CN202189222U - Photomask cleaning device - Google Patents

Photomask cleaning device Download PDF

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Publication number
CN202189222U
CN202189222U CN2011202991509U CN201120299150U CN202189222U CN 202189222 U CN202189222 U CN 202189222U CN 2011202991509 U CN2011202991509 U CN 2011202991509U CN 201120299150 U CN201120299150 U CN 201120299150U CN 202189222 U CN202189222 U CN 202189222U
Authority
CN
China
Prior art keywords
cleaning
light shield
photomask
cleaning device
district
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2011202991509U
Other languages
Chinese (zh)
Inventor
杨家豪
潘咏晋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Home board automation Limited by Share Ltd
Original Assignee
JIADENG PRECISE INDUSTRY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIADENG PRECISE INDUSTRY Co Ltd filed Critical JIADENG PRECISE INDUSTRY Co Ltd
Priority to CN2011202991509U priority Critical patent/CN202189222U/en
Application granted granted Critical
Publication of CN202189222U publication Critical patent/CN202189222U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model discloses a photomask cleaning device, relates to a device used for cleaning the photomask in a wiping manner, specifically to a photomask cleaning device which can remove micro particles and atomized strains attached to a flange on any side of the photomask and the side edge of an outer frame of the flange side. The photomask cleaning device at least consists of a photomask lifting group, a washing clamping head group, a horizontal displacement group, a cleaning area and a dispenser machine. The photomask cleaning device can rapidly remove micro particles and atomized strains attached to the flange on any side of the photomask and the side edge of the outer frame of the flange side, can save labor and waste water processing cost and shorten washing time of the photomask; furthermore, the photomask cleaning device can ensure the cleanliness of the photomask after washing so as to contribute to improving the process yield of a semi-conductor.

Description

Light shield cleaning device
Technical field
The utility model relates to and a kind ofly comes the light shield cleaning device of photomask cleaning with the wiping mode, is meant that especially a kind of can effectively the removal is attached to light shield either side flange and the light shield cleaning device of particulate and atomizing spot on the housing side of flange side.
Background technology
When getting into the new century, the human lives has got in the field of digital Age, and article, apparatus arround many now lives all replace with the digitizing high-tech product; Not only bring people many convenience; Also be able to simultaneously enjoy high-tech civilization and progress achievement, and in the digitized epoch, even most of electrical equipment article, apparatus all have relation directly to control with high-tech IC chip with digital science and technology; To reach the robotization purpose; So someone declares that the IC chip is the mother of industry, and the IC chip is made up of the integrated circuit of superprecision, its manufacture process is to utilize light shield in the environment of dust free room, to use the board of high precision that the lamination operation that silicon wafer carries out high precision is accomplished; Manufacturing costs such as its board, factory building are very high; Therefore in the process of making wafer, the product yield can determine a semiconductor factory whether to make a profit, so the yield of being devoted to improve product is the most important problem of the operator of each semiconductor factory.
And influence in the wafer yield most important factor wherein one be light shield and whether be subjected to pollute; If micro dust particle occurs on the light shield, can make when contaminated light shield is used for photolithography in semiconductor manufacturing, can on wafer, produce corresponding defective (Defect); Be with; In order to keep the cleaning of light shield, generally can be provided with light shield cuticula (Pellicle) in light shield, attach on light shield to prevent micro dust particle; And the light shield cuticula keeps a distance for seeing through frame supported with light shield; The micro dust particle that drops on the light shield is collected on the light shield cuticula, and micro-photographing process becomes image distortion because of the light shield cuticula produces certain degree, makes the unlikely influence script of this micro dust particle micro-photographing process.
The existing mask cleaning method, it is to do clean a processing through manual type to the surface of a light shield.One cleanup crew is with firm being placed on the support body of this light shield, and it is surperficial to wash this light shield through a cleaning fluid [for example: acetone, ethanol and deionized water etc.], brushes the particulate matter on this light shield surface simultaneously with a brushing tool; Then,, so repeat again this light shield to be carried out drying behind the above-mentioned cleaning for several times, thus, can remove the impurity or the residue on light shield surface, and then guarantee the cleanliness factor on light shield surface once more with the surface of this this light shield of cleaning fluid flushing.
Generally speaking; The cleaning method of above-mentioned existing mask has disadvantage; For example: each cleanup crew need be exposed under the working environment of this cleaning fluid when cleaning this light shield for a long time, very easily because of sucking or directly contact this chemical substance, and influences the healthy of this cleanup crew; In addition, this cleaning fluid normally is an organic solvent, needs centralized management to dispose, and therefore must extraly set up the waste collection device, pollutes to avoid arbitrarily releasing.For these reasons, it is necessary further to improve above-mentioned existing mask cleaning way really.
The utility model content
In order to address the above problem; After the utility model is promptly totally considered based on above-mentioned present common deletion; Hope can reach protection cleanup crew personal safety simultaneously, can keep photomask clean degree and can be rapidly and effectively shorten cleaning time equally with the photomask clean structure that the utility model was provided, and uses and further can reach the effect that promotes the manufacture of semiconductor yield in order to semiconductor factory.
One fundamental purpose of the utility model is that a kind of device with wiping mode photomask cleaning is being provided; It is to utilize to soak into cleaning wiping cloth in the wet type clear area; And utilize horizontal shift group and cleaning chuck group that light shield to be cleaned is moved around on horizontal shift group institute formation track simultaneously; Can directly reach in the housing side of flange side in order to light shield cleaning device to soak into cleaning wiping cloth wiping light shield either side flange; With can be effectively with particulate and atomizing greasiness removal; Then move to the dry cleaning district with being about to light shield to be cleaned, then dry surperficial water stain action with xerotripsis wiping cloth (rags) in the dry cleaning district this moment, makes cleaning accomplish the unlikely light shield cleaning device that cleans washmarking or spot that stays of light shield.
Another fundamental purpose of the utility model is to provide a tool wet-cleaning district and two stages clear area, dry cleaning district to carry out the light shield cleaning device of photomask clean; It is photomask cleaning either side flange and on the housing side of flange side, adhere to particulate or the atomizing spot effectively, and can residual cleaning washmarking after the cleaning or the device of the spot that atomizes.
Another fundamental purpose of the utility model is to provide a light shield cleaning device; It can directly carry out wiping action with particulate that is built-up in light shield either side ledge surface and atomizing spot and it is removed; But the also housing side of simultaneously cleaning light shield flange side; Clean both simultaneously, help to promote cleaning efficiency.
A fundamental purpose again of the utility model be to provide a light shield cleaning device can be directly with light shield surface particle and the direct wiped clean of atomizing spot; And do not use a large amount of organic cleaning solutions; Can not produce a large amount of pending waste liquids; In keeping under the photomask clean effect prerequisite, can reach simultaneously and keep environmental safety, and can reduce the effect of processing cost.
According to above-mentioned purpose, the utility model provides a kind of light shield cleaning device, and it comprises: a framework, a horizontal shift group; Being the upside that is positioned at framework, being formed, one cleaned the chuck group by a pair of transporting rail, is to be positioned at horizontal shift group top; With two ends pivot joint, a clear area of horizontal shift group, be to be arranged in horizontal shift transporting rail that group forms, it is the wet-cleaning district by clear area one side; And the dry cleaning district of relative opposite side forms, a point gum machine, is to be positioned at the below, clear area, is aquifer yield, a light shield up-down group that is used for controlling wet-cleaning district, clear area; Be a side that is positioned at framework, and be to adopt the mechanical actuation mode to go up and down.
The beneficial effect of the utility model: through the light shield cleaning device that the utility model provided; Can effectively reach photomask cleaning either side flange and on the housing side of flange side, adhere to particulate or the atomizing spot, and can residual cleaning washmarking after the cleaning or the effect of the spot that atomizes.
Description of drawings
Fig. 1 is the one-piece construction synoptic diagram of the light shield cleaning device of the utility model;
Fig. 2 is the clear area synoptic diagram of the light shield cleaning device of the utility model;
Fig. 3 is the partial schematic diagram at position, wet-cleaning district of clear area of the light shield cleaning device of the utility model;
Fig. 4 is the dry cleaning district position partial schematic diagram in the clear area of light shield cleaning device of the utility model;
Fig. 5 is the light shield and the clear area relative position synoptic diagram of the light shield cleaning device of the utility model.
The main element symbol description
Light shield cleaning device 10
Framework 11
Horizontal shift group 20
Track 21
Clean chuck group 30
Clear area 40
Wet-cleaning district 50
Dry cleaning district 60
Point gum machine 70
Light shield up-down group 80
Wet process unit 51
Water outlet 52
Cleaning wiping cloth 53
Drainage arrangement 54
Drying journey unit 61
Light shield 90
Housing 100
Embodiment
For technology contents, utility model purpose that the utility model is used and the effect reached thereof have more complete and clearly disclose, the detailed description in the below now, and please consult diagram and the figure number that is disclosed in the lump.
See also Fig. 1 and be the specific embodiment of the utility model, a light shield cleaning device 10, its agent structure comprises: a framework 11, a horizontal shift group 20; Being the upside that is positioned at framework 11, being formed, one cleaned chuck group 30 by a pair of transporting rail 21, is to be positioned at horizontal shift group 20 tops; Two ends pivot joint, a clear area 40 with horizontal shift group 20; Be to be arranged in horizontal shift group 20 transporting rail that forms 21, it is the wet-cleaning district 50 by clear area 40 1 sides, and the dry cleaning district 60 of relative opposite side forms, a point gum machine 70; Be to be positioned at 40 belows, clear area; Being aquifer yield, a light shield up-down group 80 that is used for controlling 40 wet-cleaning districts 50, clear area, is a side that is positioned at framework 11, and is to adopt the mechanical actuation mode to go up and down.
Be aided with at present disclose graphic and light shield 90 cleaning process descriptions are following: at first light shield 90 to be cleaned is placed on the light shield up-down group 80; The continuous chuck group 30 of will cleaning moves to directly over the light shield up-down group 80 and gripping light shield 90; Promptly determine area size to be cleaned and clean chuck group 30 initial institute gripping light shield 90 positions; And horizontal shift group 20 is to adopt the start of screw rod induced way; The screw rod start can drive simultaneously cleans chuck group 30, and carries light shield 90 to be cleaned to clear area 40, carries out cleaned.
Can be to decision light shield 90 zones to be cleaned with reference to shown in Figure 5; This is graphic to be the light shield and the clear area relative position synoptic diagram of the light shield cleaning device of the utility model; Therefrom can be observed light shield 90 cleaning main positions and be that light shield 90 either side flanges reach in housing 100 sides of flange side, light shield 90 flange side cleaning area sizes then are to be put by the 30 initial folded fetch bits of cleaning chuck group promptly to define the cleaning area.
Then please with reference to shown in Figure 2; After photomask cleaning 90 programs begin; Promptly to clean chuck group 30 light shield 90 to be cleaned is at first moved to by carrying out cleaned in 50 clear areas of forming jointly 40 in dry cleaning district 60 and wet-cleaning district, cleaning procedure at first is earlier light shield 90 to be cleaned to be moved in the wet-cleaning district 50, then please with reference to Fig. 3; Wet-cleaning district 50 in the clear area 40 wherein; Form by 51 of two wet process unit, 51 of wet process unit by a Water outlet 52, a cleaning wiping cloth 53, and 54 of drainage arrangements form, and two wet process unit 51 are to be the relative direction configuration.
When carrying out cleaning procedure; About 0.5~the 1cc of the Water outlet 52 first water outlets of meeting of wet process unit 51; With cleaning wiping cloth 53 wetting after; Continuous light shield 90 cleaned of carrying out; Cleaning wiping cloth 53 materials then possibly be to select for use from the tool absorbability; And do not produce the non-dust cloth that particulate or fiber peel off; Dust-free paper etc.; This place does not limit; Be that cleaning chuck group 30 with gripping light shield 90 is on horizontal displacement group 20 formed transporting rails 21 at this moment; The employing mode that moves around cleans; Earlier light shield 90 to be cleaned in wet-cleaning district 50; Cleaning wiping cloth 53 to soak into is carried out wiping action back and forth; Dry cleaning district 60 is delivered in reforwarding; Carry out wiping action again with unnecessary water stain removal; The cleaning back testing result that finishes shows that light shield 90 can reach and under every cubic feet, only surpluss 0.5 μ m size micronic dust number less than one clean level, that is general so-called class 1 grade of dust free room.
In wet-cleaning district 50; Water outlet 52 aquifer yields are by 70 controls of point gum machine; Each light shield 90 cleaning employed deionized water (DI water) aquifer yields are about 0.5~1cc, and aquifer yield is if may infiltrate graph area on the light shield 90 too much, and in a single day light shield 90 figures are destroyed; Light shield 90 promptly equals to have scrapped and can't re-use, the control so Water outlet 52 each aquifer yields are taken every caution against error.
And the drainage arrangement 54 in wet-cleaning district 50 is to take to absorb or get rid of the moisture mode, and excess moisture is removed; And can the effect of bleeding simultaneously when removing moisture; Avoid water droplet to infilter light shield 90 graph area, and cleaning wiping cloth 53 is to adopt upper and lower frames to engage mode mutually it is tightened arrangement, is beneficial to keep the tension force of cleaning wiping cloth 53 in light shield 90 cleaning courses; Make each light shield 90 back and forth under the wiping, cleaning wiping cloth 53 tension force are maintained unanimity.
Then please refer to shown in Figure 4; Dry cleaning district 60 for the utility model; Local area is made up of two 61 of drying journey unit, and drying journey unit 61 by a cleaning wiping cloth 53, and 54 of drainage arrangements form, and two drying journey unit 61 are to be the relative direction configuration equally.
Drainage arrangement 54 can adopt equally and absorb or get rid of the moisture mode in the dry cleaning district 60, with surplus moisture removal on light shield 90 surfaces, and can the effect of bleeding simultaneously when removal moisture; Avoid water droplet to infilter light shield 90 graph area; In order to the usefulness of protection light shield 90, and cleaning wiping cloth 53 is to adopt upper and lower frames to engage mode mutually it is tightened arrangement, is beneficial to keep the tension force of cleaning wiping cloth 53 in light shield 90 cleaning courses; Make each light shield 90 back and forth under the wiping, cleaning wiping cloth 53 tension force are maintained unanimity.
It will be further appreciated that clear area 40 designs here; It is for the unnecessary particulate sedimentation that prevents to be removed on it that central authorities hollow out the position; When light shield cleaning device 10 operations, being kicked up by air-flow accidentally becomes airborne dust, and has influence on the cleanliness that cleaning is accomplished light shield 90.
The mentioned light shield cleaning device 10 of the utility model is parts of light shield 90 whole cleaning processes, follow-up can be adding that air knife, water cutter and various cleaning device make more complete process, more complete in order to follow-up light shield 90 cleaning procedures.
Though the utility model discloses as above with aforesaid preferred embodiment; Right its is not in order to limit the utility model; Any familiar similar art; In spirit that does not break away from the utility model and scope, when can doing a little change and retouching, so the scope of patent protection of the utility model must be looked the appended claim of this instructions and defined and be as the criterion.

Claims (9)

1. a light shield cleaning device is characterized in that, comprising:
One framework;
One horizontal shift group is the upside that is positioned at this framework, is formed by a pair of transporting rail;
One cleans the chuck group, is to be positioned at this horizontal shift group top, with the two ends pivot joint of this horizontal shift group;
One clear area is to be arranged in this horizontal shift group to form this transporting rail, and it is the wet-cleaning district by this clear area one side, and the dry cleaning district of relative opposite side forms;
One point gum machine is to be positioned at this below, clear area, is used for controlling the aquifer yield in this wet-cleaning district, this clear area;
One light shield up-down group is a side that is positioned at this framework, and is to adopt the mechanical actuation mode to go up and down.
2. light shield cleaning device as claimed in claim 1 is characterized in that, this wet-cleaning district in this clear area is made up of two wet process unit.
3. light shield cleaning device as claimed in claim 2 is characterized in that, this wet process unit is made up of a Water outlet, a cleaning wiping cloth and a drainage arrangement, and this two wet process unit is to be the relative direction configuration.
4. light shield cleaning device as claimed in claim 1 is characterized in that, this dry cleaning district in this clear area is made up of two drying journey unit.
5. light shield cleaning device as claimed in claim 4 is characterized in that, this two drying journeys unit by a cleaning wiping cloth, and a drainage arrangement form, and this two drying journeys unit is to be relative direction to dispose.
6. like claim 3 or 5 described light shield cleaning devices, it is characterized in that this cleaning wiping cloth is by selecting in the combination: from the tool absorbability and do not produce particulate or non-dust cloth or dust-free paper that fiber peels off.
7. like claim 3 or 5 described light shield cleaning devices, it is characterized in that this cleaning wiping cloth is to adopt upper and lower frames to engage mode mutually it is tightened arrangement, is maintained at the tension force of cleaning wiping cloth in the photomask clean process.
8. light shield cleaning device as claimed in claim 3 is characterized in that, this Water outlet aquifer yield is to control the deionized water aquifer yield that each photomask clean uses by this point gum machine.
9. like claim 3 or 5 described light shield cleaning devices, it is characterized in that this drainage arrangement is configurable in this wet-cleaning district; Adopt and absorb or eliminating moisture mode; Excess moisture is removed, and can the effect of bleeding simultaneously when removing moisture, avoid water droplet to infilter the light mask image district.
CN2011202991509U 2011-08-17 2011-08-17 Photomask cleaning device Expired - Fee Related CN202189222U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011202991509U CN202189222U (en) 2011-08-17 2011-08-17 Photomask cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011202991509U CN202189222U (en) 2011-08-17 2011-08-17 Photomask cleaning device

Publications (1)

Publication Number Publication Date
CN202189222U true CN202189222U (en) 2012-04-11

Family

ID=45920662

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011202991509U Expired - Fee Related CN202189222U (en) 2011-08-17 2011-08-17 Photomask cleaning device

Country Status (1)

Country Link
CN (1) CN202189222U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107272329A (en) * 2017-08-04 2017-10-20 武汉华星光电半导体显示技术有限公司 Mask plate cleaning device
US9864283B2 (en) 2015-11-18 2018-01-09 Applied Materials, Inc. Apparatus and methods for photomask backside cleaning
CN107685047A (en) * 2016-08-04 2018-02-13 特铨股份有限公司 Contactless light shield or wafer cleaning apparatus
CN114011791A (en) * 2021-09-24 2022-02-08 威科赛乐微电子股份有限公司 Photomask cleaning device and cleaning method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9864283B2 (en) 2015-11-18 2018-01-09 Applied Materials, Inc. Apparatus and methods for photomask backside cleaning
CN107685047A (en) * 2016-08-04 2018-02-13 特铨股份有限公司 Contactless light shield or wafer cleaning apparatus
CN107272329A (en) * 2017-08-04 2017-10-20 武汉华星光电半导体显示技术有限公司 Mask plate cleaning device
CN107272329B (en) * 2017-08-04 2020-12-25 武汉华星光电半导体显示技术有限公司 Mask plate cleaning device
CN114011791A (en) * 2021-09-24 2022-02-08 威科赛乐微电子股份有限公司 Photomask cleaning device and cleaning method thereof

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20180209

Address after: The central road Tucheng Chinese Taiwan New Taipei 4 No. 2 8 floor 5

Patentee after: Home board automation Limited by Share Ltd

Address before: Chinese Taiwan New Taipei City

Patentee before: Jiadeng Precise Industry Co., Ltd.

TR01 Transfer of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120411

Termination date: 20190817

CF01 Termination of patent right due to non-payment of annual fee