CN107634140A - Light based on SiNx reads nerve synapse device architecture and preparation method thereof - Google Patents
Light based on SiNx reads nerve synapse device architecture and preparation method thereof Download PDFInfo
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Abstract
The present invention provides one kind and is based on SiNxLight read nerve synapse device architecture and preparation method thereof, including " metal/SiNxThe waveguide of/metal " surface plasma and " Top electrode/bis- change resistance layer/bottom electrode " memristor being embedded；Surface plasma waveguide has " second metal layer/dielectric layer/the first metal layer " vertical three-decker from top to bottom；Memristor has " change resistance layer of Top electrode/second/the first change resistance layer/bottom electrode " vertical four-layer structure from top to bottom, and the change resistance layer of memristor first, the second change resistance layer are connected as lightray propagation passage with the dielectric layer level of surface plasma waveguide；The present invention realizes that the light of nerve synapse weight is read, so that nerve synapse device is read using optical signal amplitude and phase as the light of synapse weight, with the incomparable advantage of traditional cynapse device using resistance as synapse weight, surface plasma waveguide can allow optical signal to break through diffraction limit and be transmitted, and be advantageous to device size and further reduce.
Description
Technical field
The invention belongs to silicon-based photonics integration device and neuromorphic chip field, and in particular to one kind is based on SiNxLight
Read nerve synapse device and preparation method thereof.
Background technology
Memristor with " medium/metal layer/metal " sandwich structure, if applying different bias voltages, device
Resistance value nonlinear change will be presented.The nonlinear change of this resistance is by conductive channel in dielectric layer under different biass
Caused by formation or disappearance.It is interesting that the bonding strength of this nano level thread conductive channel can be with the amplitude of bias
Changed with action time.The working mechanism of the cynapse of this characteristic neuron different from being connected in biological nervous system is very
It is similar.Exactly memristor and this similitude of biosystem cynapse, it is highly suitable as cynapse device and be used to construct god
Brain chip is imitated through form, and then is used for artificial neural network.Research confirms up to the present the bionical cynapse based on memristor is
The closest bionical device with cynapse in biological nervous system.
Memristor provides a kind of more outstanding cynapse device for artificial neural network, but all at present based on recalling
The bionical cynapse device of resistance device is all to read the synaptic weight in cynapse device with electric signal.The signal bandwidth of electron transmission
It is small, it can produce and interfere in transmittance process.By contrast, photon has the concurrency of signal, while has with roomy spy
Property so that synapse weight is read out then advantageously using optical signal (amplitude and phase) as information media.However, arrive mesh
Before untill, in the cynapse Device Patent based on memristor effect announced, be all based on electronic media entirely and synapse weight entered
Row is read, and can be referred to as " electrical modulation electricity read ", not using photon intermediate come read the weight of nerve synapse (with reference to according to
According to：CN 104916313 A, CN 10378055A, CN105287046A, CN105304813A, CN 104934534 A, CN
104376362 A)。
The content of the invention
The present invention proposes that a kind of new light based on memristor effect reads nerve synapse device, using light as signal medium,
Synaptic weight is represented with light intensity and phase, its object is to break through the bandwidth limitation of traditional neural cynapse device signal processing, is carried
For it is a kind of with excellent Parallel signal processing ability based on SiNxLight read nerve synapse device and preparation method thereof.
For achieving the above object, technical solution of the present invention is as follows：
One kind is based on SiNxLight read nerve synapse device architecture, including " metal/SiNx/ metal " surface plasma-wave
" Top electrode/bis- change resistance layer/bottom electrode " memristor led and be embedded；
Described surface plasma waveguide has " second metal layer/dielectric layer/the first metal layer " vertical three from top to bottom
Rotating fields；
The memristor has " change resistance layer of Top electrode/second/the first change resistance layer/bottom electrode " vertical four layers of knot from top to bottom
Structure；
The memristor is embedded among surface plasma waveguide, and the change resistance layer of memristor first, the second change resistance layer are as light
Signal propagation ducts are connected with the dielectric layer level of surface plasma waveguide.
It is preferred that the first change resistance layer is pure SiNxFilm.
It is preferred that the second change resistance layer is the SiN containing metal nanoparticlexFilm, described metal nanoparticle
It is preferably silver-colored selected from silver, copper or aluminium.
It is preferred that described Top electrode, bottom electrode are all inert electrode.
It is preferred that the second described change resistance layer is contained by what cosputtering method combined standard CMOS technology obtained
Silver, copper, aluminium one of which metal nano particle SiNxFilm, x=0.9~1.1, thickness are 10nm~30nm, and metal is received
Rice grain content is the 30%~45% of film quality.
It is preferred that the first described change resistance layer is obtained by magnetically controlled sputter method combined standard CMOS technology
Intrinsic SiNxFilm, x=0.9~1.1, thickness are 30nm~50nm.
It is preferred that the first metal layer and second metal layer are Ag.
It is preferred that the top of the Top electrode is located inside second metal layer.A part of light can so be reduced
The loss of signal.
It is preferred that described memristor Top electrode, bottom electrode are using physical gas-phase deposite method combined standard
The inert metal platinum electrode that CMOS technology obtains, thickness is 10nm~20nm, and its width and surface plasma waveguide width phase
Together.
For achieving the above object, also offer one kind of the invention is above-mentioned is based on SiNxLight read nerve synapse device junction
The preparation method of structure, comprises the following steps：
(1) prepare silicon single crystal flake, and carry out washing and drying treatment；
(2) using physical gas-phase deposite method and combined standard CMOS technology, the first metal layer is formed；
(3) first, in one layer of photoresist of surface spin coating where the first metal layer, walked using mask plate and photoetching, development
Suddenly, memristor window is realized；Secondly, using plasma reinforced chemical vapour deposition method, in gluing and patterned first
On metal level, SiN is depositedxFilm is as waveguide medium layer；3rd, using stripping technology, obtain above the first metal layer
Waveguide medium layer, and reserve memristor window wherein；
(4) first, photoetching agent pattern is formed outside memristor region using photoetching process, secondly, is sequentially depositing memristor
Device bottom electrode, the first change resistance layer, the second change resistance layer and Top electrode, wherein, bottom electrode is obtained using d.c. sputtering method；First
Change resistance layer is amorphous Si NxFilm, x=0.9~1.1, obtained using reaction magnetocontrol sputtering method；Second change resistance layer is containing gold
The amorphous Si N of metal nano-particlexFilm, x=0.9~1.1, Top electrode are obtained using d.c. sputtering method；3rd, using stripping
Separating process removes above-mentioned 4 layer film, obtains the memristor being located in surface plasma waveguide；
(5) on the basis of step (3), using metal lift-off material, the second metal layer of formation surface plasma waveguide；
(6) common response ion etching RIE techniques are used, remove residual photoresist, cleaning is completed, dries subsequent handling.
The present invention basic functional principle be：When applying forward voltage between device Top electrode and bottom electrode, (electricity is adjusted
System), the metal nanoparticle in the second change resistance layer is in electric field action moves to the first change resistance layer so that in memristor change resistance layer
The distribution of metal nanoparticle recombinates；Memristor change resistance layer after the light and restructuring transmitted in surface plasma waveguide
After interacting, the amplitude generation decay of transmission light, phase postpone, and so as to realize the modulation of synapse weight, (light is read
Take).When applying backward voltage between device Top electrode and bottom electrode (electrical modulation), the metal in the first change resistance layer is moved to
Nano particle is returned under electric field action in the second change resistance layer, can equally make the distribution of metal nanoparticle in memristor change resistance layer
Recombinate, so that modulate light intensity and phase are restored.Obviously, in a cycle of electrical modulation, light reads god
Intensity of variation through memristor synapse weight, one-to-one relationship be present with the voltage applied.
Beneficial effects of the present invention are：The present invention is based on " metal/SiNx/ metal " memristor structure, mating surface etc. from
Wavelet is led, and realizes that the light of nerve synapse weight is read.Because optical signal can realize parallel and big bandwidth in transmitting procedure
Feature so that using optical signal amplitude and phase as the light of synapse weight read nerve synapse device, have using resistance as dash forward
Touch the incomparable advantage of traditional cynapse device of weight.What is more important, surface plasma waveguide can allow optical signal to dash forward
Broken diffraction limit is transmitted, and is advantageous to device size and is further reduced.
Brief description of the drawings
Fig. 1 is the structural representation of the present invention.
1 is the first metal layer, and 2 be dielectric layer, and 3 be second metal layer, and 4 be bottom electrode, and 5 be the first change resistance layer, and 6 be second
Change resistance layer, 7 be Top electrode.
Embodiment
Illustrate embodiments of the present invention below by way of specific instantiation, those skilled in the art can be by this specification
Disclosed content understands other advantages and effect of the present invention easily.The present invention can also pass through specific realities different in addition
The mode of applying is embodied or practiced, the various details in this specification can also be based on different viewpoints with application, without departing from
Various modifications or alterations are carried out under the spirit of the present invention.
One kind is based on SiNxLight read nerve synapse device architecture, including " metal/SiNx/ metal " surface plasma-wave
" Top electrode/bis- change resistance layer/bottom electrode " memristor led and be embedded；
Described surface plasma waveguide is from top to bottom with " the first metal layer 1 " of 3/ dielectric layer of second metal layer 2/ is vertical
Three-decker；
The memristor has the " bottom electrode 4 " vertical four of 7/ second 6/ first change resistance layer of change resistance layer of Top electrode 5/ from top to bottom
Rotating fields；
The memristor is embedded among surface plasma waveguide, memristor the first change resistance layer 5, the conduct of the second change resistance layer 6
Lightray propagation passage is connected with the level of dielectric layer 2 of surface plasma waveguide.
Specifically, the first change resistance layer 5 is pure SiNxFilm.
Specifically, the second change resistance layer 6 is the SiN containing metal nanoparticlexFilm, described metal nanoparticle are selected from
Silver, copper or aluminium, it is preferably silver-colored；
Specifically, described Top electrode 7, bottom electrode 4 are all inert electrode.
Preferably, the second described change resistance layer 6 be by cosputtering method combined standard CMOS technology obtain argentiferous,
Copper, aluminium one of which metal nano particle SiNxFilm, thickness are 10nm~30nm, and metal nanoparticle content is film
The 30%~45% of quality.
Preferably, the first described change resistance layer 5 is by the intrinsic of magnetically controlled sputter method combined standard CMOS technology acquisition
SiNxFilm, thickness are 30nm~50nm.
Specifically, the first metal layer and second metal layer are Ag.
Specifically, the top of the Top electrode 7 is located inside second metal layer 3.A part of optical signal can so be reduced
Loss.
Preferably, described memristor Top electrode 7, bottom electrode 4 are using physical gas-phase deposite method combined standard CMOS
The inert metal platinum electrode that technique obtains, thickness is 10nm~20nm, and its width is identical with surface plasma waveguide width.
The present embodiment, which also provides, a kind of above-mentioned is based on SiNxLight read nerve synapse device architecture preparation method, including
Following steps：
(1) prepare silicon single crystal flake, and washing and drying treatment is carried out by standard technology；
(2) using physical gas-phase deposite method and combined standard CMOS technology, it is the μ m of 10 μ m 0.8 to form length
0.1 μm of Ag the first metal layers 1；
(3) first, in one layer of photoresist of surface spin coating where Ag the first metal layers 1, mask plate and photoetching, development are utilized
Etc. step, the memristor window that length and width is 0.8 μm of 5 μ m is realized；Secondly, using plasma reinforced chemical vapour deposition
(PECVD) method, on gluing and patterned Ag the first metal layers 1, deposit thickness is 50nm silicon nitride (SiNx) thin
Film is as waveguide medium layer；3rd, using stripping technology, obtain the μ m of 10 μ m 0.8 positioned at the top of Ag the first metal layers 1
0.05 μm of waveguide medium layer, and the memristor window that length and width is 0.8 μm of 5 μ m is reserved wherein；
(4) first, photoetching agent pattern is formed outside memristor region using photoetching process.Secondly, it is sequentially depositing memristor
Device bottom electrode 4, the first change resistance layer 5, the second change resistance layer 6 and Top electrode 7.Wherein, bottom electrode 4 is Pt, thickness 10nm, using straight
Sputtering method is flowed to obtain；First change resistance layer 5 is amorphous Si NxFilm, x=0.9~1.1, thickness 30nm, using reaction magnetic
Sputtering method is controlled to obtain；Second change resistance layer 6 is the amorphous Si N of the nano particle containing AgxFilm, x=0.9~1.1, thickness~
10nm, amount containing Ag 35%；Top electrode 7 is Pt, thickness 10nm, is obtained using d.c. sputtering method.3rd, gone using stripping technology
Except above-mentioned 4 layer film, the memristor being located in surface plasma waveguide is obtained；
(5) on the basis of step (3), using metal lift-off material, the second metal layer of formation surface plasma waveguide
3, it is 0.1 μm of Ag metal levels；
(6) common response ion etching RIE techniques are used, remove residual photoresist, complete the follow-up work such as cleaning, dry
Sequence.
The basic functional principle of the present embodiment is：When applying forward voltage between device Top electrode 7 and bottom electrode 4
(electrical modulation), the metal nanoparticle in the second change resistance layer 6 is in electric field action moves to the first change resistance layer 5 so that memristor
The distribution of metal nanoparticle recombinates in change resistance layer；The memristor after light and restructuring transmitted in surface plasma waveguide
After device change resistance layer interacts, the amplitude generation decay of transmission light, phase postpone, so as to realize the tune of synapse weight
Make (light reading).When applying backward voltage between device Top electrode 7 and bottom electrode 4 (electrical modulation), the first resistive is moved to
Metal nanoparticle in layer 5 is returned under electric field action in the second change resistance layer 6, metal in memristor change resistance layer is received
The distribution of rice grain recombinates, so that modulate light intensity and phase are restored.Obviously, in a cycle of electrical modulation
Interior, light reads the intensity of variation of neural memristor synapse weight, one-to-one relationship be present with the voltage applied.
The above-described embodiments merely illustrate the principles and effects of the present invention, not for the limitation present invention.It is any ripe
Know the personage of this technology all can carry out modifications and changes under the spirit and scope without prejudice to the present invention to above-described embodiment.Cause
This, all those of ordinary skill in the art without departing from disclosed spirit with being completed under technological thought
All equivalent modifications or change, should by the present invention claim be covered.
Claims (10)
1. one kind is based on SiNxLight read nerve synapse device architecture, it is characterised in that：Including " metal/SiNx/ metal " surface
Plasma waveguide and " Top electrode/bis- change resistance layer/bottom electrode " memristor being embedded；
Described surface plasma waveguide has " second metal layer/dielectric layer/the first metal layer " vertical three-layered node from top to bottom
Structure；
The memristor has " change resistance layer of Top electrode/second/the first change resistance layer/bottom electrode " vertical four-layer structure from top to bottom,
The memristor is embedded among surface plasma waveguide, and the change resistance layer of memristor first, the second change resistance layer are as optical signal
Propagation ducts are connected with the dielectric layer level of surface plasma waveguide.
2. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：First
Change resistance layer is pure SiNxFilm.
3. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：Second
Change resistance layer is the SiN containing metal nanoparticlexFilm, described metal nanoparticle are selected from silver, copper or aluminium.
4. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：It is described
Top electrode, bottom electrode be all inert electrode.
5. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：It is described
The second change resistance layer be that the argentiferous, copper, aluminium one of which metal obtained by cosputtering method combined standard CMOS technology is received
The SiN of rice grainxFilm, x=0.9~1.1, thickness are 10nm~30nm, and metal nanoparticle content is film quality
30%~45%.
6. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：It is described
The first change resistance layer be by magnetically controlled sputter method combined standard CMOS technology obtain intrinsic SiNxFilm, x=0.9~1.1,
Thickness is 30nm~50nm.
7. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：It is described
The first metal layer and second metal layer are Ag.
8. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：It is described
The top of Top electrode is located inside second metal layer.
9. one kind according to claim 1 is based on SiNxLight read nerve synapse device architecture, it is characterised in that：It is described
Memristor Top electrode, bottom electrode be using physical gas-phase deposite method combined standard CMOS technology obtain inert metal platinum electricity
Pole, thickness is 10nm~20nm, and its width is identical with surface plasma waveguide width.
10. described in claim 1 to 9 any one based on SiNxLight read nerve synapse device architecture preparation method, its
It is characterised by comprising the following steps：
(1) prepare silicon single crystal flake, and carry out washing and drying treatment；
(2) using physical gas-phase deposite method and combined standard CMOS technology, the first metal layer is formed；
(3) first, it is real using mask plate and photoetching, development step in one layer of photoresist of surface spin coating where the first metal layer
Existing memristor window；Secondly, using plasma reinforced chemical vapour deposition method, in gluing and patterned the first metal layer
On, deposit SiNxFilm is as waveguide medium layer；3rd, using stripping technology, obtain the waveguide above the first metal layer
Dielectric layer, and memristor window is reserved wherein；
(4) first, photoetching agent pattern is formed outside memristor region using photoetching process, secondly, be sequentially depositing under memristor
Electrode, the first change resistance layer, the second change resistance layer and Top electrode, wherein, bottom electrode is obtained using d.c. sputtering method；First resistive
Layer is amorphous Si NxFilm, x=0.9~1.1, obtained using reaction magnetocontrol sputtering method；Second change resistance layer is to be received containing metal
The amorphous Si N of rice grainxFilm, x=0.9~1.1, Top electrode are obtained using d.c. sputtering method；3rd, using stripping work
Skill removes above-mentioned 4 layer film, obtains the memristor being located in surface plasma waveguide；
(5) on the basis of step (3), using metal lift-off material, the second metal layer of formation surface plasma waveguide；
(6) common response ion etching RIE techniques are used, remove residual photoresist, cleaning is completed, dries subsequent handling.
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| CN109037443A (en) * | 2018-08-07 | 2018-12-18 | 电子科技大学 | Based on a-SiNxSPR nerve synapse device of memristor effect and preparation method thereof |
| CN109065713A (en) * | 2018-08-07 | 2018-12-21 | 电子科技大学 | SPR nerve synapse device and preparation method thereof based on a-Si memristor effect |
| CN112885868A (en) * | 2021-02-03 | 2021-06-01 | 湖北大学 | 1S1R device based on niobium oxide gate tube and preparation method thereof |
| CN112885869A (en) * | 2021-02-03 | 2021-06-01 | 湖北大学 | 1S1R device based on metallic intercalation and preparation method thereof |
| WO2021191697A1 (en) * | 2020-03-26 | 2021-09-30 | International Business Machines Corporation | Optical synapses |
| CN113723602A (en) * | 2021-09-01 | 2021-11-30 | 哈尔滨工程大学 | Nerve synapse scheme of optical fiber structure |
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| CN109037443A (en) * | 2018-08-07 | 2018-12-18 | 电子科技大学 | Based on a-SiNxSPR nerve synapse device of memristor effect and preparation method thereof |
| CN109065713A (en) * | 2018-08-07 | 2018-12-21 | 电子科技大学 | SPR nerve synapse device and preparation method thereof based on a-Si memristor effect |
| CN109037443B (en) * | 2018-08-07 | 2020-07-31 | 电子科技大学 | Based on a-SiNxSPR (surface plasmon resonance) nerve synapse device with memristive effect and preparation method thereof |
| CN109065713B (en) * | 2018-08-07 | 2020-07-31 | 电子科技大学 | SPR (surface plasmon resonance) nerve synapse device based on a-Si memristor effect and preparation method thereof |
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| CN112885868A (en) * | 2021-02-03 | 2021-06-01 | 湖北大学 | 1S1R device based on niobium oxide gate tube and preparation method thereof |
| CN112885869A (en) * | 2021-02-03 | 2021-06-01 | 湖北大学 | 1S1R device based on metallic intercalation and preparation method thereof |
| CN113723602A (en) * | 2021-09-01 | 2021-11-30 | 哈尔滨工程大学 | Nerve synapse scheme of optical fiber structure |
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