CN107505761A - The preparation method of chromatic filter and liquid crystal display panel - Google Patents
The preparation method of chromatic filter and liquid crystal display panel Download PDFInfo
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- CN107505761A CN107505761A CN201710842242.9A CN201710842242A CN107505761A CN 107505761 A CN107505761 A CN 107505761A CN 201710842242 A CN201710842242 A CN 201710842242A CN 107505761 A CN107505761 A CN 107505761A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/40—Arrangements for improving the aperture ratio
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- Crystallography & Structural Chemistry (AREA)
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- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
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Abstract
The preparation method that the embodiment of the present application provides chromatic filter and liquid crystal display panel, can improve colour cast, the preparation method of the chromatic filter includes：In forming black-matrix layer on array base palte；In on the array base palte and the black-matrix layer, form color blocking layer, the color blocking layer includes the colour filter of multiple different colours, each colour filter includes the first colour filter region and the second colour filter region, the first colour filter region has first thickness, the second colour filter region has second thickness, and the first thickness is different from the second thickness.
Description
Technical field
The invention relates to field of liquid crystal display, more particularly to a kind of chromatic filter and liquid crystal display panel
Preparation method.
Background technology
Liquid crystal display panel is typically by colorized optical filtering (Color Filter, CF) substrate, thin film transistor (TFT) (Thin
Film Transistor, TFT) array base palte and be configured between two substrates liquid crystal layer (Liquid Crystal Layer,
LC Layer) formed, its operation principle is to control the liquid of liquid crystal layer by applying driving voltage on two panels glass substrate
The rotation of brilliant molecule, the light of backlight module is reflected into generation picture.
At present, the liquid crystal display panel of wide viewing angle can be following several types:Multiregional vertical align ((Multi-
Domain Vertical Alignment, MVA) type, plane conversion (In-Plane Switching, IPS) type and fringing field open
(Fringe Field Switching, the FFS) type of closing.
Multiregional vertical align type (Multi-domain Vertical Alignment, MVA) liquid crystal display is by one
Individual pixel is divided into multiple regions, and uses thrust or specific pattern structure so that positioned at the liquid crystal molecule direction of different zones
Different directions are toppled over, and to have the function that wide viewing angle and lifting penetrance, but such design can cause GTG whiting or colour cast
The problem of.
In IPS patterns or FFS mode, by applying the electric field containing the component for being basically parallel to substrate, make liquid crystal point
Son is corresponding in the direction parallel to base plan and drives liquid crystal molecule.IPS types liquid crystal display panel and FFS type LCDs
Plate, the two has the advantages of wide viewing angle.But because the wavelength of blue light is shorter, compared with feux rouges and green glow, reach identical penetrance
(Transmittance) phase difference (Retardation) needed for is smaller, the voltage (V- of penetrance one of feux rouges, green glow and blue light
T) curve is different；Moreover, poly- phthalimide (PI) film, planarization layer (PFA), the coat of feux rouges, green glow and blue light in the panel
Etc. (OC) penetrance of film surface is different, also results in and colour cast problem occurs.
Therefore, it is necessary to provide a kind of design for improving colour cast problem.
The content of the invention
The embodiment of the present application provides a kind of preparation method of chromatic filter and liquid crystal display panel, can solve the problem that and extensively regards
GTG whiting or the problem of colour cast during angle.
In order to achieve the above object, the embodiment of the present application provides a kind of preparation method of chromatic filter, including：
In forming black-matrix layer on array base palte；
In forming color blocking layer on the array base palte and the black-matrix layer, the color blocking layer includes multiple different colours
Colour filter, each colour filter includes the first colour filter region and the second colour filter region, and the first colour filter region has first
Thickness, the second colour filter region have second thickness, and the first thickness is different from the second thickness, so as to described first
Colour filter region and the second colour filter region can have different light transmittances.
Alternatively, the thickness difference of the first thickness and the second thickness is between 0.3 micron to 0.5 micron.
Alternatively, the colour filter of the multiple different colours includes the first colour filter, in the substrate and the black square
The step of forming first colour filter on battle array layer includes：
In the array base palte with forming the first color film layer in the black-matrix layer；
Using the mask with multiple light-transmission rate, different degrees of exposure imaging is carried out to the first color film layer；
The first color film layer of exposure imaging is etching through, to cause the first area of the first color film layer by part
Etching and form the first colour filter region, the second area of the first color film layer forms the second colour filter region, and
3rd region of the first color film layer is possible to determine when the sample has been completely etched so as to form the first colour filter.
Alternatively, the mask is intermediate tone mask.
Alternatively, the mask corresponds to the light transmittance of the Part I of the first area between 5 percent to percentage
Ten between, the light transmittance that the mask corresponds to the Part II of the second area is 0 percent, and the mask is corresponding
In the 3rd region Part III light transmittance for absolutely.
Alternatively, the colour filter of the multiple different colours is red color filter layer, green color filter layer and blue color filter layer；
Or the colour filter of the multiple different colours is red color filter layer, green color filter layer, blue color filter layer and yellow colour filter
Layer；Or the colour filter of the multiple different colours is red color filter layer, green color filter layer, blue color filter layer and white filter
Chromatograph.
Alternatively, each colour filter includes multiple color blockings, and each color blocking includes the first sub- color blocking region and second
Sub- color blocking region, multiple first sub- color blocking regions form the first colour filter region, and multiple second sub- color blocking regions form second
Colour filter region, first area in the face parallel with the array base palte is more than the described second son in the first sub- color blocking region
The second area in the face parallel with the array base palte in color blocking region.
Alternatively, the ratio of first area and the second area is between 1.5 to 2.3.
In addition, the embodiment of the present application also provides a kind of preparation method of liquid crystal display panel, including：
Form array base palte；
In forming black-matrix layer on the array base palte；
In on the array base palte and the black-matrix layer, color blocking layer is formed, the color blocking layer includes multiple different face
The colour filter of color, each colour filter include the first colour filter region and the second colour filter region, and the first colour filter region has the
One thickness, the second colour filter region have second thickness, and the first thickness is different from the second thickness；
Liquid crystal display panel is formed based on the array base palte, the black-matrix layer and the color blocking layer.
The embodiment of the present application also provides a kind of preparation method of chromatic filter, including：
In forming black-matrix layer on array base palte；
In forming color blocking layer on the array base palte and the black-matrix layer, the color blocking layer includes multiple different colours
Colour filter, each colour filter includes the first colour filter region and the second colour filter region, and the first colour filter region has first
Thickness, the second colour filter region have second thickness, and the first thickness is different from the second thickness, wherein, described
One thickness and the thickness difference of the second thickness are between 0.3 micron to 0.5 micron；
Wherein, the colour filter of the multiple different colours includes the first colour filter, in the substrate and the black matrix"
The step of forming first colour filter on layer includes：
In the array base palte with forming the first color film layer in the black-matrix layer；
Using the mask with multiple light-transmission rate, different degrees of exposure imaging is carried out to the first color film layer；
The first color film layer of exposure imaging is etching through, to cause the first area of the first color film layer by part
Etching and form the first colour filter region, the second area of the first color film layer forms the second colour filter region, and
3rd region of the first color film layer is possible to determine when the sample has been completely etched, so as to form the first colour filter；
Wherein, the mask is intermediate tone mask, and the mask corresponds to the printing opacity of the Part I of the first area
For rate between 5 percent to 10, the light transmittance that the mask corresponds to the Part II of the second area is hundred
/ zero, the mask corresponds to the light transmittance of the Part III in the 3rd region for absolutely.
The chromatic filter and the preparation method of liquid crystal display panel that the embodiment of the present application provides, color blocking layer is arranged at
On array base palte, each colour filter in color blocking layer includes two colour filter regions, and two colour filter regions have different thickness
Degree, so, the light transmittance using the color blocking layer of different-thickness are different, and pixel transmittance is divided into clear zone and dark space, reached low
The effect of colour cast and improve aperture opening ratio and penetrance.
Brief description of the drawings
, below will be to embodiment or existing in order to illustrate more clearly of the embodiment of the present application or technical scheme of the prior art
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are this Shens
Some embodiments please, for those of ordinary skill in the art, on the premise of not paying creative work, can be with root
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is the schematic diagram for the liquid crystal display panel that the embodiment of the application one provides；
Fig. 2 is the schematic diagram for the color blocking that the embodiment of the application one provides；
Fig. 3 is the flow chart of the preparation method for the chromatic filter that the embodiment of the application one provides；
Fig. 4 is the preparation method for the colour filter that the embodiment of the application one provides；
Fig. 5 is the flow chart of the preparation method for the chromatic filter that another embodiment of the application provides；
Fig. 6 to Figure 15 is the manufacturing process schematic diagram of chromatic filter；
Figure 16 is the flow chart of the preparation method for the liquid crystal display panel that the embodiment of the application one provides；
Figure 17 is the schematic diagram for the sub-pixel that the embodiment of the application one provides.
Embodiment
To make the purpose, technical scheme and advantage of the embodiment of the present application clearer, below in conjunction with the embodiment of the present application
In accompanying drawing, the technical scheme in the embodiment of the present application is clearly and completely described, it is clear that described embodiment is
Some embodiments of the present application, rather than whole embodiments.Based on the embodiment in the application, those of ordinary skill in the art
The every other embodiment obtained under the premise of creative work is not made, belong to the scope of the application protection.
The explanation of following embodiment is with reference to additional schema, to illustrate the particular implementation that the application can be used to implementation
Example.The direction term that the application is previously mentioned, such as " on ", " under ", "front", "rear", "left", "right", " interior ", " outer ", " side "
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used is to illustrate and understand the application, and is not used to
Limit the application.
Accompanying drawing and explanation are considered as inherently illustrative rather than restricted.In figure, the similar list of structure
Member is represented with identical label.In addition, being described to understand and be easy to, the size and thickness of each component shown in accompanying drawing are
Arbitrarily show, but the application not limited to this.
In the accompanying drawings, for clarity, the thickness in layer, film, panel, region etc. is exaggerated.In the accompanying drawings, in order to understand
Be easy to describe, exaggerate the thickness of some layers and region.It will be appreciated that ought such as layer, film, region or substrate component quilt
Referred to as " " another component " on " when, the component can be directly on another component, or there may also be middle groups
Part.
In addition, in the description, unless explicitly described as opposite, otherwise word " comprising " will be understood as meaning to wrap
The component is included, but is not excluded for any other component.In addition, in the description, " above " means to be located at target group
Part either above or below, and be not intended to must be positioned on the top based on gravity direction.
Further to illustrate that the application is to reach the technological means and effect that predetermined goal of the invention taken, below in conjunction with
Accompanying drawing and preferred embodiment, the preparation method of a kind of chromatic filter and liquid crystal display panel that are proposed to foundation the application,
Its embodiment, structure, feature and its effect, describe in detail as after.
Fig. 1 is the part-structure schematic diagram for the liquid crystal display panel that the embodiment of the application one provides；Fig. 2 is that the application one is real
The schematic diagram of the color blocking of example offer is provided.As shown in figure 1, liquid crystal display panel includes array base palte 10 and chromatic filter, it is color
Color filter is arranged on array base palte 10, and array base palte 10 is specially tft array substrate, is actively opened formed with TFT etc. thereon
Close element arrays.Chromatic filter can include black-matrix layer and color blocking layer.Black-matrix layer is arranged at array base palte 10
On, black-matrix layer includes multiple black matrix"s 21.Color blocking layer is arranged in array base palte 10 and black-matrix layer, color blocking layer bag
Include the colour filter of multiple different colours, each colour filter includes multiple color blockings, each color blocking include the first sub- color blocking region and
Second sub- color blocking region, the first sub- color blocking region have first thickness, and the second sub- color blocking region has second thickness, first thickness
Different from second thickness, it is described in detail below in conjunction with Fig. 1, Fig. 2.
Two sub- color blocking regions in Fig. 1 in same color blocking are separated with dotted line, include different colours in Fig. 1 with color blocking layer
First colour filter, the second colour filter and the 3rd colour filter, the first colour filter include multiple first color blockings 22, each first color blocking
22 include sub- color blocking region 221,222, and the second colour filter includes multiple second color blockings 23, and each second color blocking 23 includes sub- color blocking
Region 231,232, the 3rd colour filter include multiple 3rd color blockings 24, and each 3rd color blocking 24 includes sub- color blocking region 241,242,
The thickness d 1 of sub- color blocking region 221,232,241 illustrates exemplified by being less than the thickness d 2 of sub- color blocking region 222,232,242.Ginseng
According to shown in Fig. 2, the thickness of the sub- color blocking region 221 of the first color blocking 22 is less than the thickness of sub- color blocking region 222.
It should be noted that enter in Fig. 1 so that the thickness of the colour filter for multiple different colours that color blocking layer includes is equal as an example
Row explanation.In another embodiment herein, according to the actual requirements, the colour filter for multiple different colours that color blocking layer includes
Thickness can be not completely equivalent, but the color blocking in each colour filter includes the first sub- color blocking region and the second sub- color blocking area
Domain, and the first thickness of the first sub- color blocking region is less than the second thickness of the second sub- color blocking region, for example, the thickness of blue color filter layer
More than the thickness of red color filter layer and the thickness of green color filter layer, the blue color blocking in blue color filter layer includes first blue degree
The thickness of dice color blocking region is less than the thickness of the second sub- color blocking region of blueness, the red color resistance in red color filter layer include the
The thickness of one red sub- color blocking region is less than the thickness of the second red sub- color blocking region, and the thickness of the second sub- color blocking region of blueness is big
In the thickness of the second red sub- color blocking region.
In the embodiment of the application, the first colour filter, the second colour filter and the 3rd colour filter can it is different and
Respectively red color filter layer, green color filter layer and blue color filter layer, corresponding first color blocking 22, the second color blocking 23 and the 3rd
The difference of color blocking 24 and respectively red color resistance, green color blocking and blue color blocking.Exemplary, the first colour filter is red color filter
Layer, the first color blocking 22 are red color resistance, and the second colour filter is blue color filter layer, the second color blocking 23 is blue color blocking, the 3rd colour filter
Layer is green color filter layer, the 3rd color blocking 24 is green color blocking.
The embodiment of the present application also provides a kind of liquid crystal display, and this liquid crystal display can include above-mentioned liquid crystal display
Panel and backlight module.The light that backlight module is sent passes through penetrance during the first sub- color blocking region with first thickness
It is relatively large, pixel transmittance clear zone is formed, the light that backlight module is sent passes through the second sub- color blocking region with second thickness
When penetrance it is relatively small, form pixel transmittance dark space.
Common low colour cast technology cardinal principle is that traditional 4 regions are cut into 8 again using partial pressure or extra type of drive
Region, but this design is relative complex.The liquid crystal display panel and liquid crystal display that the embodiment of the present application provides, by color blocking layer
It is arranged on array base palte, the region that color blocking is arranged to have different-thickness, the region for passing through different-thickness using light
The difference of penetrance, pixel transmittance is divided into printing opacity brightness and printing opacity dark space, effect that is simple in construction, reaching low colour cast and
Improve aperture opening ratio and penetrance.
In the embodiment of the application, first thickness d1 and second thickness d2 thickness difference is between 0.3 μm (micron)
To between 0.5 μm.
In the embodiment of the application, color blocking layer can include red color filter layer, green color filter layer and blueness filter
Chromatograph.Certainly, in another embodiment herein, color blocking layer can include red color filter layer, green color filter layer, blueness filter
Chromatograph and yellow colour filter.In a further embodiment of the application, color blocking layer can include red color filter layer, green color
Layer, blue color filter layer and white filter layer.
In the embodiment of the application, first area in the face parallel with array base palte 10 in the first sub- color blocking region
The second area in face parallel with array base palte 10 in the second sub- color blocking region is greater than, it is exemplary, as shown in Fig. 2 the
The first area A1 in the face parallel with array base palte 10 is more than in the second sub- color blocking region 222 and battle array in one sub- color blocking region 221
The second area A2 in the parallel face of row substrate 10.Specifically, the ratio of the first area and second area is between 1.5 to 2.3.
In the embodiment of the application, chromatic filter can also include conductive layer, and conductive layer is arranged at color blocking layer
On.Alternatively, conductive layer is tin indium oxide (ITO) conductive layer.
In the embodiment of the application, as shown in figure 1, chromatic filter can also include conductive layer 30 and protection
Layer 40, protective layer 40 is arranged in color blocking layer, and conductive layer 30 is arranged on protective layer 40, i.e., protective layer 40 be arranged at color blocking layer with
Between conductive layer 30.In the present embodiment, protective layer 40 also serves as planarization layer use.
In the embodiment of the application, liquid crystal display panel can also include liquid crystal layer, and liquid crystal layer is arranged at colour
On filter.
Fig. 3 is the flow chart of the preparation method for the chromatic filter that the embodiment of the application one provides.Colour as shown in Figure 3
The preparation method of filter, may comprise steps of：
Step 102, in forming black-matrix layer on array base palte 10, black-matrix layer includes multiple black matrix"s 21.
Step 104, in array base palte 10 and black-matrix layer, form color blocking layer, color blocking layer includes multiple different colours
Colour filter, each colour filter includes the first colour filter region and the second colour filter region, and the first colour filter region has first thickness,
Second colour filter region has second thickness, and first thickness is different from second thickness.
The chromatic filter made by the present embodiment, color blocking layer are arranged on array base palte, each filter in color blocking layer
Chromatograph includes two colour filter regions, and two colour filter regions have different thickness, so, utilize the color blocking layer of different-thickness
Light transmittance it is different, pixel transmittance is divided into clear zone and dark space, effect that is simple in construction, reaching low colour cast and improved out
Mouth rate and penetrance.
In the embodiment of the application, the preparation method of chromatic filter can also include：In being formed in color blocking layer
Conductive layer.
In another embodiment herein, the preparation method of chromatic filter can also include：In shape in color blocking layer
Into protective layer 40, in formation conductive layer 30 on protective layer.
Fig. 4 is the preparation method for the colour filter that the embodiment of the application one provides.Below with the colour filter of multiple different colours
Illustrated exemplified by the first colour filter in layer, as shown in figure 4, the preparation method of the first colour filter may comprise steps of：
Step 202, in array base palte 10 and black-matrix layer, form the first color film layer.
Step 204, using the mask with multiple light-transmission rate, different degrees of exposure is carried out to the first color film layer and shown
Shadow.
Step 206, the first color film layer for being etching through exposure imaging, to cause the first area quilt of the first color film layer
Part etches and forms the first colour filter region, and the second area of the first color film layer forms the second colour filter region, and the first color
3rd region of film layer is possible to determine when the sample has been completely etched, so as to form the first colour filter.
In the embodiment of the application, mask is halftoning (half tone) mask.
Fig. 5 is the flow chart of the preparation method for the chromatic filter that another embodiment of the application provides；Fig. 6 to Figure 15 is coloured silk
The manufacturing process schematic diagram of color filter.Below by taking the colour filter that color blocking layer includes three kinds of colors as an example and with reference to Fig. 5 to Figure 15
Illustrate the preparation method of chromatic filter, the preparation method of the chromatic filter may comprise steps of：
Step 301, in forming black-matrix layer on array base palte 10, as shown in fig. 6, black-matrix layer includes multiple black
Matrix 21.
Step 302, in array base palte 10 and black-matrix layer, form the first color film layer 400, as shown in Figure 7.
Step 303, using the first mask 500 with multiple light-transmission rate, the first color film layer 400 is carried out in various degree
Exposure imaging, as shown in Figure 8.
Step 304, the first color film layer 400 for being etching through exposure imaging, to cause the first of the first color film layer 400
Region E1 is partially etched and forms the first colour filter region 411, and the second area E2 of the first color film layer 400 forms the second colour filter
Region 412, and the 3rd region E3 of the first color film layer 400 is possible to determine when the sample has been completely etched, so as to form the first colour filter 410, wherein the
One colour filter region 411 has first thickness, and the second colour filter region 412 has second thickness, and first thickness is less than second thickness, such as
Shown in Fig. 9.First mask 500 has the first masked areas X1, the second masked areas X2 and the 3rd masked areas X3, and first covers
The region that diaphragm area X1 expression some lights can pass through, the region that the second masked areas X2 expression light can not pass through, the 3rd
Masked areas X3 represents the region that whole light can pass through, using the first mask 500 to the regional of the first color film layer 400
Different degrees of exposure imaging is carried out, it is exemplary, the first masked areas X1 is directed at the first color film layer 400 and is intended to part removal
First area E1, by the second masked areas X2 be aligned the first color film layer 400 be intended to entirely without must remove second area E2, will
3rd masked areas X3 is directed at the 3rd region E3 that the first color film layer 400 is intended to all remove.Due to the first of the first mask 500
Masked areas X1, the second masked areas X2 and the 3rd masked areas X3 light transmittance are different, are being exposed development and erosion
After quarter, as shown in figure 9, first area E1 the first color film layer 400 is partially etched, second area E2 the first color film
Layer 400 is retained completely, and the 3rd region E3 the first color film layer 400 is possible to determine when the sample has been completely etched and removed.
Step 305, on array base palte 10, black-matrix layer and the first colour filter, form the second color film layer 600,
As shown in Figure 10.
Step 306, using the second mask 700 with multiple light-transmission rate, the second color film layer 600 is carried out in various degree
Exposure imaging, as shown in figure 11.
Step 307, the second color film layer 600 for being etching through exposure imaging, to cause the first of the second color film layer 600
Region F1 is partially etched and forms the first colour filter region 611, and the second area F2 of the second color film layer 600 forms the second colour filter
Region 612, and the 3rd region F3 of the second color film layer 600 is possible to determine when the sample has been completely etched so as to form the second colour filter 610, such as Figure 12 institutes
Show.Second mask 700 has the first masked areas Y1, the second masked areas Y2, the 3rd masked areas Y3, the first masked areas Y1
The region that some light can pass through is represented, the second masked areas Y2 represents the region that light can not pass through, the 3rd masked areas
Y3 represents the region that whole light can pass through, and the regional of second color film layer 600 is carried out using the second mask 700 different
The exposure imaging of degree, it is exemplary, the second color film layer 600 of the first masked areas Y1 alignments is intended to the firstth area of part removal
Domain F1, the second masked areas Y2 is directed at the second color film layer 600 and is intended to entirely without the second area F2 that must be removed, by the 3rd mask
Region Y3 is directed at the 3rd region F3 that the second color film layer 600 is intended to all remove.Due to the first masked areas of the second mask 700
Y1, the second masked areas Y2 and the 3rd masked areas Y3 light transmittance are different, after development and etching is exposed, such as
Shown in Figure 12, first area F1 the second color film layer 600 is partially etched, and second area F2 the second color film layer 600 is complete
Complete to be retained, the 3rd region F3 the second color film layer 600 is possible to determine when the sample has been completely etched and removed.
Step 308, on array base palte, black-matrix layer, the first colour filter and the second colour filter, form the 3rd color
Film layer 800, as shown in figure 13.
Step 309, using the 3rd mask 900 with multiple light-transmission rate, the 3rd color film layer 800 is carried out in various degree
Exposure imaging, as shown in figure 14.
Step 310, the 3rd color film layer 800 for being etching through exposure imaging, to cause the first of the 3rd color film layer 800
Region G1 is partially etched and forms the first colour filter region 811, and the second area G2 of the 3rd color film layer 800 forms the second colour filter
Region 812, and the 3rd region G3 of the 3rd color film layer 800 is possible to determine when the sample has been completely etched so as to form the 3rd colour filter 810, the first colour filter
The 410, second colour filter 610 of layer and the 3rd colour filter 810 composition color blocking layer, as shown in figure 15.3rd mask 900 has first
Masked areas Z1, the second masked areas Z2, the 3rd masked areas Z3, the first masked areas Z1 represent what some light can pass through
Region, the second masked areas Z2 represent the region that light can not pass through, and the 3rd masked areas Z3 represents that whole light can pass through
Region, different degrees of exposure imaging is carried out to the regional of the 3rd color film layer 800 using the 3rd mask 900, it is exemplary
, by the first masked areas Z1 be aligned the 3rd color film layer 800 be intended to part removal first area G1, by the second masked areas Z2
The 3rd color film layer 800 is directed to be intended to, entirely without the second area G2 that must be removed, the 3rd masked areas Z3 is directed at into the 3rd color film
Layer 800 is intended to the 3rd region G3 all removed.Due to the first masked areas Z1 of the 3rd mask 900, the second masked areas Z2 with
And the 3rd masked areas Z3 light transmittance it is different, after development and etching is exposed, as shown in figure 15, first area G1
The 3rd color film layer 800 be partially etched, second area G2 the 3rd color film layer 800 is retained completely, the 3rd region G3
The 3rd color film layer 800 be possible to determine when the sample has been completely etched and remove.
In the embodiment of the application, mask corresponds to the light transmittance of the Part I of first area between percent
Between five to 10, the light transmittance that mask corresponds to the Part II of second area is 0 percent, and mask corresponds to the
The light transmittance of the Part III in three regions is absolutely.For example, the first masked areas X1 of the first mask 500 light transmittance is situated between
Between 5 percent to 10, the second masked areas X2 light transmittance be 0 percent, the 3rd masked areas X3's is saturating
Light rate is absolutely.
In the embodiment of the application, the first color film layer 400 is red film layer, green film layer and blue film layer
One of in, the second color film layer 600 is wherein another in red film layer, green film layer and blue film layer, and the 3rd
The color of color film layer 800 is different from the first color film layer 400 and the second color film layer 600.Exemplary, the first color film
Layer 400 is red film layer, and the second color film layer 600 is green film layer, and the 3rd color film layer 800 is blue film layer, then corresponding,
First colour filter 410 is red color filter layer, and the second colour filter 610 is green color filter layer, and the 3rd colour filter 810 is blue color
Layer.Red color filter layer includes multiple red color resistances, and green color filter layer includes multiple green color blockings, and blue color filter layer includes multiple indigo plants
Color color blocking.In the embodiment of the application, a red color resistance, a green color blocking and a blue color blocking form coloured silk
A pixel cell on color filter simultaneously corresponds to a red sub-pixel, a green sub-pixels and a sub- picture of blueness respectively
Element.
Figure 16 is the flow chart of the preparation method for the liquid crystal display panel that the embodiment of the application one provides.As shown in figure 16
The preparation method of liquid crystal display panel, may comprise steps of：
Step 402, provide array base palte 10.
Step 404, in forming black-matrix layer on array base palte 10, black-matrix layer includes multiple black matrix"s 21.
Step 406, in array base palte 10 and black-matrix layer, form color blocking layer, color blocking layer includes multiple different colours
Colour filter, each colour filter includes the first colour filter region and the second colour filter region, and the first colour filter region has first thickness,
Second colour filter region has second thickness, and first thickness is different from second thickness.
Step 408, based on array base palte 10, black-matrix layer and color blocking layer formed liquid crystal display panel.
In the embodiment of the application, step 408 can include：In forming conductive layer in color blocking layer；Based on array
Substrate, black-matrix layer, color blocking layer and conductive layer form liquid crystal display panel.In another embodiment herein, in
The step of conductive layer is formed in color blocking layer can include：In formation protective layer in color blocking layer and in formation conduction on protective layer
Layer.
The application also provides a kind of dot structure of array base palte, includes the pixel cell of multiple arrays arrangement, each picture
Plain unit includes multiple sub-pixels.Figure 17 is the schematic diagram for the sub-pixel that the embodiment of the application one provides.As shown in figure 17,
Sub-pixel 100 includes the first subpixel area 1001 and the second subpixel area 1002, and the of the first subpixel area 1001
One region area is more than the second area area of the second subpixel area 1002.
By this embodiment, each pixel cell in the pixel cell of multiple array arrangements includes multiple sub-pixels
100, each sub-pixel includes two subpixel areas, and the size of two subpixel areas is different, can be preferably to picture
The clear zone and dark space that plain printing opacity is distinguished are controlled, and reach the effect of low colour cast, effect that is simple in construction and reaching low colour cast.
In the embodiment of the application, the ratio of first area area and second area area between 1.5 to 2.3 it
Between.
In the embodiment of the application, the first subpixel area 1001 is aligned with the first sub- color blocking region, the second son
Pixel region 1002 is aligned with the second sub- color blocking region.
In the embodiment of the application, multiple sub-pixels are red sub-pixel, green sub-pixels and the sub- picture of blueness
Element.
In another embodiment herein, multiple sub-pixels are red sub-pixel, green sub-pixels, blue subpixels
And yellow sub-pixel.
In a further embodiment of the application, multiple sub-pixels are red sub-pixel, green sub-pixels, blue subpixels
And white sub-pixels.
The application also provides a kind of array base palte, and this array base palte can include：Common line, data wire, scan line and
The dot structure of above-mentioned array base palte, the dot structure of array base palte couple with data wire, scan line respectively.
" in certain embodiments " and " in various embodiments " term is used repeatedly etc..The term is not usually
Refer to identical embodiment；But it may also mean that identical embodiment.The word such as "comprising", " having " and " comprising " is synonymous
Word, unless its context meaning shows other meanings.
It is described above, only it is the preferred embodiment of the application, not makees any formal limitation to the application, though
Right the application is disclosed above with specific embodiment, but is not limited to the application, any to be familiar with this professional technology
Personnel, do not departing from the range of technical scheme, when the technology contents using the disclosure above make a little change or repair
The equivalent embodiment for equivalent variations is adornd, as long as being the content without departing from technical scheme, the technology according to the application is real
Any simple modification, equivalent change and modification that confrontation above example is made, still fall within the scope of technical scheme
It is interior.
Claims (10)
- A kind of 1. preparation method of chromatic filter, it is characterised in that including：In forming black-matrix layer on array base palte；In forming color blocking layer on the array base palte and the black-matrix layer, the color blocking layer includes the filter of multiple different colours Chromatograph, each colour filter include the first colour filter region and the second colour filter region, and the first colour filter region has first thickness, The second colour filter region has second thickness, and the first thickness is different from the second thickness.
- 2. the preparation method of chromatic filter according to claim 1, it is characterised in that the first thickness and described the The thickness difference of two thickness is between 0.3 micron to 0.5 micron.
- 3. the preparation method of chromatic filter according to claim 1, it is characterised in that the filter of the multiple different colours Chromatograph includes the first colour filter, includes the step of the substrate in the black-matrix layer with forming first colour filter：In the array base palte with forming the first color film layer in the black-matrix layer；Using the mask with multiple light-transmission rate, different degrees of exposure imaging is carried out to the first color film layer；The first color film layer of exposure imaging is etching through, to cause the first area of the first color film layer to be partially etched And the first colour filter region is formed, the second area of the first color film layer forms the second colour filter region, and described 3rd region of the first color film layer is possible to determine when the sample has been completely etched, so as to form the first colour filter.
- 4. the preparation method of chromatic filter according to claim 3, it is characterised in that the mask is covered for halftoning Film.
- 5. the preparation method of chromatic filter according to claim 4, it is characterised in that the mask corresponds to described the For the light transmittance of the Part I in one region between 5 percent to 10, the mask corresponds to the second area Part II light transmittance be 0 percent, the mask correspond to the 3rd region Part III light transmittance be hundred / hundred.
- 6. the preparation method of chromatic filter according to claim 1, it is characterised in that the filter of the multiple different colours Chromatograph is red color filter layer, green color filter layer and blue color filter layer；OrThe colour filter of the multiple different colours is red color filter layer, green color filter layer, blue color filter layer and yellow colour filter； OrThe colour filter of the multiple different colours is red color filter layer, green color filter layer, blue color filter layer and white filter layer.
- 7. the preparation method of chromatic filter according to claim 1, it is characterised in that each colour filter includes more Individual color blocking, each color blocking include the first sub- color blocking region and the second sub- color blocking region, multiple first sub- color blocking region composition institutes State the first colour filter region, multiple second sub- color blocking regions form the second colour filter regions, in the first sub- color blocking region with it is described First area in the parallel face of array base palte is more than face parallel with the array base palte in the described second sub- color blocking region Second area.
- 8. the preparation method of chromatic filter according to claim 7, it is characterised in that first area and described the The ratio of two areas is between 1.5 to 2.3.
- A kind of 9. preparation method of liquid crystal display panel, it is characterised in that including：Array basal plate is provided；In forming black-matrix layer on the array base palte；In on the array base palte and the black-matrix layer, forming color blocking layer, the color blocking layer includes multiple different colours Colour filter, each colour filter include the first colour filter region and the second colour filter region, and the first colour filter region has the first thickness Degree, the second colour filter region have second thickness, and the first thickness is different from the second thickness；Liquid crystal display panel is formed based on the array base palte, the black-matrix layer and the color blocking layer.
- A kind of 10. preparation method of chromatic filter, it is characterised in that including：In forming black-matrix layer on array base palte；In forming color blocking layer on the array base palte and the black-matrix layer, the color blocking layer includes the filter of multiple different colours Chromatograph, each colour filter include the first colour filter region and the second colour filter region, and the first colour filter region has first thickness, The second colour filter region has second thickness, and the first thickness is different from the second thickness, wherein, the first thickness Thickness difference with the second thickness is between 0.3 micron to 0.5 micron；Wherein, the colour filter of the multiple different colours includes the first colour filter, on the substrate and the black-matrix layer The step of forming first colour filter includes：In the array base palte with forming the first color film layer in the black-matrix layer；Using the mask with multiple light-transmission rate, different degrees of exposure imaging is carried out to the first color film layer；The first color film layer of exposure imaging is etching through, to cause the first area of the first color film layer to be partially etched And the first colour filter region is formed, the second area of the first color film layer forms the second colour filter region, and described 3rd region of the first color film layer is possible to determine when the sample has been completely etched, so as to form the first colour filter；Wherein, the mask is intermediate tone mask, and the light transmittance that the mask corresponds to the Part I of the first area is situated between Between 5 percent to 10, the light transmittance that the mask corresponds to the Part II of the second area is percent Zero, the mask corresponds to the light transmittance of the Part III in the 3rd region for absolutely.
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| CN201710842242.9A CN107505761B (en) | 2017-09-18 | 2017-09-18 | Color filter and manufacturing method of liquid crystal display panel |
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