CN107255904B - Open type photomask storage device - Google Patents
Open type photomask storage device Download PDFInfo
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- CN107255904B CN107255904B CN201710607022.8A CN201710607022A CN107255904B CN 107255904 B CN107255904 B CN 107255904B CN 201710607022 A CN201710607022 A CN 201710607022A CN 107255904 B CN107255904 B CN 107255904B
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- air
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- box body
- open
- bearing frame
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
Abstract
The invention discloses an open type photomask storage device, which comprises a storage box body, wherein the lower part of one side of the storage box body is of an open structure, an air outlet is arranged right above the open structure, and airflow flowing out of the air outlet moves downwards to form an air wall and cover the open structure; a chemical filter, a fan and an air filter are arranged at the upper part in the storage box body; the lower part in the storage box body is provided with at least 1 layer of photomask bearing frame, the outer side of the photomask bearing frame is close to the open structure, and the inner side of the photomask bearing frame and the storage box body form a return air channel. According to the invention, one side of the storage box body is designed to be the open structure, and the light shield is taken and stored through the open structure, so that the problem of inconvenient transportation caused by the existence of a door in the prior art is solved.
Description
Technical Field
The invention relates to a storage device, in particular to an open type photomask storage device.
Background
The photomask, also known as MASK plate and MASK plate in the industry, is called MASK or reticle in English, is made of quartz glass and metal chromium, is used for repeatedly copying patterns on a produced product through a photoetching process, and is widely applied to industries of modern electronics, semiconductors, flat panel displays, LEDs and the like. Due to the repeated copying characteristic of the pattern of the mask, the pattern of the mask is not allowed to have excessive or disappearing patterns from the viewpoint of mass production.
The current microelectronic manufacturing technology is rapidly developing, and therefore the demand of the corresponding products for the production environment is also increasing. For the microelectronic manufacturing industry, molecular air pollutants (or airborne molecular pollutants, abbreviated as AMC) in the air, like particles, can harm products and directly lead to yield reduction. Molecular level air pollutants exist in gaseous form, and high efficiency air particle filters (HEPA) or ultra high efficiency air particle filters (ULPA) cannot filter AMC at all. The control of molecular-scale air pollution in microelectronics buildings is becoming increasingly important. Currently, the AMC international classification standards include ITRS, SEMI, ISO 14644-8 and JACA 35, and SEMI (SEMI F21-1102). The standard is classified into four categories for AMC: acidic AMC (MA), basic AMC (MB), coagulum AMC (MC), and doping substance AMC (MD).
In the above-mentioned AMC, in the photolithography process, since the wavelength of the used light has a certain energy, the molecular gas of AMC in the photomask often forms crystallization reaction and deposition on the mask pattern, thereby changing the original pattern of the photomask.
Therefore, to avoid the impact of AMC on the reticle, reticle storage devices have emerged. The existing photomask storage device is shown in fig. 1-2 and mainly comprises a storage box body 1, wherein a door 2 (which serves as an inlet and an outlet of a photomask) is arranged on one side of the storage box body, a fan 3 and an ultra-efficient air particle filter 4 (which is used for continuously sending clean air into the storage box body) are arranged at the top of the storage box body, a photomask storage area is arranged inside the storage box body, and a multi-layer support 5 can be arranged in the storage box body to bear a photomask 6. The direction of airflow is shown with reference to figure 2. When the light cover needs to be moved, the door is opened first and then the light cover is carried. However, the following problems are found in practical applications: (1) because the existing photomask has a large size (generally 800X 600 mm), when the photomask is transported from a doorway, the transportation is inconvenient because of the existence of a door, and finally the door even needs to be dismantled; (2) because ULPA cannot filter AMC, it is necessary to install a chemical filter at the inlet of the blower, which seriously affects the life of the chemical filter, resulting in high cost.
Therefore, the development of a novel photomask storage device can greatly prolong the service life of the chemical filter while being convenient to carry, so as to reduce the cost, and obviously has positive practical significance.
Disclosure of Invention
The invention aims to provide an open type photomask storage device.
In order to achieve the purpose of the invention, the technical scheme adopted by the invention is as follows: an open type photomask storage device comprises a storage box body, wherein the lower part of one side of the storage box body is of an open structure, an air outlet is arranged right above the open structure, and airflow flowing out of the air outlet moves downwards to form an air wall and cover the open structure;
a chemical filter, a fan and an air filter are arranged at the upper part in the storage box body; the lower part in the storage box body is provided with at least 1 layer of photomask bearing frame, the outer side of the photomask bearing frame is close to the open structure, and the inner side of the photomask bearing frame and the storage box body form a return air channel;
the clean air coming out of the air filter moves downwards from the air outlet, part of the clean air flows through the photomask bearing frame and enters the air return channel, and the outlet of the air return channel is communicated with the chemical filter and the air filter, so that air flow circulation is formed.
In the above, the lower part of one side of the storage box body is of an open structure, so that the light shield can be conveniently taken and stored.
The air flow that flows out by the air outlet moves down, forms the air wall and covers uncovered structure utilizes the drainage method, and dirty air can be introduced in clean air's the outside, nevertheless because holistic air current direction all is downwards, can avoid the diffusion of horizontal direction, can be in order to avoid the dirty air in the air wall outside to get into uncovered structure.
The outer side of the reticle carrier is the exit side thereof for removal of a reticle, where the outer side is adjacent to the open structure. The inner side of the mask carrier is opposite to the outer side, which is the side of the mask carrier away from the open structure.
In the above technical scheme, the storage box body is further provided with a fresh air supplement opening. Used for supplementing a small amount of clean air.
Preferably, the fresh air supplement inlet is communicated with the return air channel and is adjacent to the chemical filter and the air filter.
Preferably, the upper part in the storage box body is sequentially provided with a chemical filter, a fan and an air filter. Of course, the positions of the above 3 components can be adjusted according to actual needs.
In the technical scheme, a temperature control device is further arranged in the storage box body. Preferably, the temperature control device is arranged at the fresh air supply inlet.
In the above technical solution, the mask bearing frames in the storage box are multi-layered, and the outward extending length of the outer side of each layer of mask bearing frame gradually increases from top to bottom. This structure can be used as an air flow baffle for guiding the clean air flowing out from the air outlet downwards into the mask carrier and its mask storage area.
Preferably, the photomask bearing frame in the storage box body is multi-layer, and a plurality of ventilation openings are formed in the inner side of the photomask bearing frame and communicated with the return air channel; and the total area of the ventilation openings on each layer of the photomask bearing frame is gradually reduced from top to bottom. This mesoporous drag design may better maintain uniform draft through the layers of reticle carriers.
Preferably, the air filter is an ultra-high efficiency air particle filter. I.e., ULPA.
Preferably, the direction of the airflow flowing out of the air outlet is parallel to the plane of the open structure. Preferably, the plane of the open structure is perpendicular to the horizontal plane, so that the direction of the airflow flowing out of the air outlet is preferably vertical downward.
In the above technical scheme, the top of the storage box body is provided with a top cover with a detachable structure. The top cover can be lifted up for replacing the chemical filter, the fan and the air filter, and is particularly convenient for replacing the chemical filter.
Preferably, the outer side of the air outlet is provided with a drainage plate, a drainage port is formed between the drainage plate and the outer side wall of the air outlet, and the main air flow flowing out of the air outlet and the bleed air flow flowing out of the drainage port form an air wall together. The bleed air flow may also be referred to as a secondary flow, known in english as an induced flow or an induced secondary flow or a secondary induced flow.
In the above technical scheme, the ratio of the flow velocity of the air flow flowing out of the air outlet to the height of the open structure is 3-4 m/s: 1.5 to 2.5 m.
Preferably, the bottom of the storage box body is provided with rollers. To facilitate its own movement.
Due to the application of the technical scheme, compared with the prior art, the invention has the following advantages:
1. the invention designs a novel open type photomask storage device, one side of a storage box body is designed into an open structure, and the photomask is taken and stored through the open structure, so that the problem of inconvenient transportation caused by the existence of a door in the prior art is solved;
2. according to the invention, the air outlet is arranged right above the open structure, and the airflow flowing out of the air outlet moves downwards to form the air wall and cover the open structure, so that the air wall can avoid air diffusion in the horizontal direction, namely, unclean air outside the air wall can be prevented from entering the open structure, and a sealing structure of the storage device is formed; meanwhile, the length of the photomask bearing frame extending outwards from the outer side of each layer of photomask bearing frame from top to bottom is gradually increased, so that clean air flowing downwards from the air outlet is guided to enter the photomask bearing frame and a photomask storage area of the photomask bearing frame, and the interference of unclean air on the open photomask storage device is reduced;
3. the invention utilizes the structure that the air wall is formed by the air flow of the air outlet and the length of the outer side of the photomask bearing frame is gradually increased to realize that the interior of the open photomask storage device is in a close closed state, thereby avoiding the influence of the external air on the chemical filter, greatly prolonging the service life of the chemical filter, not only avoiding the influence of AMC on the photomask, but also reducing the cost of the device, and having positive practical significance and economic significance;
4. the device has simple structure, is easy to prepare and use, and is suitable for popularization and application.
Drawings
FIG. 1 is a schematic diagram of a conventional mask storage device in the background art.
Fig. 2 is a schematic view of the gas flow of fig. 1.
Fig. 3 is a schematic structural diagram of a first embodiment of the present invention.
Fig. 4 is a schematic view of the gas flow of fig. 3.
Fig. 5 is an enlarged view of a portion a in fig. 4.
Fig. 6 is a schematic structural diagram of a second embodiment of the present invention.
Fig. 7 is a schematic view of the gas flow of fig. 5.
Wherein: 1. a storage box body; 2. a door; 3. a fan; 4. an ultra-high efficiency air particulate filter; 5. a support; 6. a photomask; 7. an air outlet; 8. a chemical filter; 9. a mask carrier; 10. an air return channel; 11. a fresh air supply port; 12. a temperature control device; 13. a roller; 14. a drainage plate.
Detailed Description
The invention is further described with reference to the following figures and examples:
example one
Referring to fig. 3 to 5, an open type mask storage device comprises a storage box 1, the lower part of one side of the storage box is an open structure, an air outlet 7 is arranged right above the open structure,
a drainage plate 14 is arranged on the outer side of the air outlet, a drainage port is formed between the drainage plate and the outer side wall of the air outlet, and the main air flow flowing out of the air outlet and the bleed air flow flowing out of the drainage port form an air wall together and cover the open structure; as shown in fig. 5;
a chemical filter 8, a fan 3 and an air filter are arranged at the upper part in the storage box body; the lower part in the storage box body is provided with 4 layers of photomask bearing frames 9, the outer sides of the photomask bearing frames are close to the open structure, and the inner sides of the photomask bearing frames and the storage box body form a return air channel 10;
the clean air coming out of the air filter moves downwards from the air outlet, part of the clean air flows through the photomask bearing frame and enters the air return channel, and the outlet of the air return channel is communicated with the chemical filter and the air filter, so that air flow circulation is formed.
The lower part of one side of the storage box body is of an open structure, so that the light shield can be conveniently taken and stored. Referring to fig. 3, the lower part of the right side is in an open structure.
The air flow that flows out by the air outlet moves down, forms the air wall and covers uncovered structure utilizes the drainage method, and dirty air can be introduced in clean air's the outside, nevertheless because holistic air current direction all is downwards, can avoid the diffusion of horizontal direction, can be in order to avoid the dirty air in the air wall outside to get into uncovered structure.
The outer side of the reticle carrier is the exit side thereof for removal of a reticle, where the outer side is adjacent to the open structure. The inner side of the mask carrier is opposite to the outer side, which is the side of the mask carrier away from the open structure.
The storage box body is also provided with a fresh air supplement port 11. The storage box body is also provided with a temperature control device 12. The mask carrier 9 is used to carry the mask 6. The bottom of the storage box is provided with rollers 13 to facilitate its own movement.
And the upper part in the storage box body is sequentially provided with a chemical filter, a fan and an air filter.
The photomask bearing frames in the storage box body are 4 layers, and the outward extending length of the outer side of each layer of photomask bearing frame is gradually increased from top to bottom. This structure can be used as an air flow baffle for guiding the clean air flowing out from the air outlet downwards into the mask carrier and its mask storage area.
The photomask bearing frame in the storage box body is multi-layer, and a plurality of ventilation openings are formed in the inner side of the photomask bearing frame and communicated with the return air channel; and the total area of the ventilation openings on each layer of the photomask bearing frame is gradually reduced from top to bottom. This mesoporous drag design may better maintain uniform draft through the layers of reticle carriers.
The air filter is an ultra-efficient air particle filter 4.
The direction of the airflow flowing out of the air outlet is parallel to the plane of the open structure. The top of the storage box body is provided with a top cover with a detachable structure. In this embodiment, the direction of the airflow flowing out of the air outlet is vertical downward.
The ratio of the flow velocity of the airflow flowing out of the air outlet to the height of the open structure is 3-4 m/s: 1.5 to 2.5 m. Preferably 3.5 m/s: 2 m, respectively.
Example two
Referring to fig. 6 to 7, an open mask storage device has a structure substantially the same as that of the embodiment, except that: the chemical filter 8, the fan 3 and the ultra-high efficiency air particle filter 4 are vertically arranged, and the air outlet 7 is arranged at the outlet of the ultra-high efficiency air particle filter. This configuration is more suitable for the flow of the gas stream, as shown in fig. 6.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (9)
1. An open mask storage device, comprising: the air-wall-type storage box comprises a storage box body (1), wherein the lower part of one side of the storage box body is of an open structure, an air outlet (7) is arranged right above the open structure, and air flow flowing out of the air outlet moves downwards to form an air wall and cover the open structure;
a chemical filter (8), a fan (3) and an air filter are arranged at the upper part in the storage box body; the lower part in the storage box body is provided with at least 1 layer of photomask bearing frame (9), the outer side of the photomask bearing frame is close to the open structure, and the inner side of the photomask bearing frame and the storage box body form a return air channel (10);
the clean gas from the air filter moves downwards from the air outlet, part of the clean gas flows through the photomask bearing frame and enters the return air channel, and the outlet of the return air channel is communicated with the chemical filter and the air filter, so that airflow circulation is formed;
the photomask bearing frames in the storage box body are in multiple layers, and the outward extending length of the outer side of each layer of photomask bearing frame is gradually increased from top to bottom.
2. The open reticle storage device of claim 1, wherein: the storage box body is also provided with a fresh air supplement port (11).
3. The open reticle storage device of claim 1, wherein: and the upper part in the storage box body is sequentially provided with a chemical filter, a fan and an air filter.
4. The open reticle storage device of claim 1, wherein: the storage box body is also internally provided with a temperature control device (12).
5. The open reticle storage device of claim 1, wherein: the photomask bearing frame in the storage box body is multi-layer, and a plurality of ventilation openings are formed in the inner side of the photomask bearing frame and communicated with the return air channel; and the total area of the ventilation openings on each layer of the photomask bearing frame is gradually reduced from top to bottom.
6. The open reticle storage device of claim 1, wherein: the air filter is an ultra-efficient air particle filter.
7. The open reticle storage device of claim 1, wherein: the direction of the airflow flowing out of the air outlet is parallel to the plane of the open structure.
8. The open reticle storage device of claim 1, wherein: the outside at air outlet department is equipped with drainage plate (14), forms the drainage mouth between the lateral wall of drainage plate and air outlet, forms the air wall together by the main air current that the air outlet flows and the bleed air current that the drainage mouth flows.
9. The open reticle storage device of claim 1, wherein: the ratio of the flow velocity of the airflow flowing out of the air outlet to the height of the open structure is 3-4 m/s: 1.5 to 2.5 m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710607022.8A CN107255904B (en) | 2017-07-24 | 2017-07-24 | Open type photomask storage device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710607022.8A CN107255904B (en) | 2017-07-24 | 2017-07-24 | Open type photomask storage device |
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| CN107255904A CN107255904A (en) | 2017-10-17 |
| CN107255904B true CN107255904B (en) | 2020-11-17 |
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| CN201710607022.8A Active CN107255904B (en) | 2017-07-24 | 2017-07-24 | Open type photomask storage device |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111279265B (en) * | 2017-10-25 | 2023-04-18 | 卡尔蔡司Smt有限责任公司 | Method for temperature control of a component |
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| CN102219174B (en) * | 2011-05-10 | 2012-10-17 | 浙江卫信生物药业有限公司 | Dust removing device with air curtain separation and self-circulation purification |
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| CN201281423Y (en) * | 2008-07-21 | 2009-07-29 | 比亚迪股份有限公司 | Air curtain equipment |
| CN202207518U (en) * | 2011-08-15 | 2012-05-02 | 东莞市富莱仕空调净化科技有限公司 | Workbench with air return function |
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