CN104793391B - A kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel - Google Patents
A kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel Download PDFInfo
- Publication number
- CN104793391B CN104793391B CN201510117726.8A CN201510117726A CN104793391B CN 104793391 B CN104793391 B CN 104793391B CN 201510117726 A CN201510117726 A CN 201510117726A CN 104793391 B CN104793391 B CN 104793391B
- Authority
- CN
- China
- Prior art keywords
- layers
- black
- sub
- substrate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 126
- 239000012528 membrane Substances 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 19
- 239000011159 matrix material Substances 0.000 claims abstract description 85
- 239000002184 metal Substances 0.000 claims abstract description 13
- 230000008021 deposition Effects 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims 2
- 239000011248 coating agent Substances 0.000 abstract description 11
- 238000000576 coating method Methods 0.000 abstract description 11
- 238000003825 pressing Methods 0.000 abstract description 9
- 238000010586 diagram Methods 0.000 description 7
- 230000000903 blocking effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
Abstract
A kind of production method the invention discloses color membrane substrates includes: to provide a substrate, and substrate includes color diaphragm area, W sub-pixel region and black matrix area;OC layers of the coating one the oneth on substrate;To the first OC layers be patterned processing, retain the first OC layers of W sub-pixel region, other regions the first OC layers remove;A black-matrix layer is deposited on substrate;Processing is patterned to black-matrix layer, retains the black-matrix layer of black matrix area, the black-matrix layer in other regions removes;Color diaphragm area on substrate is coated with RGB color resistance layer, to form RGB coloured silk film, the thickness of RGB coloured silk film and W sub-pixel region the first OC layers thickness it is identical;OC layers of the coating the 2nd on substrate;And transparent metal layer is deposited on OC layers the 2nd, to form transparent electrode.The invention can avoid W sub-pixel regions to be recessed, so that the light leakage for effectively avoiding RGBW pixel from occurring, is effectively improved the problem of pressing color difference.
Description
[technical field]
The present invention relates to field of display technology, in particular to a kind of production method of color membrane substrates, color membrane substrates and liquid
LCD panel.
[background technique]
In the prior art, the principle of RGBW liquid crystal display technology be a kind of white (W) sub-pixel is dosed by red (R),
Green (G), blue (B) three colour cell at traditional rgb pixel in, then reapply corresponding sub-pixel imaging technique, seen with the mankind
The mode of image preferably arranges these sub-pixels.It just can ensure to generate what those cannot be seen by human eye in this way
When image, display screen power and intensity source will not be lost.RGBW sub-pixel imaging technique individually addresses for each sub-pixel, and
And a kind of white sub-pixels are added in pattern of rows and columns, a kind of RGBW pixel design is formed, which sets than traditional rgb pixel
The display screen of meter will more become clear and resolution ratio wants some higher.Because more backlights can pass through bigger and semi-transparent W picture
Element shines, rather than is blocked by the close-packed arrays that smaller red, green, blue sub-pixel that RGB stripe line uses is constituted, transmissivity and
Brightness is increased.Using white subpixel, the increase of white brightness is realized in the case where power consumption does not have increased situation.Cause
And the advantage of RGBW technology is the utilization rate of improving brightness of backlight source, saves power consumption, reduces cost, and do not reducing resolution ratio
Or in the case where increasing power consumption use, more levels of brightness is obtained.Therefore, RGBW liquid crystal display can more and more extensive use.
Referring to Fig. 1, being the structural schematic diagram for the color membrane substrates that the prior art provides, it can be seen that due to R, G, B
Pixel will use the color blocking of same thickness, and W sub-pixel does not have color blocking, so OC is covered on W after integrally coating one layer of OC
Sunk area will occur in pixel portion.Sunk area uneven surface can make in this way after carrying out friction treatment to oriented layer
There are the non-uniform phenomenons of friction orientation for oriented layer, and then will lead to leakage problem;Also, the uneven surface of oriented layer can also
The problems such as keeping the mobility for the liquid crystal molecule being in contact with oriented layer poor, and then pressing color difference can be generated.
Therefore, it is necessary to propose a kind of new technical solution, to solve the above technical problems.
[summary of the invention]
The purpose of the present invention is to provide a kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel,
It is avoided that W sub-pixel region is recessed, so that the light leakage for effectively avoiding RGBW pixel from occurring, is effectively improved pressing color difference
Problem.
To solve the above problems, technical scheme is as follows:
A kind of production method of color membrane substrates, the production method of the color membrane substrates include:
A substrate is provided, the substrate includes color diaphragm area, W sub-pixel region and black matrix area;
OC layers of coating one the oneth on the substrate;
To the described first OC layers be patterned processing, retain the described first OC layers of the W sub-pixel region, other areas
Domain the described first OC layers remove;
A black-matrix layer is deposited on the substrate;
Processing is patterned to the black-matrix layer, retains the black-matrix layer of the black matrix area,
The black-matrix layer in other regions removes;
The color diaphragm area on the substrate is coated with RGB color resistance layer, to form RGB coloured silk film, wherein the RGB is color
The thickness of film and the W sub-pixel region the described first OC layers thickness it is identical;
OC layers of coating the 2nd on the substrate;And
Transparent metal layer is deposited on OC layers the described 2nd, to form transparent electrode.
Preferably, in the production method of the color membrane substrates, the thickness of the RGB coloured silk film, the black matrix area
The black-matrix layer thickness and the W sub-pixel region the described first OC layers thickness it is all the same.
Preferably, in the production method of the color membrane substrates, to the described first OC layers be patterned processing, retain institute
The described first OC layers for stating W sub-pixel region, specifically include the described first OC layers of remove the step of in other regions:
To the described first OC layers be exposed, develop and etch, retain the first OC in the W sub-pixel region
Layer, other regions the described first OC layers remove.
Preferably, in the production method of the color membrane substrates, on the substrate coat the 2nd OC layers the step of, specifically
Include:
In the RGB color resistance layer of the color diaphragm area, in the black-matrix layer of the black matrix area, with
And the described 2nd OC layers are coated on OC layers of the described first of the W sub-pixel region.
Preferably, in the production method of the color membrane substrates, the corresponding R coloured silk of a pixel of the color membrane substrates
Film, a G coloured silk film, a B coloured silk film and a W sub-pixel.
A kind of color membrane substrates, the color membrane substrates include:
One substrate, the substrate include color diaphragm area, W sub-pixel region and black matrix area;
One the oneth OC layers, it is set to the W sub-pixel region on the substrate;
One black-matrix layer, the black matrix area being set on the substrate;
One RGB color resistance layer, the color diaphragm area being set on the substrate;
One the 2nd OC layers, be set in the RGB color resistance layer of the color diaphragm area, the black matrix area it is described
In black-matrix layer and on the first OC layer in the W sub-pixel region;
One transparent metal layer is set on the 2nd OC layer;
Wherein, the thickness of OC layers of the described first of the thickness of the RGB coloured silk film and the W sub-pixel region is identical.
Preferably, in the color membrane substrates, the black of the thickness of the RGB coloured silk film, the black matrix area
The thickness of matrix layer and the W sub-pixel region the described first OC layers thickness it is all the same.
Preferably, in the color membrane substrates, a pixel of the color membrane substrates corresponding a R coloured silk film, a G coloured silk
Film, a B coloured silk film and a W sub-pixel.
A kind of liquid crystal display panel, the liquid crystal display panel include: array substrate, color membrane substrates and are set to institute
State the liquid crystal layer between array substrate and the color membrane substrates;
Wherein, the color membrane substrates include:
One substrate, the substrate include color diaphragm area, W sub-pixel region and black matrix area;
One the oneth OC layers, it is set to the W sub-pixel region on the substrate;
One black-matrix layer, the black matrix area being set on the substrate;
One RGB color resistance layer, the color diaphragm area being set on the substrate;
One the 2nd OC layers, be set in the RGB color resistance layer of the color diaphragm area, the black matrix area it is described
In black-matrix layer and on the first OC layer in the W sub-pixel region;
One transparent metal layer is set on the 2nd OC layer;
Wherein, the thickness of OC layers of the described first of the thickness of the RGB coloured silk film and the W sub-pixel region is identical.
Preferably, in the liquid crystal display panel, the thickness of the RGB coloured silk film, the black matrix area it is described
The thickness of black-matrix layer and the W sub-pixel region the described first OC layers thickness it is all the same.
Compared with the prior art, the present invention is by first making the first OC layers in W sub-pixel region, also, guarantees R, G, B color blocking
First OC layer of consistency of thickness of layer and W sub-pixel region, in this way it is last it is whole coat the 2nd after OC layers, the 2nd OC layers cover
It is flat.Therefore, the embodiment of the present invention is avoided that W sub-pixel region is recessed, so that RGBW pixel effectively be avoided to occur
Light leakage, be effectively improved pressing color difference the problem of.
For above content of the invention can be clearer and more comprehensible, preferred embodiment is cited below particularly, and cooperate institute's accompanying drawings, makees
Detailed description are as follows.
[Detailed description of the invention]
Fig. 1 is the structural schematic diagram for the color membrane substrates that the prior art provides;
Fig. 2 is the implementation process schematic diagram of the production method of color membrane substrates provided in an embodiment of the present invention;
Fig. 3 is that the decomposition of the color film substrate structure provided in an embodiment of the present invention obtained in production color membrane substrates process is shown
It is intended to;
Fig. 4 is the structural schematic diagram of color membrane substrates provided in an embodiment of the present invention.
[specific embodiment]
The word " embodiment " used in this specification means serving as example, example or illustration.In addition, this specification and institute
The article " one " used in attached claim can generally be interpreted to mean " one or more ", unless specified otherwise or
Guiding singular is understood from context.
In embodiments of the present invention, by first making the first OC layers in W sub-pixel region, also, guarantee R, G, B color blocking layer
With the first OC layers of the consistency of thickness in W sub-pixel region, in this way after last the 2nd OC layers of whole coating, the 2nd OC layers of covering are
Flat.Therefore, the embodiment of the present invention is avoided that W sub-pixel region is recessed, so that RGBW pixel effectively be avoided to occur
Light leakage is effectively improved the problem of pressing color difference.
In order to illustrate technical solutions according to the invention, the following is a description of specific embodiments.
Please refer to figs. 2 and 3 together, and Fig. 2 is the realization stream of the production method of color membrane substrates provided in an embodiment of the present invention
Journey schematic diagram;Fig. 3 is the decomposition of the color film substrate structure provided in an embodiment of the present invention obtained in production color membrane substrates process
Schematic diagram.For ease of description, only parts related to embodiments of the present invention are shown.
In embodiments of the present invention, the production method of the color membrane substrates mainly comprises the steps that
In step s101, a substrate is provided, the substrate includes color diaphragm area, W sub-pixel region and black matrix"
Region;
In embodiments of the present invention, the substrate provided can be glass substrate, and the substrate includes being used to form RGB coloured silk
The color diaphragm area of film, the W sub-pixel region for being used to form white sub-pixels and the black matrix" area for being used to form black matrix"
Domain.
In step s 102, OC layers of coating one the oneth on the substrate;
In embodiments of the present invention, one layer the first OC layers are coated in the whole surface of the substrate.
In step s 103, to the described first OC layers be patterned processing, retain described the of the W sub-pixel region
One OC layers, other regions the described first OC layers remove;
In embodiments of the present invention, to the described first OC layers the technological operations such as be exposed, develop and etch, retain
The described first OC layers of the W sub-pixel region, other regions the described first OC layers remove.
In step S104, a black-matrix layer is deposited on the substrate;
In embodiments of the present invention, described the of the thickness of the black-matrix layer of deposition and the W sub-pixel region
One OC layers of thickness is identical.
In step s105, processing is patterned to the black-matrix layer, retains the institute of the black matrix area
Black-matrix layer is stated, the black-matrix layer in other regions removes;
In embodiments of the present invention, it the technological operations such as is exposed, develops and etches to the black-matrix layer, protect
The black-matrix layer of the black matrix area is stayed, the black-matrix layer in other regions removes.
In step s 106, the color diaphragm area on the substrate is coated with RGB color resistance layer, to form RGB coloured silk film,
In, the thickness of the RGB coloured silk film and the W sub-pixel region the described first OC layers thickness it is identical;
In step s 107, OC layers of coating the 2nd on the substrate;And
In embodiments of the present invention, the 2nd OC layers of whole coating on the substrate, specifically, in the color diaphragm area
In the RGB color resistance layer, in the black-matrix layer of the black matrix area and W sub-pixel region it is described
First is coated with the described 2nd OC layers on OC layers.
Wherein, the corresponding R coloured silk film of a pixel of the color membrane substrates, a G coloured silk film, a B coloured silk film and one
W sub-pixel.
In step S108, transparent metal layer is deposited on OC layers the described 2nd, to form transparent electrode.
In embodiments of the present invention, the transparent metal layer can be made of ITO.
From the foregoing, it will be observed that the present embodiment is by first making the first OC layers in W sub-pixel region, also, guarantee R, G, B color blocking layer
With the first OC layers of the consistency of thickness in W sub-pixel region, in this way after last the 2nd OC layers of whole coating, the 2nd OC layers of covering are
Flat.Therefore, the embodiment of the present invention is avoided that W sub-pixel region is recessed, so that RGBW pixel effectively be avoided to occur
Light leakage is effectively improved the problem of pressing color difference.
Referring to Fig. 4, being the structural schematic diagram of color membrane substrates provided in an embodiment of the present invention.For ease of description, only show
Part related to the embodiment of the present invention is gone out.
The color membrane substrates include: a substrate 100, one the oneth OC layer 200, a black-matrix layer 300, a RGB color resistance layer
400, one the 2nd OC layer 500 and a transparent metal layer 600.Wherein, the substrate 100 includes color diaphragm area, W sub-pixel area
Domain and black matrix area;The first OC layer 200 is set to the W sub-pixel region on the substrate 100;It is described
Black-matrix layer 300 is set to the black matrix area on the substrate 100;The RGB color resistance layer 400 is set to described
The color diaphragm area on substrate 100;The 2nd OC layer 500 is set to the RGB color resistance layer 400 of the color diaphragm area
Above, the first OC layer 200 in the black-matrix layer 300 of the black matrix area and W sub-pixel region
On;The transparent metal layer 600 is set on the 2nd OC layer 500.
In embodiments of the present invention, the thickness of OC layers of the described first of the thickness of the RGB coloured silk film and the W sub-pixel region
It spends identical.
As a preferred embodiment of the present invention, the black square of the thickness of the RGB coloured silk film, the black matrix area
Battle array layer thickness and the W sub-pixel region the described first OC layers thickness it is all the same.Make the 2nd OC layer 500 in this way
The region of covering is flat, and in this way after carrying out friction treatment to oriented layer, will not making oriented layer, there are friction orientation unevenness
Even phenomenon, and then leakage problem will not be caused;Also, the flat liquid crystal that can make to be in contact with oriented layer in the surface of oriented layer
The mobility of molecule is preferable, and then will not generate the problems such as pressing color difference.
As another preferred embodiment of the present invention, a pixel of the color membrane substrates corresponding a R coloured silk film, a G coloured silk
Film, a B coloured silk film and a W sub-pixel.
Referring to Fig. 4, the embodiment of the invention also provides a kind of liquid crystal display panels.For ease of description, it illustrates only
Part related to the embodiment of the present invention.The liquid crystal display panel includes array substrate, color membrane substrates and is set to described
Liquid crystal layer between array substrate and color membrane substrates.
The color membrane substrates include: a substrate 100, one the oneth OC layer 200, a black-matrix layer 300, a RGB color resistance layer
400, one the 2nd OC layer 500 and a transparent metal layer 600.Wherein, the substrate 100 includes color diaphragm area, W sub-pixel area
Domain and black matrix area;The first OC layer 200 is set to the W sub-pixel region on the substrate 100;It is described
Black-matrix layer 300 is set to the black matrix area on the substrate 100;The RGB color resistance layer 400 is set to described
The color diaphragm area on substrate 100;The 2nd OC layer 500 is set to the RGB color resistance layer 400 of the color diaphragm area
Above, the first OC layer 200 in the black-matrix layer 300 of the black matrix area and W sub-pixel region
On;The transparent metal layer 600 is set on the 2nd OC layer 500.
As a preferred embodiment of the present invention, the black square of the thickness of the RGB coloured silk film, the black matrix area
Battle array layer thickness and the W sub-pixel region the described first OC layers thickness it is all the same.Make the 2nd OC layer 500 in this way
The region of covering is flat, and in this way after carrying out friction treatment to oriented layer, will not making oriented layer, there are friction orientation unevenness
Even phenomenon, and then leakage problem will not be caused;Also, the flat liquid crystal that can make to be in contact with oriented layer in the surface of oriented layer
The mobility of molecule is preferable, and then will not generate the problems such as pressing color difference.
As another preferred embodiment of the present invention, a pixel of the color membrane substrates corresponding a R coloured silk film, a G coloured silk
Film, a B coloured silk film and a W sub-pixel.
In conclusion the production method of color membrane substrates provided in an embodiment of the present invention, color membrane substrates and LCD display
Plate by first making the first OC layers in W sub-pixel region, also, guarantees the first OC of R, G, B color blocking layer and W sub-pixel region
The consistency of thickness of layer, in this way after last the 2nd OC layers of whole coating, the 2nd OC layers of covering are flat.Therefore, the present invention is real
It applies example and is avoided that W sub-pixel region is recessed, so that the light leakage for effectively avoiding RGBW pixel from occurring, is effectively improved pressing color difference
The problem of.
Although the present invention, those skilled in the art have shown and described relative to one or more implementations
It will be appreciated that equivalent variations and modification based on the reading and understanding to the specification and drawings.The present invention includes all such repairs
Change and modification, and is limited only by the scope of the following claims.In particular, to various functions executed by the above components, use
It is intended to correspond in the term for describing such component and executes the specified function of the component (such as it is functionally of equal value
) random component (unless otherwise instructed), even if in structure with execute the exemplary of this specification shown in this article and realize
The open structure of function in mode is not equivalent.In addition, although the special characteristic of this specification is relative to several realization sides
Only one in formula is disclosed, but this feature can with such as can be for a given or particular application expectation and it is advantageous
One or more other features combinations of other implementations.Moreover, with regard to term " includes ", " having ", " containing " or its deformation
For being used in specific embodiments or claims, such term is intended to wrap in a manner similar to the term " comprising "
It includes.
In conclusion although the present invention has been disclosed above in the preferred embodiment, but above preferred embodiment is not to limit
The system present invention, those skilled in the art can make various changes and profit without departing from the spirit and scope of the present invention
Decorations, therefore protection scope of the present invention subjects to the scope of the claims.
Claims (8)
1. a kind of production method of color membrane substrates, which is characterized in that the production method of the color membrane substrates includes:
A substrate is provided, the substrate includes color diaphragm area, W sub-pixel region and black matrix area;
One the oneth OC layers are coated in the whole surface of the substrate;
To the described first OC layers be exposed, the operation of development and etching technics, retain described the of the W sub-pixel region
One OC layers, other regions the described first OC layers remove;
A black-matrix layer is deposited on the substrate;The thickness of the black-matrix layer of deposition and the W sub-pixel region
The described first OC layers thickness it is identical;
The black-matrix layer is exposed, the operation of development and etching technics, retains the described of the black matrix area
The black-matrix layer of black-matrix layer, other regions removes;
The color diaphragm area on the substrate is coated with RGB color resistance layer, to form RGB coloured silk film, wherein the RGB coloured silk film
Thickness, the black matrix area the black-matrix layer thickness and the described first OC layers of the W sub-pixel region
Thickness it is all the same;
It is whole on the substrate to coat OC layers of flat the 2nd;And
Transparent metal layer is deposited on OC layers the described 2nd, to form transparent electrode.
2. the production method of color membrane substrates according to claim 1, which is characterized in that coat the 2nd OC on the substrate
It the step of layer, specifically includes:
In the RGB color resistance layer of the color diaphragm area, in the black-matrix layer of the black matrix area, Yi Jisuo
It states the described first of W sub-pixel region and is coated with the described 2nd OC layers on OC layers.
3. the production method of color membrane substrates according to claim 1, which is characterized in that a pixel of the color membrane substrates
A corresponding R coloured silk film, a G coloured silk film, a B coloured silk film and a W sub-pixel.
4. a kind of color membrane substrates of the production method including color membrane substrates as described in any one of claims 1 to 3, feature exist
In the color membrane substrates include:
One substrate, the substrate include color diaphragm area, W sub-pixel region and black matrix area;
One the oneth OC layers, it is set to the W sub-pixel region on the substrate;
One black-matrix layer, the black matrix area being set on the substrate;The thickness of the black-matrix layer and institute
State W sub-pixel region the described first OC layers thickness it is identical;
One RGB color resistance layer, the color diaphragm area being set on the substrate;
It one the 2nd OC layers, is set in the RGB color resistance layer of the color diaphragm area, the black of the black matrix area
In matrix layer and on the first OC layer in the W sub-pixel region;Described 2nd OC layers coated for whole face and flat the
Two OC layers;
One transparent metal layer is set on the 2nd OC layer;
Wherein, the thickness of OC layers of the described first of the thickness of the RGB coloured silk film and the W sub-pixel region is identical.
5. color membrane substrates according to claim 4, which is characterized in that the thickness of the RGB coloured silk film, the black matrix" area
The thickness of the black-matrix layer in domain and the W sub-pixel region the described first OC layers thickness it is all the same.
6. color membrane substrates according to claim 4, which is characterized in that the corresponding R of a pixel of the color membrane substrates
Color film, a G coloured silk film, a B coloured silk film and a W sub-pixel.
7. a kind of liquid crystal display panel of the production method including color membrane substrates as described in any one of claims 1 to 3, special
Sign is, the liquid crystal display panel includes: array substrate, color membrane substrates and is set to the array substrate and the coloured silk
Liquid crystal layer between ilm substrate;
Wherein, the color membrane substrates include:
One substrate, the substrate include color diaphragm area, W sub-pixel region and black matrix area;
One the oneth OC layers, it is set to the W sub-pixel region on the substrate;
One black-matrix layer, the black matrix area being set on the substrate;The thickness of the black-matrix layer and institute
State W sub-pixel region the described first OC layers thickness it is identical;
One RGB color resistance layer, the color diaphragm area being set on the substrate;
It one the 2nd OC layers, is set in the RGB color resistance layer of the color diaphragm area, the black of the black matrix area
In matrix layer and on the first OC layer in the W sub-pixel region;Described 2nd OC layers coated for whole face and flat the
Two OC layers;
One transparent metal layer is set on the 2nd OC layer;
Wherein, the thickness of OC layers of the described first of the thickness of the RGB coloured silk film and the W sub-pixel region is identical.
8. liquid crystal display panel according to claim 7, which is characterized in that the thickness of the RGB coloured silk film, the black square
The thickness of the black-matrix layer in array area domain and the W sub-pixel region the described first OC layers thickness it is all the same.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510117726.8A CN104793391B (en) | 2015-03-18 | 2015-03-18 | A kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel |
PCT/CN2015/075815 WO2016145685A1 (en) | 2015-03-18 | 2015-04-02 | Color filter substrate fabrication method, color filter substrate, and liquid crystal display panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510117726.8A CN104793391B (en) | 2015-03-18 | 2015-03-18 | A kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104793391A CN104793391A (en) | 2015-07-22 |
CN104793391B true CN104793391B (en) | 2019-04-16 |
Family
ID=53558333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510117726.8A Active CN104793391B (en) | 2015-03-18 | 2015-03-18 | A kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN104793391B (en) |
WO (1) | WO2016145685A1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107015399B (en) * | 2017-05-11 | 2020-04-24 | 京东方科技集团股份有限公司 | Color film substrate and manufacturing method thereof, display device and manufacturing method thereof |
CN107272294B (en) | 2017-07-10 | 2020-08-18 | 华南师范大学 | Electric control intelligent window, preparation method and light adjusting method |
CN107247359A (en) * | 2017-07-20 | 2017-10-13 | 京东方科技集团股份有限公司 | A kind of display base plate, display panel and display device |
CN107591430A (en) * | 2017-09-14 | 2018-01-16 | 深圳市华星光电半导体显示技术有限公司 | The preparation method of color membrane substrates |
CN107505761B (en) * | 2017-09-18 | 2020-06-12 | 惠科股份有限公司 | Color filter and manufacturing method of liquid crystal display panel |
CN107505760B (en) * | 2017-09-18 | 2020-06-12 | 惠科股份有限公司 | Pixel structure of array substrate and liquid crystal display panel |
CN110618554A (en) * | 2019-09-26 | 2019-12-27 | 厦门天马微电子有限公司 | Color film substrate, display panel and display device |
CN115480421A (en) * | 2022-10-19 | 2022-12-16 | 信利(仁寿)高端显示科技有限公司 | CF substrate and manufacturing method thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1624544A (en) * | 2003-12-04 | 2005-06-08 | Lg.菲利浦Lcd株式会社 | Liquid crystal display device and method for fabricating the same |
CN1844983A (en) * | 2006-05-15 | 2006-10-11 | 友达光电股份有限公司 | Semi-transmissive semi-reflective display and manufacturing method thereof, display manufacturing method |
KR20070027264A (en) * | 2005-09-06 | 2007-03-09 | 엘지.필립스 엘시디 주식회사 | A liquid crystal device and a method for fabricating the same |
CN104317098A (en) * | 2014-11-05 | 2015-01-28 | 京东方科技集团股份有限公司 | Display substrate and preparation method thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101033461B1 (en) * | 2003-12-23 | 2011-05-11 | 엘지디스플레이 주식회사 | Liquid crystal display device and manufacturing of the same |
CN103869531A (en) * | 2012-12-10 | 2014-06-18 | 上海天马微电子有限公司 | Color film substrate and manufacturing method thereof |
CN104280930B (en) * | 2014-10-11 | 2017-07-18 | 深圳市华星光电技术有限公司 | Preparation method, color membrane substrates and the liquid crystal display panel of color membrane substrates |
-
2015
- 2015-03-18 CN CN201510117726.8A patent/CN104793391B/en active Active
- 2015-04-02 WO PCT/CN2015/075815 patent/WO2016145685A1/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1624544A (en) * | 2003-12-04 | 2005-06-08 | Lg.菲利浦Lcd株式会社 | Liquid crystal display device and method for fabricating the same |
KR20070027264A (en) * | 2005-09-06 | 2007-03-09 | 엘지.필립스 엘시디 주식회사 | A liquid crystal device and a method for fabricating the same |
CN1844983A (en) * | 2006-05-15 | 2006-10-11 | 友达光电股份有限公司 | Semi-transmissive semi-reflective display and manufacturing method thereof, display manufacturing method |
CN104317098A (en) * | 2014-11-05 | 2015-01-28 | 京东方科技集团股份有限公司 | Display substrate and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN104793391A (en) | 2015-07-22 |
WO2016145685A1 (en) | 2016-09-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104793391B (en) | A kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel | |
CN105204217B (en) | Liquid crystal display panel | |
US10295713B2 (en) | Color filter substrate, preparing method thereof, and display device | |
US20140085578A1 (en) | Color filter substrate, method of fabricating the same, and lcd panel | |
WO2017008369A1 (en) | Coa-type liquid crystal display panel and manufacturing method thereof | |
CN106707606A (en) | Special-shaped display panel and display device | |
CN107505760B (en) | Pixel structure of array substrate and liquid crystal display panel | |
US20140168585A1 (en) | Color filter substrate, manfacturing method for the same, and display device | |
EP3505981B1 (en) | Display device and filter thereof | |
CN104678639A (en) | Method for manufacturing color filter substrate | |
CN106684100B (en) | A kind of array substrate and preparation method thereof, display device | |
CN105929593A (en) | Array substrate, transparent display substrate and transparent display device | |
US20170176813A1 (en) | A display panel and a manufacturing method thereof, a display device | |
CN110350003A (en) | Organic light emitting display panel and its manufacturing method | |
US9116297B2 (en) | Color filter substrate, manufacturing method thereof and liquid crystal panel | |
WO2017186095A1 (en) | Display panel and manufacturing method thereof, and display device | |
CN107463023A (en) | Liquid crystal display panel and liquid crystal display device | |
CN107505761A (en) | Color filter and manufacturing method of liquid crystal display panel | |
CN103217826B (en) | Liquid crystal panel | |
US10203542B2 (en) | Color film substrate and manufacturing method thereof | |
KR101321172B1 (en) | Color filter substrate and method for manufacturing thereof | |
US20160282680A1 (en) | Liquid crystal panels | |
WO2018120022A1 (en) | Colour filter, display apparatus and method for manufacturing colour filter | |
US10627671B2 (en) | Array substrate and manufacturing method thereof, reflective liquid crystal display | |
WO2018045614A1 (en) | Color filter substrate, liquid crystal panel and liquid crystal display |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
EXSB | Decision made by sipo to initiate substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee after: TCL China Star Optoelectronics Technology Co.,Ltd. Patentee after: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. Patentee before: Wuhan China Star Optoelectronics Technology Co.,Ltd. |