area so that the exchange plate is positioned at the upper side of the exchange plate interface of the second exposure station; referring to fig. 7 and 8, after the exposure stage 2.2 completes the alignment measurement, it moves to the exposure side area 1.1 and is located under the exchange plate 5.4.
S7: raising the second exposure platform to enable the exchange plate to be in butt joint with an exchange plate interface of the second exposure platform;
in a further alternative embodiment, referring to fig. 8 and 9, the exposure stage 2.2 is moved in the positive Z direction, the exchange plate 5.4 is precisely butted with the exchange plate interface 2.0 on the exposure stage 2.2 by aligning the alignment mark 7.2 on the exchange plate 5.4 with the position sensor 7.1 as shown in fig. 15, and the exchange plate 5.4 and the exchange plate interface 2.0 are connected firmly by vacuum pumping through the vacuum suction hole 7.3 as shown in fig. 16, or by electromagnetic suction or the like.
S8: separating the exchange plate interface 2.0 and the exchange plate 5.4 of the first exposure station and moving the first exposure station to the alignment side area 1.2; further, referring to fig. 10, the exposure stage 2.1 is disconnected from the exchange plate 5.4, and the exposure stage 2.1 moves to the alignment side area 1.2.
S9: synchronously moving the exchange plate 5.4 and the second exposure station, so that the immersion liquid field 4.0 is transferred from the exchange plate 5.4 to an exposure area of the second exposure station for exposure thereon, and after the exposure is finished, entering step S10;
in a further alternative embodiment of the invention, in step S9, the exchange plate 5.4, the second exposure stage and the robot base 5.2 are moved synchronously. As shown in fig. 11, the robot base 5.2 and the exposure stage 2.2 move together in the positive X direction, so that the immersion liquid field 4.0 is transferred onto the exposure stage 2.2, and the robot arm 5.3 and the exchange plate 5.4 keep a proper distance therebetween, thereby protecting the exchange plate 5.4 from falling.
S10: and lifting the exchange plate 5.4 through the manipulator assembly to separate the exchange plate 5.4 from an exchange plate interface 2.0 of a second exposure station.
In a further alternative embodiment of the present invention, in the step S10, the robot arm 5.3 is lifted by the robot base 5.2, so that the robot arm 5.3 is abutted against the exchange board 5.4, and the exchange board 5.4 is further lifted by the robot base 5.2, so that the exchange board 5.4 is separated from the exchange board interface 2.0 of the second exposure station.
In the specific implementation process, the exposure table 2.2 is disconnected from the exchange plate 5.4, the manipulator base 5.2 moves along the positive Z direction, the exchange plate 5.4 is jacked up and adsorbed onto the manipulator arm 5.3, then the manipulator arm 5.3 is retracted to the side edge of the balance mass 3 in the Y-axis direction, then the manipulator base 5.2 moves along the negative Z direction and is lowered to the lowest position, and then the exposure table 2.2 performs the subsequent exposure process.
After the subsequent exposure platform 2.1 finishes the processes of film unloading, film loading, alignment and the like, the exchange with the exposure platform 2.2 is realized by adopting the similar steps, the whole process is circularly repeated, and the immersion liquid field 4.0 is always supported and maintained.
Example 2
Referring to fig. 19, the difference between the present embodiment and embodiment 1 is:
in this embodiment, the robot guide rails in embodiments 1 and 3 are not provided, the number of the robot bases 5.2 and the number of the robot arms 5.3 are two, the two sets of the robot bases 5.2 are fixed on the side edge of the workpiece table at intervals, wherein one set of the robot base 5.2 and the one set of the robot arm 5.3 are used for driving the first exchange board interface/the second exchange board interface to be in butt joint with the exchange board 5.4; and the other group of the manipulator base 5.2 and the manipulator arm 5.3 is used for realizing the separation of the exchange board interface and the exchange board.
For further specific layout design, the differences can be further described as:
two sets of manipulator bases 5.2 and manipulator arms 5.3 are arranged on the side edge of the balance mass 3 in the Y-axis direction, and the manipulator bases 5.2 are located at fixed positions on the X-axis and do not move along the X-axis. When the exposure tables 2.1 and 2.2 are exchanged, one manipulator arm 5.3 is responsible for placing the exchange plate 5.4 on the exchange plate interface 2.0, and the other manipulator arm 5.3 is responsible for taking the exchange plate 5.4 off the exchange plate interface 2.0, wherein the manipulator arm 5.3 is retracted after placing the exchange plate 5.4 on the exchange plate interface 2.0, so as to prevent the exchange movement of the exposure tables.
Correspondingly, the immersion exchanging method provided by the embodiment is optionally modified based on the steps S0 to S10 as follows:
in step S0, the robot assembly includes a robot base 5.2 and a robot arm 5.3, and the exchanging plate 5.4 is carried on the robot arm 5.3; the manipulator arm 5.3 is arranged on the manipulator base 5.2; the number of the mechanical arm bases 5.2 and the number of the mechanical arm arms 5.3 are two; the first mechanical arm is mounted on the first mechanical arm base in a matching mode, and the second mechanical arm is mounted on the second mechanical arm base in a matching mode;
in step S2, the exchange plate 5.4 is translated to a corresponding position by the extension and retraction of the first robot arm;
in step S3, the exchange board 5.4 is lowered by the first robot base therein to realize docking;
in step S4, the first robot arm is further lowered by the first robot base thereof, so that the first robot arm is separated from the exchange board 5.4;
in step S10, the second robot arm extends to a desired position, and is raised by the second robot base, so that the second robot arm abuts against the exchange plate 5.4, and the exchange plate is separated from the interface of the exchange plate 5.4 of the second exposure station by further raising.
Example 3
Referring to fig. 20, the difference between the present embodiment and embodiment 1 is:
in the case of a robot guide rail, the first exposure station 2.1 is located in an exposure area 1.1 of the work table, the second exposure station 2.2 is located in an alignment area 1.2 of the work table, the exposure area 1.1 and the alignment area 1.2 are distributed in the Y direction, and the robot guide rail is arranged on the side of the work table in the Y direction. Specifically, the robot guide 5.1, the robot base 5.2, and the robot arm 5.3 are disposed on the side of the balance mass 3 in the X-axis direction, and the exchange between the exposure stage 2.1 and the exposure stage 2.2 is performed along the Y-axis.
In summary, the present invention provides an immersion exchanging apparatus and method, which can be applied to the location measurement by using an interferometer or a plane grating, and solve the problem of maintaining an immersion liquid field during double stage exchange, and avoid the reestablishment of a sealed gas field liquid field and save time compared with a closed disk type exchanging apparatus.
Claims (13)
1. An immersion exchange apparatus for maintaining an immersion liquid field during immersion exchange between a first exposure station and a second exposure station, comprising: the immersion exchange device comprises a manipulator assembly, an exchange plate, a first exchange plate interface arranged on the first exposure platform and a second exchange plate interface arranged on the second exposure platform, and the first exchange plate interface and the second exchange plate interface have the same structure;
the manipulator assembly is used for detachably moving and bearing the exchange plate:
the exchange plate is used for being moved by the manipulator assembly and butted with the first exchange plate interface, after the exchange plate is butted with the manipulator assembly, the exchange plate is separated from the manipulator assembly, and the exchange plate and the first exposure platform are synchronously driven to move, so that the immersion liquid field is transferred onto the exchange plate from the exposure area of the first exposure platform;
the exchange plate is also butted to the second exchange plate interface, after the exchange plate is butted, the exchange plate is separated from the manipulator assembly, and the exchange plate and the second exposure station are driven to move synchronously, so that the immersion liquid field is transferred from the exchange plate to an exposure area of the second exposure station to carry out exposure on the immersion liquid field;
the mechanical arm assembly comprises one or two groups of mechanical arm bases and mechanical arm arms, and the exchange plate is borne on the mechanical arm arms; the manipulator arm is arranged on the manipulator base;
when the manipulator assembly comprises a group of manipulator bases and manipulator arms, the manipulator assembly further comprises a manipulator guide rail arranged on the side edge of the workbench along a first direction, and the manipulator bases are movably arranged on the manipulator guide rail along the first direction;
when the manipulator assembly comprises two groups of manipulator bases and manipulator arms, the two groups of manipulator bases are fixedly arranged on the side edge of the workbench at intervals;
the manipulator base has a Z-direction movement function; the manipulator arm can move along a second direction perpendicular to the first direction;
the mechanical arm has a withdrawing state, when the mechanical arm is in the withdrawing state, the exchange plate is positioned on the side edge of the balance mass along the second direction, and the mechanical arm base is lowered to the lowest position and positioned below the first exposure platform and the second exposure platform.
2. The immersion exchanger apparatus of claim 1, wherein:
the mechanical arm drives the exchange plate to translate;
the manipulator base drives the manipulator arm and the exchange plate on the manipulator arm to move vertically.
3. The immersion exchanger apparatus of claim 1, wherein: the first direction is the X direction, the second direction is the Y direction, first exposure platform is located the exposure area of workstation, the second exposure platform is located the alignment area of workstation, the exposure area with the alignment area is along the Y to the distribution, the manipulator guide rail along the X to arranging on the side of workstation.
4. The immersion exchanger apparatus of claim 1, wherein: the first direction is Y direction, the second direction is X direction, the first exposure platform is located the exposure area of workstation, the second exposure platform is located the alignment area of workstation, the exposure area with the alignment area is along Y to the distribution, the manipulator guide rail along Y to arranging on the side of workstation.
5. The immersion exchanger apparatus of claim 1, wherein: when the manipulator assembly comprises two groups of manipulator bases and manipulator arms, one group of manipulator base and manipulator arm is used for driving to realize the butt joint of the first exchange board interface/the second exchange board interface and the exchange board; and the other group of the mechanical arm base and the mechanical arm are used for realizing the separation of the second exchange board interface/the first exchange board interface and the exchange board.
6. The immersion exchanger apparatus of claim 1, wherein: the exchange board or the first exchange board interface is provided with an alignment mark, the first exchange board interface or the exchange board is provided with a position sensor for detecting the alignment mark, the exchange board and the first exchange board interface are aligned through the alignment mark and the position sensor, and then the butt joint can be realized after the alignment.
7. The immersion exchanger apparatus of claim 1, wherein: the exchange board or the first exchange board interface is also provided with an adsorption piece, and the exchange board is connected with the first exchange board interface through the adsorption piece in an adsorption manner.
8. The immersion exchanger apparatus of claim 1, wherein: and the first exchange plate interface is also provided with a vacuum pumping hole.
9. The immersion exchanger apparatus of claim 1, wherein: the heat exchanger is characterized in that a temperature sensor and a heating element are further arranged on the exchange plate or the first exchange plate interface, and the heating element adjusts the heating value according to the detection data of the temperature sensor.
10. The immersion exchanger apparatus of claim 1, wherein: and a flexible sealing ring is also arranged on the first exchange plate interface.
11. An immersion exchange method, characterized by: the method comprises the following steps:
s0: providing a manipulator assembly, an exchange board and exchange board interfaces respectively arranged on two exposure tables; the mechanical arm assembly comprises a group of mechanical arm bases and mechanical arm arms, and the exchange plate is borne on the mechanical arm arms; the manipulator arm is arranged on the manipulator base; the manipulator assembly further comprises a manipulator guide rail arranged on the side edge of the workbench along a first direction, and the manipulator base is movably arranged on the manipulator guide rail along the first direction;
s1: the exchange plate is carried by the manipulator assembly, is located at an initial position, and enters step S2 after the exposure process on the first exposure platform in the exposure side area is finished; the initial position comprises that the exchange plate is positioned on the side edge of the balance mass along a second direction vertical to the first direction, the manipulator arm of the manipulator assembly is in a withdrawing state, and the manipulator base of the manipulator assembly is lowered to the lowest position and positioned below the first exposure table and the second exposure table;
s2: translating the exchange plate to a corresponding position through the manipulator assembly, so that the exchange plate is positioned on the upper side of an exchange plate interface of the first exposure platform;
s3: lifting the exchange plate through the manipulator assembly to enable the exchange plate to be in butt joint with an exchange plate interface of a first exposure platform;
s4: the manipulator assembly is separated from the exchange plate;
s5: synchronously moving the exchange plate and the first exposure platform so that the immersion liquid field is transferred from the exposure area of the first exposure platform to the exchange plate;
s6: moving the second exposure station which completes alignment in the alignment side area so that the exchange plate is positioned at the upper side of the exchange plate interface of the second exposure station;
s7: raising the second exposure platform to enable the exchange plate to be in butt joint with an exchange plate interface of the second exposure platform;
s8: separating the exchange plate interface and the exchange plate of the first exposure platform, and moving the first exposure platform to an alignment side area;
s9: synchronously moving the exchange plate and the second exposure platform, so that the immersion liquid field is transferred from the exchange plate to an exposure area of the second exposure platform for exposure thereon, and after the exposure is finished, entering step S10;
s10: and lifting the exchange plate through the manipulator assembly so that the exchange plate is separated from an exchange plate interface of the second exposure platform.
12. The immersion exchange method as claimed in claim 11, wherein:
in step S2, the swap plate is translated to a corresponding position by the extension and contraction of the robot arm;
in step S3, the swap board is lowered by the robot base so that the swap board interfaces with the swap board interface of the first exposure station;
in step S4, the robot arm is further lowered by the robot base so that the robot arm is separated from the exchange board;
in the step S5, the exchange plate, the first exposure stage, and the robot base are moved in synchronization;
in the step S9, the exchange plate, the second exposure stage, and the robot base are moved simultaneously;
in step S10, the robot base raises the robot arm to bring the robot arm into abutment with the exchange board, and the robot base further raises the exchange board to bring the exchange board into abutment with the exchange board interface of the second exposure station.
13. An immersion exchange method, characterized by: the method comprises the following steps:
s0: providing a manipulator assembly, an exchange board and exchange board interfaces respectively arranged on two exposure tables; the mechanical arm assembly comprises two groups of mechanical arm bases and mechanical arm arms, and the exchange plate is borne on the mechanical arm arms; the manipulator arm is arranged on the manipulator base; the two groups of manipulator bases are fixedly arranged on the side edge of the workbench at intervals; the two groups of manipulator bases are respectively a first manipulator base and a second manipulator base; the two groups of mechanical arms are respectively a first mechanical arm and a second mechanical arm; the first mechanical arm is mounted on the first mechanical arm base in a matching mode, and the second mechanical arm is mounted on the second mechanical arm base in a matching mode;
s1: the exchange plate is carried by the manipulator assembly, is located at an initial position, and enters step S2 after the exposure process on the first exposure platform in the exposure side area is finished; the exchange plate is borne on the first mechanical arm and located on the side edge of the balance mass along a second direction perpendicular to the first direction, the mechanical arms of the two groups of mechanical arm assemblies are in a withdrawing state, and the mechanical arm bases of the two groups of mechanical arm assemblies are lowered to the lowest position and located below the first exposure platform and the second exposure platform;
s2: translating the exchange plate to a corresponding position through the extension and retraction of the first mechanical arm; so that the exchange plate is positioned at the upper side of the exchange plate interface of the first exposure platform;
s3: lowering the swap plate via the first robot mount; enabling the exchange board to be in butt joint with an exchange board interface of a first exposure station;
s4: further lowering the first manipulator arm through the first manipulator base such that the first manipulator arm is separated from the exchange plate;
s5: synchronously moving the exchange plate and the first exposure platform so that the immersion liquid field is transferred from the exposure area of the first exposure platform to the exchange plate;
s6: moving the second exposure station which completes alignment in the alignment side area so that the exchange plate is positioned at the upper side of the exchange plate interface of the second exposure station;
s7: raising the second exposure platform to enable the exchange plate to be in butt joint with an exchange plate interface of the second exposure platform;
s8: separating the exchange plate interface and the exchange plate of the first exposure platform, and moving the first exposure platform to an alignment side area;
s9: synchronously moving the exchange plate and the second exposure platform, so that the immersion liquid field is transferred from the exchange plate to an exposure area of the second exposure platform for exposure thereon, and after the exposure is finished, entering step S10;
s10: and the second manipulator arm extends to a required position, and is lifted through the second manipulator base, so that the second manipulator arm is in butt joint with the exchange plate, and the exchange plate is separated from an exchange plate interface of the second exposure platform through further lifting.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1862384A (en) * | 2006-06-13 | 2006-11-15 | 上海微电子装备有限公司 | Submersible photoetching apparatus soaking liquid flow field maintaining system |
| CN102193331A (en) * | 2010-03-12 | 2011-09-21 | Asml荷兰有限公司 | Lithographic apparatus and method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1862384A (en) * | 2006-06-13 | 2006-11-15 | 上海微电子装备有限公司 | Submersible photoetching apparatus soaking liquid flow field maintaining system |
| CN102193331A (en) * | 2010-03-12 | 2011-09-21 | Asml荷兰有限公司 | Lithographic apparatus and method |
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