CN107577117A - One kind is without mask optical lithography system - Google Patents
One kind is without mask optical lithography system Download PDFInfo
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- CN107577117A CN107577117A CN201711014026.1A CN201711014026A CN107577117A CN 107577117 A CN107577117 A CN 107577117A CN 201711014026 A CN201711014026 A CN 201711014026A CN 107577117 A CN107577117 A CN 107577117A
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- 238000000206 photolithography Methods 0.000 title claims abstract description 35
- 239000000835 fiber Substances 0.000 claims abstract description 46
- 239000013307 optical fiber Substances 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000005286 illumination Methods 0.000 claims abstract description 20
- 230000003287 optical effect Effects 0.000 claims abstract description 19
- 238000012946 outsourcing Methods 0.000 claims abstract description 17
- 238000009826 distribution Methods 0.000 claims abstract description 12
- 239000004606 Fillers/Extenders Substances 0.000 claims description 22
- 201000009310 astigmatism Diseases 0.000 claims description 6
- 230000011514 reflex Effects 0.000 claims description 5
- 230000011218 segmentation Effects 0.000 claims description 2
- 238000003384 imaging method Methods 0.000 abstract description 7
- 238000012546 transfer Methods 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000001259 photo etching Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
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- 230000005540 biological transmission Effects 0.000 description 1
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- 230000009897 systematic effect Effects 0.000 description 1
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Abstract
The embodiment of the invention discloses one kind without mask optical lithography system, including illumination optics subsystem, space light modulating subsystem and projection optics；Illumination optics subsystem is evenly distributed for emanated energy, the light beam parallel with the optical axis of space light modulating subsystem；Space light modulating subsystem includes digital fiber bundling device and coupled controller；Digital fiber bundling device is the outsourcing optical fiber by a diameter of micron level of multi beam, is arranged according to default arrangement mode and is symmetric in the optical-fiber bundling of both sides, the connection cell of multiple array distributions and is formed positioned at the pixel switch connected in cell slit；Projection optics include projection lens set and substrate, for being spliced after mask pattern is first split by zigzag route, and are imaged on substrate.The application uses digital fiber bundling device to produce device as dynamic mask, and the pattern transfer of real-time, high efficiency and low cost can be achieved, improve pattern imaging quality, enhance light exposure.
Description
Technical field
The present invention relates to mask-free photolithography technical field, more particularly to one kind without mask optical lithography system.
Background technology
With the development of optical technology, photoetching technique has also obtained quick development, and photoengraving pattern characteristic size gradually becomes
It is small, and litho pattern structure is more complicated and diversified.Traditional mask lithography technology occurs making difficulty and expense rises
The problem of.
In order to reduce the cost of mask manufacture, maskless photoetching technology is born, such as ion/direct electronic beam writing technology, swashs
Light direct writing technology, but existing mask-free photolithography equipment price is expensive, and photoetching speed is slower.
For digital photolithography system as a kind of mask-free photolithography equipment, the core component of dynamic mask is digital micro-mirror,
Digital micro-mirror is a kind of pure digi-tal spatial light modulator, is made up of million about more than ten microns of square micro mirror, control
" 1 " and " 0 " state of signal binary corresponds to two stable states of+12 ° and -12 ° deflection of micro mirror.
The etching system of digital micro-mirror can realize the pattern transfer of real-time, high efficiency and low cost, it is achieved thereby that
Quickly, mass, inexpensive photoetching.Digital photolithography system is on the premise of high-end electronic product quality is ensured, although reducing
Cost, but because digital micro-mirror is integrated by polylith micro mirror, inevitably there is gap between micro mirror, cause incident light meeting
Diffraction phenomena is produced, and a part of luminous energy can be lost in catoptric imaging；These micro mirrors form two-dimensional array, and ultraviolet source shines during photoetching
Diffraction can occur for the optical grating construction of these bright minor cycles, and diffraction light is low due to limited beam orifice again by miniature optical projection system
Pass filter characteristic, so the loss of high order diffraction can cause the picture edge blurry of exposure figure.In addition, the manufacture craft pole of micro mirror
It is complicated, and the requirement to equipment is extremely harsh.
It is that those skilled in the art urgently solve it can be seen that how to improve the pattern imaging quality of no mask optical lithography equipment
Certainly the problem of.
The content of the invention
The purpose of the embodiment of the present invention is to provide one kind without mask optical lithography system, being capable of real-time, efficient transmission figure
Shape, improve pattern imaging quality and enhancing light exposure.
In order to solve the above technical problems, the embodiment of the present invention provides following technical scheme：
The embodiments of the invention provide one kind without mask optical lithography system, including：
Illumination optics subsystem, space light modulating subsystem and projection optics；
The illumination optics subsystem is used for emanated energy and is evenly distributed, is put down with the optical axis of the space light modulating subsystem
Capable light beam；
The space light modulating subsystem include digital fiber bundling device and and controller, the digital fiber bundling device with
The controller is connected, and the light beam of the digital fiber bundling device outgoing is projected to the projection optics；For passing through
The controller controls the digital fiber bundling device dynamically to obtain mask pattern；
Wherein, the digital fiber bundling device is the outsourcing optical fiber by a diameter of micron level of multi beam, according to default arrangement
Mode is arranged and is symmetric in the optical-fiber bundling of both sides, the connection cell of multiple array distributions and positioned at connection cell slit
Interior pixel switch is formed；The controller is used for the shading astigmatism plate by controlling the pixel to switch, to realize control institute
Whether the light beam for stating illumination optics subsystem outgoing is transmitted to the optical-fiber bundling of opposite side by the optical-fiber bundling of side；
The projection optics include projection lens set and substrate；The projection lens set is used for the mask figure
Shape is spliced after first splitting by zigzag route, and spliced mask pattern is reduced, is imaged on the substrate.
Optionally, the illumination optics subsystem include excimer laser, extender lens group, two-stage fly's eye homogenizer and
Collimation lens set；
Wherein, the light beam of the excimer laser outgoing is equal by the extender lens group, the two-stage fly's eye successively
Even device and the collimation lens set, it is incident to the digital fiber bundling device；The extender lens group is used for the quasi-molecule
The laser beam of laser emitting expands the square hot spot light beam for pre-set dimension；The two-stage fly's eye homogenizer is used for energy
Measure uneven laser beam and be decomposed into the uniform beamlet of multi beam.
Optionally, the excimer laser is the LASER Light Source that wavelength is 193nm.
Optionally, the extender lens group is one-dimensional by the laser beam progress for the excimer laser to be emitted
The sphere microscope group that the cylinder microscope group and two dimension expanded expands combines.
Optionally, the illumination optics subsystem also includes the first reflective mirror, after the extender lens group is expanded
Light beam reflex to the two-stage fly's eye homogenizer, the excimer laser and the extender lens group are in same vertical light
On axle.
Optionally, the two-stage fly's eye homogenizer includes two groups of fly lens groups, and every group of lens are that end face is regular hexagon
Structure, bus are mutually perpendicular to intersect focal length identical post lens.
Optionally, in the projection lens set numerical aperture of camera lens be 0.85, enlargement ratio be 5.2 times.
Optionally, the projection optics also include the second reflective mirror, for be emitted the optical-fiber bundling device
Light beam reflexes to the projection lens set, and the projection lens set and the substrate are on same vertical optical axis.
Optionally, the digital fiber bundling device is the outsourcing optical fiber by a diameter of micron level of multi beam, according to positive hexagonal
Shape is arranged and is symmetric in the optical-fiber bundling of both sides, the connection cell of multiple array distributions and in connection cell slit
Pixel switch form.
Adjusted the embodiments of the invention provide one kind without mask optical lithography system, including illumination optics subsystem, spatial light
Subsystem and projection optics；Illumination optics subsystem is evenly distributed for emanated energy and space light modulation subsystem
The parallel light beam of the optical axis of system；Space light modulating subsystem includes digital fiber bundling device and controller, digital fiber bundling device
It is connected with controller；Digital fiber bundling device is the outsourcing optical fiber by a diameter of micron level of multi beam, according to default arrangement mode
Arrange and be symmetric in the optical-fiber bundling of both sides, the connection cell of multiple array distributions and in connection cell slit
Pixel switch is formed；Projection optics include projection lens set and substrate；Projection lens set is used to first divide mask pattern
Spliced after cutting by zigzag route, and spliced mask pattern is reduced, is imaged on substrate.
The advantages of technical scheme that the application provides, is that the light beam being emitted by illumination optics subsystem exposes to numeral
On optical-fiber bundling, closed through digital fiber after beam forms required mask pattern and be emitted to projection lens set, will through projection lens set
Figure is reduced, is imaged on substrate, can obtain required litho pattern.With the micro- reflection of digital fiber bundling device substitution numeral
Mirror, device is produced as the dynamic mask without mask optical lithography system, the figure of real-time, high efficiency and low cost can be realized
Transfer, improves pattern imaging quality, enhances light exposure.Because the outsourcing optical fiber that image is presented is micron level, so as to pole
The big resolution ratio and picture quality that improve image, pixel switch only have two states of break-make, fast response time.
Brief description of the drawings
, below will be to embodiment or existing for the clearer explanation embodiment of the present invention or the technical scheme of prior art
The required accompanying drawing used is briefly described in technology description, it should be apparent that, drawings in the following description are only this hair
Some bright embodiments, for those of ordinary skill in the art, on the premise of not paying creative work, can be with root
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is no mask optical lithography system provided in an embodiment of the present invention in a kind of structural frames of embodiment
Figure；
Fig. 2 is structural frames of the no mask optical lithography system provided in an embodiment of the present invention in another embodiment
Figure；
Fig. 3 is the mask pattern schematic diagram that space light modulating subsystem provided in an embodiment of the present invention is formed；
Fig. 4 is the litho pattern schematic diagram formed on substrate provided in an embodiment of the present invention；
Fig. 5 is one provided in an embodiment of the present invention exemplary no mask optical lithography system structural representation.
Embodiment
In order that those skilled in the art more fully understand the present invention program, with reference to the accompanying drawings and detailed description
The present invention is described in further detail.Obviously, described embodiment is only part of the embodiment of the present invention, rather than
Whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art are not making creative work premise
Lower obtained every other embodiment, belongs to the scope of protection of the invention.
Term " first ", " second ", " the 3rd " " in the description and claims of this application and above-mentioned accompanying drawing
Four " etc. be for distinguishing different objects, rather than for describing specific order.In addition term " comprising " and " having " and
Their any deformations, it is intended that cover non-exclusive include.Such as contain the process of series of steps or unit, method,
The step of system, product or equipment are not limited to list or unit, but the step of may include not list or unit.
Referring to Fig. 1, Fig. 1 is without mask optical lithography system under a kind of embodiment provided in an embodiment of the present invention
Structured flowchart.
It may include illumination optics subsystem 1, space light modulating subsystem 2 and projected light scholar without mask optical lithography system
System 3.
Illumination optics subsystem 1 is used to obtain suitable spot size, Energy distribution high uniformity, collimation height and spatial light
The parallel light beam of the optical axis of mod subsystem 2.
In a kind of specific embodiment, referring to Fig. 2, illumination optics subsystem 1 may include excimer laser 11,
Extender lens group 12, two-stage fly's eye homogenizer 13 and collimation lens set 14.
The light beam that excimer laser 11 is emitted is saturating by extender lens group 12, two-stage fly's eye homogenizer 13 and collimation successively
Microscope group 14, it is projected to the digital fiber bundling device 21 of space light modulating subsystem 2.
Excimer laser 11 provides light source for whole etching system, specifically, excimer laser 11 can be using ArF
The a length of 193nm of operation material, outgoing wave LASER Light Source.
Extender lens group 12 is used to expanding the laser beam that excimer laser 11 is emitted into the square for pre-set dimension
Hot spot light beam；The hot spot amplification for the laser beam that excimer laser 11 is emitted, that is, the rectangular laser light by 193nm
Beam is expanded as square laser beam, is then again amplified the hot spot of square laser beam.Extender lens group can be by cylindrical mirror
Group and sphere microscope group composition, cylinder microscope group be used for by excimer laser outgoing laser beam carry out it is one-dimensional expands, spherical mirror
Group expands for carrying out two dimension.
Because the laser beam that excimer laser 11 is emitted is Gaussian-shaped beam, i.e., the Energy distribution on cross section is in height
This distribution, energy is uneven, and the precision of the figure to subsequently making by lithography has an impact.Two-stage fly's eye homogenizer 13 is used for energy is uneven
Even laser beam is decomposed into the uniform beamlet of multi beam, and the laser angle pencil of ray after will also expanding is decomposed into some uniform thin
Light beam.Specifically, two-stage fly's eye homogenizer 13 may include two groups of fly lens groups, every group of lens can be that end face is regular hexagon knot
Structure, bus are mutually perpendicular to intersect focal length identical post lens.
Collimation lens set 14 includes multiple lens, for the uniform laser light pencil for being emitted two-stage fly's eye homogenizer 13
It is collimated into the light beam parallel with systematic optical axis.
In view of the volume entirely without mask optical lithography system, illumination optics subsystem 1 may also include the first reflective mirror
15, reflex to two-stage fly's eye homogenizer 13 for the light beam after extender lens group 12 is expanded, excimer laser 11 and expand
Lens group 12 is on same vertical optical axis.
Space light modulating subsystem 2 may include digital fiber bundling device 21 and controller 22, digital fiber bundling device 21 with
Controller 22 is connected, and the light beam that digital fiber bundling device 21 is emitted is projected to projection optics 3.Controller 21 passes through control
Digital fiber bundling device 22 dynamically obtains mask pattern.
Digital fiber bundling device 21 can be a diameter of by multi beam as the spatial light modulator without mask optical lithography system
The outsourcing optical fiber of micron level, arranged according to default arrangement mode and be symmetric optical-fiber bundling, the multiple arrays in both sides
The connection cell of distribution and the pixel in connection cell slit are switched and formed, and pass through the shading astigmatism for controlling pixel to switch
Plate, to realize whether the light beam of control illumination optics subsystem outgoing is transmitted to the optical fiber of opposite side by the optical-fiber bundling of side
Close beam.In a kind of specific embodiment, digital fiber bundling device 21 can be the outsourcing light by a diameter of micron level of multi beam
Fibre, arranged according to regular hexagon and be symmetric in the optical-fiber bundling of both sides, the connection cell of multiple array distributions and be located at
The pixel switch connected in cell slit is formed.
The quantity for connecting cell is the half of outsourcing optical fiber sum, each optical-fiber bundling for connecting cell and being used to accommodate both sides
Corresponding two piece outsourcing optical fiber the inner, and form slit between this corresponding two outsourcing optical fiber the inners end face；Pass through
Control pixel switch shading astigmatism plate, with realize control light source outgoing light beam by the optical-fiber bundling of side whether transmit to
The optical-fiber bundling of opposite side；The central shaft of shading astigmatism plate is consistent with outsourcing fiber optic hub axle.
It is in array distribution to connect cell, corresponding with the arrangement mode of outsourcing light pricker, forms every outsourcing of optical-fiber bundling
The inner insertion of optical fiber connects small interior, and leaves crack, and the size of slit is not less than the chi for accommodating corresponding pixel switch
It is very little.
The quantity for connecting cell is the half of outsourcing optical fiber sum, sets a pixel to open in each slit for connecting cell
Close, the quantity of pixel switch is identical with the quantity for connecting cell.
The effect of shading astigmatism plate in pixel switch be control by the light of an optical fiber by or do not pass through opposite side
Optical fiber, when control does not allow by another optical fiber it is necessary to which light is reflected, but it is not backtracking, but it is angled anti-
It is mapped in connection cell, light absorbing purpose is as the way of reflected light, makes it completely can not be by the optical fiber of opposite side.
Because digital fiber bundling device 21 controls light beam by the way of direct incidence, in the absence of slit diffraction, be advantageous to
Improve the quality of lithographic images.
Ceramic pin grid array package connects each pixel and opened the light, and is connected with the control board of controller 22.Controller 22
When light beam is exposed on the optical-fiber bundling of optical-fiber bundling device side, source images are converted into the binary system gray-scale map of 8 to 10
As signal, these signals are by addressing, by controlling digital fiber to close the pixel switch rotation in beam or not rotating, so as to realize
Laser beam by or not by the way that the side that is connected with the light path of projection optics 3 that beam is closed in digital fiber produces and moved
State mask pattern.
Controller 22 can use the loading of data row, four pieces of pattern Operation switch timings and the work side for resetting and (switching and reset)
Formula, concretely：
, can be by these signals by addressing the quilt in the form of going and load after source images are converted into gray image signals
The internal memory of writing controller, sequential addressing can also be carried out to row or randow addressing obtains pattern bit signal.Digital fiber closes beam
21 pixel switch is an array, is divided into some pieces according to row, such as adoptable is four pieces of patterns.After signal loading,
A switch commutator pulse is sent to the block of these loading signals again, the block is converted into pixel and switches on-off state, i.e., it is aobvious
Diagram shape.After several clock cycle of first block loading data, complete " 0 " signal is loaded to the block, i.e. pixel is opened
Pass is completely in closed mode, and the reset of switch, the clearing of signal are completed with this.And so on, mask pattern can be achieved
Quick real-time display, the use of mask plate is removed, obtain high-precision figure, Fig. 3 is the mask that space light modulating subsystem 2 is formed
Pictorial diagram.
Projection optics 3 may include projection lens set 31 and substrate 32；Projection lens set 31 is used for mask pattern
Spliced after first splitting by zigzag route, and spliced mask pattern is reduced, is imaged on substrate 32.
In view of the volume entirely without mask optical lithography system, projection optics 3 also include the second reflective mirror 33,
The light beam being emitted for digital fiber bundling device 21 reflexes to projection lens set 31, and projection lens set 31 and substrate 32 are in same
On vertical optical axis.
Under a kind of embodiment, the numerical aperture of camera lens can be that 0.85, enlargement ratio can be in projection lens set
5.2 again.
Limited due to being closed the size of beam 21 by digital fiber, etching system can use the exposure side that figure segmentation is spliced again
Formula, it sequentially can be since the upper right corner, splice according to zigzag course.Fig. 4 is the litho pattern schematic diagram formed on substrate.
First speculum 15 and the second speculum 31 are any one reflection unit, such as can be that surface is coated with high reflection type
Material, reflecting plate of the reflection efficiency up to 99%.
It should be noted that when being not provided with the first speculum 15 and the second speculum 33 in the entire system, quasi-molecule swashs
Light device 11, extender lens group 12, two-stage fly's eye homogenizer 13, collimation lens set 14, digital fiber bundling device 21, projection lens set
31 and substrate 32 on the same level optical axis；When being provided with the first speculum, excimer laser 11, extender lens group
12 on same vertical optical axis, level fly's eye homogenizer 13, collimation lens set 14, digital fiber bundling device 21, projection lens set
31 and substrate 32 on the same level optical axis；When being provided with the second speculum, projection lens set 31 and substrate 32 are located at
On same vertical optical axis, excimer laser 11, extender lens group 12, two-stage fly's eye homogenizer 13, collimation lens set 14, numeral
Optical-fiber bundling device 21 is located on same level optical axis.
In technical scheme provided in an embodiment of the present invention, the light beam being emitted by illumination optics subsystem exposes to numeral
On optical-fiber bundling, closed through digital fiber after beam forms required mask pattern and be emitted to projection lens set, will through projection lens set
Figure is reduced, is imaged on substrate, can obtain required figure.Digital micro-mirror is substituted with digital fiber bundling device, made
Device is produced for the dynamic mask without mask optical lithography system, the pattern transfer of real-time, high efficiency and low cost can be realized,
Pattern imaging quality is improved, enhances light exposure.Because the outsourcing optical fiber that image is presented is micron level, so as to greatly carry
The high resolution ratio and picture quality of image, pixel switch only have two states of break-make, fast response time.
In order to be better understood from the thought of technical scheme and principle, carried out below with a kind of specific application scenarios
The technical scheme provided the embodiment of the present invention is illustrated, referring to Fig. 5, the system that Fig. 5 is the illustrative example is illustrated
Figure.
As shown in Figure 5, it is a kind of to may include excimer laser 51, extender lens group 52, the without mask optical lithography system
One speculum 53, two-stage fly's eye homogenizer 54, collimation lens set 55, digital fiber bundling device 56, controller 57, the second speculum
58th, projection lens set 59 and substrate 510.
The laser beam that excimer laser 51 is emitted is uniform through extender lens group 52, the first reflective mirror 53, two-stage fly's eye
Incide digital fiber after device 54, collimation lens set 55 to close on beam 56, closing beam 56 through digital fiber forms required mask pattern
After be emitted to the second speculum 58, projection lens set 59, figure is reduced, is imaged on substrate 510, you can obtains required light
Needle drawing shape, digital fiber close beam 56 and are connected with control device 57.
The dynamic mask that the embodiment of the present invention closes Shu Zuowei digital photolithographies with digital fiber produces device, saves conventional lithography
Mask plate used, the pattern transfer of real-time, high efficiency and low cost can be realized, improve pattern imaging quality and enhancing exposes
Amount.
Each embodiment is described by the way of progressive in this specification, what each embodiment stressed be with it is other
The difference of embodiment, between each embodiment same or similar part mutually referring to.
Professional further appreciates that, with reference to the unit of each example of the embodiments described herein description
And algorithm steps, can be realized with electronic hardware, computer software or the combination of the two, in order to clearly demonstrate hardware and
The interchangeability of software, the composition and step of each example are generally described according to function in the above description.These
Function is performed with hardware or software mode actually, application-specific and design constraint depending on technical scheme.Specialty
Technical staff can realize described function using distinct methods to each specific application, but this realization should not
Think beyond the scope of this invention.
One kind provided by the present invention is described in detail without mask optical lithography system above.It is used herein
Specific case is set forth to the principle and embodiment of the present invention, and the explanation of above example is only intended to help and understands this
The method and its core concept of invention.It should be pointed out that for those skilled in the art, this hair is not being departed from
On the premise of bright principle, some improvement and modification can also be carried out to the present invention, these are improved and modification also falls into power of the present invention
In the protection domain that profit requires.
Claims (9)
1. one kind is without mask optical lithography system, it is characterised in that including：
Illumination optics subsystem, space light modulating subsystem and projection optics；
The illumination optics subsystem is evenly distributed for emanated energy, is parallel with the optical axis of the space light modulating subsystem
Light beam；
The space light modulating subsystem include digital fiber bundling device and and controller, the digital fiber bundling device with it is described
Controller is connected, and the light beam of the digital fiber bundling device outgoing is projected to the projection optics；For by described
Controller controls the digital fiber bundling device dynamically to obtain mask pattern；
Wherein, the digital fiber bundling device is the outsourcing optical fiber by a diameter of micron level of multi beam, according to default arrangement mode
Arrange and be symmetric in the optical-fiber bundling of both sides, the connection cell of multiple array distributions and in connection cell slit
Pixel switch is formed；The controller is used for the shading astigmatism plate by controlling the pixel to switch, and the photograph is controlled to realize
Whether the light beam of Mingguang City's storage subsystem outgoing is transmitted to the optical-fiber bundling of opposite side by the optical-fiber bundling of side；
The projection optics include projection lens set and substrate；The projection lens set is used for the mask pattern is first
Spliced after segmentation by zigzag route, and spliced mask pattern is reduced, is imaged on the substrate.
2. as claimed in claim 1 without mask optical lithography system, it is characterised in that the illumination optics subsystem includes standard
Molecular laser, extender lens group, two-stage fly's eye homogenizer and collimation lens set；
Wherein, the light beam of the excimer laser outgoing is successively by the extender lens group, the two-stage fly's eye homogenizer
And the collimation lens set, it is incident to the digital fiber bundling device；The extender lens group is used for the PRK
The laser beam of device outgoing expands the square hot spot light beam for pre-set dimension；The two-stage fly's eye homogenizer is used for energy not
Uniform laser beam is decomposed into the uniform beamlet of multi beam.
3. as claimed in claim 2 without mask optical lithography system, it is characterised in that the excimer laser is that wavelength is
193nm LASER Light Source.
4. as claimed in claim 2 without mask optical lithography system, it is characterised in that the extender lens group is by for inciting somebody to action
The laser beam of the excimer laser outgoing carries out the sphere microscope group combination that the one-dimensional cylinder microscope group expanded and two dimension expand
Form.
5. as claimed in claim 2 without mask optical lithography system, it is characterised in that the illumination optics subsystem also includes
First reflective mirror, the two-stage fly's eye homogenizer, the standard point are reflexed to for the light beam after the extender lens group is expanded
Sub- laser and the extender lens group are on same vertical optical axis.
6. as described in claim 2-5 any one without mask optical lithography system, it is characterised in that the two-stage fly's eye is equal
Even device includes two groups of fly lens groups, and it is identical that every group of lens are that end face is that regular hexagon structure, bus are mutually perpendicular to intersect focal length
Post lens.
7. as claimed in claim 1 without mask optical lithography system, it is characterised in that the number of camera lens in the projection lens set
Value aperture is 0.85, enlargement ratio is 5.2 times.
8. as claimed in claim 7 without mask optical lithography system, it is characterised in that the projection optics also include
Second reflective mirror, the light beam for the optical-fiber bundling device to be emitted reflex to the projection lens set, the projection lens set
It is in the substrate on same vertical optical axis.
9. as claimed in claim 1 without mask optical lithography system, it is characterised in that the digital fiber bundling device is by more
Beam diameter is the outsourcing optical fiber of micron level, is arranged according to regular hexagon and is symmetric the optical-fiber bundling, multiple in both sides
The connection cell of array distribution and the pixel in connection cell slit are switched and formed.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108169847A (en) * | 2018-03-13 | 2018-06-15 | 杭州艾芯智能科技有限公司 | A kind of large field of view scan imaging optical system |
| CN115639729A (en) * | 2022-08-30 | 2023-01-24 | 之江实验室 | Optical fiber parallel laser direct writing method and system based on holographic phase splitting |
| CN117539112A (en) * | 2024-01-09 | 2024-02-09 | 之江实验室 | Refined digital imitation body projection device and projection method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2009020395A (en) * | 2007-07-13 | 2009-01-29 | Nikon Corp | Structural component of exposure apparatus, exposure apparatus, exposure method, method for manufacturing device, and device |
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