CN110989237B - Display device and method for manufacturing the same - Google Patents
Display device and method for manufacturing the same Download PDFInfo
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- CN110989237B CN110989237B CN201911151771.XA CN201911151771A CN110989237B CN 110989237 B CN110989237 B CN 110989237B CN 201911151771 A CN201911151771 A CN 201911151771A CN 110989237 B CN110989237 B CN 110989237B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- Crystallography & Structural Chemistry (AREA)
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- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a display device and a method of manufacturing the same. The display device includes a first substrate having a plurality of pixel units; the second substrate is provided with a patterned light shielding layer and a color resistance layer, the patterned light shielding layer comprises a first opening, a second opening and a third opening, the color resistance layer comprises a first color resistor, a second color resistor and a third color resistor, and the first color resistor, the second color resistor and the third color resistor are sequentially arranged in a strip shape along a first direction, wherein part of the first color resistor is accommodated in the first opening, part of the second color resistor is accommodated in the second opening, and part of the third color resistor is accommodated in the third opening; a display molecular layer arranged between the first substrate and the second substrate; the first color resistor, the second color resistor and the third color resistor are respectively provided with a first side edge and a second side edge which are opposite, and the thickness of the first side edge of one of the first color resistor, the second color resistor and the third color resistor is different from the thickness of the first side edges of the other two color resistors.
Description
Technical Field
The present invention relates to a display device, and more particularly, to a display device and a method for manufacturing the same, which utilizes the exposure repair of color resists to solve the problem of one-sided blackening.
Background
With the development of technology, display devices are widely used in many electronic products, such as mobile phones, tablet computers, watches, and the like. In the design of the display panel, the color film substrate adopts the color resistance of the stripe pattern, and the purpose of different resolutions is achieved by designing different widths of the color resistance stripe pattern.
The existing color resist manufacturing method usually adopts an exposure machine to perform secondary exposure, and the exposure machine generally consists of 7 cylindrical lenses and is arranged in a mode of 3 lenses above and 4 lenses below. In the exposure process, because the connection between the lenses is poor or the secondary exposure is carried out along the same direction, the exposure is uneven, the cross-linking reaction of the color resistance is not linear, the characteristics of CD/film thickness/chromaticity and the like are different from the normal area of the lens, and the phenomenon that the display panel is blackened on one side is further caused.
How to more effectively avoid uneven exposure and reduce the phenomenon that the single side of the display panel is black is one of the problems to be solved.
Disclosure of Invention
In order to solve the above problems, the present invention provides a display device, which can effectively prevent uneven exposure during the formation of photoresist, avoid the occurrence of the phenomenon of single-side blackening of the display panel, and improve the yield of the display device.
A display device according to an embodiment of the present invention includes a first substrate having a plurality of pixel units, the plurality of pixel units being arranged in a plurality of rows along a first direction and a plurality of columns along a second direction; a second substrate having a patterned light-shielding layer and a color-resisting layer, wherein the patterned light-shielding layer includes a first opening, a second opening and a third opening, the color-resisting layer includes a first color resistor, a second color resistor and a third color resistor, the first color resistor, the second color resistor and the third color resistor are sequentially arranged in a strip shape along the first direction, wherein a part of the first color resistor is accommodated in the first opening, a part of the second color resistor is accommodated in the second opening, and a part of the third color resistor is accommodated in the third opening; the display molecular layer is arranged between the first substrate and the second substrate; the first color resistor, the second color resistor and the third color resistor are respectively provided with a first side edge and a second side edge which are opposite, and the thickness of the first side edge of one of the first color resistor, the second color resistor and the third color resistor is different from the thickness of the first side edges of the other two color resistors.
A method for manufacturing a display device according to an embodiment of the present invention includes forming a plurality of pixel units on a first substrate, wherein the plurality of pixel units are arranged in a plurality of rows along a first direction and a plurality of columns along a second direction; forming a patterned light-shielding layer on a second substrate, wherein the patterned light-shielding layer includes a first opening, a second opening and a third opening; forming a color-resist layer on the second substrate, the color-resist layer including a first color resist, a second color resist and a third color resist, wherein the method of forming the color-resist layer on the second substrate further comprises: setting the first color resistor to enable part of the first color resistor to be accommodated in the first opening; exposing the first color resistor along a first exposure direction; setting the second color resistor, so that part of the second color resistor is accommodated in the second opening; exposing the second color resistor along a second exposure direction; setting the third color resistor so that part of the third color resistor is accommodated in the third opening; exposing the third color resistance along a third exposure direction; assembling the first substrate and the second substrate, and arranging a display molecular layer between the first substrate and the second substrate; wherein one of the first exposure direction, the second exposure direction and the third exposure direction is different from the other two exposure directions.
The invention is described in detail below with reference to the drawings and specific examples, but the invention is not limited thereto.
Drawings
Fig. 1 is a schematic structural diagram of a display device according to an embodiment of the invention.
Fig. 2A to fig. 2J are schematic views illustrating a manufacturing method according to an embodiment of the invention.
Wherein, the reference numbers:
100: display device
101: first substrate
102: second substrate
103: patterned light-shielding layer
104: color resist layer
1041: first color resistance layer
1042: second color resist layer
1043: third color resist layer
105: display molecule layer
S1: first opening
S2: second opening
S3: third opening
C1: the first side edge
C2: second side edge
D1: first exposure direction
D2: second exposure direction
D3: the third exposure direction
LENS: lens and lens assembly
Detailed Description
The invention will be described in detail with reference to the following drawings, which are provided for illustration purposes and the like:
fig. 1 is a schematic structural diagram of a display device according to an embodiment of the invention. As shown in fig. 1, the display device 100 includes a first substrate 101 and a second substrate 102, wherein the first substrate 101 and the second substrate 102 are disposed opposite to each other. The first substrate 101 has a plurality of pixel units (not shown), and the plurality of pixel units are arranged in a plurality of rows along a horizontal direction and a plurality of columns along a vertical direction to form a pixel array. Of course, other circuit structures are also formed in the first substrate 101, and the present invention is not limited thereto, and will not be described herein again. The second substrate 102 is provided with a patterned light-shielding layer 103 and a color resist layer 104. In the embodiment, the patterned light-shielding layer 103 is formed on the second substrate 102, wherein the patterned light-shielding layer 103 has a first opening S1, a second opening S2 and a third opening S3, and the color-resist layer 104 is disposed on the second substrate. Specifically, the color resist layer 104 is divided into a first color resist layer 1041, a second color resist layer 1042, and a third color resist layer 1043. The first color-resist layer 1041 is formed in the first opening S1 such that the first opening S1 receives a portion of the first color-resist layer 1041, the second color-resist layer 1042 is formed in the second opening S2 such that the second opening S2 receives a portion of the second color-resist layer 1042, and the third color-resist layer 1043 is formed in the third opening S3 such that the third opening S3 receives a portion of the third color-resist layer 1043. In addition, the first color resist 1041, the second color resist 1042 and the third color resist 1043 are arranged in a stripe shape along the horizontal direction shown in the figure. A display molecule layer 105 is disposed between the first substrate 101 and the second substrate 102.
Specifically, as shown in fig. 1, the first color-resist layer 1041, the second color-resist layer 1042 and the third color-resist layer 1043 respectively have a first side C1 and a second side C2 opposite to each other, and the first side C1 and the second side C2 have different thicknesses. In the embodiment shown in fig. 1, the thickness of the first side C1 of the first color-resist layer 1041 is smaller than the thickness of the second side C2, the thickness of the first side C1 of the second color-resist layer 1042 is larger than the thickness of the second side C2, the thickness of the first side C1 of the third color-resist layer 1043 is smaller than the thickness of the second side C2, the thickness of the first side C1 of the first color-resist layer 1041 is substantially the same as the thickness of the first side C1 of the third color-resist layer 1043, and the thickness of the second side C2 of the first color-resist layer 1041 is substantially the same as the thickness of the second side C2 of the third color-resist layer 1043. In addition, the thickness of the first side C1 of the second color-resist layer 1042 is different from the thickness of the first side C1 of the first color-resist layer 1041 and/or the third color-resist layer 1043, the thickness of the first side C1 of the second color-resist layer 1042 is greater than the thickness of the first side C1 of the first color-resist layer 1041 and/or the third color-resist layer 1043, and the thickness of the first side C1 of the second color-resist layer 1042 is substantially the same as the thickness of the second side C2 of the first color-resist layer 1041 and/or the third color-resist layer 1043.
Of course, in another modification, the thickness of the first side C1 of the first color-resist layer 1041 or the third color-resist layer 1043 may be different from the thickness of the first side C1 of the other two color-resist layers. Or the thickness of the first side C1 of the first color-resisting layer 1041 is greater than the thickness of the second side C2, the thickness of the first side C1 of the second color-resisting layer 1042 is less than the thickness of the second side C2, and the thickness of the first side C1 of the third color-resisting layer 1043 is greater than the thickness of the second side C2, so that the thickness of the first side C1 of the second color-resisting layer 1042 is less than the thickness of the first side C1 of the first color-resisting layer 1041 and/or the third color-resisting layer 1043.
Fig. 2A to fig. 2J are schematic views illustrating a manufacturing method according to an embodiment of the invention. Since the first substrate 101 and the second substrate 102 are two separate parts and are processed separately in production, only the method for manufacturing the second substrate 102 will be described in detail in the present invention. Specifically, fig. 2A-2C illustrate a method for forming a first color resist layer, wherein fig. 2C is a schematic cross-sectional view taken along a-a' in fig. 2B. As shown in fig. 2A-2C, the patterned light-shielding layer 103 is formed on the second substrate 102, and the patterned light-shielding layer 103 of the second substrate 102 has the first opening S1, the second opening S2 and the third opening S3 formed therein, as shown in fig. 2C. The first color resist layer 1041 is formed on the second substrate 102, and the first color resist layer 1041 covers the patterned light-shielding layer 103 and the first opening S1, the second opening S2 and the third opening S3. Next, under the irradiation of the LENS, the first color resist layer 1041 is formed along the first exposure direction D1, and the first color resist layer 1041 is formed in the first opening S1, so that a portion of the first color resist layer 1041 is accommodated in the first opening S1. In the exposure process of the present embodiment, the position of the LENS is fixed, and the second substrate 102 is moved along the first exposure direction D1 to perform the exposure process, as shown in fig. 2A, but the invention is not limited thereto. After that, a developing process is performed to form a patterned first photoresist layer 1041, as shown in fig. 2B and fig. 2C.
FIG. 2D-FIG. 2F illustrate a second method for forming a photoresist layer, wherein FIG. 2F is a cross-sectional view taken along line A-A' of FIG. 2E. First, a second color resist layer 1042 is formed on the second substrate 102, the second color resist layer 1042 covers the first color resist layer 1041, the patterned light-shielding layer 103, the second opening S2 and the third opening S3, and the first color resist layer 1041 is omitted in fig. 2D for clarity. Under LENS irradiation, the second color resist layer 1042 is formed along the second exposure direction D2, and the second color resist layer 1042 is formed in the second opening S2, such that the second opening S2 accommodates a portion of the second color resist layer 1042. Specifically, in the embodiment of fig. 2D, the position of the LENS is fixed, and the second substrate 102 is moved along the second exposure direction D2 to perform the exposure process, but the invention is not limited thereto. After that, a developing process is performed to form a patterned second photoresist layer 1042. As shown in fig. 2E and fig. 2F, the first color resist layer 1041 is disposed in the first opening S1, and the second color resist layer 1042 is formed in the second opening S2.
Fig. 2G-2I illustrate a method for forming a third photoresist layer, wherein fig. 2I is a schematic cross-sectional view taken along a-a' in fig. 2H. First, a third color-resist layer 1043 is formed on the second substrate 102, the third color-resist layer 1043 covers the first color-resist layer 1041, the second color-resist layer 1042, the patterned light-shielding layer 103 and the third opening S3, and for clarity, the first color-resist layer 1041 and the second color-resist layer 1042 are omitted in fig. 2G. Under the illumination of the LENS, the third color-blocking layer 1043 is formed along the third exposure direction D3, and the third color-blocking layer 1043 is formed in the third opening S3, so that a portion of the third color-blocking layer 1043 is accommodated in the third opening S3. Specifically, in the embodiment shown in fig. 2G, the position of the LENS is fixed, and the second substrate 102 is moved along the third exposure direction D3 to perform the exposure process, but the invention is not limited thereto. After that, a developing process is performed to form a patterned third photoresist layer 1043. As shown in fig. 2H and fig. 2I, the first color resist 1041 is disposed in the first opening S1, the second color resist 1042 is disposed in the second opening S2, and the third color resist 1043 is formed in the third opening S3.
In the present embodiment, the first exposure direction D1, the second exposure direction D2, and the third exposure direction D3 represent the moving direction of the second substrate 102 relative to the lens of the exposure machine. Specifically, as shown in the figure, the first exposure direction D1 is the movement of the second substrate 102 to the left, the second exposure direction D2 is the movement of the second substrate 102 to the right, and the third exposure direction D3 is the movement of the second substrate 102 to the left. As shown in fig. 2A, fig. 2D, fig. 2G and fig. 1, since the second exposure direction D2 is different from the first exposure direction D1 and/or the third exposure direction D3, the first color-resist layer 1041, the second color-resist layer 1042 and the third color-resist layer 1043 respectively have a first side C1 and a second side C2 opposite to each other, and the first side C1 is different from the second side C2 in thickness, as shown in fig. 2I. Specifically, the thickness of the first side C1 of the first color-resist layer 1041 is smaller than the thickness of the second side C2, the thickness of the first side C1 of the second color-resist layer 1042 is larger than the thickness of the second side C2, the thickness of the first side C1 of the third color-resist layer 1043 is smaller than the thickness of the second side C2, the thickness of the first side C1 of the first color-resist layer 1041 is substantially the same as the thickness of the first side C1 of the third color-resist layer 1043, and the thickness of the second side C2 of the first color-resist layer 1041 is substantially the same as the thickness of the second side C2 of the third color-resist layer 1043. In addition, the thickness of the first side C1 of the second color-resist layer 1042 is different from the thickness of the first side C1 of the first color-resist layer 1041 and/or the third color-resist layer 1043, the thickness of the first side C1 of the second color-resist layer 1042 is greater than the thickness of the first side C1 of the first color-resist layer 1041 and/or the third color-resist layer 1043, and the thickness of the first side C1 of the second color-resist layer 1042 is substantially the same as the thickness of the second side C2 of the first color-resist layer 1041 and/or the third color-resist layer 1043.
Of course, in order to implement the present invention, the first color resist layer 1041, the second color resist layer 1042 and the third color resist layer 1043 may be formed in a manner that the first exposure direction D1 or the third exposure direction D3 is different from the other two exposure directions. Therefore, the thickness of the first side C1 of the first color-resist layer 1041 or the third color-resist layer 1043 is different from the thickness of the first side C1 of the other two color-resist layers. Or, if the first exposure direction D1 is adopted to move the second substrate 102 rightward, the second exposure direction D2 is adopted to move the second substrate 102 leftward, and the third exposure direction D3 is adopted to move the second substrate 102 rightward, the thickness of the first side C1 of the first color resist layer 1041 is greater than that of the second side C2, the thickness of the first side C1 of the second color resist layer 1042 is less than that of the second side C2, and the thickness of the first side C1 of the third color resist layer 1043 is greater than that of the second side C2, so that the thickness of the first side C1 of the second color resist layer 1042 is smaller than that of the first side C1 of the first color resist layer 1041 and/or the third color resist layer 1043.
Finally, as shown in fig. J, the first substrate 101 and the second substrate 102 are assembled to be opposite to each other, and the display molecule layer 105 is disposed between the first substrate 101 and the second substrate 102. In this embodiment, different exposure directions are adopted by different color resists, so that the thicknesses of the first color resist 1041 and the third color resist 1043 at the first side C1 are relatively small, and the thickness of the second color resist 1042 at the second side C2 is relatively small. For example, when the first color resist layer 1041 is a blue color resist, the second color resist 1042 is a red color resist, and the third color resist 1043 is a green color resist, a bright/black phenomenon is formed on a single side due to different thicknesses of the color resists. Taking the first color resist 1041 as an example, the first side C1 will be a lighter white color, taking the second color resist 1042 as an example, the second side C2 will be a lighter white color, and taking the third color resist 1043 as an example, the first side C1 will be a lighter white color. However, after the three colors are superimposed, the brightening/blackening phenomena of the single side can be mutually complemented, so that the finally presented color is complete, the line defect (mura) is reduced, and the display quality is improved.
In summary, according to the embodiments of the invention, since the color resists are formed in different exposure directions, the directions of the different color resists in which the exposure unevenness occurs are different, and the exposure unevenness of the different color resists overlap each other, the problem of the exposure unevenness of the entire color resist can be alleviated, and the occurrence of the phenomenon of one-side blackening of the display device can be avoided, thereby improving the yield of the display device.
The present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof, and it should be understood that various changes and modifications can be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (10)
1. A display device, comprising:
the pixel structure comprises a first substrate, a second substrate and a plurality of pixel units, wherein the first substrate is provided with a plurality of pixel units which are arranged in a plurality of rows along a first direction and a plurality of columns along a second direction;
a second substrate having a patterned light-shielding layer and a color-resisting layer, wherein the patterned light-shielding layer includes a first opening, a second opening and a third opening, the color-resisting layer includes a first color resistor, a second color resistor and a third color resistor, the first color resistor, the second color resistor and the third color resistor are sequentially arranged in a strip shape along the first direction, wherein a part of the first color resistor is accommodated in the first opening, a part of the second color resistor is accommodated in the second opening, and a part of the third color resistor is accommodated in the third opening;
the display molecular layer is arranged between the first substrate and the second substrate;
wherein, first look hinders the second look hinder and the third look hinders and has a relative first side and a second side respectively, just first look hinders the second look hinder and the thickness that the first side of one of the third look hinders the thickness of first side is different with the thickness that other two looks hinder in the third look, first look hinders the thickness of first side is less than the thickness of second side, the second look hinders the thickness of first side is greater than the thickness of second side, the third look hinders the thickness of first side is less than the thickness of second side.
2. The display device of claim 1, wherein a thickness of the first side of the second color resistance is different from a thickness of the first side of the first color resistance and the third color resistance.
3. The display device as claimed in claim 2, wherein the first side of the first color resistance has the same thickness as the first side of the third color resistance.
4. The display device as claimed in claim 3, wherein the thickness of the first side of the second color resistor is greater than the thickness of the first side of the first color resistor and the third color resistor.
5. The display device as claimed in claim 3, wherein the thickness of the first side of the second color resistance is smaller than the thickness of the first side of the first color resistance and the third color resistance.
6. The display device of claim 1, wherein a thickness of the second side of the first color resistance is substantially the same as a thickness of the second side of the third color resistance.
7. The display device of claim 1, wherein a thickness of the second side of the first color resistance is substantially the same as a thickness of the first side of the second color resistance.
8. A method of manufacturing a display device, the method comprising:
forming a plurality of pixel units on a first substrate, wherein the pixel units are arranged in a plurality of columns along a first direction and in a plurality of rows along a second direction;
forming a patterned light-shielding layer on a second substrate, wherein the patterned light-shielding layer includes a first opening, a second opening and a third opening;
forming a color-resist layer on the second substrate, wherein the color-resist layer includes a first color resist, a second color resist and a third color resist, the first color resist, the second color resist and the third color resist respectively have a first side and a second side opposite to each other, and the method for forming the color-resist layer on the second substrate further includes:
setting the first color resistor to enable part of the first color resistor to be accommodated in the first opening;
exposing the first color resistor along a first exposure direction;
setting the second color resistor, so that part of the second color resistor is accommodated in the second opening;
exposing the second color resistor along a second exposure direction;
setting the third color resistor so that part of the third color resistor is accommodated in the third opening; and
exposing the third color resistance along a third exposure direction;
assembling the first substrate and the second substrate, and arranging a display molecular layer between the first substrate and the second substrate;
one of the first exposure direction, the second exposure direction and the third exposure direction is different from the other two exposure directions, so that the thickness of the first side of the first color resistor after exposure is smaller than that of the second side, the thickness of the first side of the second color resistor is larger than that of the second side, and the thickness of the first side of the third color resistor is smaller than that of the second side.
9. The manufacturing method according to claim 8, wherein the second exposure direction is different from the first exposure direction and the third exposure direction.
10. The manufacturing method according to claim 8, wherein the first exposure direction is the same as the third exposure direction.
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| CN201911151771.XA CN110989237B (en) | 2019-11-21 | 2019-11-21 | Display device and method for manufacturing the same |
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| CN201911151771.XA CN110989237B (en) | 2019-11-21 | 2019-11-21 | Display device and method for manufacturing the same |
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| CN110989237B true CN110989237B (en) | 2022-04-12 |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090077117A (en) * | 2008-01-10 | 2009-07-15 | 삼성전자주식회사 | Display substrate and method of manufacturing the same |
| CN105974636A (en) * | 2016-07-18 | 2016-09-28 | 深圳市华星光电技术有限公司 | Method for manufacturing liquid crystal display panel |
| CN205809499U (en) * | 2016-07-26 | 2016-12-14 | 上海中航光电子有限公司 | A kind of array base palte, display floater and display device |
| CN106249465A (en) * | 2016-09-22 | 2016-12-21 | 合肥鑫晟光电科技有限公司 | A kind of display base plate, its manufacture method, display panels and display device |
| CN107463023A (en) * | 2017-09-18 | 2017-12-12 | 惠科股份有限公司 | Liquid crystal display panel and liquid crystal display |
| CN107505761A (en) * | 2017-09-18 | 2017-12-22 | 惠科股份有限公司 | The preparation method of chromatic filter and liquid crystal display panel |
| CN107589583A (en) * | 2017-09-15 | 2018-01-16 | 惠科股份有限公司 | A kind of display panel and its manufacture method |
| CN109143660A (en) * | 2018-07-11 | 2019-01-04 | 信利半导体有限公司 | Production method, color membrane substrates and the liquid crystal display of color membrane substrates |
Family Cites Families (1)
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Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090077117A (en) * | 2008-01-10 | 2009-07-15 | 삼성전자주식회사 | Display substrate and method of manufacturing the same |
| CN105974636A (en) * | 2016-07-18 | 2016-09-28 | 深圳市华星光电技术有限公司 | Method for manufacturing liquid crystal display panel |
| CN205809499U (en) * | 2016-07-26 | 2016-12-14 | 上海中航光电子有限公司 | A kind of array base palte, display floater and display device |
| CN106249465A (en) * | 2016-09-22 | 2016-12-21 | 合肥鑫晟光电科技有限公司 | A kind of display base plate, its manufacture method, display panels and display device |
| CN107589583A (en) * | 2017-09-15 | 2018-01-16 | 惠科股份有限公司 | A kind of display panel and its manufacture method |
| CN107463023A (en) * | 2017-09-18 | 2017-12-12 | 惠科股份有限公司 | Liquid crystal display panel and liquid crystal display |
| CN107505761A (en) * | 2017-09-18 | 2017-12-22 | 惠科股份有限公司 | The preparation method of chromatic filter and liquid crystal display panel |
| CN109143660A (en) * | 2018-07-11 | 2019-01-04 | 信利半导体有限公司 | Production method, color membrane substrates and the liquid crystal display of color membrane substrates |
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