CN107653436A - Mask plate and preparation method thereof, evaporation coating method - Google Patents
Mask plate and preparation method thereof, evaporation coating method Download PDFInfo
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- CN107653436A CN107653436A CN201711043889.1A CN201711043889A CN107653436A CN 107653436 A CN107653436 A CN 107653436A CN 201711043889 A CN201711043889 A CN 201711043889A CN 107653436 A CN107653436 A CN 107653436A
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- Prior art keywords
- mask
- mask plate
- hole
- groove
- plate body
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of mask plate, including mask plate body, mask pattern is provided with the mask plate body, the mask plate body includes relative first surface and second surface, set on the first surface fluted, the groove is located at the region beyond the mask pattern, and the bottom portion of groove is provided through the first through hole of the mask plate body.Correspondingly, the present invention also provides the preparation method and evaporation coating method of a kind of mask plate.The aligning accuracy of mask plate when the present invention can improve evaporation, so as to improve evaporation effect.
Description
Technical field
The present invention relates to the production field of display device, and in particular to a kind of mask plate and preparation method thereof, evaporation coating method.
Background technology
Inkjet technology (Inkjet Printing, IJT) be organic electroluminescent display substrate manufacturing process in often
With technology, when forming flood structure (e.g., cathode layer) in viewing area using inkjet printing, it will usually use open mask plate
(Open Mask), multiple evaporation openings are provided with the mask plate.In evaporation, vapor deposition source and described open can be utilized
Substrate with multiple viewing areas is deposited mask plate, and each evaporation opening on mask plate is corresponding to one on substrate
Viewing area.Therefore, the making precision of mask plate and aligning accuracy directly affect the quality for showing product.
At present, be typically employed on mask plate set registration holes, on substrate set alignment mark mode, by mask plate
Aligned with substrate.But because the thickness of mask plate is larger, therefore, is limited by process conditions, made on mask plate
The precision of registration holes is relatively low, and is difficult to produce the less registration holes of size, so as to influence aligning accuracy, and then influences evaporation effect
Fruit.
The content of the invention
It is contemplated that at least solves one of technical problem present in prior art, it is proposed that a kind of mask plate and its system
Make method, evaporation coating method, the aligning accuracy of mask plate when improving evaporation, so as to improve evaporation effect.
One of in order to solve the above-mentioned technical problem, the present invention provides a kind of mask plate, including mask plate body, the mask
Mask pattern is provided with plate body, the mask plate body includes relative first surface and second surface, first table
Set fluted on face, the groove is located at the region beyond the mask pattern, and the bottom portion of groove is provided through described
The first through hole of mask plate body.
Preferably, the mask plate also includes the mask strip being arranged in the groove, and the thickness of the mask strip is less than
The thickness of mask plate body beyond the groove, the first through hole with the bottom portion of groove is provided with the mask strip
The second through hole institute is completely covered in one-to-one second through hole, the view field of the first through hole towards the mask strip
In region.
Preferably, the mask strip is less than away from the surface of the first through hole or flushes in the mask plate body
First surface.
Preferably, the groove corresponds with the mask strip, and the bearing of trend of the groove and the mask strip
Bearing of trend it is identical, the bottom portion of groove is provided with multiple first through hole.
Preferably, the thickness of the mask plate body is between 270 μm~330 μm;The thickness of the mask strip is at 30 μm
Between~50 μm;The opening size of second through hole is between 95 μm~105 μm.
Preferably, the mask plate also includes installation frame, and the mask plate body is fixed on the installation frame.
Correspondingly, the present invention also provides a kind of preparation method of mask plate, including:
Mask plate body is provided, the mask plate body includes relative first surface and second surface;
Mask pattern is formed on the mask plate body;
Groove is formed on the first surface of the mask plate body, the groove is located at the area beyond the mask pattern
Domain;
The first through hole through the mask plate body is formed in bottom portion of groove.
Preferably, the preparation method also includes:
There is provided installation frame and with the one-to-one mask strip of the groove;
One-to-one second through hole of first through hole with corresponding recesses bottom is formed in the mask strip;
The mask plate body is fixed on the installation frame;
The mask strip is fixedly installed in corresponding groove so that the position of the second through hole in the mask strip with
The position of the first through hole of corresponding recesses bottom corresponds.
Correspondingly, the present invention also provides a kind of evaporation coating method, including:
The display base plate of partial amt in multiple display base plates is deposited in advance using vapor deposition source and above-mentioned mask plate;Its
In, the display base plate include with the one-to-one viewing area of mask regions figure of the mask plate body and with the mask
The one-to-one standard evaporation area of first through hole of plate body;
The position of the mask plate is adjusted, until being deposited by the first through hole to the evaporation material of the display base plate
Area is deposited in the standard in material position;
Remaining display base plate is arranged on to the current location for the display base plate for completing to be deposited in advance, keeps the position of current mask plate
Put, to carry out main evaporation to remaining display base plate using the mask plate and the vapor deposition source.
Preferably, the mask plate also includes being arranged on mask strip in the groove, be provided with the mask strip with
One-to-one second through hole of first through hole of the bottom portion of groove, view field of the first through hole towards the mask strip
The second through hole region is completely covered;
Carrying out the pre- evaporation and during the main evaporation, the second surface of the mask plate body is towards the evaporation
Source.
In the present invention, set fluted on the first surface of mask plate, first through hole is located at bottom portion of groove, therefore, when
When one through hole is directly as registration holes, the thickness for the mask plate body that first through hole (that is, registration holes) runs through has been reduced, so as to
It is more beneficial for improving the making precision of registration holes, and is advantageous to the less registration holes of manufactured size, in order to falls into detection device
Detection range, in order to detect the actual alignment situation of alignment mark on registration holes and substrate, and then be advantageous to improve mask
The aligning accuracy of plate, so as to improve evaporation effect;When first through hole is not directly as registration holes, but mask is set in groove
During the other structures such as bar, can the thickness of the structure be set smaller, and be provided as the second of registration holes on this structure
Through hole, in this case, the thickness for the structure that the second through hole is run through are smaller, are also beneficial to improve the making precision of registration holes,
And be advantageous to the less registration holes of manufactured size, in order to which registration holes fall into the detection range of detection device, and then be advantageous to carry
The aligning accuracy of high mask plate, so as to improve evaporation effect.
Brief description of the drawings
Accompanying drawing is for providing a further understanding of the present invention, and a part for constitution instruction, with following tool
Body embodiment is used to explain the present invention together, but is not construed as limiting the invention.In the accompanying drawings:
Fig. 1 is the top view of mask plate provided by the invention;
Fig. 2 is Tu1Zhong I areas enlarged drawing;
Fig. 3 is the sectional view of the line A-A along Fig. 1;
Fig. 4 is the schematic diagram in the standard evaporation area on display base plate;
Fig. 5 is the preparation method flow chart of mask plate provided by the invention;
Second through hole and the mark schematic diagram of throwing the net on display base plate when Fig. 6 is fixed mask strip;
Fig. 7 is the evaporation coating method schematic diagram that the present invention is carried out using mask plate.
Wherein, reference is:
10th, mask plate body;10a, mask plate body external boundary;11st, mask pattern;12nd, groove;13rd, first through hole;
14th, third through-hole;20th, mask strip;21st, the second through hole;30th, installation frame;30a, installation frame inner boundary;40th, slug;
50th, throw the net mark.
Embodiment
The embodiment of the present invention is described in detail below in conjunction with accompanying drawing.It should be appreciated that this place is retouched
The embodiment stated is merely to illustrate and explain the present invention, and is not intended to limit the invention.
As an aspect of of the present present invention, there is provided a kind of mask plate, with reference to shown in Fig. 1 to Fig. 3, including mask plate body 10,
Mask pattern 11 is provided with mask plate body 10, mask plate body 10 includes relative first surface and second surface, described
Fluted 12 are set on first surface, groove 12 is located at the region beyond mask pattern 11, and the bottom of groove 12 is provided through covering
The first through hole 13 of diaphragm plate body 10.It should be appreciated that bottom surface size of the opening of first through hole 13 less than groove 12.
The mask plate provided by the invention is particularly suitable for use in, and display base plate is deposited, wherein, first through hole 13 can
With directly as registration holes, for the contraposition in evaporation advance line mask plate and display base plate.Wherein, the display base plate includes
With 11 one-to-one viewing area of mask pattern and standard one-to-one with registration holes evaporation area (as shown in Figure 4);
When the registration holes and standard evaporation area align one by one to timing, mask pattern 11 with viewing area one by one., can when being aligned
So that a wherein display base plate to be deposited in advance first with the mask plate, after pre- evaporation, detected and passed through using detection device
The registration holes and be deposited the deposition material to display base plate whether positioned at standard evaporation area in, if deviate the standard evaporation
Area, then adjust the position of mask plate.Wherein, above-mentioned detection device can be that location of pixels calibrates (Pixel Position
Aligenment, PPA) check machine.Certainly, first through hole 13 can not also be directly as registration holes, but are set in groove 12
The other structures such as mask strip are put, and second through hole corresponding with first through hole 13 is set in addition on this structure, the second through hole is made
For registration holes.
Registration holes typically directly are etched on mask plate body in the prior art, for mask plate and pair of display base plate
Position, and because the thickness of mask plate is larger, direct etching easily causes the making precision of registration holes relatively low, causes aligning accuracy to drop
It is low;Also, when the thickness of mask plate is larger, it is difficult to the less registration holes of manufactured size, and the detection range of detection device is that have
Limit, therefore, when registration holes are oversized, detection device is difficult to detect that registration holes and the reality of alignment mark on substrate are right
Position situation, so as to reduce aligning accuracy, and then influence evaporation effect.
And in the present invention, fluted 12 are set on the first surface of mask plate, first through hole 13 is located at the bottom of groove 12, because
This, is when first through hole 13 is directly as registration holes, the thickness for the mask plate body 10 that first through hole 13 (that is, registration holes) runs through
It has been reduced that, so as to be more beneficial for improving the making precision of registration holes, and be advantageous to the less registration holes of manufactured size, in order to
The detection range of detection device is fallen into, in order to detect registration holes and the actual alignment situation of alignment mark on substrate, Jin Eryou
Beneficial to the aligning accuracy for improving mask plate, so as to improve evaporation effect;When first through hole 13 is not directly as registration holes, but
When the other structures such as mask strip are set in groove 12, can the thickness of the structure be set smaller, and set on this structure
As the second through hole of registration holes, in this case, the thickness for the structure that registration holes are run through is smaller, is also beneficial to improve contraposition
The making precision in hole, and be advantageous to the less registration holes of manufactured size, in order to which registration holes fall into the detection range of detection device,
And then be advantageous to improve the aligning accuracy of mask plate, so as to improve evaporation effect.
As the preferred embodiment of the present invention, with reference to shown in Fig. 1 to Fig. 3, the mask plate also includes being arranged on groove
Mask strip 20 in 12, the thickness of mask strip 20 are less than the thickness for the mask plate body 10 being located at beyond groove 12, mask strip 20
On be provided with one-to-one second through hole 21 of the first through hole 13 of the bottom of groove 12, first through hole 13 is towards mask strip 20
The region of the second through hole 21 is completely covered in view field.Compared with mask plate body 10, because the volume of mask strip 20 is smaller,
Structure is simpler, and therefore, the manufacture difficulty for the registration holes that manufactured size is smaller in mask strip 20, precision is higher is smaller.
Specifically, the thickness of mask plate body 10 is between 270 μm~330 μm, and the depth of groove 12 is at 80 μm~120 μm
Between;The width of groove 12 is between 5mm~6mm.
Wherein, mask plate body 10 and mask strip 20 are made of metal, first through hole 13, groove 12, the second through hole
21 etchings are formed.
Precision is higher in order to make, and the second smaller through hole 21, the thickness of mask strip 20 can be arranged into one
Smaller value, specifically, the thickness of mask strip 20 are compared, the thickness of mask strip 20 between 30 μm~50 μm with mask plate body 10
Degree is much smaller than the thickness of mask plate body 10, so as to be advantageous to improve the craft precision for making the second through hole.Specifically, mask is worked as
The thickness of bar 20 when between 30 μm~50 μm, etching formed the second through hole 21 when craft precision can reach ± 5 or better than ±
5。
Specifically, the opening size of the second through hole 21 is between 95 μm~105 μm;The opening size of first through hole 13 exists
Between 3mm~4mm;The width of mask strip 20 is less than the opening size of first through hole 13 between 2mm~4mm.Wherein, institute
State opening size to refer to, the size being open in any direction, for example, when first through hole 13 (or second through hole 21) is circular logical
Kong Shi, its opening size are the diameter of opening;When first through hole 13 (or second through hole 21) is rectangular through-hole, its opening size
For the length or width of opening.In the present invention, the through hole 21 of first through hole 13 and second is specifically configured to rectangular through-hole, in order to examine
The detection of measurement equipment.
Mask plate in the present invention can be used for the display base plate including multiple viewing areas is deposited.Correspondingly, cover
Multiple mask patterns 11 are provided with diaphragm plate body 12, multiple mask patterns 11 are lined up multiple lines and multiple rows, set on mask plate body 12
Multiple grooves 12 are equipped with, the column direction that each groove 12 arranges along mask pattern 11 extends, and is set between every two neighboring groove 12
It is equipped with multiple mask patterns 11.In actual applications, the number of groove can be set according to the size of display base plate.
Wherein, mask pattern 11 is specially the evaporation opening through mask plate body 10, and mask plate can be used for described
The viewing area of display base plate is deposited to form flood structure, e.g., the negative electrode of luminescence unit.
During evaporation, in order that the second through hole 21 must be passed through and be deposited to the position of the deposition material layer on display base plate
Put with the position consistency of the second through hole 21, during evaporation, by mask strip 20 close proximity to display base plate, and in order to prevent mask strip 20 from drawing
Hinder display base plate, it is preferable that mask strip 20 is less than or flushed in the first of mask plate body 10 away from the surface of first through hole 13
Surface.
As shown in figure 1, groove 12 corresponds with mask strip 20, and the bearing of trend of groove 12 and the extension of mask strip 20
Direction is identical, and the bottom of groove 12 is provided with multiple first through hole 13, correspondingly, multiple second through holes is provided with mask strip 20
21.During evaporation, it will be deposited by each second through hole 21 to the actual evaporation area of each deposition material floor on display base plate
The position in standard evaporation area corresponding with display base plate is contrasted, so as to more accurately be adjusted to the position of mask plate
Section.
In the present invention, as shown in figure 4, the standard evaporation area B on display base plate is located at the different mark of two bearing of trends
The extended line infall of bar 40 is remembered, when actual evaporation area of the deposition material by the second through hole 21 on display base plate deviates mark
During quasi- evaporation area B, mobile mask plate, until actual evaporation area B ' aligns with standard evaporation area B.
Further, the mask plate also installation frame 30, mask plate body 10 are fixed on installation frame 30.In this hair
In bright, mask plate body 10, mask strip 20 and installation frame 30 are made of metal, and at this moment, mask strip 20 is using welding
Mode is fixed in groove 12, and mask plate body 10 is also fixed on installation frame 30 by the way of welding.Mask plate body
10 be frame shape, and installation frame 30 has certain overlapping, the inner boundary 30a and mask plate of installation frame 30 with mask plate body 10
The external boundary 10a of body 10 position relationship is as shown in figure 1, fixed position of the mask strip 20 in groove 12 can be located at mask
The overlapping region of plate body 10 and installation frame 30.
Third through-hole 14 can also be set on mask plate, be provided with substrate and aided in correspondingly with the third through-hole 14
Alignment mark, third through-hole 14 are located at the overlapping region of mask plate body 10 and installation frame 30., can a root in practical application
It is deposited according to the second through hole 21 is crossed to the position of the deposition material on display base plate, mask plate is aligned, can also be combined
By third through-hole 14, evaporation is deposited to substrate to the position of the deposition material on substrate and by the second through hole 21
Deposition material position, to carry out the contraposition of mask plate.
As the second aspect of the present invention, there is provided a kind of preparation method of above-mentioned mask plate, with reference to shown in Fig. 1 and Fig. 5, bag
Include:
S101, mask plate body 10 is provided, the mask plate body 10 includes relative first surface and second surface.
S102, mask pattern 11 is formed on mask plate body 10, specifically, mask pattern 11 is through the mask plate
The evaporation opening of body, the quantity of mask pattern 11 is multiple, is arranged into multiple lines and multiple rows, and each mask pattern 11 is corresponding to show base
A viewing area on plate.
S103, groove 12 is formed on the first surface of mask plate body 10, groove 12 is located at beyond mask pattern 11
Region.Specifically, mask plate body 10 is made of metal, and the evaporation opening and groove 12 etch formation.As described above,
The quantity of groove 12 can be multiple, and the column direction that each groove 12 arranges along mask pattern 11 extends, per two neighboring groove
Multiple mask patterns 11 are provided between 12.In addition, the width and depth of groove 12 are being described above, it is no longer superfluous here
State.
S104, the first through hole 13 for running through mask plate body 10 is formed in the bottom of groove 12.
Wherein, the quantity of the first through hole 13 of each bottom of groove 12 can be multiple.
Further, the preparation method also includes:
S105, provide installation frame 30 and mask strip one-to-one with groove 12 20.Wherein, the thickness of mask strip 20 exists
30 μm~50 μm.
S106, formation and one-to-one second through hole of first through hole 13 of the bottom of corresponding recesses 12 in mask strip 20
21.Wherein, the opening size of the second through hole 21 is between 95 μm~105 μm.
S107, mask plate body 10 is fixed on installation frame 30.
S108, mask strip 20 is fixedly installed in corresponding groove 12, and causes the second through hole 21 in mask strip 20
The position of first through hole 13 of position and the bottom of corresponding recesses 12 correspond.
Wherein,, can be first logical with second on display base plate in order to ensure that the position of mask strip 20 is accurate in step S108
21 corresponding position of hole sets mark 50 of throwing the net, as shown in fig. 6, this is thrown the net, the length and width of mark 50 is respectively than the second through hole
Small 20 μm or so of 21 length and width.When mask strip 20 is fixed in groove 12, the second through hole 21 is thrown the net with corresponding
Mark 50 is aligned, and each edge for mark 50 of throwing the net and the second through hole 21 have 10 μm or so of interval.
As the third aspect of the invention, there is provided a kind of evaporation coating method, with reference to shown in Fig. 1 and Fig. 7, the evaporation coating method
Including:
S201, using vapor deposition source and above-mentioned mask plate to partial amt in multiple display base plates (for example, can be one)
Display base plate be deposited in advance.Wherein, the display base plate includes a pair of the mask regions 11 1 with the mask plate body 10
The viewing area answered and 13 one-to-one standard of the first through hole evaporation area with mask plate 10.
S202, the position for adjusting mask plate, until being deposited by first through hole 13 to the evaporation material of the display base plate
Area is deposited in the standard in material position.
S203, remaining display base plate is arranged on to the current location of display base plate for completing to be deposited in advance, keeps current mask
The position of plate, to carry out main evaporation to remaining display base plate using the mask plate and the vapor deposition source.
In the case of being not provided with other structures in groove 12, first through hole 13 is used as registration holes, and deposition material directly leads to
Cross first through hole 13 to be deposited to display base plate, because the setting of groove 12 is so that the mask plate body 10 that first through hole 13 passes through
Thickness it is smaller, so as to be more beneficial for improve first through hole 13 making precision, and be advantageous to reduce first through hole 13 size,
And then be advantageous to improve aligning accuracy.
Further, as described above, the mask plate also includes the mask strip 20 being arranged in groove 12, mask strip 20
On be provided with and one-to-one second through hole 21 of the first through hole 13 of the bottom of groove 12, throwing of the first through hole 13 towards mask strip 20
The region of the second through hole 21 is completely covered in shadow zone domain.In this case, carried out in step S201 in pre- evaporation and step S203
When carrying out main evaporation, the second surface of mask plate body 10 is towards vapor deposition source.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, but the invention is not limited in this.For those skilled in the art, the essence of the present invention is not being departed from
In the case of refreshing and essence, various changes and modifications can be made therein, and these variations and modifications are also considered as protection scope of the present invention.
Claims (10)
1. a kind of mask plate, including mask plate body, mask pattern is provided with the mask plate body, it is characterised in that institute
Stating mask plate body includes relative first surface and second surface, and fluted, the groove position is set on the first surface
Region beyond the mask pattern, the bottom portion of groove are provided through the first through hole of the mask plate body.
2. mask plate according to claim 1, it is characterised in that the mask plate also includes being arranged in the groove
Mask strip, the thickness of the mask strip are less than the thickness for the mask plate body being located at beyond the groove, set in the mask strip
It is equipped with and one-to-one second through hole of the first through hole of the bottom portion of groove, throwing of the first through hole towards the mask strip
The second through hole region is completely covered in shadow zone domain.
3. mask plate according to claim 2, it is characterised in that the mask strip away from the surface of the first through hole
It is less than or flushes in the first surface of the mask plate body.
4. mask plate according to claim 2, it is characterised in that the groove corresponds with the mask strip, and institute
It is identical with the bearing of trend of the mask strip to state the bearing of trend of groove, it is logical that the bottom portion of groove is provided with multiple described first
Hole.
5. mask plate according to claim 2, it is characterised in that the thickness of the mask plate body is at 270 μm~330 μm
Between;The thickness of the mask strip is between 30 μm~50 μm;The opening size of second through hole 95 μm~105 μm it
Between.
6. mask plate according to claim 2, it is characterised in that the mask plate also includes installation frame, the mask
Plate body is fixed on the installation frame.
A kind of 7. preparation method of mask plate, it is characterised in that including:
Mask plate body is provided, the mask plate body includes relative first surface and second surface;
Mask pattern is formed on the mask plate body;
Groove is formed on the first surface of the mask plate body, the groove is located at the region beyond the mask pattern;
The first through hole through the mask plate body is formed in bottom portion of groove.
8. preparation method according to claim 7, it is characterised in that the preparation method also includes:
There is provided installation frame and with the one-to-one mask strip of the groove;
One-to-one second through hole of first through hole with corresponding recesses bottom is formed in the mask strip;
The mask plate body is fixed on the installation frame;
The mask strip is fixedly installed in corresponding groove so that the position of the second through hole in the mask strip with it is corresponding
The position of the first through hole of bottom portion of groove corresponds.
A kind of 9. evaporation coating method, it is characterised in that including:
Using the mask plate described in any one in vapor deposition source and claim 1 to 6 to partial amt in multiple display base plates
Display base plate is deposited in advance;Wherein, the display base plate includes corresponding with the mask regions figure of the mask plate body
Viewing area and standard one-to-one with the first through hole of mask plate body evaporation area;
The position of the mask plate is adjusted, until being deposited by the first through hole to the deposition material position of the display base plate
Area is deposited in the standard;
Remaining display base plate is arranged on to the current location for the display base plate for completing to be deposited in advance, keeps the position of current mask plate,
To carry out main evaporation to remaining display base plate using the mask plate and the vapor deposition source.
10. evaporation coating method according to claim 9, it is characterised in that the mask plate also includes being arranged on the groove
Interior mask strip, be provided with the mask strip with one-to-one second through hole of the first through hole of the bottom portion of groove, it is described
The second through hole region is completely covered in the view field of first through hole towards the mask strip;
Carrying out the pre- evaporation and during the main evaporation, the second surface of the mask plate body is towards the vapor deposition source.
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CN201711043889.1A CN107653436B (en) | 2017-10-31 | 2017-10-31 | Mask plate, manufacturing method thereof and evaporation method |
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CN201711043889.1A CN107653436B (en) | 2017-10-31 | 2017-10-31 | Mask plate, manufacturing method thereof and evaporation method |
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CN107653436B CN107653436B (en) | 2023-09-19 |
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Cited By (12)
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CN108611600A (en) * | 2018-08-17 | 2018-10-02 | 京东方科技集团股份有限公司 | Mask structure |
CN109609911A (en) * | 2019-01-10 | 2019-04-12 | 云谷(固安)科技有限公司 | Mask plate, evaporation coating device and mask plate alignment method |
CN110048007A (en) * | 2019-04-25 | 2019-07-23 | 云谷(固安)科技有限公司 | Mask plate and its manufacturing method |
CN111088473A (en) * | 2020-01-02 | 2020-05-01 | 京东方科技集团股份有限公司 | Alignment mask plate, alignment mechanism and preparation method of alignment mask plate |
CN111471960A (en) * | 2020-06-09 | 2020-07-31 | 京东方科技集团股份有限公司 | Mask plate and preparation method |
CN111809144A (en) * | 2019-04-12 | 2020-10-23 | 上海和辉光电有限公司 | Mask plate and manufacturing method thereof |
CN111926291A (en) * | 2020-08-31 | 2020-11-13 | 合肥维信诺科技有限公司 | Mask plate and mask plate assembly |
CN112575289A (en) * | 2020-12-25 | 2021-03-30 | 福建华佳彩有限公司 | Fine metal mask plate of FMM |
CN112962055A (en) * | 2021-01-29 | 2021-06-15 | 合肥维信诺科技有限公司 | Mask plate, display substrate evaporation assembly and display substrate |
CN113403576A (en) * | 2021-06-23 | 2021-09-17 | 昆山国显光电有限公司 | Mask plate structure and preparation method thereof |
CN114361374A (en) * | 2021-12-31 | 2022-04-15 | 云谷(固安)科技有限公司 | Mask plate repairing method and mask plate assembly |
WO2022133737A1 (en) * | 2020-12-22 | 2022-06-30 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method therefor, display panel, and display device |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006228540A (en) * | 2005-02-17 | 2006-08-31 | Seiko Epson Corp | Mask, manufacturing method of the mask, and manufacturing method of organic el device |
CN104561892A (en) * | 2014-12-04 | 2015-04-29 | 深圳市华星光电技术有限公司 | Mask sheet for OLED (organic light-emitting diode) material vacuum thermal evaporation |
CN105839052A (en) * | 2016-06-17 | 2016-08-10 | 京东方科技集团股份有限公司 | Mask board and assembling method of mask board |
CN105951042A (en) * | 2016-07-01 | 2016-09-21 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
CN106480404A (en) * | 2016-12-28 | 2017-03-08 | 京东方科技集团股份有限公司 | A kind of mask integrated framework and evaporation coating device |
CN206033864U (en) * | 2016-09-22 | 2017-03-22 | 京东方科技集团股份有限公司 | Opening mask plate, mask plate and base plate |
CN106702318A (en) * | 2016-12-12 | 2017-05-24 | 京东方科技集团股份有限公司 | Mask frame, manufacturing method thereof and mask plate |
CN207331040U (en) * | 2017-10-31 | 2018-05-08 | 京东方科技集团股份有限公司 | Mask plate |
-
2017
- 2017-10-31 CN CN201711043889.1A patent/CN107653436B/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006228540A (en) * | 2005-02-17 | 2006-08-31 | Seiko Epson Corp | Mask, manufacturing method of the mask, and manufacturing method of organic el device |
CN104561892A (en) * | 2014-12-04 | 2015-04-29 | 深圳市华星光电技术有限公司 | Mask sheet for OLED (organic light-emitting diode) material vacuum thermal evaporation |
CN105839052A (en) * | 2016-06-17 | 2016-08-10 | 京东方科技集团股份有限公司 | Mask board and assembling method of mask board |
CN105951042A (en) * | 2016-07-01 | 2016-09-21 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
CN206033864U (en) * | 2016-09-22 | 2017-03-22 | 京东方科技集团股份有限公司 | Opening mask plate, mask plate and base plate |
CN106702318A (en) * | 2016-12-12 | 2017-05-24 | 京东方科技集团股份有限公司 | Mask frame, manufacturing method thereof and mask plate |
CN106480404A (en) * | 2016-12-28 | 2017-03-08 | 京东方科技集团股份有限公司 | A kind of mask integrated framework and evaporation coating device |
CN207331040U (en) * | 2017-10-31 | 2018-05-08 | 京东方科技集团股份有限公司 | Mask plate |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108611600A (en) * | 2018-08-17 | 2018-10-02 | 京东方科技集团股份有限公司 | Mask structure |
US11268184B2 (en) | 2018-08-17 | 2022-03-08 | Ordos Yuansheng Optoelectronics Co., Ltd. | Mask frame assembly |
WO2020034892A1 (en) * | 2018-08-17 | 2020-02-20 | Boe Technology Group Co., Ltd. | Mask frame assembly |
CN109609911A (en) * | 2019-01-10 | 2019-04-12 | 云谷(固安)科技有限公司 | Mask plate, evaporation coating device and mask plate alignment method |
CN111809144A (en) * | 2019-04-12 | 2020-10-23 | 上海和辉光电有限公司 | Mask plate and manufacturing method thereof |
CN111809144B (en) * | 2019-04-12 | 2023-09-12 | 上海和辉光电股份有限公司 | Mask plate and manufacturing method thereof |
CN110048007A (en) * | 2019-04-25 | 2019-07-23 | 云谷(固安)科技有限公司 | Mask plate and its manufacturing method |
CN111088473A (en) * | 2020-01-02 | 2020-05-01 | 京东方科技集团股份有限公司 | Alignment mask plate, alignment mechanism and preparation method of alignment mask plate |
CN111471960A (en) * | 2020-06-09 | 2020-07-31 | 京东方科技集团股份有限公司 | Mask plate and preparation method |
CN111471960B (en) * | 2020-06-09 | 2022-09-09 | 京东方科技集团股份有限公司 | Mask plate and preparation method |
CN111926291A (en) * | 2020-08-31 | 2020-11-13 | 合肥维信诺科技有限公司 | Mask plate and mask plate assembly |
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CN113403576A (en) * | 2021-06-23 | 2021-09-17 | 昆山国显光电有限公司 | Mask plate structure and preparation method thereof |
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