CN107400888B - 一种不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法 - Google Patents
一种不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法 Download PDFInfo
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Abstract
本发明提供一种不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法。本发明采用勃姆石为前驱体,用浸渍提拉法和热处理先在不锈钢基底上制备多孔Al2O3涂层,再将所得基片浸泡于硅酸钠溶液中,采用浸渍提拉的方法负载Na2SiO3,取出干燥后高温烧结制备Na2SiO3/Al2O3复合涂层。本发明方法制备的涂层为致密的无孔结构,该复合涂层具有与基底结合牢固,化学性能稳定,涂层结构致密,耐高温氧化和抗海水腐蚀等特点。本发明的制备方法简单,成本低廉,能够有效解决不锈钢在高温氧化和海水腐蚀的问题。
Description
技术领域
本发明涉及一种在不锈钢上利用浸渍提拉的方法快速制备Na2SiO3/Al2O3复合涂层的方法,属于不锈钢耐高温氧化和抗海水腐蚀等领域。
背景技术
由于不锈钢具有相对成本低,易加工,良好的机械用途和抗腐蚀性,其在化学工程、生物医学、建筑领域和航空航天等领域有很重要的应用。不锈钢的耐腐蚀能力来自于其表面形成了一层柔软连续的Cr2O3膜,将不锈钢与外界腐蚀相隔开。虽然不锈钢的耐腐蚀能力通过表面Cr2O3膜有所提高,但当其暴露于高温环境和海水溶液中时,不锈钢仍然会受到腐蚀并造成其结构损坏从而造成巨大的经济损失。
Al2O3作为最有代表性的陶瓷涂层,是一种经济、耐热、化学耐用材料,在高温催化剂载体,金属纳米粒子基底,高温或海洋环境下不锈钢保护涂层等方面有非常广泛的应用。Al2O3涂层有很多种制备方法,溶胶凝胶法是其中最简单最经济的方法。由于Al2O3的气孔可以使氧气或水介质渗透,因此限制了Al2O3陶瓷涂层材料的应用。同单一相陶瓷材料相比,复合物涂层如:金属-陶瓷涂层、陶瓷-陶瓷涂层和玻璃-陶瓷涂层,有着更好的微观结构和机械性能,能起更好的保护作用。
硅酸类玻璃材料如硅酸铝,硅酸镁,硼硅酸等对不锈钢的抗腐蚀具有保护作用,硅酸钠水玻璃也用来保护锌,钛,铝合金等,但尚未有硅酸钠水玻璃作为不锈钢的保护层。
专利CN 105084762 A公开了一种用于不锈钢和耐热钢的高温抗热震和抗热腐蚀的涂层及其制备方法,在不锈钢和耐热钢基体表面烧制了一层微晶玻璃涂层。然而该方法需要的原料种类繁多,操作复杂,且微晶玻璃原料需要经过破碎、干燥、球磨等多种工序处理,费时耗力。
专利CN 101265372 A公开了一种不锈钢高温抗氧化涂料及其应用。利用无机矿粉、无机粘结剂、悬浮剂等多种物质,高温涂覆在不锈钢基体上再经高温热处理得到涂层。然而该方法不仅所需原料多,操作困难性大,还不能提升不锈钢的耐腐蚀能力。
发明内容
本发明的目的在于提供一种不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法。
本发明解决上述技术问题提供了一种不锈钢表面复合物涂层的制备方法。
本发明采用勃姆石为前驱体,用浸渍提拉和热处理等在不锈钢基底上制备 Al2O3涂层,再将所得基片浸泡于硅酸钠溶液浸渍提拉,干燥后,高温烧结,制得Na2SiO3/Al2O3复合涂层。
不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法具体制备方法步骤为:
步骤a)将不锈钢基底表面清洗;
步骤b)将勃姆石与去离子水按质量比以1:10混合,将不锈钢基底浸泡在勃姆石胶体中,以1cm/min~6cm/min的速度浸渍提拉,在60℃下干燥30min后以5℃/min在保护气氛下加热到550℃,保温2h后自然冷却,制得多孔γ-Al2O3涂层;
步骤c)将硅酸钠与去离子水按质量比以1:100~1:4混合,将步骤b)所得的不锈钢片浸入在此溶液中0.5h~2h,通过浸渍提拉法以1cm/min~6cm/min的速度提拉,在60℃下干燥30min后以5℃/min在保护气氛下加热到450~550℃,保温30min后自然冷却,制得Na2SiO3/Al2O3复合涂层。
优选的,步骤a)中将勃姆石与去离子水按质量比以1:10混合。
优选的,步骤a)中不锈钢基底为304,304L,316或316L的不锈钢。
优选的,步骤b)、步骤c)中采用的保护气体为氮气或者氩气。
本发明与现有技术相比,其显著优点是:(1)本发明为不锈钢表面的 Na2SiO3/Al2O3复合涂层制备方法简单,可重复性高,与基底材料结合能力强,化学性能稳定的优点。(2)采用本发明制备方法制备的不锈钢Na2SiO3/Al2O3复合涂层能够承受1050℃的高温氧化。(3)采用本发明制备方法制备的不锈钢 Na2SiO3/Al2O3复合涂层抗氯离子腐蚀能好。
附图说明
图1为所制备的Na2SiO3/Al2O3复合涂层的表面形貌SEM图。
图2为所制备的Al2O3(2a)-(2c)和Na2SiO3/Al2O3复合涂层(2d)-(2f)的的AFM的3D模型(2a,2d),表面拓扑图(2b,2e)和高度分析图(2c,2f)。
图3为1050℃热处理2h后所制备的Na2SiO3/Al2O3涂层的不锈钢(3a)、Al2O3涂层的不锈钢(3b)及未涂层的不锈钢(3c)的SEM图。
图4为在质量分数3.5%的NaCl溶液浸泡1h后不锈钢、含有Al2O3涂层不锈钢及含有Na2SiO3/Al2O3涂层的不锈钢的极化曲线(4a)、尼奎斯特图(4b)、相位角博德图(4c)及伯德图(4d)。
具体实施方式
下面结合附图及实施例对本发明做进一步详述:
实施例1
将勃姆石粉末与去离子水按质量比以1:10混合,室温下磁力搅拌1h得到溶胶。将用洗涤剂,去离子水和乙醇依次清洗过后的洁净干燥的304不锈钢基底,浸泡在勃姆石胶体中,以1cm/min的速度浸渍提拉,在60℃下干燥30min后以 5℃/min的升温速率在氮气保护下加热到550℃,保温2h后自然冷却,制得多孔γ-Al2O3涂层。将硅酸钠与去离子水按质量比以1:4混合,将刚制备的304不锈钢片浸入在此溶液中2h,在60℃下干燥30min后以5℃/min升温速率在管式炉中氮气保护下加热到450℃,保温30min后自然冷却,制得Na2SiO3/Al2O3复合涂层。本发明将硅酸钠水溶液浸泡在多孔Al2O3的纳米孔道中,通过高温热处理使其在纳米孔道中玻璃化,从而填充Al2O3的纳米孔道,使得硅酸钠水玻璃性粘结剂对不锈钢有明显的保护作用。
图1为所制备的Na2SiO3/Al2O3复合涂层的表面形貌SEM图。
实施例2
将勃姆石粉末与去离子水按质量比以1:10混合,室温下磁力搅拌1h得到溶胶。将用洗涤剂,去离子水和乙醇依次清洗过后的洁净干燥的316不锈钢基底,浸泡在勃姆石胶体中,以1.5cm/min的速度浸渍提拉,在60℃下干燥30min后以5℃/min的升温速率在氩气保护下加热到550℃,保温2h后自然冷却,制得多孔γ-Al2O3涂层。将硅酸钠与去离子水按质量比以1:100混合,将刚制备的 316不锈钢片浸入在此溶液中0.5h,在60℃下干燥30min后以5℃/min升温速率在管式炉中氩气保护下加热到550℃,保温30min后自然冷却,制得Na2SiO3/Al2O3复合涂层。
图2为Al2O3和Na2SiO3/Al2O3复合涂层的的AFM的3D模型(2a,2d),表面拓扑图(2b,2e)和高度分析图(2c,2f)。
实施例3
将勃姆石粉末与去离子水按质量比以1:10混合,室温下磁力搅拌1h得到溶胶。将用洗涤剂,去离子水和乙醇依次清洗过后的洁净干燥的316L不锈钢基底,浸泡在勃姆石胶体中,以1.5cm/min的速度浸渍提拉,在60℃下干燥30min后以5℃/min的升温速率在氩气保护下加热到550℃,保温2h后自然冷却,制得多孔γ-Al2O3涂层。将硅酸钠与去离子水按质量比以3:17混合,将刚制备的316L 不锈钢片浸入在此溶液中2h,在60℃下干燥30min后以5℃/min升温速率在管式炉中氩气保护下加热到550℃,保温30min后自然冷却,制得Na2SiO3/Al2O3复合涂层。将制备的复合涂层用于高温氧化实验,具体为将其置于1050℃煅烧2 h,观察期高温氧化后的表面形貌。
图3为1050℃热处理2h后Na2SiO3/Al2O3涂层的不锈钢(3a)、Al2O3涂层的不锈钢(3b)及未涂层的不锈钢(3c)的SEM图。
实施例4
将勃姆石粉末与去离子水按质量比以1:10混合,室温下磁力搅拌1h得到溶胶。将用洗涤剂,去离子水和乙醇依次清洗过后的洁净干燥的304L不锈钢基底,浸泡在勃姆石胶体中,以1.5cm/min的速度浸渍提拉,在60℃下干燥30min后以5℃/min的升温速率在氮气保护下加热到550℃,保温2h后自然冷却,制得多孔γ-Al2O3涂层。将硅酸钠与去离子水按质量比以3:17混合,将刚制备的304L 不锈钢片浸入在此溶液中2h,在60℃下干燥30min后以5℃/min升温速率在管式炉中氮气保护下加热到500℃,保温30min后自然冷却,制得Na2SiO3/Al2O3复合涂层。25℃下,利用传统的三电极系统在电化学工作中测试涂层的耐腐蚀性能。用饱和甘汞电极作为参比电极,铂电极作为对电极,涂覆涂层的不锈钢作为工作电极,质量分数3.5%的氯化钠溶液作为耐腐蚀测试的电解液,在 -500mV-500mV的偏振测量范围以0.5mV/s的扫描速度进行。电化学阻抗测试在开路电压下频率从100KHz到0.01Hz振幅10mV下测试。所有测试样品在测试前在3.5%的NaCl溶液中浸泡1h,平衡系统中的电解质,测试时将1cm2不锈钢暴露于溶液中。
图4为在质量分数3.5%的NaCl溶液浸泡1h后不锈钢、含有Al2O3涂层不锈钢及含Na2SiO3/Al2O3涂层的不锈钢的极化曲线(4a)、尼奎斯特图(4b)、相位角博德图(4c)及伯德图(4d)。
Claims (7)
1.一种不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法,其特征在于,采用勃姆石为前驱体,用浸渍提拉和热处理在不锈钢基底上制备Al2O3涂层,再将Al2O3涂层浸泡于硅酸钠溶液中,高温烧结制备Na2SiO3/Al2O3复合涂层。
2.根据权利要求1所述的不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法,其特征在于,具体制备方法步骤为:
步骤a),将不锈钢基底表面清洗;
步骤b),将勃姆石与去离子水混合,制得勃姆石胶体,再将步骤a)中的不锈钢基底浸泡在勃姆石胶体中,以1cm/min~6cm/min的速度浸渍提拉,干燥后,在保护气体气氛中加热到550℃,保温2h后自然冷却,制得γ-Al2O3涂层;
步骤c),将硅酸钠与去离子水按质量比以1:100~1:4混合,制得硅酸钠水溶液,再将步骤b)制得的涂覆γ-Al2O3涂层的不锈钢基底浸入在硅酸钠水溶液中0.5h~2h,通过浸渍提拉法以1cm/min~6cm/min的速度提拉,干燥后,在保护气体气氛中加热到450~550℃,保温30min后自然冷却,制得Na2SiO3/Al2O3复合涂层。
3.根据权利要求2所述的不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法,其特征在于,步骤a)中的不锈钢基底为304,304L,316,316L不锈钢中的一种。
4.根据权利要求2所述的不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法,其特征在于,步骤b)中,勃姆石与去离子水按质量比以1:10混合。
5.根据权利要求2所述的不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法,其特征在于,步骤b)、步骤c)中,所述的干燥在60℃下加热30min。
6.根据权利要求2所述的不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法,其特征在于,步骤b)、步骤c)中,在保护气体气氛中加热的速率为5℃/min。
7.根据权利要求2所述的不锈钢抗高温氧化和耐海水腐蚀Na2SiO3/Al2O3复合涂层制备方法,其特征在于,步骤b)、步骤c)中采用的保护气体为氮气或者氩气。
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JPS63171883A (ja) * | 1987-01-12 | 1988-07-15 | Nisshin Steel Co Ltd | 耐熱性に優れた絶縁性ステンレス鋼板およびその製造方法 |
JPH01156496A (ja) * | 1987-12-11 | 1989-06-20 | Shinku Zairyo Kk | 耐蝕被覆方法 |
CN1397751A (zh) * | 2001-07-16 | 2003-02-19 | 日本里可雷斯工业株式会社 | 金属衬垫原料板及其生产方法 |
CN1900360A (zh) * | 2006-07-14 | 2007-01-24 | 西南大学 | 镁合金表面功能梯度膜制备方法 |
CN101270476A (zh) * | 2008-04-25 | 2008-09-24 | 浙江大学 | 溶胶-凝胶制备高结合强度碳素钢基Al2O3陶瓷涂层方法 |
TW201246564A (en) * | 2011-04-05 | 2012-11-16 | Fujifilm Corp | Metal substrate with insulating layer and manufacturing method thereof and semiconductor device |
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JPS63171883A (ja) * | 1987-01-12 | 1988-07-15 | Nisshin Steel Co Ltd | 耐熱性に優れた絶縁性ステンレス鋼板およびその製造方法 |
JPH01156496A (ja) * | 1987-12-11 | 1989-06-20 | Shinku Zairyo Kk | 耐蝕被覆方法 |
CN1397751A (zh) * | 2001-07-16 | 2003-02-19 | 日本里可雷斯工业株式会社 | 金属衬垫原料板及其生产方法 |
CN1900360A (zh) * | 2006-07-14 | 2007-01-24 | 西南大学 | 镁合金表面功能梯度膜制备方法 |
CN101270476A (zh) * | 2008-04-25 | 2008-09-24 | 浙江大学 | 溶胶-凝胶制备高结合强度碳素钢基Al2O3陶瓷涂层方法 |
TW201246564A (en) * | 2011-04-05 | 2012-11-16 | Fujifilm Corp | Metal substrate with insulating layer and manufacturing method thereof and semiconductor device |
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