CN107490887A - A kind of preparation method of liquid crystal display panel - Google Patents
A kind of preparation method of liquid crystal display panel Download PDFInfo
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- CN107490887A CN107490887A CN201710802095.2A CN201710802095A CN107490887A CN 107490887 A CN107490887 A CN 107490887A CN 201710802095 A CN201710802095 A CN 201710802095A CN 107490887 A CN107490887 A CN 107490887A
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- preparation
- light transmittance
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- liquid crystal
- crystal display
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
Abstract
The invention discloses a kind of preparation method of liquid crystal display panel, the described method comprises the following steps：(a) colored filter substrate is provided, wherein the colored filter substrate includes viewing area and non-display area；(b) black matrix layer is formed in the non-display area of the colored filter substrate；(c) a conductive photoresist layer is formed in the black matrix layer；(d) light shield with the first light transmittance in a first area and the second light transmittance in a second area is passed through, the conductive photoresist layer is exposed, to form spacer material corresponding with the first area and electrode corresponding with the second area respectively on the conductive photoresist layer；Wherein described first light transmittance is different from second light transmittance.
Description
Technical field
The present invention relates to liquid crystal display panel technical field, more particularly to a kind of preparation method of liquid crystal display panel.
Background technology
Thin Film Transistor-LCD (thin film transistor-liquid crystal display, TFT-
LCD) because having the characteristics that light, thin, small while low in energy consumption, radiationless, manufacturing cost is relatively low, in current FPD row
Industry is using relatively broad.Liquid crystal display panel is TFT-LCD primary clustering, and it includes thin-film transistor array base-plate (Array
Substrate) and colored filter substrate (Color Filter Substrate) form traditional liquid crystal display panel.Its
In, the general preparation method of colored filter includes BM (light shield layer), RGB (colored picture element), ITO (electrode), PS (photoresistance dottle pins
Thing).
During electrode ITO is formed, physical vaporous deposition (physical vapor can be typically used
Deposition, abbreviation PVD).However, PVD equipment is expensive, and productivity ratio is more nervous.
Therefore, how preferably to form electrode ITO during colored filter is prepared and have become related personnel
Primary study project.
The content of the invention
It is an object of the present invention to provide a kind of preparation method of liquid crystal display panel, during spacer material is formed
Using conductive photoresist, and more light transmittance light shield manufacture spacer materials and electrode are utilized, electricity is formed in the prior art so as to omit
The making step of the physical vaporous deposition of pole, to reach the purpose for reducing cost, and improve production capacity.
To achieve these goals, the preparation method that one embodiment of the invention provides liquid crystal display panel, including it is following
Step：(a) colored filter substrate is provided, wherein the colored filter substrate includes viewing area and non-display area；
(b) black matrix layer is formed in the non-display area of the colored filter substrate；(c) one is formed in the black matrix layer to lead
Electric photoresist layer；(d) light with the first light transmittance in a first area and the second light transmittance in a second area is passed through
Cover, is exposed to the conductive photoresist layer, to be formed and the first area pair respectively on the conductive photoresist layer
The spacer material and electrode corresponding with the second area answered；Wherein described first light transmittance is different from second light transmittance.
In one embodiment of this invention, first light transmittance is more than second light transmittance.
Preferably, first light transmittance is 100%, and second light transmittance is 20%~50%.
In one embodiment of this invention, the conductive photoresist layer is formed by transparent material, wherein, the transparent material
Including：Conducting medium, resin, sensitising agent, solvent and additive.
Preferably, the conducting medium is that resistivity is less than 10*10-8The conductive metal particles or electrical conductivity alloy of ohm meter
Particle.
In one embodiment of this invention, the thickness of the spacer material is 2~4.5 μm.
In one embodiment of this invention, step is further comprised between step (b) and step (c)：
A colored light filter membrane layer is formed in the viewing area of the colored filter substrate；The colored light filter membrane layer is entered
Row exposure, to form Red lightscreening plate, green color filter and blue color filter.
Alternatively, in step (b), by using chromium shading embrane method or eclipsed form membrane formation process or resin shading membrane formation process or
Back side lithographic exposes membrane formation process to form black matrix layer.
Alternatively, methods described is applied to the color filter sheet integrated liquid crystal display panel or black in array base-plate structure
Matrix is integrated in the liquid crystal display panel of array base-plate structure.
It is an advantage of the current invention that the preparation method of the invention by implementing liquid crystal display panel, to form spacer material
During use conductive photoresist, and more light transmittance light shield manufacture spacer materials and electrode are utilized, so as to omit prior art
The making step of the middle physical vaporous deposition for forming electrode, to reach the purpose for reducing cost, and improves production capacity.
Brief description of the drawings
Fig. 1 is the step flow chart of the preparation method of the liquid crystal display panel of first embodiment of the invention；
Fig. 2A~Fig. 2 D are the process charts of the preparation method of the liquid crystal display panel of first embodiment of the present invention.
Fig. 3 A~Fig. 3 E are the process charts of the preparation method of the liquid crystal display panel of second embodiment of the present invention.
Embodiment
Hereinafter, with reference to refer to the attached drawing, the specific implementation of the preparation method of the liquid crystal display panel of the present invention will be described in detail
Mode.In the component in adding reference to each accompanying drawing, it is notable that although display is in different drawings,
But they represent same or analogous component.In addition, being described below in the present invention, if the known function being incorporated herein
With the detailed description of configuration subject of the present invention can be made to become unclear, then to be omitted.
Fig. 1 is the step flow chart of the preparation method of the liquid crystal display panel of the first embodiment of the present invention.Fig. 2A~figure
2D is the process chart of the preparation method of the liquid crystal display panel of first embodiment of the present invention.
The preparation method for providing liquid crystal display panel referring to Fig. 1, the first embodiment of the present invention, comprises the following steps：
With reference to shown in Fig. 2A, step S110：A colored filter substrate is provided, wherein the colored filter substrate includes
Viewing area and non-display area.
In this step, the colored filter substrate 210 includes the viewing area and viewing area for display image
Outside for example for be spaced or region different pixels non-display area.
With reference to shown in Fig. 2 B, step S120：A black matrix is formed in the non-display area of the colored filter substrate 210
Layer 220.
In this step, can be by using chromium shading embrane method or eclipsed form membrane formation process or resin shading membrane formation process or the back side
Lithographic exposes membrane formation process to form black matrix layer 220.
Wherein, in the first embodiment of the invention, using resin shading membrane formation process.The resin shading membrane formation process is to set
The materials such as carbon black, inorganic pigment and organic pigment are dispersed into light screening material in fat, then are coated on substrate, are utilized
PEP technologies are processed, to form required light shield layer.So, the thickness of made black matrix layer can with relatively thick,
And light-proofness is preferable.And in the other parts embodiment of the present invention, using chromium shading embrane method.The chromium shading embrane method is to utilize
The comprehensive film forming of crome metal film on substrate, is then being used PEP (photolithographic etching by sputtering unit
Pattern, i.e. lithography) technology is processed and forms chromium light shield layer.The black matrix layer (i.e. light shield layer) can reach
The effect of antireflection.
With reference to shown in Fig. 2 C, step S130：A conductive photoresist layer 230 is formed in the black matrix layer 220.
In the first embodiment of the invention, by using narrow slit type coating apparatus gluing to the black matrix layer.It is described to lead
Electric photoresist layer 230 is formed by transparent material, wherein, the transparent material includes：Conducting medium, resin, sensitising agent, solvent and
Additive.
Preferably, the conducting medium is that resistivity is less than 10*10-8The conductive metal particles or electrical conductivity alloy of ohm meter
Particle.
With reference to shown in Fig. 2 D, step S140：By with the first light transmittance in a first area 511 and in one second area
The light shield 510 of second light transmittance in domain 512, the conductive photoresist layer 230 is exposed, with the conductive photoresist layer
On 230 respectively formed it is corresponding with the first area 511 and have first thickness spacer material 231 and with the second area
512 electrodes 232 corresponding and with second thickness；Wherein described first light transmittance is different from second light transmittance；Described
One thickness is different from the second thickness.
In the first embodiment of the invention, first light transmittance is more than second light transmittance.Preferably, described first
Light transmittance is 100%, and second light transmittance is 20%~50%.That is, the first area 511 is full-trans-parent film, and
The translucency of the second area 512 is more than the translucency of impermeable membrane.
Because first light transmittance is different from second light transmittance, therefore, after exposure imaging, in conductive photoresist
The spacer material 231 and the respective thickness of electrode 232 formed on layer 230 is also different.In the first embodiment of the invention, described
One thickness is more than the second thickness.In the first embodiment of the invention, the thickness of the spacer material 231 is 2~4.5 μm.Institute
The thickness for stating electrode is
Further, since the material of the spacer material 231 is identical with the material of the electrode 232, therefore, with the electrode phase
The part spacer material 231 of stack pile can be used as the electrode 232, and so, the conductive photoresist layer 230 is in visualization
Afterwards, the electrode 232 in the whole face (still keeping certain thickness) that can be formed, and form an electric field with another substrate.
Embodiment of the present invention utilizes more printing opacities by using conductive photoresist during spacer material is formed
Rate light shield manufacture spacer material and electrode, the making step for the physical vaporous deposition for forming electrode in the prior art is omitted, so as to
Reaching reduces the purpose of cost, and improves production capacity.
Fig. 3 A~Fig. 3 E are the process charts of the preparation method of the liquid crystal display panel of second embodiment of the present invention.
In addition, the preparation method that the second embodiment of the present invention provides liquid crystal display panel, comprises the following steps：
With reference to figure 1 and with reference to shown in Fig. 3 A, step S110：A colored filter substrate 310 is provided, wherein the colored filter
Mating plate substrate 310 includes viewing area and non-display area.
With reference to shown in Fig. 3 B, step S120：A black matrix is formed in the non-display area of the colored filter substrate 310
Layer 320.
With reference to shown in Fig. 3 C, further comprise between step S120 and step S130：
A colored light filter membrane layer is formed in the viewing area of the colored filter substrate 310；Pass through different light shields pair
The colored light filter membrane layer is exposed, to form corresponding Red lightscreening plate 331, green color filter 332 and blue color filter
333.It is noted that the thickness of blue color filter 333 is more than Red lightscreening plate 331, the thickness of green color filter 332.This is
The pigment inside color blocking due to forming blue color filter 333 needs the standard for meeting colourity and colour gamut, only works as blue filter
When the thickness of piece 333 reaches certain thickness, can be only achieved chromaticity coordinate, so as to Red lightscreening plate 331, green color filter 332
Combination, meets the color standard of product, and general color standard meets NTSC72%.
With reference to shown in Fig. 3 D, step S130：A conductive photoresist layer 340 is formed in the black matrix layer 320.
With reference to shown in Fig. 3 E, step S140：By with the first light transmittance in a first area 511 and in one second area
The light shield 510 of second light transmittance in domain 512, the conductive photoresist layer 340 is exposed, with the conductive photoresist layer
On 340 respectively formed it is corresponding with the first area 511 and have first thickness spacer material 351 and with the second area
512 electrodes 352 corresponding and with second thickness；Wherein described first light transmittance is different from second light transmittance；Described
One thickness is different from the second thickness.
In addition, the preparation method of liquid crystal display panel of the present invention is suitable for color filter sheet integrated in array base palte knot
The liquid crystal display panel or black matrix of structure are integrated in the liquid crystal display panel of array base-plate structure.That is, institute of the present invention
The method of stating is applicable not only to color filter sheet integrated in the structure on colored filter substrate, is also suitable for color filter sheet integrated
Array base-plate structure is integrated in the structure of array base palte, or black matrix.
Although the preferred embodiments of the present invention have been described that purposes, those skilled in the art is not departing from this hair
It will be appreciated that different modification, supplement and replacement, these modifications, supplement and replacement in the case of bright scope and the spirit of invention
Also it should be regarded as protection scope of the present invention.Therefore, disclosed embodiment is intended to the technology think of of the explanation present invention in the present invention
The scope thought, and those embodiments are not delimit the scope of the invention.The scope of the present invention will according to appended claims,
Such as all technical ideas include being equal to scope of the presently claimed invention, to explain.
Claims (9)
1. a kind of preparation method of liquid crystal display panel, it is characterised in that comprise the following steps：
(a) colored filter substrate is provided, wherein the colored filter substrate includes viewing area and non-display area；
(b) black matrix layer is formed in the non-display area of the colored filter substrate；
(c) a conductive photoresist layer is formed in the black matrix layer；
(d) by the light shield with the first light transmittance in a first area and the second light transmittance in a second area, to institute
State conductive photoresist layer to be exposed, to form dottle pin corresponding with the first area respectively on the conductive photoresist layer
Thing and electrode corresponding with the second area；Wherein described first light transmittance is different from second light transmittance.
2. preparation method according to claim 1, it is characterised in that first light transmittance is more than second light transmittance.
3. preparation method according to claim 2, it is characterised in that first light transmittance is 100%, second light transmittance
For 20%~50%.
4. preparation method according to claim 1, it is characterised in that the conductive photoresist layer is formed by transparent material, wherein,
The transparent material includes：Conducting medium, resin, sensitising agent, solvent and additive.
5. preparation method according to claim 4, it is characterised in that the conducting medium is that resistivity is less than 10*10-8Ohm
The conductive metal particles or electrical conductivity alloy particle of rice.
6. preparation method according to claim 1, it is characterised in that the thickness of the spacer material is 2~4.5 μm.
7. preparation method according to claim 1, it is characterised in that further comprise walking between step (b) and step (c)
Suddenly：
A colored light filter membrane layer is formed in the viewing area of the colored filter substrate；
The colored light filter membrane layer is exposed, to form Red lightscreening plate, green color filter and blue color filter.
8. preparation method according to claim 1, it is characterised in that in step (b), by using chromium shading embrane method or overlapping
Formula membrane formation process or resin shading membrane formation process or back side lithographic expose membrane formation process to form black matrix layer.
9. preparation method according to claim 1, it is characterised in that methods described is applied to color filter sheet integrated in array base
The liquid crystal display panel or black matrix of harden structure are integrated in the liquid crystal display panel of array base-plate structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710802095.2A CN107490887A (en) | 2017-09-07 | 2017-09-07 | A kind of preparation method of liquid crystal display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710802095.2A CN107490887A (en) | 2017-09-07 | 2017-09-07 | A kind of preparation method of liquid crystal display panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107490887A true CN107490887A (en) | 2017-12-19 |
Family
ID=60651236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710802095.2A Pending CN107490887A (en) | 2017-09-07 | 2017-09-07 | A kind of preparation method of liquid crystal display panel |
Country Status (1)
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019127674A1 (en) * | 2017-12-29 | 2019-07-04 | 深圳市华星光电半导体显示技术有限公司 | Method for fabricating black matrix and spacer |
| US10488699B2 (en) | 2017-12-29 | 2019-11-26 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Method for manufacturing black matrix and spacer |
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| CN106708346A (en) * | 2017-01-13 | 2017-05-24 | 京东方科技集团股份有限公司 | Touch substrate and preparation method thereof |
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| CN1979229A (en) * | 2005-12-08 | 2007-06-13 | Lg.菲利浦Lcd株式会社 | Color filter substrate and method of fabricating the same |
| US20070190466A1 (en) * | 2006-02-15 | 2007-08-16 | Yi-Wei Lee | Manufacturing method for pixel structure |
| CN102929046A (en) * | 2012-11-05 | 2013-02-13 | 京东方科技集团股份有限公司 | Blue phase liquid crystal panel, blue phase liquid crystal device and manufacture method of blue phase liquid crystal panel |
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| CN106708346A (en) * | 2017-01-13 | 2017-05-24 | 京东方科技集团股份有限公司 | Touch substrate and preparation method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019127674A1 (en) * | 2017-12-29 | 2019-07-04 | 深圳市华星光电半导体显示技术有限公司 | Method for fabricating black matrix and spacer |
| US10488699B2 (en) | 2017-12-29 | 2019-11-26 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Method for manufacturing black matrix and spacer |
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Application publication date: 20171219 |