CN112987386A - Color film substrate and display panel - Google Patents
Color film substrate and display panel Download PDFInfo
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- CN112987386A CN112987386A CN202110321820.0A CN202110321820A CN112987386A CN 112987386 A CN112987386 A CN 112987386A CN 202110321820 A CN202110321820 A CN 202110321820A CN 112987386 A CN112987386 A CN 112987386A
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- 239000000758 substrate Substances 0.000 title claims abstract description 157
- 239000012780 transparent material Substances 0.000 claims abstract description 104
- 239000004973 liquid crystal related substance Substances 0.000 claims description 9
- 238000002834 transmittance Methods 0.000 abstract description 27
- 230000000694 effects Effects 0.000 abstract description 9
- 239000012528 membrane Substances 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 224
- 238000010586 diagram Methods 0.000 description 19
- 230000003287 optical effect Effects 0.000 description 11
- 239000012790 adhesive layer Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 239000003086 colorant Substances 0.000 description 7
- 238000000059 patterning Methods 0.000 description 7
- 230000000903 blocking effect Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
Abstract
The application discloses various membrane base plate and display panel belongs to and shows technical field. This various membrane base plate includes: the color film layer is positioned on the substrate base plate; the color film layer is provided with a plurality of sub-pixel regions, the plurality of sub-pixel regions comprise at least one target sub-pixel region, the sub-pixel regions and the target sub-pixel regions are respectively provided with a color resistance layer, the target sub-pixel region is also provided with a transparent material layer, and in the target sub-pixel region, the orthographic projection of the transparent material layer on the substrate base plate and the orthographic projection of the color resistance layer on the substrate base plate have a non-overlapped region. This application is through setting up color resistance layer and transparent material layer in the sub-pixel region on various rete, because the luminousness on transparent material layer is greater than the color resistance layer, therefore this structure makes more light can follow and sees through in the sub-pixel region, and then has improved the luminousness on various rete. The problem that the light transmittance of the color film substrate is low in the related technology can be solved, and the effect of improving the light transmittance of the color film substrate is achieved.
Description
Technical Field
The application relates to the technical field of display, in particular to a color film substrate and a display panel.
Background
The display panel is a device with a display function, and may include a color film substrate, a liquid crystal layer, an array substrate, and other structures.
At present, a color filter substrate includes a substrate and a color filter layer on the substrate, where the color filter layer has color resists of various colors and can be used to transmit color lights of various colors.
However, the color filter substrate has low light transmittance.
Disclosure of Invention
The embodiment of the application provides a color film substrate and a display panel. The technical scheme is as follows:
according to a first aspect of the present application, a color filter substrate is provided, which includes:
the color film comprises a substrate base plate and a color film layer positioned on the substrate base plate;
the color film layer is provided with a plurality of sub-pixel areas, the plurality of sub-pixel areas comprise at least one target sub-pixel area, the sub-pixel areas and the target sub-pixel area are respectively provided with a color resistance layer, the target sub-pixel area is provided with the color resistance layer and a transparent material layer, and in the target sub-pixel area, the orthographic projection of the transparent material layer on the substrate base plate and the orthographic projection of the color resistance layer on the substrate base plate are in a non-overlapped area.
The color film comprises a substrate base plate and a color film layer positioned on the substrate base plate;
the color film layer is provided with a plurality of sub-pixel areas and at least one target sub-pixel area, the sub-pixel areas and the target sub-pixel area are both provided with color resistance layers, the target sub-pixel area is also provided with a transparent material layer, and in the target sub-pixel area, the orthographic projection of the transparent material layer on the substrate base plate and the orthographic projection of the color resistance layer on the substrate base plate have non-overlapped areas.
Optionally, in the target sub-pixel region, the color resist layer and the transparent material layer have a contact edge, and an end point of the contact edge intersects with the edge of the target sub-pixel region.
Optionally, the transparent material layer includes two sub-transparent material layers, and the two sub-transparent material layers are respectively located at two opposite sides of the color resistance layer in the target sub-pixel region.
Optionally, the target sub-pixel region is rectangular, the two sub-transparent material layers are respectively located on two sides of the color resist layer in the target sub-pixel region in a first direction, and the first direction is a long side direction of the target sub-pixel region.
Optionally, the sides of the two sub transparent material layers, which are in contact with the color resist layer in the target sub-pixel region, are perpendicular to the long sides of the target sub-pixel region.
Optionally, in the target sub-pixel region, the color resistance layer surrounds the transparent material layer.
Optionally, the transparent material layer includes at least two sub transparent material layers, and the sub transparent material layers are circular, oval, rectangular or square.
Optionally, the transparent material layer has at least one edge overlapping with an edge of the target sub-pixel region.
Optionally, the color film layer has a plurality of pixel regions, each of the pixel regions includes at least three sub-pixel regions, and the at least three sub-pixel regions include at least one target sub-pixel region.
According to another aspect of the present application, a display panel is provided, where the display panel includes an array substrate, a color filter substrate, and a liquid crystal layer located between the array substrate and the color filter substrate, and the color filter substrate includes any one of the color filter substrates.
The beneficial effects brought by the technical scheme provided by the embodiment of the application at least comprise:
through set up look resistance layer and transparent material layer in the sub-pixel region of various rete, because the luminousness of transparent material layer is greater than look resistance layer, therefore this structure makes more light can follow and sees through in the sub-pixel region, and then has improved the luminousness of various rete. The problem that the light transmittance of the color film substrate is low in the related technology can be solved, and the effect of improving the light transmittance of the color film substrate is achieved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a reflective display panel;
fig. 2 is a schematic structural diagram of a color filter substrate according to an embodiment of the present disclosure;
fig. 3 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application;
fig. 4 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application;
fig. 5 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application;
fig. 6 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application;
fig. 7 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application;
fig. 8 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application;
fig. 9 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application;
fig. 10 is a schematic structural diagram of another color filter substrate provided in this embodiment of the present application;
fig. 11 is a schematic cross-sectional view of the color filter substrate shown in fig. 10;
fig. 12 is a flowchart of a method for manufacturing a color filter substrate according to an embodiment of the present disclosure;
fig. 13 is a schematic structural diagram of a display panel according to an embodiment of the present application.
With the above figures, there are shown specific embodiments of the present application, which will be described in more detail below. These drawings and written description are not intended to limit the scope of the inventive concepts in any manner, but rather to illustrate the inventive concepts to those skilled in the art by reference to specific embodiments.
Detailed Description
To make the objects, technical solutions and advantages of the present application more clear, embodiments of the present application will be described in further detail below with reference to the accompanying drawings.
A color filter substrate is a substrate for allowing a display panel to emit various color lights. The color filter substrate generally includes a color resist layer, where the color resist layer corresponds to one color light, and the color light can pass through the corresponding color resist layer, but the color resist layer can prevent the color light that does not correspond from passing through. Illustratively, red light can transmit through the corresponding red color resist layer, but the red color resist layer can prevent other color lights such as blue light and green light which are not corresponding to the red color resist layer from transmitting.
The color filter substrate may include a plurality of color resist layers, such as a red color resist layer, a blue color resist layer, a green color resist layer, and the like, for transmitting red light, blue light, and green light, respectively.
However, each color resist layer can only transmit the corresponding color light, and a large amount of light of other colors is blocked, so that the color film substrate cannot be emitted, and the brightness of the display panel is low. This problem is particularly acute for reflective display panels.
The reflective display panel is a display panel that displays through external light, and as shown in fig. 1, the reflective display panel is a schematic structural diagram of the reflective display panel. The display panel comprises a substrate 11, a reflecting layer 12, a liquid crystal layer 13 and a color film substrate 14. The substrate 11 and the reflective layer 12 are located on one side of the liquid crystal layer 13, and the color filter substrate 14 is located on the other side of the liquid crystal layer.
The external light L irradiates the color filter substrate 14 from the outside, irradiates the reflective layer 12 through the color filter substrate 14 and the liquid crystal layer 13, is reflected by the reflective layer 12, and is transmitted out through the liquid crystal layer 13 and the color filter substrate 14 for display. It can be seen that the light emitted from the display panel passes through the color film substrate 14 twice when entering the display panel and exits the display panel, and if the light transmittance of the color film substrate 14 is low, the luminance of the display panel is seriously affected (for example, if the light transmittance of the color film substrate is 50%, only 25% of the external light remains after passing through the color film substrate twice), so that the display effect of the display panel is poor.
The embodiment of the application provides a color film substrate and a display panel, which can solve some problems mentioned above.
Fig. 2 is a schematic structural diagram of a color filter substrate according to an embodiment of the present disclosure. The color film substrate may include:
a substrate 21 and a color film layer 22 on the substrate 21.
The color film layer 22 has a plurality of sub-pixel regions sp including at least one target sub-pixel region sp1, the sub-pixel region sp and the target sub-pixel region sp1 both have the color-resist layer 221, the target sub-pixel region also has a transparent material layer 222 therein, and in the target sub-pixel region sp1, there is a non-overlapping region between the orthographic projection of the transparent material layer 222 on the substrate 21 and the orthographic projection of the color-resist layer 221 on the substrate 21.
In the non-overlapped region, that is, in the target sub-pixel region sp1, the color resistance layer 221 and the transparent material layer 222 are not shielded from each other, and the region of the transparent material layer 222 that is not shielded by the color resistance layer 221 can transmit color light of various colors, and has a higher light transmittance, so that the light transmittance of the color film substrate can be improved.
The transparent material layer may be made of a material with high light transmittance (e.g., greater than 80%, or greater than 90%), such as Optical Clear Adhesive (OCA).
It should be noted that fig. 2 shows a case where the orthographic projection of the transparent material layer 222 on the base substrate 21 and the orthographic projection of the color resist layer 221 on the base substrate 21 are not shielded from each other in the target sub-pixel region sp1, but there may be a region where the orthographic projection of the transparent material layer 222 on the base substrate 21 and the orthographic projection of the color resist layer 221 on the base substrate 21 are partially shielded from each other, which is not limited in the embodiment of the present application.
To sum up, the color filter substrate provided by the embodiment of the present application sets the color resist layer and the transparent material layer in the sub-pixel region of the color filter layer, and because the light transmittance of the transparent material layer is greater than that of the color resist layer, the structure enables more light rays to penetrate through the sub-pixel region, and further improves the light transmittance of the color filter layer. The problem that the light transmittance of the color film substrate is low in the related technology can be solved, and the effect of improving the light transmittance of the color film substrate is achieved.
Fig. 3 is a schematic structural diagram of another color filter substrate provided in the embodiment of the present application, where some adjustments are made to the color filter substrate shown in fig. 2.
Optionally, a color-resist layer 221 surrounds the transparent material layer 222. That is, the color resist layer 221 may have an opening thereon, and the transparent material layer 222 may be disposed in the opening on the color resist layer 221.
Optionally, the color film layer 22 may further include a light shielding pattern (e.g., a Black Matrix (BM) pattern) 223 having a plurality of openings, the areas in the openings are sub-pixel areas, and the transparent material layer 222 and the color resist layer 221 are located in the openings.
Fig. 3 shows the case where there is one opening in the color resist layer 221, but there may be more openings in the color resist layer. For example, as shown in fig. 4, which is a schematic structural diagram of another color filter substrate provided in the embodiment of the present application, the transparent material layer 222 includes at least two sub transparent material layers 2221. Correspondingly, at least two openings may be disposed on the color-resist layer 221, and at least two sub-transparent material layers 2221 may be disposed in the openings in a one-to-one correspondence. The color filter substrate shown in fig. 3 has three openings on the color resist layer 221, and the transparent material layer 222 includes three sub-transparent material layers 2221, where the three sub-transparent material layers 2221 are located in the three openings of the color resist layer 221 in a one-to-one correspondence manner.
Fig. 3 and 4 illustrate a case where the shape of the transparent material layer 222 and the sub-transparent material layer 2221 is rectangular (may be rectangular or square), but the shape of the transparent material layer 222 and the sub-transparent material layer 2221 may be other shapes, such as circular, oval, and the like, and the embodiment of the present application does not limit this.
Optionally, in a target sub-pixel region of the color film substrate provided in the embodiment of the present application, an area of the transparent material layer is smaller than an area of the color resist layer, so that chromaticity of light rays emitted from the target sub-pixel region as a whole can be ensured.
Optionally, as shown in fig. 5, the structure of another color filter substrate provided in the embodiment of the present application is schematically illustrated. The color film layer 22 has a plurality of pixel regions p, each pixel region p includes at least three sub-pixel regions, and the at least three sub-pixel regions include at least one target sub-pixel region. In this way, a pixel region including at least three sub-pixel regions may be formed, wherein a red sub-pixel region r capable of transmitting red light, a blue sub-pixel region b capable of transmitting blue light, and a green sub-pixel region g capable of transmitting green light may be included (in addition, a white sub-pixel region for transmitting white light may be included, that is, a display mode of RGBW is implemented). Fig. 5 shows a case where the green sub-pixel region g is a target sub-pixel region, but other sub-pixel regions may be the target sub-pixel region, which is not limited in the embodiment of the present application.
At least one target sub-pixel region with higher light transmittance is arranged in each pixel region, so that the uniformity of the light transmittance of each position of the color film substrate can be improved, and the light transmittance of each region of the whole color film substrate can be effectively improved.
In addition, as shown in fig. 6, a schematic structural diagram of another color filter substrate provided in the embodiment of the present application is shown. Each sub-pixel region in the pixel region p is a target sub-pixel region sp1, that is, each sub-pixel region has a transparent material layer 222, so that the light transmittance of the color filter substrate can be improved to a greater extent.
Of course, as shown in fig. 7, this is a schematic structural diagram of another color filter substrate provided in the embodiment of the present application. Each pixel region may also include two target sub-pixel regions sp1, which is another color film substrate provided in this application.
When the number of the sub-pixel regions included in the pixel region is larger, the number of the target sub-pixel regions may also be changed accordingly, for example, when the number of the sub-pixel regions included in the pixel region is four, the number of the target sub-pixel regions may also be one, two, three, or four, which is not limited in the embodiment of the present application.
In the color filter substrate provided in the embodiment of the present application, a contact edge may exist between the transparent material layer 222 and the color resistance layer 221, and light transmittance at the contact edge may fluctuate due to a process, which may further cause that the aperture ratio of the sub-pixel region is difficult to determine. The embodiments of the present application provide some structures to reduce the length of the edge between the transparent material layer 222 and the color resist layer 221, so as to improve the performance of the color filter substrate.
Fig. 8 is a schematic structural diagram of another color film substrate provided in the embodiment of the present application. The transparent material layer 222 has at least one edge overlapping with an edge of the target sub-pixel region sp 1. It is understood that one side of the transparent material layer 222 overlaps with the edge of the target sub-pixel region sp1, and the side does not contact the color-resist layer 221, thereby reducing the length of the side contacting between the transparent material layer 222 and the color-resist layer 221. For example, in the color filter substrate shown in fig. 8, three sides of the transparent material layer 222 are in contact with the color resist layer 221, and in the color filter substrate shown in fig. 6, four sides of the transparent material layer 222 are in contact with the color resist layer 221, so that in the color filter substrate shown in fig. 8, the length of the side, in contact with the color resist layer 221, of the transparent material layer 222 may be smaller than the length of the side, in contact with the color resist layer 221, of the color filter substrate shown in fig. 6.
The edge of the target sub-pixel region sp1 is the light shielding pattern 223. The contact between the transparent material layer 222 and the light blocking pattern 223 does not cause a problem in that the aperture ratio of the sub-pixel region is difficult to determine.
Fig. 8 shows a case where the transparent material layer 222 and the color resist layer 221 are both 1 in the target sub-pixel region sp1, but the transparent material layer 222 and the color resist layer 221 may be plural.
Exemplarily, as shown in fig. 9, the structure of another color filter substrate provided in the embodiment of the present application is schematically illustrated. The color-resist layer 221 includes two sub-color-resist layers 2211, and the two sub-color-resist layers 2211 are respectively located on two opposite sides of the transparent material layer 222. With this structure, the transparent material layer 222 divides the color-resist layer 221 into two sub-color-resist layers 2211, and both sides of the transparent material layer 222 overlap the edges of the target sub-pixel area sp1, reducing the length of the side in contact between the transparent material layer 222 and the color-resist layer 221.
In addition, in the color filter substrate shown in fig. 9, the color resist layer 221 and the transparent material layer 222 have edges (s1 and s2) that are in contact, and the end points of the edges (s1 and s2) that are in contact overlap with the edge of the target sub-pixel region sp 1. In this structure, both sides (s1 and s2) of the transparent material layer 222 overlap the edges of the target sub-pixel region sp1, and thus the length of the side in contact between the color-resist layer 221 and the transparent material layer 222 can be reduced.
Fig. 10 is a schematic structural diagram of another color film substrate provided in this embodiment of the present application. The transparent material layer 222 includes two sub-transparent material layers 2221, and the two sub-transparent material layers 2221 are respectively located at two opposite sides of the color resist layer 221. With such a structure, most of the edges of the sub transparent material layer 2221 are in contact with the light blocking pattern 223, and only a small part of the edges are in contact with the color resist layer 221, so that the length of the edges in contact between the transparent material layer 222 and the color resist layer 221 can be reduced.
Alternatively, the target sub-pixel region sp1 has a rectangular shape (the rectangular shape is not limited to a strict rectangular shape, and may be an approximate rectangular shape, such as a rounded rectangular shape, or a rectangular shape with corners having a similar chamfer structure as shown in fig. 10, etc.), two sub-transparent material layers 2221 are respectively located on both sides of the color resist layer 221 in the first direction f1, and the first direction f1 is a long side direction of the target sub-pixel region sp 1. With this structure, the length of the side of the two sub-transparent material layers 2221 contacting the color resist layer 221 can be the length of the short side of the target sub-pixel area sp1, and the other sides of the sub-transparent material layers 2221 contact the light-shielding pattern 223, so that the length of the side of the transparent material layer 222 contacting the color resist layer 221 can be reduced.
Alternatively, the sides (s3 and s4) of the two sub transparent material layers 2221 in contact with the color resist layer 221 are perpendicular to the long side of the target sub pixel area. In the case where the side of the sub transparent material layer 2221 in contact with the color resist layer 221 is perpendicular to the long side of the target sub pixel region, the length of the side in contact is equal to the length of the short side of the target sub pixel region sp1, so that the length of the side in contact between the transparent material layer 222 and the color resist layer 221 can be reduced.
Fig. 10 may be a top view of the color filter substrate viewed from above the panel surface of the color filter substrate, and fig. 11 is a schematic cross-sectional view at m-m in fig. 10. As can be seen, the color resist layer 221 and the two sub transparent material layers 2221 are disposed on the base substrate 21, and the color resist layer 221 and the two sub transparent material layers 222 are all located in the openings of the light shielding patterns 223.
Alternatively, the optical adhesive layer oca may be disposed on the base substrate 21, the optical adhesive layer oca is disposed on the base substrate 21 on which the color resist layer 221 is disposed, and further, on the base substrate 21, a portion of the optical adhesive layer oca not disposed with the color resist layer 221 may be covered by the optical adhesive layer oca, that is, a portion of the optical adhesive layer oca does not overlap with the color resist layer 221, and the optical adhesive layer oca of this portion may be a transparent material layer according to the above embodiment, or a sub-transparent material layer 2221. Fig. 11 shows a structure of a transparent material layer, but the transparent material layer may have other structures, for example, the transparent material layer may be formed on the substrate base plate 21 through a patterning process, and a portion where the color resist layer 221 is not disposed, which is not limited by the embodiment of the present application.
The sub-pixel region according to the embodiments of the present application may also be referred to as a sub-pixel region, which is not limited in the embodiments of the present application.
Optionally, in the color film substrate provided in this embodiment of the present application, the target sub-pixel regions may be uniformly distributed on the entire color film substrate. For example, each pixel region may have one target sub-pixel region, or the sub-pixel regions in each pixel region may be all target sub-pixel regions, or each n pixel regions has 1 target sub-pixel region, n is greater than or equal to 2, and the like, which is not limited in this embodiment of the application.
To sum up, the color filter substrate provided by the embodiment of the present application sets the color resist layer and the transparent material layer in the sub-pixel region of the color filter layer, and because the light transmittance of the transparent material layer is greater than that of the color resist layer, the structure enables more light rays to penetrate through the sub-pixel region, and further improves the light transmittance of the color filter layer. The problem that the light transmittance of the color film substrate is low in the related technology can be solved, and the effect of improving the light transmittance of the color film substrate is achieved.
Through testing, the applicant provides data of the aperture ratio and the reflectivity of some color film substrates according to the embodiments of the present application, which can be shown in table 1 below:
TABLE 1
Table 1 shows various parameters of the pixel region shown in fig. 10, the pixel region shown in fig. 6, and the pixel region shown in fig. 9. Wherein, the Aperture Ratio (AR) is the total Aperture ratio of the sub-pixel region, the Aperture ratio (AR-RGB) of the color resist layer is the Aperture ratio of the region where the color resist layer is located, and the Aperture ratio (AR-OC) of the transparent material layer is the Aperture ratio of the region where the transparent material layer is located.
The reflectivity can be the reflectivity of a reflective display panel made of a color film substrate in the sub-pixel area, and the higher the reflectivity is, the higher the brightness of the display panel is, and the better the display effect is.
In addition, an embodiment of the present application further provides a manufacturing method of a color filter substrate, as shown in fig. 12, which is a flowchart of the manufacturing method of the color filter substrate provided in the embodiment of the present application, and the manufacturing method of the color filter substrate may include the following steps:
Wherein, the sub-pixel area in at least one opening is the target sub-pixel area.
The light blocking pattern may be formed through a one-time patterning process. The light blocking pattern may be a black matrix pattern. The shading pattern is used for avoiding the phenomenon of light leakage and improving the display effect of the display panel.
The patterning process according to the embodiment of the present disclosure may include steps of forming a photoresist, exposing, developing, etching, and stripping the photoresist.
Color resist layers of a plurality of colors may be formed on the base substrate on which the light blocking pattern is formed to transmit light of the plurality of colors, and the color resist layers of different colors may be formed by patterning processes of different times, respectively.
For example, a red resist layer may be formed through a first patterning process, a green resist layer may be formed through a second patterning process, and a blue resist layer may be formed through a third patterning process. In addition, a white color resist layer can be formed to transmit white light to form an RGBW display mode.
The color resist layer may be correspondingly formed in the sub-pixel region of the light-shielding pattern, and the color resist layer formed in the target sub-pixel region may not fill the target sub-pixel region, but a smaller opening is reserved for forming the transparent material layer subsequently.
And 503, forming an optical adhesive layer on the substrate with the color resistance layer, wherein the optical adhesive layer forms a transparent material layer in the area which is not covered by the color resistance layer in the target sub-pixel area.
The optical adhesive layer can be covered on the substrate base plate which is formed with the colored resistance layer, wherein, in the target sub-pixel area, the area which is not formed with the colored resistance layer is covered by the optical adhesive layer to form the transparent material layer.
When step 503 is finished, reference may be made to fig. 10 and fig. 11 in the above embodiments for the structure of the substrate base plate, which is not described herein again in this embodiment of the application.
In summary, in the manufacturing method of the color film substrate provided in the embodiment of the present application, the color resist layer and the transparent material layer are disposed in the sub-pixel region of the color film layer, and since the light transmittance of the transparent material layer is greater than that of the color resist layer, the structure enables more light to penetrate through the sub-pixel region, thereby improving the light transmittance of the color film layer. The problem that the light transmittance of the color film substrate is low in the related technology can be solved, and the effect of improving the light transmittance of the color film substrate is achieved.
In addition, as shown in fig. 13, the display panel includes an array substrate 31, a color filter substrate 32, and a liquid crystal layer 33 located between the array substrate 31 and the color filter substrate 32, where the color filter substrate 32 may include the color filter substrate provided in the foregoing embodiments, such as the color filter substrate shown in fig. 2, the color filter substrate shown in fig. 3, the color filter substrate shown in fig. 4, the color filter substrate shown in fig. 5, the color filter substrate shown in fig. 6, the color filter substrate shown in fig. 7, the color filter substrate shown in fig. 8, the color filter substrate shown in fig. 9, or the color filter substrate shown in fig. 10.
Alternatively, the display panel may be a reflective display panel, and the array substrate 31 may include a reflective layer 311. The light source module can be used for reflecting the light irradiated to the inside of the display panel from the outside out of the display panel.
The display panel can be combined in various devices with display functions, such as smart phones, tablet computers, desktop computers, notebook computers, digital cameras, smart watches and the like.
The display panel that this application embodiment provided, because the luminousness of various membrane base plate is higher, this makes the light that gets into display panel more, and the light that jets out from display panel also can be more, so alright in order to promote display panel's reflectivity, and then promote display panel's display effect.
It is noted that in the drawings, the sizes of layers and regions may be exaggerated for clarity of illustration. Also, it will be understood that when an element or layer is referred to as being "on" another element or layer, it can be directly on the other element or layer or intervening layers may also be present. In addition, it will be understood that when an element or layer is referred to as being "under" another element or layer, it can be directly under the other element or intervening layers or elements may also be present. In addition, it will also be understood that when a layer or element is referred to as being "between" two layers or elements, it can be the only layer between the two layers or elements, or more than one intermediate layer or element may also be present. Like reference numerals refer to like elements throughout.
In this application, the term "first" is used for descriptive purposes only and is not to be construed as indicating or implying a relative importance. The term "plurality" means two or more unless expressly limited otherwise.
The above description is only exemplary of the present application and should not be taken as limiting, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (10)
1. The color film substrate is characterized by comprising:
the color film comprises a substrate base plate and a color film layer positioned on the substrate base plate;
the color film layer is provided with a plurality of sub-pixel regions, the plurality of sub-pixel regions comprise at least one target sub-pixel region, the sub-pixel regions and the target sub-pixel region are respectively provided with a color resistance layer, the target sub-pixel region is also provided with a transparent material layer, and in the target sub-pixel region, the orthographic projection of the transparent material layer on the substrate base plate and the orthographic projection of the color resistance layer on the substrate base plate are provided with non-overlapping regions.
2. The color filter substrate according to claim 1, wherein in the target sub-pixel region, the color resist layer and the transparent material layer have edges in contact with each other, and an end point of the edge in contact with the edge of the target sub-pixel region intersects with the edge of the target sub-pixel region.
3. The color filter substrate according to claim 2, wherein the transparent material layer comprises two sub transparent material layers, and the two sub transparent material layers are respectively located on two opposite sides of the color resist layer in the target sub pixel region.
4. The color filter substrate according to claim 3, wherein the target sub-pixel region is rectangular, the two sub-transparent material layers are respectively located on two sides of the color resist layer in the target sub-pixel region in a first direction, and the first direction is a long side direction of the target sub-pixel region.
5. The color filter substrate according to claim 4, wherein edges of the two sub transparent material layers, which are in contact with the color resist layer in the target sub pixel region, are perpendicular to a long edge of the target sub pixel region.
6. The color filter substrate of claim 1, wherein in the target sub-pixel region, the color resist layer surrounds the transparent material layer.
7. The color filter substrate according to claim 6, wherein the transparent material layer comprises at least two sub transparent material layers, and the sub transparent material layers are circular, oval, rectangular or square.
8. The color filter substrate according to claim 1, wherein the transparent material layer has at least one edge overlapping with an edge of the target subpixel area.
9. The color filter substrate according to any one of claims 1 to 8, wherein the color filter layer has a plurality of pixel regions, each pixel region includes at least three sub-pixel regions, and the at least three sub-pixel regions include at least one target sub-pixel region.
10. A display panel, comprising an array substrate, a color filter substrate, and a liquid crystal layer located between the array substrate and the color filter substrate, wherein the color filter substrate comprises the color filter substrate according to any one of claims 1 to 9.
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| CN202110321820.0A CN112987386A (en) | 2021-03-25 | 2021-03-25 | Color film substrate and display panel |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110321820.0A CN112987386A (en) | 2021-03-25 | 2021-03-25 | Color film substrate and display panel |
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| CN112987386A true CN112987386A (en) | 2021-06-18 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114578611A (en) * | 2022-03-15 | 2022-06-03 | 广州华星光电半导体显示技术有限公司 | Color film substrate, manufacturing method of color film substrate and display device |
| CN115480421A (en) * | 2022-10-19 | 2022-12-16 | 信利(仁寿)高端显示科技有限公司 | CF substrate and manufacturing method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101349845A (en) * | 2008-09-05 | 2009-01-21 | 上海广电光电子有限公司 | Red, green, blue and white type thin-film transistor LCD device |
| CN102914905A (en) * | 2012-10-12 | 2013-02-06 | 京东方科技集团股份有限公司 | Color film substrate and semitransparent semi-reflective liquid crystal display device |
| CN103197462A (en) * | 2013-03-26 | 2013-07-10 | 京东方科技集团股份有限公司 | Color film substrate, display panel and display device |
| CN103809323A (en) * | 2014-01-29 | 2014-05-21 | 合肥鑫晟光电科技有限公司 | Display substrate and display device |
| KR102173090B1 (en) * | 2019-09-04 | 2020-11-03 | (주)라이타이저 | Selective-transferring method of carrier substrate, manufacturing method of display apparatus using this same and display apparatus manufactured by that method |
| CN111999934A (en) * | 2020-09-16 | 2020-11-27 | 厦门天马微电子有限公司 | Display panel and display device |
-
2021
- 2021-03-25 CN CN202110321820.0A patent/CN112987386A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101349845A (en) * | 2008-09-05 | 2009-01-21 | 上海广电光电子有限公司 | Red, green, blue and white type thin-film transistor LCD device |
| CN102914905A (en) * | 2012-10-12 | 2013-02-06 | 京东方科技集团股份有限公司 | Color film substrate and semitransparent semi-reflective liquid crystal display device |
| CN103197462A (en) * | 2013-03-26 | 2013-07-10 | 京东方科技集团股份有限公司 | Color film substrate, display panel and display device |
| CN103809323A (en) * | 2014-01-29 | 2014-05-21 | 合肥鑫晟光电科技有限公司 | Display substrate and display device |
| KR102173090B1 (en) * | 2019-09-04 | 2020-11-03 | (주)라이타이저 | Selective-transferring method of carrier substrate, manufacturing method of display apparatus using this same and display apparatus manufactured by that method |
| CN111999934A (en) * | 2020-09-16 | 2020-11-27 | 厦门天马微电子有限公司 | Display panel and display device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114578611A (en) * | 2022-03-15 | 2022-06-03 | 广州华星光电半导体显示技术有限公司 | Color film substrate, manufacturing method of color film substrate and display device |
| CN114578611B (en) * | 2022-03-15 | 2023-09-05 | 广州华星光电半导体显示技术有限公司 | Color film substrate, manufacturing method of color film substrate and display device |
| CN115480421A (en) * | 2022-10-19 | 2022-12-16 | 信利(仁寿)高端显示科技有限公司 | CF substrate and manufacturing method thereof |
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Application publication date: 20210618 |