CN107272329A - Mask plate cleaning device - Google Patents
Mask plate cleaning device Download PDFInfo
- Publication number
- CN107272329A CN107272329A CN201710662008.8A CN201710662008A CN107272329A CN 107272329 A CN107272329 A CN 107272329A CN 201710662008 A CN201710662008 A CN 201710662008A CN 107272329 A CN107272329 A CN 107272329A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- cleaning device
- absorption cylinder
- blade
- plate cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Abstract
The invention discloses a kind of mask plate cleaning device, including absorption cylinder, the first end of the absorption cylinder is provided with suction nozzle, the absorption cylinder is in fluid communication by tracheae and getter device, wherein, electric rotating machine and blade are provided with the absorption cylinder, the blade is connected in the rotary shaft of the electric rotating machine, the blade is located in the absorption cylinder and is adjacent to the suction nozzle.The mask plate cleaning device, for sticking in the class knitting wool foreign matter on mask plate, the main body of class knitting wool foreign matter is drawn into the suction nozzle of absorption cylinder by suction-operated first, then class knitting wool foreign matter is cut off from mask plate by blade circumgyration incision, finally by the foreign matter Adsorption of cut-out, it is possible thereby to effectively remove the class knitting wool foreign matter such as hair, cotton thread, knitting wool and fiber of adhesion on mask plate.
Description
Technical field
The present invention relates to OLED display manufacturing technology field, specifically a kind of mask plate cleaning device.
Background technology
OLED display device can be divided into PM-OLED (passive OLED) and AM-OLED (active OLED) according to driving type；Under
The technique that face mainly parses AM-OLED；AM-OLED techniques can be divided into three big flows, and first paragraph is the technique of array base palte, second
Packaging technology is deposited for OLED in section；3rd section of display module technique then for bonding aging.Wherein, OLED is deposited in packaging technology
The multiple organic layers and inorganic layer of the evaporation process aligned comprising multiple substrates and mask plate, respectively evaporation making OLED.
In the technical process that substrate and mask plate are aligned, it must be noted that mask plate tapping whether hollow out, if
There is impurity foreign matter in mask plate tapping, the OLED produced occurs that pixel is bad and causes bad.It is most of on mask plate
Impurity foreign matter can be removed by cleaning, laser repair, but class knitting wool foreign matter and mask plate are sticky very on mask plate
Greatly, it is and low to laser absorption, it is difficult to be eliminated；
Class knitting wool impurity foreign matter on mask plate generally includes the class such as micro dust particle and hair, cotton thread, knitting wool and fiber hair
Line foreign matter, for micro dust particle, removal can be cleaned usually using air blowing or getter device, and for class knitting wool foreign matter, tradition
Air blowing or getter device understand that effect is not good, different positions are easily attached to again.For class knitting wool foreign matter, prior art
Middle use syringe needle suction pipe Adsorption, but the more difficult control of the absorption affinity of syringe needle suction pipe, if the suction of syringe needle is too weak, energy of adsorption
Power is low, does not reach the adsorption effect of effective class knitting wool foreign matter；If the suction of syringe needle is too strong, mask plate may be deformed.And
And, class knitting wool foreign matter not simply may be attached on mask plate, but is sticked on mask plate, may be existed between the two
Larger viscous force, is now absorbed, it is easy to make mask plate stress, cause mask plate to deform, to mask using syringe needle suction pipe strength
Version is damaged.
The content of the invention
In view of the deficiency that prior art is present, the invention provides a kind of mask plate cleaning device, the device can be effective
Remove the class knitting wool foreign matter such as hair, cotton thread, knitting wool and fiber of adhesion on mask plate in ground, it is to avoid mask plate deforms, clear
Mask plate is effectively protected in clean process.
To achieve the above object, present invention employs following technical scheme：
A kind of mask plate cleaning device, including absorption cylinder, the first end of the absorption cylinder are provided with suction nozzle, the suction
Attached cylinder is in fluid communication by tracheae and getter device, wherein, electric rotating machine and blade are provided with the absorption cylinder, it is described
Blade is connected in the rotary shaft of the electric rotating machine, and the blade is located in the absorption cylinder and is adjacent to the suction nozzle.
Specifically, the vertical range of the blade and the end face where the suction nozzle is 0~2mm.
Specifically, the quantity of the blade is multiple, and multiple blades are circumferentially symmetrically connected to the rotary shaft
On.
Specifically, the quantity of the blade is 2 or 3.
Specifically, the absorption cylinder is cylinder-like structure, a diameter of 5~10mm of the absorption cylinder.
Specifically, the getter device is vavuum pump.
Specifically, the mask plate cleaning device also includes fixed pedestal and the branch being located relatively above the fixed pedestal
Support, the fixed pedestal is used to carry mask plate to be cleaned, and the absorption cylinder is connected to described by a position-limit mechanism
On support frame；The position-limit mechanism is used to drive the absorption cylinder to move simultaneously along short transverse in the top of the fixed pedestal
Shift motion is limited, so that the spacing between the suction nozzle and the mask plate is not less than default safe distance.
Specifically, the safe distance is 1~2mm.
Specifically, the mask plate cleaning device also includes control module and height sensor, and the height sensor connects
The first end of the absorption cylinder is connected on, the height sensor is used to detect in real time between the suction nozzle and the mask plate
Detected value is simultaneously fed back to the control module by spacing；Wherein, if that detects in real time is smaller than the safe distance, the control
Molding block sends control signal to the getter device and the electric rotating machine respectively, controls the getter device to stop suction,
The electric rotating machine is controlled to stop operating.
Specifically, the quantity of the height sensor is two, and two height sensors are located at the phase of the suction nozzle
To both sides.
Mask plate cleaning device provided in an embodiment of the present invention, is provided with blade in absorption cylinder, is covered for sticking in
The main body of class knitting wool foreign matter, is drawn into the suction nozzle of absorption cylinder by the class knitting wool foreign matter in film version by suction-operated first,
Then class knitting wool foreign matter is cut off from mask plate by blade circumgyration incision, finally by the foreign matter Adsorption of cut-out, thus
The class such as the hair of adhesion, cotton thread, knitting wool and fiber knitting wool foreign matter on mask plate can be effectively removed, during cleaning,
Mask plate can be avoided to deform, effectively protect mask plate.
Brief description of the drawings
Fig. 1 is the structural representation of mask plate cleaning device provided in an embodiment of the present invention；
Fig. 2 is such as the enlarged diagram of part A in Fig. 1.
Embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with the accompanying drawings to the specific reality of the present invention
The mode of applying is described in detail.The example of these preferred embodiments is illustrated in the accompanying drawings.Shown in accompanying drawing and according to
What the embodiments of the present invention of accompanying drawing description were merely exemplary, and the present invention is not limited to these embodiments.
Here, it should also be noted that, in order to avoid having obscured the present invention because of unnecessary details, in the accompanying drawings only
Show and according to the solution of the present invention closely related structure and/or process step, and eliminate little with relation of the present invention
Other details.
A kind of mask plate cleaning device is present embodiments provided, as depicted in figs. 1 and 2, the mask plate cleaning device bag
Include fixed pedestal 1, the support frame 2 for being located relatively at the top of fixed pedestal 1, absorption cylinder 3.The fixed pedestal 1 is used to hold
Mask plate 4 to be cleaned is carried, the absorption cylinder 3 is connected on support frame as described above 2, and support frame as described above 2 adsorbs cylinder 3 by described
It is supported on the top of the fixed pedestal 1.
Wherein, the first end of the direction mask plate 4 of the absorption cylinder 3 is provided with suction nozzle 31, the absorption cylinder 3
It is in fluid communication by tracheae 51 with getter device 5.When being attached with impurity foreign matter on the mask plate 4, by the absorption cylinder 3
Suction nozzle 31 is directed at impurity foreign matter, then controls the air-breathing of getter device 5, if now impurity foreign matter is that simple attachment (non-adhesion) exists
On mask plate 4, then impurity foreign matter is inhaled into the absorption cylinder 3, reaches the effect of the cleaning mask plate 4.In this reality
Apply in example, the getter device 5 is vavuum pump.
Further, electric rotating machine 6 and blade 7 are provided with the absorption cylinder 3, the blade 7 is connected to the rotation
In the rotary shaft 61 of rotating motor 6, the blade 7 is located in the absorption cylinder 3 and is adjacent to the suction nozzle 31.For sticking in
Class knitting wool foreign matter on mask plate 4, for example, the class knitting wool foreign matter such as hair, cotton thread, knitting wool and fiber, passes through getter device 5 first
Suction-operated by the main body of class knitting wool foreign matter be drawn into absorption cylinder 3 suction nozzle 31 in, then pass through the circumgyration incision of blade 7 will
Class knitting wool foreign matter is cut off from mask plate 4, finally again by the suction-operated of getter device 5 by the foreign matter Adsorption of cut-out.
For sticking in the class knitting wool foreign matter on mask plate 4, the mask plate cleaning device of example offer is provided, is not logical
Cross getter device 5 and strong adsorption disengaging is provided, but selection uses less absorption affinity make it that class knitting wool foreign matter free portion is (non-
Adhesion part) it extend into the suction nozzle 31 of absorption cylinder 3, then by blade 7 that the class knitting wool extending into suction nozzle 31 is different
Thing cutting departs from mask plate 4.Thus, it is possible to the class knitting wool foreign matter of adhesion on mask plate 4 is effectively removed, and in the mistake of cleaning
Cheng Zhong, it is to avoid being departed from using strong adsorption causes mask plate 4 to deform, and effectively protects mask plate 4.
In the present embodiment, the absorption cylinder 3 is cylinder-like structure, thus more easily assembles the He of electric rotating machine 6
Blade 7.Specifically, the diameter of the absorption cylinder 3 can be arranged in the range of 5~10mm, and the size of the blade 7 can be with
It is accordingly specifically chosen according to the diameter of the absorption cylinder 3.
Wherein, the quantity of the blade 7 can be multiple, and multiple blades 7 are circumferentially symmetrically connected to the rotation
In rotating shaft 61.Specifically, in the present embodiment, the quantity of the blade 7 is 2, in a further preferred embodiment, the knife
The quantity of piece 7 is it can also be provided that 3.
Wherein, in order to avoid the blade 7 touches the mask plate 4 and scratch described in mask plate 4, the blade 7 is not
It can be stretched out from the suction nozzle 31, the blade 7 can be concordant with the end face where the suction nozzle 31 or be housed in described
Within suction nozzle 31, but avoid the blade 7 and the end face distance at the place of suction nozzle 31 excessive again.As shown in Fig. 2 it is preferred that
, the vertical range h of the blade 7 and the end face where the suction nozzle 31 could be arranged to 0~2mm, as H=0, i.e. institute
State blade 7 concordant with the end face where the suction nozzle 31.
In the present embodiment, refering to Fig. 1 and Fig. 2, the absorption cylinder 3 is connected to the support by a position-limit mechanism 8
On frame 2.The position-limit mechanism 8 is used to drive the absorption cylinder 3 to move simultaneously along short transverse in the top of the fixed pedestal 1
Its shift motion is limited, so that the spacing L between the suction nozzle 31 and the mask plate 4 is not less than default safe distance.Its
In, the safe distance could be arranged to 1~2mm.
Further, refering to Fig. 1 and Fig. 2, the mask plate cleaning device in the present embodiment also includes control module 9 and height
Sensor 10, the height sensor 10 is connected to the first end of the absorption cylinder 3, and the height sensor 10 is used for real-time
Detect the spacing L between the suction nozzle 31 and the mask plate 4 and detected value is fed back into the control module 9.Wherein, it is described
Control module 9 is also set up signal with the getter device 5 and the electric rotating machine 6 and is connected, if anti-from the height sensor 10
The spacing L of the real-time detection of feedback is less than the safe distance, then the control module 10 is respectively to the getter device 5 and described
Electric rotating machine 6 sends control signal, controls the getter device 5 to stop suction, and controls the electric rotating machine 6 to stop operating.By
When this prevents that the spacing L between the suction nozzle 31 and the mask plate 4 is less than safe distance, aspiratory action and circumgyration incision are dynamic
Work is damaged to mask plate 4.Being adjusted by the position-limit mechanism 8 spacing L is returned to after safe distance, then again
The getter device 5 and the electric rotating machine 6 is controlled to start corresponding action.
Specifically, in the present embodiment, as shown in figure 1, the quantity of the height sensor 10 is two, two height
Sensor 10 is located at the opposite sides of the suction nozzle 31.
The mask plate cleaning device of example offer is provided, blade is provided with absorption cylinder, for sticking in mask
The main body of class knitting wool foreign matter, is drawn into the suction nozzle of absorption cylinder, so by the class knitting wool foreign matter in version by suction-operated first
Class knitting wool foreign matter is cut off from mask plate by blade circumgyration incision afterwards, finally by the foreign matter Adsorption of cut-out, thus may be used
, can during cleaning effectively to remove the class such as the hair of adhesion, cotton thread, knitting wool and fiber knitting wool foreign matter on mask plate
To avoid mask plate from deforming, mask plate is effectively protected.
It should be noted that herein, such as first and second or the like relational terms are used merely to a reality
Body or operation make a distinction with another entity or operation, and not necessarily require or imply these entities or deposited between operating
In any this actual relation or order.Moreover, term " comprising ", "comprising" or its any other variant are intended to
Nonexcludability is included, so that process, method, article or equipment including a series of key elements not only will including those
Element, but also other key elements including being not expressly set out, or also include being this process, method, article or equipment
Intrinsic key element.In the absence of more restrictions, the key element limited by sentence "including a ...", it is not excluded that
Also there is other identical element in process, method, article or equipment including the key element.
Described above is only the embodiment of the application, it is noted that for the ordinary skill people of the art
For member, on the premise of the application principle is not departed from, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as the protection domain of the application.
Claims (10)
1. a kind of mask plate cleaning device, including absorption cylinder, the first end of the absorption cylinder are provided with suction nozzle, the absorption
Cylinder is in fluid communication by tracheae and getter device, it is characterised in that be provided with electric rotating machine and blade in the absorption cylinder,
The blade is connected in the rotary shaft of the electric rotating machine, and the blade is located in the absorption cylinder and is adjacent to the suction
Mouth.
2. mask plate cleaning device according to claim 1, it is characterised in that the blade and the end where the suction nozzle
The vertical range in face is 0~2mm.
3. mask plate cleaning device according to claim 1, it is characterised in that the quantity of the blade be it is multiple, it is multiple
The blade is circumferentially symmetrically connected in the rotary shaft.
4. mask plate cleaning device according to claim 3, it is characterised in that the quantity of the blade is 2 or 3.
5. mask plate cleaning device according to claim 1, it is characterised in that the absorption cylinder is cylinder-like structure,
A diameter of 5~10mm of the absorption cylinder.
6. mask plate cleaning device according to claim 1, it is characterised in that the getter device is vavuum pump.
7. according to any described mask plate cleaning devices of claim 1-6, it is characterised in that the mask plate cleaning device is also
Including fixed pedestal and the support frame being located relatively above the fixed pedestal, the fixed pedestal is used to carry to be cleaned cover
Film version, the absorption cylinder is connected on support frame as described above by a position-limit mechanism；The position-limit mechanism is used to drive the suction
Attached cylinder moves along short transverse in the top of the fixed pedestal and limits shift motion, so that the suction nozzle and the mask
Spacing between version is not less than default safe distance.
8. mask plate cleaning device according to claim 7, it is characterised in that the safe distance is 1~2mm.
9. mask plate cleaning device according to claim 7, it is characterised in that the mask plate cleaning device also includes control
Molding block and height sensor, the height sensor are connected to the first end of the absorption cylinder, and the height sensor is used
In detecting the spacing between the suction nozzle and the mask plate in real time and detected value fed back into the control module；Wherein, if
That detects in real time is smaller than the safe distance, and the control module is sent out to the getter device and the electric rotating machine respectively
Go out control signal, control the getter device to stop suction, control the electric rotating machine to stop operating.
10. mask plate cleaning device according to claim 9, it is characterised in that the quantity of the height sensor is two
Individual, two height sensors are located at the opposite sides of the suction nozzle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710662008.8A CN107272329B (en) | 2017-08-04 | 2017-08-04 | Mask plate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710662008.8A CN107272329B (en) | 2017-08-04 | 2017-08-04 | Mask plate cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107272329A true CN107272329A (en) | 2017-10-20 |
| CN107272329B CN107272329B (en) | 2020-12-25 |
Family
ID=60076152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710662008.8A Active CN107272329B (en) | 2017-08-04 | 2017-08-04 | Mask plate cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107272329B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110161808A (en) * | 2019-05-09 | 2019-08-23 | 上海华力微电子有限公司 | Grating scale cleaning device and method, litho machine |
| CN114635215A (en) * | 2022-05-18 | 2022-06-17 | 苏州维杰纺织有限公司 | Yarn conduction and feeding synchronous processing device |
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| Publication number | Publication date |
|---|---|
| CN107272329B (en) | 2020-12-25 |
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