CN107429993B - 用于产生图案化照明的装置 - Google Patents

用于产生图案化照明的装置 Download PDF

Info

Publication number
CN107429993B
CN107429993B CN201680018810.7A CN201680018810A CN107429993B CN 107429993 B CN107429993 B CN 107429993B CN 201680018810 A CN201680018810 A CN 201680018810A CN 107429993 B CN107429993 B CN 107429993B
Authority
CN
China
Prior art keywords
array
microlens array
light
light sources
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201680018810.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN107429993A (zh
Inventor
M·罗西
H·P·赫齐希
P·米勒
A·纳奎维
D·因方特戈麦斯
M·多尔恩
M·格洛尔
A·亚桑
H·拉德曼
M·L·巴里曼
M-L·E·布瓦塔尔
B·哈雷拉
D·P·卡雷罗
J·布卡特
H·维克瑞克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ames Osram Asia Pacific Pte Ltd
Sensors Singapore Private Ltd
Original Assignee
Heptagon Micro Optics Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/608,408 external-priority patent/US9273846B1/en
Application filed by Heptagon Micro Optics Pte Ltd filed Critical Heptagon Micro Optics Pte Ltd
Publication of CN107429993A publication Critical patent/CN107429993A/zh
Application granted granted Critical
Publication of CN107429993B publication Critical patent/CN107429993B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • F21V5/002—Refractors for light sources using microoptical elements for redirecting or diffusing light
    • F21V5/004—Refractors for light sources using microoptical elements for redirecting or diffusing light using microlenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Projection Apparatus (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CN201680018810.7A 2015-01-29 2016-01-26 用于产生图案化照明的装置 Active CN107429993B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US14/608408 2015-01-29
US14/608,408 US9273846B1 (en) 2015-01-29 2015-01-29 Apparatus for producing patterned illumination including at least one array of light sources and at least one array of microlenses
US201562147299P 2015-04-14 2015-04-14
US62/147299 2015-04-14
PCT/SG2016/050033 WO2016122404A1 (en) 2015-01-29 2016-01-26 Apparatus for producing patterned illumination

Publications (2)

Publication Number Publication Date
CN107429993A CN107429993A (zh) 2017-12-01
CN107429993B true CN107429993B (zh) 2021-06-15

Family

ID=56543858

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680018810.7A Active CN107429993B (zh) 2015-01-29 2016-01-26 用于产生图案化照明的装置

Country Status (7)

Country Link
EP (1) EP3250882B1 (https=)
JP (1) JP6563022B2 (https=)
KR (1) KR102544297B1 (https=)
CN (1) CN107429993B (https=)
SG (1) SG11201705805PA (https=)
TW (1) TWI699512B (https=)
WO (1) WO2016122404A1 (https=)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102597579B1 (ko) * 2015-10-21 2023-11-01 프린스톤 옵트로닉스, 인크. 코딩된 패턴 투영기
WO2017131585A1 (en) * 2016-01-26 2017-08-03 Heptagon Micro Optics Pte. Ltd. Multi-mode illumination module and related method
KR102051352B1 (ko) * 2017-02-06 2019-12-04 주식회사 제이티에스인더스트리 공진기 내부에 사용되는 리어 패턴 미러 제조 방법 및 이에 의해 제조된 리어 패턴 미러
CN106990548A (zh) * 2017-05-09 2017-07-28 深圳奥比中光科技有限公司 阵列激光投影装置及深度相机
CN107026392B (zh) * 2017-05-15 2022-12-09 奥比中光科技集团股份有限公司 Vcsel阵列光源
CN106997603B (zh) * 2017-05-19 2020-04-17 深圳奥比中光科技有限公司 基于vcsel阵列光源的深度相机
CN107424188B (zh) 2017-05-19 2020-06-30 深圳奥比中光科技有限公司 基于vcsel阵列光源的结构光投影模组
CN109521578B (zh) * 2017-09-19 2021-02-26 奥比中光科技集团股份有限公司 深度相机
CN109521631B (zh) * 2017-09-19 2021-04-30 奥比中光科技集团股份有限公司 投射不相关图案的深度相机
CN114706150B (zh) * 2017-12-14 2024-06-11 唯亚威通讯技术有限公司 光学系统
US10042241B1 (en) 2018-01-18 2018-08-07 Himax Technologies Limited Projection method and associated optical system
CN110133853B (zh) * 2018-02-09 2021-09-21 舜宇光学（浙江）研究院有限公司 可调散斑图案的调节方法及其投射方法
CN110891471B (zh) * 2018-03-21 2022-11-18 卡普索影像公司 采用结构光提供生理特征尺寸测量的内窥镜
CN108594454B (zh) 2018-03-23 2019-12-13 深圳奥比中光科技有限公司 一种结构光投影模组和深度相机
TWI734928B (zh) * 2018-06-22 2021-08-01 旺矽科技股份有限公司 用於雷射晶片之發光分布檢測方法以及雷射晶片之發光強度的顯示方法
EP3598591A1 (en) * 2018-07-17 2020-01-22 Koninklijke Philips N.V. Laser arrangement with reduced building height
CN109254476B (zh) * 2018-09-08 2023-10-24 深圳阜时科技有限公司 一种光学投影方法、感测方法及物体三维信息应用方法
US10915003B2 (en) * 2018-09-27 2021-02-09 Himax Technologies Limited Projecting apparatus for 3D sensing system
WO2020085999A1 (en) 2018-10-22 2020-04-30 Ams Sensors Asia Pte. Ltd. Structured illumination devices
US11442282B2 (en) 2018-10-26 2022-09-13 Viavi Solutions Inc. Optical element including a plurality of regions
WO2020100890A1 (ja) 2018-11-13 2020-05-22 株式会社ダイセル 光学部材、該光学部材を含むレーザーモジュール及びレーザーデバイス
JP6966517B2 (ja) 2018-11-13 2021-11-17 株式会社ダイセル 光学部材、該光学部材を含むレーザーモジュール及びレーザーデバイス
WO2020103507A1 (zh) * 2018-11-20 2020-05-28 南昌欧菲生物识别技术有限公司 投射模组、成像装置及电子设备
US11137246B2 (en) * 2019-01-31 2021-10-05 Himax Technologies Limited Optical device
US11674665B2 (en) * 2019-02-08 2023-06-13 Signify Holding B.V. Lighting device
JP7251240B2 (ja) * 2019-03-20 2023-04-04 株式会社リコー 光学装置、検出装置及び電子機器
JP7472468B2 (ja) * 2019-03-20 2024-04-23 株式会社リコー 照明装置、投影装置、計測装置、ロボット、電子機器、移動体、および造形装置
CN113661358B (zh) * 2019-04-09 2024-06-21 昕诺飞控股有限公司 用于实现数字光束成形的具有小球体的微型led板
EP3961148A4 (en) * 2019-04-25 2022-09-21 Panasonic Intellectual Property Management Co., Ltd. SIZING DEVICE AND LOCKER FOR BAGGAGE SHIPPING
CN114051656B (zh) * 2019-06-20 2024-12-06 ams传感器亚洲私人有限公司 从具有机发光二极管显示屏幕的设备投射结构光图案
JP2022547389A (ja) * 2019-07-31 2022-11-14 オプシス テック リミテッド 高分解能ソリッドステートｌｉｄａｒ透過機
WO2021040250A1 (ko) 2019-08-28 2021-03-04 주식회사 에스오에스랩 빅셀 어레이 및 이를 이용한 라이다 장치
CN110707532A (zh) * 2019-10-26 2020-01-17 深圳市迈科光电有限公司 一种Vcsel芯片光点排布方法
KR20210059591A (ko) * 2019-11-13 2021-05-25 주식회사 에스오에스랩 옵틱 및 그 제작 방법
CN115516721A (zh) 2020-05-10 2022-12-23 苹果公司 折叠的光学共轭透镜
WO2021229848A1 (ja) * 2020-05-13 2021-11-18 Ｓｃｉｖａｘ株式会社 光学系装置および光学素子製造方法
US11656392B2 (en) * 2020-08-11 2023-05-23 Himax Technologies Limited Optical element and wafer level optical module
US11774060B2 (en) 2020-08-25 2023-10-03 Nil Technology Aps Structured and diffuse light generation
GB202019970D0 (en) * 2020-12-17 2021-02-03 Ams Sensors Asia Pte Ltd Structured light generation
US11994694B2 (en) * 2021-01-17 2024-05-28 Apple Inc. Microlens array with tailored sag profile
US11085609B1 (en) * 2021-02-08 2021-08-10 Himax Technologies Limited Illumination device
GB202107061D0 (en) * 2021-05-18 2021-06-30 Ams Sensors Singapore Pte Ltd Optical device and method of manufacture
US20220412729A1 (en) * 2021-06-25 2022-12-29 Himax Technologies Limited Dot pattern projector for use in three-dimensional distance measurement system
US20220413154A1 (en) * 2021-06-25 2022-12-29 Himax Technologies Limited Line pattern projector for use in three-dimensional distance measurement system
JP7418050B2 (ja) * 2021-08-25 2024-01-19 Ｓｃｉｖａｘ株式会社 光学系装置
GB202112351D0 (en) * 2021-08-30 2021-10-13 Ams Sensors Singapore Pte Ltd Illumination apparatus
GB202112352D0 (en) 2021-08-30 2021-10-13 Ams Sensors Singapore Pte Ltd Illumination apparatus
JP7692796B2 (ja) * 2021-10-29 2025-06-16 株式会社オーク製作所 照明光学系及びレーザ加工装置
US12320632B2 (en) * 2022-02-10 2025-06-03 Sarcos Corp. High resolution optical displacement measurement
US11979548B2 (en) 2022-04-08 2024-05-07 Himax Technologies Limited Structured light projector and three-dimensional image sensing apparatus
CN114509880B (zh) * 2022-04-20 2022-07-19 杭州灵西机器人智能科技有限公司 一种基于光源阵列的3d结构光的产生装置
GB202206055D0 (en) * 2022-04-26 2022-06-08 Ams Int Ag Illumination apparatus
JP2023173126A (ja) * 2022-05-25 2023-12-07 株式会社ダイセル マイクロレンズアレイ、拡散板及び照明装置
CN115224583B (zh) * 2022-06-21 2026-01-06 嘉兴驭光光电科技有限公司 基于微透镜阵列的激光投射模组
JP7752436B2 (ja) * 2022-08-05 2025-10-10 Ｓｃｉｖａｘ株式会社 光学素子、光学系装置および光学系装置の製造方法
WO2024143498A1 (ja) * 2022-12-27 2024-07-04 Ｓｃｉｖａｘ株式会社 光学系装置
KR20250072275A (ko) * 2023-11-16 2025-05-23 동우 화인켐 주식회사 2d 변환 렌즈 어레이 구조체 및 광 스캐닝 장치

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1614353A (zh) * 2003-11-07 2005-05-11 财团法人工业技术研究院 产生正弦光强度分布的结构光的系统
JP3963080B2 (ja) * 2001-04-13 2007-08-22 セイコーエプソン株式会社 電気光学装置の製造方法および電気光学装置
CN102147239A (zh) * 2011-01-11 2011-08-10 华中科技大学 一种无衍射栅型结构光条纹投影系统及其方法
CN102706290A (zh) * 2012-06-20 2012-10-03 北京航空航天大学 一种高速、高亮度变化范围结构光投射器
CN103115586A (zh) * 2013-02-05 2013-05-22 华南理工大学 一种基于激光干涉条纹的微三维传感装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2622185B2 (ja) * 1990-06-28 1997-06-18 シャープ株式会社 カラー液晶表示装置
JPH08304811A (ja) * 1995-05-02 1996-11-22 Ricoh Opt Ind Co Ltd 単板式液晶カラープロジェクタ−用の単板式液晶デバイスおよび単板式液晶デバイス用の対向基板
US5900981A (en) * 1997-04-15 1999-05-04 Scitex Corporation Ltd. Optical system for illuminating a spatial light modulator
JP3717654B2 (ja) * 1998-02-17 2005-11-16 株式会社リコー カラー画像表示装置
JP4006983B2 (ja) * 2000-11-22 2007-11-14 セイコーエプソン株式会社 電気光学装置および電子機器
JP4739411B2 (ja) * 2005-06-13 2011-08-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影システムおよび投影レンズ偏光センサ
JP4826152B2 (ja) * 2005-06-23 2011-11-30 株式会社ニコン 画像合成方法及び撮像装置
US7970177B2 (en) * 2006-03-23 2011-06-28 Tyzx, Inc. Enhancing stereo depth measurements with projected texture
EP2193657A2 (en) * 2007-09-25 2010-06-09 Explay Ltd. Micro-projector
US8314469B2 (en) * 2009-09-04 2012-11-20 United Microelectronics Corp. Image sensor structure with different pitches or shapes of microlenses
US8320621B2 (en) * 2009-12-21 2012-11-27 Microsoft Corporation Depth projector system with integrated VCSEL array
US9122097B2 (en) * 2010-04-27 2015-09-01 Sharp Kabushiki Kaisha Backlight system and LCD device using the same
EP2633277B1 (en) * 2010-10-27 2020-06-17 Cornell University Angle-sensitive pixel device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3963080B2 (ja) * 2001-04-13 2007-08-22 セイコーエプソン株式会社 電気光学装置の製造方法および電気光学装置
CN1614353A (zh) * 2003-11-07 2005-05-11 财团法人工业技术研究院 产生正弦光强度分布的结构光的系统
CN102147239A (zh) * 2011-01-11 2011-08-10 华中科技大学 一种无衍射栅型结构光条纹投影系统及其方法
CN102706290A (zh) * 2012-06-20 2012-10-03 北京航空航天大学 一种高速、高亮度变化范围结构光投射器
CN103115586A (zh) * 2013-02-05 2013-05-22 华南理工大学 一种基于激光干涉条纹的微三维传感装置

Also Published As

Publication number Publication date
TWI699512B (zh) 2020-07-21
EP3250882A4 (en) 2018-09-26
WO2016122404A9 (en) 2016-09-15
CN107429993A (zh) 2017-12-01
WO2016122404A1 (en) 2016-08-04
KR102544297B1 (ko) 2023-06-15
KR20170126872A (ko) 2017-11-20
EP3250882A1 (en) 2017-12-06
SG11201705805PA (en) 2017-08-30
JP6563022B2 (ja) 2019-08-21
EP3250882B1 (en) 2019-11-27
TW201638555A (zh) 2016-11-01
JP2018511034A (ja) 2018-04-19

Similar Documents

Publication Publication Date Title
CN107429993B (zh) 用于产生图案化照明的装置
US10509147B2 (en) Apparatus for producing patterned illumination using arrays of light sources and lenses
US9273846B1 (en) Apparatus for producing patterned illumination including at least one array of light sources and at least one array of microlenses
TWI716533B (zh) 多模式照明模組及相關方法
JP7835451B2 (ja) 単一要素ドットパターンプロジェクタ
CN104956179B (zh) 利用折射或反射光的结构化元件从光源阵列生成结构化光场的光学系统
JP7228572B2 (ja) 構造化光投射
US10609266B2 (en) Camera for wide field of view with an arbitrary aspect ratio
KR102755595B1 (ko) 광학 시스템
KR102673806B1 (ko) 3차원 거리 측정 시스템에서의 사용을 위한 선 패턴 프로젝터
JP7374165B2 (ja) 三次元距離測定システムで使用するドットパターンプロジェクタ
US12494621B2 (en) Vertical cavity surface emitting laser (VCSEL) based pattern projector
US20240422417A1 (en) Illumination device for illuminating a scene, camera system and method for illuminating a scene
JP2022074568A (ja) 拡散素子、投射装置、及び空間認識装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: Shinka ha

Patentee after: Ames Osram Asia Pacific Pte. Ltd.

Country or region after: Singapore

Address before: Shinka ha

Patentee before: Sensors Singapore Private Ltd.

Country or region before: Singapore

Address after: Shinka ha

Patentee after: Sensors Singapore Private Ltd.

Country or region after: Singapore

Address before: Singapore City

Patentee before: HEPTAGON MICRO OPTICS Pte. Ltd.

Country or region before: Singapore