CN107723659B - Mask plate and preparation method for vapor deposition - Google Patents
Mask plate and preparation method for vapor deposition Download PDFInfo
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- CN107723659B CN107723659B CN201711214518.5A CN201711214518A CN107723659B CN 107723659 B CN107723659 B CN 107723659B CN 201711214518 A CN201711214518 A CN 201711214518A CN 107723659 B CN107723659 B CN 107723659B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The present invention relates to a kind of mask plates and preparation method for vapor deposition.The above-mentioned mask plate for vapor deposition includes frame, cross-brace item, blocks item, mask substrate and longitudinal bracing item；Frame offers the first mounting groove, the second mounting groove, third mounting groove and the 4th mounting groove, the first mounting groove and the second mounting groove being laterally extended along frame, and third mounting groove and the 4th mounting groove extend along the longitudinal direction of frame；The both ends of cross-brace item are located in the first mounting groove and the second mounting groove；The both ends blocked article are located in third mounting groove and the 4th mounting groove, cross-brace item and block item overlap joint；Longitudinal bracing item and mask substrate bear the pushing gravity of underlay substrate jointly, mitigate mask substrate and is squeezed the deformation generated by underlay substrate, the service life for extending mask plate avoids the problem that the deformation of mask substrate causes the patterns of openings of the effective district of mask substrate to be deformed and colour cast even colour mixture occurs.
Description
Technical field
The present invention relates to the technical fields of Organic Light Emitting Diode, more particularly to a kind of mask plate and system for vapor deposition
Preparation Method.
Background technique
In recent years, Organic Light Emitting Diode (Organic Light Emitting Diode, OLED) display at
For domestic and international popular emerging flat-panel monitor product.When OLED display has self-luminous, wide viewing angle, short reaction
Between, wide colour gamut, low-work voltage, panel is thin, is easy to be made into flexible panel and the advantages such as operating temperature range is wide.
Plating material is heated in a vacuum, is evaporated, makes to evaporate by the vacuum vapour deposition that the preparation of traditional OLED device uses
Atom or atomic radical out is precipitated on the lower underlay substrate of temperature and forms film.The stability of evaporation process determines
The quality of quality of forming film.In order to realize that colorization is shown, need that red, green, blue is deposited respectively in evaporation process using mask method
One layer of very thin metal mask plate is arranged, only in metal mask plate in the corresponding material of three primary colours that is, before underlay substrate
The corresponding organic material of red, green, blue three primary colours is deposited in opening.Due to being used to that the corresponding organic material of red, green, blue three primary colours is deposited
The position of material is accurately defined, and is also that the position of pixel electrode is accurately defined, and makes the opening of mask plate in vapor deposition work
It needs corresponding with pixel electrode position in skill, is not allow for beyond the offset within error range, otherwise will will appear two kinds has
The case where machine material coincides together, so that there is a phenomenon where colour mixtures.
The production of mask plate seeks to guarantee that the opening of mask plate keeps coincideing with the anode pattern of the underlay substrate of design.
However, the situation that the gravity that traditional mask plate is squeezed by underlay substrate pushes, when mask plate is by additional gravity
Pushing when, mask plate deforms, this will violate metal mask plate opening with design underlay substrate anode pattern
Identical original intention is kept, so that luminescent material cannot be deposited according to designed mode, so as to cause colour cast, even
There is phenomena such as colour mixture, the mask plate will be scrapped in this case.Further, since the extruding of underlay substrate, makes on mask plate
There is uneven gauffer situation.
Summary of the invention
Based on this, it is necessary to aiming at the problem that mask plate deforms and the situation of uneven gauffer occurs, provide one kind
Mask plate and preparation method for vapor deposition.
A kind of mask plate for vapor deposition, comprising:
Frame offers the first mounting groove, the second mounting groove, third mounting groove and the 4th mounting groove, first installation
Slot and second mounting groove being laterally extended along the frame, the third mounting groove and the 4th mounting groove are along institute
The longitudinal of frame is stated to extend；
Cross-brace item, the both ends of the cross-brace item are located at first mounting groove and second mounting groove
It is interior；
Block item, the both ends blocked article are located in the third mounting groove and the 4th mounting groove, described
Cross-brace item and the item that blocks overlap；
Mask substrate, the number at least two of the mask substrate, two mask substrates are parallel to each other, Mei Gesuo
State mask substrate be placed in it is described block on item and the frame, it is described block item for block the two neighboring mask substrate it
Between gap；And
Longitudinal bracing item, the longitudinal bracing item be placed in it is described block on item, the top surface of the longitudinal bracing item with it is described
The distance between top surface of frame is less than or equal to the top surface of the mask substrate and the distance between the top surface of the frame.
The sag of chain of the longitudinal bracing item is less than the sag of chain of the mask substrate in one of the embodiments, makes
The step of application of subsequent magnetic force systems makes mask substrate flatten with certain reserved space, also makes longitudinal bracing item first
Underlay substrate is first touched, mask substrate is made to avoid the extruding of underlay substrate, is deformed and damages to control mask substrate
The degree scrapped can preferably avoid mask plate from the situation of uneven fold occur.
The frame includes frame body, the first lug boss and the second lug boss in one of the embodiments, and described
One mounting groove, second mounting groove, the third mounting groove and the 4th mounting groove are opened on the frame body,
First boss is connect in the third mounting groove and with the frame body, and second boss is in described
It is connect in 4th mounting groove and with the frame body；Described block offers the first escape groove and the second escape groove on item, institute
The first boss is stated in first escape groove, second boss is in second escape groove, the longitudinal direction
Support bar is also placed on first lug boss and second lug boss, is made to block item and is preferably positioned on frame；In addition,
Longitudinal bracing item is also placed on the first lug boss and the second lug boss, props up the first lug boss, the second lug boss and frame jointly
Longitudinal bracing item is supportted, such longitudinal bracing item, which acts on, blocks the power decomposed of item to the first lug boss and the second lug boss
On, that is, longitudinal bracing item is reduced to the active force for blocking item, avoids the deformation for blocking item is larger from leading to opening in mask substrate
Anode pattern on mouthful pattern and underlay substrate cannot preferably coincide or even there are gap, make the masking effect of mask substrate compared with
It is good, to keep the exposure mask precision of mask plate higher.
First escape groove and second escape groove are opened in respectively in one of the embodiments, described blocks item
Both ends.
In one of the embodiments, the frame body, first lug boss and second lug boss one at
Type keeps the structure of frame more compact.
The groove depth of the third mounting groove and the groove depth of the 4th mounting groove are equal in one of the embodiments, make
The depth of parallelism blocked between the top surface of item and the top surface of frame is preferable；The groove depth of first mounting groove and second mounting groove
Groove depth it is equal, keep the depth of parallelism between the top surface of cross-brace item and the top surface of frame preferable, and the top surface due to blocking item
The depth of parallelism between the top surface of frame is preferable, keeps the depth of parallelism between the top surface of mask substrate and the top surface of frame preferable.
The groove depth of the third mounting groove is greater than or equal to the thickness for blocking item in one of the embodiments, by
It is equal with the groove depth of the 4th mounting groove in the groove depth of third mounting groove, make to block and article is fully located at third mounting groove and the 4th installation
In slot, longitudinal bracing item can be preferably placed, is placed in mask substrate entirely on frame, to enable longitudinal bracing item
It is enough to be preferably fixed on frame.
The groove depth of first mounting groove is greater than the thickness for blocking item and the transverse direction in one of the embodiments,
The sum of thickness of support bar, enables that cross-brace item is set to the lower section for blocking item and item is blocked in support, in this way can be preferable
Ground layout occlusion item, mask substrate and longitudinal bracing item.
The mask substrate is equipped with exposure mask effective district in one of the embodiments, to play the role of exposure mask.
A kind of preparation method of the mask plate for vapor deposition, for manufacturing mask plate described in any of the above-described embodiment, institute
Stating preparation method includes:
One frame is provided；
The cross-brace item is welded on the frame；
The item that blocks is welded on the frame；
The longitudinal bracing item is respectively welded in the frame and described is blocked on item；
The mask substrate is respectively welded in the frame and described is blocked on item.
The above-mentioned mask plate and preparation method for vapor deposition, the first mounting groove and the second mounting groove are along the transverse direction of frame
Extend, third mounting groove and the 4th mounting groove extend along the longitudinal direction of frame, and the both ends of cross-brace item are located at the first peace
In tankage and the second mounting groove, the both ends blocked article are located in third mounting groove and the 4th mounting groove, and cross-brace item
With block item overlap and support block item, mask substrate and in vapor deposition when support substrate substrate, avoid blocking item in the cross of frame
It is larger to direction sagging deflections；The both ends blocked article are located in third mounting groove and the 4th mounting groove, each mask substrate
It is placed in and blocks on item and frame, make to block item and frame supports mask substrate jointly, avoid mask substrate in the longitudinal direction side of frame
Letting droop, it is larger to deform；Gap between two neighboring mask substrate is blocked due to blocking item, organic molecule material is avoided to penetrate
Gap between two neighboring mask substrate plays the role of blocking；Longitudinal bracing item, which is placed in, to be blocked on item, and longitudinal bracing item
The distance between top surface and the top surface of frame are less than or equal to the distance between top surface and top surface of frame of mask substrate, avoid
Because longitudinal bracing item protrusion caused by underlay substrate cannot be fitted closely with mask substrate so that longitudinal bracing item can be with
Advantageous support substrate substrate is without introducing unfavorable factor, and longitudinal bracing item and mask substrate are born under underlay substrate jointly
Ballast power alleviates mask substrate and is squeezed the deformation generated by underlay substrate, extend the service life of mask plate, reduces exposure mask
The damage of substrate avoids the deformation of mask substrate that the patterns of openings of the effective district of mask substrate is caused to be deformed and colour cast occur
Or even the problem of colour mixture, it can also be to avoid the problem of mask plate plated film unevenness；Also make simultaneously for the application of subsequent magnetic force systems
The step reserved space that mask substrate flattens solves the problems, such as that the situation of uneven fold occurs in mask plate.
Detailed description of the invention
Fig. 1 is the schematic diagram of the mask plate for vapor deposition of an embodiment；
Fig. 2 is the partial schematic diagram shown in Fig. 1 for the mask plate of vapor deposition；
Fig. 3 is another partial schematic diagram of mask plate shown in Fig. 2；
Fig. 4 is the line A-A cross-sectional view of mask plate shown in Fig. 1；
Fig. 5 is the line B-B cross-sectional view of mask plate shown in Fig. 1；
Fig. 6 is the line C-C cross-sectional view of mask plate shown in Fig. 1；
Fig. 7 is the line D-D cross-sectional view of mask plate shown in Fig. 1；
Fig. 8 is another schematic diagram of mask plate shown in Fig. 1；
Fig. 9 is the structure feature schematic diagram of mask plate shown in Fig. 1；
Figure 10 is the schematic diagram for the process that magnetic force systems and underlay substrate are applied to mask plate shown in Fig. 1；
Figure 11 is that magnetic force systems and underlay substrate are entirely applied to the schematic diagram on mask plate shown in Fig. 1；
Figure 12 is the schematic diagram for blocking item of mask plate shown in Fig. 1；
Figure 13 is the flow chart for manufacturing mask plate shown in an embodiment.
Specific embodiment
To facilitate the understanding of the present invention, below with reference to relevant drawings to for vapor deposition mask plate and preparation method carry out
A more complete description.The preferred embodiment of the mask plate and preparation method for vapor deposition is given in attached drawing.But for being deposited
Mask plate and preparation method can be realized using many different forms, however it is not limited to embodiment described herein.Phase
Instead, purpose of providing these embodiments is make it is more thorough to the disclosure of mask plate and preparation method for vapor deposition complete
Face.
It should be noted that it can directly on the other element when element is referred to as " being fixed on " another element
Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it, which can be, is directly connected to
To another element or it may be simultaneously present centering elements.Term as used herein " vertical ", " horizontal ", " left side ",
" right side " and similar statement for illustrative purposes only, are not meant to be the only embodiment.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention
The normally understood meaning of technical staff is identical.Herein for vapor deposition mask plate and preparation method it is used in the description
Term be only for the purpose of describing specific embodiments and be not intended to limit the present invention.Term as used herein
" and/or " it include any and all combinations of one or more related listed items.
For example, a kind of mask plate for vapor deposition includes frame, cross-brace item, blocks item, mask substrate and longitudinal direction
Support bar；For example, frame offers the first mounting groove, the second mounting groove, third mounting groove and the 4th mounting groove,；For example, described
First mounting groove and second mounting groove being laterally extended along the frame；For example, the third mounting groove and described
Four mounting grooves extend along the longitudinal direction of the frame；For example, the both ends of the cross-brace item are located at first installation
In slot and second mounting groove；For example, the both ends blocked article are located at the third mounting groove and the 4th peace
In tankage, the cross-brace item and the item that blocks are overlapped；For example, the number at least two of the mask substrate；For example,
Two mask substrates are parallel to each other；For example, each mask substrate is placed in described block on item and the frame；Example
Such as, the item that blocks is for blocking the gap between the two neighboring mask substrate；For example, the longitudinal bracing item is placed in institute
It states and blocks on item；For example, the distance between the top surface of the longitudinal bracing item and the top surface of the frame are less than or equal to described
The distance between the top surface of the top surface of mask substrate and the frame.For example, a kind of mask plate for vapor deposition includes frame, cross
To support bar, block item, mask substrate and longitudinal bracing item；Frame offers the first mounting groove, the second mounting groove, third peace
Tankage and the 4th mounting groove, first mounting groove and second mounting groove being laterally extended along the frame, described
Three mounting grooves and the 4th mounting groove extend along the longitudinal direction of the frame；The both ends of the cross-brace item are located at institute
It states in the first mounting groove and second mounting groove；The both ends blocked article are located at the third mounting groove and described
In four mounting grooves, the cross-brace item and the item that blocks are overlapped；The number at least two of the mask substrate, two institutes
Mask substrate is stated to be parallel to each other, each mask substrate be placed in it is described block on item and the frame, the item that blocks is used for
Block the gap between the two neighboring mask substrate；The longitudinal bracing item blocks on item described in being placed in, longitudinal branch
The top surface of the distance between the top surface of stay and the top surface of the frame less than or equal to the mask substrate and the frame
The distance between top surface.
As shown in Figure 1, Figure 2 and Figure 3, the mask plate 10 for vapor deposition of an embodiment includes frame 100, cross-brace item
200, item 300, mask substrate 400 and longitudinal bracing item 500 are blocked.Frame offers the first mounting groove 110, the second mounting groove
120, third mounting groove 130 and the 4th mounting groove 140.First mounting groove and second mounting groove are along the frame
It is laterally extended, the third mounting groove and the 4th mounting groove extend along the longitudinal direction of the frame；That is, frame has laterally
With longitudinal direction；The extending direction of first mounting groove and second mounting groove is parallel, the third mounting groove and described
The extending direction of four mounting grooves is parallel, and the extending direction of first mounting groove and the 4th mounting groove is perpendicular；Example
Such as, frame is rectangular frame.As shown in figure 4, the both ends of the cross-brace item are located at first mounting groove and described
In second mounting groove.As shown in figure 5, the both ends blocked article are located at the third mounting groove and the 4th mounting groove
Interior, the cross-brace item and the item that blocks overlap.The number at least two of the mask substrate, two exposure mask bases
Plate is parallel to each other, each mask substrate be placed in it is described block on item and the frame, referring also to Fig. 6 and Fig. 7, the screening
Blend stop is used to block the gap between the two neighboring mask substrate.The longitudinal bracing item is placed in described block on item.Such as
Shown in Fig. 8, the distance between top surface and the top surface of the frame of the longitudinal bracing item are less than or equal to the mask substrate
Top surface and the frame the distance between top surface.
The both ends blocked article are located in third mounting groove and the 4th mounting groove, and cross-brace item and block item overlap joint
And support and block item, mask substrate and support substrate substrate when vapor deposition, avoid blocking item in the sagging change of the transverse direction of frame
Shape is larger；The both ends blocked article are located in third mounting groove and the 4th mounting groove, each mask substrate be placed in block item and
On frame, make to block item and frame support mask substrate jointly, avoid mask substrate in frame longitudinal direction sagging deflections compared with
Greatly；Gap between two neighboring mask substrate is blocked due to blocking item, avoids organic molecule material through two neighboring exposure mask
Gap between substrate plays the role of blocking；Longitudinal bracing item, which is placed in, to be blocked on item, and the top surface of longitudinal bracing item and frame
The distance between top surface is less than or equal to the distance between top surface and top surface of frame of mask substrate, avoids because of longitudinal bracing item
Protrusion caused by underlay substrate cannot be fitted closely with mask substrate so that longitudinal bracing item can advantageous support lining
Substrate is without introducing unfavorable factor, and longitudinal bracing item and mask substrate bear the pushing gravity of underlay substrate jointly, mitigates
Mask substrate is squeezed the deformation generated by underlay substrate, extends the service life of mask plate, reduces the damage of mask substrate,
It avoids the deformation of mask substrate that the patterns of openings of the effective district of mask substrate is caused to be deformed and colour cast even colour mixture occurs
Problem, can also be to avoid the problem of mask plate plated film unevenness；Also become mask substrate simultaneously for the application of subsequent magnetic force systems
Smooth step reserved space solves the problems, such as that the situation of uneven fold occurs in mask plate.
For example, the distance between the top surface of the longitudinal bracing item and the top surface of the frame are equal to the mask substrate
The distance between the top surface of top surface and the frame makes longitudinal bracing item and the common support substrate substrate of mask substrate, Ke Yigeng
Mitigate mask substrate well and squeezed the deformation generated by underlay substrate, extends the service life of mask plate, reduce mask substrate
Damage avoids the deformation of mask substrate that the patterns of openings of the effective district of mask substrate is caused to be deformed and colour cast occurs and even mix
The problem of color.
For example, frame is square frame, cross-brace item blocks item and longitudinal bracing item in a rectangular parallelepiped shape, laterally props up
Stay is adapted with the first mounting groove and the second mounting groove respectively, is blocked and article is mutually fitted with third mounting groove and the 4th mounting groove respectively
It answers, make cross-brace item and blocks item and be preferably positioned on frame.For another example, the extending direction of cross-brace item and item is blocked
Extending direction is mutually perpendicular to, and mask plate is made to distribute as net shape.For example, the first mounting groove and the second mounting groove are along the cross of frame
To extension, and the center line of the first mounting groove is overlapped with the center line of the second mounting groove, makes the first mounting groove and the second mounting groove
By being disposably process, the manufacture difficulty of mask plate is greatly reduced；Third mounting groove and the 4th mounting groove are along frame
It is longitudinal extend, and the center line of third mounting groove is overlapped with the center line of the 4th mounting groove, makes third mounting groove and the 4th peace
Tankage greatly reduces the manufacture difficulty of mask plate by being disposably process.For example, the number of cross-brace item is two
A, the number of the first mounting groove and the second mounting groove is two, and the both ends of each cross-brace article are located at corresponding
In one mounting groove and corresponding second mounting groove, two cross-brace items support jointly blocks item, avoid blocking the deformation of item compared with
Greatly.For another example, two cross-brace items are parallel to each other, and there are distances between two cross-brace items, make two cross-brace items
Preferably item, mask substrate and underlay substrate are blocked in support.Referring again to Fig. 2, for example, frame includes the first frame side 140, second
Frame in 150, third frame 160 and the 4th frame side 170, the first frame while both ends respectively with the second frame while and the 4th frame side connect,
Third frame while both ends respectively with the second frame it is outlying from the first frame while the outlying end from the first frame side in end and the 4th frame connect
It connects, the first frame is parallel to each other while with third frame, and the second frame is parallel to each other while with four frames, and two cross-braces article are with
One frame side is parallel, make the first frame in, the second frame, third frame while and when four frames surround square frame jointly.Two first peaces
Tankage is opened on the 4th frame side, and two the second mounting grooves are opened on the second frame side.Third mounting groove is opened in first
On frame side, the 4th mounting groove is opened on third frame side.For another example, the distance between two described cross-braces article are equal to described the
Cross-brace item the distance between of one frame while with neighbouring first frame, and the distance between two cross-brace items are equal to
Cross-brace item the distance between of third frame while with the neighbouring third frame, in this case, the first frame side, third
Item is blocked in frame side and two cross-brace mutual distance supports, keeps the deflection for blocking item minimum, ensure that covering for mask plate
Film precision.
For example, the number for blocking item is N+1, the number of mask substrate be it is N number of, N+1 block item and are parallel to each other, N number of
Mask substrate is parallel to each other, and each blocks item and be parallel to each other with each mask substrate.Third mounting groove and the 4th mounting groove
Number is N+1, each blocks and article is located in corresponding third mounting groove and corresponding 4th mounting groove；N+1 block item
It is overlapped with cross-brace item, cross-brace item is made to support N+1 to block item respectively；The number of longitudinal bracing item is N+1, N+
1 longitudinal bracing item and N number of mask substrate interval are arranged side by side, and N+1 longitudinal bracing item is parallel to each other, and make N+1 longitudinal direction
Support bar can preferably support substrate substrate, keep the pushing gravity of underlay substrate suffered by support bar longitudinally in each smaller, in this way
The deflection of single longitudinal bracing item can be reduced.For another example, N+1 longitudinal bracing item is spaced apart, longitudinally in each support bar with
It each blocks that item is corresponding, keeps the deflection of support bar longitudinally in each more uniform.For example, being deposited between two neighboring mask substrate
Item is blocked at one, makes to block gap of the item for blocking between two mask substrates and blocks item in other embodiments and also use
In blocking the gap between mask substrate of the third frame in neighbouring third frame while, and for blocking the 4th frame side and neighbouring the
Gap between the mask substrate on four frame sides.For example, the distance between two neighboring longitudinal bracing article is equal to the 4th frame Bian Yulin
The distance between the longitudinal bracing article on the nearly 4th frame side, the distance between two neighboring longitudinal bracing item are equal to the second frame side
With the distance between the longitudinal bracing item on neighbouring second frame side, the deflection of longitudinal bracing item can be made minimum, ensure that
The exposure mask precision of mask plate.In the present embodiment, N=3.It is appreciated that in other embodiments, the number of longitudinal bracing item
N+1 can be less than, for example, a longitudinal bracing item is arranged at interval of two mask substrates, in the stress for guaranteeing mask substrate
The usage amount for reducing longitudinal bracing item under the lesser situation of deflection, reduces the manufacturing cost of mask plate.
As shown in figure 9, the sag of chain of the longitudinal bracing item is less than the mask substrate in one of the embodiments,
Sag of chain, the i.e. amount of naturally drooping of longitudinal bracing item are less than the amount of naturally drooping of mask substrate, make applying for subsequent magnetic force systems
Add the step of making mask substrate flatten with certain reserved space, longitudinal bracing item also made to touch underlay substrate first,
So that mask substrate is avoided the extruding of underlay substrate, is deformed to control mask substrate and damages the degree scrapped, it can be compared with
It avoids mask plate the situation of uneven fold occur well, also i other words, is covered since the amount of naturally drooping of longitudinal bracing item is less than
The amount of naturally drooping of ilm substrate makes to unfold space with certain when upward adsorption of the mask substrate by magnetic force systems.
Figure 10 is the schematic diagram for the process that magnetic force systems and underlay substrate are applied to mask plate, i.e. magnetic force systems 20 and underlay substrate 30 are equal
It moves in the direction of the arrow, during being moved in the direction of the arrow with magnetic force systems 20 and underlay substrate 30, longitudinal bracing item
500 and mask substrate 400 by the magneticaction of magnetic force systems, make the magnetic of magnetic force systems suffered by longitudinal bracing item and mask substrate
Power is increasingly greater than the gravity of itself, is gradually reduced the sag of chain of longitudinal bracing item and mask substrate, until underlay substrate supports
It is connected on longitudinal bracing item 500 and mask substrate 400.Figure 11 is that magnetic force systems and underlay substrate are entirely applied on mask plate
Schematic diagram, the sag of chain of the sag of chain and mask substrate that make longitudinal bracing item are zero, and underlay substrate is connected to completely at this time
On longitudinal bracing item 500 and mask substrate (not shown), due under the nature of longitudinal bracing item before the application of magnetic force systems
The amount of hanging down is less than the amount of naturally drooping of mask substrate, makes the application of magnetic force systems the step of so that mask substrate is flattened with certain
Reserved space also makes longitudinal bracing item touch underlay substrate first, so that mask substrate is made to avoid the extruding of underlay substrate, with
Control mask substrate is deformed and damages the degree scrapped, and mask plate can preferably be avoided the feelings of uneven fold occur
Shape.
As shown in Fig. 2, the frame includes frame body 100a, the first lug boss 100b in one of the embodiments,
With the second lug boss 100c, first mounting groove, second mounting groove, the third mounting groove and the 4th mounting groove
It is opened on the frame body, first boss connects in the third mounting groove and with the frame body
It connects, second boss is connect in the 4th mounting groove and with the frame body；Referring also to Figure 12, the screening
Offer the first escape groove 310 and the second escape groove 320 on blend stop, first boss in first escape groove,
For second boss in second escape groove, the longitudinal bracing article is also placed in first lug boss and described
On two lug bosses, makes to block item and be preferably positioned on frame；In addition, longitudinal bracing item is also placed in the first lug boss and second convex
In the portion of rising, the first lug boss, the second lug boss and frame is set to support longitudinal bracing item jointly, such longitudinal bracing item acts on screening
On the power decomposed to the first lug boss and the second lug boss of blend stop, that is, reduce effect of the longitudinal bracing item to item is blocked
Power avoids the anode pattern blocked in the larger patterns of openings and underlay substrate caused in mask substrate of deformation of item cannot be preferable
It is identical in addition there are gaps, keep the masking effect of mask substrate preferable, to keep the exposure mask precision of mask plate higher.And/or
First escape groove and second escape groove are opened in the both ends for blocking item respectively in one of the embodiments,.
And/or the frame body, first lug boss and second lug boss are integrally formed in one of the embodiments,
Keep the structure of frame more compact.In other embodiments, the frame body, first lug boss and second protrusion
Portion can also each self-forming, and by welding or be glued be connected together.
To keep the depth of parallelism between the top surface of mask substrate and the top surface of frame preferable, institute in one of the embodiments,
The groove depth of the groove depth and the 4th mounting groove of stating third mounting groove is equal, makes between the top surface for blocking item and the top surface of frame
The depth of parallelism is preferable；The groove depth of first mounting groove and the groove depth of second mounting groove are equal, make the top surface of cross-brace item
The depth of parallelism between the top surface of frame is preferable, and since the depth of parallelism between the top surface of the top surface and frame of blocking item is preferable,
Keep the depth of parallelism between the top surface of mask substrate and the top surface of frame preferable.
Preferably to place longitudinal bracing item, in one of the embodiments, the groove depth of the third mounting groove be greater than or
Equal to the thickness for blocking item, since the groove depth of third mounting groove is equal with the groove depth of the 4th mounting groove, make to block item complete
In third mounting groove and the 4th mounting groove, longitudinal bracing item can be preferably placed, is placed in mask substrate entirely
On frame, so that longitudinal bracing item be enable preferably to be fixed on frame.In the present embodiment, the slot of the third mounting groove
It is deep to be equal to the thickness for blocking item, keep the top surface of the top surface for blocking item and frame in the same plane, makes to block item and frame
Frame supports longitudinal bracing item jointly.If the groove depth of third mounting groove is h1, block item with a thickness of t1, then h1=t1.It can manage
Solution, in other embodiments, the groove depth of the third mounting groove are not limited only to be equal to the thickness for blocking item, for example, described
The groove depth of third mounting groove is greater than the thickness for blocking item, makes to block and article is fully located at third mounting groove and the 4th mounting groove
It is interior, it can preferably place block item in this way.For another example, h1-t1 > 0, and 10 μm of 30 μm of < h1-t1 <, make to block item and preferably set
It is placed on frame.
The groove depth of first mounting groove is greater than the thickness for blocking item and the transverse direction in one of the embodiments,
The sum of thickness of support bar, enables that cross-brace item is set to the lower section for blocking item and item is blocked in support, in this way can be preferable
Ground layout occlusion item, mask substrate and longitudinal bracing item.If the groove depth of the first mounting groove be h2, cross-brace item with a thickness of
T2, then h2- (t1+t2) > 0.For another example, 10 μm 30 μm of < of < h2- (t1+t2), make cross-brace item be located at block item lower section and
It can preferably be set on frame.For example, 10 μm of 30 μm of < h1-t1 <, make cross-brace item by 10 μm 30 μm of < of < h2- (t1+t2)
It can be preferably set on frame with item is blocked, and the structure of entire mask plate is more compact.For example, the longitudinal bracing item
Thickness is less than or equal to the thickness of the mask substrate, and longitudinal bracing item and mask substrate is made to bear the pushing of underlay substrate jointly
Gravity alleviates mask substrate and is squeezed the deformation generated by underlay substrate, extend the service life of mask plate, reduces exposure mask base
The damage of plate avoids the deformation of mask substrate that the patterns of openings of the effective district of mask substrate is caused to be deformed and colour cast occur very
It the problem of to colour mixture, can also be to avoid the problem of mask plate plated film unevenness.For example, the thickness of the longitudinal bracing item is equal to described
The thickness of mask substrate, and the distance between the top surface of the longitudinal bracing item and the top surface of the frame are equal to the exposure mask base
The distance between the top surface of the top surface of plate and the frame makes longitudinal bracing item and the common support substrate substrate of mask substrate, can
The deformation generated is squeezed preferably to mitigate mask substrate by underlay substrate, extends the service life of mask plate, reduces exposure mask base
The damage of plate avoids the deformation of mask substrate that the patterns of openings of the effective district of mask substrate is caused to be deformed and colour cast occur very
The problem of to colour mixture.
For example, the groove depth of the third mounting groove is equal to the thickness for blocking item, make the top surface for blocking item and frame
Top surface is in the same plane, makes to block item and frame and supports longitudinal bracing item jointly.The thickness of the longitudinal bracing item is equal to
The thickness of the mask substrate, and the distance between the top surface of the longitudinal bracing item and the top surface of the frame are equal to described cover
The distance between the top surface of the top surface of ilm substrate and the frame makes longitudinal bracing item and the common support substrate base of mask substrate
Plate can preferably mitigate mask substrate and be squeezed the deformation generated by underlay substrate, extend the service life of mask plate, reduction is covered
The damage of ilm substrate avoids the deformation of mask substrate that the patterns of openings of the effective district of mask substrate is caused to be deformed and color occur
The problem of inclined even colour mixture.
The mask substrate is equipped with exposure mask effective district in one of the embodiments, to play the role of exposure mask.For example,
The exposure mask effective district is square-shaped, and the number of the exposure mask effective district be it is multiple, multiple exposure mask effective districts are along mask substrate
Extending direction be spaced apart, make mask substrate have preferable masking effect.
The present invention also provides a kind of preparation methods of mask plate for vapor deposition.Preparation method is for manufacturing any of the above-described reality
Apply mask plate described in example.As shown in figure 13, the preparation method includes:
S101 provides a frame；
The cross-brace item is welded on the frame, is firmly secured to cross-brace item on frame by S103；Tool
Body, cross-brace item is welded in the first mounting groove and the second mounting groove of frame, keeps cross-brace item preferably fixed
In on frame.For example, before the cross-brace item is welded on the frame, and after a frame is provided, also
Comprising steps of cross-brace item is tensioned on frame, keep the amount of naturally drooping of cross-brace item smaller, can preferably support
Block item.For another example, before cross-brace item is tensioned on frame, and after a frame is provided, further comprise the steps of: by
Frame is positioned, and in favor of subsequent cross-brace item, blocks being welded and fixed for item, mask substrate and longitudinal bracing item.
The item that blocks is welded on the frame by S105, is made to block item and is firmly secured on frame；Specifically, will
It blocks and article is welded in the third mounting groove and the 4th mounting groove of frame, make to block item and preferably be fixed on frame.For example, In
It will block before item is welded on frame, and after cross-brace item is welded on frame, further comprising the steps of: will be blocked
Item is tensioned on frame, keeps the amount of naturally drooping for blocking item smaller, can preferably support longitudinal bracing item and mask substrate.It can
To understand, in other embodiments, step S105 and the sequence of step S103 be can be interchanged.
S107, by the longitudinal bracing item be respectively welded in the frame and it is described block on item, keep longitudinal bracing item solid
Due to frame and block on item.For another example, the longitudinal bracing item is being respectively welded in the frame and described is blocking on item it
Before, and block after item is welded on the frame by described, it further comprises the steps of: and the longitudinal bracing item is opened
Tightly, make the amount of naturally drooping of longitudinal bracing item smaller, with preferably support substrate substrate.
S109, by the mask substrate be respectively welded in the frame and it is described block on item, be fixed on mask substrate
It frame and blocks on item.For another example, the mask substrate is respectively welded in the frame and it is described block on item before, and
The longitudinal bracing item is respectively welded in the frame and it is described block on item after, further comprise the steps of: to the exposure mask
Substrate is tensioned, and keeps the amount of naturally drooping of mask substrate smaller, with preferably support substrate substrate.
The above-mentioned mask plate and preparation method for vapor deposition, the first mounting groove and the second mounting groove are along the transverse direction of frame
Extend, third mounting groove and the 4th mounting groove extend along the longitudinal direction of frame, and the both ends of cross-brace item are located at the first peace
In tankage and the second mounting groove, the both ends blocked article are located in third mounting groove and the 4th mounting groove, and cross-brace item
With block item overlap and support block item, mask substrate and in vapor deposition when support substrate substrate, avoid blocking item in the cross of frame
It is larger to direction sagging deflections；The both ends blocked article are located in third mounting groove and the 4th mounting groove, each mask substrate
It is placed in and blocks on item and frame, make to block item and frame supports mask substrate jointly, avoid mask substrate in the longitudinal direction side of frame
Letting droop, it is larger to deform；Gap between two neighboring mask substrate is blocked due to blocking item, organic molecule material is avoided to penetrate
Gap between two neighboring mask substrate plays the role of blocking；Longitudinal bracing item, which is placed in, to be blocked on item, and longitudinal bracing item
The distance between top surface and the top surface of frame are less than or equal to the distance between top surface and top surface of frame of mask substrate, avoid
Because longitudinal bracing item protrusion caused by underlay substrate cannot be fitted closely with mask substrate so that longitudinal bracing item can be with
Advantageous support substrate substrate is without introducing unfavorable factor, and longitudinal bracing item and mask substrate are born under underlay substrate jointly
Ballast power alleviates mask substrate and is squeezed the deformation generated by underlay substrate, extend the service life of mask plate, reduces exposure mask
The damage of substrate avoids the deformation of mask substrate that the patterns of openings of the effective district of mask substrate is caused to be deformed and colour cast occur
Or even the problem of colour mixture, it can also be to avoid the problem of mask plate plated film unevenness；Also make simultaneously for the application of subsequent magnetic force systems
The step reserved space that mask substrate flattens solves the problems, such as that the situation of uneven fold occurs in mask plate.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (10)
1. a kind of mask plate for vapor deposition characterized by comprising
Frame, offers the first mounting groove, the second mounting groove, third mounting groove and the 4th mounting groove, first mounting groove and
Second mounting groove being laterally extended along the frame, the third mounting groove and the 4th mounting groove are along the frame
The longitudinal of frame extends；
Cross-brace item, the both ends of the cross-brace item are located in first mounting groove and second mounting groove；
Block item, the both ends blocked article are located in the third mounting groove and the 4th mounting groove, the transverse direction
Support bar and the item that blocks overlap；
Mask substrate, the number at least two of the mask substrate, two mask substrates are parallel to each other, each described to cover
Ilm substrate is blocked on item and the frame described in being placed in, and the item that blocks is for blocking between the two neighboring mask substrate
Gap；And
Longitudinal bracing item, the longitudinal bracing item be placed in it is described block on item, the top surface of the longitudinal bracing item and the frame
The distance between top surface be less than or equal to the top surface of the mask substrate and the distance between the top surface of the frame；
Wherein, the frame includes frame body, the first lug boss and the second lug boss, first mounting groove, described second
Mounting groove, the third mounting groove and the 4th mounting groove are opened on the frame body, first boss
Connect in the third mounting groove and with the frame body, second boss in the 4th mounting groove and with
The frame body connection；Described block offers the first escape groove and the second escape groove on item, first boss in
In first escape groove, in second escape groove, the longitudinal bracing item is also placed in described second boss
On first lug boss and second lug boss.
2. mask plate according to claim 1, which is characterized in that the sag of chain of the longitudinal bracing item is less than the exposure mask
The sag of chain of substrate.
3. mask plate according to claim 1 or 2, which is characterized in that the thickness of the longitudinal bracing item is less than or equal to
The thickness of the mask substrate.
4. mask plate according to claim 3, which is characterized in that first escape groove and second escape groove difference
It is opened in the both ends for blocking item.
5. mask plate according to claim 3, which is characterized in that the frame body, first lug boss and described
Second lug boss is integrally formed.
6. mask plate according to claim 3, which is characterized in that the groove depth of the third mounting groove and the 4th installation
The groove depth of slot is equal, and the groove depth of the groove depth of first mounting groove and second mounting groove is equal.
7. mask plate according to claim 6, which is characterized in that the groove depth of the third mounting groove is greater than or equal to described
Block the thickness of item.
8. mask plate according to claim 6, which is characterized in that the groove depth of first mounting groove blocks item greater than described
Thickness and the cross-brace item the sum of thickness.
9. mask plate according to claim 1, which is characterized in that the mask substrate is equipped with exposure mask effective district.
10. a kind of preparation method of the mask plate for vapor deposition, which is characterized in that for any one of manufacturing claims 1 to 9
The mask plate, the preparation method include:
One frame is provided；
The cross-brace item is welded on the frame；
The item that blocks is welded on the frame；
The longitudinal bracing item is respectively welded in the frame and described is blocked on item；And
The mask substrate is respectively welded in the frame and described is blocked on item.
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| CN201711214518.5A CN107723659B (en) | 2017-11-28 | 2017-11-28 | Mask plate and preparation method for vapor deposition |
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| CN201711214518.5A CN107723659B (en) | 2017-11-28 | 2017-11-28 | Mask plate and preparation method for vapor deposition |
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Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108441814B (en) | 2018-03-22 | 2020-03-13 | 京东方科技集团股份有限公司 | Mask device, manufacturing method thereof and evaporation system |
| CN108559946B (en) * | 2018-05-14 | 2019-07-23 | 昆山国显光电有限公司 | Mask assembly, main mask plate and cooperation mask plate |
| CN108796434A (en) * | 2018-05-28 | 2018-11-13 | 京东方科技集团股份有限公司 | A kind of mask and preparation method |
| CN108977763B (en) * | 2018-06-20 | 2020-02-14 | 武汉华星光电半导体显示技术有限公司 | Active matrix organic light emitting diode fine shadow mask assembly and manufacturing method thereof |
| CN109182964B (en) * | 2018-08-31 | 2019-11-15 | 云谷（固安）科技有限公司 | Mask plate composition method |
| JP7487481B2 (en) * | 2019-02-06 | 2024-05-21 | 大日本印刷株式会社 | DEPOSITION MASK APPARATUS, MASK SUPPORT MECHANISM, AND METHOD FOR MANUFACTURING DEPOSITION MASK APPARATUS |
| KR101999360B1 (en) * | 2019-05-14 | 2019-07-11 | 주식회사 핌스 | Composite frame elenent for mask assembly for thin film deposition and method for manufacturing thereof |
| CN110066976B (en) * | 2019-06-03 | 2021-04-06 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof, evaporation equipment and vapor deposition equipment |
| CN110565050A (en) * | 2019-10-18 | 2019-12-13 | 云谷（固安）科技有限公司 | mask assembly and evaporation device |
| CN111549316B (en) * | 2020-06-22 | 2022-07-15 | 京东方科技集团股份有限公司 | Mask plate for evaporation |
| CN111733380B (en) * | 2020-06-28 | 2022-10-04 | 武汉华星光电半导体显示技术有限公司 | Mask plate assembly, screen stretching method and evaporation device |
| CN113604777B (en) * | 2021-08-20 | 2023-04-18 | 京东方科技集团股份有限公司 | Supporting plate, mask plate and preparation method of mask plate |
| CN114540769A (en) * | 2022-01-17 | 2022-05-27 | 合肥莱德装备技术有限公司 | Integrated form coating by vaporization system and polybase plate coating by vaporization device |
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| CN105951042A (en) * | 2016-07-01 | 2016-09-21 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
| CN206266698U (en) * | 2016-11-23 | 2017-06-20 | 信利（惠州）智能显示有限公司 | Mask assembly |
| CN206270648U (en) * | 2016-11-23 | 2017-06-20 | 信利（惠州）智能显示有限公司 | Mask supporting construction |
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| KR102420460B1 (en) * | 2016-01-15 | 2022-07-14 | 삼성디스플레이 주식회사 | Mask frame assembly, apparatus and method for manufacturing a display apparatus |
| CN106086782B (en) * | 2016-06-28 | 2018-10-23 | 京东方科技集团股份有限公司 | A kind of mask plate component and its installation method, evaporation coating device |
| CN206289294U (en) * | 2016-12-10 | 2017-06-30 | 信利（惠州）智能显示有限公司 | A kind of high accuracy evaporation metal mask structure being |
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| CN105951042A (en) * | 2016-07-01 | 2016-09-21 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
| CN206266698U (en) * | 2016-11-23 | 2017-06-20 | 信利（惠州）智能显示有限公司 | Mask assembly |
| CN206270648U (en) * | 2016-11-23 | 2017-06-20 | 信利（惠州）智能显示有限公司 | Mask supporting construction |
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