CN103353451A - Preparation method of nano probe - Google Patents
Preparation method of nano probe Download PDFInfo
- Publication number
- CN103353451A CN103353451A CN2013102781735A CN201310278173A CN103353451A CN 103353451 A CN103353451 A CN 103353451A CN 2013102781735 A CN2013102781735 A CN 2013102781735A CN 201310278173 A CN201310278173 A CN 201310278173A CN 103353451 A CN103353451 A CN 103353451A
- Authority
- CN
- China
- Prior art keywords
- probe
- nano
- silicon carbide
- noble metal
- silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a preparation method of a nano probe. The method comprises the steps as follows: (1) performing surface cleaning treatment to a silicone-based or carborundum-based probe, and arranging a cover on the whole probe except the point; (2) coating the silicone-based or carborundum-based probe with a nano-granularity noble metal film, noble metal alloy film or noble metal lamination through a vacuum evaporation coating technology or a magnetron sputtering technology, and removing the cover; (3) carrying out a TERS (Tip enhanced Raman spectroscopy) experiment on a nano probe prepared on TERS equipment, and counting the corresponding relations between enhanced properties of the nano probe and technical parameters of preparation according to experimental results; (4) adjusting the technical parameters of preparation according to the corresponding relations, and repeating the steps (1) to (4) until the nano probe meeting preset enhancement conditions is obtained.
Description
Technical field
The application relates to field of nanometer devices, relates in particular to a kind of preparation method of nano-probe.
Background technology
Raman spectrum and Surface enhanced raman spectroscopy can obtain the relevant information on intramolecule vibration, absorption behavior and material structure and surface thereof as a kind of analytical technology means.But be subjected to the restriction of optical diffraction limit, the spatial resolution of conventional far field Raman spectrum can't break through the restriction of optical diffraction half-wavelength, the average information of plurality of samples chemical composition in the certain area can only be obtained, the spectral information of nano-space resolution and local pattern can not be obtained simultaneously.Based on the TERS(Tip enhanced Raman spectroscopy of near field optic principle and scanning probe microscopy (SPM), Tip-Enhanced Raman Spectroscopy) appearance of technology solved this Raman spectroscopy problem.
Yet since the TERS technology was in the news, TERS technology progress experimentally was slow more than people's anticipation.The development of TERS technology and application are except depending on design level and the structural behaviour of optically coupled system, and the research and development technology level of TERS nano-probe also plays very important effect to the development of TERS technology simultaneously.Thereby how the TERS nano-probe that satisfies the TERS technical need is provided is a problem demanding prompt solution.
Summary of the invention
The preparation method who the purpose of this invention is to provide a kind of nano-probe can provide to have the excellent TERS nano-probe that strengthens effect.
For achieving the above object, the invention provides a kind of preparation method of nano-probe, comprising:
Step (1) is carried out cleaning surfaces to silica-based or silicon carbide-based probe and is processed, and blocks in the part setting except needle point;
Step (2) by vacuum evaporation coating membrane technology evaporation or noble metal film, precious metal alloys film or noble metal lamination by magnetron sputtering technique sputter nano particle size, and is removed described blocking at described silica-based or silicon carbide-based detecting probe surface;
Step (3) is used the nano-probe that makes at needle point enhancing Raman spectrum TERS equipment and is carried out the TERS experiment, adds up the corresponding relation of the enhanced propertied and preparation technology parameter of described nano-probe according to experimental result;
Step (4) is adjusted described preparation technology parameter according to described corresponding relation, and repeating step (1)-(3) are until be met the nano-probe of default enhancing condition.
Wherein, block and to comprise in the part setting except needle point: at the Wax-coated layer of described part except needle point or stickup barrier bed.
Wherein, describedly can comprise by vacuum evaporation coating membrane technology evaporation or the precious metal alloys film by magnetron sputtering technique sputter nano particle size:
It is the gold and silver target of 1:1 to 1:3 that molar ratio is set, and uses described gold and silver target that described precious metal alloys film is set.
Wherein, described precious metal alloys film by vacuum evaporation coating membrane technology evaporation nano particle size can comprise: heat described silica-based or silicon carbide-based probe.
Wherein, describedly can comprise by vacuum evaporation coating membrane technology evaporation or the noble metal lamination by magnetron sputtering technique sputter nano particle size:
Two above noble metal target materials are set simultaneously, are used alternatingly that described two above noble metal target materials carry out evaporation or sputter obtains the noble metal lamination.
Wherein, described two above noble metal target materials can comprise gold and silver-colored target, carry out evaporation or sputter obtains Yin-Jin-Yin lamination according to order silver-colored, the gold, silver target.
Step (2) can also comprise before:
Between described silica-based or silicon carbide-based probe and noble metal target material, precious metal network is set, less the closer to the density of the mesh of the described precious metal network in position of needle point.
Wherein, described precious metal network can comprise the structure of the proportional amplification of needle point of described silica-based or silicon carbide-based probe, and described needle point silica-based or silicon carbide-based probe is contained in the described precious metal network.
Step (2) can also comprise before: heat described silica-based or silicon carbide-based probe.
Based on technique scheme, the present invention makes nano-probe by at silica-based or silicon carbide-based detecting probe surface nanometer layer being set.Because silica-based or silicon carbide-based probe has stronger hardness, therefore, the nano-probe that makes by the present invention has stronger hardness, can be applied even more extensively in spectral detection.And, owing to test the adjusting process parameter that combines with TERS, can make the noble metal nano layer with better enhancing effect.
Description of drawings
Accompanying drawing described herein is used to provide a further understanding of the present invention, consists of the application's a part, and illustrative examples of the present invention and explanation thereof are used for explaining the present invention, do not consist of improper restriction of the present invention.In the accompanying drawings:
The preparation method's of the nano-probe that Fig. 1 provides for the application schematic flow sheet.
The synoptic diagram of the process of preparation silver nanoparticle film on the silicon probe that Fig. 2 provides for the embodiment of the present application one.
The synoptic diagram of the process of preparation silver nanoparticle film on the silicon probe that Fig. 3 provides for the embodiment of the present application two.
The synoptic diagram of the process of preparation silver nanoparticle film on the silicon probe that Fig. 4 provides for the embodiment of the present application three.
Embodiment
Below by drawings and Examples, technical scheme of the present invention is described in further detail.
The application provides a kind of preparation method of nano-probe, as shown in Figure 1, comprising:
Silica-based or silicon carbide-based detecting probe surface may exist greasy dirt or other impurity, need at first carry out cleaning surfaces and process, and removes these greasy dirts or other impurity.The mode that cleaning surfaces is processed comprises uses chemical method or physical method to clean, and for example with an organic solvent washs silica-based or silicon carbide-based detecting probe surface, perhaps, uses the silica-based or silicon carbide-based detecting probe surface of sand papering etc.Preferably, use five step ultrasonic cleaning methods that silica-based or silicon carbide-based detecting probe surface is carried out cleaning among the application, concrete steps comprise: use respectively deionized water-absolute ethyl alcohol-acetone-absolute ethyl alcohol-deionized water in turn ultrasonic cleaning five minutes of nano-probe, then the needle point after cleaning is carried out vacuum drying treatment.
In the present embodiment, for silica-based or silicon carbide-based detecting probe surface, only at the needle point position layer of precious metal is set, thereby avoids that the nanostructured noble metal outside the needle point has influence on whole enhancing effect in the TERS experiment.Therefore, thus needing in advance to block in the part setting outside the needle point avoids that part arranges the nano particle size noble metal outside the needle point of silica-based or silicon carbide-based probe.The concrete mode of blocking includes but not limited to Wax-coated layer, tygon organic coating, perhaps pastes other barrier bed, and these shielding modes need to be easy to be eliminated and can not bring other impurity at probe follow-up.
By vacuum evaporation coating membrane technology evaporation or by magnetron sputtering technique the nano-noble metal layer is set among the application, concrete setting procedure is introduced among the embodiment hereinafter in detail.After coating is set, also need to remove the coating outside the needle point, block owing to being provided with in the step 101 this moment, therefore, when blocking, removal just can remove the coating that blocks, the probe that stays only is provided with nano-noble metal coating at the needle point position, and use therein organic solvent comprises absolute ethyl alcohol, acetone etc.
In order to guarantee the consistance of TERS experiment, the tested reagent that will once make among the application is divided into many parts, and a copy of it reagent is used in each TERS experiment, thereby guarantees to greatest extent to cause that by the variation of nano-probe TERS strengthens the variation of effect.Preparation technology parameter specifically includes but not limited to sputtering time, argon flow amount, underlayer temperature, sputtering voltage-electric current and target lining spacing etc.
Default enhancing condition can be default enhancing rank, determines according to actual needs that by the user this paper is not restricted this.
Among the application, consider the difference of vacuum thermal evaporation coating technique and magnetron sputtering technique, preferably, wrap up one deck noble metal for example gold or silver nanoparticle film with the means of vacuum thermal evaporation plated film at for example existing silica-based needle surface, preparation TERS strengthens nanometer pinpoint with the formula of rapping (DFM); Adopt the magnetron sputtering means at existing silicon carbide-based contact (AFM) needle surface parcel gold/silver alloy nano thin-film or Yin-Jin-Yin sandwich film, strengthen TERS for the preparation of microcell scanning and strengthen nanometer pinpoint with AFM.And, use prepared all kinds of nanometers at the TERS equipment that sets in advance and strengthen probe, the enhancing efficient of full test probe and the relation of preparation technology parameter, and then the adjustment parameter of system control needle point pattern; The parameter indexs such as the thickness of needle surface coating noble metal nano thin-film, roughness reach desirable TERS and strengthen effect.
Specify the preparation method of the nano-probe that the application provides below by embodiment.
Embodiment one
Present embodiment provides a kind of preparation method of nanometer pinpoint, be introduced as example to prepare the silver nanoparticle film at the silicon detecting probe surface, be to be understood that, use silicon carbide-based probe, perhaps use other noble metals similar such as situation and the described situation of present embodiment of gold, platinum etc., can carry out with reference to the described process of present embodiment, i.e. present embodiment and the preparation that is not used in nano-probe is restricted to concrete certain probe or certain noble metal.
Lower mask body introduction as shown in Figure 2, may further comprise the steps in the process of silicon probe preparation silver nanoparticle film:
This step is similar with step 101, but refer step 101 does not repeat them here.
For promoting carrying out smoothly of plated film, except the temperature of the silver-colored target of control, can also heat the silicon needle point.
In addition, in order to control the homogeneity of silverskin on the silver nanoparticle needle point, can between silicon needle point and silver-colored target silver-colored net be set, the density of the mesh of silver net is lower the closer to needle point.In this way, intervene the interior target molecule of vacuum chamber to the distribution probability of detecting probe surface, improve the homogeneity on argentum nanometer probe surface.
The concrete shape of silver net can arrange flexibly according to actual conditions, the whole relatively proportional increase of silicon probe of silver net for example can be set, be that silver-colored net global shape also is probe shape, the silicon probe is contained in the silver net, and the silver-colored particle that silver-colored target is evaporated arrives the silicon probe by the mesh of silver net.
Technological parameter includes but not limited to evaporating temperature, vacuum tightness and the target lining spacing etc. of silver-colored target.
Other operations of this step can refer step 103, repeats no more herein.
In this step, material according to institute's evaporation is material boiling point and the saturated vapor pressure of silver, determine best evaporating temperature and vacuum tightness, so that the thickness of the silver-colored film of silicon needle surface is moderate, dense, smooth surface, the good difficult drop-off of the absorption property of film and needle point material.In the present embodiment, control evaporation rate by control evaporation molybdenum boat electric current, among the application the evaporation molybdenum boat electric current of silver-colored target at the 100-120 ampere, preferably 115 amperes.
Embodiment two
Present embodiment provides a kind of preparation method of nanometer pinpoint, is introduced as example to prepare the electrum nano thin-film at the silit detecting probe surface.Similar with embodiment one, be to be understood that, use the silicon probe, perhaps use situation and the described situation of present embodiment of other noble metals such as plation, silver-platinum alloy etc. similar, present embodiment and the preparation that is not used in nano-probe are restricted to concrete certain probe or certain noble metal.
Lower mask body introduction as shown in Figure 3, may further comprise the steps in the process of silit probe preparation electrum nano thin-film:
This step is similar with step 101, but refer step 101 does not repeat them here.
For promoting carrying out smoothly of plated film, can heat the silit needle point.
With among the upper embodiment similarly, in order to control the homogeneity of electrum on the nanometer silicon carbide needle point, golden net or silver-colored net or electrum net can be set correspondingly between silit needle point and gold and silver target, the density of mesh is lower the closer to needle point.
In order to prepare the electrum nano thin-film that is fit to TERS, can adjust the wherein content of gold and silver.For example, the content of the gold target material by adjusting usefulness and silver-colored target is adjusted the content of gold and silver in the electrum film.
Step 303 is used the electrum nano-probe that makes at TERS equipment and is carried out the TERS experiment, adds up the corresponding relation of the enhanced propertied and preparation technology parameter of gold and silver nano-probe according to experimental result.
Technological parameter includes but not limited to that the content of the sputtering rate, vacuum tightness of gold and silver target and target lining spacing, gold and silver compares.
Other operations of this step can refer step 103, repeats no more herein.
Step 304 is adjusted preparation technology parameter according to above-mentioned corresponding relation, and repeating step 301 to 304 is until be met the nano-probe of default enhancing condition.
In this step, adjust gold and silver content ratio, determine best gold and silver content ratio, so that moderate, dense, the smooth surface of the thickness of the electrum film of silicon needle surface, the good difficult drop-off of the absorption property of film and needle point material.In the present embodiment, the molar ratio of gold and silver is preferably in the scope of 1:1 to 1:3.
Embodiment three
Present embodiment provides a kind of preparation method of nanometer pinpoint, is introduced as an example of the sandwich structure for preparing Nano Silver-Jin-Yin at the silit detecting probe surface example.Similar with embodiment one, be to be understood that, use the silicon probe, perhaps use situation and the described situation of present embodiment of other noble metals Zhu Ru Jin-Yin-Jin, Jin-Yin-platinum etc. or more laminations similar, present embodiment also is not used in the structure that the preparation of nano-probe is restricted to concrete certain probe or certain noble metal or the specific number of plies.
Lower mask body introduction as shown in Figure 4, may further comprise the steps in the stacked process of silit probe preparation Yin Jinyin Nanoalloy:
Step 401 is carried out cleaning surfaces to the silicon probe and is processed.
This step is similar with step 101, but refer step 101 does not repeat them here.
Ground similar to the above embodiments for promoting carrying out smoothly of plated film, can heat the silit needle point, and golden net or silver-colored net or electrum net can correspondingly be set between silit needle point and gold and silver target.
In the present embodiment, two gold and silver-colored target are set simultaneously, carry out sputter according to the order of silver, gold, silver target and obtain Yin-Jin-Yin lamination.Perhaps, two silver medals, one gold target material is set simultaneously, carries out sputter according to the order of silver, gold, silver target and obtain Yin-Jin-Yin lamination, thereby control better the thickness of every one deck.
Step 403 is used the Yin-Jin make-stacked probe of silver nanoparticle at TERS equipment and is carried out the TERS experiment, according to the corresponding relation of the enhanced propertied and preparation technology parameter of experimental result statistics Yin-Jin-stacked probe of silver nanoparticle.
Technological parameter includes but not limited to sputtering rate, vacuum tightness and target lining spacing, the thickness (sputtering time) of each individual layer and total thickness etc. of gold and silver target.
Other operations of this step can refer step 103, repeats no more herein.
Step 404 is adjusted preparation technology parameter according to above-mentioned corresponding relation, and repeating step 401 to 404 is until be met the nano-probe of default enhancing condition.
Although be described with sandwich structure in the present embodiment, should be noted that in preparation process to increase or to reduce the number of plies, for example only prepares 2 layers or prepare structure more than 4 layers, and the application is not restricted this.
Should be noted that at last: above embodiment is only in order to illustrate that technical scheme of the present invention is not intended to limit; Although with reference to preferred embodiment the present invention is had been described in detail, those of ordinary skill in the field are to be understood that: still can make amendment or the part technical characterictic is equal to replacement the specific embodiment of the present invention; And not breaking away from the spirit of technical solution of the present invention, it all should be encompassed in the middle of the technical scheme scope that the present invention asks for protection.
Claims (10)
1. the preparation method of a nano-probe is characterized in that, comprising:
Step (1) is carried out cleaning surfaces to silica-based or silicon carbide-based probe and is processed, and blocks in the part setting except needle point;
Step (2) by vacuum evaporation coating membrane technology evaporation or noble metal film, precious metal alloys film or noble metal lamination by magnetron sputtering technique sputter nano particle size, and is removed described blocking at described silica-based or silicon carbide-based detecting probe surface;
Step (3) is used the nano-probe that makes at needle point enhancing Raman spectrum TERS equipment and is carried out the TERS experiment, adds up the corresponding relation of the enhanced propertied and preparation technology parameter of described nano-probe according to experimental result;
Step (4) is adjusted described preparation technology parameter according to described corresponding relation, and repeating step (1)-(4) are until be met the nano-probe of default enhancing condition.
2. the method for claim 1 is characterized in that, blocks in the part setting except needle point to comprise: at the Wax-coated layer of described part except needle point, tygon organic coating or stickup barrier bed.
3. the method for claim 1 is characterized in that, describedly comprises by vacuum evaporation coating membrane technology evaporation or the precious metal alloys film by magnetron sputtering technique sputter nano particle size:
It is the gold and silver target of 1:1 to 1:3 that molar ratio is set, and uses described gold and silver target that described precious metal alloys film is set.
4. the method for claim 1 is characterized in that, described precious metal alloys film by vacuum evaporation coating membrane technology evaporation nano particle size comprises: heat described silica-based or silicon carbide-based probe.
5. the method for claim 1 is characterized in that, describedly comprises by vacuum evaporation coating membrane technology evaporation or the noble metal lamination by magnetron sputtering technique sputter nano particle size:
Two above noble metal target materials are set simultaneously, are used alternatingly that described two above noble metal target materials carry out evaporation or sputter obtains the noble metal lamination.
6. method as claimed in claim 5 is characterized in that, described two above noble metal target materials comprise gold and silver-colored target, carries out evaporation or sputter obtains Yin-Jin-Yin lamination according to order silver-colored, the gold, silver target.
7. such as each described method of claim 1-6, it is characterized in that step (2) also comprises before:
Between described silica-based or silicon carbide-based probe and noble metal target material, precious metal network is set, less the closer to the density of the mesh of the described precious metal network in position of needle point.
8. method as claimed in claim 7 is characterized in that, described precious metal network comprises the structure of the proportional amplification of needle point of described silica-based or silicon carbide-based probe, and described needle point silica-based or silicon carbide-based probe is contained in the described precious metal network.
9. such as each described method of claim 1-6, it is characterized in that step (2) also comprises before: heat described silica-based or silicon carbide-based probe.
10. such as each described method of claim 1-6, it is characterized in that step (1) comprising: with an organic solvent wash described silica-based or silicon carbide-based detecting probe surface, perhaps use the described silica-based or silicon carbide-based detecting probe surface of sand papering; Perhaps use respectively deionized water-absolute ethyl alcohol-acetone-absolute ethyl alcohol-deionized water to described silica-based or silicon carbide-based detecting probe surface ultrasonic cleaning five minutes, then described silica-based the or silicon carbide-based probe after cleaning is carried out vacuum drying treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310278173.5A CN103353451B (en) | 2013-07-04 | 2013-07-04 | Preparation method of nano probe |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310278173.5A CN103353451B (en) | 2013-07-04 | 2013-07-04 | Preparation method of nano probe |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103353451A true CN103353451A (en) | 2013-10-16 |
| CN103353451B CN103353451B (en) | 2015-04-08 |
Family
ID=49309845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310278173.5A Active CN103353451B (en) | 2013-07-04 | 2013-07-04 | Preparation method of nano probe |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103353451B (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103808968A (en) * | 2014-02-18 | 2014-05-21 | 中国科学院化学研究所 | Metal modified atomic force microscopy (AFM) tip for tip enhanced Raman spectroscopy and preparation method thereof |
| CN105403551A (en) * | 2015-10-30 | 2016-03-16 | 上海纳米技术及应用国家工程研究中心有限公司 | Preparation method of thin film with Raman enhancing performance |
| CN107267940A (en) * | 2017-06-09 | 2017-10-20 | 中国科学院合肥物质科学研究院 | A kind of Au Cu/Ag Al nano-multilayer film surface-enhanced fluorescence substrates and its application |
| CN109487221A (en) * | 2018-12-12 | 2019-03-19 | 中国科学院合肥物质科学研究院 | A kind of Ag-Au-Al-Cr-Cu nano composite membrane surface-enhanced fluorescence substrate and preparation method thereof |
| CN110373708A (en) * | 2019-07-31 | 2019-10-25 | 东南大学 | Adjustable concentration realizes that the nanometer pinpoint of needle point cone angle control prepares platform and method |
| CN112481582A (en) * | 2020-12-22 | 2021-03-12 | 珠海拓优电子有限公司 | Nano-coating probe and preparation method thereof |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009236830A (en) * | 2008-03-28 | 2009-10-15 | Sumitomo Precision Prod Co Ltd | Analyte carrier and its manufacturing method |
| WO2010056258A1 (en) * | 2008-11-17 | 2010-05-20 | Hewlett-Packard Development Company, L.P. | A substrate for surface enhanced raman scattering (sers) |
| CN101923054A (en) * | 2009-06-12 | 2010-12-22 | 中国科学院上海硅酸盐研究所 | Non-aperture tip enhanced Raman scattering probe and manufacturing method thereof |
| CN102041507A (en) * | 2009-10-23 | 2011-05-04 | 中国科学院合肥物质科学研究院 | Top silver-cladding gold nanorod array and preparation method and application thereof |
| CN102525421A (en) * | 2011-05-18 | 2012-07-04 | 东南大学 | Detecting micro-needle with strengthened Raman and fluorescence signal and preparation method thereof |
| CN102749317A (en) * | 2012-06-18 | 2012-10-24 | 东南大学 | Surface enhanced Raman scattering probe based on carbon nanotube and preparation method thereof |
| CN102886933A (en) * | 2011-07-21 | 2013-01-23 | 中国科学院上海硅酸盐研究所 | High-sensitivity SERS (surface enhanced Raman scattering) sensor active-substrate for drug detection and preparation method thereof |
-
2013
- 2013-07-04 CN CN201310278173.5A patent/CN103353451B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009236830A (en) * | 2008-03-28 | 2009-10-15 | Sumitomo Precision Prod Co Ltd | Analyte carrier and its manufacturing method |
| WO2010056258A1 (en) * | 2008-11-17 | 2010-05-20 | Hewlett-Packard Development Company, L.P. | A substrate for surface enhanced raman scattering (sers) |
| CN101923054A (en) * | 2009-06-12 | 2010-12-22 | 中国科学院上海硅酸盐研究所 | Non-aperture tip enhanced Raman scattering probe and manufacturing method thereof |
| CN102041507A (en) * | 2009-10-23 | 2011-05-04 | 中国科学院合肥物质科学研究院 | Top silver-cladding gold nanorod array and preparation method and application thereof |
| CN102525421A (en) * | 2011-05-18 | 2012-07-04 | 东南大学 | Detecting micro-needle with strengthened Raman and fluorescence signal and preparation method thereof |
| CN102886933A (en) * | 2011-07-21 | 2013-01-23 | 中国科学院上海硅酸盐研究所 | High-sensitivity SERS (surface enhanced Raman scattering) sensor active-substrate for drug detection and preparation method thereof |
| CN102749317A (en) * | 2012-06-18 | 2012-10-24 | 东南大学 | Surface enhanced Raman scattering probe based on carbon nanotube and preparation method thereof |
Non-Patent Citations (4)
| Title |
|---|
| NORIHIKO HAYAZAWA ET AL.: "Near-field Raman scattering enhanced by a metallized tip", 《CHEMICAL PHYSICS LETTERS》, vol. 335, 31 March 2001 (2001-03-31), pages 369 - 374, XP002971357, DOI: doi:10.1016/S0009-2614(01)00065-3 * |
| XIAOHUI JI，ET AL.: "Immunoassay using the probe-labeled Au/Ag core-shell nanoparticles based on surface-enhanced Raman scattering", 《COLLOIDS AND SURFACES A》, 31 December 2005 (2005-12-31), pages 171 - 175 * |
| 周细应等: "磁控共溅射制备Al-Cu薄膜分析", 《轻金属》, no. 12, 31 December 2007 (2007-12-31), pages 63 - 66 * |
| 王瑞等: "针尖增强拉曼光谱术原理与系统设计关键", 《激光与光电子学进展》, 31 December 2010 (2010-12-31) * |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103808968A (en) * | 2014-02-18 | 2014-05-21 | 中国科学院化学研究所 | Metal modified atomic force microscopy (AFM) tip for tip enhanced Raman spectroscopy and preparation method thereof |
| CN103808968B (en) * | 2014-02-18 | 2015-10-28 | 中国科学院化学研究所 | For afm tip and the method for making thereof of the metal-modified of Tip-Enhanced Raman Spectroscopy |
| CN105403551A (en) * | 2015-10-30 | 2016-03-16 | 上海纳米技术及应用国家工程研究中心有限公司 | Preparation method of thin film with Raman enhancing performance |
| CN105403551B (en) * | 2015-10-30 | 2018-02-09 | 上海纳米技术及应用国家工程研究中心有限公司 | A kind of preparation method with Raman-enhancing energy film |
| CN107267940A (en) * | 2017-06-09 | 2017-10-20 | 中国科学院合肥物质科学研究院 | A kind of Au Cu/Ag Al nano-multilayer film surface-enhanced fluorescence substrates and its application |
| CN107267940B (en) * | 2017-06-09 | 2019-06-18 | 中国科学院合肥物质科学研究院 | A kind of Au-Cu/Ag-Al nano-multilayer film surface-enhanced fluorescence substrate and its application |
| CN109487221A (en) * | 2018-12-12 | 2019-03-19 | 中国科学院合肥物质科学研究院 | A kind of Ag-Au-Al-Cr-Cu nano composite membrane surface-enhanced fluorescence substrate and preparation method thereof |
| CN109487221B (en) * | 2018-12-12 | 2021-04-02 | 中国科学院合肥物质科学研究院 | Ag-Au-Al-Cr-Cu nano composite film surface enhanced fluorescent substrate and preparation method thereof |
| CN110373708A (en) * | 2019-07-31 | 2019-10-25 | 东南大学 | Adjustable concentration realizes that the nanometer pinpoint of needle point cone angle control prepares platform and method |
| CN110373708B (en) * | 2019-07-31 | 2021-04-30 | 东南大学 | Nano needle tip preparation platform and method for adjusting concentration to realize needle tip cone angle control |
| CN112481582A (en) * | 2020-12-22 | 2021-03-12 | 珠海拓优电子有限公司 | Nano-coating probe and preparation method thereof |
| CN112481582B (en) * | 2020-12-22 | 2024-04-05 | 珠海拓优电子有限公司 | Nano-coating probe and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103353451B (en) | 2015-04-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103353451A (en) | Preparation method of nano probe | |
| Cheng et al. | Plasma electrolytic oxidation of brass | |
| Johnson et al. | Soft landing of bare nanoparticles with controlled size, composition, and morphology | |
| Byeon et al. | Spark generation of monometallic and bimetallic aerosol nanoparticles | |
| Tran et al. | Facile fabrication of sensitive surface enhanced Raman scattering substrate based on CuO/Ag core/shell nanowires | |
| Yi et al. | Preparation of dendritic Ag/Au bimetallic nanostructures and their application in surface-enhanced Raman scattering | |
| CN103063707A (en) | Preparation method for gas-sensitive material with composite structure | |
| El Mel et al. | Creating nanoporosity in silver nanocolumns by direct exposure to radio-frequency air plasma | |
| Ma et al. | SERS study of Ag/FeS/4-MBA interface based on the SPR effect | |
| CN104495850B (en) | Preparation method of SiC/graphene core-shell structured nano material | |
| Rezaee et al. | Synthesis of Ag-Cu-Pd alloy thin films by DC-magnetron sputtering: Case study on microstructures and optical properties | |
| Orús et al. | Focused ion beam induced processing | |
| Arnas et al. | Analyses of dust samples collected in the MAST tokamak | |
| Oláh et al. | TiC crystallite formation and the role of interfacial energies on the composition during the deposition process of TiC/a: C thin films | |
| Yan et al. | Effect of thermal activation energy on the structure and conductivity corrosion resistance of Cr doped TiN films on metal bipolar plate | |
| Haas et al. | Synthesis of copper dendrite nanostructures by a sonoelectrochemical method | |
| Francioso et al. | Top-down contact lithography fabrication of a TiO2 nanowire array over a SiO2 mesa | |
| Gubert et al. | Effect of wavelength and fluence in laser-induced iron nitride nanostructures | |
| Liu et al. | Diffusion behavior of Ag in TiO2 nanofilms | |
| US20100206720A1 (en) | Method of producing inorganic nanoparticles | |
| Bisht et al. | Growth of dense CNT on the multilayer graphene film by the microwave plasma enhanced chemical vapor deposition technique and their field emission properties | |
| Zhang et al. | Single layer porous gold films grown at different temperatures | |
| Peng et al. | Comparative investigations of stainless steel and molybdenum first mirrors cleaning using radio frequency plasma | |
| Mehrvar et al. | Fine-tunable plasma nano-machining for fabrication of 3D hollow nanostructures: SERS application | |
| Rao et al. | Layer engineering of graphene with oxygen plasma etching |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |