CN1072117C - 喷墨头电阻层的制程 - Google Patents
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Abstract
一种喷墨头电阻层的制程,其系于选定的基板上,以热氧化法(Thermal Oxidation)形成一介电层,再于该介电层上溅镀(Sputtering)一第一电阻层,而于该第一电阻层上溅镀一掺质层,又于该掺质层上溅镀一第二电阻层,继之通过一快速热制程步骤(Rapid Thermal Processing,RTP),将使该掺质层扩散至该第一电阻层与该第二电阻层,以避免电子迁移现象(Electron Migration)发生,而得到特性较佳的喷墨头结构。
Description
本发明涉及一种喷墨头电阻层的制程,尤指一种可提高喷墨头性能之喷墨头电阻层的制程。
首先,请配合参阅图1,可得知由现有技术制作以电阻加热元件煮沸墨水,使墨水经由喷孔喷出的气泡的气泡式喷墨头时,其系先以一热氧化法(Thermal Oxidation),形成一二氧化矽层12于一矽基板11上方,并于该二氧化矽层12上形成一电阻层13,而一般于喷墨头电阻层13之制程步骤中,其系直接以一直流溅镀(DC Sputtering)方式形成该电阻层13,且其中该电阻层13系为一钽铝合金(TaAl)层,之后,再形成一铝制导电层14于部分该电阻层13上方,并形成一氮化矽/碳化矽层的保护层15于未被该导电层14覆盖之该电阻层13上方及该导电层14上方,再形成一外隔层16于该保护层15上方,最后涂附上胶著剂,以供固贴一喷嘴片17,使得以完成一喷墨头的制程。
显然地,上述常用作法的缺陷即在于:借助于钽铝合金(TaAl)所形成的电阻层13,由于钽铝合金(TaAl)本身为一高电阻值材料,且将严重导致电子迁移现象(Elcctron Migtation)发生,因而将缩短喷墨头的使用寿命。
本发明主要目的,即在于提供一种可避免电子迁移现象(ElcctronMigtation)发生,以降低电阻层的电阻值,而能提高喷墨头使用寿命之喷墨头电阻层的制程。
本发明的喷墨头电阻层的制程,其制程步骤包括:(a)形成一介电层于一基板上;(b)形成一第一电阻层于该介电层上;(c)形成一掺质层于该第一电阻层上;(d)形成一第二电阻层于该掺质层上;以及(c)施行一热处理步骤,以使该掺质层扩散至该第一电阻层与该第二电阻层,形成该喷墨头的电阻层。
如上所述,该电阻层的制程,其中,该基板系可为一矽基板,且该介电层系以一热氧化法(Thermal Oxidation)之方式,形成于该矽基板上,而较佳地,该介电层系可为一二氧化矽(SiO2)层。
而于该介电层上,以一直流溅镀方式(DC Sputtering)形成该第一电阻层,较佳地,该第一电阻层为一氮化钽(TaN)层;再以一直流溅镀方式(DCSupttering)形成该掺质层于该第一电阻层上方;再以一直流溅镀方式(DCSputtering)形成该第二电阻层于该掺质层上方,当然,较佳地,该第二层电阻层系可为一氮化钽(TaN)层。
而其中,该掺质层中所包含的掺质系可为原子半径为钽(Ta)之10%-30%的元素,较佳地,该掺质层系可为一含铟(In)的金属层,或为一含铅(Pb)的金属层,或为一含镨(Pr)的金属层,抑或为一含钐(Sm)的金属层。
最后,该热处理步骤系采用一快速热制程(Rapid Thermal Processing,RTP),而借助该快速制程,可使该掺质扩散至该第一电阻层与该第二电阻层,以得到本发明所需的电阻层。
而藉由本案所提供之电阻层,即可于该电阻层上完成喷墨头之后序制程,其步骤包含:借助溅镀法(Sputtering)与光学微影(Photolithography)与蚀刻技术(Etching)之方式,以形成一铝(Al)金属层,再以电浆增强汽相沉积法(PECVD),或直流溅镀(DC Sputtering)方式,形成一氮矽化合物(SiN)层,再以直流溅镀(DC Sputtering)方式,形成一金(Au)金属层于未被该氮矽化合物层覆盖于该铝金属层上方,以及形成一光阻隔层于部分该氮矽化合物层上方,以形成一墨水储存槽,再借助喷孔处理步骤,即贴附一喷孔片于该光阻隔层上方,以提供至少一供墨水喷出的喷孔;以完成喷墨头的制程步骤。
综上所述,透过本发明所提供的喷墨头电阻层的制程之作法,而所提供的电阻层结构,可明显地避免以常用作法所形成的电子迁移现象(ElectronMigration)发生,而且能使喷墨头后续的其它制程顺利进行,同时,可提供一制程快速、性能较佳且使用寿命长的喷墨头结构。
本发明将通过下列附图及详细说明,可达到更深入了解:
图1为常用喷墨头的结构示意图。
图2(a)-(f)为本发明的较佳实施例制程步骤例示图。
现请参阅图2(a)-(f),其系为本发明的较佳实施例制程步骤例示图,其中:
图2(a)包括下列步骤:
以一热氧化法(thermal Oxidation),形成一介电层22于该基板21上,其中,该基板21系为一矽基板,且该介电层22系为一二氧化矽(SiO2)层;
图2(b)包括下列步骤:
以直流溅镀法(DC Sputtering),形成一第一电阻层231于该二氧化矽(SiO2)层上方,而其中该第一电阻层231系为一氮化钽(TaN)层;
图2(c)系包括下列步骤:
以直流溅镀法(DC Sputtering),形成一掺质层232于该氮化钽(TaN)层231上方,而其中该掺质层232中所包含的掺质系可为原子半径为钽(Ta)之10%-30%的元素,较佳地,该掺质层232系可为一含铟(In)的金属层,或为一含铅(Pb)的金属层,或为一含镨(Pr)的金属层,抑或为一含钐(Sm)的金属层;
图2(d)系包括下列步骤:
以直流溅镀法(DC Sputtering),形成一第二电阻层233于该掺质层232上方,而其中该第二电阻层233系可为一氮化钽(TaN)层;
图2(c)系包括下列步骤:
以快速热制程(Rapid Thermal Processing,RTP)之方式,使该掺质层232扩散至该第一电阻层231与该第二电阻层233之中,以得到本发明所需经掺质的电阻层23;
借助本发明所提供的电阻层23,得以避免电子迁移现象(ElectronMigration)发生,则电阻层23将不会因长期过热而损坏。
图2(f)系包括下列步骤:
藉由溅镀法(Sputtering),及光学策影(photolithography),以及蚀刻技术(Etching)之方式,以形成一导电层24于该电阻层23上方的部分区域,其中,该导电层24系可为一铝(Al)金属层;
以电浆增强化学汽相沉积法(PECVD),或直流溅镀(DC Sputtering)方式,形成一保护层25,而其中,该保护层25系可为一氮矽化合物(SiN)层,且该氮矽化合物(SiN)层系形成于未被该铝金属层覆盖的该电阻层23上方及作为导电层24的该铝金属层上的部分区域;
以直流溅镀(DC Sputtering)方式,形成一金属层26于未被该保护层25覆盖之该导电层24上方,而该金属层26系可为一金(Au)金属层;
形成一光阻隔层27于部分该保护层25上方,以形成一墨水储存槽;
再利用喷孔处理步骤,即可贴附一喷孔片28于该光阻隔层27上方,以提供至少一供墨水喷出的喷孔,以完成喷墨头的制程步骤。
如此,藉由本发明所提供的喷墨头电阻层,再继续于该电阻层上完成喷墨头的其余制程步骤,即可有效避免该电阻层电子迁移现象(ElectronMigration),而使电阻层不会因长期过热而损坏,进而得以延长整组喷墨头的使用寿命。
Claims (10)
1.一种喷墨头电阻层的制程,其特征在于,:制程步骤包括:
a)形成一介电层于一基板上;
b)形成一第一电阻层于该介电层上;
c)形成一掺质层于该第一电阻层上;
d)形成一第二电阻层于该掺质层上;以及
e)施行一热处理步骤,以使掺质层扩散至该第一电阻层与该第二电
阻层,而形成该喷墨头的该电阻层。
2.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(a)中,该基板系可为一矽基板。
3.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(a)中,形成该介电层的方法系可以以一热氧化法,且该介电层可为一二氧化矽层。
4.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(b)中,形成该第一电阻层的方式系可以以一直流溅镀方式,且该第一电阻层系可为一氮化钽层。
5.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(c)中,形成该掺质层之方式系可以以一直流溅镀方式。
6.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(c)中,该掺质层中所包含之掺质系可为原子半径为钽之10%-30%之元素。
7.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(c)中,该掺质层系可为一含铟的金属层,或为一含铅的金属层,或为一镨的金属层,抑或为一含钐的金属层。
8.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(d)中,形成该第二电阻层之方式系可以以一直流溅镀方式。
9.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(d)中,该第二电阻层系可为一氮化钽层。
10.如权利要求1所述的喷墨头电阻层的制程,其特征在于,该步骤(e)中,该热处理步骤系可为一快速热制程,以使该掺质层扩散至该第一电阻层与该第二电阻层之中。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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CN97121341A CN1072117C (zh) | 1997-10-21 | 1997-10-21 | 喷墨头电阻层的制程 |
DE69829108T DE69829108T2 (de) | 1997-10-21 | 1998-10-21 | Herstellungsverfahren und Struktur eines Tintenstrahldruckkopfes |
CA 2250788 CA2250788C (en) | 1997-10-21 | 1998-10-21 | Manufacturing process and structure of ink jet printhead |
EP98250372A EP0930166B1 (en) | 1997-10-21 | 1998-10-21 | Manufacturing process and structure of ink jet printhead |
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CN97121341A CN1072117C (zh) | 1997-10-21 | 1997-10-21 | 喷墨头电阻层的制程 |
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CN1214992A CN1214992A (zh) | 1999-04-28 |
CN1072117C true CN1072117C (zh) | 2001-10-03 |
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CN97121341A Expired - Fee Related CN1072117C (zh) | 1997-10-21 | 1997-10-21 | 喷墨头电阻层的制程 |
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CN (1) | CN1072117C (zh) |
DE (1) | DE69829108T2 (zh) |
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TWI823046B (zh) * | 2021-01-11 | 2023-11-21 | 研能科技股份有限公司 | 晶圓結構 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1104885A (zh) * | 1994-01-07 | 1995-07-12 | 吴重行 | 青少年近视、散光综合治疗仪 |
CN1145855A (zh) * | 1995-04-21 | 1997-03-26 | 佳能株式会社 | 喷液记录头及制造它的方法 |
-
1997
- 1997-10-21 CN CN97121341A patent/CN1072117C/zh not_active Expired - Fee Related
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1998
- 1998-10-21 DE DE69829108T patent/DE69829108T2/de not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1104885A (zh) * | 1994-01-07 | 1995-07-12 | 吴重行 | 青少年近视、散光综合治疗仪 |
CN1145855A (zh) * | 1995-04-21 | 1997-03-26 | 佳能株式会社 | 喷液记录头及制造它的方法 |
Also Published As
Publication number | Publication date |
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CN1214992A (zh) | 1999-04-28 |
DE69829108T2 (de) | 2006-04-13 |
DE69829108D1 (de) | 2005-03-31 |
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