JP4562021B2 - Color filter substrate, manufacturing method thereof, and display device - Google Patents

Description

  The present invention relates to a color filter substrate, a manufacturing method thereof, and a display device such as a color liquid crystal display device using the same.

  Since this type of color liquid crystal display device has various characteristics such as small size, thinness, low power consumption and light weight, it is currently widely used in display units of various electronic devices. In particular, an active matrix liquid crystal display device having a switching element is widely used in OA equipment such as a personal computer, AV equipment such as a television device, and a cellular phone. Further, in recent years, quality improvements such as an increase in size, high definition, improvement in the effective pixel area ratio (increase in aperture ratio), wide viewing angle, and improvement in color purity of a color liquid crystal display device are rapidly progressing.

  For example, in an active matrix liquid crystal display device, a thin film transistor (hereinafter referred to as TFT) as a switching element and an active matrix substrate on which a pixel electrode is formed and a color filter substrate on which a color filter layer and a counter electrode are formed have a predetermined distance. And a liquid crystal layer as a display medium is sandwiched between both substrates. In this color liquid crystal display device, the thickness (cell gap, cell thickness) of the liquid crystal layer is held by a spacer made of plastic beads disposed between both substrates.

  Since the plastic beads are spread on the substrate in an air current, the position where the plastic beads are arranged cannot be specified in advance. For this reason, there is a problem that the display quality of the color liquid crystal display device is deteriorated due to light scattering or light transmission by the bead spacer existing on the pixel.

  Therefore, in recent years, a color liquid crystal display device has been proposed in which a protruding structure is formed on a color filter substrate using a resin or the like, and this is used as a columnar spacer to maintain the thickness of the liquid crystal layer.

  For example, Patent Document 1 discloses a method of forming a protruding structure that becomes a spacer (laminated columnar spacer) by laminating colored layers constituting a color filter layer.

  FIG. 8 is a cross-sectional view of an essential part showing a configuration example of a conventional color liquid crystal display device disclosed in Patent Document 1. In FIG.

  As shown in FIG. 8, the color liquid crystal display device 50 is, for example, an active matrix liquid crystal display device, and includes a color filter substrate 20 on the counter substrate side and a TFT array substrate 30 which is an active matrix substrate on the element substrate side. is doing.

  The color filter substrate 20 is provided with a color filter layer 2 having RGB colored layers 2a, 2b and 2c on the transparent substrate 1 so as to face each pixel electrode. Between each colored layer 2a, 2b and 2c, a laminated columnar spacer 3 which is a protruding structure in which the same colored layers 3a, 3b and 3c as the colored layers are laminated is provided. A counter electrode and an alignment film (not shown) are formed so as to cover the substrate.

  In the TFT array substrate 30, a TFT circuit layer 9 including wiring and TFT elements is provided on a transparent substrate 10, and a pixel electrode 7 is provided thereon via an insulating layer 8. A plurality of pixel electrodes 7 are provided in a matrix in a two-dimensional plan view on the substrate portion, and each pixel electrode 7 is connected to a wiring via a TFT element provided in the vicinity thereof. . An alignment film (not shown) is formed so as to further cover the substrate.

  In the liquid crystal display device 50, the color filter substrate 20 and the TFT array substrate 30 are projecting structures formed on the color filter substrate 20 side so as to face each other such that their alignment films (not shown) face each other. A certain substrate interval (cell gap) is maintained by a certain laminated columnar spacer 3, and the color filter substrate 20 and the TFT array substrate 30 are bonded together by a sealing material (not shown). A liquid crystal layer 6 is filled in a gap between the substrates 20 and 30, and a liquid crystal injection port is sealed with a sealing material (not shown).

  For example, Patent Document 2 discloses a color liquid crystal display device in which an insulating resin layer is provided between a counter electrode and a pixel electrode in order to divide and control the alignment state of liquid crystals in each pixel portion and to adjust a cell gap. Has been proposed.

  FIG. 9 is a cross-sectional view of an essential part showing another configuration example of the conventional color liquid crystal display device disclosed in Patent Document 2. In FIG.

  As shown in FIG. 9, the color liquid crystal display device 60 is, for example, an active matrix liquid crystal display device, and includes a color filter substrate 20A on the counter substrate side and a TFT array substrate 30A that is an active matrix substrate on the element substrate side. is doing.

  The color filter substrate 20A is provided with a color filter layer 2 having RGB colored layers 2a, 2b and 2c on the transparent substrate 1 so as to face each pixel electrode. A counter electrode (not shown) is provided so as to further cover the insulating layer, and an insulating property for controlling the alignment state of the liquid crystal layer 6 in the pixel portion is divided on the central portion of each of the colored layers 2a, 2b and 2c. A resin layer 5a is provided. Further, between the colored layers 2a, 2b and 2c, the same colored layers 3a, 3b and 3c as the respective colored layers are sequentially laminated, and a liquid crystal is formed in each pixel portion via a counter electrode (not shown) thereon. In order to divide and control the orientation state of the layer 6 and to adjust the cell gap, the insulating resin layer 5b is provided to form the stacked columnar spacer 3 that is a protruding structure.

  In the TFT array substrate 30A, a TFT circuit layer 9 including wiring and TFT elements is provided on a transparent substrate 10, and a pixel electrode 7 is provided thereon via an insulating layer 8. The pixel electrodes 7 are provided on the substrate 10 in a two-dimensional matrix, and each pixel electrode 7 is connected to a wiring via a TFT element provided in the vicinity thereof. An alignment film (not shown) is formed so as to cover the substrate.

  In the color liquid crystal display device 60, the color filter substrate 20A and the TFT array substrate 30A are arranged so as to face each other such that their alignment films (not shown) face each other, and a protruding structure formed on the color filter substrate 20A. A fixed substrate interval (cell gap) is maintained by the stacked columnar spacers 3 which are objects, and the substrates are bonded together by a sealing material (not shown). The gap between the two substrates 20A and 30A is filled with the liquid crystal layer 6, and the liquid crystal injection port is sealed with a sealing material (not shown).

  However, in the method of forming the protruding structure (laminated columnar spacer 3) using the resin or the like on the color filter substrates 20 and 20A as in Patent Document 1 and Patent Document 2, manufacturing variations and manufacturing of each stacked film are performed. The height of the laminated columnar spacer 3 (projection-like structure) finally obtained due to troubles of the apparatus may vary, and a spacer having a desired height may not be obtained.

  As described above, when a display device such as a color liquid crystal display device is manufactured using the color filter substrates 20 and 20A when a spacer having a desired height cannot be obtained, a desired cell gap cannot be obtained. There is a problem that the display quality cannot be obtained and the manufacturing yield is lowered.

  Therefore, for example, in Patent Document 3 and Patent Document 4, a defective color filter substrate is not used for manufacturing a liquid crystal display device by measuring the protrusion height of the stacked columnar spacer 3 formed on the color filter substrate. A method of doing so is disclosed.

  FIG. 10 is a flowchart for explaining a conventional method of manufacturing a color filter substrate disclosed in Patent Document 3 and Patent Document 4.

  As shown in FIG. 10, in step S <b> 1, first, when the stacked columnar spacer 3 (projection-like structure) is formed, the projection height of the stacked columnar spacer 3 is measured in step 2.

Next, if the height of the laminated columnar spacer 3 is a desired value (within a predetermined value range), it is determined to be a non-defective product (OK), and if it is not a desired value, it is determined to be a defective product (NG). In NG), the measurement result is fed back to the manufacturing process so that the manufacturing conditions are optimized from the next manufacturing. Accordingly, it is possible to prevent the color liquid crystal display device from being manufactured using a defective color filter substrate that does not satisfy the desired spacer height range.
Japanese Patent Laid-Open No. 9-43425 Japanese Patent Laying-Open No. 2001-201750 (FIG. 22) Japanese Patent Laid-Open No. 11-288463 JP-A-11-218466

  In the method of forming a protruding structure by laminating a colored layer, an insulating resin layer, etc. on the color filter substrates 20 and 20A as in Patent Document 1 and Patent Document 2, and using this as the laminated columnar spacer 3 If a display device such as a color liquid crystal display device is manufactured using a color filter substrate that is not of the desired height, a good display quality may not be obtained. There is a problem that the yield decreases.

  In the prior arts of Patent Document 3 and Patent Document 4 described above, since the height of the stacked spacer is measured after the formation of the stacked columnar spacers, those that do not satisfy the desired spacer height are determined as defective products, In addition, since the feedback of the manufacturing conditions to the manufacturing process is also delayed, there is a problem that the manufacturing yield cannot be improved.

  SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems. A color filter substrate, a manufacturing method thereof, and a display using the same can be formed by forming a stacked columnar spacer having a desired height and manufacturing a display device of good display quality with a high yield. An object is to provide an apparatus.

The method for producing a color filter substrate according to the present invention is a projecting shape in which two or more layers are laminated on a predetermined layer of a color filter layer provided on a transparent substrate and in which a plurality of colored layers are arranged two-dimensionally. In the method for manufacturing a color filter substrate for manufacturing a color filter substrate having a structure, at least at the time before forming the laminated film immediately before the final laminated film and before forming the final laminated film of the protruding structure. The step of measuring the protrusion height of the structure of the structure, and based on the measurement result, set the lamination conditions of the at least the final laminated film so that the protrusion height of the protrusion-like structure becomes the desired protrusion height And the step of forming the projecting structure by forming the at least final laminated film based on the set lamination conditions, whereby the above object is achieved.

The method for producing a color filter substrate according to the present invention is a projection in which three or more layers are laminated on a predetermined layer of a color filter layer that is provided on a transparent substrate and in which a plurality of colored layers are arranged two-dimensionally. In the method for manufacturing a color filter substrate for manufacturing a color filter substrate having a structure, at least before the formation of the final one layer of the laminated film lower than the final laminated film of the projecting structure, the final one layer After the formation of the immediately preceding laminated film, the protrusion height of the structure is measured at the time, and the protrusion height of the protrusion-like structure becomes a desired protrusion height based on the measured result. A step of setting a lamination condition of at least one final layer in the lower layer, a step of forming and forming the at least one final layer based on the set lamination condition, and forming a final laminated film of the projecting structure Before and after forming the final layer The step of measuring the protrusion height of the structure at that time and the lamination of the final laminated film so that the protrusion height of the protrusion-like structure becomes a desired protrusion height based on the measured measurement result There are a step of setting conditions, and a step of forming the projecting structure by forming the final laminated film based on the set lamination conditions, whereby the above object is achieved.

  Further preferably, the protruding structure in the method for producing a color filter substrate of the present invention includes a colored layer constituting the color filter layer.

  Further preferably, the color filter layer in the method for producing a color filter substrate of the present invention includes a black layer, and the protruding structure is formed on the black layer.

  Further preferably, a conductive layer is provided on the color filter layer in the method for manufacturing a color filter substrate of the present invention, and a final laminated film of the protruding structure is formed on the conductive layer.

  Further preferably, the final laminated film of the protruding structure in the method for producing a color filter substrate of the present invention is an alignment control material film.

  Further preferably, the protruding structure in the method for producing a color filter substrate of the present invention includes a photosensitive resin film.

  The color filter substrate of the present invention is produced by the method for producing a color filter substrate according to any one of claims 1 to 7, and thereby the above-described object is achieved.

  In the display device according to the present invention, the color filter substrate according to claim 8 and another substrate are arranged to face each other with a predetermined interval with the protruding structure as a spacer, and the display medium is sandwiched between the substrates. This achieves the above object.

  The operation of the present invention will be described below with the above configuration.

  In the present invention, at least the final lamination is performed when a protruding structure (laminated columnar spacer) in which a colored layer constituting the color filter layer and an insulating resin layer for controlling the divisional orientation of the liquid crystal layer are laminated is produced. By measuring the protrusion height of the structure before forming the film and feeding back the measurement result to the manufacturing conditions of the final laminated film, a spacer having a desired height can be manufactured. Also, instead of measuring the projection height when the laminated columnar spacer is completed, it is necessary to measure the projection height of the laminated columnar spacer at least before forming the final laminated film. Therefore, it is possible to greatly reduce defective products.

  As described above, according to the present invention, the protrusion height of the structure is measured at least before the final laminated film is formed, and the measurement result is fed back to the manufacturing conditions of the final laminated film. Can be suppressed. Therefore, the manufacturing cost can be reduced, and a display device having a desired cell thickness can be repeatedly and accurately manufactured to improve display quality.

Embodiments 1 and 2 in which the present invention is applied to a color filter substrate of an active matrix color liquid crystal display device will be described below with reference to the drawings. The present invention is not limited to the following first and second embodiments.
(Embodiment 1)
In the first embodiment, an example will be described in which the present invention is applied to the manufacture of a color filter substrate in which a protruding structure that becomes a stacked columnar spacer is formed by laminating colored layers constituting a color filter layer. In the first embodiment, a case where a black matrix is provided on the color filter substrate will be described. However, the present invention can also be applied to a configuration in which a black matrix is not provided as shown in FIG.

  FIG. 1 is a cross-sectional view of a main part showing a configuration example of a color filter substrate according to the first embodiment.

  As shown in FIG. 1, the color filter substrate 20B includes a first colored layer 2a such as RGB (red / green / blue), a second colored layer 2b and a third colored layer 2c on the transparent substrate 1, and each colored layer. A color filter layer 2B having a black layer (light-shielding portion: black matrix layer) 2d disposed between the two is provided. Between the first colored layer 2a and the second colored layer 2c, the same black layer as the black matrix layer 2d and the same colored layer as the first colored layer 2a, the second colored layer 2b and the third colored layer 2c are provided. A protrusion-like structure having a protrusion height T of the first protrusion-forming layer 3a to the third protrusion-forming layer 3c in which the one protrusion-forming layer 3a, the second protrusion-forming layer 3b, and the third protrusion-forming layer 3c are sequentially stacked. Laminated columnar spacers 3B are provided. A counter electrode and an alignment film (not shown) are formed so as to cover the substrate.

  Here, each manufacturing process of the color filter substrate 20B of the first embodiment will be sequentially described with reference to FIGS. 2A (a) to 2A (c) and FIGS. 2B (d) to 2B (f).

  First, as shown in FIG. 2A (a), a negative acrylic photosensitive resin liquid in which carbon fine particles are dispersed is applied onto the transparent substrate 1 by spin coating, and then dried to obtain a black photosensitive resin layer. 2p is formed.

  Following this, the black photosensitive resin layer 2p is exposed through the photomask 31, and then developed to form a black matrix layer 2d as shown in FIG. 2A (b). At this time, the black matrix layer 2d has an opening for the first colored layer and an opening for the second colored layer in regions where the first colored layer 2a, the second colored layer 2b, and the third colored layer 2c are formed, respectively. And an opening for the third colored layer are formed at a predetermined interval on the substrate.

  Next, as shown in FIG. 2A (c), a negative acrylic type in which the pigment for the first colored layer is dispersed by spin coating on the transparent substrate 1 on which the black matrix layer 2d and the black layer 3d are formed. After applying the photosensitive resin liquid, it is dried, and exposed and developed using the photomask 32, leaving the opening for the first colored layer 2a and the formation portion of the first protrusion constituting layer 3a. Then, the photosensitive resin film for the first colored layer formed in the other region is removed, and the first colored layer 2a and the first protrusion constituting layer 3a are formed as shown in FIG. 2B (d).

  A negative type in which a pigment for the second colored layer is dispersed by a spin coating method on the transparent substrate 1 on which the black matrix layer 2d, the black layer 3d, the first colored layer 2a, and the first protrusion constituting layer 3a are formed. After applying the acrylic photosensitive resin liquid, it is dried and exposed and developed using a photomask to leave the opening for the second colored layer 2b and the formation part of the second protrusion constituting layer 3b. Then, the second colored layer photosensitive resin film formed in the other region is removed, and as shown in FIG. 2B (e), the second colored layer 2b and the second protrusion constituting layer 3b are formed.

  Furthermore, including, for example, Patent Document 3 and Patent Document 4, before the formation of the third protrusion constituting layer 3c that is the final stacked film of the stacked columnar spacer 3 that is the protruded structure by a known measurement technique (measurement apparatus). The protrusion height t is measured. A specific measurement flow at this time will be described with reference to FIG.

  As shown in FIG. 3, first, in step S11, a laminated film (black layer 3d, first protrusion structure) lower than the final laminated film (third protrusion constituting layer 3c) of the laminated columnar spacer 3 (projecting structure). When the layer 3a and the second protrusion constituting layer 3b) are formed, in step S12, the protrusion height t of the first protrusion constituting layer 3a and the second protrusion constituting layer 3b is measured in a state before the final laminated film is formed. The

  In step 3, in order to obtain the desired spacer height T from the previously obtained photosensitive resin liquid coating film thickness condition of the final laminated film, the lamination condition of the final laminated film is selected to adjust the film thickness. Is done.

  Table 1 and FIG. 4 below show the final results when the set value of the projection height T of the laminated columnar spacer 3B (projection structure) is 2.8 μm in the manufacture of the color filter substrate 20B of the first embodiment. Projection height t before formation of the laminated film (third projection constituent layer 3c), photosensitive resin liquid coating thickness of the final laminated film (third projection constituent layer 3c), final laminated film (third projection constituent layer 3c) 6 is a table and a graph showing the relationship between the film thickness t ′ and the protrusion height T of the laminated columnar spacer 3B. In FIG. 3, the horizontal axis is the projection height t before the final laminated film is formed, the vertical axis is the square of the photosensitive resin liquid coating film thickness of the final laminated film, the rhombus is the film thickness t ′ of the final laminated film, and the triangular is the laminated column The protrusion height T of the spacer 3B is shown.

ここで、感光性樹脂液塗布膜厚とは、平坦な基板上（例えばガラス基板上）に感光性樹脂液が塗布されたときの膜厚であり、本実施形態１のように、ドットパターン上に樹脂からなる積層膜を形成する場合、膜厚が薄くなるため、最終積層膜の感光性樹脂液塗布膜厚と、最終積層膜の膜厚ｔ’および積層柱状スペーサ３の突起高さＴとの関係は、図４および上記表１に示すようなものとなる。例えば最終積層膜（第３突起構成層３ｃ）の形成前の突起高さｔが１．７０μｍの場合、最終積層膜の感光性樹脂液塗布膜厚を２．０３７μｍとすると、最終積層膜の膜厚ｔ’は１．１００μｍとなり、積層柱状スペーサ３Ｂ（突起状積層構造物）の突起高さＴを２．８μｍとすることができる。

Here, the photosensitive resin liquid application film thickness is a film thickness when the photosensitive resin liquid is applied on a flat substrate (for example, on a glass substrate), and on the dot pattern as in the first embodiment. When the laminated film made of resin is formed, the film thickness becomes thin. Therefore, the photosensitive resin liquid coating film thickness of the final laminated film, the film thickness t ′ of the final laminated film, and the projection height T of the laminated columnar spacer 3 The relationship is as shown in FIG. 4 and Table 1 above. For example, when the projection height t before formation of the final multilayer film (third projection constituent layer 3c) is 1.70 μm, the film thickness of the final multilayer film is set to 2.037 μm when the photosensitive resin liquid coating thickness of the final multilayer film is 2.037 μm. The thickness t ′ is 1.100 μm, and the protrusion height T of the stacked columnar spacer 3B (protruded stacked structure) can be 2.8 μm.

  Further, when the projection height t before formation of the final multilayer film (third projection constituent layer 3c) is 1.80 μm, if the photosensitive resin liquid coating film thickness of the final multilayer film is 1.852 μm, the final multilayer film The film thickness t ′ is 1.000 μm, and the protrusion height T of the stacked columnar spacer 3B (protruded stacked structure) can be 2.8 μm.

  Further, when the projection height t before the formation of the final laminated film 3c is 1.90 μm, when the photosensitive resin liquid coating film thickness of the final laminated film is 1.667 μm, the film thickness t ′ of the final laminated film is 0.8. Thus, the protrusion height T of the stacked columnar spacer 3 (protruded stacked structure) can be set to 2.8 μm. The photosensitive resin liquid coating film thickness of the final laminated film can be set by adjusting the spin coat rotational speed. For example, when the spin coat rotational speed is 800 rpm, the photosensitive resin liquid coating thickness of the final laminated film is 1.8 μm, and the final laminated film thickness t ′ is 0.98 μm (the final coating thickness is 1.806 μm). (Laminated film thickness 0.975 μm).

  Next, on the transparent substrate portion on which the black matrix layer 2d, the black layer 3d, the first colored layer 2a, the second colored layer 2b, the first protrusion constituting layer 3a and the second protrusion constituting layer 3b are formed, as described above. After applying the negative acrylic photosensitive resin liquid in which the pigment for the third colored layer is dispersed by the spin coat method under the coating film thickness condition set to ## EQU2 ## By performing the development, the third colored layer photosensitive resin film formed in the other region is removed, leaving the third colored layer 2c opening and the third protrusion constituting layer 3c forming part. As shown in 2B (f), a third colored layer 2c and a third protrusion constituting layer 3c having a film thickness t ′ are formed. Thus, the columnar laminated spacer 3B (projection structure) having the desired projection height T is formed.

  In the first embodiment, the film thickness setting value of the black matrix layer 2d is 1.4 μm, the film thickness setting values of the first colored layer 2a to the third colored layer 2c are 1.6 μm, and the stacked columnar spacer 3B (protruding structure) The set value of the projection height T of the object) is set to 2.8 μm.

  Thus, the color filter substrate of the first embodiment is formed by forming the counter electrode and the alignment film (not shown) so that the color filter layer 2B and the protruding structure 3B cover the substrate portion formed as the laminated columnar spacer. 20B is completed.

  A TFT circuit layer including wiring and TFT elements is provided on the color filter substrate 20B and a transparent substrate, and pixel electrodes are provided in a matrix form via an insulating layer thereon, and TFT elements provided in the vicinity thereof The TFT substrate is connected to the wiring through the substrate and has an alignment film formed so as to cover the substrate portion (the configuration is the same as that of the TFT substrate 30 in FIG. 8, but in this case, no black matrix is provided) Are arranged so as to face each other so that the alignment films face each other, and are bonded together by a sealing material. At this time, a constant substrate interval (cell gap) is maintained by the protruding structures 3B (laminated columnar spacers) formed on the color filter substrate 20B. The liquid crystal layer is filled in the gap between the two substrates, and the liquid crystal inlet is sealed with a sealing material, whereby the color liquid crystal display device of the first embodiment is manufactured.

  As described above, according to the first embodiment, the projection height t is measured in advance before the final stacked film is formed, and the stacking condition of the final stacked film is set according to the measurement result, thereby obtaining the desired height. The protrusion-like structure 3B (laminated columnar spacer) can be reliably produced, and the occurrence of defective products can be greatly suppressed. In addition, by manufacturing a liquid crystal display device using the color filter substrate 20B of the first embodiment, a color liquid crystal display device having a desired cell thickness (cell gap) can be repeatedly manufactured with high accuracy. Can be improved.

  In the first embodiment, the negative photosensitive resin liquid is used to form the color filter layer 2B and the protruding structure 3B. However, the negative photosensitive resin liquid is not limited to the negative type. good. In addition, the photosensitive resin liquid is not limited to acrylic, and a known material such as polyimide, epoxy, phenol novolac, or polyester can be used as appropriate. Further, although the photosensitive resin is used in the first embodiment, it is possible to process the resin into a desired shape by using a photo-sensitive resin and a photolithographic process using a photoresist and an etching process.

Furthermore, in the first embodiment, the protruding structure 3B is formed as a stacked columnar spacer by stacking four layers of the black matrix layer 2d and the first colored layer 2a to the third colored layer 2c. If the thickness T is obtained, the number of stacked layers is not limited to this, and may be, for example, two or more. In the first embodiment, the color filter layer 2B is composed of the first colored layer 1a to the third colored layer 2c (for example, red, blue, and green). However, for example, four or more colors such as red, blue, green, and white are used. It may be a color filter layer composed of a colored layer.
(Embodiment 2)
In the second embodiment, in order to control the alignment state of the liquid crystal in the pixel and to adjust the cell gap, a color filter substrate in which an insulating resin layer is provided between the counter electrode and the pixel electrode is manufactured. An example to which the present invention is applied will be described. In the present embodiment, a case where a black matrix is provided on the color filter substrate will be described. However, the present invention can be applied to a configuration in which a black matrix is not provided as shown in FIG.

  FIG. 5 is a cross-sectional view showing the main configuration of the color filter substrate according to the second embodiment.

  As shown in FIG. 5, the color filter substrate 20D includes a first colored layer 2a such as RGB (red / green / blue), a second colored layer 2b and a third colored layer 2c on the transparent substrate 1, and each colored layer. A color filter layer 2D having a black layer 3d (light-shielding portion: black matrix layer 2d) disposed between the two is provided. A counter electrode 4 is provided so as to cover it, and an insulating resin layer (alignment control structure) for dividing and controlling the alignment state of the liquid crystal in the pixel portion is provided on the center of each of the colored layers 2a, 2b and 2c. Thing) 11 is provided. Between the first colored layer 2a and the second colored layer 2c, the same black layer 3d as the black matrix layer 2d and the same colored layer as the first colored layer 2a, the second colored layer 2b and the third colored layer 2c are formed. The first protrusion constituting layer 3a, the second protrusion constituting layer 3b, and the third protrusion constituting layer 3c are sequentially stacked, and the liquid crystal alignment state is divided and controlled in the pixel portion via the counter electrode 4 thereon, and An insulating resin layer 5 is further provided for adjusting the cell gap, and a protruding structure 3D having a protruding height T is configured as a stacked columnar spacer.

  Here, the manufacturing process of the color filter substrate 20D of Embodiment 2 will be described with reference to FIGS. 6A (a) to 6A (e) and FIGS. 6B (f) to 6B (i).

  First, as shown in FIG. 6A (a), a negative acrylic photosensitive resin liquid in which carbon fine particles are dispersed is applied onto the transparent substrate 1 by spin coating, and then dried to obtain a black photosensitive resin layer. 2p is formed.

  Subsequently, the black photosensitive resin layer 2p is exposed through the photomask 31, and then developed, thereby forming a black matrix layer 2d as shown in FIG. 6A (b). At this time, the black matrix layer 2d has an opening for the first colored layer and an opening for the second colored layer in regions where the first colored layer 2a, the second colored layer 2b, and the third colored layer 2c are formed, respectively. And an opening for the third colored layer are formed on the substrate 1 at a predetermined interval.

  Next, as shown in FIG. 6A (c), a negative acrylic resin in which the pigment for the first colored layer is dispersed by spin coating on the transparent substrate portion on which the black matrix layer 2d and the black layer 3d are formed. After applying the photosensitive resin liquid, it is dried, and exposed and developed using the photomask 32, leaving the opening for the first colored layer 2a and the first protrusion constituting layer 3a forming part, The photosensitive resin film for 1st colored layers formed in the area | region other than that is removed, and as shown to FIG. 6A (d), the 1st colored layer 2a and the 1st protrusion structure layer 3a are formed.

  Further, a negative type in which a pigment for the second colored layer is dispersed by a spin coating method on the transparent substrate portion on which the black matrix layer 2d, the black layer 3d, the first colored layer 2a, and the first protrusion constituting layer 3a are formed. After applying the acrylic photosensitive resin liquid, it is dried, and exposed and developed using a photomask, leaving the second colored layer 2b opening and the second protrusion constituting layer 3b forming part, The photosensitive resin film for 2nd colored layers formed in the area | region other than that is removed, and as shown to FIG. 6A (e), the 2nd colored layer 2b and the 2nd protrusion structure layer 3b are formed.

  Further, on the transparent substrate portion on which the black matrix layer 2d, the black layer 3d, the first colored layer 2a, the first protrusion constituting layer 3a, the second colored layer 2b, and the second protrusion constituting layer 3b are formed, by spin coating. After applying the negative acrylic photosensitive resin liquid in which the pigment for the third colored layer is dispersed, it is dried and exposed and developed using a photomask, thereby opening the third colored layer 2c. The third colored layer 2c and the third colored layer 2c are removed by removing the photosensitive resin film for the third colored layer formed in the other region, leaving the third protrusion constituting layer 3c forming part, as shown in FIG. A third protrusion constituting layer 3c is formed.

  Further, as shown in FIG. 6B (g), the black matrix layer 2d, the black layer 3d, the first colored layer 2a, the first projection constituting layer 3a, the second colored layer 2b, the second projection constituting layer 3b, and the third colored layer. A transparent conductive film made of ITO (indium tin oxide) is deposited as a counter electrode 4 on the transparent substrate portion on which the layer 2c and the third protrusion constituting layer 3c are formed by a sputtering method. The transparent conductive film is not limited to ITO, and any other material that can obtain a desired resistance and transmittance, such as IZO, zinc oxide, or tin oxide, can be used.

  Further, for example, including Patent Document 3 and Patent Document 4, the projection height t before the formation of the insulating resin layer 5 which is the final laminated film of the projecting structure 3D is measured by a known measurement technique (measurement apparatus). To do. A specific measurement flowchart at this time will be described with reference to FIG.

  In step S11, a laminated film (black layer 3d, first protrusion constituting layer 3a, second protrusion constituting layer 3b) lower than the final laminated film (insulating resin layer 5) of the laminated columnar spacer (projecting structure 3D), When the third protrusion constituting layer 3c and the counter electrode 4) are formed, in step 2, the protrusion height t is measured in a state before the final laminated film is formed. In step 3, the lamination condition of the final laminated film (insulating resin layer 5) is selected in order to obtain a desired spacer height T from the previously obtained photosensitive resin liquid coating film thickness condition of the final laminated film. Is done.

  Table 2 and FIG. 7 show the final lamination in the case of setting the projection height T of the projection structure 3D (lamination columnar spacer) to 3.2 μm in the manufacture of the color filter substrate 20D of the second embodiment. Projection height t before formation of the film (insulating resin layer 5), photosensitive resin liquid coating thickness of the final laminated film (insulating resin layer 5), film thickness t of the final laminated film (insulating resin layer 5) It is a table | surface and a graph which show the relationship between 'and the protrusion height T of a lamination | stacking columnar spacer (projection-like structure 3D). In FIG. 7, the horizontal axis represents the protrusion height t before formation of the final laminated film (insulating resin layer 5), the vertical axis represents the photosensitive resin liquid coating film thickness of the final laminated film (insulating resin layer 5), The rhombus indicates the film thickness t ′ of the final laminated film (insulating resin layer 5), and the triangle indicates the protrusion height T of the laminated columnar spacer (protruding structure 3D).

ここで、感光性樹脂液塗布膜厚とは、平坦な基板上（例えばガラス基板上）に感光性樹脂液が塗布されたときの膜厚であり、本実施形態２のように、ドットパターン上に樹脂からなる積層膜を形成する場合、膜厚が薄くなるため、最終積層膜の感光性樹脂液塗布膜厚と、最終積層膜の膜厚ｔ’および積層柱状スペーサの突起高さＴとの関係は、図７および上記表２に示すようなものとなる。例えば最終積層膜（絶縁性樹脂層５）の形成前の突起高さｔが２．４０μｍの場合、最終積層膜（絶縁性樹脂層５）の感光性樹脂液塗布膜厚を２．０３０μｍとすると、最終積層膜（絶縁性樹脂層５）の膜厚ｔ’は０．８００μｍとなり、積層柱状スペーサ（突起状積層構造物３Ｄ）の突起高さＴを３．２μｍとすることができる。

Here, the photosensitive resin liquid application film thickness is a film thickness when the photosensitive resin liquid is applied on a flat substrate (for example, on a glass substrate), and is on the dot pattern as in the second embodiment. When the laminated film made of resin is formed, the film thickness becomes thin. Therefore, the photosensitive resin liquid coating film thickness of the final laminated film, the film thickness t ′ of the final laminated film, and the projection height T of the laminated columnar spacer The relationship is as shown in FIG. 7 and Table 2 above. For example, when the projection height t before formation of the final laminated film (insulating resin layer 5) is 2.40 μm, the photosensitive resin liquid coating film thickness of the final laminated film (insulating resin layer 5) is 2.030 μm. The film thickness t ′ of the final laminated film (insulating resin layer 5) is 0.800 μm, and the protrusion height T of the laminated columnar spacer (protruded laminated structure 3D) can be 3.2 μm.

  Further, when the projection height t before the formation of the final laminated film 3c is 2.70 μm, when the photosensitive resin liquid coating film thickness of the final laminated film is 1.787 μm, the film thickness t ′ of the final laminated film is 0.500 μm. Thus, the protrusion height T of the stacked columnar spacer (protruded stacked structure) can be set to 3.2 μm. Further, when the protrusion height t before formation of the final laminated film (insulating resin layer 5) is 3.00 μm, if the photosensitive resin liquid coating film thickness of the final laminated film is 1.500 μm, the film of the final laminated film The thickness t ′ is 0.200 μm, and the protrusion height T of the stacked columnar spacer (protruded stacked structure 3D) can be 3.2 μm. The film thickness of the photosensitive resin liquid applied to the final laminated film (insulating resin layer 5) can be set by adjusting the spin coat rotational speed. For example, when the spin coat rotational speed is 700 rpm, the photosensitive resin liquid coating film thickness of the final laminated film can be 2.0 μm, and the film thickness t ′ of the final laminated film can be 0.8 μm.

  Next, the black matrix layer 2d, the black layer 3d, the first colored layer 2a, the second colored layer 2b, the third colored layer 2c, the first protrusion constituting layer 3a, the second protrusion constituting layer 3b, and the third protrusion constituting layer 3c. Then, a phenol novolac-based positive photosensitive insulating resin liquid is applied as an alignment control material by spin coating on the transparent substrate portion on which the counter electrode 4 is formed under the coating film thickness conditions set as described above. Then, this is dried to form the photosensitive insulating resin layer 5p.

  Subsequently, after exposing the photosensitive insulating resin layer 5p through the photomask 33, the photosensitive insulating resin layer 5p is developed to develop the insulating resin layer 5 and the insulating resin layer 11 (see FIG. 6B (i)). An alignment regulating structure). As described above, the protruding structure 3D having the desired protruding height T is formed as the columnar laminated spacer.

  In the second embodiment, the film thickness setting value of the black matrix layer 2d is 1.4 μm, the film thickness setting values of the first colored layer 2a to the third colored layer 2c are 1.6 μm, and the film thickness of the insulating resin layer 11 is set. The set value was set to 0.5 μm, and the set value of the protrusion height T of the protruding structure 3D (laminated columnar spacer) was set to 3.2 μm.

  In this way, the color filter substrate 20D on which the color filter layer 2D and the protruding structure 3D are formed, and the TFT circuit layer including the wiring and the TFT element are provided on the transparent substrate, and the insulating layer is provided on the TFT circuit layer. A plurality of pixel electrodes are provided in a matrix in a dimensional shape, connected to a wiring through TFT elements provided in the vicinity thereof, and a TFT substrate on which an alignment film is formed so as to cover the substrate (see FIG. 9) The structure is the same as that of the TFT substrate 30A, but in this case, a black matrix is not provided), and is arranged so as to face each other so that the alignment films face each other, and are bonded together with a sealant. At this time, a constant substrate interval (cell gap) is maintained by the protruding structure 3D (laminated columnar spacer) formed on the color filter substrate 20D. The liquid crystal is filled in the gap between the two substrates, and the liquid crystal injection port is sealed with a sealing material, whereby the color liquid crystal display device of Embodiment 2 is manufactured.

  As described above, according to the first and second embodiments, the projection height t is measured before the final laminated film is formed, and the lamination condition of the final laminated film is set according to the measurement result. Protruding structures (stacked columnar spacers) having a height can be reliably produced, and the occurrence of defective products can be greatly suppressed. In addition, by manufacturing a color liquid crystal display device using the color filter substrate of Embodiments 1 and 2 above, a color liquid crystal display device having a desired cell thickness (cell gap) can be repeatedly and accurately manufactured. The display quality can be improved.

  In the first and second embodiments, the negative photosensitive resin liquid is used to form the color filter layer and the protruding structure. However, the negative photosensitive resin liquid is not limited to the negative type. good. In addition, the photosensitive resin liquid is not limited to acrylic, and a known material such as polyimide, epoxy, phenol novolac, or polyester can be used as appropriate. Furthermore, although the photosensitive resin is used in the first and second embodiments, it can be processed into a desired shape by a photolithography process using a photoresist and an etching process using a resin having no photosensitivity. It is.

  In the second embodiment, the phenol novolac-based positive photosensitive resin liquid is used to form the insulating resin layer. However, the present invention is not limited to this as long as the liquid crystal material can be regulated in alignment. For example, it may be a polyimide type or a positive photosensitive resin liquid.

  Furthermore, in Embodiment 2 above, a protruding structure (laminated columnar spacer) is formed by laminating a black matrix layer, four layers of the first colored layer to the third colored layer, a counter electrode, and an insulating resin layer. However, the number of stacked layers is not limited to this as long as a desired spacer height can be obtained. In the first and second embodiments, the color filter layer is composed of the first colored layer to the third colored layer (for example, red, blue, green). For example, the color filter layer has four or more colors such as red, blue, green, and white. It may be a color filter layer made of a colored layer.

  In the first and second embodiments, the thickness of the laminated columnar spacer (projection-like structure) as a final laminated film is appropriately controlled to accurately produce the laminated columnar spacer having a desired height. Measuring the film thickness of each laminated film constituting the structure, or measuring the film thickness of at least one laminated film constituting the protruding structure, and feeding back the measurement result Thus, the accuracy of the spacer height may be improved. However, from the viewpoint of producing a laminated columnar spacer having a desired height with the highest accuracy while avoiding complication of the process, as in the first and second embodiments, the final lamination of the laminated columnar spacers (protruding structures) is performed. It is preferable to measure the height of the protrusion before film formation to control the film thickness of the final laminated film. In addition, it is most preferable to apply the present invention to all color filter substrates manufactured on a production line, but the present invention is applied once every time several substrates are manufactured (for example, implementation). Needless to say, a certain degree of effect can also be obtained by changing the type of the product flowing in the production line, such as the color filter substrate of Embodiment 1 and the color filter substrate of Embodiment 2.

  In addition, the color filter substrate 20B or 20D and the TFT substrate (element-side substrate) of the first and second embodiments are disposed to face each other with a predetermined interval with the protruding structure 3B or 3D as a spacer, and a gap between the two substrates. A display device such as a color liquid crystal display device in which a display medium (liquid crystal layer 6) is sandwiched is widely used for an OA device such as a personal computer, an AV device such as a television device, and a display unit such as a mobile phone. Thus, it is possible to accurately form a laminated columnar spacer (projecting structure 3B or 3D) having a desired height and to produce a display device having a good display quality with a high yield.

  In the first and second embodiments, the protrusions are formed on a predetermined layer of a color filter layer that is provided on the transparent substrate 1 and has a plurality of colored layers arranged two-dimensionally. In the manufacturing method of the color filter substrate 20B or 20D for manufacturing the color filter substrate 2B or 2D having the structure 3B or 3D, the structure of the structure at that time is formed before the final stacked film of the protruding structure 3B or 3D is formed. The projection height is measured, and based on the measurement result, the lamination condition of the final laminated film is set so that the projection height of the projecting structure becomes a desired projection height, and the set lamination condition is set. Based on this, the projecting structure 3B or 3D is produced by forming the final laminated film. However, the present invention is not limited to this. For example, the final two-layer lamination conditions are set, and based on the set lamination conditions, for example. And last 2 The may be by forming to produce a protrusion-like structures 3B or 3D. Further, as another method for manufacturing the color filter substrate, the height of the protrusion of the structure at that time before the formation of at least one final layer of the stacked films lower than the final stacked film of the protruding structures 3B or 3D Based on the measurement result, the stacking conditions of at least one final layer of this lower layer are set so that the protrusion height of the protrusion-like structure 3B or 3D becomes a desired protrusion height. Forming at least one final layer on the basis of the laminated conditions, and measuring the protrusion height of the structure at that time before forming the final laminated film of the protruding structures 3B or 3D Then, based on the measurement result, the lamination condition of the final laminated film is set so that the projection height of the projecting structure 3B or 3D becomes a desired projection height, and based on the set lamination condition Deposit final laminated film It may be prepared protruding structure 3B or 3D Te.

  As mentioned above, although this invention was illustrated using preferable Embodiment 1, 2 of this invention, this invention should not be limited and limited to this Embodiment 1,2. It is understood that the scope of the present invention should be construed only by the claims. It is understood that those skilled in the art can implement an equivalent range based on the description of the present invention and the common general technical knowledge from the description of the specific preferred embodiments 1 and 2 of the present invention. Patents, patent applications, and documents cited herein should be incorporated by reference in their entirety, as if the contents themselves were specifically described herein. Understood.

  In the field of a color filter substrate and a manufacturing method thereof, and a display device such as a color liquid crystal display device using the same, the present invention suppresses a defect of the color filter substrate, reduces the manufacturing cost, and reduces the desired cell thickness. It is possible to improve the display quality by repeatedly producing a display device having high accuracy. The present invention can be widely used for OA equipment such as a personal computer, AV equipment such as a television device, and a display unit such as a mobile phone.

FIG. 3 is a cross-sectional view of a main part illustrating a configuration example of a color filter substrate according to the first embodiment. (A)-(c) is principal part sectional drawing of each process for demonstrating the manufacturing process (the 1) of the color filter substrate of FIG. (E)-(f) is principal part sectional drawing of each process for demonstrating the manufacturing process (the 2) of the color filter substrate of FIG. 2 is a flowchart for explaining a method of manufacturing the color filter substrate of FIG. 1. It is a graph which shows the lamination conditions of the spacer last laminated film in the manufacturing method of the color filter substrate of FIG. It is principal part sectional drawing which shows the structural example of the color filter board | substrate of this Embodiment 2. FIG. (A)-(e) is principal part sectional drawing of each process for demonstrating the manufacturing process (the 1) of the color filter substrate of FIG. (F)-(i) is principal part sectional drawing of each process for demonstrating the manufacturing process (the 2) of the color filter substrate of FIG. It is a graph which shows the lamination conditions of the spacer last laminated film in the manufacturing method of the color filter substrate of FIG. It is principal part sectional drawing which shows the structural example of the conventional color liquid crystal display device currently disclosed by patent document 1. FIG. It is principal part sectional drawing which shows the other structural example of the conventional color liquid crystal display device currently disclosed by patent document 2. FIG. 10 is a flowchart for explaining a conventional method of manufacturing a color filter substrate disclosed in Patent Document 3 and Patent Document 4.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Transparent substrate 2B, 2D Color filter layer 2a 1st colored layer 2b 2nd colored layer 2c 3rd colored layer 2d Black matrix layer 3B, 3D Projection-like structure (laminated columnar spacer)
3a First protrusion constituent layer 3b Second protrusion constituent layer 3c Third protrusion constituent layer 3d Black layer 4 Counter electrode 5 Insulating resin layer 11 Insulating resin layer (alignment control structure)

Claims (9)

A color for producing a color filter substrate having a protruding structure in which two or more layers are laminated on a predetermined layer of a color filter layer provided on a transparent substrate and in which a plurality of colored layers are arranged two-dimensionally In the manufacturing method of the filter substrate,
Measuring the protrusion height of the structure at that time before forming the laminated film immediately before the final laminated film and before forming the final laminated film of the protruding structure;
A step of setting the lamination conditions of the at least the final laminated film so that the projection height of the projecting structure is a desired projection height based on the measured measurement results;
And a step of producing the protruding structure by forming the at least final laminated film based on the set lamination conditions. A color for producing a color filter substrate having a protruding structure in which three or more layers are laminated on a predetermined layer of a color filter layer provided on a transparent substrate and having a plurality of colored layers arranged two-dimensionally In the manufacturing method of the filter substrate,
The height of the protrusion of the structure at that point in time before the formation of at least one final layer of the stacked films lower than the final stacked film of the protruding structure and after the formation of the stacked film immediately before the final one layer Measuring the
A step of setting a lamination condition of at least one final layer of the lower layer based on the measured result of measurement, so that the protrusion height of the protrusion-like structure becomes a desired protrusion height;
Forming and forming the at least one final layer based on the set lamination conditions;
Measuring the protrusion height of the structure at that time before the formation of the final laminated film of the protrusion structure and after the formation of the final layer ;
A step of setting the lamination conditions of the final laminated film so that the projection height of the projecting structure is a desired projection height based on the measured measurement results;
Forming the final laminated film based on the set lamination conditions to produce the protruding structure.   The method for manufacturing a color filter substrate according to claim 1, wherein the protruding structure includes a colored layer constituting the color filter layer. The color filter layer includes a black layer,
The method for producing a color filter substrate according to claim 1, wherein the protruding structure is formed on the black layer. A conductive layer is provided on the color filter layer,
The method for producing a color filter substrate according to claim 1, wherein the final laminated film of the protruding structure is formed on the conductive layer.   6. The method of manufacturing a color filter substrate according to claim 5, wherein the final laminated film of the protruding structure is an orientation control material film.   The method for manufacturing a color filter substrate according to claim 5, wherein the protruding structure includes a photosensitive resin film.   A color filter substrate produced by the method for producing a color filter substrate according to claim 1. 9. A display device, wherein the color filter substrate according to claim 8 and another substrate are disposed to face each other with a predetermined interval with the protruding structure as a spacer, and a display medium is sandwiched between the substrates.

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