CN107267940B - A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate and its application - Google Patents

A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate and its application Download PDF

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CN107267940B
CN107267940B CN201710431891.XA CN201710431891A CN107267940B CN 107267940 B CN107267940 B CN 107267940B CN 201710431891 A CN201710431891 A CN 201710431891A CN 107267940 B CN107267940 B CN 107267940B
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film surface
multilayer film
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sputtering
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CN107267940A (en
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杨瑞芳
赵南京
肖雪
殷高方
马明俊
孟德硕
方丽
甘婷婷
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Hefei Institutes of Physical Science of CAS
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N21/6428Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
    • G01N21/643Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes" non-biological material

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Abstract

The invention discloses a kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate and its applications, will be spare after glass slide cleaning, drying;Au-Cu and Ag-Al composition target is separately mounted on DC cathode, the glass slide after cleaning is packed into sample stage, booting, it vacuumizes, then leads to people's argon gas, open shielding power supply, alternating sputtering Au-Cu and Ag-Al, sputtering is completed, and shielding power supply is closed, and stops ventilation, close molecular pump, powered-down source is cooled to room temperature under natural vacuum, then takes out sample.The film surface enhancing fluorescent base bottom that operation of the present invention is simple, environmental-friendly, deposition velocity is fast, high-efficient, production cost is low, is easy to produce in batches, the film is multilayered structure, by on glass alternating deposit Au-Cu and Ag-Al prepare, the instrument of use is common magnetic control sputtering device.

Description

A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate and its application
Technical field
The invention belongs to field of spectroscopy more particularly to a kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrates And its application.
Background technique
Fluorescent technique is as a kind of important modern spectral technique, and with high sensitivity, easy to operate, detection is rapid, nothing The advantages that needing sample pre-treatments, meets the needs of real time on-line monitoring, is therefore widely used in the inspection of the environment such as atmosphere, water body It surveys.Polycyclic aromatic hydrocarbon is pollutant generally existing in water environment, has the characteristics that inertia is relatively strong, more stable, difficult to degrade, in reality In use, even if the content of polycyclic aromatic hydrocarbon is few in water body, but when used for a long time since its cumulative effect can still generate human body The harm such as carcinogenic, the rugged, mutagenesis of cause.Therefore, prediction more early to the polycyclic aromatic hydrocarbon pollutant in water environment more can be avoided timely Its harmfulness, this puts forward new requirements the detection sensitivity of fluorescent technique.
There are many ways to for improving fluorescence detection sensitivity, such as: the inspection of instrument is improved using new technology, new device Survey sensitivity;Long wavelength's probe molecule is selected to reduce the interference of background fluorescence;It is anti-using enzyme linked immunoassay, polymerase chain Answer, the biochemical methods such as more fluorescent chromophore probes improve the amplification factor of fluorescence signal, etc..But these methods improve The detection sensitivity limitation of fluorescent technique is very big, and the degree of raising is limited by the quantum yield of fluorescence species itself, photodissociation And interference of background fluorescence etc..From the aspect of improving instrument, although being reduced to the maximum extent in strict control experiment condition In the case where background fluorescence, it may be implemented to monomolecular measurement, but this measurement needs to use complicated optical system, to inspection The quality requirement for surveying device is also especially high, therefore instrument price is expensive, and experimentation requires that strictly, this method popularization and application are deposited In Difficulty.Therefore, it is necessary to find the approach of new raising fluorescence detection sensitivity.
In the 1970s, the discovery precious metal surface such as Drexhage has important shadow to the fluorescence property of neighbouring fluorogen It rings, the plasma oscillation and electromagnetic field of metal surface cut effect, make to be distributed in glimmering near metal surface or sol particle The fluorescent emission intensity of light object enhances than free state, i.e. surface-enhanced fluorescence effect.Maryland university, the U.S. It is plentiful and substantial that professor Lakowiczpsj leads its research team to achieve in the experiment and theoretical research of surface-enhanced fluorescence effect Achievement, raised the new page of surface-enhanced fluorescence effect study.Be currently used for fluorescent surface enhancing substrate be typically all Using the simple substance golden film or silverskin of chemical reduction method preparation, the fluorescence of very close limit can only be enhanced, and deposit Cannot accurately control in deposition rate, membrane-film preparation process environmental pollution the problems such as.Harbin Institute of Technology Sun Xiudong is taught theoretically The prediction surface plasmon polariton of each layer and local surface phasmon in multi-layer film structure intercouple and may be implemented Fluorescence is further enhanced, and relevant experimental study has not been reported.
Summary of the invention
The object of the present invention is to provide a kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrates.
To achieve the goals above the present invention adopts the following technical scheme:
A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate, which is characterized in that preparation method includes following Step:
It 1) will be spare after glass slide cleaning, drying;
2) Au-Cu and Ag-Al composition target being separately mounted on DC cathode, the glass slide after cleaning is packed into sample stage, The distance for adjusting target and substrate is 48-52mm;
3) it is switched on, is evacuated to 0.9-1.1x10-3Pa, then leads to people's argon gas, and adjustment Ar flow is 29-31sccm, adjustment Operating air pressure is to 1.4-1.6Pa;
4) shielding power supply is opened, alternating sputtering Au-Cu and Ag-Al, wherein sputtering power is respectively 40W and 60W, and control is single Secondary sputtering time is 0.9-1.1min, and total sputtering time is 5.9-6.1min;
5) it sputters and completes, close shielding power supply, stopping is ventilated, pass molecular pump, powered-down source, is cooled to room under natural vacuum Temperature then takes out sample.
A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate, it is characterised in that: preparation method packet Include following steps:
It 1) will be spare after glass slide cleaning, drying;
2) Au-Cu and Ag-Al composition target being separately mounted on DC cathode, the glass slide after cleaning is packed into sample stage, The distance for adjusting target and substrate is 50mm;
3) it is switched on, is evacuated to 1x10-3Then pa leads to people's argon gas, adjustment Ar flow is 30sccm, and adjustment operating air pressure is extremely 1.5Pa;
4) shielding power supply is opened, alternating sputtering Au-Cu and Ag-Al, wherein sputtering power is respectively 40W and 60W, and control is single Secondary sputtering time is 1min, and total sputtering time is 6min;
5) it sputters and completes, close shielding power supply, stopping is ventilated, pass molecular pump, powered-down source, is cooled to room under natural vacuum Temperature then takes out sample.
A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate, it is characterised in that: Au-Cu and Ag- Au/Cu mass ratio=1/4, Ag/Al mass ratio=2/3 in Al composition target.
The application of the Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate, which is characterized in that it can be mentioned Fluorescence detection sensitivity in high modern times spectral technique.
Beneficial effects of the present invention: operation of the present invention is simple, environmental-friendly, deposition velocity is fast, high-efficient, production cost Bottom, the film surface enhancing fluorescent base bottom for being easy to produce in batches, which is multilayered structure, passes through the alternating deposit on glass Au-Cu and Ag-Al preparation, the instrument of use is common magnetic control sputtering device.The present invention can make full use of different in composite membrane Metal and the multiple layering effect, that is, surface plasmon-polarition and local surface phasmon of multilayer film intercouple to realize width The surface enhanced of spectral limit fluorescence.
Detailed description of the invention
Fig. 1 is that embodiment STEM sectional view shows that prepared film is multilayered structure, and thickness in monolayer is controllable in 2-4nm;
Fig. 2 is that embodiment utilizes common glass slide, monofilm, multilayer film respectively to the fluorescence after phenanthrene, pyrene, anthracene fluorometric investigation Strength Changes.
Specific embodiment
A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate, preparation method the following steps are included:
It 1) will be spare after glass slide cleaning, drying.
2) Au-Cu and Ag-Al composition target being separately mounted on DC cathode, the glass slide after cleaning is packed into sample stage, The distance for adjusting target and substrate is 50mm.Au/Cu mass ratio=1/4, Ag/Al mass ratio=2/ in Au-Cu and Ag-Al composition target 3。
3) it is switched on, is evacuated to 1x10-3Then pa leads to people's argon gas, adjustment Ar flow is 30sccm, and adjustment operating air pressure is extremely 1.5Pa。
4) shielding power supply is opened, alternating sputtering Au-Cu and Ag-Al, wherein sputtering power is respectively 40W and 60W, and control is single Secondary sputtering time is 1min, and total sputtering time is 6min.
5) sputtering is completed, and closes shielding power supply, stops ventilation, closes molecular pump, powered-down source.Room is cooled under natural vacuum Temperature then takes out sample.
A kind of application of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate, can be improved modern spectrum skill Fluorescence detection sensitivity in art.
The performance test of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate: as shown in Figure 1 and Figure 2;
The test of STEM Cross Section Morphology shows that prepared film substrate is multilayered structure, and every layer of thickness is about 2-4 nm, always Thickness is about 25nm, to three kinds of differences when fluorometric investigation shows to do surface fluorescence enhancing substrate using monofilm Au-Cu, Ag-Al Phenanthrene, pyrene, anthracene the fluorescence enhancement factor be respectively 4,1.5,3 and 2,5,2, and when using multilayer film fluorescence enhancement substrate The fluorescence enhancement factor be respectively 9,7,8, i.e., Au-Cu/Ag-Al nano-multilayer film is a kind of very effective surface-enhanced fluorescence Substrate.

Claims (3)

1. a kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate, it is characterised in that: preparation method includes following step It is rapid:
It 1) will be spare after glass slide cleaning, drying;
2) Au-Cu and Ag-Al composition target is separately mounted on DC cathode, the glass slide after cleaning is packed into sample stage, adjustment The distance of target and substrate is 50mm;
3) it is switched on, is evacuated to 1x10-3Then pa leads to people's argon gas, adjustment Ar flow is 30sccm, and adjustment operating air pressure is extremely 1.5Pa;
4) shielding power supply is opened, alternating sputtering Au-Cu and Ag-Al, wherein sputtering power is respectively 40W and 60W, and control single splashes Penetrating the time is 1min, and total sputtering time is 6min;
5) it sputters and completes, close shielding power supply, stopping is ventilated, pass molecular pump, powered-down source, is cooled to room temperature under natural vacuum, so After take out sample, preparation-obtained film substrate is nano-multilayered structures, every layer with a thickness of 2-4 nm, overall thickness is about 25nm。
2. a kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate according to claim 1, feature exist In: Au/Cu mass ratio=1/4, Ag/Al mass ratio=2/3 in Au-Cu and Ag-Al composition target.
3. a kind of application of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate as described in claim 1, feature It is, the fluorescence detection sensitivity in modern spectral technique can be improved.
CN201710431891.XA 2017-06-09 2017-06-09 A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate and its application Active CN107267940B (en)

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CN109487221B (en) * 2018-12-12 2021-04-02 中国科学院合肥物质科学研究院 Ag-Au-Al-Cr-Cu nano composite film surface enhanced fluorescent substrate and preparation method thereof
CN115181953B (en) * 2022-09-09 2022-12-06 清华大学 Preparation method of surface plasmon thin film and method for preparing multilayer film metamaterial

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CN104372299A (en) * 2013-09-23 2015-02-25 中国科学院合肥物质科学研究院 Multilayer-structural hard wear-resistant lubrication coating and preparation method thereof

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CN102965538A (en) * 2012-11-10 2013-03-13 清华大学 Polycrystalline silver platinum alloy plasma thin-film material and preparation method thereof
CN103353451A (en) * 2013-07-04 2013-10-16 首都师范大学 Preparation method of nano probe
CN104280376A (en) * 2013-07-10 2015-01-14 任贻均 Surface enhanced Raman spectroscopy (SERS) sensing substrate and manufacturing method thereof
CN104372299A (en) * 2013-09-23 2015-02-25 中国科学院合肥物质科学研究院 Multilayer-structural hard wear-resistant lubrication coating and preparation method thereof
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